CN113719704B - Large-stroke two-dimensional nano positioning platform - Google Patents
Large-stroke two-dimensional nano positioning platform Download PDFInfo
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- CN113719704B CN113719704B CN202110913075.9A CN202110913075A CN113719704B CN 113719704 B CN113719704 B CN 113719704B CN 202110913075 A CN202110913075 A CN 202110913075A CN 113719704 B CN113719704 B CN 113719704B
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16M—FRAMES, CASINGS OR BEDS OF ENGINES, MACHINES OR APPARATUS, NOT SPECIFIC TO ENGINES, MACHINES OR APPARATUS PROVIDED FOR ELSEWHERE; STANDS; SUPPORTS
- F16M11/00—Stands or trestles as supports for apparatus or articles placed thereon Stands for scientific apparatus such as gravitational force meters
- F16M11/02—Heads
- F16M11/04—Means for attachment of apparatus; Means allowing adjustment of the apparatus relatively to the stand
- F16M11/043—Allowing translations
- F16M11/045—Allowing translations adapted to left-right translation movement
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
- F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
- F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
- F16F15/04—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using elastic means
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16M—FRAMES, CASINGS OR BEDS OF ENGINES, MACHINES OR APPARATUS, NOT SPECIFIC TO ENGINES, MACHINES OR APPARATUS PROVIDED FOR ELSEWHERE; STANDS; SUPPORTS
- F16M11/00—Stands or trestles as supports for apparatus or articles placed thereon Stands for scientific apparatus such as gravitational force meters
- F16M11/02—Heads
- F16M11/04—Means for attachment of apparatus; Means allowing adjustment of the apparatus relatively to the stand
- F16M11/043—Allowing translations
- F16M11/048—Allowing translations adapted to forward-backward translation movement
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16M—FRAMES, CASINGS OR BEDS OF ENGINES, MACHINES OR APPARATUS, NOT SPECIFIC TO ENGINES, MACHINES OR APPARATUS PROVIDED FOR ELSEWHERE; STANDS; SUPPORTS
- F16M11/00—Stands or trestles as supports for apparatus or articles placed thereon Stands for scientific apparatus such as gravitational force meters
- F16M11/02—Heads
- F16M11/18—Heads with mechanism for moving the apparatus relatively to the stand
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16M—FRAMES, CASINGS OR BEDS OF ENGINES, MACHINES OR APPARATUS, NOT SPECIFIC TO ENGINES, MACHINES OR APPARATUS PROVIDED FOR ELSEWHERE; STANDS; SUPPORTS
- F16M11/00—Stands or trestles as supports for apparatus or articles placed thereon Stands for scientific apparatus such as gravitational force meters
- F16M11/20—Undercarriages with or without wheels
- F16M11/22—Undercarriages with or without wheels with approximately constant height, e.g. with constant length of column or of legs
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
- G01Q60/24—AFM [Atomic Force Microscopy] or apparatus therefor, e.g. AFM probes
Abstract
The invention discloses a large-stroke two-dimensional nano positioning platform, which is characterized in that a plurality of rectangular lever amplifying units with the same structure are arranged in a centrosymmetric mode relative to a motion platform, a two-stage motion displacement amplifying unit is adopted, a rectangular amplifying lever is taken as a primary structure to amplify XY-direction displacement, a sawtooth lever amplifying unit is taken as a secondary structure to secondarily amplify internal deformation of the rectangular lever amplifying unit, and micro deformation of a flexible hinge is utilized to transmit displacement and complete decoupling, so that the positioning accuracy of the motion platform is greatly improved; compared with the traditional lever amplification unit, the platform has a larger amplification ratio, is high-speed and accurate in positioning, has a large action stroke, can complete the precise tracking task of a two-dimensional plane track, and can be used for designing a large-stroke image-grade atomic force microscope.
Description
Technical Field
The invention belongs to the field of precision positioning, and particularly relates to a large-stroke two-dimensional nanometer positioning platform.
Background
In recent years, the demand of high-end and precise instruments independently researched and developed in the fields of biomedical engineering, semiconductors, nano functional materials, chip manufacturing and the like is increasingly urgent in China. High-speed and high-precision measuring instruments represented by Atomic Force Microscopes (AFM) are an important part in high-end precision manufacturing, and the precision and the performance of the high-precision instruments depend on the precision and the performance of a nano positioning platform behind the high-precision instruments to a great extent, so that the research on the high-precision nano positioning platform is of great significance to the research and development of the high-precision measuring instruments.
Nowadays, with the development of biomedical technology, the requirement of people for the scanning result of nanometer images is changed from static photos to dynamic images. To meet such a demand, it is necessary for the AFM to have high resolution and high scanning speed, and the scanning speed of the conventional commercial AFM has not been satisfactory. The AFM has a large enough stroke, and the traditional large-stroke nanometer positioning platform has low positioning speed and large XY coupling effect, so that the realization of an image-grade atomic force microscope cannot be supported. Based on the defects of the prior art, the development of a novel mechanical structure and a control method and a nano positioning system which has high speed, high precision, large stroke and easy decoupling has important theoretical significance and engineering practice value.
Disclosure of Invention
Aiming at the defects or improvement requirements of the prior art, the invention provides a large-stroke two-dimensional nano positioning platform, so that the technical problems of low positioning speed and large XY coupling action of the traditional large-stroke nano positioning platform are solved.
To achieve the above objects, according to one aspect of the present invention, there is provided a large-stroke two-dimensional nano positioning platform, comprising: the device comprises a base, a motion platform arranged at the center of the base, four driver grooves which have the same structure and are arranged on the base in a central symmetry mode relative to the motion platform, a rectangular lever amplification unit and a sawtooth lever amplification unit;
the rectangular lever amplifying unit comprises two connecting hinges and four buffering hinges; the two connecting hinges are a group of opposite sides of a rectangle, the four buffering hinges are hinged in pairs to form two buffering hinge groups which serve as the other pair of opposite sides of the rectangle, one buffering hinge group is sequentially connected with the driver groove and the motion platform, and the other buffering hinge group is connected with the base;
the sawtooth lever amplification unit comprises two support arms, and the two support arms are respectively connected with one of the two adjacent rectangular lever amplification units through a connecting hinge; each support arm comprises a plurality of buffer hinges which are connected in sequence and are vertical to each other in pairs.
Preferably, the included angle between one of the buffer hinge groups and the driver slot is 90 ° ± 10 °; the included angle between the buffering hinge group and the connecting hinge is 90 degrees +/-10 degrees.
Preferably, the two connecting hinges have the same length, the four buffering hinges have the same length, and the buffering hinges of the sawtooth lever amplifying unit have different lengths;
and the lengths of the four buffering hinges are greater than the lengths of the two connecting hinges, and the lengths of the two connecting hinges are greater than the lengths of the buffering hinges of the sawtooth lever amplifying unit.
Preferably, the two connecting hinges have the same width, the four buffering hinges have the same width, and the buffering hinges of the saw-tooth lever amplifying unit have the same width;
and the widths of the two connecting hinges are greater than the widths of the four buffering hinges, and the widths of the four buffering hinges are greater than the widths of the buffering hinges of the sawtooth lever amplifying unit.
Preferably, the large-stroke two-dimensional nanometer positioning platform further comprises four S-shaped spring decoupling units which are identical in structure and are arranged on the base in a centrosymmetric mode relative to the moving platform, and each S-shaped spring decoupling unit comprises a plurality of sequentially connected buffer hinges which are perpendicular to each other in pairs; one end of the S-shaped spring decoupling unit is connected with the moving platform.
Preferably, the length of the head and tail buffer hinges of the S-shaped spring decoupling unit is the same, the S-shaped spring decoupling unit is respectively connected with the motion platform and the base, and the included angles between the S-shaped spring decoupling unit and the XY axes are both 45 degrees.
Preferably, the lengths of the buffer hinges in the S-shaped spring decoupling unit except for the first and the last two buffer hinges are different, and the length of the buffer hinge in the same direction as the first and the last two buffer hinges is smaller than the length of the buffer hinge in the direction perpendicular to the first and the last two buffer hinges.
Preferably, the width of the buffering hinge of the S-shaped spring decoupling unit is the same as that of the buffering hinge of the saw-tooth lever amplifying unit.
Preferably, the connection between the buffer hinge of the sawtooth lever amplification unit and the buffer hinge of the S-shaped spring decoupling unit is subjected to rounding treatment through a rounding off angle.
Preferably, the base is provided with a plurality of screw holes which are respectively used for fixing a connecting hinge of the rectangular lever amplifying unit and reinforcing the sawtooth lever amplifying unit and the S-shaped spring decoupling unit.
In general, compared with the prior art, the above technical solution contemplated by the present invention can achieve the following beneficial effects:
1. the large-stroke two-dimensional nanometer positioning platform provided by the invention adopts a mode of central symmetry about a motion platform to arrange a plurality of rectangular lever amplification unit sawtooth lever amplification units with the same structure, adopts two-stage motion displacement amplification units, takes a rectangular amplification lever as a primary structure, amplifies displacement in XY directions, takes the sawtooth lever amplification unit as a secondary structure, secondarily amplifies internal deformation of the rectangular lever amplification units, transmits the displacement and completes decoupling by utilizing micro deformation of a flexible hinge, and greatly improves the positioning accuracy of the motion platform; compared with the traditional lever amplification unit, the platform has a larger amplification ratio, is high-speed and accurate in positioning, has a large action stroke, can complete the precise tracking task of a two-dimensional plane track, and can be used for designing a large-stroke image-grade atomic force microscope.
2. The large-stroke two-dimensional nanometer positioning platform provided by the invention adopts symmetrically designed rectangular lever amplification units, and controls different primary amplification ratios by designing different lengths and widths of the buffering hinge and the connecting hinge; the flexibility of the whole platform can be improved by the structural design of the buffer type lever, and the rapid positioning can be realized more easily; the sawtooth lever amplifying unit adopting the double sawtooth arm design has the same gain as the rectangular amplifying lever, and can reduce the XY coupling influence of the rectangular primary amplifying lever.
3. According to the large-stroke two-dimensional nano positioning platform, the S-shaped spring decoupling unit is adopted, cross coupling of the moving platform in the XY two directions can be effectively eliminated, and the spring type flexible design can increase decoupling efficiency and improve platform flexibility compared with a traditional cross decoupling unit; the whole nanometer positioning platform adopts the structural design of flexible parallel connection and central symmetry, and has a plurality of buffer type and spring type design structures, so that the flexibility of the whole platform is ensured, the internal elements of the device are uniformly stressed, the protection effect is achieved, and the service life of the whole device is prolonged.
4. According to the large-stroke two-dimensional nanometer positioning platform provided by the invention, the rectangular lever amplification unit carries out primary amplification movement displacement, and the sawtooth amplification unit connected with the rectangular lever amplification unit assists the S-shaped spring decoupling unit to reduce XY coupling influence while secondarily amplifying the displacement. The whole positioning platform is designed to be a compliant structure, a lever and spring type design structure is adopted through a plurality of symmetrical flexible hinges, displacement is amplified through small deformation, XY decoupling is completed, high rigidity and high natural frequency of the whole device structure are guaranteed, and high positioning speed can be guaranteed while the stroke of the nanometer positioning platform is greatly improved.
5. The large-stroke two-dimensional nano positioning platform provided by the invention can simultaneously meet the requirements that the natural frequency is more than 2kHz, the maximum displacement in each direction reaches 100um, and the XY coupling error is less than 1%. The scanning platform can be used as a scanning application platform of an atomic force microscope, the requirement of large-stroke measurement is met under the condition of keeping higher scanning frequency, and the grid scanning frequency on the platform can reach more than 200 Hz.
6. The large-stroke two-dimensional nanometer positioning platform provided by the invention adopts a multi-direction and multi-position screw hole fixing mode, the reliability of connection between the platform base body and a design structure is ensured, and the reinforcing screw hole design at the lever structure, the decoupling unit and the platform base body can effectively ensure the synergistic effect brought by micro deformation in the structure.
Drawings
FIG. 1 is a schematic view of a three-dimensional structure of a large-stroke two-dimensional nano-positioning platform provided by the present invention;
FIG. 2 is a top view of a large-stroke two-dimensional nanopositioning platform provided in accordance with the present invention;
FIG. 3 is a partial view of a middle rectangular lever amplifying unit of the large-stroke two-dimensional nano positioning platform provided by the present invention;
FIG. 4 is a partial view of a middle sawtooth lever amplifying unit of the large-stroke two-dimensional nano positioning platform provided by the present invention;
FIG. 5 is a partial view of an S-shaped spring decoupling unit in the large-stroke two-dimensional nano positioning platform provided by the invention.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is described in further detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention. In addition, the technical features involved in the respective embodiments of the present invention described below may be combined with each other as long as they do not conflict with each other.
The embodiment of the invention provides a large-stroke two-dimensional nanometer positioning platform, as shown in fig. 1, comprising: the device comprises a base 2, a motion platform 1 arranged at the center of the base, four driver grooves 5 which have the same structure and are arranged on the base in a central symmetry mode relative to the motion platform, a rectangular lever amplification unit 6 and a sawtooth lever amplification unit 8;
the rectangular lever amplifying unit comprises two connecting hinges and four buffering hinges; the two connecting hinges are a group of opposite sides of the rectangle, the four buffering hinges are mutually hinged in pairs to form two buffering hinge groups which are used as the other group of opposite sides of the rectangle, one buffering hinge group is sequentially connected with the driving groove and the motion platform, and the other buffering hinge group is connected with the base;
the sawtooth lever amplification unit comprises two support arms, and the two support arms are respectively connected with one of the two adjacent rectangular lever amplification units through a connecting hinge; each support arm comprises a plurality of buffer hinges which are connected in sequence and are vertical to each other in pairs.
Specifically, the base 2 is a platform base body, the motion platform 1 is arranged at the center of the upper surface of the platform base body, and the motion platform 1 is fixed on the platform base body in the vertical direction; in the horizontal direction, the motion platform 1 performs two-dimensional displacement motion on the surface of the platform base body under the action of the driving signal.
The side of the motion platform 1 is provided with four measuring surfaces, and the measuring surfaces are used for measuring the displacement data of the motion platform 1. The measuring surface and the motion platform are equivalent to a whole, the laser sensor is used for detecting laser signals reflected by the measuring surface to obtain the displacement change of the motion platform, and an auxiliary device can be added to measure the displacement change by using the capacitive sensor. Namely, four side surfaces of the motion platform are laser reflecting surfaces which are used for being matched with a laser interferometer to measure the motion displacement.
In the XY axis direction, the motion platform is connected with the platform base body through a piezoelectric ceramic driving device and a rectangular lever amplification unit; in the XY middle direction, one end of the sawtooth lever amplifying unit and one end of the S-shaped XY spring decoupling unit are respectively connected with the rectangular lever amplifying unit and the moving platform, and the other ends of the sawtooth lever amplifying unit and the S-shaped XY spring decoupling unit are fixed on the platform base body. The piezoelectric driving devices in the four directions of the XY axis are completely the same and are placed in four driver grooves. The four rectangular lever amplifying units have the same structure and are distributed on the platform base body in central symmetry with respect to the motion platform; the sawtooth lever amplifying units in the XY four middle directions have the same structure and are in central symmetry distribution relative to the motion platform, and the sawtooth lever amplifying units are used for reducing XY direction coupling and avoiding deformation of the platform due to uneven stress.
Drive arrangement is connected with motion platform 1 and rectangle lever amplification unit 6 respectively, and drive arrangement is equipped with: the four-direction driving device slot 5 and the four-direction driving hinge 4 are correspondingly connected in sequence. The driving grooves 5 and the driving hinges 4 are distributed in central symmetry relative to the moving platform 1 and are positioned in four directions of XY coordinate axes, and the four driving grooves 5 are distributed in the middle direction among the four coordinate axes. Four driver grooves are embedded in the platform base body, are positioned in four XY directions and are connected with the motion platform, and piezoelectric ceramics are arranged in the driver grooves and are used for driving the two-dimensional motion of the XY motion platform. One end of the rectangular lever amplifying unit 6 is connected with the driver slot 5, and the other end is connected with the platform base body through a fixed hinge 7; one end of each sawtooth lever amplification unit 8 is fixed on the platform base body, the other end of each sawtooth lever amplification unit 8 is connected with a connecting hinge in the rectangular lever amplification unit 6, and the four sawtooth lever amplification units 8 are centrally and symmetrically distributed on the motion platform 1 and are positioned in the four XY middle directions.
The fixed hinges 7 comprise X-axis positive fixed hinges 7-1, Y-axis positive fixed hinges 7-2, X-axis negative fixed hinges 7-3 and Y-axis negative fixed hinges 7-4.
As shown in fig. 2-3, one end of a Y-axis forward driver slot 5-2 is vertically connected with a measuring surface of the moving platform 1 through a Y-axis forward driving hinge 4-2, the other end thereof is connected with a Y-axis forward buffer slot 6-2, the Y-axis forward buffer slot 6-2 is connected with the platform base body through a Y-axis forward fixing hinge 7-2, one end of a support arm C8-2-1 of the second quadrant sawtooth lever amplification unit is connected with a first connection hinge 6-2-3 of the Y-axis forward rectangular lever amplification unit, the other end thereof is connected with the platform base body, one end of a second quadrant S-shaped spring decoupling unit 9-2 is connected with one corner of the moving platform 1, and the other end thereof is connected with the platform base body. In this embodiment, the connection and arrangement of the buffer devices in other directions are the same.
As shown in fig. 2, the driver slot 5 is disposed on the platform base, and includes: an X-axis positive driver groove 5-1, a Y-axis positive driver groove 5-2, an X-axis negative driver groove 5-3 and a Y-axis negative driver groove 5-4; at least one driver is arranged in the driver groove 5, and the driver generates a driving signal to drive the motion platform connected with the transmission branched chain to move. Taking the X-axis forward rectangular lever amplification unit 5-2 as an example, one end is connected to the X-axis forward driving hinge 4-2, the other end is connected to the third buffer hinge 6-2-4 and the fourth buffer hinge 6-2-5 of the X-axis forward rectangular lever amplification unit, and the connection manner of the other three-directional driver slots 5 is similar.
As shown in fig. 2, the four-directional driving hinges are respectively connected to the four-directional driver slots 5 in a one-to-one correspondence manner, and each driving hinge is used for transmitting a driving signal corresponding to the corresponding direction. The four driving hinges comprise an X-axis positive driving hinge 4-1, a Y-axis positive driving hinge 4-2, an X-axis negative driving hinge 4-3 and a Y-axis negative driving hinge 4-4; taking an X-axis forward driving hinge 4-1 as an example, one end of the X-axis forward driving hinge is connected with an X-axis forward driving groove 5-1, and the other end of the X-axis forward driving hinge is connected with a motion platform 1; the driving hinges 4 in the other three directions are connected in a similar manner.
And one end of the rectangular lever amplifying unit is connected with the driver groove, and the other end of the rectangular lever amplifying unit is fixed on the platform base through a fixed hinge. The rectangular lever amplifying unit is composed of four identical buffering hinges and two identical connecting hinges to form a rectangular structure, and the four buffering hinges and the two connecting hinges form a rectangular groove together. Every two buffer hinges are directly connected to form two buffer hinge groups, the middle connection parts of the hinge groups are respectively connected with a driving device and the platform base body, the two connection hinges connect the two hinge groups together to form the whole rectangular lever amplification unit, and the upper ends of the connection hinges are provided with screw holes for compressing through screws to ensure that the rectangular lever amplification unit is integrally fixed.
The rectangular lever amplifying unit is completely symmetrical about an X axis or a Y axis, the buffering hinges in the buffering hinge group are symmetrical in pairs about the X axis or the Y axis, and the connecting hinges are symmetrical in pairs about the X axis or the Y axis.
As shown in fig. 2, four-directional rectangular lever amplification units are respectively connected with four-directional actuator slots in a one-to-one correspondence manner, and the rectangular lever amplification unit 6 is used for amplifying the movement displacement of the actuator and increasing the stroke in the direction. The four rectangular lever amplification units comprise an X-axis positive rectangular lever amplification unit 6-1, a Y-axis positive rectangular lever amplification unit groove 6-2, an X-axis negative rectangular lever amplification unit 6-3 and a Y-axis negative rectangular lever amplification unit 6-4. As shown in FIG. 3, each rectangular lever amplifying unit is composed of four buffering hinges and two connecting hinges, taking the Y-axis forward rectangular lever amplifying unit as an example, the four buffering hinges are respectively a first buffering hinge 6-2-1, a second buffering hinge 6-2-2, a third buffering hinge 6-2-4 and a fourth buffering hinge 6-2-5, and the two connecting hinges are respectively a first connecting hinge 6-2-3 and a second connecting hinge 6-2-6, wherein the four buffering hinges keep an included angle close to 90 degrees with the driver slot in the horizontal direction, and the four buffering hinges displace along with the movement of the moving platform to play an amplifying role, and the included angle with the driver slot also changes constantly, but because the displacement of the moving platform itself is very small, the change of the included angle is very small, not visible to the naked eye. A third buffer hinge 6-2-4 and a fourth buffer hinge 6-2-5 in the rectangular lever amplifying unit are simultaneously connected with the driving groove 5-2, one end of a first connecting hinge 6-2-3 and one end of a second connecting hinge 6-2-6 are respectively connected with the third buffer hinge 6-2-4 and the fourth buffer hinge 6-2-5, the other end of the first connecting hinge 6-2-3 and the other end of the second connecting hinge 6-2-6 are respectively connected with the first buffer hinge 6-2-1, and the other ends of the two buffer hinges are simultaneously connected with the fixed hinge 7-2.
According to the large-stroke two-dimensional nanometer positioning platform provided by the invention, the large stroke of the nanometer positioning platform is realized through the multiple different types of multi-stage lever amplification units, the high speed and the accuracy of the nanometer positioning platform are ensured through the flexible spring type design, and the flexible decoupling unit is designed to effectively reduce the coupling influence among XY.
Further, the included angle between one of the buffer hinge groups and the driver groove is 90 degrees +/-10 degrees; the included angle between the buffering hinge group and the connecting hinge is 90 degrees +/-10 degrees.
Furthermore, the two connecting hinges have the same length, the four buffering hinges have the same length, and the buffering hinges of the sawtooth lever amplifying unit have different lengths;
and the lengths of the four buffering hinges are greater than the lengths of the two connecting hinges, and the lengths of the two connecting hinges are greater than the lengths of the buffering hinges of the sawtooth lever amplifying unit.
Specifically, the four buffering hinges have the same length, the two connecting hinges have the same length, and the length of the buffering hinges is obviously larger than that of the connecting hinges, so that the displacement is amplified.
Furthermore, the two connecting hinges have the same width, the four buffering hinges have the same width, and the buffering hinges of the sawtooth lever amplifying unit have the same width;
and the widths of the two connecting hinges are greater than the widths of the four buffering hinges, and the widths of the four buffering hinges are greater than the widths of the buffering hinges of the sawtooth lever amplifying unit.
Specifically, the widths of the four buffering hinges are the same, the widths of the two connecting hinges are the same, the widths of the connecting hinges are obviously larger than those of the buffering hinges, and the width ratio of the two hinges depends on the design stroke of the positioning platform.
Furthermore, in the rectangular lever amplification unit, the included angle between the buffering hinge and the piezoelectric driving device is about 90 degrees, the included angle between the buffering hinge and the connecting hinge is about 90 degrees, and after the driving device generates displacement in the X or Y direction, the included angle can slightly change but cannot exceed 10 degrees.
The included angles between the buffer hinge and the fixed hinge, between the buffer hinge and the driver groove, between the buffer hinge and the connecting hinge are all approximate to 90 degrees, and the error range is +/-10 degrees; the four buffering hinges are the same in length and width, the two connecting hinges are the same in length and width, and the buffering hinges are longer than the connecting hinges and shorter than the connecting hinges in width integrally.
Preferably, the width of each of the four buffering hinges is 1.4mm, and the length of each buffering hinge is 16 mm; the width of each connecting hinge is 3.5mm, and the length of each connecting hinge is 9.2 mm. The other three rectangular lever amplifying units and the internal structure are the same.
As shown in fig. 2, the sawtooth lever amplification units 8 in four diagonal directions are respectively connected with the connection hinges in the rectangular lever amplification units 6 in each direction, when the driver slot 5 drives the motion platform 1 to move, the rectangular lever amplification units serve as primary displacement amplification units of the platform and deform along with the movement of the driver slot, so that the connection hinges in the rectangular lever amplification units also move, and the sawtooth lever amplification units connected with the connection hinges serve as secondary displacement amplification structures to amplify the movement displacement of the connection hinges and simultaneously eliminate the coupling effect of the rectangular lever amplification units in the XY axis direction.
The sawtooth lever amplification unit is positioned in the four XY middle directions and consists of two sawtooth arms which are symmetrical about the XY center direction, one end of each sawtooth arm is connected with the connecting hinge of the rectangular lever amplification groove, and the other end of each sawtooth arm is fixed on the platform base body; each sawtooth arm is composed of a plurality of sections of flexible hinges which are connected in sequence and are perpendicular to each other to form a spring-like structure for assisting the rectangular lever amplifying unit to amplify and displace. The device belongs to a secondary structure below a rectangular lever amplification unit and is used for assisting the rectangular lever amplification unit to amplify and displace. Meanwhile, due to the symmetrical design of the two sawtooth arms in each structure about the XY center direction, the coupling influence of the rectangular lever amplification unit between the XY axes can be reduced, and the coupling effect of the motion platform in the XY two directions can be reduced in an auxiliary manner. Due to the flexible design of the sawtooth arm, the joints between the flexible hinges are all subjected to rounding treatment through the rounding off.
Furthermore, the joints between the flexible hinges are all subjected to rounding treatment through rounding off.
The lengths of the multiple sections of flexible hinges are not completely the same, different deviations exist among the multiple sections of flexible hinges, the multiple sections of flexible hinges are smaller than the connecting hinges and the buffering hinges in the rectangular lever amplifying unit on the whole, and a secondary auxiliary amplifying effect is achieved.
The multi-section short buffering hinges have the same width and are integrally smaller than the connecting hinges and the buffering hinges in the rectangular lever amplifying unit. The last section of buffering hinge is fixed on the platform base body and is provided with a screw hole for fastening and fixing the saw tooth lever amplification unit, so that the synergistic effect of the small deformation of the saw teeth is ensured.
The eight saw-tooth lever amplification units in four directions include: a first quadrant sawtooth lever amplification unit support arm A8-1-1, a first quadrant sawtooth lever amplification unit support arm B8-1-2, a second quadrant sawtooth lever amplification unit support arm C8-2-1, a second quadrant sawtooth lever amplification unit support arm D8-2-2, a third quadrant sawtooth lever amplification unit support arm E8-3-1, a third quadrant sawtooth lever amplification unit support arm F8-3-2, a fourth quadrant sawtooth lever amplification unit support arm G8-4-1 and a fourth quadrant sawtooth lever amplification unit support arm H8-4-2.
A sawtooth lever amplifying unit support arm is connected in sequence by a plurality of sections, two pairwise mutually perpendicular's buffering hinge is constituteed, buffering hinge length is different, the width is close, behind the connecting hinge horizontal migration in the rectangle lever amplifying unit, a plurality of sections buffering hinge play "spring" effect, according to the size and the difference of direction of connecting hinge deformation power, the deformation that takes place difference, and the buffering hinge shape change perpendicular to power direction is big, and design length should also be longer, and the buffering hinge the same with power direction is just in the opposite.
As shown in FIG. 4, the fourth quadrant sawtooth lever amplifying unit arm G8-4-1 is composed of eight segments of buffering hinges, the fourth quadrant sawtooth lever amplifying unit arm G8-4-1 comprises a buffering hinge a 8-4-1-1, a buffering hinge b 8-4-1-2, a buffering hinge c 8-4-1-3, a buffering hinge d 8-4-1-4, a buffering hinge e 8-4-1-5, a buffering hinge f 8-4-1-6, a buffering hinge G8-4-1-7 and a buffering hinge h 8-4-1-8, the buffering hinges are perpendicular to each other, and the curvature of the circumference at the intersection point is 0.2 m.
Similarly, the fourth quadrant sawtooth lever amplifying unit support arm H8-4-2 comprises a buffering hinge a '8-4-2-1, a buffering hinge b' 8-4-2-2, a buffering hinge c '8-4-2-3, a buffering hinge d' 8-4-2-4, a buffering hinge e '8-4-2-5, a buffering hinge f' 8-4-2-6, a buffering hinge g '8-4-2-7 and a buffering hinge H' 8-4-2-8
Preferably, the widths of eight sections of hinges of the support arm G of the fourth quadrant sawtooth lever amplification unit are 0.4mm, the length of a buffer hinge a 8-4-1-1 is 1.7mm, the length of a buffer hinge b 8-4-1-2 is 1.6mm, the length of a buffer hinge c 8-4-1-3 is 0.9mm, the length of a buffer hinge d 8-4-1-4 is 0.8mm, the length of a buffer hinge e 8-4-1-5 is 0.9mm, the length of a buffer hinge f 8-4-1-6 is 2.3mm, the length of a buffer hinge G8-4-1-7 is 0.9mm, and the length of a buffer hinge h 8-4-1-8 is 0.9 mm. The structure of the fourth quadrant sawtooth lever amplifying unit support arm H8-4-2 is the same, and the sawtooth lever amplifying units in other three directions are also the same.
Furthermore, the platform also comprises four S-shaped spring decoupling units which have the same structure and are arranged on the base in a centrosymmetric manner relative to the motion platform, and each S-shaped spring decoupling unit comprises a plurality of sequentially connected buffer hinges which are perpendicular to each other in pairs; one end of the S-shaped spring decoupling unit is connected with the moving platform.
Specifically, the S-shaped spring decoupling units in the XY four middle directions are composed of multiple sections of flexible hinges, the flexible hinges are sequentially connected, are mutually perpendicular and are in a spring shape, and the joints are subjected to rounding treatment through fillets. One end of the decoupling unit is connected with four corners of the square motion platform, and the other end of the decoupling unit is fixed on the platform base.
Furthermore, the length of the head and tail two sections of buffer hinges of the S-shaped spring decoupling unit is the same, the S-shaped spring decoupling unit is respectively connected with the motion platform and the base, and the included angles between the S-shaped spring decoupling unit and the XY axis are both 45 degrees.
Specifically, the length of the first section of flexible hinge is the same as that of the last section of flexible hinge, the two sections of flexible hinges are strictly positioned in the XY middle direction, form an included angle of 45 degrees with the X, Y axis, and are respectively connected and fixed with the motion platform and the platform base body. When the moving platform moves in the XY directions, the S-shaped flexible hinge flexibly deforms according to the difference of the positions of the moving platform, so that the coupling effect between the XY directions is reduced.
The platform base body is provided with a screw hole for secondary reinforcement for the same reason as the saw-tooth lever amplification unit. The middle multi-section flexible hinges have different lengths to form an S-shaped structure. Due to the design requirement of flexible decoupling, the length of the multi-section hinge in the same direction with the first and last flexible hinges is shorter, and the length of the multi-section hinge perpendicular to the first and last flexible hinges is longer.
As shown in fig. 2, the S-shaped spring decoupling units 9 in four diagonal directions are respectively connected to one corner of the motion platform 1 and the platform base, and when the motion platform moves in the XY direction, the flexible hinges inside the S-shaped spring decoupling units 9 flexibly deform according to the different positions of the motion platform, thereby reducing the coupling effect between the XY directions. The S-shaped buffer chain group in the four directions comprises: the decoupling device comprises a first quadrant S-shaped spring decoupling unit 9-1, a second quadrant S-shaped spring decoupling unit 9-2, a third quadrant S-shaped spring decoupling unit 9-3 and a fourth quadrant S-shaped spring decoupling unit 9-4.
As shown in FIG. 5, the length of the first section of the buffering hinge i 9-3-1 is the same as that of the last section of the buffering hinge o 9-3-7, the first section of the buffering hinge i 9-3-1 is connected with the moving platform 1, the last section of the buffering hinge o 9-3-7 is connected with the platform base body, and the two sections of the buffering hinges are in the diagonal direction. The middle multi-section buffering hinges have different lengths to form an S-shaped structure, the buffering hinges in the same direction with the first section buffering hinges and the last section buffering hinges are shorter, and the buffering hinges vertical to the first section buffering hinges are longer.
The S-shaped spring decoupling unit plays a role in buffering through different deformations of different buffering hinges in different directions in a spring buffering mode and is located in the XY middle direction, and therefore flexible decoupling in the XY direction is completed.
The large-stroke two-dimensional nano positioning platform provided by the invention has a central symmetrical structure about a motion platform in a design mode, four identical driver grooves and rectangular lever amplification units are embedded in the four XY directions, and a compliant mechanism (comprising a driving hinge, a driver groove, a rectangular lever amplification unit and a fixed hinge) in the XY direction is also symmetrical about an X axis or a Y axis; in four directions between XY, four identical sawtooth lever amplification units and four S-shaped spring decoupling units are embedded, and the structure is symmetrical about the middle direction of XY.
Furthermore, the lengths of the buffer hinges in the S-shaped spring decoupling unit except the head and tail buffer hinges are different, and the length of the buffer hinge in the same direction as the head and tail buffer hinges is smaller than the length of the buffer hinge in the direction perpendicular to the head and tail buffer hinges.
Further, the width of the buffering hinge of the S-shaped spring decoupling unit is the same, and the width of the buffering hinge of the sawtooth lever amplifying unit is the same.
Specifically, the multi-segment flexible hinges have the same width and are consistent with the sawtooth arm flexible hinges of the sawtooth lever amplifying unit.
Preferably, as shown in fig. 5, the third quadrant S-shaped spring decoupling unit 9-3 is composed of seven segments of buffer hinges, the branched chain of the third quadrant S-shaped spring decoupling unit includes a first segment of buffer hinge i 9-3-1, a buffer hinge j 9-3-2, a buffer hinge k 9-3-3, a buffer hinge p 9-3-4, a buffer hinge m 9-3-5, a buffer hinge n 9-3-6, and a last segment of buffer hinge o 9-3-7, the buffer hinges form an included angle of 90 ° with each other, and the circumferential curvature at the intersection point is 0.2 m. The widths of the seven buffering hinges are 0.4mm, the length of the first buffering hinge I9-3-1 is 6.0mm, the length of the buffering hinge j 9-3-2 is 2.9mm, the length of the buffering hinge k 9-3-3 is 1.2mm, the length of the buffering hinge p 9-3-4 is 5.8mm, the length of the buffering hinge m 9-3-5 is 1.2mm, the length of the buffering hinge n 9-3-6 is 2.9mm, and the length of the buffering hinge o 9-3-7 is 6.0 mm. The S-shaped spring decoupling units in the other three directions are also the same.
Furthermore, the joints of the buffer hinges of the sawtooth lever amplifying unit and the buffer hinges of the S-shaped spring decoupling unit are subjected to rounding treatment through rounding off.
Furthermore, the base is provided with a plurality of screw holes which are respectively used for fixing the connecting hinge of the rectangular lever amplifying unit and reinforcing the sawtooth lever amplifying unit and the S-shaped spring decoupling unit.
Specifically, as shown in fig. 2, the base, i.e., the platform base body, is provided with a plurality of circular screw holes 3, and the circular screw holes are used for fixing the platform base body on a preset table top under the action of screws.
In order to improve the reliability of nanometer location platform, be equipped with the screw that a plurality of circular screws are used for consolidating the pretension on the nanometer platform base body, include: the periphery of the platform base body plays a role in integral fixation, a screw hole of a hinge fixedly connected in the buffer groove, a reinforcing screw hole at the joint of the sawtooth lever amplification unit and the platform base body, and a reinforcing screw hole at the joint of the S-shaped spring decoupling unit and the platform base body.
Preferably, 24 circular screw holes are formed in the platform base body, and the platform base body is fixed on the preset table top under the action of the screws. Peripheral 8 screws play the monolithic stationary action, and 8 screws in the dashpot play eight fixed connection hinge' S effects, and the link of sawtooth lever amplification unit and platform base body is consolidated to 4 screws of sawtooth chain department, and the link of S type spring decoupling zero unit and platform base body is consolidated to inside 4 screws.
The basic frequency of the large-stroke two-dimensional nano positioning platform provided by the invention is more than 2kHz, the maximum displacement of the motion platform in the XY direction reaches 100um, and the coupling error is less than 1%. The scanning platform can be used as a scanning application platform of an atomic force microscope, the requirement of large-stroke measurement is met under the condition of keeping higher scanning frequency, and the grid scanning frequency on the platform can reach more than 200 Hz. In actual operation, under the condition of keeping the technical scheme the same or similar, the structural form and the device parameters can be flexibly changed to meet the actual requirements.
It will be understood by those skilled in the art that the foregoing is only a preferred embodiment of the present invention, and is not intended to limit the invention, and that any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the scope of the present invention.
Claims (10)
1. A large-stroke two-dimensional nanometer positioning platform is characterized by comprising: the device comprises a base, a motion platform arranged at the center of the base, four driver grooves which have the same structure and are arranged on the base in a central symmetry mode relative to the motion platform, a rectangular lever amplification unit and a sawtooth lever amplification unit;
the rectangular lever amplifying unit comprises two connecting hinges and four buffering hinges; the two connecting hinges are a group of opposite sides of a rectangle, the four buffering hinges are hinged in pairs to form two buffering hinge groups which serve as the other pair of opposite sides of the rectangle, one buffering hinge group is sequentially connected with the driver groove and the moving platform, and the other buffering hinge group is connected with the base through the fixed hinge;
the sawtooth lever amplification unit comprises two support arms, and the two support arms are respectively connected with one of the two adjacent rectangular lever amplification units through a connecting hinge; each support arm comprises a plurality of buffer hinges which are connected in sequence and are vertical to each other in pairs;
one end of the driver groove is vertically connected with the measuring surface of the moving platform through a driving hinge.
2. The large-stroke two-dimensional nanopositioning platform of claim 1 wherein one of the set of buffer hinges makes an angle of 90 ° ± 10 ° with the driver slot; the included angle between the buffering hinge group and the connecting hinge is 90 degrees +/-10 degrees.
3. The large-stroke two-dimensional nanometer positioning platform as claimed in claim 1, wherein the two connecting hinges have the same length, the four buffering hinges have the same length, and the buffering hinges of the sawtooth lever amplifying unit have different lengths;
and the lengths of the four buffering hinges are greater than the lengths of the two connecting hinges, and the lengths of the two connecting hinges are greater than the lengths of the buffering hinges of the sawtooth lever amplifying unit.
4. The large-stroke two-dimensional nanometer positioning platform as recited in claim 1, wherein the two connecting hinges have the same width, the four buffering hinges have the same width, and the buffering hinges of the sawtooth lever amplifying unit have the same width;
and the widths of the two connecting hinges are greater than the widths of the four buffering hinges, and the widths of the four buffering hinges are greater than the widths of the buffering hinges of the sawtooth lever amplifying unit.
5. The large-stroke two-dimensional nanopositioning platform of any one of claims 1 to 4, further comprising four S-shaped spring decoupling units of the same structure and centrally symmetrically arranged on the base with respect to the motion platform, the S-shaped spring decoupling units comprising a plurality of sequentially connected buffer hinges perpendicular to each other two by two; one end of the S-shaped spring decoupling unit is connected with the moving platform.
6. The large-stroke two-dimensional nanometer positioning platform of claim 5, wherein the two segments of the buffer hinges at the head and the tail of the S-shaped spring decoupling unit have the same length, are respectively connected with the motion platform and the base, and have an included angle of 45 degrees with the XY axes.
7. The long-stroke two-dimensional nanometer positioning platform of claim 5, wherein the lengths of the buffer hinges in the S-shaped spring decoupling unit except the first and the last buffer hinges are different, and the length of the buffer hinge in the same direction as the first and the last buffer hinges is smaller than the length of the buffer hinge perpendicular to the first and the last buffer hinges.
8. The large-stroke two-dimensional nanopositioning platform of claim 5, wherein the width of the buffer hinge of the S-shaped spring decoupling unit is the same and the width of the buffer hinge of the sawtooth lever amplification unit is the same.
9. The large-stroke two-dimensional nanometer positioning platform of claim 5, wherein the connection between the buffer hinge of the sawtooth lever amplification unit and the buffer hinge of the S-shaped spring decoupling unit is rounded.
10. The long-stroke two-dimensional nanometer positioning platform of claim 5, wherein the base is provided with a plurality of screw holes for fixing the connecting hinge of the rectangular lever amplification unit and reinforcing the sawtooth lever amplification unit and the S-shaped spring decoupling unit respectively.
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