CN109440085A - A kind of high production capacity PECVD device of 10 pipes - Google Patents
A kind of high production capacity PECVD device of 10 pipes Download PDFInfo
- Publication number
- CN109440085A CN109440085A CN201811570772.3A CN201811570772A CN109440085A CN 109440085 A CN109440085 A CN 109440085A CN 201811570772 A CN201811570772 A CN 201811570772A CN 109440085 A CN109440085 A CN 109440085A
- Authority
- CN
- China
- Prior art keywords
- workbench
- fixedly connected
- production capacity
- host
- gas source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 35
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 title claims abstract description 23
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 23
- 229910002804 graphite Inorganic materials 0.000 claims abstract description 23
- 239000010439 graphite Substances 0.000 claims abstract description 23
- 238000007789 sealing Methods 0.000 claims abstract description 21
- 239000000463 material Substances 0.000 claims description 6
- 239000003053 toxin Substances 0.000 claims description 4
- 231100000765 toxin Toxicity 0.000 claims description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 4
- 238000000034 method Methods 0.000 abstract description 19
- 239000011521 glass Substances 0.000 abstract description 7
- 230000008901 benefit Effects 0.000 abstract description 5
- 230000005684 electric field Effects 0.000 abstract description 5
- 210000004262 dental pulp cavity Anatomy 0.000 description 5
- 238000000576 coating method Methods 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000003667 anti-reflective effect Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 210000004556 brain Anatomy 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
The invention discloses a kind of high production capacity PECVD devices of 10 pipes, including gas source cabinet, host, sealing door extractor structure and workbench, the side of gas source cabinet is fixedly connected with host, and host is fixedly connected with sealing door extractor structure far from the side of gas source cabinet, it seals door extractor structure and is fixedly connected with workbench far from the side of host, the side of workbench inner wall is fixedly connected with loading and unloading manipulator.The high production capacity PECVD device, is fixedly connected with host by the side of gas source cabinet, with this configuration the innovation of equipment, so that the production capacity of unit area improves 50%, the production cost for reducing chip, brings higher benefit to enterprise, is connected with graphite boat by the internal slide of workbench, new graphite boat slide glass amount reaches 600, graphite boat forms two circuits, avoids the decaying of electric field, increases the slide glass ability of graphite boat, high production capacity is not only brought, pecvd process index can be also optimized.
Description
Technical field
The present invention relates to PECVD device technical fields, the specially a kind of high production capacity PECVD device of 10 pipes.
Background technique
PECVD (Plasma Enhanced Chemical Vapor Deposition) refers to plasma enhancing
Vapour deposition process makes the gas ionization containing film composed atom by microwave or radio frequency etc., is being partially formed plasma
Body, and plasma chemistry activity is very strong, it is easy to it reacts, goes out desired film in deposition on substrate, for making
Learn reaction can carry out at a lower temperature, the activity of plasma is utilized to promote to react, thus this CVD be known as etc. from
Daughter enhances chemical vapor deposition, is process important in solar battery sheet, and embodies enterprise's solar-electricity
One important indicator of pond piece efficiency, coating technique are the technology that entire photovoltaic industry compares attention, the efficiency of solar battery
Promotion can realize that light is up to 35% or so in the reflection loss rate of silicon face by the promotion of coating technique, and antireflective film can be with
Cell piece is highly improved to the utilization rate of sunlight, improves photoelectric conversion efficiency.
Because every a batch cell piece requires to monitor, generally relatively busy, the present equipment production status of PECVD process
Under, original equipment amount can no longer meet the demand of production capacity, and improve production capacity by increasing number of devices, and can bring and account for
The problem of ground area, and the equipment land used of most of cell piece manufacturers has reached saturation, in this case, improves
The production capacity of equipment itself is just at urgent demand.
Summary of the invention
In view of the deficiencies of the prior art, the present invention provides a kind of high production capacity PECVD device of 10 pipes, original set is solved
Standby amount can no longer meet the demand of production capacity, and improve production capacity by increasing number of devices, and can bring asking for occupied area
Topic.
In order to achieve the above object, the present invention is achieved by the following technical programs: one kind high production capacity PECVD of 10 pipes is set
It is standby, including gas source cabinet, host, sealing door extractor structure and workbench, the side of the gas source cabinet be fixedly connected with host, and host
Side far from gas source cabinet is fixedly connected with sealing door extractor structure, and the sealing door extractor structure is fixedly connected far from the side of host
There is workbench, the side of the workbench inner wall is fixedly connected with loading and unloading manipulator, and the side of the workbench inner wall is fixed
It is connected with interval platform, front and the back side of the workbench side are sequentially connected with automatic sending and taking material system, the workbench
Front with the back side be fixedly connected to control station.
Preferably, the workbench is internally provided with push-and-pull boat, and the internal slide of the workbench is connected with graphite boat.
Preferably, the vacuum system that is internally provided with for sealing door extractor structure, front and the back of gas source cabinet side
Face is provided with insulating box.
Preferably, it is provided with transformer at the top of the gas source cabinet, is provided with toxin expelling at the top of the sealing door extractor structure
Case.
Preferably, water flow switch is fixedly connected at the top of the host.
Preferably, the workbench is internally provided with Sic paddle.
Beneficial effect
The present invention provides a kind of high production capacity PECVD devices of 10 pipes.Have compared with prior art it is following the utility model has the advantages that
(1), the high production capacity PECVD device is fixedly connected with host by the side of gas source cabinet, and host far from gas source cabinet one
Side is fixedly connected with sealing door extractor structure, and sealing door extractor structure is fixedly connected with workbench far from the side of host, in workbench
The side of wall is fixedly connected with loading and unloading manipulator, and the side of workbench inner wall is fixedly connected with interval platform, workbench side
Front is sequentially connected with automatic sending and taking material system with the back side, and front and the back side of workbench are fixedly connected to control operation
Platform, the with this configuration innovation of equipment reduce the production cost of chip so that the production capacity of unit area improves 50%, to enterprise
Industry brings higher benefit.
(2), the high production capacity PECVD device is connected with graphite boat, new graphite boat slide glass by the internal slide of workbench
Amount reaches 600, and graphite boat forms two circuits, avoids the decaying of electric field, and for the uniformity of film thickness, new
Electric field is better than pervious single loop form, increases the slide glass ability of graphite boat, not only brings high production capacity, can also optimize PECVD work
Skill index.
Detailed description of the invention
Fig. 1 is the equipment complete machine figure of structure of the invention；
Fig. 2 is the main view of gas source cabinet of the present invention；
Fig. 3 is the side view of structure of the invention；
Fig. 4 is the cross-sectional view of vacuum system structure of the present invention；
Fig. 5 is the equipment entirety installation diagram of structure of the invention；
Fig. 6 is the top view of the whole assembly graph structure of the present invention；
Fig. 7 is the perspective view of constant temperature box structure of the present invention；
Fig. 8 is the main view of constant temperature box structure of the present invention；
Fig. 9 is the side view of constant temperature box structure of the present invention
Figure 10 is the partial enlarged view in Fig. 1 of the present invention at A；
Figure 11 is the partial enlarged view in Fig. 1 of the present invention at B；
Figure 12 is the partial enlarged view in Fig. 3 of the present invention at C.
In figure: 1 gas source cabinet, 2 hosts, 3 sealing door extractor structures, 4 workbench, 5 loading and unloading manipulators, 6 interval platforms, 7 are automatically
Material-feeding and fetching system, 8 control stations, 9 push-and-pull boats, 10 graphite boats, 11 vacuum systems, 12 insulating boxs, 13 transformers, 14 toxin expellings
Case, 15 water flow switches, 16 Sic paddles.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation description, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts every other
Embodiment shall fall within the protection scope of the present invention.
Fig. 1-12 is please referred to, the present invention provides a kind of technical solution: a kind of high production capacity PECVD device of 10 pipes, including gas source
Cabinet 1, host 2, sealing door extractor structure 3 and workbench 4, the top of gas source cabinet 1 are provided with transformer 13, sealing door extractor structure 3
Top is provided with toxin expelling case 14, and the side of gas source cabinet 1 is fixedly connected with host 2, and the top of host 2 is fixedly connected with water flow switch
15, and host 2 is fixedly connected with sealing door extractor structure 3 far from the side of gas source cabinet 1, sealing door extractor structure 3 is internally provided with
Vacuum system 11, front and the back side of 1 side of gas source cabinet are provided with insulating box 12, seal one of door extractor structure 3 far from host 2
Side is fixedly connected with workbench 4, and workbench 4 is internally provided with Sic paddle 16, and workbench 4 is internally provided with push-and-pull boat 9, this
Totally 12 root canal, every layer of two root canal, this two root canal share a set of 9 mechanism of push-and-pull boat to equipment, and push-and-pull boat 9 is controlled by software design
Material-feeding and fetching mechanism makes it serve two root canals of this layer, so, not only there is lateral inlet/outlet mechanism in new 9 mechanism of push-and-pull boat, also increases
Add horizontal conveyor system, so that movement of this feeding mechanism between every layer of two root canals, to achieve the purpose that material-feeding and fetching, two
Column process duct can reduce the production cost of chip with the material-feeding and fetching system of common bed on very significantly in this way, to enterprise
Industry brings higher benefit, and the internal slide of workbench 4 is connected with graphite boat 10, and the matched graphite boat 10 of this equipment institute is newly to grind
The bipolar graphite boat 10 of hair, new 10 slide glass amount of graphite boat reach 600, and production capacity improves nearly 50% compared to before, graphite boat
10 be to lengthen graphite boat 10 by increasing and improve slide glass amount, and graphite boat 10 forms two circuits, avoid the decaying of electric field,
And for the uniformity of film thickness, new electric field is better than pervious single loop form, increases the slide glass ability of graphite boat 10,
High production capacity is not only brought, pecvd process index can be also optimized, the side of 4 inner wall of workbench is fixedly connected with loading and unloading manipulator
5, the side of 4 inner wall of workbench is fixedly connected with interval platform 6, and front and the back side of 4 side of workbench are sequentially connected with automatically
Material-feeding and fetching system 7, front and the back side of workbench 4 are fixedly connected to control station 8, pass through gas source cabinet 1, host 2, sealing
Fire door mechanism 3, workbench 4, loading and unloading manipulator 5, interval platform 6, automatic sending and taking material system 7 and the setting for controlling station 8, should
The innovation of structural device reduces the production cost of chip, brings more to enterprise so that the production capacity of unit area improves 50%
High benefit.
In use, automatic sending and taking material system 7 is mounted on workbench 4, then the graphite boat 10 for being loaded with chip to be coated
It sends loading and unloading manipulator 5 to, by the precise positioning of this fully automatic manipulator, graphite boat 10 is put into every pipe is corresponding to be pushed away
It draws on boat 9, is then sent into process duct by push-and-pull boat 9 again, chip passes through sealing door extractor structure 3 and vacuum system in process duct
System 11, technique vacuum degree, then passes to process gas, in the process, control system plays brain required for reaching
Command function enables coating process in stable environment under low pressure, technique knot by a whole set of strict closed-loop control software
Shu Hou takes out graphite boat 10 from process duct by push-and-pull boat 9, then pyrographite boat 10 is placed by loading and unloading manipulator 5
It is cooled down in interval platform 6, and by circulating air cooling system, until work is sent out by automatic sending and taking material system 7 after suitable temperature
Then platform 4 can carry out taking 10 program of graphite boat, this completes the uses once to the high production capacity PECVD device.
It should be noted that, in this document, relational terms such as first and second and the like are used merely to a reality
Body or operation are distinguished with another entity or operation, are deposited without necessarily requiring or implying between these entities or operation
In any actual relationship or order or sequence.Moreover, the terms "include", "comprise" or its any other variant are intended to
Non-exclusive inclusion, so that the process, method, article or equipment including a series of elements is not only wanted including those
Element, but also including other elements that are not explicitly listed, or further include for this process, method, article or equipment
Intrinsic element.
It although an embodiment of the present invention has been shown and described, for the ordinary skill in the art, can be with
A variety of variations, modification, replacement can be carried out to these embodiments without departing from the principles and spirit of the present invention by understanding
And modification, the scope of the present invention is defined by the appended.
Claims (6)
1. a kind of high production capacity PECVD device of 10 pipes, including gas source cabinet (1), host (2), sealing door extractor structure (3) and workbench
(4), the side of the gas source cabinet (1) is fixedly connected with host (2), and host (2) is fixedly connected far from the side of gas source cabinet (1)
There is sealing door extractor structure (3), sealing door extractor structure (3) is fixedly connected with workbench (4) far from the side of host (2),
Be characterized in that: the side of workbench (4) inner wall is fixedly connected with loading and unloading manipulator (5), workbench (4) inner wall
Side is fixedly connected with interval platform (6), and front and the back side of workbench (4) side are sequentially connected with automatic sending and taking material system
It unites (7), front and the back side of the workbench (4) are fixedly connected to control station (8).
2. the high production capacity PECVD device of a kind of 10 pipe according to claim 1, it is characterised in that: the workbench (4) it is interior
Portion is provided with push-and-pull boat (9), and the internal slide of the workbench (4) is connected with graphite boat (10).
3. the high production capacity PECVD device of a kind of 10 pipe according to claim 1, it is characterised in that: the sealing door extractor structure
(3) be internally provided with vacuum system (11), front and the back side of gas source cabinet (1) side are provided with insulating box (12).
4. the high production capacity PECVD device of a kind of 10 pipe according to claim 1, it is characterised in that: the top of the gas source cabinet (1)
Portion is provided with transformer (13), is provided with toxin expelling case (14) at the top of the sealing door extractor structure (3).
5. the high production capacity PECVD device of a kind of 10 pipe according to claim 1, it is characterised in that: the top of the host (2)
It is fixedly connected with water flow switch (15).
6. the high production capacity PECVD device of a kind of 10 pipe according to claim 1, it is characterised in that: the workbench (4) it is interior
Portion is provided with Sic paddle (16).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811570772.3A CN109440085A (en) | 2018-12-21 | 2018-12-21 | A kind of high production capacity PECVD device of 10 pipes |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811570772.3A CN109440085A (en) | 2018-12-21 | 2018-12-21 | A kind of high production capacity PECVD device of 10 pipes |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109440085A true CN109440085A (en) | 2019-03-08 |
Family
ID=65534823
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811570772.3A Pending CN109440085A (en) | 2018-12-21 | 2018-12-21 | A kind of high production capacity PECVD device of 10 pipes |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109440085A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110453201A (en) * | 2019-09-12 | 2019-11-15 | 深圳市捷佳伟创新能源装备股份有限公司 | To the process and coating apparatus of multiple graphite boats while plated film in one cavity |
| CN110616418A (en) * | 2019-10-23 | 2019-12-27 | 湖南红太阳光电科技有限公司 | Control method of tubular PECVD (plasma enhanced chemical vapor deposition) equipment and tubular PECVD equipment |
| CN111235552A (en) * | 2020-04-01 | 2020-06-05 | 湖南红太阳光电科技有限公司 | Preheating type tubular PECVD (plasma enhanced chemical vapor deposition) equipment and control method thereof |
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| CN209568142U (en) * | 2018-12-21 | 2019-11-01 | 无锡华源晶电科技有限公司 | A kind of high production capacity PECVD device of 10 pipes |
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| CN110453201A (en) * | 2019-09-12 | 2019-11-15 | 深圳市捷佳伟创新能源装备股份有限公司 | To the process and coating apparatus of multiple graphite boats while plated film in one cavity |
| CN110616418A (en) * | 2019-10-23 | 2019-12-27 | 湖南红太阳光电科技有限公司 | Control method of tubular PECVD (plasma enhanced chemical vapor deposition) equipment and tubular PECVD equipment |
| CN111235552A (en) * | 2020-04-01 | 2020-06-05 | 湖南红太阳光电科技有限公司 | Preheating type tubular PECVD (plasma enhanced chemical vapor deposition) equipment and control method thereof |
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