CN112649904B - 一种真空镀膜防雾镜片及其制备方法 - Google Patents

一种真空镀膜防雾镜片及其制备方法 Download PDF

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CN112649904B
CN112649904B CN202011591955.0A CN202011591955A CN112649904B CN 112649904 B CN112649904 B CN 112649904B CN 202011591955 A CN202011591955 A CN 202011591955A CN 112649904 B CN112649904 B CN 112649904B
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刘锋
毛良良
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Zenni Optical Inc
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Abstract

本发明公开了一种真空镀膜防雾镜片及其制备方法，加硬树脂镜片前表面经过离子工艺处理活化表面后设置有光学镜片减反射膜组层，减反射膜组层前表面经过离子工艺处理活化表面后镀制有防雾层；所述树脂镜片加硬层前表面，进行离子源轰击，离子工艺处理活化表面，得到表面更致密的膜层，即加硬活化层；所述减反射膜组层采用从内往外依次为SiO2、ZrO2、SiO2、ZrO2、ITO、Al2O3、SiO2的组合膜层；所述减反射膜组层的前表面进行离子源轰击，离子工艺处理活化表面，最后采用电阻热辐射加热蒸镀镀制防雾层，防雾层厚度为10~100nm。

Description

一种真空镀膜防雾镜片及其制备方法
技术领域
本发明镜片技术领域，具体涉及一种真空镀膜防雾镜片及其制备方法。
背景技术
在日常的生活中，当你端起热茶准备喝时，镜片容易起雾。当你从空调中走出来时镜片会起雾。当你从冷的室外走入室内时镜片会起雾。尤其处于疫情期间时，每天佩戴口罩成了必不可少的部分，而佩戴口周及其容易引起镜片起雾，非常影响佩戴效果，干扰正常视线。镜片起雾不但给我们日常生活带来诸多不便，而且会影响日常的正常工作环境。镜片一旦起雾，很难通过擦拭快速去除表面雾气。所以，我们非常需要一种防雾树脂镜片来解决镜片起雾的问题。
由于温差较大造成的起雾，即相对干燥和冷的镜片碰到相对热和水分较多的空气时，会发生冷凝效应，在镜片表面结成细小晶状体，导致了镜片起雾，这就是镜片起雾的原因。而通过降低雾珠的表面张力，使镜片上的雾珠聚合形成超薄的水膜，这可以解决镜片起雾的问题。目前应用较多是用防雾布以及组合喷剂，这种方式相对快捷、方便，但是有效持续时间短(4-5天左右)，维护相对也较麻烦，成本相对也较高，目前市面上可以长期保持防雾效果的镜片总体来说很少。再者，现在市面上的防雾镜片大多表面硬度很低，远远达不到日常耐磨的使用标准，导致镜片防雾性能很快就失效。
发明内容
目的：为了克服现有技术中存在的不足，本发明提供一种真空镀膜防雾镜片及其制备方法。
技术方案：为解决上述技术问题，本发明采用的技术方案为：
第一方面，提供一种真空镀膜防雾镜片，包括加硬树脂镜片，加硬树脂镜片前表面经过离子工艺处理活化表面后设置有光学镜片减反射膜组层，减反射膜组层前表面经过离子工艺处理活化表面后镀制有防雾层；
所述树脂镜片加硬层前表面，进行离子源轰击，离子工艺处理活化表面，得到表面更致密的膜层，即加硬活化层；
所述减反射膜组层采用从内往外依次为SiO2、ZrO2、SiO2、ZrO2、ITO、Al2O3、SiO2的组合膜层；
所述减反射膜组层的前表面进行离子源轰击，离子工艺处理活化表面，最后采用电阻热辐射加热蒸镀镀制防雾层，防雾层厚度为10～100nm。
所述防雾层的材质为有机硅聚合物。
在一些实施例中，所述防雾层采用电阻热辐射加热蒸镀的方式进行镀制，得有机硅聚合物膜层，控制膜料加热进行镀膜，蒸发厚度根据性能要求在10～100nm。
在一些实施例中，所述加硬树脂镜片为表面均布有加硬层的树脂镜片。
进一步的，所述加硬层是通过浸涂法对树脂镜片基体表面形成耐磨加硬层。
在一些实施例中，所述减反射膜组层中，从内往外依次为厚度为110～125nm的SiO2、厚度为20～30nm的ZrO2、厚度为15～25nm的SiO2、厚度为40～50nm的ZrO2、厚度为6～10nm的ITO、厚度为5～10nm的Al2O3、厚度为45～70nm的SiO2。
第二方面，提供所述的真空镀膜防雾镜片的制备方法，包括：
步骤A、将加硬树脂镜片用超声波清洗干净，并在60℃烘干30min，取出，冷却；
步骤B、将步骤A得到的加硬树脂镜片放入真空镀膜腔内进行真空镀膜，真空镀膜工艺为：镀膜腔体温度设定在35-55℃，真空抽至1.0×10-3Pa～1.0×10-5Pa，用Ar进行离子束轰击镜片表面进行活化，采用电子枪依次蒸镀镀制SiO2、ZrO2、SiO2、ZrO2、ITO、Al2O3、SiO2，得到减反射膜组层；
步骤C、再用Ar进行离子束轰击2～10min，使减反射膜组层前表面进行活化处理；
步骤D、采用电阻热辐射加热蒸镀镀制防雾层，控制膜料加热进行镀膜，蒸发厚度根据性能要求在10～100nm。
在一些实施例中，所述的真空镀膜防雾镜片的制备方法，电子枪功率10～50％，电阻热辐射功率为：10～15％，阳极电压90V～120V，阳极电流1A～3A，O2的流量为0sccm～30sccm，Ar的流量为0sccm～50sccm；
在一些实施例中，所述的真空镀膜防雾镜片的制备方法，减反射膜组层各层由电子枪镀制的药品蒸发速率为：SiO2为0.3-3nm/s，ZrO2为0.1-2nm/s，Al2O3为0.5nm/s，防雾层由电子枪镀制的药品蒸发速率为0.12nm/s。
一种真空镀膜防雾镜片，由上述的真空镀膜防雾镜片的制备方法制备而成。
有益效果：本发明真空镀膜防雾镜片及其制备方法，具有以下优点：
1、可以持续防雾，可以多次水洗。
2、无需防雾喷剂，没有环境污染，使用方便，成本低。
3、表面硬度可以高达5～6H，有效减少表面划伤对镜片的影响
4、高透过率，相对于普通防雾镜片最多只有89％的透过率，该防雾镜片透过率高达98％。
附图说明
图1为本发明实施例的结构示意图；
图中：1为树脂镜片，2为加硬层，3为SiO2、ZrO2、SiO2、ZrO2、ITO、Al2O3、SiO2组合膜层的减反射膜组层，4为防雾层。
具体实施方式
下面结合附图及具体实施例对本发明作进一步说明，但本发明并不限于以下实施例。
实施例一
将表面加过硬的聚氨酯类树脂镜片用超声波清洗干净，并在60℃烘箱烘干30min，取出，恢复至常温；
将取出的树脂镜片，放入真空镀膜机器镀制防雾膜，其具体工艺为，真空抽至1.0*10--5Pa，离子束先轰击树脂镜片加硬层表面进行活化，依次镀制SiO2、ZrO2、SiO2、ZrO2、ITO、Al2O3、SiO2，再进行离子源轰击，离子工艺处理活化表面，最后镀制防雾层；
具体的依次镀上115nmSiO2、25nmZrO2、20nmSiO2、45nm的ZrO2、8nm的ITO、6nm的Al2O3、60nm的SiO2，25nm的有机硅聚合物防雾层。
具体镀制工艺为：电子枪功率10％，电阻热辐射功率为：15％，阳级电流：2A，阳级电压：100V；Ar的流量为30sccm，O2的流量为20sccm；
SiO2蒸发速率0.8nm/s、ZrO2蒸发速率1.0nm/s、Al2O3蒸发速率0.5nm/s、特殊离子工艺处理层<1nm/s、防雾层0.1nm/s。
其所述防雾层采用电阻热辐射加热蒸镀的方法的方式进行制得有机硅聚合物膜层，蒸发厚度根据性能要求在10～100nm。
性能测试。
实施例二
将加硬树脂镜片用超声波清洗干净，并在60℃烘箱烘干30min，取出，恢复至常温；
将以上镜片放入真空镀膜机器镀制防雾膜，其具体工艺为，真空抽至1.0*10-3Pa，离子束轰击镜片表面进行活化，依次镀制SiO2、ZrO2、SiO2、ZrO2、ITO、Al2O3、SiO2，再进行离子源轰击，镀制特殊离子工艺处理层层和防雾层；
具体的镀上118nmSiO2、25nmZrO2、20nmSiO2、46nm的ZrO2、10nm的ITO、6nm的Al2O3、55nm的SiO2的减反射膜组层，16nm的有机硅聚合物防雾层。
具体镀制工艺为：电子枪功率15％，电阻热辐射功率为：12％，阳级电流：3A，阳级电压：120V；Ar的流量为30sccm，O2的流量为10sccm；
SiO2蒸发速率0.6nm/s、ZrO2蒸发速率1.5nm/s、Al2O3蒸发速率0.5nm/s、特殊离子工艺处理层0.5nm/s、防雾层0.2nm/s。
其所述防雾层采用电阻热辐射加热蒸镀的方法的方式进行制得有机硅聚合物膜层，蒸发厚度根据性能要求在10～100nm。
性能测试。
实施例三
将加硬树脂镜片用超声波清洗干净，并在60℃烘箱烘干30min，取出，恢复至常温；
将以上镜片取出，放入真空镀膜机器镀制防雾膜，其具体工艺为，真空抽至1.0*10-3Pa，离子束轰击镜片表面进行活化，依次镀制SiO2、ZrO2、SiO2、ZrO2、ITO、Al2O3、SiO2，再进行离子源轰击，镀制特殊离子工艺处理层和防雾层；
具体的镀上120nmSiO2、30nmZrO2、20nmSiO2、50nm的ZrO2、6nm的ITO、10nm的Al2O3、65nm的SiO2、30nm的Ti3O5、20nm的有机硅聚合物防雾层。
具体镀膜工艺为：其镀制工艺为：电子枪功率10％，电阻热辐射功率为：13％，阳级电流：3A，阳级电压：90V；Ar的流量为20sccm，O2的流量为30sccm；
SiO2蒸发速率1.0nm/s、ZrO2蒸发速率1.0nm/s、Al2O3蒸发速率0.5nm/s、特殊离子工艺处理层层1.5nm/s、防雾层0.1nm/s。
其所述防雾层采用电阻热辐射加热蒸镀的方法的方式进行制得有机硅聚合物膜层，蒸发厚度根据性能要求在10～100nm。
性能测试
对比例1
将加硬树脂镜片用超声波清洗干净，并在60℃烘箱烘干30min，取出，恢复至常温；
将以上树脂镜片放入真空镀膜机器镀制防雾膜，其具体工艺为，真空抽至1.0*10- 5Pa，离子束轰击镜片表面进行活化，依次镀制SiO2、ZrO2、SiO2、ZrO2、ITO、Al2O3、SiO2；及普通防水层；
具体的镀上120nmSiO2、30nmZrO2、20nmSiO2、50nm的ZrO2、6nm的ITO、10nm的Al2O3、65nm的SiO2。15nm的HT-100
具体镀膜工艺为：其镀制工艺为：电子枪功率10％，阳级电流：3A，阳级电压：90V；Ar的流量为20sccm，O2的流量为30sccm；
SiO2蒸发速率1.0nm/s、ZrO2蒸发速率1.0nm/s、Al2O3蒸发速率0.5nm/s、防水层蒸发速率0.1nm/s。
对比例2
将树脂镜片用超声波清洗干净，并在60℃烘箱烘干30min，取出，恢复至常温；
将以上镜片表面提拉镀制高分子防雾防雾药水，常温固化2小时。
性能测试。
性能测试结果如下表所示：
Figure BDA0002867193940000081
结果显示：本发明工艺生产的防雾镜片具有良好的防雾效果，其表面硬度和透过率都能达到很高的等级。
以上所述仅是本发明的优选实施方式，应当指出：对于本技术领域的普通技术人员来说，在不脱离本发明原理的前提下，还可以做出若干改进和润饰，这些改进和润饰也应视为本发明的保护范围。

Claims (9)

1.一种真空镀膜防雾镜片，包括加硬树脂镜片，其特征在于，加硬树脂镜片前表面经过离子工艺处理活化表面后设置有光学镜片减反射膜组层，减反射膜组层前表面经过离子工艺处理活化表面后镀制有防雾层；
所述树脂镜片加硬层前表面，进行离子源轰击，离子工艺处理活化表面，得到表面更致密的膜层，即加硬活化层；
所述减反射膜组层采用从内往外依次为SiO2、ZrO2、SiO2、ZrO2、ITO、Al2O3、SiO2的组合膜层；所述减反射膜组层中，从内往外依次为厚度为110~125nm的SiO2、厚度为20~30nm的ZrO2、厚度为15~25nm的SiO2、厚度为40~50nm的ZrO2、厚度为6~10nm的ITO、厚度为5~10nm的Al2O3、厚度为45~70nm的SiO2；
所述减反射膜组层的前表面进行离子源轰击，离子工艺处理活化表面，最后采用电阻热辐射加热蒸镀镀制防雾层，防雾层厚度为10~100nm。
2.根据权利要求1所述的真空镀膜防雾镜片，其特征在于，所述防雾层的材质为有机硅聚合物。
3.根据权利要求1或2所述的真空镀膜防雾镜片，其特征在于，所述防雾层采用电阻热辐射加热蒸镀的方式进行镀制，得有机硅聚合物膜层，控制膜料加热进行镀膜，蒸发厚度根据性能要求在10~100nm。
4.根据权利要求1所述的真空镀膜防雾镜片，其特征在于，所述加硬树脂镜片为表面均布有加硬层的树脂镜片。
5.根据权利要求1或2所述的真空镀膜防雾镜片，其特征在于，所述加硬层是通过浸涂法对树脂镜片基体表面形成耐磨加硬层。
6.权利要求1-5任一项所述的真空镀膜防雾镜片的制备方法，其特征在于，包括：
步骤A、将加硬树脂镜片用超声波清洗干净，并在60℃烘干30min，取出，冷却；
步骤B、将步骤A得到的加硬树脂镜片放入真空镀膜腔内进行真空镀膜，真空镀膜工艺为：镀膜腔体温度设定在35-55℃，真空抽至1.0×10-3Pa~1.0×10-5Pa，用Ar进行离子束轰击镜片表面进行活化，采用电子枪依次蒸镀镀制SiO2、ZrO2、SiO2、ZrO2、ITO、Al2O3、SiO2，得到减反射膜组层；
步骤C、再用Ar进行离子束轰击2~10min，使减反射膜组层前表面进行活化处理；
步骤D、采用电阻热辐射加热蒸镀镀制防雾层，控制膜料加热进行镀膜，蒸发厚度根据性能要求在10~100nm。
7.根据权利要求6所述的真空镀膜防雾镜片的制备方法，其特征在于，电子枪功率10~50%，电阻热辐射功率为：10~15%，阳极电压90V～120V，阳极电流1A～3A，O2的流量为0sccm～30sccm，Ar的流量为0sccm～50sccm。
8.根据权利要求6所述的真空镀膜防雾镜片的制备方法，其特征在于，减反射膜组层各层由电子枪镀制的药品蒸发速率为：SiO2为0.3-3nm/s，ZrO2 为0.1-2nm/s， Al2O3为0.5nm/s，防雾层由电子枪镀制的药品蒸发速率为0.12nm/s 。
9.一种真空镀膜防雾镜片，其特征在于，由权利要求6-8任一项所述的真空镀膜防雾镜片的制备方法制备而成。
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