CN112415641A - 一种带镧系氧化物疏水光学薄膜的光学镜片及其制备 - Google Patents
一种带镧系氧化物疏水光学薄膜的光学镜片及其制备 Download PDFInfo
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Abstract
本发明公开了一种原子层沉积法制备的镧系氧化物疏水光学薄膜,其膜层材料采用镧系氧化物,该膜层镀于光学镜片基底表面时,不影响原镜片的光学性能。可应用于要求疏水性的光学器件表面,如防污染光学透射镜,反射镜等。本发明的镧系氧化物薄膜须采用原子层沉积镀膜工艺和设备进行制备,疏水性好,光学性能优良,应用广泛。
Description
技术领域
本发明涉及镀膜领域,具体涉及到一种可保证疏水性和透光性双重性质的镧系氧化物疏水光学薄膜领域。
背景技术
疏水和超疏水涂层成为近年来的研究热点。最开始,人们利用仿生学原理,模仿荷叶表面的微纳结构制备疏水涂层,水滴在其表面接触角可达到130°-160°,具备疏水甚至超疏水性能。后来,科学家们开发出一些低表面能的有机疏水涂层,如聚四氟乙烯等。但在一些特殊领域,如具有疏水性要求的光学元器件表面,要求该疏水涂层在工作波段是透明的,并在特殊情况下,可应用于复杂恶劣环境,如高温高湿等条件。一般的氧化物非晶材料,如SiO2,Al2O3等都是亲水性材料,无法满足要求。镧系元素的表面活性较高,因此极易吸附大气中的碳氢物种进而呈现出疏水特性,可满足上述要求,应用于光学元器件表面的疏水涂层。镧系氧化物陶瓷块体材料的疏水性研究已见报道,但薄膜材料报道较少,尤其是应用在光学薄膜上更是罕见报道。
发明内容
为解决上述问题,本发明提供了一种镧系氧化物疏水光学薄膜,用来解决某些光学元器件表面疏水性的要求。
本发明的疏水涂层是非晶态透明的镧系氧化物薄膜,有CeO2,Pr6O11,Nd2O3,Sm2O3,Eu2O3,Gd2O3,Tb4O7,Dy2O3,Ho2O3,Er2O3,Tm2O3,Yb2O3和Lu2O3,共13种。
本发明的镧系氧化物薄膜须由原子层沉积镀膜工艺制备。
所述的镧系氧化物薄膜表面光滑,具有疏水性能。
所述的镧系氧化物薄膜透光波段可涵盖可见光和近红外光波段;折射率可与现有光学膜层材料匹配。
本发明公开了一种原子层沉积法制备的镧系氧化物疏水光学薄膜,其膜层材料采用镧系氧化物,该膜层镀于光学镜片基底表面时,不影响原镜片的光学性能。可应用于要求疏水性的光学器件表面,如防污染光学透射镜、反射镜、带通滤光片、窄带滤光片或太阳能电池表面等。本发明的镧系氧化物薄膜须采用原子层沉积镀膜工艺和设备进行制备,疏水性好,光学性能优良,应用广泛。
附图说明
图1:原子层沉积膜结构示意图,原子层沉积膜厚度为10-30nm,最佳厚度为25nm,基片可以是块体光学材料或光学镜片,也可以是带有单层膜或多层膜的光学镜片。
图2:原子层沉积CeO2膜前后疏水性能比较,膜厚为25nm,左图为水滴在原带通滤光片表面停留照片,静态接触角为52°;右图为水滴在镀CeO2膜的带通滤光片表面停留照片,静态接触角为108°。
图3:实线为设计工作在710-720nm的带通滤光片的透射光谱图,虚线为原子层沉积生长、厚度为25nm的CeO2薄膜的带通滤光片的透射光谱图。可以看出增加一层厚度为25nm的CeO2薄膜对原带通滤光片光学性能几乎无影响。
具体实施方式
为了使本发明的目的及优点更加清楚明白,以下结合具体实施例对本发明进行进一步的详细说明。应当理解,此处所描述的具体实施例仅仅用于解释本发明,并不用于限定本发明。
例:带通滤光片的光入射侧表面镀膜;
由原子层沉积镀膜工艺和设备(型号Nano9000,Ensure Nanotech)进行制备时,所采用的制备参数为:Ce(thmd)4前驱体的蒸出温度为110℃,脉冲持续时间为1s,脉冲间隔为1.5s;臭氧的脉冲持续时间为1.5s,脉冲间隔为2s;高纯氮气(99.999%)做为稀释和缓冲气体;原子层沉积薄膜的生长温度为220℃;反应腔室的压力为2-3mbar。
制得的CeO2薄膜,采用GBX-HTECH接触角仪对其表面润湿性能进行测试,使用去离子水作为润湿液体,液滴体积3μl,水滴在其上的静态接触角达108°。
制得的CeO2薄膜,采用J.A.Woollam Co.,Inc.椭偏仪对膜层厚度和折射率进行测量,扫描波长300-2100nm,扫描步长为10nm,入射角度为55°,60°,65°。测得厚度为25nm,折射率为1.998@1064nm。
制得的CeO2薄膜,采用原子探针显微镜扫描表面,扫描范围5x5μm,结果表明表面粗糙度控制良好,Rms=2.3nm。
实验数据如下表:
表格1.带通滤光片在沉积CeO2薄膜前后的性能对比。
结论:如示例所示,在原带通滤光片表面生长25nm CeO2薄膜后,可大大改善表面疏水性能(见表格1和图2),水滴在镜片表面的静态接触角可从52°增长到108°,由亲水性变为疏水性。同时,该镜片光学性能并不受影响,如表面粗糙度(见表格1)和透光度(图3)。
以上所述仅是本发明的优选实施方式,应当指出,对于本技术领域的普通技术人员来说,在不脱离本发明原理的前提下,还可以作出若干改进和润饰,这些改进和润饰也应视为本发明的保护范围。
Claims (8)
1.一种带镧系氧化物疏水光学薄膜的光学镜片,其特征在于:于光学镜片的受光面或光入射面设有镧系氧化物疏水光学薄膜,镧系氧化物疏水光学薄膜膜层采用镧系氧化物材料,为:CeO2,Pr6O11,Nd2O3,Sm2O3,Eu2O3,Gd2O3,Tb4O7,Dy2O3,Ho2O3,Er2O3,Tm2O3,Yb2O3和Lu2O3,共13种中的一种或二种以上。
2.根据权利要求1所述的光学镜片,其特征在于:光学镜片作为基片可以是块体光学材料或光学镜片,或者也可以是带有单层膜或多层膜的光学镜片。
3.根据权利要求1所述光学镜片,其特征在于:镧系氧化物疏水光学薄膜膜层最佳使用厚度在10-50nm,优选10-30nm,最佳厚度为25nm。
4.根据权利要求1、2或3所述的光学镜片,其特征在于:镧系氧化物疏水光学薄膜在测试波长1064nm下,膜层折射率为n=1.998;该镧系氧化物疏水光学薄膜起疏水隔离作用,并不影响原基片的光学性能。
5.根据权利要求1或2所述的光学镜片,其特征在于:该镧系氧化物疏水光学薄膜膜层为同时具有疏水性和高透光性的薄膜材料,应用在对表面有疏水性要求的光学元器件,所述光学镜片包括透射镜片、反射镜片、带通滤光片、窄带滤光片或太阳能电池透光层表面。
6.一种权利要求1-5任一所述的光学镜片的制备方法,其特征在于:光学镜片表面的镧系氧化物疏水光学薄膜,须采用原子层沉积镀膜工艺和设备进行制备;当采用原子层沉积镀膜工艺和设备进行制备时,所使用的前驱体为Rex(thmd)y,以及臭氧(体积浓度大于等于99.999%)或水;其中Re=Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb和Lu中的一种或二种以上,thmd=2,2,6,6-tetramethyl-3,5-heptanedione,x=1-10的正整数,y=1-10的正整数。
7.根据权利要求6所述的制备方法,其特征在于:当采用原子层沉积镀膜工艺和设备进行制备时,所采用的制备参数为:金属有机物前驱体Rex(thmd)y的蒸出温度为100-130℃,脉冲持续时间为0.5-2s,脉冲间隔为1-3s;臭氧或水的脉冲持续时间为0.5-2s,脉冲间隔为1-3s;高纯氮气(体积浓度大于等于99.999%)做为稀释和缓冲气体;原子层沉积薄膜的生长温度为200-500℃;反应腔室的压力为1-6mbar。
8.根据权利要求6或7所述的制备方法,其特征在于:优选所采用的制备参数为:金属有机物前驱体的蒸出温度为110℃,脉冲持续时间为1s,脉冲间隔为1.5s;臭氧或水的脉冲持续时间为1.5s,脉冲间隔为2s;高纯氮气(体积浓度大于等于99.999%)作为稀释和缓冲气体;原子层沉积薄膜的生长温度为220℃;反应腔室的压力为2-3mbar。
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20040027700A1 (en) * | 2000-08-29 | 2004-02-12 | Kunio Yoshida | Method of forming optical thin film |
US20060243320A1 (en) * | 2005-05-02 | 2006-11-02 | Kazunori Shimazaki | Optical thin film for solar cells and method of forming the same |
CN104877564A (zh) * | 2015-06-15 | 2015-09-02 | 安徽中恩化工有限公司 | 超疏水防油自清洁气雾剂及其制备方法 |
CN107462943A (zh) * | 2016-06-03 | 2017-12-12 | 中国科学院大连化学物理研究所 | 一种带镧系氧化物疏水光学薄膜的光学镜片及其制备 |
CN107920685A (zh) * | 2015-07-20 | 2018-04-17 | Seb公司 | 包含氟碳树脂和稀土氧化物涂层的烹饪制品及制造所述制品的方法 |
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20040027700A1 (en) * | 2000-08-29 | 2004-02-12 | Kunio Yoshida | Method of forming optical thin film |
US20060243320A1 (en) * | 2005-05-02 | 2006-11-02 | Kazunori Shimazaki | Optical thin film for solar cells and method of forming the same |
CN104877564A (zh) * | 2015-06-15 | 2015-09-02 | 安徽中恩化工有限公司 | 超疏水防油自清洁气雾剂及其制备方法 |
CN107920685A (zh) * | 2015-07-20 | 2018-04-17 | Seb公司 | 包含氟碳树脂和稀土氧化物涂层的烹饪制品及制造所述制品的方法 |
CN107462943A (zh) * | 2016-06-03 | 2017-12-12 | 中国科学院大连化学物理研究所 | 一种带镧系氧化物疏水光学薄膜的光学镜片及其制备 |
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