CN113226511A - 光刻用涂布膜形成用组合物的制造方法 - Google Patents

光刻用涂布膜形成用组合物的制造方法 Download PDF

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Publication number
CN113226511A
CN113226511A CN201980082879.XA CN201980082879A CN113226511A CN 113226511 A CN113226511 A CN 113226511A CN 201980082879 A CN201980082879 A CN 201980082879A CN 113226511 A CN113226511 A CN 113226511A
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CN
China
Prior art keywords
group
lithography
filter element
coating film
metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201980082879.XA
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English (en)
Chinese (zh)
Inventor
大桥智也
吉田丰之郎
佐佐卓
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissan Chemical Corp
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Nissan Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissan Chemical Corp filed Critical Nissan Chemical Corp
Publication of CN113226511A publication Critical patent/CN113226511A/zh
Pending legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D36/00—Filter circuits or combinations of filters with other separating devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
    • B01J20/22—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising organic material
    • B01J20/26—Synthetic macromolecular compounds
    • B01J20/265—Synthetic macromolecular compounds modified or post-treated polymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
    • B01J20/22—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising organic material
    • B01J20/26—Synthetic macromolecular compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D15/00—Separating processes involving the treatment of liquids with solid sorbents; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D39/00—Filtering material for liquid or gaseous fluids
    • B01D39/14—Other self-supporting filtering material ; Other filtering material
    • B01D39/16—Other self-supporting filtering material ; Other filtering material of organic material, e.g. synthetic fibres
    • B01D39/1607—Other self-supporting filtering material ; Other filtering material of organic material, e.g. synthetic fibres the material being fibrous
    • B01D39/1623—Other self-supporting filtering material ; Other filtering material of organic material, e.g. synthetic fibres the material being fibrous of synthetic origin
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D39/00—Filtering material for liquid or gaseous fluids
    • B01D39/14—Other self-supporting filtering material ; Other filtering material
    • B01D39/16—Other self-supporting filtering material ; Other filtering material of organic material, e.g. synthetic fibres
    • B01D39/1607—Other self-supporting filtering material ; Other filtering material of organic material, e.g. synthetic fibres the material being fibrous
    • B01D39/1623—Other self-supporting filtering material ; Other filtering material of organic material, e.g. synthetic fibres the material being fibrous of synthetic origin
    • B01D39/163—Other self-supporting filtering material ; Other filtering material of organic material, e.g. synthetic fibres the material being fibrous of synthetic origin sintered or bonded
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
    • B01J20/22—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising organic material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
    • B01J20/28—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof characterised by their form or physical properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
    • B01J20/28—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof characterised by their form or physical properties
    • B01J20/28014—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof characterised by their form or physical properties characterised by their form
    • B01J20/28033—Membrane, sheet, cloth, pad, lamellar or mat
    • B01J20/28035—Membrane, sheet, cloth, pad, lamellar or mat with more than one layer, e.g. laminates, separated sheets
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D181/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing sulfur, with or without nitrogen, oxygen, or carbon only; Coating compositions based on polysulfones; Coating compositions based on derivatives of such polymers
    • C09D181/04—Polysulfides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2239/00—Aspects relating to filtering material for liquid or gaseous fluids
    • B01D2239/04—Additives and treatments of the filtering material
    • B01D2239/0407—Additives and treatments of the filtering material comprising particulate additives, e.g. adsorbents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2239/00—Aspects relating to filtering material for liquid or gaseous fluids
    • B01D2239/06—Filter cloth, e.g. knitted, woven non-woven; self-supported material
    • B01D2239/0604—Arrangement of the fibres in the filtering material
    • B01D2239/0618—Non-woven
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2239/00—Aspects relating to filtering material for liquid or gaseous fluids
    • B01D2239/06—Filter cloth, e.g. knitted, woven non-woven; self-supported material
    • B01D2239/065—More than one layer present in the filtering material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2239/00—Aspects relating to filtering material for liquid or gaseous fluids
    • B01D2239/06—Filter cloth, e.g. knitted, woven non-woven; self-supported material
    • B01D2239/069—Special geometry of layers
    • B01D2239/0695—Wound layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2239/00—Aspects relating to filtering material for liquid or gaseous fluids
    • B01D2239/12—Special parameters characterising the filtering material
    • B01D2239/1233—Fibre diameter

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Analytical Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Materials For Photolithography (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Paints Or Removers (AREA)
  • Filtering Materials (AREA)
  • Filtration Of Liquid (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)
CN201980082879.XA 2018-12-20 2019-12-18 光刻用涂布膜形成用组合物的制造方法 Pending CN113226511A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2018-238751 2018-12-20
JP2018238751 2018-12-20
PCT/JP2019/049504 WO2020130005A1 (ja) 2018-12-20 2019-12-18 リソグラフィー用塗布膜形成組成物の製造方法

Publications (1)

Publication Number Publication Date
CN113226511A true CN113226511A (zh) 2021-08-06

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN201980082879.XA Pending CN113226511A (zh) 2018-12-20 2019-12-18 光刻用涂布膜形成用组合物的制造方法

Country Status (6)

Country Link
US (1) US12153348B2 (https=)
JP (2) JPWO2020130005A1 (https=)
CN (1) CN113226511A (https=)
FI (1) FI130725B1 (https=)
TW (1) TWI859174B (https=)
WO (1) WO2020130005A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114225496A (zh) * 2021-12-07 2022-03-25 明士(北京)新材料开发有限公司 一种高性能聚合物树脂的纯化方法及纯化装置

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7498530B1 (ja) 2023-09-21 2024-06-12 室町ケミカル株式会社 有機溶媒の精製方法及び精製有機溶媒の製造方法、並びに有機溶媒の精製システム

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101523291A (zh) * 2006-10-12 2009-09-02 日产化学工业株式会社 使用通过光交联固化形成的抗蚀剂下层膜的半导体装置的制造方法
CN101910948A (zh) * 2008-01-30 2010-12-08 日产化学工业株式会社 含有硫原子的抗蚀剂下层膜形成用组合物以及抗蚀剂图案的形成方法
CN107407887A (zh) * 2015-03-31 2017-11-28 富士胶片株式会社 上层膜形成用组合物、图案形成方法、抗蚀剂图案及电子器件的制造方法
WO2018051716A1 (ja) * 2016-09-15 2018-03-22 富士フイルム株式会社 有機溶剤の精製方法および有機溶剤の精製装置
JP2018097249A (ja) * 2016-12-15 2018-06-21 Dic株式会社 レジスト用感光性樹脂組成物の製造方法
WO2018180430A1 (ja) * 2017-03-30 2018-10-04 倉敷繊維加工株式会社 フィルターカートリッジ及びフィルター

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI248829B (en) * 2002-02-27 2006-02-11 Ebara Corp Filter cartridge
JP2004330056A (ja) * 2003-05-07 2004-11-25 Ebara Corp 電子素子基板表面処理液用フィルターカートリッジ
JP5182793B2 (ja) 2007-10-12 2013-04-17 独立行政法人日本原子力研究開発機構 液体濾過用カートリッジフィルタ
JP2013061426A (ja) * 2011-09-12 2013-04-04 Nomura Micro Sci Co Ltd フォトレジスト膜形成用樹脂溶液の不純物除去方法、不純物除去用濾過部材及び不純物除去用濾過装置
JP5727350B2 (ja) 2011-10-26 2015-06-03 信越化学工業株式会社 リソグラフィー用レジスト組成物の製造方法、レジスト保護膜形成用組成物の製造方法、ケイ素含有レジスト下層膜形成用組成物の製造方法、及び有機レジスト下層膜形成用組成物の製造方法
WO2016136596A1 (ja) 2015-02-26 2016-09-01 富士フイルム株式会社 上層膜形成用組成物、並びに、それを用いたパターン形成方法及び電子デバイスの製造方法
CN107430335B (zh) 2015-04-01 2021-04-02 东丽株式会社 感光性着色树脂组合物
JP6445382B2 (ja) * 2015-04-24 2018-12-26 信越化学工業株式会社 リソグラフィー用塗布膜形成用組成物の製造方法及びパターン形成方法
KR102409417B1 (ko) 2016-05-02 2022-06-15 닛산 가가쿠 가부시키가이샤 특정 가교제를 포함하는 보호막 형성 조성물 및 이것을 이용한 패턴 형성 방법
JPWO2020184306A1 (https=) * 2019-03-11 2020-09-17

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101523291A (zh) * 2006-10-12 2009-09-02 日产化学工业株式会社 使用通过光交联固化形成的抗蚀剂下层膜的半导体装置的制造方法
CN101910948A (zh) * 2008-01-30 2010-12-08 日产化学工业株式会社 含有硫原子的抗蚀剂下层膜形成用组合物以及抗蚀剂图案的形成方法
CN107407887A (zh) * 2015-03-31 2017-11-28 富士胶片株式会社 上层膜形成用组合物、图案形成方法、抗蚀剂图案及电子器件的制造方法
WO2018051716A1 (ja) * 2016-09-15 2018-03-22 富士フイルム株式会社 有機溶剤の精製方法および有機溶剤の精製装置
JP2018097249A (ja) * 2016-12-15 2018-06-21 Dic株式会社 レジスト用感光性樹脂組成物の製造方法
WO2018180430A1 (ja) * 2017-03-30 2018-10-04 倉敷繊維加工株式会社 フィルターカートリッジ及びフィルター

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114225496A (zh) * 2021-12-07 2022-03-25 明士(北京)新材料开发有限公司 一种高性能聚合物树脂的纯化方法及纯化装置

Also Published As

Publication number Publication date
JP2023086778A (ja) 2023-06-22
FI130725B1 (en) 2024-02-12
TW202039046A (zh) 2020-11-01
US20210397091A1 (en) 2021-12-23
JPWO2020130005A1 (ja) 2021-11-04
JP7652210B2 (ja) 2025-03-27
US12153348B2 (en) 2024-11-26
KR20210102213A (ko) 2021-08-19
FI20215644A1 (en) 2021-06-03
TWI859174B (zh) 2024-10-21
WO2020130005A1 (ja) 2020-06-25

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