CN206204412U - Coating for selective absorption of sunlight spectrum sputters volume to volume coating film production line upwards - Google Patents
Coating for selective absorption of sunlight spectrum sputters volume to volume coating film production line upwards Download PDFInfo
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- CN206204412U CN206204412U CN201621288343.3U CN201621288343U CN206204412U CN 206204412 U CN206204412 U CN 206204412U CN 201621288343 U CN201621288343 U CN 201621288343U CN 206204412 U CN206204412 U CN 206204412U
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- 238000000576 coating method Methods 0.000 title claims abstract description 74
- 239000011248 coating agent Substances 0.000 title claims abstract description 73
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 55
- 238000010521 absorption reaction Methods 0.000 title claims abstract description 19
- 238000001228 spectrum Methods 0.000 title claims abstract description 19
- 238000004544 sputter deposition Methods 0.000 claims abstract description 55
- 238000005477 sputtering target Methods 0.000 claims abstract description 15
- 238000001816 cooling Methods 0.000 claims abstract description 12
- 238000002955 isolation Methods 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 4
- 238000004140 cleaning Methods 0.000 claims description 3
- 238000010276 construction Methods 0.000 claims description 2
- 239000000463 material Substances 0.000 abstract description 8
- 230000007547 defect Effects 0.000 abstract description 4
- 230000006641 stabilisation Effects 0.000 abstract description 3
- 238000011105 stabilization Methods 0.000 abstract description 3
- 238000004062 sedimentation Methods 0.000 abstract description 2
- 238000000034 method Methods 0.000 description 13
- 230000008569 process Effects 0.000 description 8
- 238000001755 magnetron sputter deposition Methods 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 4
- 238000005086 pumping Methods 0.000 description 3
- 238000004804 winding Methods 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000012937 correction Methods 0.000 description 2
- 238000007665 sagging Methods 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 238000013475 authorization Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000009958 sewing Methods 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 230000017105 transposition Effects 0.000 description 1
Abstract
The utility model is related to a kind of coating for selective absorption of sunlight spectrum to sputter volume to volume coating film production line upwards, including vacuum chamber body, and vacuum system, inflation system and the electric-control system being connected with vacuum chamber body respectively, unwinding device, heated wash device, support roller device, sputtering unit, cooling device, deviation correcting device and wrap-up are placed with vacuum chamber body, the sputtering unit is provided with multiple, and gas isolating unit is provided between adjacent sputtering unit；The sputtering unit includes the magnetic controlled sputtering target being installed on below coiled material and the baffle plate being installed on above magnetic controlled sputtering target, and the band is located between magnetic controlled sputtering target and baffle plate.The utility model sputtering sedimentation coating from bottom to top, in band lower surface film forming, effectively prevent the generation coating defects such as fall to being resulted on coiled material pin hole because of side wall scaling, show money or valuables one carries unintentionally, coating quality is excellent, sputtering ambiance stabilization, reproducible, it is easy to control, production efficiency is high.
Description
Technical field
The utility model belongs to solar energy utilization technique field, is related to coating for selective absorption of sunlight spectrum to produce and sets
It is standby, specifically, it is related to a kind of coating for selective absorption of sunlight spectrum to sputter volume to volume coating film production line upwards, it is also possible to be used for
Solar cell etc. needs the magnetron sputtering plating field that flexible strip volume to volume plated film is produced.
Background technology
It is currently used for manufacturing solar energy heating plate core and is coated with the vacuum coating equipment of coating for selective absorption and is divided into single vacuum chamber
Coating machine and step-by-step movement coating film production line.Wherein, single vacuum chamber coating machine has simple structure, a cheap advantage, but due to
This coating machine uses the single cycle plated film mode of production, often completes a plated film production process and is accomplished by putting vacuum chamber
Gas and the circulate operation for vacuumizing, sputtering ambiance are difficult to repeat and stablize, and coating quality is difficult to ensure that, and efficiency is low；Its
Secondary, due to many productions of unit, status of equipment is difficult unanimously, while needing many people to be operated, easily causes performance difference, and need
Take excessive production site.In plated film production process, band needs to carry out plated film one by one step-by-step movement coating film production line
Production, the operating time between piece and piece, this interval time was used for vacuum lock room air and vacuum condition at intervals of a few minutes
Conversion, the production capacity of this production line is relatively low, and unit cost is larger, and carries out the magnetron sputtering unit of sputter coating and be arranged on band
Material top, is also easy to produce side wall scaling, the coating defects such as the skin that side wall falls down falls to being formed on base pin hole, shows money or valuables one carries unintentionally.
Authorization Notice No. discloses a kind of selective solar spectrum for the Chinese utility model patent of the U of CN 202090053
Absorber coatings volume to volume continuous coating production line, the production line include unwinding device, needle sewing device, press-roller device, heater,
Sputtering unit, pumping slit arrangement, support roller device, cooling device, the slit arrangement for isolating different film layer work atmospheres, correction are passed
Defeated device, diaphragm set composite and wrap-up；Above-mentioned various pieces are placed in vacuum chamber body；Vacuum chamber body also connects respectively
Connect vacuum system, inflation system and electric-control system.Utility model work between different film layers between slit isolation magnetron sputtering unit
Make atmosphere, each magnetron sputtering unit ambiance stabilization is reproducible, is easy to control, is adapted to volume to volume continuous coating and gives birth to automatically
Produce, production efficiency is high.But its sputtering unit is installed on the top of band, side wall scaling, the skin that side wall falls down equally are also easy to produce
Fall to being formed on base pin hole, the coating defects such as show money or valuables one carries unintentionally, and there is a problem of that coating quality is poor.
Utility model content
The above mentioned problems such as the coating quality difference that the utility model exists for prior art, there is provided a kind of coating quality is excellent
Coating for selective absorption of sunlight spectrum sputter volume to volume coating film production line upwards, the production line can improve product quality, carry
Uniformity high, enhances production capacities, and is easy to automatically continuously efficiently production.
In order to achieve the above object, the utility model sputters volume upwards there is provided a kind of coating for selective absorption of sunlight spectrum
To volume coating film production line, including vacuum chamber body, and vacuum system, inflation system and the automatically controlled system being connected with vacuum chamber body respectively
System, is placed with unwinding device, heated wash device, support roller device, sputtering unit, cooling device, deviation correcting device in vacuum chamber body
And wrap-up, the sputtering unit is provided with multiple, gas isolating unit is provided between adjacent sputtering unit；The sputtering unit
Including the magnetic controlled sputtering target being installed on below band and the baffle plate being installed on above magnetic controlled sputtering target, the band splashes positioned at magnetic control
Shoot at the target and baffle plate between.
Preferably, the sputtering unit also includes that be fixed on vacuum chamber body bottom surface at least one is scored by mass flow
The gas tube and the interference guard on vacuum chamber body sidewall of section control penetrate baffle plate.
Preferably, the gas isolating unit includes slit overhead gage, slit lower baffle plate and slit intermediate isolating plate, slit
Overhead gage, slit lower baffle plate and slit intermediate isolating plate composition isolation slit, that isolates slit is respectively provided on two sides with a molecular pump.
Further, the sputtering unit and atmosphere isolated location are mounted on cover plate.
Preferably, the heated wash device is including for the heating in vacuum roller heated to band and for band
The linear ion source for being cleaned.
Further, also it is placed with tenslator in the vacuum chamber body.
Preferably, tenslator is tonometry roller.
Preferably, the support roller device is multiple carrying rollers tactic successively.
Preferably, the vacuum chamber body is monolithic construction or split-type structural.
Preferably, when the vacuum chamber body is split-type structural, including for placing the first vacuum chamber body of unwinding device,
The second vacuum chamber body for placing heated wash device, it is gentle for placing tenslator, support roller device, sputtering unit
3rd vacuum chamber body of atmosphere isolated location, the 4th vacuum chamber body for placing cooling device and deviation correcting device, and for putting
Put the 5th vacuum chamber body of wrap-up.
Compared with prior art, the beneficial effects of the utility model are：
(1) the volume to volume coating film production line that the utility model is provided, in units of volume (be about several kms) production, whole work
Make process and do not destroy vacuum, repeatability, stability, uniformity and the quality for sputtering ambiance are easily guaranteed that production efficiency is high.
(2) the volume to volume coating film production line that the utility model is provided, the magnetic controlled sputtering target of sputtering unit is installed under band
Side, when being coated with coating to band, magnetic controlled sputtering target sputtering sedimentation coating from bottom to top, in band lower surface film forming, is effectively prevented
The generation coating defects such as fall to being resulted on band pin hole because of side wall scaling, show money or valuables one carries unintentionally is stopped, coating quality is excellent.
(3) the volume to volume coating film production line that the utility model is provided, with difference between gas isolating cell isolation sputtering unit
Work atmosphere between film layer, each sputtering unit ambiance stabilization is reproducible, is easy to control.
(4) the volume to volume coating film production line that the utility model is provided, after continuous coating technique, a production line production
Efficiency can be equivalent to more than ten, tens production scales of single-chamber vacuum coating machine, it is possible to reduce number of devices, save manpower, few
With factory building, investment reduction.
(5) the volume to volume coating film production line that the utility model is provided, integral layout is compact, save space.
Brief description of the drawings
Fig. 1 is the structural representation of the embodiment of the utility model one.
Fig. 2 is the structural representation of the embodiment sputtering unit of the utility model one and gas isolating unit.
Fig. 3 is the structural representation of another embodiment of the utility model.
In figure, 1, vacuum chamber body, the 101, first vacuum chamber body, the 102, second vacuum chamber body, the 103, the 3rd vacuum chamber body,
104th, the 4th vacuum chamber body, the 105, the 5th vacuum chamber body, 2, inflation system, 3, unwinding device, 4, heated wash device, 5, carrying roller
Device, 501, carrying roller, 6, sputtering unit, 601, magnetic controlled sputtering target, 602, baffle plate, 603, gas tube, 604, interference guard penetrate baffle plate, 7,
Cooling device, 8, deviation correcting device, 9, wrap-up, 10, gas isolating unit, 1001, slit overhead gage, 1002, slit lower block
Plate, 1003, slit middle baffle plate, 1004, molecular pump, 11, band, 12, cover plate, 13, tenslator.
Specific embodiment
Below, the utility model is specifically described by exemplary implementation method.It should be appreciated, however, that not having
In the case of being further discussed below, element, structure and features in an implementation method can also be advantageously incorporated into other implementations
In mode.
, it is necessary to explanation, the orientation of the instruction such as term " interior ", " on " " in ", D score in description of the present utility model
Or position relationship is, based on position relationship shown in the drawings, to be for only for ease of description the utility model and simplify description, without
Be indicate or imply meaning device or element must have specific orientation, with specific azimuth configuration and operation, therefore not
It is understood that to be to limitation of the present utility model.Additionally, term " first ", " second ", " the 3rd ", " the 4th ", " the 5th " are only used for
Description purpose, and it is not intended that indicating or implying relative importance.
Referring to Fig. 1, Fig. 2, the embodiment of the utility model one, there is provided a kind of coating for selective absorption of sunlight spectrum splashes upwards
Penetrate volume to volume coating film production line, including monoblock type vacuum chamber body 1, and vacuum system, the inflation being connected with vacuum chamber body 1 respectively
System 2 and electric-control system, be placed with vacuum chamber body 1 unwinding device 3, heated wash device 4, support roller device 5, sputtering unit 6,
Cooling device 7, deviation correcting device 8 and wrap-up 9, the sputtering unit 6 are provided with three, and gas is provided between adjacent sputtering unit 6
Atmosphere isolated location 10；The sputtering unit 6 includes being installed on the magnetic controlled sputtering target 601 of the lower section of band 11 and is installed on magnetron sputtering
The baffle plate 602 of the top of target 601, the band 11 is located between magnetic controlled sputtering target 601 and baffle plate 602.
Referring to Fig. 2, the sputtering unit also includes that two be fixed on vacuum chamber body bottom surface are segmented by mass flowmenter
The gas tube 603 and the interference guard on vacuum chamber body sidewall of control penetrate baffle plate 604.In plated film production, interference guard penetrates baffle plate
Underproof sputtering thing can be carried out necessary retention by 604.
In order to extract the gas in vacuum chamber body, and isolate two neighboring sputtering unit,
Referring to Fig. 2, the gas isolating unit 10 includes slit overhead gage 1001, slit lower baffle plate 1002 and slit intermediate isolating plate
1003, slit overhead gage 1001, slit lower baffle plate 1002 and slit intermediate isolating plate 1003 composition isolation slit, isolation slit
It is respectively provided on two sides with a molecular pump 1004.It is evacuated by 1004 pairs of isolation slit both sides of molecular pump.
Referring to Fig. 2, for the ease of the installation and maintenance of sputtering unit and atmosphere isolated location, the sputtering unit and atmosphere
Isolated location is mounted on cover plate 12.
The heated wash device 4 to band 11 including for the heating in vacuum roller heated to band 11 and for entering
The linear ion source of row cleaning.When carrying out plated film, heating in vacuum roller is heated to band, it is desirable to can be heated to more than 150 DEG C,
Linear ion source is cleaned to band.
In order to avoid band is too sagging, referring to Fig. 1, Fig. 2, the support roller device 5 is eight tactic supports successively
Roller 501, carrying roller 5 is positioned over the lower section of band 11, for holding band 11.
In order that band is steadily conveyed, in a certain preferred embodiment of the utility model, eight carrying rollers are uniformly distributed,
Interval between two neighboring carrying roller is identical.
Referring to Fig. 2, in another embodiment of the utility model, tenslator is also placed with the vacuum chamber body 1
13, the tension force for controlling band.
In a certain preferred embodiment of the utility model, the tenslator includes tonometry roller, by tension force
Roller is measured to measure strap tension.
Referring to Fig. 3, in the another embodiment of the utility model, the vacuum chamber body is split type making, the vacuum chamber
Body 1 includes the first vacuum chamber body 101 for placing unwinding device, the second vacuum chamber body for placing heated wash device
102, for placing tenslator, support roller device, sputtering unit and the 3rd vacuum chamber body 103 of atmosphere isolated location, use
In the 4th vacuum chamber body 104 for placing cooling device and deviation correcting device, and for placing the 5th vacuum chamber body of wrap-up
105。
In the utility model above-described embodiment, the magnetic controlled sputtering target 601 can be single rotating cathode, or double
Rotating cathode.
The workflow of the volume to volume coating film production line described in above-described embodiment is：
Destroy the vacuum of vacuum chamber body and amplify gas, hang out the empty let off roll bucket in portion in the first vacuum chamber body, hang in full
The let off roll bucket of volume；The new band one end that is put into is connected with original equipment middle part band；In the 5th vacuum chamber body, by what is plated
Band cuts off at winding, the band that taking-up has been plated；Load new core, start one section of band of Transmission system pre-roll and be fixed on winding
Device；Again close vacuum room cover, vacuum chamber body is vacuumized, heated wash device is warmed to the temperature of requirement, and will be to band
Material is cleaned, and cooling device is started working；Treat that above-mentioned work is completed, the forevacuum (high vacuum) of requirement is reached in vacuum chamber body
After state, process gas is filled with by technological requirement, and parameter opens each sputtering unit on request, be then turned on including unwinding device,
The Transmission systems such as tenslator, deviation correcting device and wrap-up, are continuously coated with required coating；A complete coiled strip to be plated
(need to retain a bit of in case being sewed up with next band and making to wind fixation in advance), stop transmission, heat, clean, cool down and sputter
Cell operation, and close process gas and be filled with, finally stop each vavuum pump pumping of vacuum system；Amplify gas destruction vacuum, open
Vacuum chamber body carries out next band and is coated with production repeating above-mentioned whole cyclic process.
Volume to volume coating film production line composition and abbreviated functional description are as follows in the utility model above-described embodiment：
Unwinding device：Unreeled for coordinating deviation correcting device to transmit.
Heated wash device：For heating and cleaning band, it is desirable to more than 150 DEG C can be heated to.
Tenslator：For measuring and control strap tension.
Support roller device：For holding band in case stop-band material is too sagging.
Sputtering unit：For being coated with required coating.
Gas isolating unit：For extracting gas and a buffer action in vacuum chamber body.
Cooling device：For cooling down the band overheated after coating film layer, to wind.
Deviation correcting device：Wandered off for placing band.
Wrap-up：For coordinating correction transposition transmission winding.
Vacuum chamber body：Vacuum cavity for accommodating above-mentioned each device, to ensure above-mentioned each device in required vacuum
Run under environment, vacuum chamber body can entirety or split production.
Vacuum system：It is made up of rough vacuum pump, intermediate pump, high-vacuum pump, for extracting the gas in vacuum chamber body out.
Inflation system：Be made up of valve, mass flowmenter (MFC) and pipe fitting etc., for sputtering unit provide needed for
Working gas.
Electric-control system：It is made up of various automatically controlled components, computer and control software, for being controlled to whole production line
System.
In order to meet requirement of the different sputtering units to different process atmosphere so that the quality of coating is easier to be adjusted
Control, in the utility model above-described embodiment, each position is equipped with identical or different vacuum pump group into vacuum system, to control respectively
Make each position to require the difference of vacuum, and one or more gas isolating units are configured between each sputtering unit and implement effective
Next door, the function of each sputtering unit can be controlled respectively.
In the present embodiment above-described embodiment, each sputtering unit is equipped with one or more and is segmented control by mass flowmenter
The gas tube of system, the process gas sectional zonal control being filled with, can realize the regulation and control to sputter coating uniformity.
In the utility model above-described embodiment, each band sputter coating process is not stopped continuously, so sputtering environment gas
The repeatability of atmosphere, stability, uniformity and coating quality are easily guaranteed that production efficiency is high.
In the utility model above-described embodiment, can be according to the characteristics of coating, the sputtering target material of each sputtering unit can be by
Different materials are constituted, such as aluminium, stainless steel, nickel, molybdenum, titanium, silicon etc., therefore can easily according to infrared external reflection, compound suction
Receipts, translucent, antireflection film layer are different to be required to determine that multiple combination is matched, with good flexibility；And it is adaptable to it
His application field.
Volume to volume coating film production line described in the utility model can also obtain vacuum chamber body using more, and each vacuum chamber body is again
Can there are multiple sputtering units or multiple gas isolating units (realizing pumping and isolating function)；Therefore, in the utility model,
(1) vacuum chamber body, sputtering unit quantity can determine according to the technological requirement of splash coating is needed；(2) it is different by technique, each sputtering
Unit can use different materials target, to meet demand of the different membrane systems to film material；(3) each gas isolating unit also may be used
To configure different type, the vacuum pump group of model into vacuum system on demand, to meet optimised process requirement；(4) this practicality is new
Volume to volume coating film production line described in type can also be used for the similar other application field for needing flexible strip volume to volume plated film to produce, such as soft
Property solar cell manufacture field.
Above-described embodiment is used for explaining the utility model, is limited rather than to the utility model, in the utility model
Spirit and scope of the claims in, any modifications and changes made to the utility model, both fall within this practicality newly
The protection domain of type.
Claims (10)
1. a kind of coating for selective absorption of sunlight spectrum sputters volume to volume coating film production line, including vacuum chamber body, Yi Jifen upwards
Vacuum system, inflation system and the electric-control system not being connected with vacuum chamber body, it is characterised in that be placed with vacuum chamber body and unreeled
Device, heated wash device, support roller device, sputtering unit, cooling device, deviation correcting device and wrap-up, the sputtering unit
Multiple is provided with, gas isolating unit is provided between adjacent sputtering unit；The sputtering unit includes being installed on the magnetic below band
Control sputtering target and the baffle plate being installed on above magnetic controlled sputtering target, the band are located between magnetic controlled sputtering target and baffle plate.
2. coating for selective absorption of sunlight spectrum as claimed in claim 1 sputters volume to volume coating film production line upwards, its feature
It is that the sputtering unit also includes at least one filling by mass flowmenter Discrete control being fixed on vacuum chamber body bottom surface
Tracheae and the interference guard on vacuum chamber body sidewall penetrate baffle plate.
3. coating for selective absorption of sunlight spectrum as claimed in claim 1 or 2 sputters volume to volume coating film production line upwards, and it is special
Levy and be, the gas isolating unit include slit overhead gage, slit lower baffle plate and slit intermediate isolating plate, slit overhead gage,
Slit lower baffle plate and slit intermediate isolating plate composition isolation slit, that isolates slit is respectively provided on two sides with a molecular pump.
4. coating for selective absorption of sunlight spectrum as claimed in claim 3 sputters volume to volume coating film production line upwards, its feature
It is that the sputtering unit and atmosphere isolated location are mounted on cover plate.
5. coating for selective absorption of sunlight spectrum as claimed in claim 4 sputters volume to volume coating film production line upwards, its feature
It is that the heated wash device is included for the heating in vacuum roller that is heated to band and for being cleaned to band
Linear ion source.
6. the coating for selective absorption of sunlight spectrum as described in claim 1 or 5 sputters volume to volume coating film production line upwards, and it is special
Levy and be, tenslator is also placed with the vacuum chamber body.
7. coating for selective absorption of sunlight spectrum as claimed in claim 6 sputters volume to volume coating film production line upwards, its feature
It is that tenslator is tonometry roller.
8. the coating for selective absorption of sunlight spectrum as described in claim 1 or 7 sputters volume to volume coating film production line upwards, and it is special
Levy and be, the support roller device is multiple carrying rollers tactic successively.
9. coating for selective absorption of sunlight spectrum as claimed in claim 8 sputters volume to volume coating film production line upwards, its feature
It is that the vacuum chamber body is monolithic construction or split-type structural.
10. coating for selective absorption of sunlight spectrum as claimed in claim 9 sputters volume to volume coating film production line upwards, its feature
It is when the vacuum chamber body is split-type structural, including for placing the first vacuum chamber body of unwinding device, to add for placing
Second vacuum chamber body of thermal cleaning device, for placing tenslator, support roller device, sputtering unit and atmosphere isolated location
The 3rd vacuum chamber body, the 4th vacuum chamber body for placing cooling device and deviation correcting device, and for placing wrap-up
The 5th vacuum chamber body.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621288343.3U CN206204412U (en) | 2016-11-25 | 2016-11-25 | Coating for selective absorption of sunlight spectrum sputters volume to volume coating film production line upwards |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621288343.3U CN206204412U (en) | 2016-11-25 | 2016-11-25 | Coating for selective absorption of sunlight spectrum sputters volume to volume coating film production line upwards |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN206204412U true CN206204412U (en) | 2017-05-31 |
Family
ID=58747760
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201621288343.3U Active CN206204412U (en) | 2016-11-25 | 2016-11-25 | Coating for selective absorption of sunlight spectrum sputters volume to volume coating film production line upwards |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN206204412U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110453189A (en) * | 2019-09-18 | 2019-11-15 | 上海超导科技股份有限公司 | Continuous apparatus based on technology growth REBCO superconducting film of offing normal |
| CN111519161A (en) * | 2019-09-29 | 2020-08-11 | 江苏微导纳米科技股份有限公司 | Vacuum coating process chamber and vacuum suspension coating machine with same |
-
2016
- 2016-11-25 CN CN201621288343.3U patent/CN206204412U/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110453189A (en) * | 2019-09-18 | 2019-11-15 | 上海超导科技股份有限公司 | Continuous apparatus based on technology growth REBCO superconducting film of offing normal |
| CN110453189B (en) * | 2019-09-18 | 2021-07-13 | 上海超导科技股份有限公司 | Continuous device for growing REBCO superconducting film based on dislocation technology |
| CN111519161A (en) * | 2019-09-29 | 2020-08-11 | 江苏微导纳米科技股份有限公司 | Vacuum coating process chamber and vacuum suspension coating machine with same |
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