CN104561930A - Graphite boat pushing device for horizontal semiconductor equipment - Google Patents

Graphite boat pushing device for horizontal semiconductor equipment Download PDF

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Publication number
CN104561930A
CN104561930A CN201510010029.2A CN201510010029A CN104561930A CN 104561930 A CN104561930 A CN 104561930A CN 201510010029 A CN201510010029 A CN 201510010029A CN 104561930 A CN104561930 A CN 104561930A
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CN
China
Prior art keywords
graphite boat
silicon carbide
electrode
semiconductor equipment
horizontal semiconductor
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Pending
Application number
CN201510010029.2A
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Chinese (zh)
Inventor
宋晓彬
郝晓明
桂晓波
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Beijing Sevenstar Electronics Co Ltd
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Beijing Sevenstar Electronics Co Ltd
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Publication date
Application filed by Beijing Sevenstar Electronics Co Ltd filed Critical Beijing Sevenstar Electronics Co Ltd
Priority to CN201510010029.2A priority Critical patent/CN104561930A/en
Publication of CN104561930A publication Critical patent/CN104561930A/en
Pending legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)

Abstract

The invention relates to a graphite boat pushing device for horizontal semiconductor equipment, and belongs to the technical field of horizontal semiconductor equipment. The graphite boat pushing device comprises a furnace gate and a connecting rod, wherein the connecting rod penetrates through the furnace gate; the connecting rod is fixedly connected with a graphite boat support rod; the graphite boat support rod comprises two carbonized silicon rods which are arranged in parallel; at least two metal support racks for supporting the graphite boat are arranged on the silicon carbide rods. According to the graphite boat pushing device, a structure that the two silicon carbide rods are clamped by the single connecting rod is adopted, the graphite boat is placed on the two silicon carbide rods, positioned by the graphite boat support racks and insulated by a ceramic plate; because the temperature of the two silicon carbide rods can be against more than 1,000 degrees, the deformation is reduced when a film is deposited in a PECVD reaction chamber; moreover, because of the structure that the two silicon carbide rods are clamped by the single rod, the device is simple in mechanical structure, low in cost, low in assembly difficulty and light in weight of integral cantilever and can prevent deformation quantity of the cantilever.

Description

A kind of graphite boat pusher for horizontal semiconductor equipment
Technical field
The invention belongs to horizontal semiconductor equipment technical field, more specifically, relate to a kind of graphite boat pusher for horizontal semiconductor equipment.
Background technology
In the process for making of silicon substrate solar cell, usually need to adopt thin film deposition processes to carry out the plated film of silicon chip, such as can adopt PECVD (Plasma Enhanced Chemical VapourDeposition, plasma reinforced chemical vapour deposition) depositing operation silicon chip is carried out to the vacuum plating of silicon nitride, make to form passivation layer at silicon chip surface.
Chemical vapor depsotition equipment is strengthened for four pipe horizontal plasmas, in high vacuum quartz cavity, utilize high-frequency electric field to excite, decomposition technique gas SiH4, NH3, at the formation of deposits Si3N4 film of sample surfaces, thus carrier mobility in raising silicon chip, there is the effect of body passivation, improve cell piece efficiency of conversion greatly; This horizontal semiconductor automation degree of equipment is high, can meet manufacture of solar cells line demand.
In solar cell manufacturing processed, when carrying out silicon chip surface plated film, uncoated silicon chip is inserted on the loader of PECVD vacuum coating film equipment, usual loader is realized by graphite boat, that is, the silicon chip without plated film is inserted graphite boat, then, the graphite boat being loaded with silicon chip is placed in PECVD vacuum coating film equipment cavity, adopts pecvd process to carry out plated film to silicon chip.After plated film terminates, in vacuum coating film equipment cavity, take out graphite boat, and then the silicon chip through plated film is unloaded from graphite boat take off.
In the horizontal PECVD of four pipes, graphite boat pusher is the key part of equipment, and it is the feeding drawing mechanism of equipment, is one of most important structure ensureing technique.Usually push in reaction chamber by graphite boat pusher by the graphite boat carrying non-plated film silicon chip, after plated film completes, the graphite boat carrying plated film silicon chip, by graphite boat pusher pull-out reaction chamber, carries out unloading piece operation.
And existing graphite boat pusher, usual use material is the supporting body of stainless metallic spatula as graphite boat, metallic spatula carries out thin-film deposition along with graphite boat enters reaction chamber jointly, after plated film completes, metallic spatula will carry the graphite boat pull-out reaction chamber of plated film silicon chip, carry out unloading piece operation.Because the deposition process temperature in reaction chamber is higher, heat for a long time for the metallic spatula supporting graphite boat in reaction chamber, metallic spatula is easy at high temperature be out of shape, and metallic spatula is heavier, and structure is more complicated, and difficulty of processing is large.For the problems referred to above, industry is needed badly provides a kind of graphite boat pusher for horizontal semiconductor equipment to solve the problem.
Summary of the invention
The object of the invention is for there is above-mentioned defect in prior art, providing a kind of for high temperature resistant in horizontal semiconductor equipment, preventing deformation and the simple graphite boat pusher of mechanical mechanism.
For solving the problem, the invention provides a kind of graphite boat pusher for horizontal semiconductor equipment, comprising fire door, also comprise the union lever through fire door; One end of described union lever is outside fire door, and for being connected with operating external device, the other end of described union lever stretches in the reaction chamber inside fire door, for being fixedly connected with graphite boat support bar; Wherein, described graphite boat support bar comprises two silicon carbide bars be set up in parallel, and described silicon carbide bar is provided with at least two in order to support the metal supporting frames of graphite boat; The medial extremity of described silicon carbide bar is fixedly connected with described union lever by the first stationary installation, and the outboard end of described silicon carbide bar is provided with the second stationary installation for fixing himself.
Preferably, the inside of described silicon carbide bar, is provided with along its axial direction due the stiffening web that some prevent deformation.
Preferably, above the outside surface of described metal supporting frames, be provided with insulcrete, insulate to make described graphite boat and described metal supporting frames.
Preferably, described first stationary installation is grip block, and described grip block has multiple through hole and fastening piece, and the diameter of described through hole adapts with the diameter of described union lever and silicon carbide bar respectively; Described second stationary installation is metal contiguous block, and described metal contiguous block has the through hole adapted with described silicon carbide shank diameter.
Preferably, the outboard end of described silicon carbide bar is provided with insulation covering, insulate to make described graphite boat and described silicon carbide bar.
Preferably, described insulation covering is Ceramic insulator.
Preferably, described fire door comprises fire door electrode, and described graphite boat comprises graphite boat electrode block, and be connected by electrode inlet device between described fire door electrode with described graphite boat electrode block, radio frequency is introduced described graphite boat by described electrode inlet device, to form electric field.
Preferably, described electrode inlet device comprises two electrode suppors be set up in parallel; One end of described electrode suppor is connected with described fire door electrode, and the other end of described electrode suppor is metal electrode contact, is connected with described graphite boat electrode block.
Preferably, described graphite boat electrode block has groove, described metal electrode contact is provided with the projection with described fit depressions.
As can be seen from technique scheme, graphite boat pusher for horizontal semiconductor equipment provided by the invention, single union lever is used to clamp the structure of the two bar of silicon carbide, graphite boat is made to be placed on two silicon carbide bars, rely on graphite boat bracing frame location, ceramic plate insulation, because the two bar heatproof of silicon carbide is spent more 1000, when PECVD reaction chamber carries out thin-film deposition, be out of shape very little; And single pole clamping silicon carbide double-rod structure, mechanical mechanism is simple, and cost is low, and assembly difficulty reduces, and the quality of overall cantilever is light, can prevent the deflection of cantilever.
Accompanying drawing explanation
By reference to the accompanying drawings, and by reference to detailed description below, will more easily there is more complete understanding to the present invention and more easily understand its adjoint advantage and feature, wherein:
Fig. 1 is the structural representation of a kind of graphite boat pusher for horizontal semiconductor equipment of the embodiment of the present invention.
[in figure Reference numeral]:
10, fire door; 20, union lever; 30, graphite boat support bar; 40, grip block; 50, metal contiguous block; 60, metal supporting frames; 70, insulcrete; 80, insulation covering; 90, fire door electrode; 100, electrode suppor; 110, metal electrode contact.
Embodiment
For making content of the present invention clearly understandable, below in conjunction with Figure of description, content of the present invention is described further.Certain the present invention is not limited to this specific embodiment, and the general replacement known by those skilled in the art is also encompassed in protection scope of the present invention.Secondly, the present invention's detailed statement that utilized schematic diagram to carry out, when describing example of the present invention in detail, for convenience of explanation, schematic diagram, should in this, as limitation of the invention not according to general ratio partial enlargement.
It should be noted that, in following embodiment, utilize the structural representation of Fig. 1 to carry out detailed statement to by a kind of graphite boat pusher for horizontal semiconductor equipment of the present invention.Describe in detail embodiments of the present invention time, for convenience of explanation, each schematic diagram not according to general scale and carried out partial enlargement and omit process, therefore, should avoid in this, as limitation of the invention.
Refer to Fig. 1, Fig. 1 is the structural representation of a kind of graphite boat pusher for horizontal semiconductor equipment of the embodiment of the present invention.The invention provides a kind of graphite boat pusher for horizontal semiconductor equipment, comprise fire door 10 and the union lever 20 through fire door 10; One end of union lever 20 is outside fire door 10, and for being connected with operating external device, the other end of union lever 20 stretches in the reaction chamber inside fire door 10, for being fixedly connected with graphite boat support bar 30, and union lever 10 preferable alloy list.Wherein, graphite boat support bar 30 is preferably two silicon carbide bars be set up in parallel, and silicon carbide bar is provided with at least two in order to support the metal supporting frames 60 of graphite boat (not shown); The medial extremity of silicon carbide bar 30 is fixedly connected with union lever 20 by the first stationary installation, and the outboard end of silicon carbide bar 30 is provided with the second stationary installation for fixing himself.
Wherein, the first stationary installation is grip block 40, and grip block 40 has multiple through hole and fastening piece, and the diameter of described through hole adapts with the diameter of union lever 20 and silicon carbide bar 30 respectively; Second stationary installation is metal contiguous block 50, and metal contiguous block 50 has the through hole adapted with silicon carbide bar 30 diameter.
In the present embodiment, the weight of the graphite boat that the diameter of silicon carbide bar 30 and the quantity of grip block will be accepted according to it and determining, if when graphite boat weight is large, can the diameter of corresponding increase silicon carbide bar 30, and the quantity of corresponding increase grip block 40, to improve the weight capacity of silicon carbide bar 30.
The present invention is by single pole clamping silicon carbide double-rod structure, and graphite boat is fallen on the two bar of silicon carbide, relies on graphite boat bracing frame location, owing to adopting silicon carbide double-rod structure, mechanical mechanism is simple, and cost is low, assembly difficulty reduces, and the quality of overall cantilever is light, can prevent the deflection of cantilever.
For preventing producing distortion when PECVD reaction chamber carries out thin-film deposition, the inside of silicon carbide bar 30 can be provided with along its axial direction due the stiffening web that some prevent deformation, and the material of stiffening web can be determined according to practical situation.
In the present embodiment, silicon carbide bar 30 is positioned at inside fire door 10, is in the environment carrying out thin film deposition in reaction chamber.In order to not conduct electricity with silicon carbide bar 30 when graphite boat is placed on and silicon carbide bar 30 carries out thin film deposition, on silicon carbide bar 30, for the position of placing graphite boat, two metal supporting frames 60 are set, to support graphite boat respectively.The two ends, outside of metal supporting frames 60 are provided with insulcrete 70, insulate to make graphite boat and metal supporting frames 60; Meanwhile, the outboard end of silicon carbide bar 30 is provided with insulation covering 80, insulate to make graphite boat and silicon carbide bar 30 or metal contiguous block 50.Insulcrete 70 in the present embodiment is or/and insulation covering 80 is preferably Ceramic insulator.
Use the cantilever fire door of the present embodiment, when graphite boat need carry out thin film deposition, only need be placed in the metal supporting frames 60 on silicon carbide bar 30, silicon carbide bar 30 carries out thin film deposition along with graphite boat enters reaction chamber jointly.
In the present embodiment, fire door 10 comprises fire door electrode 90, and graphite boat comprises graphite boat electrode block (not shown), is connected between fire door electrode 90 with graphite boat electrode block by electrode inlet device, radio frequency is introduced graphite boat by electrode inlet device, to form electric field.This electrode inlet device is connected with the electrode block of graphite boat with fire door electrode 90, and electric charge is introduced graphite boat by fire door 10 position.
Concrete, electrode inlet device comprises two electrode suppors be set up in parallel 100; One end of electrode suppor 100 is connected with fire door electrode 90, and the other end of electrode suppor 100 is metal electrode contact 110, is connected with graphite boat electrode block, the electric charge of fire door electrode 90 can be sent to graphite boat by metal electrode contact 110.For strengthening the effect that closely cooperates of graphite boat electrode block and metal electrode contact 110, graphite boat electrode block has groove, metal electrode contact 110 is provided with the projection with fit depressions, and this vibrational power flow can ensure that graphite boat electrode block contacts with the close fitting of metal electrode contact 110.
The electrode inlet device of the present embodiment, adopts joint form, rely on electrode suppor 100 by metal electrode contact 110 directly and fire door electrode 90 couple together.
In sum, graphite boat pusher for horizontal semiconductor equipment provided by the invention, single union lever is used to clamp the structure of the two bar of silicon carbide, graphite boat is made to be placed on two silicon carbide bars, rely on graphite boat bracing frame location, ceramic plate insulation, because the two bar heatproof of silicon carbide is spent more 1000, when PECVD reaction chamber carries out thin-film deposition, be out of shape very little; And single pole clamping silicon carbide double-rod structure, mechanical mechanism is simple, and cost is low, and assembly difficulty reduces, and the quality of overall cantilever is light, can prevent the deflection of cantilever.
In addition, it should be noted that, unless stated otherwise or point out, otherwise the term " first " in specification sheets, " second ", " the 3rd " etc. describe only for distinguishing each assembly, element, step etc. in specification sheets, instead of for representing logical relation between each assembly, element, step or ordinal relation etc.
Be understandable that, although the present invention with preferred embodiment disclose as above, but above-described embodiment and be not used to limit the present invention.For any those of ordinary skill in the art, do not departing under technical solution of the present invention ambit, the technology contents of above-mentioned announcement all can be utilized to make many possible variations and modification to technical solution of the present invention, or be revised as the Equivalent embodiments of equivalent variations.Therefore, every content not departing from technical solution of the present invention, according to technical spirit of the present invention to any simple modification made for any of the above embodiments, equivalent variations and modification, all still belongs in the scope of technical solution of the present invention protection.

Claims (9)

1. for a graphite boat pusher for horizontal semiconductor equipment, comprise fire door, it is characterized in that, also comprise the union lever through fire door; One end of described union lever is outside fire door, and for being connected with operating external device, the other end of described union lever stretches in the reaction chamber inside fire door, for being fixedly connected with graphite boat support bar;
Wherein, described graphite boat support bar comprises two silicon carbide bars be set up in parallel, and described silicon carbide bar is provided with at least two in order to support the metal supporting frames of graphite boat; The medial extremity of described silicon carbide bar is fixedly connected with described union lever by the first stationary installation, and the outboard end of described silicon carbide bar is provided with the second stationary installation for fixing himself.
2. the graphite boat pusher for horizontal semiconductor equipment according to claim 1, is characterized in that, the inside of described silicon carbide bar is provided with along its axial direction due the stiffening web that some prevent deformation.
3. the graphite boat pusher for horizontal semiconductor equipment according to claim 1, is characterized in that, be provided with insulcrete above the outside surface of described metal supporting frames, insulate to make described graphite boat and described metal supporting frames.
4. the graphite boat pusher for horizontal semiconductor equipment according to claim 1, it is characterized in that, described first stationary installation is grip block, described grip block has multiple through hole and fastening piece, and the diameter of described through hole adapts with the diameter of described union lever and silicon carbide bar respectively; Described second stationary installation is metal contiguous block, and described metal contiguous block has the through hole adapted with described silicon carbide shank diameter.
5. the graphite boat pusher for horizontal semiconductor equipment according to claim 1, is characterized in that, the outboard end of described silicon carbide bar is provided with insulation covering, insulate to make described graphite boat and described silicon carbide bar.
6. the graphite boat pusher for horizontal semiconductor equipment according to claim 5, is characterized in that, described insulation covering is Ceramic insulator.
7. the graphite boat pusher for horizontal semiconductor equipment according to claim 1, it is characterized in that, described fire door comprises fire door electrode, described graphite boat comprises graphite boat electrode block, be connected by electrode inlet device between described fire door electrode with described graphite boat electrode block, radio frequency is introduced described graphite boat by described electrode inlet device, to form electric field.
8. the graphite boat pusher for horizontal semiconductor equipment according to claim 7, is characterized in that, described electrode inlet device comprises two electrode suppors be set up in parallel; One end of described electrode suppor is connected with described fire door electrode, and the other end of described electrode suppor is metal electrode contact, is connected with described graphite boat electrode block.
9. the graphite boat pusher for horizontal semiconductor equipment according to claim 8, is characterized in that, described graphite boat electrode block has groove, and described metal electrode contact is provided with the projection with described fit depressions.
CN201510010029.2A 2015-01-08 2015-01-08 Graphite boat pushing device for horizontal semiconductor equipment Pending CN104561930A (en)

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Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106756892A (en) * 2016-11-16 2017-05-31 湖南红太阳光电科技有限公司 A kind of graphite boat boat pushing mechanism for PECVD device
CN107881488A (en) * 2017-12-15 2018-04-06 深圳市捷佳伟创新能源装备股份有限公司 Carry the delivery device of hermatic door and reacting furnace and encapsulating method with the mechanism
CN108456874A (en) * 2017-12-20 2018-08-28 湖南红太阳光电科技有限公司 A kind of Tubular PECVD device graphite boat electrode inlet device
CN109440085A (en) * 2018-12-21 2019-03-08 无锡华源晶电科技有限公司 A kind of high production capacity PECVD device of 10 pipes
CN109916181A (en) * 2017-12-13 2019-06-21 中国电子科技集团公司第四十八研究所 A kind of stove gate device for liquid phase epitaxy equipment
WO2019148520A1 (en) * 2018-02-02 2019-08-08 深圳丰盛装备股份有限公司 Tubular pecvd reaction chamber-mouth-door structure
CN110517974A (en) * 2019-07-30 2019-11-29 深圳市拉普拉斯能源技术有限公司 The new type processing equipment of semiconductor or photovoltaic material
CN110600398A (en) * 2019-07-30 2019-12-20 深圳市拉普拉斯能源技术有限公司 Processing equipment for semiconductor or photovoltaic material
CN111139460A (en) * 2019-12-27 2020-05-12 北京北方华创微电子装备有限公司 Radio frequency leading-in device and semiconductor processing equipment
CN111636058A (en) * 2020-05-22 2020-09-08 湖南红太阳光电科技有限公司 Tubular PECVD preheats system experimental apparatus
CN114807901A (en) * 2022-04-25 2022-07-29 青岛科技大学 Energy-saving and efficient PECVD (plasma enhanced chemical vapor deposition) reaction furnace tube device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102321877A (en) * 2011-09-05 2012-01-18 北京七星华创电子股份有限公司 Electrode introduction device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102321877A (en) * 2011-09-05 2012-01-18 北京七星华创电子股份有限公司 Electrode introduction device

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106756892A (en) * 2016-11-16 2017-05-31 湖南红太阳光电科技有限公司 A kind of graphite boat boat pushing mechanism for PECVD device
CN109916181A (en) * 2017-12-13 2019-06-21 中国电子科技集团公司第四十八研究所 A kind of stove gate device for liquid phase epitaxy equipment
CN107881488A (en) * 2017-12-15 2018-04-06 深圳市捷佳伟创新能源装备股份有限公司 Carry the delivery device of hermatic door and reacting furnace and encapsulating method with the mechanism
CN108456874B (en) * 2017-12-20 2020-04-03 湖南红太阳光电科技有限公司 Graphite boat electrode introducing device of tubular PECVD (plasma enhanced chemical vapor deposition) equipment
CN108456874A (en) * 2017-12-20 2018-08-28 湖南红太阳光电科技有限公司 A kind of Tubular PECVD device graphite boat electrode inlet device
WO2019148520A1 (en) * 2018-02-02 2019-08-08 深圳丰盛装备股份有限公司 Tubular pecvd reaction chamber-mouth-door structure
CN109440085A (en) * 2018-12-21 2019-03-08 无锡华源晶电科技有限公司 A kind of high production capacity PECVD device of 10 pipes
CN110517974A (en) * 2019-07-30 2019-11-29 深圳市拉普拉斯能源技术有限公司 The new type processing equipment of semiconductor or photovoltaic material
CN110600398A (en) * 2019-07-30 2019-12-20 深圳市拉普拉斯能源技术有限公司 Processing equipment for semiconductor or photovoltaic material
CN110517974B (en) * 2019-07-30 2020-12-08 深圳市拉普拉斯能源技术有限公司 Semiconductor processing equipment
CN111139460A (en) * 2019-12-27 2020-05-12 北京北方华创微电子装备有限公司 Radio frequency leading-in device and semiconductor processing equipment
CN111636058A (en) * 2020-05-22 2020-09-08 湖南红太阳光电科技有限公司 Tubular PECVD preheats system experimental apparatus
CN114807901A (en) * 2022-04-25 2022-07-29 青岛科技大学 Energy-saving and efficient PECVD (plasma enhanced chemical vapor deposition) reaction furnace tube device
CN114807901B (en) * 2022-04-25 2024-01-26 青岛科技大学 Energy-saving efficient PECVD reaction furnace tube device

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