CN112934848A - Dust cleaning equipment for semiconductor preparation - Google Patents
Dust cleaning equipment for semiconductor preparation Download PDFInfo
- Publication number
- CN112934848A CN112934848A CN202110130710.6A CN202110130710A CN112934848A CN 112934848 A CN112934848 A CN 112934848A CN 202110130710 A CN202110130710 A CN 202110130710A CN 112934848 A CN112934848 A CN 112934848A
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- Prior art keywords
- frame
- clean
- mechanical arm
- pipe
- axis mechanical
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- 238000004140 cleaning Methods 0.000 title claims abstract description 55
- 239000004065 semiconductor Substances 0.000 title claims abstract description 30
- 239000000428 dust Substances 0.000 title claims abstract description 19
- 238000002360 preparation method Methods 0.000 title abstract description 11
- 230000007246 mechanism Effects 0.000 claims abstract description 64
- 239000007788 liquid Substances 0.000 claims abstract description 33
- 238000011049 filling Methods 0.000 claims abstract description 24
- 238000006073 displacement reaction Methods 0.000 claims abstract description 20
- 239000004744 fabric Substances 0.000 claims abstract description 8
- 238000005485 electric heating Methods 0.000 claims description 28
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 13
- 238000004519 manufacturing process Methods 0.000 claims description 11
- 230000008859 change Effects 0.000 claims description 6
- 238000004026 adhesive bonding Methods 0.000 claims description 5
- 238000004887 air purification Methods 0.000 claims description 3
- 239000003292 glue Substances 0.000 claims description 3
- 230000005540 biological transmission Effects 0.000 claims 3
- 230000000712 assembly Effects 0.000 claims 2
- 238000000429 assembly Methods 0.000 claims 2
- 230000000149 penetrating effect Effects 0.000 claims 1
- 230000008901 benefit Effects 0.000 abstract description 4
- 230000003749 cleanliness Effects 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 12
- 238000011068 loading method Methods 0.000 description 11
- 230000000694 effects Effects 0.000 description 8
- 108010066114 cabin-2 Proteins 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 230000008878 coupling Effects 0.000 description 5
- 238000010168 coupling process Methods 0.000 description 5
- 238000005859 coupling reaction Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
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- LXNHXLLTXMVWPM-UHFFFAOYSA-N pyridoxine Chemical compound CC1=NC=C(CO)C(CO)=C1O LXNHXLLTXMVWPM-UHFFFAOYSA-N 0.000 description 2
- XOAAWQZATWQOTB-UHFFFAOYSA-N taurine Chemical compound NCCS(O)(=O)=O XOAAWQZATWQOTB-UHFFFAOYSA-N 0.000 description 2
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- 230000003588 decontaminative effect Effects 0.000 description 1
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- RADKZDMFGJYCBB-UHFFFAOYSA-N pyridoxal hydrochloride Natural products CC1=NC=C(CO)C(C=O)=C1O RADKZDMFGJYCBB-UHFFFAOYSA-N 0.000 description 1
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Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B5/00—Cleaning by methods involving the use of air flow or gas flow
- B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/10—Cleaning by methods involving the use of tools characterised by the type of cleaning tool
- B08B1/14—Wipes; Absorbent members, e.g. swabs or sponges
- B08B1/143—Wipes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
- F26B21/001—Drying-air generating units, e.g. movable, independent of drying enclosure
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
- F26B21/004—Nozzle assemblies; Air knives; Air distributors; Blow boxes
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning In General (AREA)
Abstract
The invention discloses a dust cleaning device for semiconductor preparation, which structurally comprises a supporting seat, a cleaning bin, a bin opening, a curtain cloth, an observation window, supporting legs, a table holding mechanism, a displacement assembly, a first six-axis mechanical arm, a second six-axis mechanical arm, a first nozzle, a second nozzle, a liquid filling mechanism, an air cleaning mechanism, a lighting lamp, an exhaust port, a grid and a cleaning platform mechanism, and has the advantages that after the bearing platform is clamped by a clamping platform mechanical arm, the table holding mechanism fixes the bearing platform, after a conveying assembly drives the bearing platform to move, the bearing platform drives the second nozzle by the second six-axis mechanical arm of a cylinder, after the liquid filling mechanism and the air filling mechanism carry out gas-liquid treatment on the surface of the bearing platform, the cleaning platform is wiped and cleaned by the cleaning platform mechanism, and then the subsequent cleaning treatment is carried out by the air cleaning mechanism, so that the bearing platform is comprehensively and effectively cleaned, improving the cleanliness grade and increasing the quality and yield of semiconductor finished products.
Description
Technical Field
The invention belongs to the technical field of semiconductor preparation, and particularly relates to dust cleaning equipment for semiconductor preparation.
Background
The semiconductor is a material with electric conductivity between a conductor and an insulator at normal temperature, and has wide application in radio, television and temperature measurement, and the preparation of the semiconductor usually requires a bearing platform to bear a semiconductor wafer, and carries out subsequent processing operation on the semiconductor, so that the semiconductor is an important bearing part in the preparation of the semiconductor;
in the micro-processing of semiconductor devices, since the space units are all calculated in microns, the fine dust particles are attached to the wafer for manufacturing the semiconductor devices, which may affect the pattern of the precise wiring layout thereon, causing serious consequences of electrical short circuit or open circuit.
Disclosure of Invention
Technical problem to be solved
In order to overcome the defects of the prior art, the dust cleaning equipment for the semiconductor preparation is provided so as to solve the problems that the cleaning grade of a bearing table is difficult to improve and the yield and the quality of semiconductors are easy to influence in the semiconductor preparation process, and achieve the effects of comprehensively and effectively cleaning the bearing table, improving the cleaning grade and increasing the quality and the yield of semiconductor finished products.
(II) technical scheme
The invention is realized by the following technical scheme: the invention provides a dust cleaning device for semiconductor preparation, which comprises a supporting seat, a cleaning bin, a bin opening, curtain cloth, an observation window, support legs, a control panel, a control key, a conveying component, a table holding mechanism, a clamping table mechanical arm, a displacement component, a first six-axis mechanical arm, a second six-axis mechanical arm, a first nozzle, a second nozzle, a liquid filling mechanism, an air cleaning mechanism, an illuminating lamp, an exhaust port, a grid and a cleaning table mechanism, wherein the top end of the supporting seat is riveted with the cleaning bin, bin openings used for placing and moving out a wafer loading table are formed in the front side and the rear side of the cleaning bin, the curtain cloth is arranged at the top end of the inner wall of the bin opening through strong adhesion, the support legs are arranged at four corners of the bottom side of the supporting seat through bolts, the rear side of the control panel is riveted on the supporting seat, the control key is embedded in the top end of the control panel, the conveying component, the utility model discloses a clean storehouse, including clean storehouse, clamp platform arm, displacement subassembly, first six arms and second six arms bottom slide along the displacement subassembly to the displacement subassembly is installed to two bolts around the clean storehouse inner wall, first six arms and second six arms bottom are installed respectively to first six arms and second six arms bottom, liquid irritate mechanism and irritate mechanism rear end bolt and install in the clean storehouse, gas is clean mechanism's bolt and is installed in the inside rear side of clean storehouse, the light is installed at clean storehouse top interval, the inside rear side in clean storehouse is seted up and is equipped with the gas vent to the grid is installed to the gas vent inner wall, two bolt installations are on clean storehouse around the clean platform mechanism.
Further, the mechanism is held to the platform comprises underframe, platform groove, inside groove, push rod, pillar block, guide rail, revolving rack, clamp splice and cylinder, the platform groove has been seted up at underframe top side middle part, the inside of underframe is provided with the inside groove, sliding mounting is on the inside groove behind the push rod, the pillar block is installed perpendicularly to push rod top side, the pillar block outside slides along the revolving rack through the guide rail, be equipped with the clamp splice through powerful gluing after the underframe is worn out to the revolving rack top, cylinder rear end promotion portion fixed mounting is on the push rod, underframe left and right sides bolt mounting is on clean storehouse.
Further, the displacement subassembly comprises first motor, frame, shaft coupling, lead screw, cover frame, footstock and slide bar, first motor bottom bolted mounting is on the frame, first motor left end rotor portion is fixed through shaft coupling and lead screw, both ends are rotated about the lead screw and are installed on the cover frame, footstock bottom bolted mounting is on the frame, both ends are installed perpendicularly on the footstock about the slide bar, frame and cover frame front end and clean storehouse bolted mounting, lead screw outer wall and first six arm and the six arm threaded connection of second, slide bar outer wall and first six arm and the six arm sliding contact of second.
Further, the liquid filling mechanism is composed of a shell, a liquid inlet pipe, a water pump, an input pipe, a first electromagnetic valve, an output pipe and a first hose, the liquid inlet pipe is installed in the middle of the top end of the shell in an embedded mode, a bolt at the top end of the water pump is installed in the shell, the right end of the input pipe is installed on the water pump, the left end of the input pipe penetrates out of the shell and is installed on the first electromagnetic valve, the output pipe is installed at the left end of the first electromagnetic valve, the bottom end of the output pipe is in threaded connection with the first hose, a bolt at the rear side of the shell is installed on the clean cabin, the bottom end of the first hose is installed on the second nozzle.
Further, the air filling mechanism comprises a frame body, an air vent, a filter screen, an electric heating seat, an electric heating rod, a sticking ring, a fin, an air blower, an air delivery pipe, a second electromagnetic valve, an air delivery pipe and a second hose, wherein the air vent is arranged at the left part of the top side of the frame body, the peripheral part of the filter screen is arranged in the air vent through strong glue, the right side of the electric heating seat is arranged on the frame body through a bolt, the electric heating rod is vertically arranged at the left side of the electric heating seat, the sticking ring is arranged at the outer side of the electric heating rod, the left end and the right end of the fin are welded on the sticking ring, the bottom end of the air blower is fixed with the frame body through the bolt, the air delivery pipe is arranged at the air pipe at the left end of the air blower, the left end of the air delivery pipe penetrates out of the frame body, the rear side of the frame body is fixed with the clean bin through bolts.
Further, the gas cleaning mechanism is composed of a tank body, an external pipe, a support frame, a bottom connecting pipe, a third electromagnetic valve, a first pressure reducing valve, a second pressure reducing valve and a third hose, the external pipe is installed in the middle of the top end of the tank body in an embedded mode, the two support frames which are symmetrically distributed in the left-right direction are installed on bolts at the rear side of the tank body, the top end of the bottom connecting pipe is embedded in the tank body, the third electromagnetic valve is installed in the middle of the bottom connecting pipe, the first pressure reducing valve and the second pressure reducing valve are sequentially installed at the bottom end of the bottom connecting pipe from left to right, the third hose is fixedly installed at the right end of the second pressure reducing valve, the right end of the third hose is installed on the first nozzle, the top end of the external.
Further, clean platform mechanism comprises frame, commentaries on classics roller, pivot, axle area, second motor and soft felt, two portions are rotated and are installed and change the roller about the frame inner wall, change the roller right-hand member and install, the pivot, through axle area normal running fit between the pivot is adjacent, second motor left end rotor portion penetrates fixed mounting in the pivot behind the frame, the pivot outside is equipped with soft felt through powerful gluing, both ends bolt mounting is in clean storehouse about the frame.
Furthermore, the vertical height difference between the top side of the table holding mechanism and the soft felt is-2.5 cm, and the minimum distance between the top side of the frame and the displacement assembly is 12 cm.
Furthermore, the electric heating rods are arranged on the electric heating seat at intervals in a circular track, the overall outline of the outer side of the sticking ring is in a circle shape, and more than two fins are arranged on the sticking ring at intervals.
(III) advantageous effects
Compared with the prior art, the invention has the following beneficial effects:
after the bearing table is clamped by the clamping table mechanical arm, the bearing table is fixed by the clamping mechanism, the bearing table is driven by the conveying assembly to move, the bearing table drives the second nozzle along with the second six-axis mechanical arm, the bearing table surface is subjected to gas-liquid treatment by the liquid filling mechanism and the gas filling mechanism, the bearing table is cleaned by the gas cleaning mechanism, and then subsequent cleaning treatment is carried out by the gas cleaning mechanism, so that the effects of comprehensively and effectively cleaning the bearing table, improving the cleaning grade and increasing the quality and the yield of semiconductor finished products are achieved.
Drawings
Other features, objects and advantages of the invention will become more apparent upon reading of the detailed description of non-limiting embodiments with reference to the following drawings:
FIG. 1 is a schematic structural view of the present invention;
FIG. 2 is a schematic view of the internal structure of the clean room of the present invention;
FIG. 3 is a schematic structural diagram of a table holding mechanism of the present invention;
FIG. 4 is a schematic view of the displacement assembly of the present invention;
FIG. 5 is a schematic structural diagram of a liquid filling mechanism of the present invention;
FIG. 6 is a schematic structural diagram of an air-filling mechanism of the present invention;
FIG. 7 is a schematic structural diagram of an air purification mechanism according to the present invention;
FIG. 8 is a schematic structural diagram of a clean bench mechanism according to the present invention;
in the figure: a supporting seat-1, a clean bin-2, a bin mouth-3, a curtain cloth-4, an observation window-5, a supporting leg-6, a control panel-7, a control key-8, a conveying component-9, a table holding mechanism-10, a clamping table mechanical arm-11, a displacement component-12, a first six-axis mechanical arm-13, a second six-axis mechanical arm-14, a first nozzle-15, a second nozzle-16, a liquid filling mechanism-17, an air filling mechanism-18, an air cleaning mechanism-19, a lighting lamp-20, an exhaust port-21, a grid-22, a cleaning table mechanism-23, a bottom frame-101, a table groove-102, an inner groove-103, a push rod-104, a column block-105, a guide rail-106, a rotating frame-107, a clamping block-108, a cylinder-109, a guide rail-106, a rotating frame-107, a, A first motor-121, a machine base-122, a coupler-123, a screw rod-124, a sleeve frame-125, a top base-126, a slide rod-127, a shell-171, a liquid inlet pipe-172, a water pump-173, an input pipe-174, a first electromagnetic valve-175, an output pipe-176, a first hose-177, a frame-181, a vent-182, a filter screen-183, an electric heating base-184, an electric heating rod-185, a sticking ring-186, a fin-187, a blower-188, an air pipe-189, a second electromagnetic valve-1810, an air pipe-1811, a second hose-1812, a tank-191, an external pipe-192, a support-193, a bottom connecting pipe-194, a third electromagnetic valve-195, a first pressure reducing valve-196, a second pressure reducing valve-197, A third hose-198, a frame-231, a rotating roller-232, a rotating shaft-233, a shaft belt-234, a second motor-235 and a soft felt-236.
Detailed Description
Referring to fig. 1 to 8, the present invention provides a dust cleaning apparatus for semiconductor manufacturing: comprises a supporting seat 1, a clean cabin 2, a cabin opening 3, curtain cloth 4, an observation window 5, support legs 6, a control panel 7, a control key 8, a conveying component 9, a holding mechanism 10, a clamping platform mechanical arm 11, a displacement component 12, a first six-axis mechanical arm 13, a second six-axis mechanical arm 14, a first nozzle 15, a second nozzle 16, a liquid filling mechanism 17, an air filling mechanism 18, an air cleaning mechanism 19, a lighting lamp 20, an exhaust port 21, a grid 22 and a clean platform mechanism 23, wherein the top end of the supporting seat 1 is riveted with the clean cabin 2, the front side and the rear side of the clean cabin 2 are provided with the cabin opening 3 for placing and moving out a wafer carrier, the top end of the inner wall of the cabin opening 3 is provided with the curtain cloth 4 through strong adhesion, four corners of the bottom side of the supporting seat 1 are provided with the support legs 6, the rear side of the control panel 7 is riveted on the supporting seat 1, the top end of the control panel 7 is embedded, the bottom end of the table holding mechanism 10 is fixedly installed on the conveying assembly 9, the front and back symmetrical installation of the table clamping mechanical arm 11 is at the right end of the inner wall of the clean room 2, the displacement assembly 12 is installed on the front and back two bolts of the inner wall of the clean room 2, the bottom ends of the first six-axis mechanical arm 13 and the second six-axis mechanical arm 14 slide along the displacement assembly 12, the bottom ends of the first six-axis mechanical arm 13 and the second six-axis mechanical arm 14 are respectively provided with a first nozzle 15 and a second nozzle 16 for clean operation, the rear end bolts of the liquid filling mechanism 17 and the gas filling mechanism 18 are installed in the clean room 2, the bolt of the gas cleaning mechanism 19 is installed at the inner rear side of the clean room 2, the illuminating lamps 20 are installed at the top end of the clean room 2 at intervals, the rear side of the interior of the clean room 2 is provided with a gas.
Wherein, the table is held mechanism 10 and is become by underframe 101, platform groove 102, inside groove 103, push rod 104, pillar block 105, guide rail 106, revolving rack 107, clamp splice 108 and cylinder 109, underframe 101 top side middle part has seted up platform groove 102, underframe 101 inside is provided with inside groove 103, push rod 104 rear side slidable mounting is on inside groove 103, pillar block 105 is installed perpendicularly to push rod 104 top side, the pillar block 105 outside slides along revolving rack 107 through guide rail 106, be equipped with clamp splice 108 through powerful gluing after underframe 101 is worn out on revolving rack 107 top, cylinder 109 rear end promotion portion fixed mounting is on push rod 104, underframe 101 left and right sides bolt mounting is on clean storehouse 2, carries out effective stable centre gripping to the plummer and fixes, does benefit to subsequent transport clean stable.
Wherein, the displacement assembly 12 is composed of a first motor 121, a base 122, a coupling 123, a screw rod 124, a sleeve frame 125, a top seat 126 and a slide rod 127, the bottom end of the first motor 121 is bolted on the base 122, the left end rotor part of the first motor 121 is fixed with the screw rod 124 through the coupling 123, the left and right ends of the screw rod 124 are rotatably mounted on the sleeve frame 125, the bottom end of the top seat 126 is bolted on the base 122, the left and right ends of the slide rod 127 are vertically mounted on the top seat 126, the front ends of the base 122 and the sleeve frame 125 are bolted on the clean cabin 2, the outer wall of the screw rod 124 is in threaded connection with the first six-axis mechanical arm 13 and the second six-axis mechanical arm 14, the outer wall of the slide rod 127 is in sliding connection with the first six-axis mechanical arm 13 and the second six-axis mechanical arm 14 to provide stable displacement and use for the first six-axis mechanical arm 13 and the second six-axis mechanical arm 14, so, and cleaning the moving bearing table.
The liquid filling mechanism 17 is composed of a casing 171, a liquid inlet pipe 172, a water pump 173, an input pipe 174, a first electromagnetic valve 175, an output pipe 176 and a first hose 177, the liquid inlet pipe 172 is embedded in the middle of the top end of the casing 171, the top end of the water pump 173 is installed in the casing 171 through a bolt, the right end of the input pipe 174 is installed on the water pump 173, the left end of the input pipe 174 penetrates out of the casing 171 and then is installed on the first electromagnetic valve 175, the output pipe 176 is installed at the left end of the first electromagnetic valve 175, the bottom end of the output pipe 176 is in threaded connection with the first hose 177, the rear side of the casing 171 is installed on the clean cabin 2 through a bolt, the bottom end of the first hose 177 is installed on the second nozzle 16, the top end of the liquid inlet pipe 172 is embedded in the clean cabin 2, so that after cleaning liquid is loaded in the casing.
Wherein, the air-filling mechanism 18 is composed of a frame 181, a vent 182, a filter screen 183, an electric heating seat 184, an electric heating rod 185, a sticking ring 186, a fin 187, a blower 188, an air pipe 189, a second electromagnetic valve 1810, an air pipe 1811 and a second hose 1812, the top side left portion vent 182 of the frame 181, the periphery of the filter screen 183 is glued in the vent 182 by a strong glue, the right side bolt of the electric heating seat 184 is installed on the frame 181, the electric heating rod 185 is vertically installed on the left side of the electric heating seat 184, the sticking ring 186 is installed on the outer side of the electric heating rod 185, the left and right ends of the fin 187 are welded on the sticking ring 186, the bottom end of the blower 188 is fixed with the frame 181 by a bolt, the air pipe 189 is installed on the left end of the blower 188, the left end of the air pipe 189 penetrates through the frame 181 and then is fixed with the second electromagnetic valve, the top end of the second hose 1812 is fixedly embedded in the gas pipe 1811, the bottom end of the second hose 1812 is arranged on the second nozzle 16, and the rear side of the frame 181 is fixed with the clean room 2 by bolts, so that the dust removal, blowing and drying of the surface of the bearing table can be facilitated.
Wherein, the air purification mechanism 19 comprises a tank body 191, an external connecting pipe 192, a support frame 193, a bottom connecting pipe 194, a third electromagnetic valve 195, a first pressure reducing valve 196, a second pressure reducing valve 197 and a third hose 198, the external connecting pipe 192 is embedded in the middle of the top end of the tank body 191, the rear side of the tank body 191 is bolted on the two support frames 193 which are distributed in bilateral symmetry, the top end of the bottom connecting pipe 194 is embedded on the tank body 191, the third electromagnetic valve 195 is installed in the middle of the bottom connecting pipe 194, the bottom end of the bottom connecting pipe 194 is sequentially provided with the first pressure reducing valve 196 and the second pressure reducing valve 197 from left to right, the right end of the second pressure reducing valve 197 is fixedly provided with the third hose 198, the right end of the third hose 198 is installed on the first nozzle 15, the top end of the external connecting pipe 192 is embedded on the clean cabin 2, the rear side of the support frame 193 is bolted, the cleaning effect is improved.
Wherein, clean platform mechanism 23 comprises frame 231, commentaries on classics roller 232, pivot 233, axle area 234, second motor 235 and soft felt 236, two portions are rotated and are installed and change roller 232 about frame 231 inner wall, change roller 232 right-hand member and install, pivot 233 is adjacent to be in the normal running fit of axle area 234, second motor 235 left end rotor portion penetrates frame 231 after fixed mounting on pivot 233, the pivot 233 outside is equipped with soft felt 236 through powerful gluing, both ends bolt mounting is in clean storehouse 2 about frame 231, brushes repeatedly the clean to the plummer and moves cleanly the improvement clean effect.
The vertical height difference between the top side of the table holding mechanism 10 and the soft felt 236 is-2.5 cm, the minimum distance between the top side of the frame 231 and the displacement assembly 12 is 12cm, the soft felt 236 is made of superfine fibers during preparation, has strong decontamination performance and can not be unhaired, so that the soft felt 236 can be effectively contacted and scrubbed with the bearing table, and the use is facilitated.
The electric heating rods 185 are arranged on the electric heating seat 184 at intervals in a circular track, the overall outline of the outer side of the sticking ring 186 is in a circle shape, and more than two fins 187 are arranged on the sticking ring 186 at intervals, so that the fins 187 can improve the heat emission effect and are beneficial to the drying effect.
The working principle is as follows:
1. when in use, the device is firstly placed at a proper position, then the control panel 7 and an external power supply can be electrified, the liquid inlet pipe 172 and the external pipe 192 are respectively communicated with a cleaning liquid pipeline and an argon gas supply pipeline, then the exhaust port 21 is connected with an external exhaust device, then the bearing table can be placed in the table groove 102 on the bottom frame 101 through the bin opening 3 and the curtain cloth 4, then the operation can be carried out through the observation window 5, after the corresponding control key 8 is pressed down, the cylinder 109 is electrified and the pushing part of the cylinder 109 is retracted, the cylinder 109 drives the push rod 104 to be pushed outwards, so that the column block 105 applies force to the rotating frame 107 along the guide rail 106, the bottom end of the rotating frame 107 is close and rotates on the inner groove 103, the top of the rotating frame 107 drives the clamping block 108 to close, and the clamping block 108 clamps the bearing table in the table groove 102, fixing the same;
2. after the bearing table moves in, the second six-axis mechanical arm 14 can be electrified and drives the second nozzle 16 to approach the bearing table, then the blower 188 can be electrified, and wind power is conveyed outwards through the air pipe 189, then the second electromagnetic valve 1810 is opened through the control key 8, so that wind power can be input into the second nozzle 16 through the air pipe 1811 and the second hose 1812, and the second six-axis mechanical arm 14 drives the second nozzle 16 to perform dust removal cleaning treatment of wind power blowing on the bearing table;
3. then, the transfer assembly 9 can be electrified through the control key 8, the transfer assembly 9 drives the carrying platform in the platform groove 102 to carry out the left-direction conveying, then, the second six-axis mechanical arm 14 can be electrified through the control key, the water pump 173 and the blower 188 are electrified, the water pump 173 is electrified, the cleaning liquid input from the liquid inlet pipe 172 can be output outwards through the input pipe 174 by the water pump 173, the first electromagnetic valve 175 is electrified and opened, the cleaning liquid is conveyed into the second nozzle 16 through the output pipe 176 and the first hose 177, and then the carrying platform is sprayed, when the cleaning liquid is prepared, the main components of the cleaning liquid are mainly prepared by mixing and proportioning of sodium chloride, preservative, hydrogen peroxide, vitamin B6, taurine, aminocaproic acid and sodium hyaluronate, the electrostatic interference prevention of the carrying platform can be improved, the dustproof effect is increased;
4. then, after the second motor 235 is electrified, the second motor 235 can drive the rotating rollers 232 to rotate through the rotating shafts 233, the rotating rollers 232 are driven to synchronously rotate together through the shaft belts 234 between adjacent rotating shafts 233, and after the bearing table is in contact with the soft felt 236 during conveying, the soft felt 236 made of superfine fibers can wipe the surface of the bearing table, so that particles and dirt on the bearing table can be effectively removed and cleaned;
5. after the bearing table is conveyed out of the range of the frame 231, the second six-axis mechanical arm 14 can move synchronously with the bearing table, if the second six-axis mechanical arm 14 needs to move, so that the matching precision is improved, the first motor 121 can drive the screw rod 124 to rotate through the coupling 123 after being electrified, and the screw rod 124 can drive the screw rod 124 to rotate along with the screw thrust after controlling the left and right directions of the second six-axis mechanical arm 14, so that the second six-axis mechanical arm 14 can control and move along the slide rod 127 in the left and right directions, and the use efficiency is improved;
6. after the wiping, the second six-axis mechanical arm 14 is controlled to drive the second nozzle 16 to approach the bearing platform, the electric heating seat 184 is electrified, the electric heating rod 185 can be electrified to generate heat, the fins 187 on the attachment ring 186 absorb and dissipate heat, the heat dissipation rate is increased, and then hot air can be conveyed to the second nozzle 16 through the air conveying pipe 1811 and the second hose 1812 by the air blower 188, so that the second nozzle 16 can dry the cleaned bearing platform;
7. then, after the loading platform moves to the left part of the clean room 2, the first six-axis mechanical arm 13 can be electrified to drive the first nozzle 15 to be close to the loading platform, then the third electromagnetic valve 195 can be electrified to be opened, argon loaded in the tank body 191 is output from the first pressure reducing valve 196 and the second pressure reducing valve 197 from the third hose 198 through the external connecting pipe 192, the loading platform can be sprayed from the first nozzle 15, oxidized dirt on the loading platform can be effectively decomposed by ions, after that, when the loading platform is driven to move rightwards by the conveying assembly 9, the loading platform can be cleaned repeatedly through the same steps, finally, after the loading platform is driven to move rightwards by the conveying assembly 9, the air cylinder 109 can be reset, the clamping block 108 can cancel clamping to the loading platform, then the clamping mechanical arm 11 can clamp the loading platform and move the loading platform out of the platform groove 102, so that the subsequent dust-free contact removal operation is convenient to complete the cleaning.
The control mode of the invention is controlled by manually starting and closing the switch, the wiring diagram of the power element and the supply of the power source belong to the common knowledge in the field, and the invention is mainly used for protecting mechanical devices, so the control mode and the wiring arrangement are not explained in detail in the invention.
While there have been shown and described what are at present considered the fundamental principles and essential features of the invention and its advantages, it will be apparent to those skilled in the art that the invention is not limited to the details of the foregoing exemplary embodiments, but is capable of other specific forms without departing from the spirit or essential characteristics thereof. The present embodiments are therefore to be considered in all respects as illustrative and not restrictive, the scope of the invention being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein. Any reference sign in a claim should not be construed as limiting the claim concerned.
Furthermore, it should be understood that although the present description refers to embodiments, not every embodiment may contain only a single embodiment, and such description is for clarity only, and those skilled in the art should integrate the description, and the embodiments may be combined as appropriate to form other embodiments understood by those skilled in the art.
Claims (9)
1. A dust cleaning apparatus for semiconductor production, characterized in that: comprises a supporting seat (1), a clean cabin (2), a cabin opening (3), curtain cloth (4), an observation window (5), support legs (6), a control panel (7), a control key (8), a conveying assembly (9), a table holding mechanism (10), a clamping table mechanical arm (11), a displacement assembly (12), a first six-axis mechanical arm (13), a second six-axis mechanical arm (14), a first nozzle (15), a second nozzle (16), a liquid filling mechanism (17), an air filling mechanism (18), an air cleaning mechanism (19), a lighting lamp (20), an exhaust port (21), grids (22) and a clean table mechanism (23), wherein the top end of the supporting seat (1) is riveted with the clean cabin (2), the front side and the rear side of the clean cabin (2) are provided with the cabin opening (3) for placing and moving out a wafer carrier, the curtain cloth (4) is arranged at the top end of the inner wall of the cabin opening (3) through strong adhesion, and the bottom sides of the supporting seat (1) are, the rear side of the control panel (7) is riveted on the supporting seat (1), a control key (8) is embedded in the top end of the control panel (7), a conveying assembly (9) is embedded in the bottom end of the inner wall of the clean bin (2), the bottom end of the table holding mechanism (10) is fixedly installed on the conveying assembly (9), the table clamping mechanical arms (11) are symmetrically installed at the right end of the inner wall of the clean bin (2) in the front-back direction, displacement assemblies (12) are installed on the front portion and the rear portion of the inner wall of the clean bin (2) through bolts, the bottom ends of the first six-axis mechanical arm (13) and the second six-axis mechanical arm (14) slide along the displacement assemblies (12), a first nozzle (15) and a second nozzle (16) for cleaning operation are installed at the bottom ends of the first six-axis mechanical arm (13) and the second six-axis mechanical arm (14), and the rear end bolts of the liquid filling mechanism (17) and the air filling mechanism (, clean mechanism of gas (19) bolt mounting is in clean storehouse (2) inside rear side, light (20) are installed at clean storehouse (2) top interval, the inside rear side in clean storehouse (2) is opened and is equipped with gas vent (21) to grid (22) are installed to gas vent (21) inner wall, two bolt mountings are on clean storehouse (2) around clean platform mechanism (23).
2. A dust cleaning apparatus for semiconductor manufacturing according to claim 1, wherein: the table holding mechanism (10) is composed of a bottom frame (101), a table groove (102), an inner groove (103), a push rod (104), a column block (105), a guide rail (106), a rotating frame (107), a clamping block (108) and a cylinder (109), the table groove (102) is formed in the middle of the top side of the bottom frame (101), the inner groove (103) is arranged inside the bottom frame (101), the push rod (104) is slidably mounted on the inner groove (103) at the rear side, the column block (105) is vertically mounted at the top side of the push rod (104), the outer side of the column block (105) slides along the rotating frame (107) through the guide rail (106), the clamping block (108) is arranged on the top end of the rotating frame (107) after penetrating out of the bottom frame (101) through strong adhesion, the rear-end pushing part of the cylinder (109) is fixedly mounted on the push rod (104), and bolts on the left side and the right side of the bottom.
3. A dust cleaning apparatus for semiconductor manufacturing according to claim 1, wherein: the displacement assembly (12) consists of a first motor (121), a base (122), a coupler (123), a screw rod (124), a sleeve frame (125), a top seat (126) and a sliding rod (127), the bottom end of the first motor (121) is mounted on the base (122) through a bolt, the left rotor part of the first motor (121) is fixed with the screw rod (124) through a coupler (123), the left end and the right end of the screw rod (124) are rotatably arranged on the sleeve frame (125), the bottom end of the top seat (126) is arranged on the machine seat (122) through a bolt, the left end and the right end of the sliding rod (127) are vertically arranged on the top seat (126), the front ends of the machine seat (122) and the sleeve frame (125) are fixed with the cleaning bin (2) by bolts, the outer wall of the screw rod (124) is in threaded connection with a first six-axis mechanical arm (13) and a second six-axis mechanical arm (14), the outer wall of the sliding rod (127) is in sliding contact with the first six-axis mechanical arm (13) and the second six-axis mechanical arm (14).
4. A dust cleaning apparatus for semiconductor manufacturing according to claim 1, wherein: the liquid filling mechanism (17) consists of a shell (171), a liquid inlet pipe (172), a water pump (173), an input pipe (174), a first electromagnetic valve (175), an output pipe (176) and a first hose (177), a liquid inlet pipe (172) is embedded in the middle of the top end of the shell (171), a top end of the water pump (173) is installed in the shell (171) through bolts, the right end of the input pipe (174) is installed on the water pump (173), the left end of the input pipe (174) penetrates out of the shell (171) and is installed on a first electromagnetic valve (175), an output pipe (176) is arranged at the left end of the first electromagnetic valve (175), the bottom end of the output pipe (176) is in threaded connection with a first hose (177), the rear side bolt of the shell (171) is installed on the clean cabin (2), the bottom end of the first hose (177) is installed on the second nozzle (16), and the top end of the liquid inlet pipe (172) is embedded and installed on the clean cabin (2).
5. A dust cleaning apparatus for semiconductor manufacturing according to claim 1, wherein: the air filling mechanism (18) comprises a frame body (181), an air vent (182), a filter screen (183), an electric heating seat (184), an electric heating rod (185), a sticking ring (186), fins (187), a blower (188), an air conveying pipe (189), a second electromagnetic valve (1810), an air conveying pipe (1811) and a second hose (1812), wherein the frame body (181) is provided with the left air vent (182) at the top side, the periphery of the filter screen (183) is adhered in the air vent (182) through strong glue, the electric heating seat (184) is bolted on the frame body (181) at the right side, the electric heating rod (185) is vertically installed at the left side of the electric heating seat (184), the sticking ring (186) is installed at the outer side of the electric heating rod (185), the left and right ends of the fins (187) are welded on the sticking ring (186), the bottom end of the blower (188) is bolted on the frame body (181), the air conveying pipe (, the left end of the gas transmission pipe (189) penetrates through the frame body (181) and then is fixed with the second electromagnetic valve (1810), the left end of the second electromagnetic valve (1810) is fixed with the gas transmission pipe (1811), the top end of the second hose (1812) is embedded and fixed with the gas transmission pipe (1811), the bottom end of the second hose (1812) is installed on the second nozzle (16), and the rear side of the frame body (181) is fixed with the clean cabin (2) through bolts.
6. A dust cleaning apparatus for semiconductor manufacturing according to claim 1, wherein: the air purification mechanism (19) comprises a tank body (191), an external connecting pipe (192), a support frame (193), a bottom connecting pipe (194), a third electromagnetic valve (195), a first pressure reducing valve (196), a second pressure reducing valve (197) and a third hose (198), the external connecting pipe (192) is embedded in the middle of the top end of the tank body (191), the support frames (193) are symmetrically distributed at the left and right sides of the tank body (191), the top end of the bottom connecting pipe (194) is embedded in the tank body (191), the third electromagnetic valve (195) is installed in the middle of the bottom connecting pipe (194), the bottom end of the bottom connecting pipe (194) is sequentially provided with the first pressure reducing valve (196) and the second pressure reducing valve (197) from left to right, the right end of the second pressure reducing valve (197) is fixedly provided with the third hose (198), the right end of the third hose (198) is installed on the first nozzle (15), the top end of the external connecting pipe (192) is embedded in, the rear side of the support frame (193) is fixed with the cleaning bin (2) through bolts.
7. A dust cleaning apparatus for semiconductor manufacturing according to claim 1, wherein: clean bench mechanism (23) comprise frame (231), commentaries on classics roller (232), pivot (233), axle area (234), second motor (235) and soft felt (236), frame (231) inner wall is controlled two and is rotated and install and change roller (232), change roller (232) right-hand member and install, pivot (233), adjacent room of pivot (233) is through axle area (234) normal running fit, fixed mounting is on pivot (233) after second motor (235) left end rotor portion penetrates frame (231), the pivot (233) outside is equipped with soft felt (236) through powerful gluing, both ends bolt mounting is in clean storehouse (2) about frame (231).
8. A dust cleaning apparatus for semiconductor production according to claims 1 and 7, wherein: the vertical height difference between the top side of the table holding mechanism (10) and the soft felt (236) is-2.5 cm, and the minimum distance between the top side of the frame (231) and the displacement assembly (12) is 12 cm.
9. A dust cleaning apparatus for semiconductor manufacturing according to claim 5, wherein: the electric heating rods (185) are arranged on the electric heating seat (184) at intervals in a circular track, the overall outline of the outer side of the sticking ring (186) is in a circle shape, and more than two fins (187) are arranged on the sticking ring (186) at intervals.
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