CN111489995B - 太阳能电池硅片二次印刷用翻转运输装置及其生产工艺 - Google Patents
太阳能电池硅片二次印刷用翻转运输装置及其生产工艺 Download PDFInfo
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- CN111489995B CN111489995B CN202010335571.6A CN202010335571A CN111489995B CN 111489995 B CN111489995 B CN 111489995B CN 202010335571 A CN202010335571 A CN 202010335571A CN 111489995 B CN111489995 B CN 111489995B
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 233
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67718—Changing orientation of the substrate, e.g. from a horizontal position to a vertical position
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1804—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic System
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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CN202010335571.6A CN111489995B (zh) | 2020-04-25 | 2020-04-25 | 太阳能电池硅片二次印刷用翻转运输装置及其生产工艺 |
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CN202010335571.6A CN111489995B (zh) | 2020-04-25 | 2020-04-25 | 太阳能电池硅片二次印刷用翻转运输装置及其生产工艺 |
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CN112909128A (zh) * | 2021-02-07 | 2021-06-04 | 宣城睿晖宣晟企业管理中心合伙企业(有限合伙) | 异质结太阳能电池片的制造方法及异质结太阳能电池片 |
CN114161819A (zh) * | 2021-11-23 | 2022-03-11 | 江苏华恒新能源有限公司 | 一种双面perc电池背场批量印刷装置 |
CN116373443B (zh) * | 2023-04-06 | 2023-12-08 | 江苏龙恒新能源有限公司 | 一种太阳能电池硅片印刷设备 |
CN116914032B (zh) * | 2023-09-11 | 2023-11-24 | 苏州莱德新能源科技有限公司 | 一种用于微晶异质结太阳电池光注入设备及其方法 |
Citations (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0555348A (ja) * | 1991-08-23 | 1993-03-05 | Toshiba Ceramics Co Ltd | 半導体ウエーハ処理用車輪付きボート |
CN202640953U (zh) * | 2012-06-21 | 2013-01-02 | 华中科技大学 | 一种光伏太阳能硅片翻转设备 |
CN203938157U (zh) * | 2014-04-30 | 2014-11-12 | 江苏爱多光伏科技有限公司 | 一种光伏电池片翻转机构 |
CN105034555A (zh) * | 2015-08-20 | 2015-11-11 | 浙江艾能聚光伏科技股份有限公司 | 一种太阳能电池片印刷机翻片器 |
CN204894746U (zh) * | 2015-08-20 | 2015-12-23 | 浙江艾能聚光伏科技股份有限公司 | 一种太阳能电池片印刷机翻片器 |
CN105692150A (zh) * | 2015-12-30 | 2016-06-22 | 无锡赛晶太阳能有限公司 | 一种新型硅片翻转器 |
CN205381695U (zh) * | 2016-03-18 | 2016-07-13 | 浙江绿远光伏科技有限公司 | 一种硅片翻片装置 |
CN106910784A (zh) * | 2017-03-03 | 2017-06-30 | 广东爱康太阳能科技有限公司 | 一种旋转式双面晶硅太阳能电池印刷系统 |
CN206628476U (zh) * | 2017-03-03 | 2017-11-10 | 广东爱康太阳能科技有限公司 | 一种旋转式双面晶硅太阳能电池印刷系统 |
CN107452656A (zh) * | 2017-08-07 | 2017-12-08 | 罗博特科智能科技股份有限公司 | 一种硅片快速翻转机构 |
CN207549695U (zh) * | 2017-10-27 | 2018-06-29 | 乐山新天源太阳能科技有限公司 | 电池片翻面装置 |
CN109449252A (zh) * | 2018-11-15 | 2019-03-08 | 浙江艾能聚光伏科技股份有限公司 | 半片多晶太阳能电池片的制作工艺 |
CN109616549A (zh) * | 2018-11-15 | 2019-04-12 | 浙江艾能聚光伏科技股份有限公司 | 一种太阳能电池片的制备方法 |
-
2020
- 2020-04-25 CN CN202010335571.6A patent/CN111489995B/zh active Active
Patent Citations (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0555348A (ja) * | 1991-08-23 | 1993-03-05 | Toshiba Ceramics Co Ltd | 半導体ウエーハ処理用車輪付きボート |
CN202640953U (zh) * | 2012-06-21 | 2013-01-02 | 华中科技大学 | 一种光伏太阳能硅片翻转设备 |
CN203938157U (zh) * | 2014-04-30 | 2014-11-12 | 江苏爱多光伏科技有限公司 | 一种光伏电池片翻转机构 |
CN105034555A (zh) * | 2015-08-20 | 2015-11-11 | 浙江艾能聚光伏科技股份有限公司 | 一种太阳能电池片印刷机翻片器 |
CN204894746U (zh) * | 2015-08-20 | 2015-12-23 | 浙江艾能聚光伏科技股份有限公司 | 一种太阳能电池片印刷机翻片器 |
CN105692150A (zh) * | 2015-12-30 | 2016-06-22 | 无锡赛晶太阳能有限公司 | 一种新型硅片翻转器 |
CN205381695U (zh) * | 2016-03-18 | 2016-07-13 | 浙江绿远光伏科技有限公司 | 一种硅片翻片装置 |
CN106910784A (zh) * | 2017-03-03 | 2017-06-30 | 广东爱康太阳能科技有限公司 | 一种旋转式双面晶硅太阳能电池印刷系统 |
CN206628476U (zh) * | 2017-03-03 | 2017-11-10 | 广东爱康太阳能科技有限公司 | 一种旋转式双面晶硅太阳能电池印刷系统 |
CN107452656A (zh) * | 2017-08-07 | 2017-12-08 | 罗博特科智能科技股份有限公司 | 一种硅片快速翻转机构 |
CN207549695U (zh) * | 2017-10-27 | 2018-06-29 | 乐山新天源太阳能科技有限公司 | 电池片翻面装置 |
CN109449252A (zh) * | 2018-11-15 | 2019-03-08 | 浙江艾能聚光伏科技股份有限公司 | 半片多晶太阳能电池片的制作工艺 |
CN109616549A (zh) * | 2018-11-15 | 2019-04-12 | 浙江艾能聚光伏科技股份有限公司 | 一种太阳能电池片的制备方法 |
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