CN111235552A - A kind of preheating type tubular PECVD equipment and its control method - Google Patents

Abstract

The invention discloses a preheating tubular PECVD equipment and a control method thereof. The equipment comprises a feeding sliding table, a purification table, a furnace body cabinet, a gas source cabinet, a vacuum pump and a discharging sliding table. The purification table is used for Complete the transportation of the substrate and its carrier from the loading slide table, the unloading slide table to the furnace body reaction chamber in the furnace body cabinet, and the clean table includes a preheating transfer area, a carrier transfer area and A cooling area, the preheating conveying area is communicated with more than one preheating cavity, and the preheating cavity is used to complete the heating process of the substrate and its carrier from room temperature to a set temperature value and send it to the preheating conveying Then, it is sent to the furnace cabinet through the carrier transfer area for constant temperature and coating process, and finally it is sent to the unloading sliding table after cooling operation in the cooling area. This control method is implemented based on the above-mentioned apparatus. The invention has the advantages of simple structure, reasonable layout, and can improve the efficiency of the whole machine.

Description

A kind of preheating type tubular PECVD equipment and its control method

technical field

The invention mainly relates to the technical field of photovoltaic equipment, in particular to a preheating tubular PECVD equipment and a control method thereof.

Background technique

Photovoltaic power generation system is a new type of power generation system that uses the "photovoltaic effect" of solar cell semiconductor materials to directly convert solar radiation energy into electrical energy. Solar cell, also known as photovoltaic cell, is the core device in photovoltaic power generation system. PECVD (Plasma Enhanced Chemical Vapor Deposition) is the abbreviation of Plasma Enhanced Chemical Vapor Deposition, which is a main technology for preparing passivation films such as SiOx, AlOx, SiONx, SiNx. It uses glow discharge plasma to decompose SiH4 and other gas source molecules, so as to realize the preparation of passivation film. The principle is: the electrons in the reactive gas are accelerated in an external electric field to obtain energy and have a primary reaction with the reactive gas, so that the gas molecules are ionized and decomposed, thereby forming a plasma. A large number of chemically active ions, neutral atoms and molecular products in the plasma are transported to the film growth surface, and secondary reactions occur with each other at the same time. Various primary and secondary reaction products reaching the film growth surface are adsorbed by the substrate and react with the surface, while other products are released, and finally the film is formed.

The existing tubular PECVD equipment is mainly composed of three cabinets: purification table, furnace cabinet and gas source cabinet. After the substrate and the carrier enter the furnace tube reaction chamber of the furnace cabinet, the substrate and the carrier are heated from room temperature to The disadvantages of the process setting temperature value are:

(1) The constant temperature time in a single process accounts for about 45% of the total process time, and a lot of time is spent waiting for the temperature of the substrate and the carrier to rise to the set temperature value, which limits the production capacity of the equipment.

(2) In response to the requirements of cost reduction and efficiency increase, the size of the substrate is getting larger and larger, and the radial size of the furnace tube reaction chamber increases accordingly. During the process, the uniformity of the temperature field of the substrate and the carrier decreases, and the uniformity of the deposited film thickness Indicator reduction ultimately affects product performance.

SUMMARY OF THE INVENTION

The technical problem to be solved by the present invention is as follows: in view of the technical problems existing in the prior art, the present invention provides a preheating tubular PECVD equipment and a control method thereof, which has a simple structure, a reasonable layout, and can improve the efficiency of the whole machine.

In order to solve the above-mentioned technical problems, the present invention adopts the following technical solutions:

A preheating tubular PECVD equipment includes a loading slide table, a clean table, a furnace cabinet, a gas source cabinet, a vacuum pump and a blanking slide table, and the clean table is used to complete the loading and unloading of substrates and their carriers. The transportation between the sliding table and the unloading sliding table to the furnace body reaction chamber in the furnace body cabinet. The clean table includes a preheating conveying area, a carrier conveying area and a cooling area that are connected in sequence. The preheating conveying area is connected to the More than one preheating chamber is connected, and the preheating chamber is used to complete the heating process of the substrate and its carrier from room temperature to a set temperature value and send it to the preheating transfer area, and then send it into the carrier transfer area. The furnace cabinet is subjected to constant temperature and coating processes, and finally it is sent to the unloading sliding table after cooling in the cooling zone.

As a further improvement of the equipment of the present invention, more than one preheating push rod is arranged in the preheating conveying area, and the preheating push rod transports the carrier on the preheating push rod to the preheating cavity or the preheating cavity through the transmission mechanism. Remove the carrier from the preheating chamber.

As a further improvement of the device of the present invention, a furnace door is provided on the preheating push rod, and the furnace door is used to form a closed chamber in close contact with the preheating chamber.

As a further improvement of the device of the present invention, the preheating conveying zone is provided with a preheating zone corresponding to the number of the preheating push rods.

As a further improvement of the equipment of the present invention: the purification table includes a first manipulator device, and the first manipulator device is used to transfer the cooled carrier to the unloading tray of the unloading mechanism, and the unloading mechanism passes through the lifting mechanism. Transport the carrier to the unloading platform.

As a further improvement of the equipment of the present invention: the first manipulator device includes a motor, a reducer, a rack and pinion drive, a slider, and a guide rail, which are used to realize the first X axis, the first Y axis, and the first Z axis. Move and rotate around the fulcrum in the XOZ plane through the cam device, transport the carrier on the push rod device in and out of the boat into the furnace body reaction chamber or take out the carrier in the furnace tube reaction chamber.

As a further improvement of the equipment of the present invention, the clean table includes a second manipulator device, and the second manipulator device is used to place the carrier on the loading platform on the preheating push rod.

As a further improvement of the device of the present invention: the second manipulator device includes a motor, a reducer, a rack and pinion drive, a slider and a guide rail, which are used to realize sports.

As a further improvement of the device of the present invention, the preheating chamber is set up into multiple zones, and each zone is individually temperature controlled.

The present invention further provides a control method based on the above-mentioned preheating tubular PECVD equipment, the flow comprising:

S01. The feeding slide table transports the carrier to the feeding platform of the clean table, and the feeding platform is raised to the Z direction stroke of the second manipulator device through the lifting mechanism, and the second manipulator device is on the second Z axis, the second Y axis Motion in the axial direction to place the carrier on the preheating push rod;

S02, the preheating push rod and the carrier move along the second X-axis until the furnace door and the preheating cavity are closed, start the preheating process, and preheat the substrate and the carrier;

S03. When the temperature of the preheating chamber reaches the set value, the preheating push rod and the carrier exit the preheating chamber, and the second manipulator moves in the directions of the second Z axis, the second Y axis, and the third Y axis to place the carrier on the On the push rod device for entering and leaving the boat;

S04, the first manipulator device moves in the directions of the first X axis, the first Y axis and the first Z axis, the XOZ plane rotates around the fulcrum, and the carrier on the push rod device in and out of the boat is placed in the constant temperature zone in the furnace tube reaction chamber, The push rod device entering and leaving the boat exits the furnace tube reaction chamber, and closes the furnace door of the furnace tube reaction chamber;

S05, vacuumize the closed furnace tube reaction chamber, and heat up the temperature at the same time; keep a constant temperature when the temperature in the furnace tube reaction chamber reaches the set temperature value, introduce the required process gas into the furnace tube reaction chamber, and control the pressure , after constant pressure for a certain period of time, the radio frequency power supply is turned on to form plasma, and the passivation film is deposited on the surface of the substrate after the process gas reacts;

S06. After depositing the passivation film, stop feeding the process gas and turn off the radio frequency power supply, evacuate the residual process gas in the furnace tube reaction chamber, and introduce inert gas to the furnace tube reaction chamber for multiple times of purging, cleaning, and evacuation, and then feeding into the furnace tube reaction chamber. Open the furnace door of the furnace tube reaction chamber after the inert gas pressure in the furnace tube returns to normal pressure, and close the furnace door of the reaction chamber after the in-out boat pusher device of the first manipulator device takes out the carrier;

S07, the first manipulator moves in the directions of the first X axis, the first Y axis, and the first Z axis, and places the carrier on the push rod device in and out of the boat on the cooling buffer position for cooling;

S08. After the cooling is completed, the first manipulator device places the carrier on the unloading tray of the unloading mechanism. After the unloading mechanism transports the carrier to the unloading platform through the lifting mechanism, the substrate flows to the next process.

Compared with the prior art, the advantages of the present invention are:

1. The substrate and the carrier of the present invention are preheated before entering the furnace tube reaction chamber, which increases the initial temperature of the substrate and the carrier, and reduces the difference between the initial temperature and the set temperature during the temperature control process during the process. value, and then reduce the heating time in the process, so that the total process time is reduced by 20%, thereby greatly improving the production capacity of the equipment.

2. The substrate and the carrier of the present invention are preheated before entering the furnace tube reaction chamber, which can improve the uniformity and stability of the temperature field in the furnace tube reaction chamber in the same process time or even in a shorter time. It has more uniform heating, thereby improving the uniformity index of substrate deposition film thickness and product performance.

3. The rational use of the space of the clean bench in the present invention is reasonably controlled by the software program, and the carrier is used for preheating while waiting to enter the furnace tube reaction chamber, and the substrate and the carrier enter the furnace tube reaction chamber in a single process without increasing. previous time.

Description of drawings

FIG. 1 is a schematic view of the front structure of the present invention.

FIG. 2 is a schematic top view of the structure of the present invention.

3 is a schematic structural diagram of a clean bench in a specific application example of the present invention.

FIG. 4 is a schematic view of the cross-sectional structure at A-A in the present invention.

FIG. 5 is a schematic diagram of the preheating conveying structure in a specific application example of the present invention.

FIG. 6 is a schematic diagram of the structural principle of the preheating chamber in another specific application example of the present invention.

illustration:

1. Loading sliding table; 2. Purification table; 3. Furnace cabinet; 4. Gas source cabinet; 5. Vacuum pump; 6. Preheating chamber; 7. Preheating transfer area; 8. Carrier transfer area; 9. Cooling area; 10. Unloading sliding table; 11. Carrier; 12. Push rod device for entering and leaving the boat; 13. The first X-axis; 14. Cooling buffer position; 15. Cam device; 16. The first Z-axis; 17. Blanking mechanism; 18, the first Y axis; 19, blanking platform; 20, four-axis manipulator device; 21, the second Y axis; 22, the second Z axis; 23, three-axis manipulator device; 24, the third Y axis; 25, feeding platform; 26, furnace door; 27, preheating push rod; 28, second X axis.

Detailed ways

The present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments.

As shown in Figures 1 and 2, the preheating tubular PECVD equipment of the present invention includes a loading slide table 1, a clean table 2, a furnace cabinet 3, a gas source cabinet 4, a vacuum pump 5, a preheating chamber 6 and a lower chamber. The material sliding table 10 and the feeding sliding table 1 transport the carrier 11 loaded with the substrates in the loading and unloading area to the clean table 2 of the equipment. The clean table 2 mainly provides a clean space to complete the transportation of the substrate and its carrier 11 from the loading slide 1 and the unloading slide 10 to the reaction chamber of the furnace body. The cooled substrate and the carrier 11 of the unloading slide 10 are transported to the loading and unloading area, so that the carrier after the coating process is completed can be transferred to the next process. The clean table 2 includes a preheating transfer area 7, a carrier transfer area 8 and a cooling area 9. The preheating chamber 6 is arranged separately and is arranged side by side with the furnace cabinet 3, and is adjacent to the preheat transfer area 7 of the clean table 2. To complete the heating process of the substrate and its carrier 11 from room temperature to a set temperature value. This layout can save the space of the overall equipment to the greatest extent possible, improve the transmission efficiency and reduce the temperature loss, and improve the efficiency of the whole machine. In other embodiments, the preheating chamber 6 can also be integrated in the clean table 2 . The heating method of the preheating chamber 6 can be selected according to actual needs, for example, an infrared lamp tube, a resistance wire or other heating methods are selected.

In a specific application example, the furnace body cabinet 3 is mainly placed in the heating furnace tube, and the substrate completes the required process in the furnace tube reaction chamber. The gas source cabinet 4 mainly houses components such as the gas circuit system, the radio frequency system, the power distribution system, and the vacuum pressure system. The vacuum pump 5 is connected to the vacuum pressure system in the gas source cabinet 4 through the vacuum pipeline, and vacuumizes the furnace tube reaction chamber to reach the set pressure value.

3 and 4 , in a specific application example of the structure of the clean table 2, the clean table 2 includes a first manipulator device (such as a four-axis manipulator device 20 ) and a first manipulator device (such as a three-axis manipulator device 23 ).

Among them, the four-axis manipulator device 20 includes a motor, a reducer, a rack and pinion drive, a slider, and a guide rail, which are used to realize the movement in the directions of the first X axis 13, the first Y axis 18, and the first Z axis 16. The device 15 realizes the rotation around the fulcrum in the XOZ plane, and accurately transports the carrier 11 on the in and out boat push rod device 12 into the furnace tube reaction chamber or takes out the carrier 11 in the furnace tube reaction chamber.

The cooling zone 9 is provided with a plurality of cooling buffer positions 14, usually 3-6 according to the number of furnace tube reaction chambers. The four-axis manipulator device 20 transfers the cooled carrier 11 to the unloading tray of the unloading mechanism 17 , the unloading mechanism 17 can move vertically along the Z-axis direction, and the carrier 11 is transported to the unloading platform 19 through the lifting mechanism .

The carrier 11 loaded with the substrates on the loading platform 25 of the preheating conveying area 7 moves in the vertical direction through the lifting mechanism.

Among them, the three-axis manipulator device 23 includes a motor, a reducer, a rack and pinion drive, a slider, a guide rail, etc., and is used to realize the movement in the directions of the second Z-axis 22, the second Y-axis 21, and the third Y-axis 23. The carrier 11 on the loading platform 25 is placed on the preheating push rod 27 .

In this specific example, the preheating transfer area 7 is provided with a plurality of preheating push rods 27 and a corresponding number of preheating chambers 6, usually 2-4 according to the number of furnace tube reaction chambers.

The preheating transfer area 7 is provided with a preheating push rod 27. The preheating push rod 27 realizes the movement in the direction of the second X-axis 28 through a motor, a reducer, a pulley, a belt drive, a slider and a guide rail. The carrier 11 on the preheating chamber 6 is transported to the preheating chamber 6 or the carrier 11 in the preheating chamber 6 is taken out. The oven door 26 on the preheating push rod 27 is closely attached to the preheating chamber 6 to form a closed chamber, as shown in the figure. 5 shown.

In a specific application example, the temperature of the preheating chamber 6 can be further controlled separately according to the size of the chamber, so that the heating control in the chamber is more accurate, and the temperature field distribution is more uniform, and the number of partitions is usually 3-6.

In a specific application example, the number of furnace tube reaction chambers is generally 4-10, and the correspondingly equipped substrate carriers 11 are 6-20 sets, each set can be 1-4 carriers 11, in the legend, each set has 2 With 11. A single furnace tube reaction chamber performs a coating process on the substrates in a set of carriers 11 in each process. The carrier 11 waiting to enter the furnace tube reaction chamber to start the process is preheated in the preheating zone, and the carrier 11 that has finished the coating process is cooled in the cooling zone 9 .

In the technical solutions of the above embodiments, the structure of the preheating device is a horizontal push-in type, and the structure of the preheating device is not limited in practical applications. For example, in the vertical loading type shown in FIG. On the skeleton, the preheating chamber bottom plate 32 is fixed on the slider 33 of the lifting mechanism, and the substrate and the carrier 11 move vertically along the guide rail 30 along with the preheating chamber bottom plate 32 until the preheating chamber 6 is closed.

The present invention further provides a control method based on the above-mentioned preheating tubular PECVD equipment, and the flow is as follows:

S01. The loading slide table 1 transports the carrier 11 to the loading platform 25 of the clean table 2, and the loading platform 25 is raised to the Z direction stroke of the three-axis manipulator device 23 through the lifting mechanism. The three-axis manipulator device 23 is in the first The two Z-axis 22 and the second Y-axis 21 move in the direction, and the carrier 11 is placed on the preheating push rod 27;

S02, the preheating push rod 27 and the carrier 11 move along the second X axis 28 until the furnace door 26 and the preheating cavity 6 are closed, start the preheating process, and preheat the substrate and the carrier 11;

S03, the temperature of the preheating chamber 6 reaches the set value, the preheating push rod 27 and the carrier 11 exit the preheating chamber 6, and the three-axis manipulator device 23 is in the second Z axis 22, the second Y axis 21, and the third Y axis. The shaft 24 moves in the direction to place the carrier 11 on the push rod device 12 for entering and leaving the boat;

S04, the four-axis manipulator device 20 moves in the directions of the first X axis 13, the first Y axis 18, and the first Z axis 16, the XOZ plane rotates around the fulcrum, and accurately places the carrier 11 on the in-out boat pusher device 12 to the In the constant temperature zone in the furnace tube reaction chamber, the in and out boat push rod device 12 exits the furnace tube reaction chamber, and closes the furnace door of the furnace tube reaction chamber;

S05, vacuumize the closed furnace tube reaction chamber, and heat up the temperature at the same time. When the temperature in the furnace tube reaction chamber reaches the set temperature value, keep a constant temperature, pass the required process gas into the furnace tube reaction chamber, and control the pressure. After a certain period of constant pressure, turn on the radio frequency power supply to form plasma. After the process gas reacts Deposit a passivation film on the surface of the substrate;

S06. After depositing the passivation film, stop feeding the process gas and turn off the radio frequency power supply, evacuate the residual process gas in the furnace tube reaction chamber, and introduce inert gas to the furnace tube reaction chamber for multiple times of purging, cleaning, and evacuation, and then feeding into the furnace tube reaction chamber. Open the furnace door of the furnace tube reaction chamber after the inert gas pressure in the furnace tube is restored to normal pressure, and close the furnace door of the reaction chamber after the in-out boat pusher device 12 of the four-axis manipulator device 20 takes out the carrier 11;

S07, the four-axis manipulator device 20 moves in the directions of the first X axis 13, the first Y axis 18, and the first Z axis 16, and places the carrier 11 on the in-out boat pusher device 12 on the cooling buffer position 14 for cooling;

S08. After cooling, the four-axis manipulator device 20 places the carrier 11 on the unloading tray of the unloading mechanism 17. After the unloading mechanism 17 transports the carrier 11 to the unloading platform 19 through the lifting mechanism, the substrate flows to the bottom. a process.

(4) Comparison of experimental results and data

During the experiment, the same equipment is operated with the same process, and the same number of substrates and the same conditions as other processes are ensured. The comparison data are as follows:

Function Process time Intra-thickness uniformity Film thickness uniformity battery efficiency with preheating 36 minutes ±2.1% ±3.2% 22.45% No preheat 45 minutes ±2.5% ±3.95% 22.41%

According to the experimental test results, the operating process time of the preheated tubular PECVD equipment is reduced by 20%, which greatly improves the production capacity, and at the same time, the film thickness uniformity and cell efficiency are improved.

The above are only preferred embodiments of the present invention, and the protection scope of the present invention is not limited to the above-mentioned embodiments, and all technical solutions that belong to the idea of the present invention belong to the protection scope of the present invention. It should be pointed out that for those skilled in the art, some improvements and modifications without departing from the principle of the present invention should be regarded as the protection scope of the present invention.

Claims (10)

1. A preheating tubular PECVD equipment, comprising a feeding slide table (1), a clean table (2), a furnace cabinet (3), a gas source cabinet (4), a vacuum pump (5) and a feeding slide table (10), the clean table (2) is used to complete the reaction of the substrate and its carrier (11) from the loading slide (1), the unloading slide (10) to the furnace body in the furnace cabinet (3). The transportation between chambers is characterized in that the clean table (2) comprises a preheating conveying area (7), a carrier conveying area (8) and a cooling area (9) which are connected in sequence, and the preheating conveying area (7) It is communicated with more than one preheating chamber (6), and the preheating chamber (6) is used to complete the heating process of the substrate and its carrier (11) from room temperature to a set temperature value and feeding it into the The preheating transfer area (7) is then sent to the furnace cabinet (3) through the carrier transfer area (8) for constant temperature and coating processes, and finally the cooling area (9) is cooled and then sent to the unloading slide table (10). ). 2. The preheating tubular PECVD equipment according to claim 1, characterized in that, more than one preheating push rod (28) is provided in the preheating transfer area (7), and the preheating push rod (28) The carrier (11) on the preheating push rod (28) is transported into the preheating chamber (6) through the transmission mechanism or the carrier (11) in the preheating chamber (6) is taken out. 3. The preheating tubular PECVD equipment according to claim 2, wherein a furnace door (27) is provided on the preheating push rod (26), and the furnace door (27) is used to communicate with the preheating push rod (26). The thermal cavity (6) is closely attached to form a closed cavity. The preheating tubular PECVD equipment according to claim 2 or 3, characterized in that, the preheating transfer zone (7) is provided with a preheating zone corresponding to the number of the preheating push rods (28). 5. The preheating tubular PECVD equipment according to any one of claims 1-3, characterized in that, the clean table (2) comprises a first manipulator device, and the first manipulator device is used to The cooled carrier (11) is transferred to the unloading tray of the unloading mechanism (17), and the unloading mechanism (17) transports the carrier (11) to the unloading platform (19) through the lifting mechanism. 6. The preheated tubular PECVD equipment according to claim 5, wherein the first manipulator device comprises a motor, a reducer, a rack and pinion drive, a slider, and a guide rail for realizing the first X The axis (13), the first Y axis (18), and the first Z axis (16) move in the directions, and realize the rotation around the fulcrum in the XOZ plane through the cam device (15), and move in and out of the boat push rod device (12). The carrier (11) is transported into the furnace body reaction chamber or the carrier (11) in the furnace tube reaction chamber is taken out. 7. The preheated tubular PECVD equipment according to any one of claims 2-3, wherein the clean table (2) comprises a second manipulator device (23), the second manipulator device (23) is used to place the carrier (11) on the loading platform (25) on the preheating push rod (28). 8. The preheated tubular PECVD equipment according to claim 7, wherein the second manipulator device (23) comprises a motor, a reducer, a rack and pinion drive, a slider and a guide rail, which are used to realize the Movements in the directions of the second Z axis (22), the second Y axis (21), and the third Y axis (23). 9. The preheating tubular PECVD equipment according to any one of claims 1 to 3, wherein the preheating chamber (6) is configured as a plurality of zones, and each zone is individually temperature controlled. 10. A control method based on any one of the above-mentioned preheating tubular PECVD equipment in claims 1-9, characterized in that the flow comprises: S01. The loading slide table (1) transports the carrier (11) to the loading platform (25) of the clean table (2), and the loading platform (25) rises to the second manipulator device (23) through the lifting mechanism During the stroke in the Z direction, the second manipulator device (23) moves in the direction of the second Z axis (22) and the second Y axis (21) to place the carrier (11) on the preheating push rod (28); S02. The preheating push rod (28) and the carrier (11) move along the second X-axis (28) until the furnace door (26) and the preheating chamber (6) are closed, start the preheating process, and start the preheating process. tool (11) for preheating; S03. When the temperature of the preheating chamber reaches the set value, the preheating push rod (27) together with the carrier (11) exits the preheating chamber (6), and the second manipulator device (23) operates on the second Z axis (22), the first The second Y-axis (21) and the third Y-axis (23) are moved in the directions, and the carrier (11) is placed on the push rod device (12) for entering and leaving the boat; S04, the first manipulator device (20) moves in the directions of the first X axis (13), the first Y axis (18), and the first Z axis (16), the XOZ plane rotates around the fulcrum, and the push rod device (12) enters and leaves the boat. The carrier (11) on the ) is placed in the constant temperature zone of the furnace tube reaction chamber, the in-out boat push rod device (12) exits the furnace tube reaction chamber, and the furnace door of the furnace tube reaction chamber is closed; S05, vacuumize the closed furnace tube reaction chamber, and heat up the temperature at the same time; when the temperature in the furnace tube reaction chamber reaches the set temperature value, keep a constant temperature, introduce the required process gas into the furnace tube reaction chamber, and control the pressure , after constant pressure for a certain period of time, the radio frequency power supply is turned on to form plasma, and the passivation film is deposited on the surface of the substrate after the process gas reacts; S06. After depositing the passivation film, stop feeding the process gas and turn off the radio frequency power supply, evacuate the residual process gas in the furnace tube reaction chamber, and introduce inert gas to the furnace tube reaction chamber for multiple times of purging, cleaning, and evacuation, and then feeding into the furnace tube reaction chamber. After the pressure in the furnace tube returns to normal pressure, the inert gas is opened to open the furnace door of the furnace tube reaction chamber, and the in-out boat push rod device (12) of the first manipulator device (20) takes out the carrier (11), and then closes the reaction chamber furnace door; S07. The first manipulator device (20) moves in the directions of the first X axis (13), the first Y axis (18), and the first Z axis (16), and moves the carrier ( 11) Place it on the cooling buffer position (14) for cooling; S08. After cooling, the first manipulator device (20) places the carrier (11) on the unloading tray of the unloading mechanism (17), and the unloading mechanism (17) transports the carrier (11) to the bottom through the lifting mechanism After the material platform (19), the substrate flow is transferred to the next process.

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