CN113238459B - 光学装置、曝光装置以及物品制造方法 - Google Patents

光学装置、曝光装置以及物品制造方法 Download PDF

Info

Publication number
CN113238459B
CN113238459B CN202110140250.5A CN202110140250A CN113238459B CN 113238459 B CN113238459 B CN 113238459B CN 202110140250 A CN202110140250 A CN 202110140250A CN 113238459 B CN113238459 B CN 113238459B
Authority
CN
China
Prior art keywords
exposure
lens barrel
exposure apparatus
travel direction
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202110140250.5A
Other languages
English (en)
Chinese (zh)
Other versions
CN113238459A (zh
Inventor
木村良一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of CN113238459A publication Critical patent/CN113238459A/zh
Application granted granted Critical
Publication of CN113238459B publication Critical patent/CN113238459B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/008—Mountings, adjusting means, or light-tight connections, for optical elements with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Atmospheric Sciences (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Toxicology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Lens Barrels (AREA)
CN202110140250.5A 2020-02-06 2021-02-02 光学装置、曝光装置以及物品制造方法 Active CN113238459B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020-018861 2020-02-06
JP2020018861A JP7427461B2 (ja) 2020-02-06 2020-02-06 露光装置、及び物品の製造方法

Publications (2)

Publication Number Publication Date
CN113238459A CN113238459A (zh) 2021-08-10
CN113238459B true CN113238459B (zh) 2024-09-13

Family

ID=77130109

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202110140250.5A Active CN113238459B (zh) 2020-02-06 2021-02-02 光学装置、曝光装置以及物品制造方法

Country Status (4)

Country Link
JP (1) JP7427461B2 (enrdf_load_stackoverflow)
KR (1) KR102818067B1 (enrdf_load_stackoverflow)
CN (1) CN113238459B (enrdf_load_stackoverflow)
TW (2) TWI874179B (enrdf_load_stackoverflow)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016095412A (ja) * 2014-11-14 2016-05-26 キヤノン株式会社 露光装置、および物品の製造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1092735A (ja) * 1996-09-13 1998-04-10 Nikon Corp 露光装置
WO1999025010A1 (fr) * 1997-11-12 1999-05-20 Nikon Corporation Appareil d'exposition, appareil de fabrication de composants, et procede de fabrication d'appareils d'exposition
JPWO2003030229A1 (ja) * 2001-09-27 2005-01-20 株式会社ニコン 露光装置及びデバイス製造方法
JP2003124092A (ja) * 2001-10-09 2003-04-25 Canon Inc 露光装置及びその制御方法、デバイス製造方法
TWI616932B (zh) * 2003-05-23 2018-03-01 Nikon Corp Exposure device and component manufacturing method
US7136142B2 (en) * 2004-05-25 2006-11-14 Asml Netherlands B.V. Lithographic apparatus having a gas flushing device
JP2008292761A (ja) * 2007-05-24 2008-12-04 Canon Inc 露光装置及びデバイス製造方法
JP5517847B2 (ja) * 2010-09-08 2014-06-11 キヤノン株式会社 露光装置、及びそれを用いたデバイスの製造方法
JP2015079074A (ja) * 2013-10-16 2015-04-23 キヤノン株式会社 露光装置
JP6896404B2 (ja) * 2016-11-30 2021-06-30 キヤノン株式会社 露光装置及び物品の製造方法
JP7016661B2 (ja) * 2017-10-06 2022-02-07 キヤノン株式会社 露光装置および物品の製造方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016095412A (ja) * 2014-11-14 2016-05-26 キヤノン株式会社 露光装置、および物品の製造方法

Also Published As

Publication number Publication date
KR20210100528A (ko) 2021-08-17
TWI874179B (zh) 2025-02-21
TW202429220A (zh) 2024-07-16
JP7427461B2 (ja) 2024-02-05
KR102818067B1 (ko) 2025-06-11
TW202131107A (zh) 2021-08-16
TWI840643B (zh) 2024-05-01
JP2021124634A (ja) 2021-08-30
CN113238459A (zh) 2021-08-10

Similar Documents

Publication Publication Date Title
JP5071385B2 (ja) 可変スリット装置、照明装置、露光装置、露光方法及びデバイス製造方法
US8467032B2 (en) Exposure apparatus and electronic device manufacturing method
KR102234255B1 (ko) 노광 장치 및 물품의 제조 방법
US20160091801A1 (en) Exposure apparatus and device manufacturing method
JPH09127702A (ja) 大サイズ基板用露光装置および露光方法
JP3200244B2 (ja) 走査型露光装置
JP2007052214A (ja) 走査型露光装置及びマイクロデバイスの製造方法
CN113238459B (zh) 光学装置、曝光装置以及物品制造方法
KR20130112753A (ko) 광학계, 노광 장치 및 디바이스 제조 방법
US8363207B2 (en) Exposure apparatus, and method of manufacturing device using same
JP6238580B2 (ja) 露光装置、露光方法、それらを用いたデバイスの製造方法
JP2002229215A (ja) 露光方法及び露光装置
JP5517847B2 (ja) 露光装置、及びそれを用いたデバイスの製造方法
CN116482946A (zh) 曝光方法、曝光装置以及物品的制造方法
JP2021124634A5 (enrdf_load_stackoverflow)
JP2003318095A (ja) フレア計測方法及びフレア計測装置、露光方法及び露光装置、露光装置の調整方法
JP2007287885A (ja) 照明光学装置、露光装置、およびデバイス製造方法
JP2025072046A (ja) 露光装置、物品の製造方法、及び露光方法
JP2001118784A (ja) 露光装置及びその露光装置における疎密線幅差の補正方法並びに露光方法
JP2002270491A (ja) 露光装置、露光装置の製造方法、波面収差計測装置及びマイクロデバイスの製造方法
KR20250093208A (ko) 노광 장치, 결정 방법, 물품의 제조 방법 및 프로그램
JP2006120899A (ja) 投影光学系、投影光学系の調整方法、投影露光装置、投影露光方法、および投影露光装置の調整方法
JP2007132981A (ja) 対物光学系、収差測定装置、および露光装置
JPH10209031A (ja) 結像特性補正方法及び投影露光装置
JPH10289873A (ja) 露光装置

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant