CN112351585A - Pcb侧壁金属化制作方法 - Google Patents
Pcb侧壁金属化制作方法 Download PDFInfo
- Publication number
- CN112351585A CN112351585A CN202010974817.4A CN202010974817A CN112351585A CN 112351585 A CN112351585 A CN 112351585A CN 202010974817 A CN202010974817 A CN 202010974817A CN 112351585 A CN112351585 A CN 112351585A
- Authority
- CN
- China
- Prior art keywords
- pcb
- copper
- layer
- side wall
- tin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0044—Mechanical working of the substrate, e.g. drilling or punching
- H05K3/0047—Drilling of holes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/38—Coating with copper
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
- C23C28/023—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material only coatings of metal elements only
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/30—Electroplating: Baths therefor from solutions of tin
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/02—Electroplating of selected surface areas
- C25D5/022—Electroplating of selected surface areas using masking means
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0044—Mechanical working of the substrate, e.g. drilling or punching
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrochemistry (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Abstract
一种PCB侧壁金属化制作方法,包括以下步骤:步骤(1),提供待加工的PCB,PCB的两侧设有外侧铜层,PCB上设有主板区域、镂空区域及废料区域,在PCB的镂空区域进行锣板处理,锣板时打穿PCB,使主板区域外围靠镂空区域处形成外侧壁;步骤(2),电镀铜锡,将PCB放置在沉铜缸中,进行沉铜,通过沉铜处理,PCB的侧壁介质层上沉积薄薄一层铜,导通两侧的铜层,再对PCB进行电镀铜层和锡层处理,PCB侧壁金属化的铜层及外侧铜层表面镀锡,形成锡保护层;步骤(3),断开不需要金属化位置;步骤(4),蚀刻并退锡;步骤(5),沉镍金处理。
Description
技术领域
本发明涉及于一种PCB制作方法,尤其涉及一种PCB侧壁金属化制作方法。
背景技术
PCB(Printed Circuit Board),中文名称为印制电路板,又称印刷线路板,是重要的电子部件,是电子元器件的支撑体,是电子元器件电气连接的载体。由于它是采用电子印刷术制作的,故被称为“印刷”电路板。
现有PCB受工艺影响,无法在PCB外侧壁上PCB,制约着PCB发展,也给PCB在使用过程中带来局限性,因此,需要对传统的PCB成型工艺进行改进。
发明内容
因此,针对现有技术的不足,本发明的目的在于提供一种的PCB侧壁金属化制作方法。
一种PCB侧壁金属化制作方法,包括以下步骤:
步骤(1),提供待加工的PCB,PCB的两侧设有外侧铜层,在后续工艺中,外侧铜层上蚀刻有电路层,PCB上设有主板区域、镂空区域及废料区域,在PCB的镂空区域进行锣板处理,锣板时打穿PCB,使主板区域外围靠镂空区域处形成外侧壁;
步骤(2),电镀铜锡,电镀前,先在PCB板上除胶渣,完成除胶渣后,将PCB放置在沉铜缸中,电镀铜锡,将PCB放置在沉铜缸中,进行沉铜,通过沉铜处理,PCB的侧壁介质层上沉积薄薄一层铜,导通两侧的铜层,再对PCB进行电镀铜层和锡层处理,电镀锡层之前,对PCB外侧铜层上除电路层以外区域覆盖干膜,再进行镀锡处理,使PCB侧壁金属化的铜层及外侧铜层干膜以外表面镀锡,形成锡保护层;
步骤(3),断开不需要金属化位置,在PCB的主板区域靠外侧边缘的位置冲半孔,去除外侧壁不需要金属部分;
步骤(4),蚀刻并退锡,先去除干膜,再对PCB进行蚀刻处理,蚀刻时,由于PCB侧壁金属化的铜层及电路层受锡保护,则不受影响,完成蚀刻后,进行退锡处理,露出制作好的线路层;
步骤(5),沉镍金处理,对PCB的电路层及侧壁金属化的铜层进行沉镍金处理,使之形成一镍金层。
进一步地,步骤(1)中,完成钻孔后,对外侧壁直接采用粗锣和精修,加工出所需金属化的侧壁,并且打磨披锋除去金属毛刺。
综上所述,本发明通过对工艺的改良,在PCB的侧壁上形成一层金属层,使PCB侧壁金属化,减少PCB在使用过程中带来局限性,灵活性好,整个成型工艺效率高,具有较强的推广意义。
附图说明
图1为PCB钻孔后的结构示意图;
图2为产品完成加工后的结构示意图;
具体实施方式
为了使本发明的技术方案能更清晰地表示出来,下面结合附图对本发明作进一步说明。
如图1至2所示,本发明提供一种PCB侧壁金属化制作方法,用于在PCB的外侧壁上成型一层金属层40,使得PCB外侧壁金属化,所述PCB侧壁金属化制作方法包括以下步骤:
步骤(1),提供待加工的PCB,PCB的两侧设有外侧铜层,在后续工艺中,外侧铜层上蚀刻有电路层50,PCB上设有主板区域10、废料区域30及镂空区域20,在PCB的废料区域30进行锣板处理,锣板时打穿PCB,使主板区域10外围靠废料区域30处形成外侧壁,完成钻孔后,对外侧壁直接采用粗锣和精修,加工出所需金属化的侧壁,并且打磨披锋除去金属毛刺;
步骤(2),电镀铜锡,电镀前,先在PCB板上除胶渣,完成除胶渣后,将PCB放置在沉铜缸中,电镀铜锡,将PCB放置在沉铜缸中,进行沉铜,通过沉铜处理,PCB的侧壁介质层上沉积薄薄一层铜,导通两侧的铜层,再对PCB进行电镀铜层和锡层处理,电镀锡层之前,对PCB外侧铜层上除电路层以外区域覆盖干膜,再进行镀锡处理,使PCB侧壁金属化的铜层及外侧铜层干膜以外表面镀锡,形成锡保护层;
步骤(3),断开不需要金属化位置,在PCB的主板区域靠外侧边缘的位置冲半孔,去除外侧壁不需要金属部分;
步骤(4),蚀刻并退锡,先去除干膜,再对PCB进行蚀刻处理,蚀刻时,由于PCB侧壁金属化的铜层40及电路层受锡保护,则不受影响,并且,在蚀刻过程中,化学药水有效去除冲半孔时产生的毛刺,完成蚀刻后,进行退锡处理,露出制作好的线路层50;
步骤(5),沉镍金处理,对PCB的电路层及侧壁金属化的铜层40进行沉镍金处理,使之形成一镍金层。完成制作后,对PCB进行剪板,去除废料区域30。
综上所述,本发明通过对工艺的改良,在PCB的侧壁上形成一层金属层40,使PCB侧壁金属化,减少PCB在使用过程中带来局限性,灵活性好,整个成型工艺效率高,具有较强的推广意义。
以上所述实施例仅表达了本发明的一种实施方式,其描述较为具体和详细,但并不能因此而理解为对本发明专利范围的限制。应当指出的是,对于本领域的普通技术人员来说,在不脱离本发明构思的前提下,还可以做出若干变形和改进,这些都属于本发明的保护范围。因此,本发明专利的保护范围应以所附权利要求为准。
Claims (2)
1.一种PCB侧壁金属化制作方法,其特征在于,包括以下步骤:
步骤(1),提供待加工的PCB,PCB的两侧设有外侧铜层,在后续工艺中,外侧铜层上蚀刻有电路层,PCB上设有主板区域、镂空区域及废料区域,在PCB的镂空区域进行锣板处理,锣板时打穿PCB,使主板区域外围靠镂空区域处形成外侧壁;
步骤(2),电镀铜锡,电镀前,先在PCB板上除胶渣,完成除胶渣后,将PCB放置在沉铜缸中,电镀铜锡,将PCB放置在沉铜缸中,进行沉铜,通过沉铜处理,PCB的侧壁介质层上沉积薄薄一层铜,导通两侧的铜层,再对PCB进行电镀铜层和锡层处理,电镀锡层之前,对PCB外侧铜层上除电路层以外区域覆盖干膜,再进行镀锡处理,使PCB侧壁金属化的铜层及外侧铜层干膜以外表面镀锡,形成锡保护层;
步骤(3),断开不需要金属化位置,在PCB的主板区域靠外侧边缘的位置冲半孔,去除外侧壁不需要金属部分;
步骤(4),蚀刻并退锡,先去除干膜,再对PCB进行蚀刻处理,蚀刻时,由于PCB侧壁金属化的铜层及电路层受锡保护,则不受影响,完成蚀刻后,进行退锡处理,露出制作好的线路层;
步骤(5),沉镍金处理,对PCB的电路层及侧壁金属化的铜层进行沉镍金处理,使之形成一镍金层。
2.如权利要求1所述的PCB侧壁金属化制作方法,其特征在于:步骤(1)中,完成钻孔后,对外侧壁直接采用粗锣和精修,加工出所需金属化的侧壁,并且打磨披锋除去金属毛刺。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202010974817.4A CN112351585A (zh) | 2020-09-16 | 2020-09-16 | Pcb侧壁金属化制作方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202010974817.4A CN112351585A (zh) | 2020-09-16 | 2020-09-16 | Pcb侧壁金属化制作方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN112351585A true CN112351585A (zh) | 2021-02-09 |
Family
ID=74357299
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202010974817.4A Pending CN112351585A (zh) | 2020-09-16 | 2020-09-16 | Pcb侧壁金属化制作方法 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN112351585A (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113993290A (zh) * | 2021-10-21 | 2022-01-28 | 景旺电子科技(龙川)有限公司 | 金属基印制板制造方法 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6110650A (en) * | 1998-03-17 | 2000-08-29 | International Business Machines Corporation | Method of making a circuitized substrate |
CN104066273A (zh) * | 2013-03-20 | 2014-09-24 | 深南电路有限公司 | 一种封装基板及其制作方法和基板组件 |
CN104135829A (zh) * | 2013-04-30 | 2014-11-05 | 富葵精密组件(深圳)有限公司 | 电路板及其制作方法 |
CN104735900A (zh) * | 2013-12-24 | 2015-06-24 | 深南电路有限公司 | 具有侧面金属结构的电路板及其制作方法 |
CN106231802A (zh) * | 2016-09-06 | 2016-12-14 | 江门崇达电路技术有限公司 | 一种金属化半槽的制作方法 |
CN106714453A (zh) * | 2016-12-21 | 2017-05-24 | 江门崇达电路技术有限公司 | 一种假性刚挠结合板及其制备方法 |
CN110493969A (zh) * | 2019-08-19 | 2019-11-22 | 江苏上达电子有限公司 | 一种防止二次蚀刻导致线路侧蚀的方法 |
-
2020
- 2020-09-16 CN CN202010974817.4A patent/CN112351585A/zh active Pending
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6110650A (en) * | 1998-03-17 | 2000-08-29 | International Business Machines Corporation | Method of making a circuitized substrate |
CN104066273A (zh) * | 2013-03-20 | 2014-09-24 | 深南电路有限公司 | 一种封装基板及其制作方法和基板组件 |
CN104135829A (zh) * | 2013-04-30 | 2014-11-05 | 富葵精密组件(深圳)有限公司 | 电路板及其制作方法 |
CN104735900A (zh) * | 2013-12-24 | 2015-06-24 | 深南电路有限公司 | 具有侧面金属结构的电路板及其制作方法 |
CN106231802A (zh) * | 2016-09-06 | 2016-12-14 | 江门崇达电路技术有限公司 | 一种金属化半槽的制作方法 |
CN106714453A (zh) * | 2016-12-21 | 2017-05-24 | 江门崇达电路技术有限公司 | 一种假性刚挠结合板及其制备方法 |
CN110493969A (zh) * | 2019-08-19 | 2019-11-22 | 江苏上达电子有限公司 | 一种防止二次蚀刻导致线路侧蚀的方法 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113993290A (zh) * | 2021-10-21 | 2022-01-28 | 景旺电子科技(龙川)有限公司 | 金属基印制板制造方法 |
CN113993290B (zh) * | 2021-10-21 | 2024-02-20 | 景旺电子科技(龙川)有限公司 | 金属基印制板制造方法 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN102124826B (zh) | 印刷电路板的制造方法及印刷电路板 | |
CN107567196B (zh) | 顶层镍钯金底层硬金板制作方法 | |
CN107835587B (zh) | 一种高频微波多层印制电路盲槽及其制作工艺 | |
CN107920415B (zh) | 具厚铜线路的电路板及其制作方法 | |
CN103687313A (zh) | 一种实现盲槽底部图形化的加工方法 | |
CN113891557A (zh) | 一种印刷电路板制作方法 | |
CN112351585A (zh) | Pcb侧壁金属化制作方法 | |
CN108323040B (zh) | 一种具有阶梯槽的pcb的制作方法及pcb | |
JPH0955451A (ja) | 導電性インクを使用した半導体パッケージ基板の製造方法 | |
JP2011086681A (ja) | プリント基板の製造方法 | |
CN108401385B (zh) | 一种侧壁非金属化的阶梯槽的制作方法 | |
US6057027A (en) | Method of making peripheral low inductance interconnects with reduced contamination | |
CN105376961A (zh) | 一种喷锡表面处理的pcb的制作方法 | |
CN115665990A (zh) | 一种塞孔及背钻线路板的制备方法 | |
US20040141299A1 (en) | Burrless castellation via process and product for plastic chip carrier | |
US9049779B2 (en) | Electrical components and methods of manufacturing electrical components | |
CN114807934A (zh) | 最小线宽间距2/2mil的类载板加工方法 | |
CN110719694B (zh) | 一种含聚苯醚印制电路板化学镍金表面处理的方法 | |
CN103813657B (zh) | 形成有局部镀铜的柔性印刷基板的厚度最小化方法 | |
CN113660787B (zh) | 一种能够使高频板侧面铜与基材齐平的制作方法、生产线及高频板 | |
CN113518515B (zh) | 断节金属化边制作方法和电路板 | |
JP2016054216A (ja) | プリント配線基板の製造方法 | |
US6360434B1 (en) | Circuit fabrication | |
TW201607401A (zh) | 電路板及其製作方法 | |
US20110048790A1 (en) | Chip carriers with side terminals |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
RJ01 | Rejection of invention patent application after publication |
Application publication date: 20210209 |
|
RJ01 | Rejection of invention patent application after publication |