CN112934848B - Dust cleaning equipment for semiconductor preparation - Google Patents
Dust cleaning equipment for semiconductor preparation Download PDFInfo
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- CN112934848B CN112934848B CN202110130710.6A CN202110130710A CN112934848B CN 112934848 B CN112934848 B CN 112934848B CN 202110130710 A CN202110130710 A CN 202110130710A CN 112934848 B CN112934848 B CN 112934848B
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- clean
- frame
- pipe
- hose
- mechanical arm
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- 238000004140 cleaning Methods 0.000 title claims abstract description 46
- 239000004065 semiconductor Substances 0.000 title claims abstract description 28
- 239000000428 dust Substances 0.000 title claims abstract description 19
- 238000002360 preparation method Methods 0.000 title abstract description 11
- 230000007246 mechanism Effects 0.000 claims abstract description 57
- 239000007788 liquid Substances 0.000 claims abstract description 26
- 238000006073 displacement reaction Methods 0.000 claims abstract description 18
- 238000011049 filling Methods 0.000 claims abstract description 14
- 239000004744 fabric Substances 0.000 claims abstract description 8
- 238000005485 electric heating Methods 0.000 claims description 20
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 12
- 238000011068 loading method Methods 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 claims description 10
- 239000003292 glue Substances 0.000 claims description 4
- 230000002093 peripheral effect Effects 0.000 claims description 3
- 230000002146 bilateral effect Effects 0.000 claims description 2
- 238000002347 injection Methods 0.000 claims 1
- 239000007924 injection Substances 0.000 claims 1
- 230000000149 penetrating effect Effects 0.000 claims 1
- 238000000746 purification Methods 0.000 claims 1
- 239000007789 gas Substances 0.000 description 13
- 230000000694 effects Effects 0.000 description 8
- 238000004026 adhesive bonding Methods 0.000 description 6
- 230000008878 coupling Effects 0.000 description 5
- 238000010168 coupling process Methods 0.000 description 5
- 238000005859 coupling reaction Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 108010066114 cabin-2 Proteins 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000004887 air purification Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 238000009529 body temperature measurement Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000005202 decontamination Methods 0.000 description 1
- 230000003588 decontaminative effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B5/00—Cleaning by methods involving the use of air flow or gas flow
- B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/10—Cleaning by methods involving the use of tools characterised by the type of cleaning tool
- B08B1/14—Wipes; Absorbent members, e.g. swabs or sponges
- B08B1/143—Wipes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
- F26B21/001—Drying-air generating units, e.g. movable, independent of drying enclosure
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
- F26B21/004—Nozzle assemblies; Air knives; Air distributors; Blow boxes
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Cleaning In General (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
The invention discloses dust cleaning equipment for semiconductor preparation, which structurally comprises a supporting seat, a clean cabin, a cabin opening, curtain cloth, an observation window, support legs, a table holding mechanism, a displacement assembly, a first six-axis mechanical arm, a second six-axis mechanical arm, a first nozzle, a second nozzle, a liquid filling mechanism, an air cleaning mechanism, an illuminating lamp, an exhaust port, a grid and a table cleaning mechanism.
Description
Technical Field
The invention belongs to the technical field of semiconductor preparation, and particularly relates to dust cleaning equipment for semiconductor preparation.
Background
The semiconductor is a material with the conductivity between the conductor and the insulator at normal temperature, and has wide application in radio, television and temperature measurement, and the preparation of the semiconductor usually needs a bearing platform to bear a semiconductor wafer, and carries out subsequent processing operation on the semiconductor, so that the semiconductor is an important bearing part in the preparation of the semiconductor;
in the micro-processing of semiconductor devices, since the space units are all calculated in microns, the fine dust particles are adhered to the wafer for manufacturing the semiconductor devices, which may affect the precise wiring layout pattern thereon, causing serious consequences of electrical short circuit or open circuit.
Disclosure of Invention
Technical problem to be solved
In order to overcome the defects in the prior art, the dust cleaning equipment for semiconductor preparation is provided, so that the problems that the cleaning grade of a bearing table is difficult to improve and the yield and the quality of semiconductors are easily influenced in the semiconductor preparation process are solved, and the effects of comprehensively and effectively cleaning the bearing table, improving the cleaning grade and increasing the quality and the yield of semiconductor finished products are achieved.
(II) technical scheme
The invention is realized by the following technical scheme: the invention provides dust cleaning equipment for semiconductor preparation, which comprises a supporting seat, a cleaning bin, a bin opening, curtain cloth, an observation window, support legs, a control panel, a control key, a conveying assembly, a holding mechanism, a clamping mechanical arm, a displacement assembly, a first six-axis mechanical arm, a second six-axis mechanical arm, a first nozzle, a second nozzle, a liquid filling mechanism, an air cleaning mechanism, a lighting lamp, an exhaust port, a grid and a cleaning mechanism, wherein the top end of the supporting seat is riveted with the cleaning bin, bin openings for placing and moving out a wafer carrier are formed in the front side and the rear side of the cleaning bin, the curtain cloth is arranged on the top end of the inner wall of the bin opening through strong adhesion, the support legs are arranged at four corners of the bottom side of the supporting seat through bolts, the rear side of the control panel is riveted on the supporting seat, and the control key is embedded in the top end of the control panel, clean storehouse inner wall bottom embedding is installed and is sent the subassembly, the mechanism bottom fixed mounting is held on sending the subassembly to the platform, press from both sides the symmetry around the platform arm and install in clean storehouse inner wall right-hand member, displacement subassembly is installed to two bolts around the clean storehouse inner wall, first six arms and the six arm bottoms of second slide along the displacement subassembly to first nozzle and the second nozzle that clean operation was used are installed respectively to first six arms and the six arm bottoms of second, liquid is irritated mechanism and gas and is irritated mechanism rear end bolt and install in the clean storehouse, gas is cleaned mechanism bolt and is installed in the inside rear side of clean storehouse, the light is installed at clean storehouse top interval, the inside rear side in clean storehouse is opened and is equipped with the gas vent to the grid is installed to the gas vent inner wall, two bolts are installed on the clean storehouse around the clean storehouse.
Further, the mechanism is held to the platform comprises underframe, platform groove, inside groove, push rod, pillar block, guide rail, revolving rack, clamp splice and cylinder, the platform groove has been seted up at underframe top side middle part, the inside of underframe is provided with the inside groove, sliding mounting is on the inside groove behind the push rod, the pillar block is installed perpendicularly to push rod top side, the pillar block outside slides along the revolving rack through the guide rail, be equipped with the clamp splice through powerful gluing after the underframe is worn out to the revolving rack top, cylinder rear end promotion portion fixed mounting is on the push rod, underframe left and right sides bolt mounting is on clean storehouse.
Further, the displacement subassembly comprises first motor, frame, shaft coupling, lead screw, cover frame, footstock and slide bar, first motor bottom bolted mounting is on the frame, first motor left end rotor portion is fixed through shaft coupling and lead screw, both ends are rotated about the lead screw and are installed on the cover frame, footstock bottom bolted mounting is on the frame, both ends are installed perpendicularly on the footstock about the slide bar, frame and cover frame front end and clean storehouse bolted mounting, lead screw outer wall and first six arm and the six arm threaded connection of second, slide bar outer wall and first six arm and the six arm sliding contact of second.
Further, the liquid filling mechanism is composed of a shell, a liquid inlet pipe, a water pump, an input pipe, a first electromagnetic valve, an output pipe and a first hose, the liquid inlet pipe is installed in the middle of the top end of the shell in an embedded mode, a bolt at the top end of the water pump is installed in the shell, the right end of the input pipe is installed on the water pump, the left end of the input pipe penetrates out of the shell and is installed on the first electromagnetic valve, the output pipe is installed at the left end of the first electromagnetic valve, the bottom end of the output pipe is in threaded connection with the first hose, a bolt at the rear side of the shell is installed on the clean cabin, the bottom end of the first hose is installed on the second nozzle, and the top end of the liquid inlet pipe is installed on the clean cabin in an embedded mode.
Further, the mechanism is irritated by framework, blow vent, filter screen, electric heat seat, electric heat pole, subsides circle, fin, air-blower, first gas-supply pipe, second solenoid valve, second gas-supply pipe and second hose are constituteed, framework top side left part blow vent, filter screen week portion locates in the blow vent through powerful gluing, electric heat seat right side bolt is installed in the framework to electric heat seat left side installs the electric heat pole perpendicularly, the subsides circle is installed in the electric heat pole outside, both ends weld on the subsides circle about the fin, the air-blower bottom is fixed with the framework bolt, first gas-supply pipe is installed to air-blower left end tuber pipe portion, fixed with the second solenoid valve after the framework is worn out to first gas-supply pipe left end, second solenoid valve left end is fixed with the second gas-supply pipe, second hose top is fixed with the embedding of second gas-supply pipe to second hose bottom is installed on the second nozzle, framework rear side and clean storehouse bolt fastening.
Further, the gas cleaning mechanism is composed of a tank body, an external pipe, a support frame, a bottom connecting pipe, a third electromagnetic valve, a first pressure reducing valve, a second pressure reducing valve and a third hose, the external pipe is installed in the middle of the top end of the tank body in an embedded mode, the two support frames which are symmetrically distributed in the left-right direction are installed on bolts at the rear side of the tank body, the top end of the bottom connecting pipe is embedded in the tank body, the third electromagnetic valve is installed in the middle of the bottom connecting pipe, the first pressure reducing valve and the second pressure reducing valve are sequentially installed at the bottom end of the bottom connecting pipe from left to right, the third hose is fixedly installed at the right end of the second pressure reducing valve, the right end of the third hose is installed on the first nozzle, the top end of the external pipe is embedded in the clean bin, and the support frame rear side is fixed to the clean bin through bolts.
Further, clean platform mechanism comprises frame, commentaries on classics roller, pivot, axle area, second motor and soft felt, two portions are rotated and are installed and change the roller about the frame inner wall, change the roller right-hand member and install, the pivot, through axle area normal running fit between the pivot is adjacent, second motor left end rotor portion penetrates fixed mounting in the pivot behind the frame, the pivot outside is equipped with soft felt through powerful gluing, both ends bolt mounting is in clean storehouse about the frame.
Furthermore, the vertical height difference between the top side of the table holding mechanism and the soft felt is-2.5 cm, and the minimum distance between the top side of the frame and the displacement assembly is 12cm.
Furthermore, the electric heating rods are arranged on the electric heating seat at intervals in a circular track, the overall outline of the outer side of the sticking ring is in a circle shape, and more than two fins are arranged on the sticking ring at intervals.
(III) advantageous effects
Compared with the prior art, the invention has the following beneficial effects:
after the bearing table is clamped by the clamping table mechanical arm, the bearing table is fixed by the clamping mechanism, the bearing table is driven by the conveying assembly to move, the bearing table drives the second nozzle along with the second six-axis mechanical arm, the bearing table surface is subjected to gas-liquid treatment by the liquid filling mechanism and the gas filling mechanism, the bearing table is cleaned by the gas cleaning mechanism, and then subsequent cleaning treatment is carried out by the gas cleaning mechanism, so that the effects of comprehensively and effectively cleaning the bearing table, improving the cleaning grade and increasing the quality and the yield of semiconductor finished products are achieved.
Drawings
Other features, objects and advantages of the invention will become more apparent upon reading of the detailed description of non-limiting embodiments with reference to the following drawings:
FIG. 1 is a schematic structural view of the present invention;
FIG. 2 is a schematic view of the internal structure of the clean room of the present invention;
FIG. 3 is a schematic view of a table holding mechanism according to the present invention;
FIG. 4 is a schematic view of the displacement assembly of the present invention;
FIG. 5 is a schematic structural diagram of a liquid filling mechanism of the present invention;
FIG. 6 is a schematic structural diagram of an air-filling mechanism of the present invention;
FIG. 7 is a schematic view of the air purification mechanism of the present invention;
FIG. 8 is a schematic view of the structure of the clean bench mechanism of the present invention;
in the figure: <xnotran> -1, -2, -3, -4, -5, -6, -7, -8, -9, -10, -11, -12, -13, -14, -15, -16, -17, -18, -19, -20, -21, -22, -23, -101, -102, -103, -104, -105, -106, -107, -108, -109, -121, -122, -123, -124, -125, -126, -127, -171, -172, -173, -174, -175, -176, -177, -181, -182, -183, -184, -185, -186, -187, -188, -189, -1810, -1811, -1812, -191, -192, -193, -194, -195, -196, </xnotran> A second pressure reducing valve-197, a third hose-198, a frame-231, a roller-232, a rotating shaft-233, a shaft belt-234, a second motor-235 and a soft felt-236.
Detailed Description
Referring to fig. 1 to 8, the present invention provides a dust cleaning apparatus for semiconductor manufacturing: including strut 1, clean storehouse 2, door opening 3, curtain cloth 4, observation window 5, stabilizer blade 6, control panel 7, control key 8, conveying assembly 9, bench mechanism 10, double-layered platform arm 11, displacement assembly 12, first six-axis arm 13, second six-axis arm 14, first nozzle 15, second nozzle 16, liquid filling mechanism 17, gas filling mechanism 18, gas cleaning mechanism 19, light 20, gas vent 21, grid 22 and clean platform mechanism 23, strut 1 top riveting has clean storehouse 2, door opening 3 that is used for placing and shifting out wafer carrier is offered to both sides around clean storehouse 2, door opening 3 inner wall top is equipped with curtain cloth 4 through powerful gluing, strut 1 bottom side bolt four corners 6 is installed to the bottom side bolt, control panel 7 rear side riveting is on strut 1, and control panel 7 top embedding is provided with control key 8, conveying assembly 9 is installed to clean storehouse 2 inner wall bottom embedding, bench mechanism 10 bottom fixed mounting is on conveying assembly 9, double-layered platform arm 11 front and back symmetry installs in the inner wall 2, and back bolt 2 is installed in the clean storehouse 2, and carry out the second nozzle mechanism 14 and clean storehouse 14, and clean storehouse 2 inner wall 14 are installed to clean storehouse 2 inner wall 14, and carry out the effect of six-axis bolt 2 displacement mechanism 17 and clean storehouse 14 are installed to clean storehouse 2 rear side bolt 2.
Wherein, the table is held mechanism 10 and is become by underframe 101, platform groove 102, inside groove 103, push rod 104, pillar block 105, guide rail 106, revolving rack 107, clamp splice 108 and cylinder 109, underframe 101 top side middle part has seted up platform groove 102, underframe 101 inside is provided with inside groove 103, push rod 104 rear side slidable mounting is on inside groove 103, pillar block 105 is installed perpendicularly to push rod 104 top side, the pillar block 105 outside slides along revolving rack 107 through guide rail 106, be equipped with clamp splice 108 through powerful gluing after underframe 101 is worn out on revolving rack 107 top, cylinder 109 rear end promotion portion fixed mounting is on push rod 104, underframe 101 left and right sides bolt mounting is on clean storehouse 2, carries out effective stable centre gripping to the plummer and fixes, does benefit to subsequent transport clean stable.
The displacement assembly 12 comprises a first motor 121, a base 122, a coupling 123, a screw rod 124, a sleeve frame 125, a top seat 126 and a slide rod 127, the bottom end of the first motor 121 is bolted to the base 122, a rotor part at the left end of the first motor 121 is fixed to the screw rod 124 through the coupling 123, the left end and the right end of the screw rod 124 are rotatably mounted to the sleeve frame 125, the bottom end of the top seat 126 is bolted to the base 122, the left end and the right end of the slide rod 127 are vertically mounted to the top seat 126, the front ends of the base 122 and the sleeve frame 125 are bolted to the clean cabin 2, the outer wall of the screw rod 124 is in threaded connection with the first six-axis mechanical arm 13 and the second six-axis mechanical arm 14, the outer wall of the slide rod 127 is in sliding connection with the first six-axis mechanical arm 13 and the second six-axis mechanical arm 14, so that stable displacement and stable use are provided for the first six-axis mechanical arm 13 and the second six-axis mechanical arm 14, and the displacement assembly can be matched with the transmission assembly 9 to clean a moving bearing platform.
The liquid filling mechanism 17 is composed of a casing 171, a liquid inlet pipe 172, a water pump 173, an input pipe 174, a first electromagnetic valve 175, an output pipe 176 and a first hose 177, the liquid inlet pipe 172 is embedded in the middle of the top end of the casing 171, the top end of the water pump 173 is installed in the casing 171 through a bolt, the right end of the input pipe 174 is installed on the water pump 173, the left end of the input pipe 174 penetrates out of the casing 171 and then is installed on the first electromagnetic valve 175, the output pipe 176 is installed at the left end of the first electromagnetic valve 175, the bottom end of the output pipe 176 is in threaded connection with the first hose 177, the rear side of the casing 171 is installed on the clean cabin 2 through a bolt, the bottom end of the first hose 177 is installed on the second nozzle 16, the top end of the liquid inlet pipe 172 is embedded in the clean cabin 2, so that after cleaning liquid is loaded in the casing 171, the conveying of the liquid for cleaning the bearing platform is performed, and the cleaning efficiency is facilitated.
The air filling mechanism 18 comprises a frame 181, a vent 182, a filter screen 183, an electric heating seat 184, an electric heating rod 185, a sticking ring 186, a fin 187, a blower 188, a first air pipe 189, a second electromagnetic valve 1810, a second air pipe 1811 and a second hose 1812, wherein the peripheral part of the top side of the frame 181 is provided with the left vent 182, the peripheral part of the filter screen 183 is adhered in the vent 182 by strong glue, the right side of the electric heating seat 184 is bolted on the frame 181, the electric heating rod 185 is vertically installed on the left side of the electric heating seat 184, the sticking ring 186 is installed on the outer side of the electric heating rod 185, the left end and the right end of the fin 187 are welded on the sticking ring 186, the bottom end of the blower 188 is bolted with the frame 181, the air pipe part at the left end of the blower 188 is provided with the first air pipe 189, the left end of the first air pipe 189 penetrates through the frame 181 and is fixed with the second electromagnetic valve 1810, the left end of the second air pipe 1811 is fixed with the second air pipe 1812, the top end of the second hose 1812 is embedded in the second nozzle 16, and the rear side of the frame 181 and the fixed with the dust removal carrying table for cleaning and the dust removal table.
Wherein, the gas clean mechanism 19 comprises jar body 191, external pipe 192, strut 193, end takeover 194, third solenoid valve 195, first relief pressure valve 196, second relief pressure valve 197 and third hose 198, jar body 191 top middle part embedding is installed and is taken over 192 outward, jar body 191 rear side bolt is installed in bilateral symmetry's two department strut 193, end takeover 194 top embedding is installed on jar body 191, end takeover 194 mid-mounting has third solenoid valve 195 to end takeover 194 bottom installs first relief pressure valve 196 and second relief pressure valve 197 from a left side to the right side in proper order, second relief pressure valve 197 right-hand member fixed mounting has third hose 198, third hose 198 right-hand member is installed on first nozzle 15, external pipe 192 top embedding is installed on clean storehouse 2, strut 193 rear side and clean storehouse 2 bolt fastening decompose the oxidation dirt on the plummer, improve clean effect.
Wherein, clean platform mechanism 23 comprises frame 231, commentaries on classics roller 232, pivot 233, axle area 234, second motor 235 and soft felt 236, two portions are rotated and are installed and change roller 232 about frame 231 inner wall, change roller 232 right-hand member and install, pivot 233 is adjacent to be in the normal running fit of axle area 234, second motor 235 left end rotor portion penetrates frame 231 after fixed mounting on pivot 233, the pivot 233 outside is equipped with soft felt 236 through powerful gluing, both ends bolt mounting is in clean storehouse 2 about frame 231, brushes repeatedly the clean to the plummer and moves cleanly the improvement clean effect.
The vertical height difference between the top side of the table holding mechanism 10 and the soft felt 236 is-2.5 cm, the minimum distance between the top side of the frame 231 and the displacement assembly 12 is 12cm, the soft felt 236 is made of superfine fibers during preparation, has strong decontamination performance and can not be unhaired, so that the soft felt 236 can be effectively contacted and scrubbed with a bearing table, and the use is convenient.
The electric heating rods 185 are arranged on the electric heating seat 184 at intervals in a circular track, the overall outline of the outer side of the sticking ring 186 is in a circle shape, and more than two fins 187 are arranged on the sticking ring 186 at intervals, so that the fins 187 can improve the heat emission effect and are beneficial to the drying effect.
The working principle is as follows:
1. when the device is used, the device is placed at a proper position, then the control panel 7 and an external power supply can be electrified, the liquid inlet pipe 172 and the external pipe 192 are respectively communicated with a cleaning liquid pipeline and an argon gas supply pipeline after being communicated with each other, then the exhaust port 21 is connected with external exhaust equipment, then a bearing table can be placed in the table groove 102 on the bottom frame 101 through the bin port 3 and the curtain cloth 4, then the operation can be carried out through the observation window 5, the cylinder 109 is electrified and the pushing part of the cylinder 109 is retracted after the corresponding control key 8 is pressed down, the cylinder 109 drives the push rod 104 to be pushed outwards, so that the column block 105 applies force to the rotating frame 107 along the guide rail 106, the bottom end of the rotating frame 107 is close to and rotates on the inner groove 103, the top of the rotating frame 107 drives the clamping block 108 to close, and the clamping block 108 clamps the bearing table in the table groove 102 to fix the bearing table;
2. after the bearing table moves in, the second six-axis mechanical arm 14 can be electrified and drives the second nozzle 16 to approach the bearing table, then the blower 188 can be electrified, and wind power is conveyed outwards through the first air conveying pipe 189, then, after the second electromagnetic valve 1810 is opened through the control key 8, the wind power can be input into the second nozzle 16 through the second air conveying pipe 1811 and the second hose 1812, and the second six-axis mechanical arm 14 drives the second nozzle 16 to perform dust removal cleaning treatment of wind power blowing on the bearing table;
3. then, the control key 8 can be used for electrifying the conveying assembly 9, enabling the conveying assembly 9 to drive the bearing platform in the platform groove 102 to convey in the left direction, then, after the second six-axis mechanical arm 14 is electrified through the control key, the water pump 173 and the air blower 188 are electrified, and after the water pump 173 is electrified, the water pump 173 can output the cleaning liquid input from the liquid inlet pipe 172 outwards through the input pipe 174, and the first electromagnetic valve 175 is electrified and opened, so that the cleaning liquid is conveyed into the second nozzle 16 through the output pipe 176 and the first hose 177, and then the cleaning liquid is sprayed on the bearing platform;
4. then, after the second motor 235 is powered on, the second motor 235 can drive the rotating rollers 232 to rotate through the rotating shafts 233, the adjacent rotating shafts 233 drive the rotating rollers 232 to synchronously rotate together through the shaft belts 234, and after the bearing table is in contact with the soft felt 236 during conveying, the soft felt 236 made of superfine fibers can wipe the surface of the bearing table, so that particles and dirt on the bearing table can be effectively removed and cleaned;
5. after the bearing table is conveyed out of the range of the frame 231, the second six-axis mechanical arm 14 can move synchronously with the bearing table, and if the second six-axis mechanical arm 14 needs to move so as to improve the matching precision, the first motor 121 can be electrified to drive the screw rod 124 to rotate through the coupling 123, and the screw rod 124 can carry out spiral thrust after controlling the left and right directions of the second six-axis mechanical arm 14, so that the second six-axis mechanical arm 14 can carry out left and right direction control movement along the slide bar 127, and the use efficiency is improved;
6. after the wiping, the second six-axis mechanical arm 14 is controlled to drive the second nozzle 16 to approach the bearing platform, the electric heating seat 184 is electrified, the electric heating rod 185 can be electrified to generate heat, the fins 187 on the attachment ring 186 absorb and dissipate heat, the heat dissipation rate is increased, and then hot air can be conveyed to the second nozzle 16 through the second air conveying pipe 1811 and the second hose 1812 by the air blower 188, so that the cleaned bearing platform can be dried by the second nozzle 16;
7. then, after the loading platform moves to the left part of the clean room 2, the first six-axis mechanical arm 13 can be electrified to drive the first nozzle 15 to be close to the loading platform, then the third electromagnetic valve 195 can be electrified to be opened, argon loaded in the tank body 191 is output from the first pressure reducing valve 196 and the second pressure reducing valve 197 from the third hose 198 through the external pipe 192, the loading platform can be sprayed from the first nozzle 15, oxidized dirt on the loading platform can be effectively decomposed by ions, after the completion, when the loading platform is driven to move rightwards by the conveying assembly 9, cleaning can be repeatedly performed through the same steps, and finally, after the loading platform is driven to reset by the conveying assembly 9, the air cylinder 109 can be reset, the clamping block 108 can cancel clamping to the loading platform, then the loading platform can be clamped by the clamping mechanical arm 11 and moved out of the loading platform slot 102, so as to facilitate subsequent dust-free contact moving-out operation, and cleaning is completed.
The control mode of the invention is controlled by manually starting and closing the switch, the wiring diagram of the power element and the supply of the power source belong to the common knowledge in the field, and the invention is mainly used for protecting mechanical devices, so the control mode and the wiring arrangement are not explained in detail in the invention.
While there have been shown and described what are at present considered to be the basic principles and essential features of the invention and advantages thereof, it will be apparent to those skilled in the art that the invention is not limited to the details of the foregoing illustrative embodiments, but is capable of other specific forms without departing from the spirit or essential characteristics thereof. The present embodiments are therefore to be considered in all respects as illustrative and not restrictive, the scope of the invention being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein. Any reference sign in a claim should not be construed as limiting the claim concerned.
Furthermore, it should be understood that although the present description refers to embodiments, not every embodiment may contain only a single embodiment, and such description is for clarity only, and those skilled in the art should integrate the description, and the embodiments may be combined as appropriate to form other embodiments understood by those skilled in the art.
Claims (8)
1. A dust cleaning apparatus for semiconductor manufacturing, characterized in that: comprises a supporting seat (1), a clean cabin (2), a cabin opening (3), curtain cloth (4), an observation window (5), support legs (6), a control panel (7), a control key (8), a conveying component (9), a table holding mechanism (10), a clamping table mechanical arm (11), a displacement component (12), a first six-axis mechanical arm (13), a second six-axis mechanical arm (14), a first nozzle (15), a second nozzle (16), a liquid filling mechanism (17), an air filling mechanism (18), an air cleaning mechanism (19), an illuminating lamp (20), an exhaust port (21), a grid (22) and a table cleaning mechanism (23), wherein the top end of the supporting seat (1) is riveted with the clean cabin (2), the front side and the rear side of the cabin clean cabin (2) are provided with the cabin opening (3) for placing and moving out a wafer loading table, the curtain cloth (4) is arranged at the top end of the inner wall of the cabin opening (3) through strong adhesion, the support legs (6) are arranged at the bottom ends of the riveting four corners of the supporting seat (1) through bolts, the clean cabin opening (7) is arranged on the bottom end of the conveying component (9), the conveying component (9) is embedded in the inner wall of the conveying component (9), press from both sides platform arm (11) front and back symmetry and install in clean storehouse (2) inner wall right-hand member, displacement subassembly (12) are installed to two bolts around clean storehouse (2) inner wall, first six arms (13) and second six arms (14) bottom slide along displacement subassembly (12) to first six arms (13) and second six arms (14) bottom are installed clean operation purpose first nozzle (15) and second nozzle (16) respectively, mechanism (17) are irritated to liquid and mechanism (18) rear end bolt is installed in clean storehouse (2), mechanism (19) bolt is installed in the inside rear side of clean storehouse (2), light (20) are installed at clean storehouse (2) top interval, the inside rear side in clean storehouse (2) is opened and is equipped with gas vent (21) to grid (22) are installed to gas vent (21) inner wall, two bolts are installed on clean storehouse (2) around clean bench mechanism (23).
2. A dust cleaning apparatus for semiconductor manufacturing according to claim 1, wherein: the table holding mechanism (10) is composed of a bottom frame (101), a table groove (102), an inner groove (103), a push rod (104), column blocks (105), a guide rail (106), a rotating frame (107), clamping blocks (108) and an air cylinder (109), the table groove (102) is formed in the middle of the top side of the bottom frame (101), the inner groove (103) is formed in the bottom frame (101), the rear side of the push rod (104) is slidably mounted on the inner groove (103), the column blocks (105) are perpendicularly mounted on the top side of the push rod (104), the outer sides of the column blocks (105) slide along the rotating frame (107) through the guide rail (106), the clamping blocks (108) are arranged on the top end of the rotating frame (107) after penetrating through the bottom frame (101) through powerful glue, the rear end pushing portion of the air cylinder (109) is fixedly mounted on the push rod (104), and bolts on the left side and the right side of the bottom frame (101) are mounted on the clean bin (2).
3. The dust cleaning apparatus for semiconductor manufacturing according to claim 1, wherein: the displacement assembly (12) comprises a first motor (121), a machine base (122), a coupler (123), a lead screw (124), a sleeve frame (125), a top seat (126) and a sliding rod (127), a bottom end bolt of the first motor (121) is installed on the machine base (122), a rotor part at the left end of the first motor (121) is fixed with the lead screw (124) through the coupler (123), the lead screw (124) is installed on the sleeve frame (125) in a rotating mode at the left end and the right end, the bottom end bolt of the top seat (126) is installed on the machine base (122), the sliding rod (127) is installed on the top seat (126) at the left end and the right end of the sliding rod perpendicularly, the machine base (122) and the sleeve frame (125) are fixed with a bin cleaning 2) bolt, the outer wall of the lead screw (124) is in threaded connection with a first six-axis mechanical arm (13) and a second six-axis mechanical arm (14), and the outer wall of the sliding rod (127) is in sliding contact with the first six-axis mechanical arm (13) and the second six-axis mechanical arm (14).
4. A dust cleaning apparatus for semiconductor manufacturing according to claim 1, wherein: liquid filling mechanism (17) comprises casing (171), feed liquor pipe (172), water pump (173), input tube (174), first solenoid valve (175), output tube (176) and first hose (177), feed liquor pipe (172) is installed in casing (171) top middle part embedding, install in casing (171) water pump (173) top bolt, input tube (174) right-hand member is installed on water pump (173) to install on first solenoid valve (175) after casing (171) is worn out to input tube (174) left end, output tube (176) are installed to first solenoid valve (175) left end, output tube (176) bottom and first hose (177) threaded connection, casing (171) rear side bolt is installed on clean storehouse (2), install on second nozzle (16) first hose (177) bottom, the embedding of feed liquor pipe (172) top is installed on clean storehouse (2).
5. The dust cleaning apparatus for semiconductor manufacturing according to claim 1, wherein: the air injection mechanism (18) comprises a frame body (181), a vent hole (182), a filter screen (183), an electric heating seat (184), an electric heating rod (185), a sticking ring (186), fins (187), a blower (188), a first air pipe (189), a second electromagnetic valve (1810), a second air pipe (1811) and a second hose (1812), the peripheral part of the frame body (181) is adhered in the vent hole (182) through strong glue, the right side of the electric heating seat (184) is bolted on the frame body (181), the left side of the electric heating seat (184) is vertically provided with the electric heating rod (185), the sticking ring (186) is installed on the outer side of the electric heating rod (185), the left end and the right end of the fins (187) are welded on the sticking ring (186), the bottom end of the blower (188) is bolted to the frame body (181), the left end of the blower (188) is provided with a first air pipe (189), the left end of the first air pipe (189) penetrates through the frame body (181) and then is fixed with the second air pipe (1811), the top end of the second air pipe (1812) is embedded in the second hose (1812), the rear side of the frame body (181) is fixed with the clean cabin (2) through bolts.
6. A dust cleaning apparatus for semiconductor manufacturing according to claim 1, wherein: the gas purification mechanism (19) comprises a tank body (191), an external pipe (192), a support (193), a bottom connecting pipe (194), a third electromagnetic valve (195), a first pressure reducing valve (196), a second pressure reducing valve (197) and a third hose (198), the external pipe (192) is installed in the middle of the top end of the tank body (191), the support (193) is installed at two positions of bilateral symmetry distribution at the rear side of the tank body (191), the top end of the bottom connecting pipe (194) is installed on the tank body (191), the third electromagnetic valve (195) is installed in the middle of the bottom connecting pipe (194), the bottom end of the bottom connecting pipe (194) is sequentially provided with the first pressure reducing valve (196) and the second pressure reducing valve (197) from left to right, the third hose (198) is fixedly installed at the right end of the second pressure reducing valve (197), the third hose (198) is installed on the first nozzle (15), the top end of the external pipe (192) is installed on the clean bin (2), and the rear side of the clean bin (193) is fixed with the bolts of the clean bin (2).
7. A dust cleaning apparatus for semiconductor manufacturing according to claim 1, wherein: the clean bench mechanism (23) comprises a frame (231), a rotating roller (232), a rotating shaft (233), a shaft belt (234), a second motor (235) and a soft felt (236), wherein the rotating roller (232) is rotatably installed at the left part and the right part of the inner wall of the frame (231), the right end of the rotating roller (232) is provided with the rotating shaft (233), the rotating shafts (233) are rotatably matched with each other through the shaft belt (234), a rotor part at the left end of the second motor (235) penetrates through the frame (231) and then is fixedly installed on the rotating shaft (233), the soft felt (236) is arranged at the outer side of the rotating shaft (233) through strong glue, and bolts at the left end and the right end of the frame (231) are installed on the clean bin (2); the vertical height difference between the top side of the supporting mechanism (10) and the soft felt (236) is-2.5 cm, and the minimum distance between the top side of the frame (231) and the displacement assembly (12) is 12cm.
8. A dust cleaning apparatus for semiconductor manufacturing according to claim 5, wherein: the electric heating rods (185) are arranged on the electric heating seat (184) at intervals in a circular track, the overall outline of the outer side of the sticking ring (186) is in a circle shape, and more than two fins (187) are arranged on the sticking ring (186) at intervals.
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| CN112934848A (en) | 2021-06-11 |
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Effective date of registration: 20220908 Address after: Room 1808, 18th Floor, Building 3, Science and Technology Industrial Park, Wuhu High-tech Industrial Development Zone, Yijiang District, Wuhu City, Anhui Province, 241002 Applicant after: Wuhu MiG Semiconductor Testing Co.,Ltd. Address before: Guan Qiao Zhen Jiu Xi Cun, Nan'an City, Quanzhou City, Fujian Province 362300 Applicant before: Shen Faming |
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