CN113376820A - Large-magnification microscopic imaging optical system and optical device - Google Patents
Large-magnification microscopic imaging optical system and optical device Download PDFInfo
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- CN113376820A CN113376820A CN202110302023.8A CN202110302023A CN113376820A CN 113376820 A CN113376820 A CN 113376820A CN 202110302023 A CN202110302023 A CN 202110302023A CN 113376820 A CN113376820 A CN 113376820A
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- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
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- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/02—Telephoto objectives, i.e. systems of the type + - in which the distance from the front vertex to the image plane is less than the equivalent focal length
Abstract
The application provides a micro-imaging optical system of big multiplying power and optical device, its technical scheme main points are: includes, arranged in order from an object side to an image side along an optical axis: the first lens group is provided with a first lens with positive focal power, a second lens with positive focal power, a third lens with positive focal power, a fourth lens with positive focal power, a fifth lens with positive focal power, a sixth lens with negative focal power and a seventh lens with positive focal power in sequence from the object side to the image side along the optical axis; a second lens group including an eighth lens having a negative refractive power; the ratio of the focal power phi A of the first lens group to the focal power phi of the whole optical system satisfies: phi A/phi is not less than 0.055 and not more than 0.075; the ratio of the focal power phi B of the second lens group to the focal power phi of the whole optical system satisfies: phi B/phi is less than or equal to-0.3 and is less than or equal to-0.5. The application provides a big multiplying power microscopic imaging optical system and optical device has big multiplying power, resolution ratio height, long working distance's advantage.
Description
Technical Field
The application relates to the technical field of optics, in particular to a high-magnification microscopic imaging optical system and an optical device.
Background
In an aqueous environment, particulate organic carbon formed by microorganisms such as bacteria, algae and biological debris is a major participant and bearer of the food chain and carbon cycle process in the aqueous environment. The research on the action of the micro organisms or the micro particles in the food chain maintenance or carbon cycle process is an important means for exploring and analyzing the substance cycle and change mechanism in the water environment from the microscopic level. Especially, the dynamic change process of the microorganism in the water environment needs to be researched by adopting a microscopic observation technology due to the fact that the variety is various, the size is small, and the difficulty of accurate detection and classification is high.
In the field of microscopic imaging, a microscopic optical system plays an extremely important role as a core component, and can realize micron-level or even submicron-level observation imaging of micro organisms. The main technical indexes of the microscopic optical system comprise working distance, resolution, magnification, focal depth, imaging field of view and the like, and the indexes are mutually restricted and mutually influenced. In high-magnification microscopic imaging, due to the fact that the numerical aperture is large, imaging resolution is high, observation of a microscopic optical system with long working distance is difficult to achieve, and observation needs to be carried out close to an object plane so as to reduce design difficulty.
In order to realize living body and in-situ observation of micro organisms such as bacteria, algae and the like in water environment, a detected object needs to keep a certain distance from a microscopic optical system, and the current large-numerical-aperture high-magnification microscope objective is difficult to meet high-resolution observation under long working distance. High magnification, high resolution and long working distance micro-optical systems are key components to address such needs.
In view of the above problems, it is desirable to provide a solution.
Disclosure of Invention
An object of the embodiments of the present application is to provide a high magnification microscopic imaging optical system and an optical device, which have the advantages of high magnification, high resolution and long working distance.
In a first aspect, an embodiment of the present application provides a large-magnification microscopic imaging optical system, which has the following technical scheme:
the method comprises the following steps: arranged in order from an object side to an image side along an optical axis:
the first lens group is sequentially arranged from the object side to the image side along an optical axis and comprises:
the lens comprises a first lens with positive focal power, a second lens and a third lens, wherein one surface of the first lens close to the object side is a plane, one surface of the first lens close to the image side is a convex surface, the radius of curvature of one surface of the first lens close to the image side is 25.48mm, the clear aperture of the first lens close to the object side is 33.4mm, and the clear aperture of the first lens close to the image side is 36 mm;
the surface, close to the object side, of the second lens is a concave surface, the surface, close to the image side, of the second lens is a convex surface, the curvature radius of the surface, close to the object side, of the second lens is 25.48mm, the curvature radius of the surface, close to the image side, of the second lens is 24.12mm, the clear aperture, close to the object side, of the second lens is 36mm, and the clear aperture, close to the image side, of the second lens is 45.6 mm;
the surface, close to the object side, of the third lens is a concave surface, the surface, close to the image side, of the third lens is a convex surface, the radius of curvature of the surface, close to the image side, of the third lens is 45.38mm, the clear aperture is 62.2mm, the radius of curvature of the surface, close to the object side, of the third lens is 64.78mm, and the clear aperture is 56.8 mm;
the surface, close to the object side, of the fourth lens is a concave surface, the surface, close to the image side, of the fourth lens is a convex surface, the radius of curvature of the surface, close to the image side, of the fourth lens is 118.38mm, the clear aperture is 70mm, the radius of curvature of the surface, close to the object side, of the fourth lens is 4582mm, and the clear aperture is 68.6 mm;
the surface, close to the object side, of the fifth lens is a convex surface, the surface, close to the image side, of the fifth lens is a convex surface, the radius of curvature of the surface, close to the image side, of the fifth lens is 69.09mm, the clear aperture is 69.8mm, the radius of curvature of the surface, close to the object side, of the fifth lens is-1348 mm, and the clear aperture is 70 mm;
the surface, close to the object side, of the sixth lens is a concave surface, the surface, close to the image side, of the sixth lens is a convex surface, the radius of curvature of the surface, close to the image side, of the sixth lens is 184.93mm, the clear aperture is 72.5mm, the radius of curvature of the surface, close to the object side, of the sixth lens is 57.28mm, and the clear aperture is 68.8 mm;
the surface, close to the object side, of the seventh lens is a convex surface, the surface, close to the image side, of the seventh lens is a concave surface, the radius of curvature of the surface, close to the image side, of the seventh lens is-201.97 mm, the clear aperture is 60.8mm, the radius of curvature of the surface, close to the object side, of the seventh lens is-63.58 mm, and the clear aperture is 73.6 mm;
a second lens group comprising:
the surface, close to the object side, of the eighth lens is a concave surface, the surface, close to the image side, of the eighth lens is a convex surface, the radius of curvature of the surface, close to the image side, of the eighth lens is 6477mm, the clear aperture is 3.7mm, the radius of curvature of the surface, close to the object side, of the eighth lens is 4.75mm, and the clear aperture is 3.7 mm;
the ratio of the focal power phi A of the first lens group to the focal power phi of the whole optical system satisfies the following conditions:
0.055≤φA/φ≤0.075；
the ratio of the focal power phi B of the second lens group to the focal power phi of the whole optical system satisfies the following conditions:
-0.5≤φB/φ≤-0.3。
further, in the embodiment of the present application, an aperture stop is disposed between the fourth lens and the fifth lens.
Further, in the embodiment of the present application, the distance between the third lens and the second lens on the central axis is 0.1mm, the distance between the fourth lens and the third lens on the central axis is 0.2mm, the distance between the aperture stop and the fourth lens on the central axis is 0.1mm, the distance between the fifth lens and the aperture stop on the central axis is 0.1mm, the distance between the sixth lens and the fifth lens on the central axis is 2.5mm, the distance between the seventh lens and the sixth lens on the central axis is 0.1mm, the distance between the eighth lens and the seventh lens on the central axis is 61.5mm, the thickness of the first lens on the central axis is 12.4mm, the thickness of the second lens on the central axis is 12.7mm, the thickness of the third lens on the central axis is 10.8mm, and the thickness of the fourth lens on the central axis is 10.3mm, the thickness of fifth lens on the axis is 14.9mm, the thickness of sixth lens on the axis is 8.3mm, the thickness of seventh lens on the axis is 29.9mm, the thickness of eighth lens on the axis is 6 mm.
Further, in the embodiments of the present application, the first lens and the second lens constitute a double cemented lens.
Further, in the embodiment of the present application, an air layer is provided between the fifth lens and the sixth lens.
Further, in the embodiment of the present application, a distance L from an object plane to the first lens and an optical system focal length f satisfy: l is more than or equal to 3 f.
Further, in the embodiment of the application, the material of the first lens is H-K9L, and the material of the second lens is H-ZF 52.
Further, in the embodiment of the application, the material of the fifth lens is H-ZF52, and the material of the sixth lens is H-ZF 88.
Further, in the embodiment of the application, the material of the third lens is H-ZF52, the material of the fourth lens is H-ZF52, the material of the seventh lens is H-ZF88, and the material of the eighth lens is H-ZF 88.
Further, the present application also provides an optical apparatus carrying the high magnification microscopic imaging optical system as described above.
As can be seen from the above, according to the high-magnification microscopic imaging optical system and the optical device provided in the embodiments of the present application, the first lens and the second lens are utilized to collimate the light with a large numerical aperture, so as to obtain a large focal power and reduce spherical aberration and coma aberration of the system, then the third lens and the fourth lens are utilized to further collimate the light, the fifth lens and the sixth lens are utilized to generate positive and high-order spherical aberration for correcting residual negative spherical aberration in the system, the seventh lens is utilized to correct curvature of field of the system, so as to obtain an effect of flat-field imaging and shorten the length of the system, and finally the eighth lens is utilized to obtain a parallel light beam with good quality, so that the high-magnification microscopic imaging optical system and the optical device have the beneficial effects of large magnification, high resolution and long working distance.
Additional features and advantages of the present application will be set forth in the description which follows, and in part will be obvious from the description, or may be learned by the practice of the embodiments of the present application. The objectives and other advantages of the application may be realized and attained by the structure particularly pointed out in the written description and claims hereof as well as the appended drawings.
Drawings
Fig. 1 is a schematic structural diagram of a large-magnification microscopic imaging optical system provided in an embodiment of the present application.
Fig. 2 is a graph illustrating an optical transfer function curve of an optical system according to an embodiment of the present disclosure.
Fig. 3 is a wave aberration distribution diagram of an optical system according to an embodiment of the present application.
In the figure: 100. a first lens; 200. a second lens; 300. a third lens; 400. a fourth lens; 500. a fifth lens; 600. a sixth lens; 700. a seventh lens; 800. an eighth lens; 900. and (4) an aperture diaphragm.
Detailed Description
The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are only a part of the embodiments of the present application, and not all of the embodiments. The components of the embodiments of the present application, generally described and illustrated in the figures herein, can be arranged and designed in a wide variety of different configurations. Thus, the following detailed description of the embodiments of the present application, presented in the accompanying drawings, is not intended to limit the scope of the claimed application, but is merely representative of selected embodiments of the application. All other embodiments, which can be derived by a person skilled in the art from the embodiments of the present application without making any creative effort, shall fall within the protection scope of the present application.
It should be noted that: like reference numbers and letters refer to like items in the following figures, and thus, once an item is defined in one figure, it need not be further defined and explained in subsequent figures. Meanwhile, in the description of the present application, the terms "first", "second", and the like are used only for distinguishing the description, and are not to be construed as indicating or implying relative importance.
Referring to fig. 1 to 3, a high magnification microscopic imaging optical system specifically includes: arranged in order from an object side to an image side along an optical axis:
the optical lens comprises a first lens group, a second lens group and a third lens group, wherein the first lens group is provided with a first lens 100 with positive focal power, a second lens 200 with positive focal power, a third lens 300 with positive focal power, a fourth lens 400 with positive focal power, a fifth lens 500 with positive focal power, a sixth lens 600 with negative focal power and a seventh lens 700 with positive focal power;
a second lens group including an eighth lens element 800 having a negative refractive power;
the ratio of the focal power phi A of the first lens group to the focal power phi of the whole optical system satisfies:
0.055≤φA/φ≤0.075；
the ratio of the focal power phi B of the second lens group to the focal power phi of the whole optical system satisfies:
-0.5≤φB/φ≤-0.3。
through the technical scheme, under the condition of meeting the focal power constraint, the light rays with large numerical apertures can be collimated by the first lens 100 and the second lens 200, the spherical aberration and the coma aberration of the system are reduced while the large focal power is obtained, then the light rays are further collimated by the third lens 300 and the fourth lens 400, the fifth lens 500 and the sixth lens 600 are used for generating positive high-level spherical aberration for correcting residual negative spherical aberration in the system, the seventh lens 700 is used for correcting the curvature of field of the system so as to obtain the effect of flat-field imaging and shorten the length of the system, and finally the parallel light beams with good quality are obtained through the eighth lens 800, so that the parallel light source has the advantages of large magnification, high resolution and long working distance.
In the technical scheme described in the application, a telephoto type structure is adopted, that is, the telephoto type structure is composed of a front positive lens group and a rear negative lens group, and meanwhile, the ratio of the focal power phi A of the first lens group to the focal power phi of the whole optical system satisfies:
0.055≤φA/φ≤0.075；
the ratio of the focal power phi B of the second lens group to the focal power phi of the whole optical system satisfies:
-0.5≤φB/φ≤-0.3；
the distance L from the object plane to the first lens 100 and the optical system focal length f satisfy: l is more than or equal to 3 f. The optical system under the condition ensures the imaging quality and simultaneously has a more compact overall structure, can realize 100 times of optical zooming by only using eight lenses, keeps a very small and compact structure while realizing high magnification, is beneficial to realizing the miniaturization and cost reduction of the optical system, and cannot be achieved by the existing means in the current market.
In some of these embodiments, an aperture stop 900 is disposed between the fourth lens 400 and the fifth lens 500.
Through the above technical solution, the aperture stop 900 is arranged between the fourth lens 400 and the fifth lens 500 for adjusting the intensity of the light beam, and the aperture stop 900 is arranged between the fourth lens 400 and the fifth lens 500 to ensure the paraxial condition, improve the imaging quality, and correct the aberration.
In some embodiments, a double-cemented lens is formed between the first lens element 100 and the second lens element 200, wherein a surface of the first lens element 100 close to the object side is a flat surface and a surface close to the image side is a convex surface, and a surface of the second lens element 200 close to the object side is a concave surface and a surface close to the image side is a convex surface. The material of the first lens 100 is H-K9L, and the material of the second lens 200 is H-ZF 52.
Through the technical scheme, the first lens 100 and the second lens 200 are arranged into a double cemented lens, the focal power is borne by the cemented lens, and the introduction of aberration is reduced, wherein the second lens 200 is located at the position of the non-vignetting point. Meanwhile, the material of the first lens 100 is H-K9L, the material of the second lens 200 is H-ZF52, and two different materials are used for eliminating chromatic aberration and improving imaging quality.
Specifically, in some embodiments, a distance between a surface of the first lens element 100 close to the object side and the object plane is 6mm on the central axis, a radius of curvature of the convex surface of the first lens element 100 is 25.48mm, a radius of curvature of the concave surface of the second lens element 200 is 25.48mm, a radius of curvature of the convex surface of the second lens element 200 is 24.12mm, a clear aperture of the first lens element 100 close to the object side is 33.4mm, a clear aperture of the second lens element 200 close to the image side is 36mm, and a clear aperture of the second lens element 200 close to the object side is 45.6 mm. The thickness of the first lens 100 on the central axis is 12.4mm, and the thickness of the second lens 200 on the central axis is 12.7 mm.
The above parameters are set, the incident light enters the double-cemented lens at an aperture angle not less than 120 degrees, the double-cemented lens formed by the first lens 100 and the second lens 200 collimates the light with a large numerical aperture, and the second lens 200 is located at the non-halation position, so that the spherical aberration and the coma aberration can be reduced while large focal power is obtained.
Further, the third lens 300 and the fourth lens 400 collimate the light further, in some embodiments, the convex surface of the third lens 300 has a radius of curvature of 45.38mm and a clear aperture of 62.2mm, the concave surface has a radius of curvature of 64.78mm and a clear aperture of 56.8mm, the convex surface of the fourth lens 400 has a radius of curvature of 118.38mm and a clear aperture of 70mm, and the concave surface has a radius of curvature of 4582mm and a clear aperture of 68.6 mm. The distance between the third lens 300 and the second lens 200 on the central axis is 0.1mm, the thickness of the third lens 300 on the central axis is 10.8mm, the distance between the fourth lens 400 and the third lens 300 on the central axis is 0.2mm, and the thickness of the fourth lens 400 on the central axis is 10.3 mm.
Through the parameter setting, the light is preliminarily collimated, so that the light becomes approximate parallel light with a large caliber, and the size is reduced while the imaging quality is ensured.
In some embodiments, the fifth lens element 500 and the sixth lens element 600 form a separate lens element, an air layer is formed between the fifth lens element 500 and the sixth lens element 600, the fifth lens element 500 is a biconvex lens element, and a surface of the sixth lens element 600 close to the object side is a concave surface and a surface close to the image side is a convex surface. The material of the fifth lens 500 is H-ZF52 and the material of the sixth lens 600 is H-ZF 88.
In particular, in some embodiments, a surface of the fifth lens element 500 close to the image side has a radius of curvature of 69.09mm and a clear aperture of 69.8mm, a surface of the sixth lens element 600 close to the object side has a radius of curvature of-1348 mm and a clear aperture of 70mm, a surface of the sixth lens element 600 close to the image side has a radius of curvature of 184.93mm and a clear aperture of 72.5mm, and a surface of the sixth lens element close to the object side has a radius of curvature of 57.28mm and a clear aperture of 68.8 mm. The distance between the aperture stop 900 and the fourth lens 400 on the central axis is 0.1mm, the distance between the fifth lens 500 and the aperture stop 900 on the central axis is 0.1mm, the thickness of the fifth lens 500 on the central axis is 14.9mm, the distance between the sixth lens 600 and the fifth lens 500 on the central axis is 2.5mm, and the thickness of the sixth lens 600 on the central axis is 8.3 mm.
Through the technical scheme and parameter setting, the air layer is arranged between the fifth lens 500 and the sixth lens 600 to introduce the high-level spherical aberration, and the introduced high-level spherical aberration is used for correcting residual aberration in the optical system, so that the imaging quality is improved, and the size is reduced.
Further, in some embodiments, the seventh lens 700 is a thick lens, a surface of the seventh lens 700 near the image side has a radius of curvature of-201.97 mm and a clear aperture of 60.8mm, and a surface of the seventh lens 700 near the object side has a radius of curvature of-63.58 mm and a clear aperture of 73.6 mm. The distance between the seventh lens 700 and the sixth lens 600 on the central axis is 0.1mm, and the thickness of the seventh lens 700 on the central axis is 29.9mm
With the above parameter settings, the seventh lens 700 is used to correct the curvature of field of the system, obtaining a flat-field imaging effect, and reducing the size while ensuring the imaging quality.
Further, in some embodiments, a surface of the eighth lens element 800 close to the image side has a radius of curvature of 6477mm and a clear aperture of 3.7mm, and a surface close to the object side has a radius of curvature of 4.75mm and a clear aperture of 3.7 mm. The distance between the eighth lens 800 and the seventh lens 700 on the central axis is 61.5mm, and the thickness of the eighth lens 800 on the central axis is 6 mm.
Wherein the central axis coincides with the optical axis.
The light is transmitted through the parameter setting, the collimation of light is completed by using the eighth lens 800, a parallel light beam with good quality is obtained, and the size is shortened while the imaging quality is ensured.
As one of the most preferred solutions, the parameter settings of the optical system are shown in the following table:
| number of noodles | Name (R) | Radius of curvature | At intervals of mm | Material | Clear aperture mm |
| 1 | Eighth lens element | 6477 | 6 | H-ZF88 | Φ3.7 |
| 2 | 4.75 | 61.5 | Φ3.7 | ||
| 3 | Seventh lens element | -201.97 | 29.9 | H-ZF88 | Φ60.8 |
| 4 | -63.58 | 0.1 | Φ73.6 | ||
| 5 | Sixth lens element | 184.93 | 8.3 | H-ZF88 | Φ72.5 |
| 6 | 57.28 | 2.5 | Φ68.8 | ||
| 7 | Fifth lens element | 69.09 | 14.9 | H-ZF52 | Φ69.8 |
| 8 | -1348 | 0.1 | Φ70.0 | ||
| 9 | Diaphragm | ∞ | 0.1 | Φ69.5 | |
| 10 | Fourth lens | 118.38 | 10.3 | H-ZF52 | Φ70.0 |
| 11 | 4582 | 0.2 | Φ68.6 | ||
| 12 | Third lens | 45.38 | 10.8 | H-ZF52 | Φ62.2 |
| 13 | 64.78 | 0.1 | Φ56.8 | ||
| 14 | Second lens | 24.12 | 12.7 | H-ZF52 | Φ45.6 |
| 15 | First lens | 25.48 | 12.4 | H-K9L | Φ36.0 |
| 16 | ∞ | 6 | Φ33.4 | ||
| 17 | Article surface | ∞ | / | Water or biological infusion | Φ0.025 |
Note that the mirror surfaces represented by the surface numbers correspond to the mirror surfaces of the respective lenses arranged in order from the image side to the object side along the optical axis, and the positive and negative of the curvature radius represent only the concave and convex of the lens.
Through the parameter setting, the technical indexes of the optical system are as follows:
object-side numerical aperture: 1.2;
object space imaging size: 0.025 mm;
object space working distance: 6 mm;
imaging wavelength: 532 nm;
multiplying power: 100X;
total optical length: less than or equal to 170 mm.
The optical system is mainly used for solving the problem of high-level aberration correction caused by large numerical aperture imaging under long working distance. In order to realize high resolution better than 270nm, the numerical aperture of a microscopic optical system reaches more than 1.2; as the working distance reaches 6mm, the aperture of the optical lens is rapidly increased, and the high-order aberrations related to the aperture such as spherical aberration, sine aberration and the like are sharply increased, including fifth-order and seventh-order high-order aberrations. In order to solve the problem of high-level aberration correction, a complicated telephoto type structure is adopted, a lens group close to one side of an object plane is designed in a complicated mode, nearly non-vignetting cemented lens is adopted to bear focal power, and introduction of aberration is reduced; a double-separation lens is adopted to introduce high-grade positive spherical aberration and correct the residual aberration of the system; a thick lens is used to correct curvature of field and shorten the system length. From the aberration correction result, the design is more perfect to correct spherical aberration, sinusoidal aberration and other monochromatic aberrations; the imaging quality close to the diffraction limit is obtained, the imaging resolution is better than 270nm under the condition that the working distance reaches 6mm, the focal length of an objective lens is 2mm, and 100-time high-magnification imaging can be realized after the imaging resolution is combined with a standard cylindrical lens, which cannot be realized by the existing products on the market. The total length of the optical system is only 170mm, and the imaging quality close to the diffraction limit is achieved by only adopting 8 lenses, so that the optical system has the advantages of compact system and low manufacturing cost, and is favorable for popularization.
FIG. 2 shows the distribution of the optical transfer function curve of the whole optical system in the above example of the present invention, and the average optical transfer function value of the optical system reaches 0.4 at 1850lp/mm, which is close to the diffraction limit and has good imaging quality.
Fig. 3 shows the wave aberration distribution profile of the entire optical system in the above example of the present invention, with a minimum rms wave aberration of 0.012 λ, a maximum of 0.08 λ, and an average of 0.049 λ, and the remaining aberration is small and substantially reaches the diffraction limit.
Further, the present application also provides an optical apparatus equipped with the above-described high-magnification microscopic imaging optical system.
Through the technical scheme, the optical system is arranged on the optical device, the imaging quality close to the diffraction limit is achieved only by adopting 8 lenses, and the optical system has the advantages of compact system and low manufacturing cost, and is favorable for popularization.
The above description is only an example of the present application and is not intended to limit the scope of the present application, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, improvement and the like made within the spirit and principle of the present application shall be included in the protection scope of the present application.
Claims (10)
1. A high power microscopic imaging optical system, comprising: arranged in order from an object side to an image side along an optical axis:
the first lens group is sequentially arranged from the object side to the image side along an optical axis and comprises:
the lens comprises a first lens with positive focal power, a second lens and a third lens, wherein one surface of the first lens close to the object side is a plane, one surface of the first lens close to the image side is a convex surface, the radius of curvature of one surface of the first lens close to the image side is 25.48mm, the clear aperture of the first lens close to the object side is 33.4mm, and the clear aperture of the first lens close to the image side is 36 mm;
the surface, close to the object side, of the second lens is a concave surface, the surface, close to the image side, of the second lens is a convex surface, the curvature radius of the surface, close to the object side, of the second lens is 25.48mm, the curvature radius of the surface, close to the image side, of the second lens is 24.12mm, the clear aperture, close to the object side, of the second lens is 36mm, and the clear aperture, close to the image side, of the second lens is 45.6 mm;
the surface, close to the object side, of the third lens is a concave surface, the surface, close to the image side, of the third lens is a convex surface, the radius of curvature of the surface, close to the image side, of the third lens is 45.38mm, the clear aperture is 62.2mm, the radius of curvature of the surface, close to the object side, of the third lens is 64.78mm, and the clear aperture is 56.8 mm;
the surface, close to the object side, of the fourth lens is a concave surface, the surface, close to the image side, of the fourth lens is a convex surface, the radius of curvature of the surface, close to the image side, of the fourth lens is 118.38mm, the clear aperture is 70mm, the radius of curvature of the surface, close to the object side, of the fourth lens is 4582mm, and the clear aperture is 68.6 mm;
the surface, close to the object side, of the fifth lens is a convex surface, the surface, close to the image side, of the fifth lens is a convex surface, the radius of curvature of the surface, close to the image side, of the fifth lens is 69.09mm, the clear aperture is 69.8mm, the radius of curvature of the surface, close to the object side, of the fifth lens is-1348 mm, and the clear aperture is 70 mm;
the surface, close to the object side, of the sixth lens is a concave surface, the surface, close to the image side, of the sixth lens is a convex surface, the radius of curvature of the surface, close to the image side, of the sixth lens is 184.93mm, the clear aperture is 72.5mm, the radius of curvature of the surface, close to the object side, of the sixth lens is 57.28mm, and the clear aperture is 68.8 mm;
the surface, close to the object side, of the seventh lens is a convex surface, the surface, close to the image side, of the seventh lens is a concave surface, the radius of curvature of the surface, close to the image side, of the seventh lens is-201.97 mm, the clear aperture is 60.8mm, the radius of curvature of the surface, close to the object side, of the seventh lens is-63.58 mm, and the clear aperture is 73.6 mm;
a second lens group comprising:
the surface, close to the object side, of the eighth lens is a concave surface, the surface, close to the image side, of the eighth lens is a convex surface, the radius of curvature of the surface, close to the image side, of the eighth lens is 6477mm, the clear aperture is 3.7mm, the radius of curvature of the surface, close to the object side, of the eighth lens is 4.75mm, and the clear aperture is 3.7 mm;
the ratio of the focal power phi A of the first lens group to the focal power phi of the whole optical system satisfies the following conditions:
0.055≤φA/φ≤0.075；
the ratio of the focal power phi B of the second lens group to the focal power phi of the whole optical system satisfies the following conditions:
-0.5≤φB/φ≤-0.3。
2. the high-magnification microscopic imaging optical system according to claim 1, wherein an aperture stop is disposed between the fourth lens and the fifth lens.
3. The high-power microscopic imaging optical system according to claim 2, wherein the distance between the third lens and the second lens on the central axis is 0.1mm, the distance between the fourth lens and the third lens on the central axis is 0.2mm, the distance between the aperture stop and the fourth lens on the central axis is 0.1mm, the distance between the fifth lens and the aperture stop on the central axis is 0.1mm, the distance between the sixth lens and the fifth lens on the central axis is 2.5mm, the distance between the seventh lens and the sixth lens on the central axis is 0.1mm, the distance between the eighth lens and the seventh lens on the central axis is 61.5mm, the thickness of the first lens on the central axis is 12.4mm, the thickness of the second lens on the central axis is 12.7mm, and the thickness of the third lens on the central axis is 10.8mm, the thickness of fourth lens on the axis is 10.3mm, the thickness of fifth lens on the axis is 14.9mm, the thickness of sixth lens on the axis is 8.3mm, the thickness of seventh lens on the axis is 29.9mm, the thickness of eighth lens on the axis is 6 mm.
4. The high power microscopic imaging optical system according to claim 3, wherein said first lens and said second lens constitute a double cemented lens.
5. The large-magnification microscopic imaging optical system according to claim 1, wherein an air layer is provided between the fifth lens and the sixth lens.
6. The large-magnification microscopic imaging optical system according to claim 1, wherein a distance L from an object plane to the first lens and an optical system focal length f satisfy: l is more than or equal to 3 f.
7. The large-magnification microscopic imaging optical system as claimed in claim 4, wherein the material of the first lens is H-K9L, and the material of the second lens is H-ZF 52.
8. The large-magnification microscopic imaging optical system as claimed in claim 5, wherein the material of the fifth lens is H-ZF52, and the material of the sixth lens is H-ZF 88.
9. The large-magnification microscopic imaging optical system as claimed in claim 1, wherein the material of the third lens is H-ZF52, the material of the fourth lens is H-ZF52, the material of the seventh lens is H-ZF88, and the material of the eighth lens is H-ZF 88.
10. An optical device carrying the high magnification microscopic imaging optical system according to any one of claims 1 to 9.
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113933976A (en) * | 2021-10-25 | 2022-01-14 | 季华实验室 | Long-focus dual-waveband infrared optical system |
| CN114236800A (en) * | 2021-12-21 | 2022-03-25 | 中国科学院长春光学精密机械与物理研究所 | Micro-distance self-immersion type microscopic imaging system and microscopic imaging method thereof |
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| CN102621668A (en) * | 2012-04-21 | 2012-08-01 | 张家港鹏博光电科技有限公司 | Projection optical system |
| CN105629443A (en) * | 2016-03-30 | 2016-06-01 | 浙江大华技术股份有限公司 | Lens system and camera lens |
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2021
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Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102621668A (en) * | 2012-04-21 | 2012-08-01 | 张家港鹏博光电科技有限公司 | Projection optical system |
| CN105629443A (en) * | 2016-03-30 | 2016-06-01 | 浙江大华技术股份有限公司 | Lens system and camera lens |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113933976A (en) * | 2021-10-25 | 2022-01-14 | 季华实验室 | Long-focus dual-waveband infrared optical system |
| CN113933976B (en) * | 2021-10-25 | 2023-07-25 | 季华实验室 | Long-focus dual-band infrared optical system |
| CN114236800A (en) * | 2021-12-21 | 2022-03-25 | 中国科学院长春光学精密机械与物理研究所 | Micro-distance self-immersion type microscopic imaging system and microscopic imaging method thereof |
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