CN112351585A - Pcb侧壁金属化制作方法 - Google Patents

Pcb侧壁金属化制作方法 Download PDF

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CN112351585A
CN112351585A CN202010974817.4A CN202010974817A CN112351585A CN 112351585 A CN112351585 A CN 112351585A CN 202010974817 A CN202010974817 A CN 202010974817A CN 112351585 A CN112351585 A CN 112351585A
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pcb
copper
layer
side wall
tin
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杜军
程声广
黄宁宁
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Dongguan Hongyuen Electronics Co ltd
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0011Working of insulating substrates or insulating layers
    • H05K3/0044Mechanical working of the substrate, e.g. drilling or punching
    • H05K3/0047Drilling of holes
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/38Coating with copper
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/02Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
    • C23C28/023Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material only coatings of metal elements only
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/30Electroplating: Baths therefor from solutions of tin
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/38Electroplating: Baths therefor from solutions of copper
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02Electroplating of selected surface areas
    • C25D5/022Electroplating of selected surface areas using masking means
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10Electroplating with more than one layer of the same or of different metals
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/48After-treatment of electroplated surfaces
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0011Working of insulating substrates or insulating layers
    • H05K3/0044Mechanical working of the substrate, e.g. drilling or punching

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
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  • Electrochemistry (AREA)
  • Manufacturing & Machinery (AREA)
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  • General Chemical & Material Sciences (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)

Abstract

一种PCB侧壁金属化制作方法,包括以下步骤:步骤(1),提供待加工的PCB,PCB的两侧设有外侧铜层,PCB上设有主板区域、镂空区域及废料区域,在PCB的镂空区域进行锣板处理,锣板时打穿PCB,使主板区域外围靠镂空区域处形成外侧壁;步骤(2),电镀铜锡,将PCB放置在沉铜缸中,进行沉铜,通过沉铜处理,PCB的侧壁介质层上沉积薄薄一层铜,导通两侧的铜层,再对PCB进行电镀铜层和锡层处理,PCB侧壁金属化的铜层及外侧铜层表面镀锡,形成锡保护层;步骤(3),断开不需要金属化位置;步骤(4),蚀刻并退锡;步骤(5),沉镍金处理。

Description

PCB侧壁金属化制作方法
技术领域
本发明涉及于一种PCB制作方法,尤其涉及一种PCB侧壁金属化制作方法。
背景技术
PCB(Printed Circuit Board),中文名称为印制电路板,又称印刷线路板,是重要的电子部件,是电子元器件的支撑体,是电子元器件电气连接的载体。由于它是采用电子印刷术制作的,故被称为“印刷”电路板。
现有PCB受工艺影响,无法在PCB外侧壁上PCB,制约着PCB发展,也给PCB在使用过程中带来局限性,因此,需要对传统的PCB成型工艺进行改进。
发明内容
因此,针对现有技术的不足,本发明的目的在于提供一种的PCB侧壁金属化制作方法。
一种PCB侧壁金属化制作方法,包括以下步骤:
步骤(1),提供待加工的PCB,PCB的两侧设有外侧铜层,在后续工艺中,外侧铜层上蚀刻有电路层,PCB上设有主板区域、镂空区域及废料区域,在PCB的镂空区域进行锣板处理,锣板时打穿PCB,使主板区域外围靠镂空区域处形成外侧壁;
步骤(2),电镀铜锡,电镀前,先在PCB板上除胶渣,完成除胶渣后,将PCB放置在沉铜缸中,电镀铜锡,将PCB放置在沉铜缸中,进行沉铜,通过沉铜处理,PCB的侧壁介质层上沉积薄薄一层铜,导通两侧的铜层,再对PCB进行电镀铜层和锡层处理,电镀锡层之前,对PCB外侧铜层上除电路层以外区域覆盖干膜,再进行镀锡处理,使PCB侧壁金属化的铜层及外侧铜层干膜以外表面镀锡,形成锡保护层;
步骤(3),断开不需要金属化位置,在PCB的主板区域靠外侧边缘的位置冲半孔,去除外侧壁不需要金属部分;
步骤(4),蚀刻并退锡,先去除干膜,再对PCB进行蚀刻处理,蚀刻时,由于PCB侧壁金属化的铜层及电路层受锡保护,则不受影响,完成蚀刻后,进行退锡处理,露出制作好的线路层;
步骤(5),沉镍金处理,对PCB的电路层及侧壁金属化的铜层进行沉镍金处理,使之形成一镍金层。
进一步地,步骤(1)中,完成钻孔后,对外侧壁直接采用粗锣和精修,加工出所需金属化的侧壁,并且打磨披锋除去金属毛刺。
综上所述,本发明通过对工艺的改良,在PCB的侧壁上形成一层金属层,使PCB侧壁金属化,减少PCB在使用过程中带来局限性,灵活性好,整个成型工艺效率高,具有较强的推广意义。
附图说明
图1为PCB钻孔后的结构示意图;
图2为产品完成加工后的结构示意图;
具体实施方式
为了使本发明的技术方案能更清晰地表示出来,下面结合附图对本发明作进一步说明。
如图1至2所示,本发明提供一种PCB侧壁金属化制作方法,用于在PCB的外侧壁上成型一层金属层40,使得PCB外侧壁金属化,所述PCB侧壁金属化制作方法包括以下步骤:
步骤(1),提供待加工的PCB,PCB的两侧设有外侧铜层,在后续工艺中,外侧铜层上蚀刻有电路层50,PCB上设有主板区域10、废料区域30及镂空区域20,在PCB的废料区域30进行锣板处理,锣板时打穿PCB,使主板区域10外围靠废料区域30处形成外侧壁,完成钻孔后,对外侧壁直接采用粗锣和精修,加工出所需金属化的侧壁,并且打磨披锋除去金属毛刺;
步骤(2),电镀铜锡,电镀前,先在PCB板上除胶渣,完成除胶渣后,将PCB放置在沉铜缸中,电镀铜锡,将PCB放置在沉铜缸中,进行沉铜,通过沉铜处理,PCB的侧壁介质层上沉积薄薄一层铜,导通两侧的铜层,再对PCB进行电镀铜层和锡层处理,电镀锡层之前,对PCB外侧铜层上除电路层以外区域覆盖干膜,再进行镀锡处理,使PCB侧壁金属化的铜层及外侧铜层干膜以外表面镀锡,形成锡保护层;
步骤(3),断开不需要金属化位置,在PCB的主板区域靠外侧边缘的位置冲半孔,去除外侧壁不需要金属部分;
步骤(4),蚀刻并退锡,先去除干膜,再对PCB进行蚀刻处理,蚀刻时,由于PCB侧壁金属化的铜层40及电路层受锡保护,则不受影响,并且,在蚀刻过程中,化学药水有效去除冲半孔时产生的毛刺,完成蚀刻后,进行退锡处理,露出制作好的线路层50;
步骤(5),沉镍金处理,对PCB的电路层及侧壁金属化的铜层40进行沉镍金处理,使之形成一镍金层。完成制作后,对PCB进行剪板,去除废料区域30。
综上所述,本发明通过对工艺的改良,在PCB的侧壁上形成一层金属层40,使PCB侧壁金属化,减少PCB在使用过程中带来局限性,灵活性好,整个成型工艺效率高,具有较强的推广意义。
以上所述实施例仅表达了本发明的一种实施方式,其描述较为具体和详细,但并不能因此而理解为对本发明专利范围的限制。应当指出的是,对于本领域的普通技术人员来说,在不脱离本发明构思的前提下,还可以做出若干变形和改进,这些都属于本发明的保护范围。因此,本发明专利的保护范围应以所附权利要求为准。

Claims (2)

1.一种PCB侧壁金属化制作方法,其特征在于,包括以下步骤:
步骤(1),提供待加工的PCB,PCB的两侧设有外侧铜层,在后续工艺中,外侧铜层上蚀刻有电路层,PCB上设有主板区域、镂空区域及废料区域,在PCB的镂空区域进行锣板处理,锣板时打穿PCB,使主板区域外围靠镂空区域处形成外侧壁;
步骤(2),电镀铜锡,电镀前,先在PCB板上除胶渣,完成除胶渣后,将PCB放置在沉铜缸中,电镀铜锡,将PCB放置在沉铜缸中,进行沉铜,通过沉铜处理,PCB的侧壁介质层上沉积薄薄一层铜,导通两侧的铜层,再对PCB进行电镀铜层和锡层处理,电镀锡层之前,对PCB外侧铜层上除电路层以外区域覆盖干膜,再进行镀锡处理,使PCB侧壁金属化的铜层及外侧铜层干膜以外表面镀锡,形成锡保护层;
步骤(3),断开不需要金属化位置,在PCB的主板区域靠外侧边缘的位置冲半孔,去除外侧壁不需要金属部分;
步骤(4),蚀刻并退锡,先去除干膜,再对PCB进行蚀刻处理,蚀刻时,由于PCB侧壁金属化的铜层及电路层受锡保护,则不受影响,完成蚀刻后,进行退锡处理,露出制作好的线路层;
步骤(5),沉镍金处理,对PCB的电路层及侧壁金属化的铜层进行沉镍金处理,使之形成一镍金层。
2.如权利要求1所述的PCB侧壁金属化制作方法,其特征在于:步骤(1)中,完成钻孔后,对外侧壁直接采用粗锣和精修,加工出所需金属化的侧壁,并且打磨披锋除去金属毛刺。
CN202010974817.4A 2020-09-16 2020-09-16 Pcb侧壁金属化制作方法 Pending CN112351585A (zh)

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Cited By (1)

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Publication number Priority date Publication date Assignee Title
CN113993290A (zh) * 2021-10-21 2022-01-28 景旺电子科技(龙川)有限公司 金属基印制板制造方法

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CN104135829A (zh) * 2013-04-30 2014-11-05 富葵精密组件(深圳)有限公司 电路板及其制作方法
CN104735900A (zh) * 2013-12-24 2015-06-24 深南电路有限公司 具有侧面金属结构的电路板及其制作方法
CN106231802A (zh) * 2016-09-06 2016-12-14 江门崇达电路技术有限公司 一种金属化半槽的制作方法
CN106714453A (zh) * 2016-12-21 2017-05-24 江门崇达电路技术有限公司 一种假性刚挠结合板及其制备方法
CN110493969A (zh) * 2019-08-19 2019-11-22 江苏上达电子有限公司 一种防止二次蚀刻导致线路侧蚀的方法

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Publication number Priority date Publication date Assignee Title
US6110650A (en) * 1998-03-17 2000-08-29 International Business Machines Corporation Method of making a circuitized substrate
CN104066273A (zh) * 2013-03-20 2014-09-24 深南电路有限公司 一种封装基板及其制作方法和基板组件
CN104135829A (zh) * 2013-04-30 2014-11-05 富葵精密组件(深圳)有限公司 电路板及其制作方法
CN104735900A (zh) * 2013-12-24 2015-06-24 深南电路有限公司 具有侧面金属结构的电路板及其制作方法
CN106231802A (zh) * 2016-09-06 2016-12-14 江门崇达电路技术有限公司 一种金属化半槽的制作方法
CN106714453A (zh) * 2016-12-21 2017-05-24 江门崇达电路技术有限公司 一种假性刚挠结合板及其制备方法
CN110493969A (zh) * 2019-08-19 2019-11-22 江苏上达电子有限公司 一种防止二次蚀刻导致线路侧蚀的方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113993290A (zh) * 2021-10-21 2022-01-28 景旺电子科技(龙川)有限公司 金属基印制板制造方法
CN113993290B (zh) * 2021-10-21 2024-02-20 景旺电子科技(龙川)有限公司 金属基印制板制造方法

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