CN112703065A - 超声波清洗机 - Google Patents

超声波清洗机 Download PDF

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Publication number
CN112703065A
CN112703065A CN201880096045.XA CN201880096045A CN112703065A CN 112703065 A CN112703065 A CN 112703065A CN 201880096045 A CN201880096045 A CN 201880096045A CN 112703065 A CN112703065 A CN 112703065A
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CN
China
Prior art keywords
ultrasonic
compressed gas
cleaning machine
gas discharge
ultrasonic cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201880096045.XA
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English (en)
Inventor
林晓群
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shenzhen Royole Technologies Co Ltd
Original Assignee
Shenzhen Royole Technologies Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shenzhen Royole Technologies Co Ltd filed Critical Shenzhen Royole Technologies Co Ltd
Publication of CN112703065A publication Critical patent/CN112703065A/zh
Pending legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
    • B08B11/04—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto specially adapted for plate glass, e.g. prior to manufacture of windshields
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B5/00—Cleaning by methods involving the use of air flow or gas flow
    • B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B5/00—Cleaning by methods involving the use of air flow or gas flow
    • B08B5/04—Cleaning by suction, with or without auxiliary action

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning In General (AREA)

Abstract

一种超声波清洗机(100)，包括机架(10)、压缩气体排出部(30)、超声波发生器(40)及真空吸入部(50)，压缩气体排出部(30)、超声波发生器(40)及所述真空吸入部(50)均设于机架(10)上，压缩气体排出部(30)用于向清洗对象(200)排放携带有清洗溶剂(500)的压缩气流，超声波发生器(40)用于向清洗对象(200)发射超声波，真空吸入部(50)用于吸入经超声波与压缩气流处理后从清洗对象(200)上剥离的杂质。清洗溶剂(500)能够软化清洗对象(200)上的杂质(400)中的油脂，使得杂质(400)中的油脂更容易脱离清洗对象(200)，从而提高超声波清洗机的杂质去除率。

Description

PCT国内申请，说明书已公开。

Claims (19)

  1. PCT国内申请，权利要求书已公开。
CN201880096045.XA 2018-10-09 2018-10-09 超声波清洗机 Pending CN112703065A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/CN2018/109447 WO2020073192A1 (zh) 2018-10-09 2018-10-09 超声波清洗机

Publications (1)

Publication Number Publication Date
CN112703065A true CN112703065A (zh) 2021-04-23

Family

ID=70163757

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201880096045.XA Pending CN112703065A (zh) 2018-10-09 2018-10-09 超声波清洗机

Country Status (2)

Country Link
CN (1) CN112703065A (zh)
WO (1) WO2020073192A1 (zh)

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2043140U (zh) * 1989-01-28 1989-08-23 辽宁省节能环保设备厂 一种集气排气的气幕机
JP2002316110A (ja) * 2001-04-19 2002-10-29 Matsushita Electric Ind Co Ltd 電子部品の洗浄方法およびそれに用いる洗浄装置
JP2003017457A (ja) * 2001-07-03 2003-01-17 Dainippon Screen Mfg Co Ltd 基板洗浄方法及び装置
CN1575872A (zh) * 2003-07-17 2005-02-09 索尼株式会社 一种清洁装置和清洁方法
JP2005349377A (ja) * 2004-06-14 2005-12-22 Kazuhisa Murata 洗浄乾燥方法および洗浄乾燥装置
US20090007934A1 (en) * 2007-07-06 2009-01-08 Micron Technology, Inc. Systems and methods for exposing semiconductor workpieces to vapors for through-hole cleaning and/or other processes
US20150027490A1 (en) * 2013-07-24 2015-01-29 Shenzhen China Star Optoelectronics Technology Co. Ltd. Method for cleansing glass substrate and device for performing the method
CN105032841A (zh) * 2015-07-23 2015-11-11 熊一凡 用于清理有害粉尘的高压气流手
CN106881326A (zh) * 2017-04-13 2017-06-23 浙江舜宇光学有限公司 用于光学镜头的除尘装置及其除尘方法
CN107020285A (zh) * 2017-04-19 2017-08-08 京东方科技集团股份有限公司 一种超声波清洗装置及基板处理系统
CN207929680U (zh) * 2018-01-05 2018-10-02 吴双 医疗器材清洗干燥设备

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3519118B2 (ja) * 1994-04-07 2004-04-12 島田理化工業株式会社 洗浄装置
JP2006286665A (ja) * 2005-03-31 2006-10-19 Toshiba Corp 電子デバイス洗浄方法及び電子デバイス洗浄装置
JP4531841B2 (ja) * 2008-02-27 2010-08-25 株式会社リコー 洗浄装置及び洗浄方法
CN101716582B (zh) * 2008-12-30 2012-12-05 四川虹欧显示器件有限公司 工业尘埃清洗方法及装置
US10112223B2 (en) * 2013-07-26 2018-10-30 Shenzhen China Star Optoelectronics Technology Co., Ltd Method for cleansing glass substrate and device for performing the method

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2043140U (zh) * 1989-01-28 1989-08-23 辽宁省节能环保设备厂 一种集气排气的气幕机
JP2002316110A (ja) * 2001-04-19 2002-10-29 Matsushita Electric Ind Co Ltd 電子部品の洗浄方法およびそれに用いる洗浄装置
JP2003017457A (ja) * 2001-07-03 2003-01-17 Dainippon Screen Mfg Co Ltd 基板洗浄方法及び装置
CN1575872A (zh) * 2003-07-17 2005-02-09 索尼株式会社 一种清洁装置和清洁方法
JP2005349377A (ja) * 2004-06-14 2005-12-22 Kazuhisa Murata 洗浄乾燥方法および洗浄乾燥装置
US20090007934A1 (en) * 2007-07-06 2009-01-08 Micron Technology, Inc. Systems and methods for exposing semiconductor workpieces to vapors for through-hole cleaning and/or other processes
US20150027490A1 (en) * 2013-07-24 2015-01-29 Shenzhen China Star Optoelectronics Technology Co. Ltd. Method for cleansing glass substrate and device for performing the method
CN105032841A (zh) * 2015-07-23 2015-11-11 熊一凡 用于清理有害粉尘的高压气流手
CN106881326A (zh) * 2017-04-13 2017-06-23 浙江舜宇光学有限公司 用于光学镜头的除尘装置及其除尘方法
CN107020285A (zh) * 2017-04-19 2017-08-08 京东方科技集团股份有限公司 一种超声波清洗装置及基板处理系统
CN207929680U (zh) * 2018-01-05 2018-10-02 吴双 医疗器材清洗干燥设备

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Application publication date: 20210423