CN111279565B - 发光装置及其制造方法以及投影仪 - Google Patents

发光装置及其制造方法以及投影仪 Download PDF

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Publication number
CN111279565B
CN111279565B CN201880069581.0A CN201880069581A CN111279565B CN 111279565 B CN111279565 B CN 111279565B CN 201880069581 A CN201880069581 A CN 201880069581A CN 111279565 B CN111279565 B CN 111279565B
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layer
emitting device
semiconductor layer
light
light emitting
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Chinese (zh)
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CN111279565A (zh
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名川伦郁
石泽峻介
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Seiko Epson Corp
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Seiko Epson Corp
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/2004—Confining in the direction perpendicular to the layer structure
    • H01S5/2018—Optical confinement, e.g. absorbing-, reflecting- or waveguide-layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
    • H01S5/042—Electrical excitation ; Circuits therefor
    • H01S5/0425—Electrodes, e.g. characterised by the structure
    • H01S5/04256—Electrodes, e.g. characterised by the structure characterised by the configuration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/2054—Methods of obtaining the confinement
    • H01S5/2081—Methods of obtaining the confinement using special etching techniques
    • H01S5/209—Methods of obtaining the confinement using special etching techniques special etch stop layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
    • H01S5/3211—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures characterised by special cladding layers, e.g. details on band-discontinuities
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00—Projectors or projection-type viewers; Accessories therefor
    • G03B21/14—Details
    • G03B21/20—Lamp housings
    • G03B21/2006—Lamp housings characterised by the light source
    • G03B21/2033—LED or laser light sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/02—Structural details or components not essential to laser action
    • H01S5/028—Coatings ; Treatment of the laser facets, e.g. etching, passivation layers or reflecting layers
    • H01S5/0281—Coatings made of semiconductor materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
    • H01S5/042—Electrical excitation ; Circuits therefor
    • H01S5/0425—Electrodes, e.g. characterised by the structure
    • H01S5/04254—Electrodes, e.g. characterised by the structure characterised by the shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
    • H01S5/042—Electrical excitation ; Circuits therefor
    • H01S5/0425—Electrodes, e.g. characterised by the structure
    • H01S5/04256—Electrodes, e.g. characterised by the structure characterised by the configuration
    • H01S5/04257—Electrodes, e.g. characterised by the structure characterised by the configuration having positive and negative electrodes on the same side of the substrate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
    • H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
    • H01S5/34333—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer based on Ga(In)N or Ga(In)P, e.g. blue laser

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • Geometry (AREA)
  • Led Devices (AREA)
  • Liquid Crystal (AREA)
  • Projection Apparatus (AREA)
  • Semiconductor Lasers (AREA)
CN201880069581.0A 2017-10-27 2018-10-19 发光装置及其制造方法以及投影仪 Active CN111279565B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2017208551A JP7110580B2 (ja) 2017-10-27 2017-10-27 発光装置およびその製造方法、ならびにプロジェクター
JP2017-208551 2017-10-27
PCT/JP2018/039049 WO2019082817A1 (ja) 2017-10-27 2018-10-19 発光装置およびその製造方法、ならびにプロジェクター

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Publication Number Publication Date
CN111279565A CN111279565A (zh) 2020-06-12
CN111279565B true CN111279565B (zh) 2023-03-14

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US (1) US11670911B2 (enExample)
JP (1) JP7110580B2 (enExample)
CN (1) CN111279565B (enExample)
WO (1) WO2019082817A1 (enExample)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6935657B2 (ja) * 2019-03-26 2021-09-15 セイコーエプソン株式会社 発光装置およびプロジェクター
US11114419B2 (en) * 2019-09-11 2021-09-07 Jade Bird Display (shanghai) Limited Multi-color LED pixel unit and micro-LED display panel
JP7017761B2 (ja) * 2019-10-29 2022-02-09 セイコーエプソン株式会社 発光装置、プロジェクター、およびディスプレイ
JP2021150373A (ja) * 2020-03-17 2021-09-27 セイコーエプソン株式会社 発光装置、プロジェクター、およびディスプレイ
FR3109020B1 (fr) * 2020-04-06 2022-02-25 Scintil Photonics Dispositif photonique pour etablir un rayonnement lumineux comprenant un mode optique dans un guide d'onde
JP7462902B2 (ja) * 2020-06-30 2024-04-08 セイコーエプソン株式会社 発光装置、プロジェクター、および発光装置の製造方法
JP7531805B2 (ja) 2020-06-30 2024-08-13 セイコーエプソン株式会社 発光装置およびプロジェクター
JP7557763B2 (ja) * 2020-07-31 2024-09-30 セイコーエプソン株式会社 発光装置およびプロジェクター
JP7556246B2 (ja) * 2020-09-23 2024-09-26 セイコーエプソン株式会社 発光装置、発光装置の製造方法およびプロジェクター
JP2022119077A (ja) * 2021-02-03 2022-08-16 住友電気工業株式会社 半導体光素子およびその製造方法
JP7608896B2 (ja) * 2021-03-16 2025-01-07 セイコーエプソン株式会社 発光装置およびプロジェクター
JP7776817B2 (ja) * 2021-09-13 2025-11-27 セイコーエプソン株式会社 発光装置、プロジェクター、およびディスプレイ
JP2023041230A (ja) * 2021-09-13 2023-03-24 セイコーエプソン株式会社 発光装置およびプロジェクター
JP2023065945A (ja) * 2021-10-28 2023-05-15 セイコーエプソン株式会社 発光装置およびプロジェクター
JP7751832B2 (ja) * 2021-10-28 2025-10-09 セイコーエプソン株式会社 発光装置およびプロジェクター
EP4607722A1 (en) 2024-02-20 2025-08-27 Nichia Corporation Semiconductor laser element

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JP2006179573A (ja) * 2004-12-21 2006-07-06 Sumitomo Electric Ind Ltd 半導体レーザ素子およびその製造方法
JP2007324411A (ja) * 2006-06-01 2007-12-13 Toshiba Corp 半導体発光素子及びその製造方法、並びに半導体発光素子を用いた照明装置

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JP2004095837A (ja) 2002-08-30 2004-03-25 Fuji Photo Film Co Ltd 半導体レーザ素子
US8163575B2 (en) * 2005-06-17 2012-04-24 Philips Lumileds Lighting Company Llc Grown photonic crystals in semiconductor light emitting devices
JP4483736B2 (ja) 2005-08-12 2010-06-16 パナソニック電工株式会社 半導体発光素子およびそれを用いる照明装置ならびに半導体発光素子の製造方法
JP2008098379A (ja) * 2006-10-11 2008-04-24 Furukawa Electric Co Ltd:The ２次元フォトニック結晶面発光レーザおよびその製造方法
JP2009231773A (ja) 2008-03-25 2009-10-08 Sumitomo Electric Ind Ltd フォトニック結晶面発光レーザ素子およびその製造方法
JP5232972B2 (ja) 2008-10-20 2013-07-10 豊田合成株式会社 半導体発光素子及び半導体発光素子の製造方法
WO2010140404A1 (ja) 2009-06-05 2010-12-09 コニカミノルタオプト株式会社 面発光半導体レーザ、光記録ヘッド及び光記録装置
JP2012059790A (ja) 2010-09-06 2012-03-22 Toshiba Corp 半導体発光素子及びその製造方法
JP5988568B2 (ja) * 2011-11-14 2016-09-07 Ｄｏｗａエレクトロニクス株式会社 半導体発光素子およびその製造方法

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JP2006179573A (ja) * 2004-12-21 2006-07-06 Sumitomo Electric Ind Ltd 半導体レーザ素子およびその製造方法
JP2007324411A (ja) * 2006-06-01 2007-12-13 Toshiba Corp 半導体発光素子及びその製造方法、並びに半導体発光素子を用いた照明装置

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CN111279565A (zh) 2020-06-12
US11670911B2 (en) 2023-06-06
US20200266611A1 (en) 2020-08-20
JP2019083232A (ja) 2019-05-30
WO2019082817A1 (ja) 2019-05-02
JP7110580B2 (ja) 2022-08-02

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