CN113238459B - 光学装置、曝光装置以及物品制造方法 - Google Patents

光学装置、曝光装置以及物品制造方法 Download PDF

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Publication number
CN113238459B
CN113238459B CN202110140250.5A CN202110140250A CN113238459B CN 113238459 B CN113238459 B CN 113238459B CN 202110140250 A CN202110140250 A CN 202110140250A CN 113238459 B CN113238459 B CN 113238459B
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CN
China
Prior art keywords
exposure
lens barrel
gas
exposure device
setting mechanism
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202110140250.5A
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English (en)
Chinese (zh)
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CN113238459A (zh
Inventor
木村良一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of CN113238459A publication Critical patent/CN113238459A/zh
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/008—Mountings, adjusting means, or light-tight connections, for optical elements with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Lens Barrels (AREA)
CN202110140250.5A 2020-02-06 2021-02-02 光学装置、曝光装置以及物品制造方法 Active CN113238459B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020-018861 2020-02-06
JP2020018861A JP7427461B2 (ja) 2020-02-06 2020-02-06 露光装置、及び物品の製造方法

Publications (2)

Publication Number Publication Date
CN113238459A CN113238459A (zh) 2021-08-10
CN113238459B true CN113238459B (zh) 2024-09-13

Family

ID=77130109

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202110140250.5A Active CN113238459B (zh) 2020-02-06 2021-02-02 光学装置、曝光装置以及物品制造方法

Country Status (4)

Country Link
JP (1) JP7427461B2 (https=)
KR (1) KR102818067B1 (https=)
CN (1) CN113238459B (https=)
TW (2) TWI840643B (https=)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016095412A (ja) * 2014-11-14 2016-05-26 キヤノン株式会社 露光装置、および物品の製造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1092735A (ja) * 1996-09-13 1998-04-10 Nikon Corp 露光装置
IL136037A0 (en) * 1997-11-12 2001-05-20 Nikon Corp Exposure apparatus, apparatus for manufacturing devices, and method of manufacturing exposure apparatuses
WO2003030229A1 (en) * 2001-09-27 2003-04-10 Nikon Corporation Aligner and method for fabricating device
JP2003124092A (ja) * 2001-10-09 2003-04-25 Canon Inc 露光装置及びその制御方法、デバイス製造方法
TWI474380B (zh) * 2003-05-23 2015-02-21 尼康股份有限公司 A method of manufacturing an exposure apparatus and an element
US7136142B2 (en) * 2004-05-25 2006-11-14 Asml Netherlands B.V. Lithographic apparatus having a gas flushing device
JP2008292761A (ja) 2007-05-24 2008-12-04 Canon Inc 露光装置及びデバイス製造方法
JP5517847B2 (ja) * 2010-09-08 2014-06-11 キヤノン株式会社 露光装置、及びそれを用いたデバイスの製造方法
JP2015079074A (ja) 2013-10-16 2015-04-23 キヤノン株式会社 露光装置
JP6896404B2 (ja) * 2016-11-30 2021-06-30 キヤノン株式会社 露光装置及び物品の製造方法
JP7016661B2 (ja) * 2017-10-06 2022-02-07 キヤノン株式会社 露光装置および物品の製造方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016095412A (ja) * 2014-11-14 2016-05-26 キヤノン株式会社 露光装置、および物品の製造方法

Also Published As

Publication number Publication date
TW202131107A (zh) 2021-08-16
TWI840643B (zh) 2024-05-01
KR102818067B1 (ko) 2025-06-11
JP2021124634A (ja) 2021-08-30
JP7427461B2 (ja) 2024-02-05
CN113238459A (zh) 2021-08-10
TWI874179B (zh) 2025-02-21
TW202429220A (zh) 2024-07-16
KR20210100528A (ko) 2021-08-17

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