CN111630453B - Dustproof film assembly frame holding device and dustproof film assembly frame holding method - Google Patents
Dustproof film assembly frame holding device and dustproof film assembly frame holding method Download PDFInfo
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- CN111630453B CN111630453B CN201980009593.9A CN201980009593A CN111630453B CN 111630453 B CN111630453 B CN 111630453B CN 201980009593 A CN201980009593 A CN 201980009593A CN 111630453 B CN111630453 B CN 111630453B
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- frame
- pellicle
- mask
- dustproof
- distance
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
- G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
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- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Supplying Of Containers To The Packaging Station (AREA)
Abstract
Provided are a pellicle frame holding device and a pellicle frame holding method, which can confirm that a pellicle is reliably attached to a mask. A pellicle frame (101) is gripped by a pellicle gripping unit (20) provided in a frame (10), and an adhesive member of the pellicle is brought into contact with a mask. The measuring unit (30) is disposed at a first position overlapping the mask near the front end to measure a first distance, which is the distance to the surface of the mask, and the measuring unit (30) is moved to a second position overlapping the pellicle frame (101) near the front end to measure a second distance, which is the distance to the pellicle film (102).
Description
Technical Field
The present invention relates to a dustproof pellicle frame holding device and a dustproof pellicle frame holding method.
Background
Patent document 1 discloses a dustproof pellicle frame holding apparatus as follows: the pellicle is held by inserting the pellicle holding member into a groove formed in the peripheral edge of the pellicle frame, aligning the pellicle held with the photomask held in the substantially vertical direction, and bonding the pellicle to the photomask by pressing the pellicle against the photomask.
Prior art literature
Patent literature
Patent document 1: international publication No. 2016/133054
Disclosure of Invention
Problems to be solved by the invention
In the invention described in patent document 1, after the pellicle is attached to the photomask, the pellicle is released by pulling out the pellicle holding member from the groove, but if the pellicle is released in a state where the pellicle is not reliably attached to the photomask, the pellicle may fall down.
The present invention has been made in view of the above-described circumstances, and an object thereof is to provide a pellicle frame holding apparatus and a pellicle frame holding method that can confirm that a pellicle is reliably attached to a mask.
Means for solving the problems
In order to solve the above-described problems, a pellicle frame holding apparatus according to the present invention holds a pellicle, for example, and attaches the pellicle to a substantially plate-shaped mask held in a substantially vertical direction, the pellicle including: a substantially hollow cylindrical dustproof pellicle assembly frame; a dustproof film provided on a first surface of the dustproof film assembly frame substantially orthogonal to the outer peripheral surface so as to cover a hollow portion of the dustproof film assembly frame; and an adhesive member provided on a second surface substantially parallel to the first surface, wherein the dustproof film module frame holding device includes: a frame body which is a frame-shaped member formed by combining a plurality of bars into a substantially rectangular shape; a dustproof film assembly holding part provided in the frame body and holding the outer peripheral surface of the dustproof film assembly frame; a measuring unit provided in the housing; and a control unit that controls the frame, the pellicle gripping unit, and the measurement unit, wherein the measurement unit is provided so as to be movable between a first position where a vicinity of a distal end overlaps the mask and a second position where a vicinity of the distal end overlaps the pellicle frame, the pellicle gripping unit and the measurement unit are provided at different positions when viewed from a direction substantially orthogonal to an extending direction of the bar, and the control unit is configured to move the measurement unit toward the second position to measure a second distance, which is a distance to the pellicle, in a state where the pellicle gripping unit grips the pellicle frame and the frame is extended in a substantially vertical direction so that the adhesive member is in contact with the mask.
According to the pellicle frame holding apparatus of the present invention, the adhesive member is brought into contact with the mask, the measuring unit is disposed at a first position overlapping the mask near the front end to measure a first distance, which is the distance to the surface of the mask, and the measuring unit is moved to a second position overlapping the pellicle frame near the front end to measure a second distance, which is the distance to the pellicle. This allows confirmation of the reliable adhesion of the pellicle to the mask.
The pellicle holding unit may include a pellicle holding member that is provided between a contact position where the pellicle holding member contacts the outer peripheral surface and a retracted position where the pellicle holding member does not contact the outer peripheral surface, and is movable in a horizontal direction or a vertical direction, the frame may be movable in the horizontal direction, the control unit may dispose the pellicle holding member to the contact position to hold the pellicle frame, and may move the frame in the horizontal direction to bring the adhesive member into contact with the mask in a state where the frame is disposed to extend in a substantially vertical direction, and may dispose the measurement unit to the first position to measure the first distance and to move the measurement unit to the second position to measure the second distance, and may move the pellicle holding member from the contact position to the retracted position when a difference between the first distance and the second distance is equal to or smaller than a threshold value. Thus, the pellicle is prevented from being released and falling down in a state where the pellicle is not reliably attached to the mask (when the difference between the first distance and the second distance is equal to or smaller than the threshold value).
The measuring unit may have a first measuring unit provided near an upper side of the frame and near a left end thereof, and a second measuring unit provided near an upper side of the frame and near a right end thereof in a posture when the adhesive member is brought into contact with the mask. Thus, the measuring unit can measure points near the upper end and the left and right ends of the mask and the pellicle. In addition, when the pellicle is attached to the mask, it is possible to find out that one end of the pellicle is attached and the other end of the pellicle is not attached.
The frame body may have a first and a second substantially rod-shaped vertical frame portions extending substantially vertically in a posture in which the adhesive member is brought into contact with the mask, and an upper frame portion extending substantially horizontally near upper ends of the first and second vertical frame portions, the first and second vertical frame portions may be movable in an extending direction of the upper frame portion, the upper frame portion may be movable in an extending direction of the first and second vertical frame portions, and the pellicle holding portion may be provided in the first and second vertical frame portions, and the measurement portion may be provided in the upper frame portion. Accordingly, the dustproof thin film assembly of various sizes can be handled by changing the sizes of the frames constituted by the first vertical frame portion, the second vertical frame portion, and the upper frame portion. In addition, the height of the pellicle can be measured at a position near the upper end of the pellicle, regardless of the size of the pellicle.
The frame body may have a lower frame portion extending substantially horizontally near lower ends of the first and second vertical frame portions, and the measuring portion may have a third measuring portion provided in the lower frame portion. Thus, it is possible to more reliably confirm whether or not the dustproof film assembly has been stuck.
When the adhesive member is brought into contact with the mask, the frame may be inclined so that a distance between the second surface on the upper end side and the mask is closer than a distance between the second surface on the lower end side and the mask. This can prevent the occurrence of a problem that the adhesive member partially contacts the mask and the pellicle is not adhered to the mask. Further, the upper end portion of the pellicle is attached to the mask, the height of the surface of the mask and the height of the pellicle are measured in the vicinity of the upper ends of the mask and the pellicle, and whether the pellicle has been attached to the mask is determined based on the measurement result, so that the attachment state of the pellicle can be accurately determined.
In order to solve the above-described problems, a pellicle frame holding method according to the present invention is a pellicle holding method for holding a pellicle, and attaching the pellicle to a mask having a substantially plate shape held in a substantially vertical direction, the pellicle including: a substantially hollow cylindrical dustproof pellicle assembly frame; a dustproof film provided on a first surface of the dustproof film assembly frame substantially orthogonal to the outer peripheral surface so as to cover a hollow portion of the dustproof film assembly frame; and an adhesive member provided on a second surface substantially parallel to the first surface, wherein in the dustproof film module frame holding method, a dustproof film module holding member provided on a frame body so as to be movable in a horizontal direction is provided at an abutment position with which the dustproof film module frame is abutted, the frame body is moved in parallel so that the adhesive member is abutted against the mask in a state where the dustproof film module frame is held, a measuring section provided on the frame body is provided at a first position where a front end vicinity overlaps the mask, a first distance to a surface of the mask is measured, the measuring section is moved to a second position where the front end vicinity overlaps the dustproof film module frame, a second distance to the dustproof film is measured, and when a difference between the first distance and the second distance is equal to or less than a threshold value, the dustproof film module holding member can be moved from the abutment position to a position where the dustproof film module holding member is not retracted from the abutment position to the outer peripheral surface.
Effects of the invention
According to the present invention, it is possible to confirm that the pellicle is reliably attached to the photomask.
Drawings
Fig. 1 is a front view showing an outline of a dustproof thin film module holding apparatus 1 according to a first embodiment.
Fig. 2 is a perspective view showing an outline of the dustproof thin film assembly 100.
Fig. 3 is a cross-sectional view A-A of fig. 2.
Fig. 4 is a diagram showing an outline of the dustproof thin film module holding portion 20.
Fig. 5 is a diagram schematically showing a state in which the measuring unit 30 is located at the first position.
Fig. 6 is a diagram schematically showing a state in which the measuring unit 30 is located at the second position.
Fig. 7 is a block diagram showing an electrical structure of the dustproof thin film module holding apparatus 1.
Fig. 8 is a flowchart showing a flow of processing performed by the dustproof thin film module holding apparatus 1.
Fig. 9 is a flowchart showing the processing of step S107.
Fig. 10 is a schematic diagram showing a case at the time of the inspection shown in step S107.
Fig. 11 is a schematic diagram showing a case at the time of the inspection shown in step S107.
Detailed Description
Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. In the drawings, the same elements are denoted by the same reference numerals, and description thereof will be omitted.
< first embodiment >, first embodiment
Fig. 1 is a front view showing an outline of a dustproof thin film module holding apparatus 1 according to a first embodiment. The pellicle film holding apparatus 1 is used to attach the pellicle film 100 to a substantially plate-shaped mask M held in a substantially vertical direction. The mask M is held in a substantially vertical direction by a mask holding device, not shown.
First, the dustproof thin film assembly 100 will be described. Fig. 2 is a perspective view showing an outline of the dustproof thin film assembly 100. Fig. 3 is a cross-sectional view A-A of fig. 2. The dustproof pellicle assembly 100 mainly has: a pellicle frame (pellicle frame) 101; a dustproof film 102 that is provided on the dustproof film assembly frame 101; and an adhesive member 103 (see fig. 3) formed on the lower surface of the dustproof pellicle assembly frame 101.
The pellicle frame 101 has a frame shape (a substantially hollow cylindrical shape) having a substantially rectangular outer periphery, and is made of a metal such as iron or aluminum. The pellicle frame 101 has a substantially rectangular shape in plan view (as viewed from above the paper surface of fig. 2), and has a hollow portion 101e in the center. The dustproof film 102 is provided on the dustproof film assembly frame 101 so as to cover the hollow portion 101e. The size of the hollow portion 101e of the pellicle frame 101 is the same as the size of the photomask (for example, about 520mm×800mm to 1620mm×1780 mm). The frame-like portion of the dustproof pellicle frame 101 has a width of about several tens of mm and a thickness of about 2mm to 10 mm.
The pellicle frame 101 has a generally parallel upper surface 101a and lower surface 101b. The outer peripheral surface 101c of the pellicle frame 101 perpendicular to the upper surface 101a and the lower surface 101b includes a groove 101d. The groove 101d is formed along the outer peripheral surface 101c, and has a height and a depth of about 2 mm. A dustproof pellicle holding member 21 (described in detail below) provided in the housing 10 is inserted into the groove 101d.
The dustproof film 102 is a film of submicron thickness. The pellicle 102 is provided on the upper surface 101a of the pellicle frame 101 so as to cover the hollow portion 101e of the pellicle frame 101. When the pellicle frame 101 is attached to a photomask substrate, the pellicle 102 is disposed at a predetermined distance from the pattern formation surface (surface) of the mask M.
The adhesive member 103 is provided on the lower surface 101b of the dustproof pellicle assembly frame 101. The adhesive member 103 is formed in a frame shape over the entire circumference of the dustproof pellicle assembly frame 101. In addition, the adhesive member 103 is provided so as not to protrude from the dustproof pellicle assembly frame 101.
The description of fig. 1 is returned. The pellicle gripping apparatus 1 mainly includes a housing 10, a pellicle gripping unit 20, and a measuring unit 30. The dustproof film assembly holding portion 20 and the measuring portion 30 are provided in the housing 10.
The frame 10 is a frame-shaped member formed by combining a plurality of bars into a substantially rectangular shape. The frame 10 mainly includes vertical frame portions 11, 12, upper frame portions 13, 14, and a frame 15 provided outside the vertical frame portions 11, 12 and the upper frame portions 13, 14. The vertical frame portions 11, 12, the upper frame portions 13, 14, and the frame 15 are formed of metal such as iron, aluminum, or the like.
The vertical frame portions 11 and 12 are substantially rod-shaped members extending substantially vertically in a posture when the pellicle assembly 100 shown in fig. 1 is attached to the mask M (the adhesive member 103 is brought into contact with the mask M), and are provided so that the longitudinal direction thereof extends along the z-direction. The vertical frame portions 11 and 12 are provided so as to be movable along the lower end portion 15a and the upper end portion 15b of the frame 15, that is, along the x-direction. The mechanism for moving the vertical frame portions 11, 12 in the x direction can use various known techniques.
The upper frame portions 13 and 14 are substantially rod-shaped members extending substantially horizontally near the upper ends of the vertical frame portions 11 and 12 in a posture when the pellicle 100 shown in fig. 1 is attached to the mask M, and are provided so that the longitudinal direction thereof extends along the x-direction. The upper frame portions 13 and 14 are provided so as to be movable along the vertical frame portions 11 and 12, that is, along the z direction. The mechanism for moving the upper frame portions 13 and 14 in the z direction can use various known techniques.
The form of the upper frame portions 13, 14 is not limited to this. For example, the upper frame portion may be constituted by 1 bar extending substantially horizontally, and the vicinity of both ends of the 1 bar may be provided in the vertical frame portions 11 and 12.
By allowing the vertical frame portions 11, 12 and the upper frame portions 13, 14 to move in this manner, the size of the frame constituted by the vertical frame portions 11, 12, the upper frame portions 13, 14 and the lower end portion 15a can be changed to cope with the dust-proof film assembly 100 of various sizes. The dustproof thin film module 100 includes, for example, a dustproof thin film module having a size of 420mm×720mm, a dustproof thin film module having a size of 700mm×800mm, a dustproof thin film module having a size of 520mm×680mm, a dustproof thin film module having a size of 750mm×1300mm, and a dustproof thin film module having a size of 1520mm×1680 mm.
The frame 10 is provided so as to be movable in the horizontal direction by a not-shown moving mechanism. When the pellicle 100 is attached to the mask M, the frame 10 moves in parallel in the +y direction. The housing 10 includes a driving unit 16 (see fig. 7) and a mechanism for horizontally moving the housing 10. A mechanism for moving the housing 10 in the horizontal direction is well known, and therefore, a description thereof will be omitted.
In addition, a rotary shaft, not shown, is provided near the lower end of the housing 10. The frame 10 is rotatable about a rotation axis between a position where a plane formed by the frame 15 is substantially horizontal (substantially parallel to the xy plane) and a position where the plane formed by the frame 15 is substantially vertical (substantially parallel to the xz plane). In fig. 1, in a state where the frame 10 holds the pellicle 100, the frame 10 is inclined with respect to the vertical direction so that the distance between the lower surface 101b of the upper end side (+z side in fig. 1) and the mask M is closer than the distance between the lower surface 101b of the lower end side (-z side) and the mask M.
The pellicle gripping unit 20 includes a plurality of pellicle gripping members 21 that grip the outer peripheral surface 101c of the pellicle frame 101. The dustproof film assembly holding member 21 is provided at the vertical frame portions 11, 12, the upper frame portions 13, 14, the lower end portion 15a, and the upper end portion 15b.
In the example shown in fig. 1, 5 pellicle gripping members 21 are provided in each of the vertical frame portions 11 and 12, 1 pellicle gripping member 21 is provided in each of the upper frame portions 13 and 14, 5 pellicle gripping members 21 are provided in the lower end portion 15a, and 1 pellicle gripping member 21 is provided in the upper end portion 15b, but the positions and the number of pellicle gripping members 21 are not limited to this.
The pellicle holding member 21 used is different depending on the size of the pellicle 100. In fig. 1, only the dustproof thin film module holding member 21 that is provided in the frame 10 and that abuts against the dustproof thin film module 100 (here, the outer peripheral surface 101 c) is used.
The dustproof film assembly holding member 21 is provided so as to be movable in the horizontal direction or the vertical direction between an abutting position abutting against the outer peripheral surface 101c and a retracted position not abutting against the outer peripheral surface 101 c. Fig. 4 is a diagram showing an outline of the dustproof thin film module holding portion 20.
The pellicle holding member 21 is formed of a metal plate material. The pellicle holding member 21 is not limited to a plate-like member, and may be formed using a rod-like member, for example.
The dustproof film assembly holding member 21 is provided with a driving member 22. The driving member 22 has a lever 22a, and an actuator 22b that moves the lever 22 a. The pellicle holding member 21 is coupled to the lever 22 a. The actuator 22b is provided in the housing 10 (not shown in fig. 4).
The pellicle holding member 21 is moved in the horizontal direction by the driving member 22 between an insertion position (see a solid line in fig. 4) where the pellicle holding member 21 is inserted into the groove 101d, and a retracted position (see a one-dot chain line in fig. 4) where the pellicle holding member 21 is not inserted into the groove 101d and the pellicle holding member 21 does not interfere with the pellicle frame 101.
The tip of the pellicle holding member 21 is covered with a sheet or the like formed of a resin (e.g., ultra-high molecular weight polyethylene). Thus, when the pellicle holding member 21 is inserted into the groove 101d, the pellicle holding member 21 and the pellicle frame 101 can be prevented from being scraped to generate dust.
The description of fig. 1 is returned. The measuring unit 30 measures the heights (positions in the y direction) of the mask M and the pellicle frame 101. The measuring unit 30 is provided in the housing 10, here, the upper frame parts 13 and 14. The measuring unit 30 is provided at a position where it does not interfere with the pellicle holding member 21. In other words, the measuring unit 30 and the pellicle holding member 21 are disposed at different positions when viewed from a direction (in this case, the y direction) substantially orthogonal to the extending direction of the bars (for example, the upper frame portions 13 and 14) constituting the frame 10.
The measuring unit 30 is provided so as to be movable in the vertical direction between a first position (see a solid line in fig. 1) where the vicinity of the front end overlaps the mask M, and a second position (see a two-dot chain line in fig. 1) where the vicinity of the front end overlaps the pellicle frame 101.
The measurement unit 30 provided in the upper frame 13 is provided in the vicinity of the vertical frame 11, and the measurement unit 30 provided in the upper frame 14 is provided in the vicinity of the vertical frame 12. In other words, the two measuring units 30 are provided near the upper side and near the left end of the housing 10, and near the upper side and near the right end of the housing 10, respectively. Thus, the measuring unit 30 can measure points near the upper end and both right and left ends of the mask M and the pellicle frame 101. However, the positions and the number of the measuring units 30 are not limited to those shown in fig. 1.
Fig. 5 is a diagram schematically showing a state in which the measuring unit 30 is located at the first position. Fig. 6 is a diagram schematically showing a state in which the measuring unit 30 is located at the second position.
The measuring unit 30 mainly includes an ultrasonic sensor 31 and a reflecting plate 32. The ultrasonic sensor 31 is a distance measuring sensor that transmits ultrasonic waves to an object and receives reflected waves of the ultrasonic waves, and measures a distance to the object based on a time interval between a transmission signal and the reception of the reflected waves. The ultrasonic sensor 31 is well known, and thus a detailed description thereof is omitted.
The reflection plate 32 reflects the ultrasonic waves transmitted from the ultrasonic sensor 31. By providing the reflection portion 32a of the reflection plate 32 at an angle of 45 degrees on the yz plane, the reflection portion 32a reflects the ultrasonic wave transmitted downward (-z direction) from the ultrasonic sensor 31 in the +y direction (see the two-dot chain line in fig. 5 and 6).
In the present embodiment, the measuring unit 30 includes the ultrasonic sensor 31, but the sensor for obtaining the distance is not limited to the ultrasonic sensor 31. As the distance measuring sensor, an optical sensor or an eddy current sensor that obtains a distance using light may be used. As the optical sensor, for example, a laser displacement sensor using a laser or a triangle ranging optical sensor can be used. Among them, a noncontact sensor is desirably used as the measuring unit 30. In the present embodiment, the reflection plate 32 is provided, but the reflection plate 32 may not be used. In this case, the ultrasonic sensor 31 may be provided so as to transmit ultrasonic waves in the +y direction.
The measuring unit 30 includes an actuator 33. The actuator 33 moves the ultrasonic sensor 31 and the reflection plate 32 in the z direction (vertical direction) between the first position and the second position.
In fig. 5, the vicinity of the measurement position of the measurement unit 30 (here, the tip (-z-end) of the measurement unit 30) overlaps with the mask M. Therefore, the ultrasonic wave transmitted from the ultrasonic sensor 31 hits the surface Ma of the mask M, and the measuring unit 30 measures the distance between the reflecting unit 32a and the surface Ma, that is, the height (position in the y direction) of the surface Ma.
In fig. 6, the vicinity of the measurement position of the measurement unit 30 (here, the tip (-z-end) of the measurement unit 30) overlaps with the pellicle frame 101. Therefore, the ultrasonic wave transmitted from the ultrasonic sensor 31 hits the dustproof film 102, and the measuring unit 30 measures the distance between the reflecting unit 32a and the dustproof film 102, that is, the height of the dustproof film 102. When the pellicle 100 is attached to the mask M, the difference between the height of the surface Ma of the mask M and the height of the pellicle 102 is equal to or less than a threshold value.
Fig. 7 is a block diagram showing an electrical structure of the dustproof thin film module holding apparatus 1. The pellicle gripping apparatus 1 includes CPU (Central Processing Unit), RAM (Random Access Memory), 152, ROM (Read Only Memory) 153, input/output interfaces (I/F) 154, communication interfaces (I/F) 155, and media interfaces (I/F) 156, and is connected to the driving unit 16, the actuator 22b, the measuring unit 30, and the like.
The CPU151 operates based on programs stored in the RAM152 and the ROM153, and controls the respective parts. Signals are input from the driving unit 16, the actuator 22b, and the measuring unit 30 to the CPU 151. The signal output from the CPU151 is output to the driving unit 16, the actuator 22b, and the measuring unit 30.
RAM152 is volatile memory. The ROM153 is a nonvolatile memory in which various control programs and the like are stored. The CPU151 operates based on programs stored in the RAM152 and the ROM153, and controls the respective parts. The ROM153 stores a boot program executed by the CPU151 at the time of starting the pellicle gripping apparatus 1, a program depending on hardware of the pellicle gripping apparatus 1, and the like. The RAM152 stores programs executed by the CPU151, data used by the CPU151, and the like.
The CPU151 controls an input/output device 161 such as a keyboard and a mouse via the input/output interface 154. The communication interface 155 receives data from other devices via the network 162 and transmits the received data to the CPU151, and transmits data generated by the CPU151 to the other devices via the network 162.
The media interface 156 reads a program or data stored in the storage medium 163, and stores it in the RAM152. The storage medium 163 is, for example, an IC card, an SD card, a DVD, or the like.
The program for realizing each function is read from the storage medium 163, loaded on the dustproof thin film assembly holding device 1 via the RAM152, and executed by the CPU151, for example.
The CPU151 has a function of a control unit 151a for controlling each part of the dustproof thin film module holding device 1 based on an input signal. The control unit 151a is configured by executing a predetermined program read by the CPU 151. The processing performed by the control unit 151a will be described in detail later.
The configuration of the dustproof pellicle holding apparatus 1 shown in fig. 7 is mainly described in the description of the features of the present embodiment, but the configuration of a general information processing apparatus is not excluded, for example. The functional configuration shown in fig. 7 is classified for the sake of easy understanding of the configuration of the dustproof thin film module holding device 1, but the classification method and the names of the constituent elements are not limited to those described in fig. 7. The configuration of the pellicle holding apparatus 1 may be further classified into a plurality of components according to the processing contents, and the processing of a plurality of components may be performed by one component.
The operation of the dustproof thin film module holding apparatus 1 configured as described above will be described. Fig. 8 is a flowchart showing a flow of processing performed by the dustproof thin film module holding apparatus 1. The following processing is mainly performed by the control unit 151 a.
First, the control unit 151a controls the actuator 22b to move the pellicle holding member 21 from the retracted position to the insertion position, and inserts the pellicle holding member 21 into the groove 101d (step S101). The control unit 151a executes the processing of step S101 for each of the dustproof thin film module holding members 21. Thereby, the dustproof thin film module holding device 1 holds the dustproof thin film module 100. The amount by which the dustproof film assembly holding member 21 is moved between the retracted position and the insertion position is set in advance and stored in the ROM153.
The control unit 151a drives the driving unit 16 to rotate the housing 10 in a substantially vertical direction (step S102). Since the housing 10 holds the pellicle 100, the pellicle 100 rotates with the housing 10. Next, the control unit 151a checks the dustproof thin film assembly 100 held by the housing 10 using a checking unit (not shown) (step S103). The inspection unit includes a transmitting unit that transmits a laser beam or the like, and inspects the pellicle 100 by using various known methods. Step S103 is well known, and therefore, description thereof is omitted.
When it can be confirmed that the pellicle 100 is not abnormal by the inspection process (step S103), the control unit 151a moves the housing 10 in parallel in the device on which the mask M is placed using the driving unit 16 (step S104). Next, alignment (registration) of the mask M and the pellicle 100 is performed (step S105). In steps S104 and S105, the control unit 151a rotates the frame 10 by the driving unit 16, and tilts the frame 10 so that the distance between the lower surface 101b on the upper end side (i.e., the adhesive member 103) and the mask M is closer than the distance between the lower surface 101b on the lower end side (i.e., the adhesive member 103) and the mask M. The inclination is at a slight angle with respect to the vertical.
After alignment (step S105), the control unit 151a attaches the pellicle 100 to the photomask (step S106). Step S106 is a so-called temporary bonding step.
The control unit 151a moves the frame 10 in parallel (here, moves in the +y direction) in a state in which the frame 10 is inclined by a slight angle with respect to the vertical direction by the driving unit 16 so that the pellicle 100 approaches the mask M. Thus, the pellicle 100 is in contact with the mask M. In this state, the control unit 151a moves the pellicle 100 in the direction approaching the mask M (+y direction). However, since the pellicle 100 is already in contact with the mask M, the pellicle 100 is pressed against the mask M, and the pellicle 100 is adhered to the mask M by the adhesive member 103.
In the attaching step (step S106), the pellicle 100 is tilted at a slight angle with respect to the mask M. In contrast, if the pellicle 100 is not inclined with respect to the mask M but is substantially parallel to the mask M, the adhesive member 103 may only partially abut against the mask M due to deformation of the pellicle 100, and therefore the pellicle 100 may not be adhered to the mask M. Accordingly, it is desirable to tilt the pellicle assembly 100 at a slight angle with respect to the mask M.
Next, the control unit 151a checks whether or not the pellicle 100 is attached to the mask M using the sensor unit 30 (step S107). Fig. 9 is a flowchart showing the flow of the processing of step S107.
First, the control unit 151a places the measuring unit 30 at the first position as shown in fig. 5. Next, ultrasonic waves are transmitted from the ultrasonic sensor 31 to measure the height (position in the y direction) of the surface Ma of the mask M (step S201).
Next, the control unit 151a moves the ultrasonic sensor 31 and the reflection plate 32 by means of the actuator 33, and the measuring unit 30 is disposed at the second position as shown in fig. 6. Next, ultrasonic waves are transmitted from the ultrasonic sensor 31 to measure the height (position in the y direction) of the dustproof film 102 (step S202). The distance for moving the ultrasonic sensor 31 and the reflection plate 32 from the first position to the second position is set in advance and stored in the ROM153.
Thereafter, the control unit 151a compares the difference between the height of the mask M and the height of the dustproof thin film 102 with the threshold T (step S203). The threshold T is set to an arbitrary value in advance. For example, when the thickness of the pellicle frame 101 is approximately 7mm and the thickness of the adhesive member 103 is approximately 1mm, the threshold T is approximately 8mm. Information (here, a value) related to the threshold T is stored in the ROM153.
The control unit 151a determines the state of adhesion of the dustproof thin film module 100 based on the comparison result in step S203 (step S204). When the difference between the height of the mask M and the height of the pellicle 102 is not equal to or less than the threshold value (no in step S204), the control unit 151a determines that the pellicle 100 is not attached to the mask M. When the pellicle 100 is not attached to the mask M, the control unit 151a returns to the process of moving the housing 10 in parallel to bring the pellicle 100 close to the mask M (step S106), and the attachment inspection process of step S107 is performed again. If the difference between the height of the mask M and the height of the dustproof thin film 102 is not greater than the threshold value even if steps S106 and S107 are repeated a plurality of times, the control unit 151a stops the process.
When the difference between the height of the mask M and the height of the pellicle 102 is equal to or less than the threshold value (yes in step S204), the control unit 151a determines that the pellicle 100 has been attached to the mask M, and releases the holding of the pellicle 100 (step S108, see fig. 8). In step S108, the control unit 151a controls the actuator 22b to move the pellicle gripping member 21 from the insertion position to the retracted position so that the tip of the pellicle gripping member 21 does not come into contact with the groove 101 d.
Next, the control unit 151a ends the series of processing shown in fig. 8. When the series of processes is completed, the control unit 151a presses the four corners of the pellicle 100 toward the mask M using a pressing unit (not shown), and attaches the pellicle 100 to the mask M (so-called main attachment).
Fig. 10 and 11 are schematic diagrams showing the case at the time of inspection shown in step S107. The broken line in fig. 10 shows the case of the pellicle frame 101 when the pellicle film 102 is not provided, and the solid line in fig. 10 shows the case of the pellicle frame 101 when the pellicle film 102 is provided. When the pellicle film 102 is provided to the pellicle frame 101, the central portions of the respective sides of the pellicle frame 101 are positioned inward when viewed along the central axis of the pellicle frame 101 due to the tension of the pellicle film 102. In the present embodiment, the measurement unit 30 is provided near the upper side and near the left and right ends of the housing 10 (not shown in fig. 10), and the measurement unit 30 measures the height near the upper end and near the left and right ends of the pellicle 100, so that even if the pellicle frame 101 is deformed, the height of the pellicle 102 can be measured by the measurement unit 30 at the second position.
As shown in fig. 11, it is assumed that the following defects occur: when the pellicle 100 is attached to the mask M, one end (for example, + x side end) of the pellicle 100 is attached, and the other end (for example, -x side end) of the pellicle 100 is not attached. In the present embodiment, the height of the vicinity of the upper end and the vicinity of the left and right ends of the pellicle 100 is measured by the measuring unit 30, and therefore, if the above-described problem occurs, the difference between the height of the mask M and the height of the pellicle 102 in one measuring unit 30 (in this case, the +x-side measuring unit 30) is equal to or less than the threshold value, but the difference between the height of the mask M and the height of the pellicle 102 in the other measuring unit 30 (in this case, the-x-side measuring unit 30) is not equal to or less than the threshold value. Therefore, the above-described defects can be detected by providing the measuring unit 30 provided in the upper frame 13 in the vicinity of the vertical frame 11 and providing the measuring unit 30 provided in the upper frame 14 in the vicinity of the vertical frame 12.
According to the present embodiment, it is possible to confirm that the pellicle 100 is reliably attached to the mask M. Therefore, the pellicle 100 can be prevented from being released and the pellicle 100 can be prevented from falling down without reliably adhering the pellicle 100 to the mask M.
When the attached state of the pellicle 100 is checked by, for example, the coordinates of a motor or the like that moves the housing 10, there is a concern that the positional relationship between the pellicle 100 and the mask M is different from expected due to damage or the like of the pellicle holding member 21, and the pellicle 100 is released in a state where the pellicle 100 is not attached to the mask M. Particularly, in the case of the dustproof film assembly 100 having a large size, a huge loss of about 1000 tens of thousands of circles is generated by dropping one dustproof film assembly 100. Therefore, by confirming that the pellicle 100 is reliably attached to the mask M as in the present embodiment, wasteful costs can be reduced.
Further, according to the present embodiment, the distance between the surface Ma of the mask M and the pellicle 100 is actually measured to confirm the adhesion state, so that even when the pellicle holding apparatus 1 handles pellicle frames 101 of various thicknesses, it is possible to easily cope with the situation.
In addition, according to the present embodiment, the frame 10, that is, the pellicle 100 is moved in parallel in a state inclined at a slight angle with respect to the vertical direction so as to press the adhesive member 103 against the mask M, whereby the upper end portion of the pellicle 100 is adhered to the mask M, and whether or not the pellicle 100 has been adhered to the mask M is determined based on the result of measuring the height of the surface Ma and the height of the pellicle 102 in the vicinity of the upper ends of the mask M and the pellicle 100, so that the adhesion state of the pellicle 100 can be accurately determined.
In the present embodiment, the dustproof thin film module holding device 1 includes two measurement units 30, and the two measurement units 30 are provided near the upper side of the housing 10 and near the left and right ends, but the positions and the number of the measurement units 30 are not limited to this. The two measuring units 30 may be provided near the upper ends of the vertical frame portions 11 and 12 instead of the upper frame portions 13 and 14. In this case, the actuator 33 may move the ultrasonic sensor 31 and the reflection plate 32 in the x direction (horizontal direction) between the first position and the second position.
Further, for example, the dustproof film package holding device 1 may have 3 measurement units 30, and the 3 measurement units 30 may be provided at the upper frame portions 13 and 14 and the lower end portion 15a. By measuring the height of the pellicle film 102 in the vicinity of the upper and lower ends of the pellicle 100, it is possible to more reliably confirm whether the pellicle 100 has been attached. In this case, when the pellicle 100 is brought into contact with the mask M, the distance between the lower surface 101b on the upper end side and the mask M is smaller than the distance between the lower surface 101b on the lower end side and the mask M, and therefore, in steps S203 and 204, the threshold value on the lower end side is set to be smaller than the threshold value on the upper end side. The measuring unit 30 provided at the lower end portion 15a is preferably disposed at a substantially central portion of the lower end portion 15a in the x direction.
For example, the measuring unit 30 may be provided not in the upper frame portions 13 and 14 but in the upper end portion 15b. Since the measuring section 30 is provided at the upper end 15b, the height of the dustproof film 102 can be measured at a position near the upper end of the dustproof film assembly 100. When 1 measuring unit 30 is provided at the upper end 15b, the measuring units 30 are desirably provided near the center of the housing 10. In order to detect a state in which a part (for example, +x end) of the pellicle 100 is attached to the mask M and the other part (for example, -x end) is not attached to the mask M, it is desirable that the measuring unit 30 is provided above the housing 10 and near both right and left ends.
In the present embodiment, the frame 10 is mainly provided with the vertical frame portions 11, 12 and the upper frame portions 13, 14 movable with respect to the frame 15 so that the dustproof film assemblies 100 of various sizes can be gripped, but the vertical frame portions 11, 12 and the upper frame portions 13, 14 are not necessarily required. For example, in the case where the housing 10 can hold 1 type of dustproof thin film module 100, only the frame 15 may be provided. In this case, the measuring unit 30 is desirably provided near the two corners located on the upper side of the frame 15 in order to measure points near the upper side and near the left and right ends of the dustproof thin film module 100.
Although the embodiments of the present invention have been described above with reference to the drawings, the specific configuration of the present invention is not limited to the embodiments, and design changes and the like are included within the scope of the present invention. Those skilled in the art can appropriately change, add, change, and the like the elements of the embodiment.
In the present invention, "substantially" means not only the exact same but also the concept of errors and deformations that do not lose the degree of identity. For example, the substantially parallel is not limited to the case of strictly parallel, but means a concept including an error of, for example, several degrees or so. For example, the case where the expression is simply parallel, orthogonal, or the like includes not only the case of strictly parallel, orthogonal, or the like, but also the case of substantially parallel, substantially orthogonal, or the like. In the present invention, "vicinity" refers to a region including a certain range (which can be arbitrarily specified) in the vicinity of the reference position. For example, when reference is made to the vicinity of a, this refers to a range of regions in the vicinity of a, and the concept of a may or may not be included.
Reference numerals illustrate:
1: dustproof film assembly frame holding device
10: frame body
11. 12: longitudinal frame part
13. 14: upper frame part
15: frame (B)
15a: lower end part
15b: upper end portion
16: drive unit
20: dustproof film assembly holding part
21: dustproof film component holding member
22: driving member
22a: rod
22b: actuator with a spring
30: measuring unit
31: ultrasonic sensor
32: reflecting plate
32a: reflection part
33: actuator with a spring
100: dustproof film assembly
101: dustproof film assembly frame
101a: upper surface of
101b: lower surface of
101c: an outer peripheral surface
101d: groove(s)
101e: hollow part
102: dustproof film assembly
103: adhesive member
151：CPU
151a: control unit
152：RAM
153：ROM
154: input/output interface
155: communication interface
156: media interface
161: input/output device
162: network system
163: a storage medium.
Claims (7)
1. A pellicle frame holding device for holding a pellicle frame in a pellicle, and adhering the pellicle to a plate-shaped mask held in a vertical direction, the pellicle comprising: a hollow cylindrical frame of the dustproof film component; a dustproof film provided on a first surface of the dustproof film module frame, the first surface being orthogonal to an outer peripheral surface of the dustproof film module frame, so as to cover a hollow portion of the dustproof film module frame; and an adhesive member provided on a second surface parallel to the first surface, characterized in that,
The dustproof film assembly frame holding device comprises:
a frame body which is a frame-shaped member formed by combining a plurality of bars into a rectangular shape;
a dustproof film assembly holding part provided in the frame body and holding the outer peripheral surface of the dustproof film assembly frame;
a measuring unit provided in the housing; and
a control unit for controlling the frame, the dustproof thin film module holding unit, and the measuring unit,
the measuring section is provided so as to be movable between a first position where a tip of the measuring section overlaps the mask and a second position where the tip overlaps the pellicle frame,
the dustproof film assembly holding part and the measuring part are arranged at different positions when being observed from a direction orthogonal to the extending direction of the bar,
the control unit may be configured to place the measurement unit at the first position to measure a first distance, which is a distance from the reflection unit of the measurement unit to the surface of the mask, and move the measurement unit to the second position to measure a second distance, which is a distance from the reflection unit of the measurement unit to the pellicle, in a state in which the pellicle frame is gripped by the pellicle gripping unit and the frame is extended in the vertical direction so that the adhesive member is in contact with the mask.
2. The pellicle frame holding apparatus of claim 1,
the dustproof film assembly holding part is provided with a dustproof film assembly holding member which can move along the horizontal direction or the vertical direction between an abutting position abutting against the outer peripheral surface and a retreating position not abutting against the outer peripheral surface,
the frame body can be moved in a horizontal direction,
the control unit is configured to place the pellicle holding member at the contact position to hold the pellicle frame, move the frame in a horizontal direction to bring the adhesive member into contact with the mask in a state in which the frame is extended in a vertical direction, place the measurement unit at the first position to measure the first distance, move the measurement unit at the second position to measure the second distance, and move the pellicle holding member from the contact position to the retracted position when a difference between the first distance and the second distance is equal to or less than a threshold value.
3. The pellicle frame holding apparatus of claim 1 or 2,
The measuring unit has a first measuring unit provided on the upper side of the frame and at the left end thereof, and a second measuring unit provided on the upper side of the frame and at the right end thereof, in a state where the adhesive member is brought into contact with the mask.
4. The pellicle frame holding apparatus of claim 1 or 2,
the frame body has a first vertical frame portion and a second vertical frame portion which are vertically extended and provided in a rod shape, and an upper frame portion which is horizontally extended and provided at the upper ends of the first vertical frame portion and the second vertical frame portion when the adhesive member is brought into contact with the mask,
the first vertical frame portion and the second vertical frame portion are movable along the extending direction of the upper frame portion,
the upper frame part can move along the extending direction of the first vertical frame part and the second vertical frame part,
the dustproof film assembly holding part is arranged on the first vertical frame part and the second vertical frame part,
the measuring unit is provided in the upper frame.
5. The pellicle frame holding apparatus of claim 4,
the frame body has a lower frame part which is horizontally extended from the lower ends of the first and second vertical frame parts,
The measuring unit has a third measuring unit provided in the lower frame.
6. The pellicle frame holding apparatus of claim 1 or 2,
when the adhesive member is brought into contact with the mask, the frame is inclined such that a distance between the second surface on the upper end side and the mask is closer than a distance between the second surface on the lower end side and the mask.
7. A pellicle frame holding method for holding a pellicle frame in a pellicle, and adhering the pellicle to a plate-shaped mask held in a vertical direction, the pellicle comprising: a hollow cylindrical frame of the dustproof film component; a dustproof film provided on a first surface of the dustproof film module frame, the first surface being orthogonal to an outer peripheral surface of the dustproof film module frame, so as to cover a hollow portion of the dustproof film module frame; and an adhesive member provided on a second surface parallel to the first surface, characterized in that,
in the dustproof pellicle assembly frame holding method,
a dustproof film assembly holding member provided in the frame body so as to be movable in a horizontal direction is disposed at an abutting position abutting against the outer peripheral surface to hold the dustproof film assembly frame,
The frame body is moved in parallel in a state where the dustproof thin film assembly frame is held so that the adhesive member is abutted against the mask,
a measuring unit provided in the housing is disposed at a first position where a front end of the measuring unit overlaps the mask to measure a first distance, which is a distance from a reflecting unit of the measuring unit to a surface of the mask,
moving the measuring part to a second position where the front end overlaps the dustproof film assembly frame to measure a second distance, which is a distance from the reflecting part of the measuring part to the dustproof film,
when the difference between the first distance and the second distance is equal to or less than a threshold value, the dustproof thin film assembly holding member can be moved from the contact position to a retracted position where the dustproof thin film assembly holding member does not contact the outer peripheral surface.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018-010999 | 2018-01-25 | ||
| JP2018010999A JP6921412B2 (en) | 2018-01-25 | 2018-01-25 | Pellicle frame gripping device and pellicle frame gripping method |
| PCT/JP2019/001668 WO2019146547A1 (en) | 2018-01-25 | 2019-01-21 | Pellicle frame gripping device and pellicle frame gripping method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN111630453A CN111630453A (en) | 2020-09-04 |
| CN111630453B true CN111630453B (en) | 2023-08-25 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201980009593.9A Active CN111630453B (en) | 2018-01-25 | 2019-01-21 | Dustproof film assembly frame holding device and dustproof film assembly frame holding method |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP6921412B2 (en) |
| KR (1) | KR20200108280A (en) |
| CN (1) | CN111630453B (en) |
| TW (1) | TWI798327B (en) |
| WO (1) | WO2019146547A1 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2022101135A (en) | 2020-12-24 | 2022-07-06 | 株式会社ブイ・テクノロジー | Pellicle frame gripping device |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05281710A (en) * | 1992-04-03 | 1993-10-29 | Tosoh Corp | Manufacture of pellicle |
| JPH0683041A (en) * | 1992-09-03 | 1994-03-25 | Fujitsu Ltd | Method and device for inspecting adhesion state of pellicle |
| JP2006163035A (en) * | 2004-12-08 | 2006-06-22 | Dainippon Printing Co Ltd | Large pellicle, method for carrying pellicle, pellicle case, and pellicle transfer device |
| CN101268349A (en) * | 2003-10-06 | 2008-09-17 | 凸版光掩膜公司 | System and method for automatically mounting a pellicle assembly on a photomask |
| CN106168735A (en) * | 2015-05-18 | 2016-11-30 | 信越化学工业株式会社 | Dustproof film component and its installation method |
| CN107112271A (en) * | 2015-02-19 | 2017-08-29 | 株式会社 V 技术 | Pellicle frame grasping device and pellicle frame holding method |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2016079052A2 (en) * | 2014-11-17 | 2016-05-26 | Asml Netherlands B.V. | Apparatus |
-
2018
- 2018-01-25 JP JP2018010999A patent/JP6921412B2/en active Active
-
2019
- 2019-01-07 TW TW108100529A patent/TWI798327B/en active
- 2019-01-21 CN CN201980009593.9A patent/CN111630453B/en active Active
- 2019-01-21 WO PCT/JP2019/001668 patent/WO2019146547A1/en active Application Filing
- 2019-01-21 KR KR1020207019887A patent/KR20200108280A/en not_active Application Discontinuation
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05281710A (en) * | 1992-04-03 | 1993-10-29 | Tosoh Corp | Manufacture of pellicle |
| JPH0683041A (en) * | 1992-09-03 | 1994-03-25 | Fujitsu Ltd | Method and device for inspecting adhesion state of pellicle |
| CN101268349A (en) * | 2003-10-06 | 2008-09-17 | 凸版光掩膜公司 | System and method for automatically mounting a pellicle assembly on a photomask |
| JP2006163035A (en) * | 2004-12-08 | 2006-06-22 | Dainippon Printing Co Ltd | Large pellicle, method for carrying pellicle, pellicle case, and pellicle transfer device |
| CN107112271A (en) * | 2015-02-19 | 2017-08-29 | 株式会社 V 技术 | Pellicle frame grasping device and pellicle frame holding method |
| CN106168735A (en) * | 2015-05-18 | 2016-11-30 | 信越化学工业株式会社 | Dustproof film component and its installation method |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2019128501A (en) | 2019-08-01 |
| TWI798327B (en) | 2023-04-11 |
| WO2019146547A1 (en) | 2019-08-01 |
| KR20200108280A (en) | 2020-09-17 |
| CN111630453A (en) | 2020-09-04 |
| TW201933512A (en) | 2019-08-16 |
| JP6921412B2 (en) | 2021-08-18 |
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