CN210072183U - Wide-spectrum large-numerical aperture ultrahigh-flux microscope objective optical system - Google Patents
Wide-spectrum large-numerical aperture ultrahigh-flux microscope objective optical system Download PDFInfo
- Publication number
- CN210072183U CN210072183U CN201920583994.2U CN201920583994U CN210072183U CN 210072183 U CN210072183 U CN 210072183U CN 201920583994 U CN201920583994 U CN 201920583994U CN 210072183 U CN210072183 U CN 210072183U
- Authority
- CN
- China
- Prior art keywords
- lens group
- lens
- optical system
- wide
- positive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Landscapes
- Lenses (AREA)
Abstract
The wide-spectrum large-numerical-aperture ultrahigh-flux microscope objective optical system comprises a first lens group, a second lens group, a third lens group, a fourth lens group and twenty lenses in total, wherein the first lens group, the second lens group, the third lens group and the fourth lens group are sequentially arranged from an object plane to an image plane along the optical axis direction of the optical system; the first lens group is a catadioptric lens group, images light emitted by the object plane to a primary image surface through twice folded optical paths, and has positive focal power; the second lens group and the third lens group image the light rays passing through the primary image surface to a secondary image surface, and both the second lens group and the third lens group have negative focal power; the fourth lens group images the light rays passing through the secondary image surface to an image plane. The optical system has the advantages of small structure size, wide imaging spectrum and large field angle.
Description
Technical Field
The invention relates to a microscope objective optical system, in particular to a microscope objective optical system with wide spectrum, large numerical aperture and ultrahigh flux.
Background
The gene sequencing equipment is used as an intersection of three technologies of nano technology, biology technology and information technology, intensively embodies that people adopt the most advanced scientific technology to explore life information, and becomes an important guarantee for the continuous development of economy and national safety and stability at present. Gene sequencing is an emerging industry and is in a rapid development stage. The key technology of the technology is that the ultra-high flux microscope objective becomes a bottleneck technology limiting the localization of the gene sequencer (sequencing flux refers to data output quantity obtained by gene sequencing equipment within a certain time and is one of important indexes for evaluating the advancement of the sequencing technology, and higher sequencing flux also means the reduction of sequencing cost). In the design of an optical system, the length of a wide field and high resolution are reduced, the width is not precise, and the precision is not wide, which is the biggest difficulty encountered by the current ultrahigh-flux microscope objective.
The objective lens is used as a core optical element of the high-throughput gene sequencer, is a key for realizing high-throughput and even ultrahigh-throughput gene sequencing, and meanwhile, the current popular research directions of high-throughput gene sequencing, cerebral neuron detection, cancer cell development monitoring and the like in the biomedical field all have urgent needs for wide-field-of-view and high-resolution optical systems.
At present, a plurality of immersion type large numerical aperture gene sequencing lenses similar to the structure form of the patent can be inquired internationally: patent US20080247036, see in particular fig. 1. The optical lens only has 7 lenses, two lens materials of BK7 and Caf2 are adopted to correct chromatic aberration, imaging is carried out in the range of a visible light spectrum band of 480nm-660nm, the numerical aperture of the system is 1.2, and the imaging field of view is only 0.25 mm.
Patent US7180658, see in particular fig. 2. The optical lens comprises 14 lenses, images are formed in a spectrum range of 297nm-313nm in an ultraviolet band by adopting fused quartz and calceium fluoride, the numerical aperture of the system is about 0.9, and the imaging field of view is only 0.28 mm; the system exit pupil is inside the system, and the larger size of the rear cylinder lens leads to a larger structural size of the whole system.
The biggest defect of the prior art is that the whole length of an optical system is too long, and meanwhile, chromatic aberration of the system is corrected by adopting various optical materials, so that the design difficulty is high, and the consistency of various materials is difficult to control in the mass production stage; meanwhile, the imaging spectrum of the current objective lens is narrow, and the imaging field angle is small.
Disclosure of Invention
The invention aims to overcome the defects in the prior art and provides a wide-spectrum large-numerical-aperture ultrahigh-flux microobjective optical system, which sequentially comprises a first lens group, a second lens group, a third lens group, a fourth lens group and twenty lenses in total from an object plane to an image plane along the optical axis direction of the optical system;
the first lens group is a catadioptric lens group, images light emitted by the object plane to a primary image surface through twice folded light paths, and has positive focal power;
the second lens group and the third lens group image light rays passing through the primary image surface to a secondary image surface, and both the second lens group and the third lens group have negative focal power;
the fourth lens group images the light rays passing through the secondary image surface to an image plane.
Further, the first lens group includes three lenses, and a first plano-convex positive lens, a first negative meniscus lens, and a second negative meniscus lens, which are convex toward the image plane in order from the object plane to the image plane along the optical axis direction.
Further, the second lens group includes four lenses, and a first positive meniscus lens, a second positive plano-convex lens, a second positive meniscus lens, and a third positive meniscus lens, which are convex to the image plane, are sequentially disposed along the optical axis from the object plane to the image plane.
Further, the third lens group includes five lenses, and a first biconvex positive lens, a third negative meniscus lens, a second biconvex positive lens, a third plano-convex positive lens convex to the object plane, and a fourth negative meniscus lens are sequentially arranged along the optical axis direction from the object plane to the image plane.
Further, the fourth lens group includes eight lenses, and a fourth positive meniscus lens, a fifth positive meniscus lens, a sixth positive meniscus lens, a biconcave negative lens, a seventh positive meniscus lens, an eighth positive meniscus lens, a ninth positive meniscus lens, and a fourth plano-convex positive lens convex to the object plane are sequentially disposed from the object plane to the image plane along the optical axis direction.
Further, a stop (21) is disposed between the second lens group and the third lens group.
Furthermore, the object plane position of the optical system adopts an immersion mode.
Further, the numerical aperture of the optical system is less than or equal to 1.0, and the imaging line field of view is less than or equal to 2.8 mm.
Further, the imaging spectrum of the optical system is 300nm-800 nm.
Furthermore, the optical system is made of the same material, and the material of the optical system is fused quartz material.
The invention has the beneficial effects that:
(1) the microscope objective optical system adopts a catadioptric optical scheme, folds an optical path, and arranges the exit pupil of the system outside the system, thereby reducing the size of the rear tube lens system;
(2) the existing optical scheme needs to adopt a plurality of optical materials to correct the chromatic aberration of the system; the optical material is adopted, so that the correction is convenient.
(3) Under the condition that the numerical aperture of the system is 1.0, the visual field of an imaging line is increased to 2.8mm, and all indexes are superior to those of the prior art.
Drawings
Fig. 1 is a schematic structural diagram of an optical lens of patent 1 in the background art;
fig. 2 is a schematic structural diagram of an optical lens of patent 2 in the background art;
fig. 3 is a schematic structural diagram of an optical system of a microscope objective according to an embodiment of the present application.
1. A first plano-convex positive lens; 2. a first negative meniscus lens; 3. a second negative meniscus lens;
4. a first positive meniscus lens; 5. a second plano-convex positive lens; 6. a second positive meniscus lens;
7. a third positive meniscus lens; 8. a first biconvex positive lens; 9. a third negative meniscus lens;
10. a second biconvex positive lens; 11. a third plano-convex positive lens; 12. a fourth negative meniscus lens;
13. a fourth positive meniscus lens; 14. a fifth meniscus positive lens; 15. a sixth positive meniscus lens;
16. a biconcave negative lens; 17. a seventh positive meniscus lens; 18. an eighth positive meniscus lens;
19. a ninth meniscus positive lens; 20. a fourth plano-convex positive lens;
21. a diaphragm; 22. an exit pupil; 23. a primary image plane; 24. and (5) secondary image surface.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention will be described in further detail below with reference to the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not to be construed as limiting the invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
The terms "comprises," "comprising," and "having," and any variations thereof, in the description and claims of this invention, are intended to cover a non-exclusive inclusion, such that a process, method, system, article, or apparatus that comprises a list of steps or elements is not necessarily limited to those steps or elements expressly listed, but may include other steps or elements not expressly listed or inherent to such process, method, article, or apparatus.
Example (b):
the wide-spectrum large-numerical-aperture ultrahigh-flux microscope objective optical system comprises a first lens group, a second lens group, a third lens group, a fourth lens group and twenty lenses in total, wherein the first lens group, the second lens group, the third lens group and the fourth lens group are sequentially arranged from an object plane to an image plane along the optical axis direction of the optical system;
the first lens group is a catadioptric lens group, images light emitted by the object plane to a primary image surface through twice folded optical paths, and has positive focal power;
the second lens group and the third lens group image the light rays passing through the primary image surface to a secondary image surface, and both the second lens group and the third lens group have negative focal power;
the fourth lens group images the light rays passing through the secondary image surface to an image plane.
The first lens group comprises three lenses, namely a first plano-convex positive lens 1, a first negative meniscus lens 2 and a second negative meniscus lens 3 which are convex to an image plane in sequence from an object plane to the image plane along the optical axis direction.
The second lens group comprises four lenses, and a first positive meniscus lens 4, a second plano-convex positive meniscus lens 5 convex to the image plane, a second positive meniscus lens 6 and a third positive meniscus lens 7 are sequentially arranged from the object plane to the image plane along the optical axis direction.
The third lens group comprises five lenses, namely a first biconvex positive lens 8, a third negative meniscus lens 9, a second biconvex positive lens 10, a third plano-convex positive lens 11 and a fourth negative meniscus lens 12 which are convex to the object plane in sequence from the object plane to the image plane along the optical axis direction.
The fourth lens group comprises eight lenses, and a fourth positive meniscus lens 13, a fifth positive meniscus lens 14, a sixth positive meniscus lens 15, a biconcave negative lens 16, a seventh positive meniscus lens 17, an eighth positive meniscus lens 18, a ninth positive meniscus lens 19 and a fourth plano-convex positive lens 20 which is convex to the object plane are sequentially arranged from the object plane to the image plane along the optical axis direction.
A stop 21 is disposed between the second lens group and the third lens group.
The numerical aperture of the optical system is less than or equal to 1.0, and the imaging line field of view is less than or equal to 2.8 mm.
The imaging spectral band of the optical system is 300nm-800 nm.
The optical system is made of the same material, and the material of the optical system is fused quartz material.
The invention adopts a catadioptric optical system form, utilizes 2-time folded light paths to move the system exit pupil out of the system, effectively corrects the high-level spherical aberration of the system, controls astigmatism, curvature of field and initial high-level coma aberration related to a view field, ensures that the total length of the optical system is less than 230mm, adopts the same optical material for the whole optical system, has an imaging spectrum section of 300-800 nm, combines rear-end immersion liquid, has a system numerical aperture of 1.0 and has a system imaging line view field of 2.8 mm.
According to the design of a forward light path, an object plane adopts an immersion method, and the numerical aperture of the system is increased; imaging to the position of a primary image surface 23 through the first lens group, and effectively reducing the central obstruction of the first negative meniscus lens 2; imaging to a position of a secondary image surface 24 through the second lens group and the third lens group, wherein a system aperture diaphragm is arranged between the third lens group and the second lens group; the fourth lens group is used for collimating light of the secondary image surface into parallel light and emitting the parallel light to the outside of the system, the calibers of the lenses of the second lens group and the third lens group are integrally reduced, the exit pupil of the system is moved outwards, the exit pupil 22 of the optical system is positioned at the 27.3mm position on the left side of the plano-convex positive lens 20, protruding to the object plane, of the fourth lens group, and the integral optical size of the subsequent optical system is effectively reduced.
Table 1 shows the basic parameters of the optical system in the embodiment of the present application, and please refer to table 1 for specific parameters.
| Operating band | 300nm-800nm |
| Numerical aperture | 1.0 |
| Field of view | 2.8mm |
| Refractive index of fused silica | 1.4585 |
| Refractive index of immersion liquid | 1.3652 |
Table 2 shows specific parameters of each lens of the optical system in the embodiment of the present application, please refer to table 2. The surface numbers in table 2 are counted in the direction from the object plane to the exit pupil, and for example, the surface of the first plano-convex positive lens 1 of the first lens group facing the object plane is number 1, the surface facing the exit pupil is number 2, the surface of the first meniscus negative lens 2 facing the object plane is number 3, the surface facing the exit pupil is number 4, and the other mirror surfaces are numbered in the same way.
In the description of the present invention, it is to be understood that the terms "central," "longitudinal," "lateral," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "axial," "radial," "circumferential," and the like are used in the orientations and positional relationships indicated in the drawings for convenience in describing the invention and for simplicity in description, and are not intended to indicate or imply that the referenced device or element must have a particular orientation, be constructed and operated in a particular orientation, and are not to be construed as limiting the invention.
In the present invention, unless otherwise expressly stated or limited, the first feature "on" or "under" the second feature may be directly contacting the first and second features or indirectly contacting the first and second features through an intermediate. Also, a first feature "on," "over," and "above" a second feature may be directly or diagonally above the second feature, or may simply indicate that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature may be directly under or obliquely under the first feature, or may simply mean that the first feature is at a lesser elevation than the second feature.
Although embodiments of the present invention have been shown and described above, it is understood that the above embodiments are exemplary and should not be construed as limiting the present invention, and that variations, modifications, substitutions and alterations can be made to the above embodiments by those of ordinary skill in the art within the scope of the present invention.
The above-described embodiments of the present invention should not be construed as limiting the scope of the present invention. Any other corresponding changes and modifications made according to the technical idea of the present invention should be included in the protection scope of the claims of the present invention.
Claims (10)
1. The wide-spectrum large-numerical-aperture ultrahigh-flux microscope objective optical system is characterized in that the optical system sequentially comprises a first lens group, a second lens group, a third lens group, a fourth lens group and twenty lenses in total from an object plane to an image plane along the optical axis direction of the optical system;
the first lens group is a catadioptric lens group, images light emitted by the object plane to a primary image surface through twice folded light paths, and has positive focal power;
the second lens group and the third lens group image light rays passing through the primary image surface to a secondary image surface, and both the second lens group and the third lens group have negative focal power;
the fourth lens group images the light rays passing through the secondary image surface to an image plane.
2. The wide-spectrum large-numerical-aperture ultrahigh-flux microobjective optical system according to claim 1, wherein the first lens group comprises three lenses, and a first plano-convex positive lens (1), a first negative meniscus lens (2) and a second negative meniscus lens (3) which are convex to the image plane in sequence from the object plane to the image plane along the optical axis direction.
3. The wide-spectrum large-numerical-aperture ultrahigh-flux microobjective optical system according to claim 1, wherein the second lens group comprises four lenses, and a first positive meniscus lens (4), a second positive plano-convex lens (5) convex to the image plane, a second positive meniscus lens (6) and a third positive meniscus lens (7) are arranged in sequence from the object plane to the image plane along the optical axis direction.
4. The wide-band large-numerical-aperture ultrahigh-flux microobjective optical system according to claim 1, wherein the third lens group comprises five lenses, and a first biconvex positive lens (8), a third negative meniscus lens (9), a second biconvex positive lens (10), a third plano-convex positive lens (11) convex to the object plane, and a fourth negative meniscus lens (12) are arranged in sequence from the object plane to the image plane along the optical axis direction.
5. The wide-spectrum large-numerical-aperture ultrahigh-flux microobjective optical system according to claim 1, wherein the fourth lens group comprises eight lenses, and a fourth positive meniscus lens (13), a fifth positive meniscus lens (14), a sixth positive meniscus lens (15), a double concave negative lens (16), a seventh positive meniscus lens (17), an eighth positive meniscus lens (18), a ninth positive meniscus lens (19) and a fourth positive plano-convex lens (20) convex to the object plane are arranged in sequence from the object plane to the image plane along the optical axis direction.
6. The wide-band large-numerical-aperture ultra-high-flux microobjective optical system of claim 1, wherein a stop (21) is disposed between the second lens group and the third lens group.
7. The wide-band large-na ultra-high-flux microobjective optical system of claim 1 in which the object plane position of the optical system is in immersion mode.
8. The wide-band large-numerical-aperture ultrahigh-flux microobjective optical system of claim 1, wherein the numerical aperture of the optical system is 1.0 or less, and the imaging line field of view is 2.8mm or less.
9. The wide-band large-numerical-aperture ultrahigh-flux microobjective optical system of claim 1, wherein an imaging spectrum of the optical system is 300nm to 800 nm.
10. The wide-band large-numerical-aperture ultrahigh-flux microobjective optical system of claim 1, wherein the optical system is made of the same material, and the material of the optical system is fused quartz.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920583994.2U CN210072183U (en) | 2019-04-26 | 2019-04-26 | Wide-spectrum large-numerical aperture ultrahigh-flux microscope objective optical system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920583994.2U CN210072183U (en) | 2019-04-26 | 2019-04-26 | Wide-spectrum large-numerical aperture ultrahigh-flux microscope objective optical system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN210072183U true CN210072183U (en) | 2020-02-14 |
Family
ID=69449277
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201920583994.2U Active CN210072183U (en) | 2019-04-26 | 2019-04-26 | Wide-spectrum large-numerical aperture ultrahigh-flux microscope objective optical system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN210072183U (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110045492A (en) * | 2019-04-26 | 2019-07-23 | 中国科学院长春光学精密机械与物理研究所 | The microcobjective optical system of wide spectrum large-numerical aperture ultra-high throughput |
| CN112180577A (en) * | 2020-09-25 | 2021-01-05 | 中国科学院西安光学精密机械研究所 | Visible light-short wave infrared-medium wave infrared-long wave infrared four-waveband optical system |
| CN115598819A (en) * | 2022-10-17 | 2023-01-13 | 佛山迈奥光学科技有限公司（Cn） | High-resolution large-view-field immersion liquid microobjective |
| CN117270185A (en) * | 2023-11-17 | 2023-12-22 | 长春长光智欧科技有限公司 | Micro-optical system with large numerical aperture and wide spectrum |
-
2019
- 2019-04-26 CN CN201920583994.2U patent/CN210072183U/en active Active
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110045492A (en) * | 2019-04-26 | 2019-07-23 | 中国科学院长春光学精密机械与物理研究所 | The microcobjective optical system of wide spectrum large-numerical aperture ultra-high throughput |
| WO2020215867A1 (en) * | 2019-04-26 | 2020-10-29 | 中国科学院长春光学精密机械与物理研究所 | Microscope objective optical system having wide spectrum, large numerical aperture, and ultra-high flux |
| CN110045492B (en) * | 2019-04-26 | 2024-03-15 | 中国科学院长春光学精密机械与物理研究所 | Wide-spectrum large-numerical aperture ultrahigh-flux micro-objective optical system |
| CN112180577A (en) * | 2020-09-25 | 2021-01-05 | 中国科学院西安光学精密机械研究所 | Visible light-short wave infrared-medium wave infrared-long wave infrared four-waveband optical system |
| CN112180577B (en) * | 2020-09-25 | 2021-07-27 | 中国科学院西安光学精密机械研究所 | Visible light-short wave infrared-medium wave infrared-long wave infrared four-waveband optical system |
| CN115598819A (en) * | 2022-10-17 | 2023-01-13 | 佛山迈奥光学科技有限公司（Cn） | High-resolution large-view-field immersion liquid microobjective |
| CN117270185A (en) * | 2023-11-17 | 2023-12-22 | 长春长光智欧科技有限公司 | Micro-optical system with large numerical aperture and wide spectrum |
| CN117270185B (en) * | 2023-11-17 | 2024-02-20 | 长春长光智欧科技有限公司 | Micro-optical system with large numerical aperture and wide spectrum |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN210072183U (en) | Wide-spectrum large-numerical aperture ultrahigh-flux microscope objective optical system | |
| CN110045492B (en) | Wide-spectrum large-numerical aperture ultrahigh-flux micro-objective optical system | |
| US7253972B2 (en) | Telephoto lens system | |
| EP2192434B1 (en) | Immersion microscope objective lens | |
| CN109061862B (en) | Microscope objective lens with large visual field number | |
| CN211669436U (en) | Wide-spectrum and large-numerical-aperture microscope objective | |
| CN113866966B (en) | Imaging lens of gene sequencer, gene sequencer and gene sequencing system | |
| KR20160022908A (en) | Lenses for curved sensor systems | |
| JP2011048086A (en) | Optical system | |
| WO2021129026A1 (en) | Wide-spectral-segment and large-numerical-aperture microscopic objective lens | |
| JP2011107313A5 (en) | ||
| US10948704B2 (en) | Objective for a confocal microscope | |
| JP6252173B2 (en) | Projector device | |
| CN113376820B (en) | Large-magnification microscopic imaging optical system and optical device | |
| JP6260274B2 (en) | Zoom optical system for projection | |
| US8284494B2 (en) | Optical system | |
| CN109683283B (en) | Finite far conjugate optical system with equidistant object and image | |
| JPS581117A (en) | Photographic lens | |
| JP2019194675A (en) | Fixed-focus length objective lens | |
| CN110618518B (en) | Imaging lens system and image pickup apparatus | |
| EP2492733A1 (en) | Optical system | |
| CN115061265B (en) | Compact logistics scanning detection lens | |
| CN110462486B (en) | Lens system for macro lens for quality assurance in industrial processes | |
| CN117647880B (en) | Immersion type high numerical aperture wide spectrum micro objective optical system | |
| EP2680060B1 (en) | Lens design forms with no 3rd or 5th order aberrations |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |