CN113165142B - 清洗组件及具备清洗组件的基板处理装置 - Google Patents

清洗组件及具备清洗组件的基板处理装置 Download PDF

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Publication number
CN113165142B
CN113165142B CN201980075357.7A CN201980075357A CN113165142B CN 113165142 B CN113165142 B CN 113165142B CN 201980075357 A CN201980075357 A CN 201980075357A CN 113165142 B CN113165142 B CN 113165142B
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China
Prior art keywords
substrate
roller
cleaning
edge
polishing
Prior art date
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CN201980075357.7A
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English (en)
Chinese (zh)
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CN113165142A (zh
Inventor
水野稔夫
桧森洋辅
马场枝里奈
石桥知淳
小畠严贵
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Ebara Corp
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Ebara Corp
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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P70/00—Cleaning of wafers, substrates or parts of devices
    • H10P70/50—Cleaning of wafers, substrates or parts of devices characterised by the part to be cleaned
    • H10P70/54—Cleaning of wafer edges
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/34—Accessories
    • B24B37/345—Feeding, loading or unloading work specially adapted to lapping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B41/00—Component parts such as frames, beds, carriages, headstocks
    • B24B41/06—Work supports, e.g. adjustable steadies
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B9/00—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
    • B24B9/02—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
    • B24B9/06—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain
    • B24B9/065—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of thin, brittle parts, e.g. semiconductors, wafers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0412—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0414—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0428—Apparatus for mechanical treatment or grinding or cutting
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/32—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations between different workstations
    • H10P72/3202—Mechanical details, e.g. rollers or belts
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/76—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches
    • H10P72/7604—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support
    • H10P72/7618—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating carrousel

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Manufacturing Of Printed Wiring (AREA)
CN201980075357.7A 2018-11-16 2019-10-31 清洗组件及具备清洗组件的基板处理装置 Active CN113165142B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2018215456A JP7265858B2 (ja) 2018-11-16 2018-11-16 洗浄モジュール、洗浄モジュールを備える基板処理装置と洗浄方法
JP2018-215456 2018-11-16
PCT/JP2019/042773 WO2020100609A1 (ja) 2018-11-16 2019-10-31 洗浄モジュール、洗浄モジュールを備える基板処理装置と洗浄方法

Publications (2)

Publication Number Publication Date
CN113165142A CN113165142A (zh) 2021-07-23
CN113165142B true CN113165142B (zh) 2023-12-22

Family

ID=70730502

Family Applications (1)

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CN201980075357.7A Active CN113165142B (zh) 2018-11-16 2019-10-31 清洗组件及具备清洗组件的基板处理装置

Country Status (7)

Country Link
US (1) US12033847B2 (https=)
JP (1) JP7265858B2 (https=)
KR (1) KR102778937B1 (https=)
CN (1) CN113165142B (https=)
SG (1) SG11202105091PA (https=)
TW (1) TWI822901B (https=)
WO (1) WO2020100609A1 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12138732B2 (en) 2020-12-14 2024-11-12 Applied Materials, Inc. Polishing system apparatus and methods for defect reduction at a substrate edge
CN112976266A (zh) * 2021-03-04 2021-06-18 王仕英 一种陶瓷生产用胚体修复装置
JP7623225B2 (ja) * 2021-06-11 2025-01-28 株式会社Ｓｃｒｅｅｎホールディングス 基板洗浄装置
CN116689340B (zh) * 2022-02-28 2026-01-23 秦皇岛烟草机械有限责任公司 一种浸渍器端盖用维护装置及其控制方法
CN114887976B (zh) * 2022-05-25 2024-01-23 宁波芯丰精密科技有限公司 一种清洁装置
CN119609909B (zh) * 2024-08-06 2026-03-24 浙江创芯集成电路有限公司 晶圆研磨装置以及晶圆研磨设备

Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1493334A (en) * 1974-03-30 1977-11-30 Schleifenbaum & Steinmetz Cleaning machine and process for cleaning metal sheets
JPH0645302A (ja) * 1992-07-24 1994-02-18 Tokyo Electron Ltd 処理装置
JPH1080668A (ja) * 1996-09-09 1998-03-31 Mitsubishi Chem Corp ディスク基板の洗浄ユニット及び連続洗浄装置
JP2003088811A (ja) * 2001-09-20 2003-03-25 Toshiba Corp ローラ清掃装置
JP2003151943A (ja) * 2001-11-19 2003-05-23 Speedfam Clean System Co Ltd スクラブ洗浄装置
JP2003151925A (ja) * 2001-11-12 2003-05-23 Yac Co Ltd ウェーハエッジ研磨処理装置
WO2006103859A1 (ja) * 2005-03-29 2006-10-05 Tokyo Electron Limited 基板洗浄方法および基板洗浄装置
JP2007317703A (ja) * 2006-05-23 2007-12-06 Fujifilm Corp ブラシ洗浄方法、半導体の製造方法及びブラシ洗浄装置
JP2008084934A (ja) * 2006-09-26 2008-04-10 Mitsumi Electric Co Ltd 半導体基板の洗浄方法
KR20080036903A (ko) * 2006-10-24 2008-04-29 주식회사 케이씨텍 대면적 기판의 접촉식 세정장치
JP2010040943A (ja) * 2008-08-07 2010-02-18 Tokyo Electron Ltd 基板洗浄装置及び基板洗浄方法
CN105382677A (zh) * 2014-08-26 2016-03-09 株式会社荏原制作所 抛光处理组件、基板处理装置及抛光垫清洗方法
JP2018113393A (ja) * 2017-01-13 2018-07-19 株式会社ディスコ ウエーハ洗浄装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5861066A (en) 1996-05-01 1999-01-19 Ontrak Systems, Inc. Method and apparatus for cleaning edges of contaminated substrates
JPH10335279A (ja) 1997-05-30 1998-12-18 Shibaura Eng Works Co Ltd 洗浄装置
JP2003317703A (ja) 2002-04-24 2003-11-07 Sony Corp 電池およびその製造方法

Patent Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1493334A (en) * 1974-03-30 1977-11-30 Schleifenbaum & Steinmetz Cleaning machine and process for cleaning metal sheets
JPH0645302A (ja) * 1992-07-24 1994-02-18 Tokyo Electron Ltd 処理装置
JPH1080668A (ja) * 1996-09-09 1998-03-31 Mitsubishi Chem Corp ディスク基板の洗浄ユニット及び連続洗浄装置
JP2003088811A (ja) * 2001-09-20 2003-03-25 Toshiba Corp ローラ清掃装置
JP2003151925A (ja) * 2001-11-12 2003-05-23 Yac Co Ltd ウェーハエッジ研磨処理装置
JP2003151943A (ja) * 2001-11-19 2003-05-23 Speedfam Clean System Co Ltd スクラブ洗浄装置
WO2006103859A1 (ja) * 2005-03-29 2006-10-05 Tokyo Electron Limited 基板洗浄方法および基板洗浄装置
JP2007317703A (ja) * 2006-05-23 2007-12-06 Fujifilm Corp ブラシ洗浄方法、半導体の製造方法及びブラシ洗浄装置
JP2008084934A (ja) * 2006-09-26 2008-04-10 Mitsumi Electric Co Ltd 半導体基板の洗浄方法
KR20080036903A (ko) * 2006-10-24 2008-04-29 주식회사 케이씨텍 대면적 기판의 접촉식 세정장치
JP2010040943A (ja) * 2008-08-07 2010-02-18 Tokyo Electron Ltd 基板洗浄装置及び基板洗浄方法
CN105382677A (zh) * 2014-08-26 2016-03-09 株式会社荏原制作所 抛光处理组件、基板处理装置及抛光垫清洗方法
JP2018113393A (ja) * 2017-01-13 2018-07-19 株式会社ディスコ ウエーハ洗浄装置

Also Published As

Publication number Publication date
US20220013352A1 (en) 2022-01-13
SG11202105091PA (en) 2021-06-29
TWI822901B (zh) 2023-11-21
CN113165142A (zh) 2021-07-23
JP2020088000A (ja) 2020-06-04
TW202027867A (zh) 2020-08-01
KR20210089671A (ko) 2021-07-16
JP7265858B2 (ja) 2023-04-27
KR102778937B1 (ko) 2025-03-11
US12033847B2 (en) 2024-07-09
WO2020100609A1 (ja) 2020-05-22

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