CN113424443A - 声波器件 - Google Patents
声波器件 Download PDFInfo
- Publication number
- CN113424443A CN113424443A CN201980081234.4A CN201980081234A CN113424443A CN 113424443 A CN113424443 A CN 113424443A CN 201980081234 A CN201980081234 A CN 201980081234A CN 113424443 A CN113424443 A CN 113424443A
- Authority
- CN
- China
- Prior art keywords
- substrate
- angle
- quartz
- acoustic wave
- piezoelectric plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims abstract description 285
- 239000010453 quartz Substances 0.000 claims abstract description 246
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 246
- 238000010897 surface acoustic wave method Methods 0.000 claims abstract description 132
- 238000000034 method Methods 0.000 claims abstract description 96
- 239000013078 crystal Substances 0.000 claims abstract description 54
- 229910003327 LiNbO3 Inorganic materials 0.000 claims abstract description 27
- 229910012463 LiTaO3 Inorganic materials 0.000 claims abstract description 26
- 230000008569 process Effects 0.000 claims description 24
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 15
- 229910052710 silicon Inorganic materials 0.000 claims description 15
- 239000010703 silicon Substances 0.000 claims description 15
- 230000008878 coupling Effects 0.000 claims description 14
- 238000010168 coupling process Methods 0.000 claims description 14
- 238000005859 coupling reaction Methods 0.000 claims description 14
- 238000007517 polishing process Methods 0.000 claims description 10
- 238000012545 processing Methods 0.000 claims description 8
- 238000001914 filtration Methods 0.000 claims description 7
- 230000000712 assembly Effects 0.000 claims description 3
- 238000000429 assembly Methods 0.000 claims description 3
- 230000005540 biological transmission Effects 0.000 claims description 3
- 238000005530 etching Methods 0.000 claims description 3
- 239000003054 catalyst Substances 0.000 claims description 2
- 241000764238 Isis Species 0.000 claims 2
- 230000010287 polarization Effects 0.000 description 21
- 230000001902 propagating effect Effects 0.000 description 13
- 230000006870 function Effects 0.000 description 12
- 238000004519 manufacturing process Methods 0.000 description 11
- 238000010438 heat treatment Methods 0.000 description 9
- 230000008901 benefit Effects 0.000 description 5
- 239000010949 copper Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- 238000004806 packaging method and process Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 206010040844 Skin exfoliation Diseases 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000010297 mechanical methods and process Methods 0.000 description 2
- 230000005226 mechanical processes and functions Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 230000001413 cellular effect Effects 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000004227 thermal cracking Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/64—Filters using surface acoustic waves
- H03H9/6423—Means for obtaining a particular transfer characteristic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02543—Characteristics of substrate, e.g. cutting angles
- H03H9/02551—Characteristics of substrate, e.g. cutting angles of quartz substrates
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02543—Characteristics of substrate, e.g. cutting angles
- H03H9/02559—Characteristics of substrate, e.g. cutting angles of lithium niobate or lithium-tantalate substrates
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02543—Characteristics of substrate, e.g. cutting angles
- H03H9/02574—Characteristics of substrate, e.g. cutting angles of combined substrates, multilayered substrates, piezoelectrical layers on not-piezoelectrical substrate
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/125—Driving means, e.g. electrodes, coils
- H03H9/145—Driving means, e.g. electrodes, coils for networks using surface acoustic waves
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/125—Driving means, e.g. electrodes, coils
- H03H9/145—Driving means, e.g. electrodes, coils for networks using surface acoustic waves
- H03H9/14538—Formation
- H03H9/14541—Multilayer finger or busbar electrode
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/25—Constructional features of resonators using surface acoustic waves
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/64—Filters using surface acoustic waves
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
- Illuminated Signs And Luminous Advertising (AREA)
- Planar Illumination Modules (AREA)
Abstract
Description
Claims (69)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201862746512P | 2018-10-16 | 2018-10-16 | |
US62/746,512 | 2018-10-16 | ||
PCT/US2019/056348 WO2020081573A2 (en) | 2018-10-16 | 2019-10-15 | Acoustic wave devices |
Publications (1)
Publication Number | Publication Date |
---|---|
CN113424443A true CN113424443A (zh) | 2021-09-21 |
Family
ID=70159235
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201980081234.4A Pending CN113424443A (zh) | 2018-10-16 | 2019-10-15 | 声波器件 |
Country Status (9)
Country | Link |
---|---|
US (2) | US20200119711A1 (zh) |
JP (1) | JP2022512700A (zh) |
KR (1) | KR20210068131A (zh) |
CN (1) | CN113424443A (zh) |
DE (1) | DE112019005176T5 (zh) |
GB (2) | GB2612701B (zh) |
SG (1) | SG11202103906RA (zh) |
TW (1) | TW202029643A (zh) |
WO (1) | WO2020081573A2 (zh) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SG10201905013VA (en) | 2018-06-11 | 2020-01-30 | Skyworks Solutions Inc | Acoustic wave device with spinel layer |
SG11202103906RA (en) * | 2018-10-16 | 2021-05-28 | Univ Tohoku | Acoustic wave devices |
US11876501B2 (en) | 2019-02-26 | 2024-01-16 | Skyworks Solutions, Inc. | Acoustic wave device with multi-layer substrate including ceramic |
US11626855B2 (en) * | 2019-11-08 | 2023-04-11 | Skyworks Solutions, Inc. | Out-of-band rejection using SAW-based integrated balun |
WO2022264933A1 (ja) * | 2021-06-16 | 2022-12-22 | 株式会社村田製作所 | 弾性波装置 |
WO2022269721A1 (ja) * | 2021-06-21 | 2022-12-29 | 国立大学法人東北大学 | 弾性表面波デバイス |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4670681A (en) * | 1986-07-29 | 1987-06-02 | R. F. Monolithics, Inc. | Singly rotated orientation of quartz crystals for novel surface acoustic wave devices |
CN102361061A (zh) * | 2010-05-17 | 2012-02-22 | 株式会社村田制作所 | 复合压电基板的制造方法及压电器件 |
CN105409119A (zh) * | 2013-07-25 | 2016-03-16 | 日本碍子株式会社 | 复合基板及其制造方法 |
WO2018097016A1 (ja) * | 2016-11-25 | 2018-05-31 | 国立大学法人東北大学 | 弾性波デバイス |
Family Cites Families (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4705979A (en) * | 1985-06-26 | 1987-11-10 | Schlumberger Technology Corporation | Stress and temperature compensated surface acoustic wave devices |
US5719538A (en) * | 1995-09-01 | 1998-02-17 | Murata Manufacturing Co., Ltd. | Surface acoustic wave device having negative temperature coefficient of decay |
JPH09214282A (ja) * | 1996-01-31 | 1997-08-15 | Kyocera Corp | 表面実装型弾性表面波装置 |
JP2001332958A (ja) * | 2000-05-22 | 2001-11-30 | Seiko Epson Corp | 表面波共振子及びその製造方法 |
JP4003434B2 (ja) * | 2001-10-31 | 2007-11-07 | 株式会社村田製作所 | 表面波装置 |
JP4587732B2 (ja) * | 2004-07-28 | 2010-11-24 | 京セラ株式会社 | 弾性表面波装置 |
JP2006246050A (ja) * | 2005-03-03 | 2006-09-14 | Tdk Corp | 複合圧電ウエハ及び弾性表面波装置 |
WO2009153757A1 (en) * | 2008-06-19 | 2009-12-23 | Nxp B.V. | Piezoelectric bimorph switch |
WO2010067794A1 (ja) * | 2008-12-10 | 2010-06-17 | 株式会社村田製作所 | 圧電性複合基板の製造方法、および圧電素子の製造方法 |
KR20110020741A (ko) * | 2009-08-24 | 2011-03-03 | 엔지케이 인슐레이터 엘티디 | 복합 기판의 제조 방법 |
EP2690782B1 (en) * | 2011-03-22 | 2020-09-09 | Murata Manufacturing Co., Ltd. | Piezoelectric device and manufacturing method for piezoelectric device |
WO2013146374A1 (ja) * | 2012-03-26 | 2013-10-03 | 株式会社村田製作所 | 弾性波装置及びその製造方法 |
US10348269B2 (en) * | 2014-12-17 | 2019-07-09 | Qorvo Us, Inc. | Multi-frequency guided wave devices and fabrication methods |
US20180048283A1 (en) * | 2015-04-16 | 2018-02-15 | Shin-Etsu Chemical Co., Ltd. | Lithium tantalate single crystal substrate, bonded substrate, manufacturing method of the bonded substrate, and surface acoustic wave device using the bonded substrate |
CN107615653B (zh) * | 2015-07-17 | 2021-04-27 | 株式会社村田制作所 | 弹性波装置 |
US10381998B2 (en) * | 2015-07-28 | 2019-08-13 | Qorvo Us, Inc. | Methods for fabrication of bonded wafers and surface acoustic wave devices using same |
US10084427B2 (en) * | 2016-01-28 | 2018-09-25 | Qorvo Us, Inc. | Surface acoustic wave device having a piezoelectric layer on a quartz substrate and methods of manufacturing thereof |
US20180159494A1 (en) * | 2016-10-20 | 2018-06-07 | Skyworks Solutions, Inc. | Elastic wave device with sub-wavelength thick piezoelectric layer |
DE102017111448B4 (de) * | 2017-05-24 | 2022-02-10 | RF360 Europe GmbH | SAW-Vorrichtung mit unterdrückten Störmodensignalen |
US11206007B2 (en) * | 2017-10-23 | 2021-12-21 | Qorvo Us, Inc. | Quartz orientation for guided SAW devices |
FR3079346B1 (fr) * | 2018-03-26 | 2020-05-29 | Soitec | Procede de fabrication d'un substrat donneur pour le transfert d'une couche piezoelectrique, et procede de transfert d'une telle couche piezoelectrique |
SG11202103906RA (en) * | 2018-10-16 | 2021-05-28 | Univ Tohoku | Acoustic wave devices |
JP7426991B2 (ja) * | 2019-04-08 | 2024-02-02 | 株式会社村田製作所 | 弾性波装置及びマルチプレクサ |
WO2021006056A1 (ja) * | 2019-07-05 | 2021-01-14 | 株式会社村田製作所 | 弾性波装置、高周波フロントエンド回路及び通信装置 |
US20210111688A1 (en) * | 2019-10-10 | 2021-04-15 | Skyworks Solutions, Inc. | Surface acoustic wave device with multi-layer piezoelectric substrate |
-
2019
- 2019-10-15 SG SG11202103906RA patent/SG11202103906RA/en unknown
- 2019-10-15 US US16/653,965 patent/US20200119711A1/en active Pending
- 2019-10-15 GB GB2214625.2A patent/GB2612701B/en active Active
- 2019-10-15 GB GB2106080.1A patent/GB2592810B/en active Active
- 2019-10-15 CN CN201980081234.4A patent/CN113424443A/zh active Pending
- 2019-10-15 US US16/653,964 patent/US20200119710A1/en active Pending
- 2019-10-15 DE DE112019005176.8T patent/DE112019005176T5/de active Pending
- 2019-10-15 KR KR1020217014380A patent/KR20210068131A/ko unknown
- 2019-10-15 JP JP2021520613A patent/JP2022512700A/ja active Pending
- 2019-10-15 WO PCT/US2019/056348 patent/WO2020081573A2/en active Application Filing
- 2019-10-16 TW TW108137291A patent/TW202029643A/zh unknown
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4670681A (en) * | 1986-07-29 | 1987-06-02 | R. F. Monolithics, Inc. | Singly rotated orientation of quartz crystals for novel surface acoustic wave devices |
CN102361061A (zh) * | 2010-05-17 | 2012-02-22 | 株式会社村田制作所 | 复合压电基板的制造方法及压电器件 |
CN105409119A (zh) * | 2013-07-25 | 2016-03-16 | 日本碍子株式会社 | 复合基板及其制造方法 |
WO2018097016A1 (ja) * | 2016-11-25 | 2018-05-31 | 国立大学法人東北大学 | 弾性波デバイス |
Also Published As
Publication number | Publication date |
---|---|
GB2612701B (en) | 2023-08-02 |
GB2612701A (en) | 2023-05-10 |
GB202214625D0 (en) | 2022-11-16 |
US20200119711A1 (en) | 2020-04-16 |
GB2592810B (en) | 2023-08-09 |
US20200119710A1 (en) | 2020-04-16 |
WO2020081573A3 (en) | 2020-05-22 |
DE112019005176T5 (de) | 2021-09-23 |
GB2592810A (en) | 2021-09-08 |
JP2022512700A (ja) | 2022-02-07 |
SG11202103906RA (en) | 2021-05-28 |
GB2592810A8 (en) | 2023-05-31 |
KR20210068131A (ko) | 2021-06-08 |
WO2020081573A2 (en) | 2020-04-23 |
TW202029643A (zh) | 2020-08-01 |
GB202106080D0 (en) | 2021-06-09 |
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Effective date of registration: 20240329 Address after: California, USA Applicant after: SKYWORKS SOLUTIONS, Inc. Country or region after: U.S.A. Address before: Sendai City, Miyagi Prefecture, Japan Applicant before: TOHOKU University Country or region before: U.S.A. |
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