CN111541149B - 一种10g抗反射激光器及其制备工艺 - Google Patents
一种10g抗反射激光器及其制备工艺 Download PDFInfo
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- CN111541149B CN111541149B CN202010415177.3A CN202010415177A CN111541149B CN 111541149 B CN111541149 B CN 111541149B CN 202010415177 A CN202010415177 A CN 202010415177A CN 111541149 B CN111541149 B CN 111541149B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
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- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Geometry (AREA)
- Semiconductor Lasers (AREA)
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CN111541149A CN111541149A (zh) | 2020-08-14 |
CN111541149B true CN111541149B (zh) | 2021-06-08 |
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Families Citing this family (3)
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CN112558219A (zh) * | 2020-12-11 | 2021-03-26 | 中国科学院微电子研究所 | 一种光器件及其制造方法 |
CN112864807B (zh) * | 2021-04-26 | 2021-11-05 | 武汉云岭光电有限公司 | 一种掩埋异质结的制备方法 |
CN117613663B (zh) * | 2024-01-19 | 2024-05-10 | 武汉云岭光电股份有限公司 | 激光器及其制作方法 |
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JPS594188A (ja) * | 1982-06-30 | 1984-01-10 | Fujitsu Ltd | 光半導体素子の製造方法 |
JP2542570B2 (ja) * | 1985-05-29 | 1996-10-09 | 日本電気株式会社 | 光集積素子の製造方法 |
CN1009690B (zh) * | 1987-05-24 | 1990-09-19 | 吉林大学 | 阶梯衬底内条形激光器 |
JP3145769B2 (ja) * | 1992-03-26 | 2001-03-12 | 日本放送協会 | 半導体面発光素子 |
JPH11261100A (ja) * | 1998-03-09 | 1999-09-24 | Mitsubishi Electric Corp | 光半導体装置の製造方法 |
JP3264369B2 (ja) * | 1999-02-05 | 2002-03-11 | 日本電気株式会社 | 光変調器集積半導体レーザ及びその製造方法 |
JP2001127378A (ja) * | 1999-10-29 | 2001-05-11 | Furukawa Electric Co Ltd:The | 半導体集積素子とその製造方法 |
CN1108653C (zh) * | 2000-09-13 | 2003-05-14 | 中国科学院半导体研究所 | 半导体模式转换器的制作方法 |
JP4058245B2 (ja) * | 2001-02-22 | 2008-03-05 | 日本オプネクスト株式会社 | 半導体光集積素子の製造方法 |
KR100369329B1 (ko) * | 2001-03-05 | 2003-01-24 | 주식회사 케이티 | 무결함, 무반사의 스폿사이즈 변환기를 구비한 광소자의제조 방법 |
CA2523105A1 (en) * | 2003-04-23 | 2004-11-04 | Dewell Corp. | Method and system for coupling waveguides |
CN100384038C (zh) * | 2004-09-16 | 2008-04-23 | 中国科学院半导体研究所 | 选择区域外延生长叠层电吸收调制激光器结构的制作方法 |
CN103457156A (zh) * | 2013-09-03 | 2013-12-18 | 苏州海光芯创光电科技有限公司 | 应用于高速并行光传输的大耦合对准容差半导体激光芯片及其光电器件 |
CN105576499A (zh) * | 2015-12-25 | 2016-05-11 | 福建中科光芯光电科技有限公司 | 一种InP沟槽腐蚀方法 |
WO2017129221A1 (en) * | 2016-01-25 | 2017-08-03 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Method for producing an optical semiconductor component and optical semiconductor component |
JP6740780B2 (ja) * | 2016-07-28 | 2020-08-19 | 三菱電機株式会社 | 光半導体装置 |
CN106159673A (zh) * | 2016-08-24 | 2016-11-23 | 陜西源杰半导体技术有限公司 | 具有倒台结构脊波导的半导体激光器芯片及其制造方法 |
CN110178275B (zh) * | 2017-01-19 | 2021-01-22 | 三菱电机株式会社 | 半导体激光元件、半导体激光元件的制造方法 |
CN107508143B (zh) * | 2017-09-05 | 2020-02-07 | 中国科学院半导体研究所 | 可调谐激光器及其制备方法 |
CN108493765A (zh) * | 2018-03-13 | 2018-09-04 | 福建中科光芯光电科技有限公司 | 一种端面刻蚀半导体激光器的制备方法 |
CN209993866U (zh) * | 2019-05-28 | 2020-01-24 | 陕西源杰半导体技术有限公司 | 一种10g抗反射分布反馈式激光器 |
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Effective date of registration: 20200805 Address after: 712000 Shaanxi Province, Xianyang City West Ham Metro West Symphony 55 Century Avenue, Tsinghua Science Park North accelerator plant No. 20 C Applicant after: SHAANXI YUANJIE SEMICONDUCTOR TECHNOLOGY Co.,Ltd. Applicant after: HUAWEI TECHNOLOGIES Co.,Ltd. Applicant after: BROADEX TECHNOLOGIES Co.,Ltd. Address before: 712000 Shaanxi Province, Xianyang City West Ham Metro West Symphony 55 Century Avenue, Tsinghua Science Park North accelerator plant No. 20 C Applicant before: SHAANXI YUANJIE SEMICONDUCTOR TECHNOLOGY Co.,Ltd. |
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Address after: 712000 area C, plant 20, accelerator, North District, Tsinghua Science Park, 55 Century Avenue, Fengxi new town, Xixian New District, Xianyang City, Shaanxi Province Patentee after: Shaanxi Yuanjie Semiconductor Technology Co.,Ltd. Patentee after: HUAWEI TECHNOLOGIES Co.,Ltd. Patentee after: BROADEX TECHNOLOGIES Co.,Ltd. Address before: 712000 area C, plant 20, accelerator, North District, Tsinghua Science Park, 55 Century Avenue, Fengxi new town, Xixian New District, Xianyang City, Shaanxi Province Patentee before: SHAANXI YUANJIE SEMICONDUCTOR TECHNOLOGY Co.,Ltd. Patentee before: HUAWEI TECHNOLOGIES Co.,Ltd. Patentee before: BROADEX TECHNOLOGIES Co.,Ltd. |
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