CN111198463A - 一种显示面板及其缺陷修补方法 - Google Patents

一种显示面板及其缺陷修补方法 Download PDF

Info

Publication number
CN111198463A
CN111198463A CN202010142240.0A CN202010142240A CN111198463A CN 111198463 A CN111198463 A CN 111198463A CN 202010142240 A CN202010142240 A CN 202010142240A CN 111198463 A CN111198463 A CN 111198463A
Authority
CN
China
Prior art keywords
electrode
pixel
display panel
lines
data line
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202010142240.0A
Other languages
English (en)
Inventor
朱静
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shenzhen China Star Optoelectronics Semiconductor Display Technology Co Ltd
Original Assignee
Shenzhen China Star Optoelectronics Semiconductor Display Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shenzhen China Star Optoelectronics Semiconductor Display Technology Co Ltd filed Critical Shenzhen China Star Optoelectronics Semiconductor Display Technology Co Ltd
Priority to CN202010142240.0A priority Critical patent/CN111198463A/zh
Priority to US16/760,505 priority patent/US20220187664A1/en
Priority to PCT/CN2020/084951 priority patent/WO2021174647A1/zh
Publication of CN111198463A publication Critical patent/CN111198463A/zh
Pending legal-status Critical Current

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36—Removing material
    • B23K26/38—Removing material by boring or cutting
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136259—Repairing; Defects
    • G02F1/136263—Line defects
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/134309—Electrodes characterised by their geometrical arrangement
    • G02F1/134363—Electrodes characterised by their geometrical arrangement for applying an electric field parallel to the substrate, i.e. in-plane switching [IPS]
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K1/00—Soldering, e.g. brazing, or unsoldering
    • B23K1/0008—Soldering, e.g. brazing, or unsoldering specially adapted for particular articles or work
    • B23K1/0016—Brazing of electronic components
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K1/00—Soldering, e.g. brazing, or unsoldering
    • B23K1/005—Soldering by means of radiant energy
    • B23K1/0056—Soldering by means of radiant energy soldering by means of beams, e.g. lasers, E.B.
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K1/00—Soldering, e.g. brazing, or unsoldering
    • B23K1/20—Preliminary treatment of work or areas to be soldered, e.g. in respect of a galvanic coating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/20—Bonding
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/20—Bonding
    • B23K26/21—Bonding by welding
    • B23K26/24—Seam welding
    • B23K26/26—Seam welding of rectilinear seams
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36—Removing material
    • B23K26/38—Removing material by boring or cutting
    • B23K26/382—Removing material by boring or cutting by boring
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36—Removing material
    • B23K26/40—Removing material taking account of the properties of the material involved
    • B23K26/402—Removing material taking account of the properties of the material involved involving non-metallic material, e.g. isolators
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/134309—Electrodes characterised by their geometrical arrangement
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136259—Repairing; Defects
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136286—Wiring, e.g. gate line, drain line
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
    • H01L21/76886—Modifying permanently or temporarily the pattern or the conductivity of conductive members, e.g. formation of alloys, reduction of contact resistances
    • H01L21/76892—Modifying permanently or temporarily the pattern or the conductivity of conductive members, e.g. formation of alloys, reduction of contact resistances modifying the pattern
    • H01L21/76894—Modifying permanently or temporarily the pattern or the conductivity of conductive members, e.g. formation of alloys, reduction of contact resistances modifying the pattern using a laser, e.g. laser cutting, laser direct writing, laser repair
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2101/00—Articles made by soldering, welding or cutting
    • B23K2101/36—Electric or electronic devices
    • B23K2101/42—Printed circuits
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00—Materials to be soldered, welded or cut
    • B23K2103/16—Composite materials, e.g. fibre reinforced
    • B23K2103/166—Multilayered materials
    • B23K2103/172—Multilayered materials wherein at least one of the layers is non-metallic
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136213—Storage capacitors associated with the pixel electrode
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136286—Wiring, e.g. gate line, drain line
    • G02F1/13629—Multilayer wirings

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Plasma & Fusion (AREA)
  • Geometry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

本申请提供一种显示面板及其缺陷修补方法，该显示面板包括显示区和边框区，显示区包括：扫描线和数据线；像素电极，对应设于扫描线与数据线围成的像素区域，其包括呈十字型的主干电极；像素驱动器件，用于将像素电极电连接至扫描线和数据线；公共电极与像素电极呈异层结构设置，公共电极包括沿横向延伸的第一电极线和沿纵向延伸的第二电极线；第一电极线与第二电极线对应像素电极的主干电极设置，公共电极对应主干电极的部分与主干电极重叠。本申请通过去除边框区的公共电极，将公共电极移至显示区的十字主干电极处，从而减小边框尺寸的同时，提高像素的开口率。

Description

一种显示面板及其缺陷修补方法
技术领域
本申请涉及显示技术领域，尤其涉及一种显示面板及其缺陷修补方法。
背景技术
液晶显示器(LCD)是最广泛使用的平板显示器之一，高开口率、窄边框以及高频率下充电率均匀是TFT-LCD面板厂追求的目标。传统的像素设计主要包括栅极线、数据线、公共电极以及像素电极等。其中，公共电极(ACOM)的存在目的是为了实现公共电极和像素电极之间形成电容(Cst)，为了改善TFT-LCD由于漏电等因素引起闪烁等品质问题，故而对电容(Cst)的大小亦有一定的需求，即电容(Cst)不能过小。从而，使得液晶显示器边框位置的公共电极(ACOM)的宽度较宽，不利于液晶显示器窄边框的发展。
因此，现有技术存在缺陷，急需解决。
发明内容
本申请提供一种显示面板及其缺陷修补方法，能够解决传统显示面板边框较宽，以及容易产生亮点的问题。
为解决上述问题，本申请提供的技术方案如下：
本申请提供一种显示面板，包括显示区和边框区，所述显示区包括：
扫描线，沿横向延伸；
数据线，沿纵向延伸；
像素电极，对应设置于所述扫描线与所述数据线围成的像素区域，所述像素电极包括呈十字型设置的主干电极；
像素驱动器件，用于将所述像素电极电连接至所述扫描线和所述数据线；
公共电极，所述公共电极与所述像素电极呈异层结构设置，所述公共电极包括沿横向延伸的第一电极线和沿纵向延伸的第二电极线；
其中，所述第一电极线与所述第二电极线对应所述像素电极的主干电极设置，所述公共电极对应所述主干电极的部分与所述主干电极重叠。
在本申请的显示面板中，所述第一电极线与所述扫描线同层设置，所述第二电极线与所述数据线同层设置。
在本申请的显示面板中，所述第一电极线与所述第二电极线交叉形成网状结构。
在本申请的显示面板中，所述第一电极线与所述第二电极线之间设置有介电层，所述第一电极线和所述第二电极线通过所述介电层上的过孔电连接。
在本申请的显示面板中，多条所述第一电极线并联设置，多条所述第二电极线并联设置。
在本申请的显示面板中，所述边框区内设有行扫描驱动电路和行扫描驱动总线。
在本申请的显示面板中，所述公共电极对应所述主干电极的部分在所述显示面板上的正投影位于所述主干电极在所述显示面板上的正投影的范围内。
本申请还提供一种显示面板的缺陷修补方法，所述方法包括以下步骤：
步骤S1，采用激光在所述数据线与所述像素驱动器件的连接位点处将所述数据线与所述像素驱动器件连接的部分切断；
步骤S2，在所述像素电极与所述第二电极线重叠的位置将所述像素电极与所述第二电极线熔接。
在本申请的显示面板的缺陷修补方法中，所述数据线与所述像素驱动器件切断后，所述数据线对应切割位点的部分的宽度大于或等于所述数据线其余部分的宽度。
在本申请的显示面板的缺陷修补方法中，所述像素电极与所述第二电极线之间设有绝缘层，所述步骤S2包括以下步骤：
步骤S201，在所述像素电极与所述第二电极线重叠的预设位置采用激光镭射形成贯穿所述像素电极和所述绝缘层的熔接孔；
步骤S202，对所述熔接孔周边的所述像素电极进行镭射，以使所述熔接孔周边的所述像素电极呈熔融状态并经由所述熔接孔与所述第二电极线接触。
本申请的有益效果为：本申请提供的显示面板及其缺陷修补方法，通过将传统显示面板边框区域的作为参考电容(Cst Referene)的公共电极(ACOM)移除，在显示区内设置双层结构的公共电极，并将公共电极设置于像素电极的十字主干电极处，无需占用像素开口，从而减小边框尺寸的同时，提高像素的开口率。此外，本申请通过将产生亮点的像素所对应的像素电极与公共电极熔接，从而解决像素由于制程等原因产生亮点的不良现象。
附图说明
下面结合附图，通过对本申请的具体实施方式详细描述，将使本申请的技术方案及其它有益效果显而易见。
图1为本申请实施例提供的显示面板的结构示意图；
图2为传统显示面板的边框区的结构示意图；
图3为本申请的显示面板的边框区的结构示意图；
图4为本申请实施例提供的公共电极的结构示意图；
图5为本申请实施例提供的显示面板的缺陷修补方法流程图；
图6为本申请实施例提供的显示面板的缺陷修补示意图。
具体实施方式
下面将结合本申请实施例中的附图，对本申请实施例中的技术方案进行清楚、完整地描述。显然，所描述的实施例仅仅是本申请一部分实施例，而不是全部的实施例。基于本申请中的实施例，本领域技术人员在没有作出创造性劳动前提下所获得的所有其他实施例，都属于本申请保护的范围。
在本申请的描述中，需要理解的是，术语“纵向”、“横向”、“长度”、“宽度”、“上”、“下”、“前”、“后”、“左”、“右”、“竖直”、“水平”等指示的方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述本申请和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本申请的限制。此外，术语“第一”、“第二”仅用于描述目的，而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此，限定有“第一”、“第二”的特征可以明示或者隐含地包括一个或者更多个所述特征。在本申请的描述中，“多个”的含义是两个或两个以上，除非另有明确具体的限定。在本申请中，“/”表示“或者”的意思。
本申请可以在不同例子中重复参考数字和/或参考字母，这种重复是为了简化和清楚的目的，其本身不指示所讨论各种实施方式和/或设置之间的关系。
请参照图1所示，为本申请实施例提供的显示面板的结构示意图，所述显示面板包括显示区100和边框区200，所述显示面板对应所述显示区100包括：多条扫描线101，沿横向延伸；多条数据线102，沿纵向延伸；所述扫描线101与所述数据线102围成的像素区域P；像素电极103，对应所述像素区域P设置，所述像素电极103包括呈十字型设置的主干电极；像素驱动器件104，用于将所述像素电极103电连接至所述扫描线101和所述数据线102；公共电极105，所述公共电极105与所述像素电极103呈异层结构设置，所述公共电极105包括沿横向延伸的第一电极线105a和沿纵向延伸的第二电极线105b。
其中，所述第一电极线105a与所述第二电极线105a对应所述像素电极103的主干电极设置，所述主干电极包括沿横向设置的横向主干电极103a和沿纵向设置的纵向主干电极103b。所述横向主干电极103a和所述纵向主干电极103b十字交叉设置。
所述公共电极105对应所述主干电极的部分与所述主干电极重叠，即所述第一电极线105a对应所述横向主干电极103a的部分与所述横向主干电极103a重叠，所述第二电极线105a对应所述纵向主干电极103b的部分与所述纵向主干电极103b重叠。通常由于像素电极设计的畴(Domain)的方式不同，通常像素电极中间不同畴的交界区域(即主干电极对应的区域)呈现为暗纹区域，对像素电极的透过率和开口率无所贡献。本实施例将传统显示面板的边框区的公共电极(ACOM)移除，将公共电极(CF-COM)设置于显示区内对应十字主干电极的位置，无需占用像素开口，在减小边框尺寸的同时，提高像素的开口率。由于公共电极(CF-COM)的位准是液晶旋转的参考电极，故无需担心漏光问题。
其中，所述第一电极线105a与所述扫描线101同层设置，所述第二电极线105b与所述数据线102同层设置。
进一步的，所述第一电极线105a与所述扫描线101是采用同种材料经同一光罩工艺形成的，所述第二电极线105b与所述数据线102是采用同种材料经同一光罩工艺形成的。
在本实施例中，所述公共电极105用于与所述像素电极103形成电容(Cst)。所述公共电极105对应所述主干电极的部分在所述显示面板上的正投影位于所述主干电极在所述显示面板上的正投影的范围内，从而使所述公共电极105不影响像素的开口率。
结合图2和图3所示，图2为传统显示面板的边框区的结构示意图；图3为本申请的显示面板的边框区的结构示意图。传统显示面板的边框区200内设置有公共电极(即C-COM)210、GOA总线(即行扫描驱动总线)220、GOA电路(即行扫描驱动电路)230以及公共电极(即A-COM)240。本申请的显示面板的边框区200内仅设置有GOA总线220和GOA电路230，由于本申请将公共电极(即A-COM)240移除，并将公共电极(C-COM)210移至显示区的主干电极处，因此，本申请的显示面板的边框大大减小。
结合图4所示，为本申请实施例提供的公共电极的结构示意图。所述第一电极线105a与所述第二电极线105b交叉形成网状结构。所述第一电极线105a与所述第二电极线105b之间设置有介电层，所述第一电极线105a和所述第二电极线105b通过所述介电层上的过孔300电连接。其中，多条所述第一电极线105a横向并联设置，多条所述第二电极线105b纵向并联设置，如此所述公共电极105设计较稳，无需担心耦合导致的画面品质问题。
所述显示面板的边框区200内包括绑定区，所述绑定区内绑定有覆晶薄膜201，所述数据线102及所述第一电极线105a分别与所述覆晶薄膜201电连接。
在一种实施例中，所述像素电极103还可以包括与所述主干电极连接的分支电极，此处不做限制。
在本实施例中，所述显示面板的像素结构为4畴，在其他实施例中显示面板的像素结构还可以为8畴等。
如图5所示，本申请还提供一种如上述实施例提供的显示面板的缺陷修补方法，所述显示面板为液晶面板，显示面板的像素由于制程等原因容易产生亮点等不良现象，影响显示面板的品质。本申请提供的显示面板的缺陷修补方法可以有效的解决该缺陷，结合图5和图6所示，显示面板的缺陷修补方法包括以下步骤：
步骤S1，采用激光在所述数据线102与所述像素驱动器件104的连接位点处将所述数据线102与所述像素驱动器件104连接的部分切断。
其中，所述数据线102与所述像素驱动器件104切断后，所述数据线102对应切割位点Q的部分的宽度大于或等于所述数据线102其余部分的宽度。从而避免在切割制程中对所述数据线102造成损伤，进而导致断线等风险。
可以理解的是，上述步骤只是将产生亮点等不良现象的像素所对应的像素驱动器件和与之连接的数据线进行切断，以将产生亮点的像素进行修补。
步骤S2，在所述像素电极103与所述第二电极线105b重叠的位置将所述像素电极103与所述第二电极线105b熔接。
具体地，所述像素电极103与所述第二电极线105b之间设有绝缘层，所述步骤S2包括以下步骤：
步骤S201，在所述像素电极103与所述第二电极线105b重叠的预设位置采用激光镭射形成贯穿所述像素电极103和所述绝缘层的熔接孔400。
步骤S202，对所述熔接孔400周边的所述像素电极103进行镭射，以使所述熔接孔400周边的所述像素电极103呈熔融状态并经由所述熔接孔400与所述第二电极线105b接触。
由于将所述像素电极103熔接至所述公共电极105上，使得所述像素电极103与所述公共电极105短路，即所述像素电极103与所述公共电极105的电位相等，故而该像素电极对应区域的液晶不发生偏转，就为暗态，也就是将产生亮点不良的像素修补为暗态。
综上所述，本申请的显示面板通过将传统显示面板边框区域的作为参考电容(CstReferene)的公共电极(ACOM)移除，在显示区内设置双层结构的公共电极，并将公共电极设置于像素电极的十字主干电极处，无需占用像素开口，从而减小边框尺寸的同时，提高像素的开口率。本申请显示面板的缺陷修补方法通过将产生亮点的像素所对应的像素电极与公共电极熔接，使得像素电极和公共电极的电位相等，故而该像素对应的液晶不发生旋转即为暗态，从而解决像素由于制程等原因产生亮点的不良现象。
综上所述，虽然本申请已以优选实施例揭露如上，但上述优选实施例并非用以限制本申请，本领域的普通技术人员，在不脱离本申请的精神和范围内，均可作各种更动与润饰，因此本申请的保护范围以权利要求界定的范围为准。

Claims (10)

1.一种显示面板，其特征在于，包括显示区和边框区，所述显示区包括：
扫描线，沿横向延伸；
数据线，沿纵向延伸；
像素电极，对应设置于所述扫描线与所述数据线围成的像素区域，所述像素电极包括呈十字型设置的主干电极；
像素驱动器件，用于将所述像素电极电连接至所述扫描线和所述数据线；
公共电极，所述公共电极与所述像素电极呈异层结构设置，所述公共电极包括沿横向延伸的第一电极线和沿纵向延伸的第二电极线；
其中，所述第一电极线与所述第二电极线对应所述像素电极的主干电极设置，所述公共电极对应所述主干电极的部分与所述主干电极重叠。
2.根据权利要求1所述的显示面板，其特征在于，所述第一电极线与所述扫描线同层设置，所述第二电极线与所述数据线同层设置。
3.根据权利要求2所述的显示面板，其特征在于，所述第一电极线与所述第二电极线交叉形成网状结构。
4.根据权利要求3所述的显示面板，其特征在于，所述第一电极线与所述第二电极线之间设置有介电层，所述第一电极线和所述第二电极线通过所述介电层上的过孔电连接。
5.根据权利要求4所述的显示面板，其特征在于，多条所述第一电极线并联设置，多条所述第二电极线并联设置。
6.根据权利要求1所述的显示面板，其特征在于，所述边框区内设有行扫描驱动电路和行扫描驱动总线。
7.根据权利要求1所述的显示面板，其特征在于，所述公共电极对应所述主干电极的部分在所述显示面板上的正投影位于所述主干电极在所述显示面板上的正投影的范围内。
8.一种如权利要求1～7任一项所述的显示面板的缺陷修补方法，其特征在于，所述方法包括以下步骤：
步骤S1，采用激光在所述数据线与所述像素驱动器件的连接位点处将所述数据线与所述像素驱动器件连接的部分切断；
步骤S2，在所述像素电极与所述第二电极线重叠的位置将所述像素电极与所述第二电极线熔接。
9.根据权利要求8所述的显示面板的缺陷修补方法，其特征在于，所述数据线与所述像素驱动器件切断后，所述数据线对应切割位点的部分的宽度大于或等于所述数据线其余部分的宽度。
10.根据权利要求8所述的显示面板的缺陷修补方法，其特征在于，所述像素电极与所述第二电极线之间设有绝缘层，所述步骤S2包括以下步骤：
步骤S201，在所述像素电极与所述第二电极线重叠的预设位置采用激光镭射形成贯穿所述像素电极和所述绝缘层的熔接孔；
步骤S202，对所述熔接孔周边的所述像素电极进行镭射，以使所述熔接孔周边的所述像素电极呈熔融状态并经由所述熔接孔与所述第二电极线接触。
CN202010142240.0A 2020-03-04 2020-03-04 一种显示面板及其缺陷修补方法 Pending CN111198463A (zh)

Priority Applications (3)

Application Number Priority Date Filing Date Title
CN202010142240.0A CN111198463A (zh) 2020-03-04 2020-03-04 一种显示面板及其缺陷修补方法
US16/760,505 US20220187664A1 (en) 2020-03-04 2020-04-15 Display panel and defect repairing method of same
PCT/CN2020/084951 WO2021174647A1 (zh) 2020-03-04 2020-04-15 一种显示面板及其缺陷修补方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202010142240.0A CN111198463A (zh) 2020-03-04 2020-03-04 一种显示面板及其缺陷修补方法

Publications (1)

Publication Number Publication Date
CN111198463A true CN111198463A (zh) 2020-05-26

Family

ID=70746455

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202010142240.0A Pending CN111198463A (zh) 2020-03-04 2020-03-04 一种显示面板及其缺陷修补方法

Country Status (3)

Country Link
US (1) US20220187664A1 (zh)
CN (1) CN111198463A (zh)
WO (1) WO2021174647A1 (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111624200A (zh) * 2020-05-28 2020-09-04 苏州精濑光电有限公司 缺陷检测方法以及装置
WO2023000368A1 (zh) * 2021-07-22 2023-01-26 Tcl华星光电技术有限公司 阵列基板及其制备方法以及显示面板

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102445796A (zh) * 2011-07-22 2012-05-09 深圳市华星光电技术有限公司 液晶显示装置及其插黑方法
CN102759831A (zh) * 2012-07-18 2012-10-31 深圳市华星光电技术有限公司 像素结构及相应的液晶显示装置
CN103943627A (zh) * 2013-07-30 2014-07-23 上海中航光电子有限公司 Tft阵列基板及其制造方法、显示装置
US20150029448A1 (en) * 2011-07-08 2015-01-29 Japan Display Inc. Liquid crystal display device
CN107238990A (zh) * 2017-08-01 2017-10-10 惠科股份有限公司 一种阵列基板以及一种显示装置
CN109164654A (zh) * 2018-09-27 2019-01-08 京东方科技集团股份有限公司 一种阵列基板及其制作方法、显示装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20150029448A1 (en) * 2011-07-08 2015-01-29 Japan Display Inc. Liquid crystal display device
CN102445796A (zh) * 2011-07-22 2012-05-09 深圳市华星光电技术有限公司 液晶显示装置及其插黑方法
CN102759831A (zh) * 2012-07-18 2012-10-31 深圳市华星光电技术有限公司 像素结构及相应的液晶显示装置
CN103943627A (zh) * 2013-07-30 2014-07-23 上海中航光电子有限公司 Tft阵列基板及其制造方法、显示装置
CN107238990A (zh) * 2017-08-01 2017-10-10 惠科股份有限公司 一种阵列基板以及一种显示装置
CN109164654A (zh) * 2018-09-27 2019-01-08 京东方科技集团股份有限公司 一种阵列基板及其制作方法、显示装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111624200A (zh) * 2020-05-28 2020-09-04 苏州精濑光电有限公司 缺陷检测方法以及装置
WO2023000368A1 (zh) * 2021-07-22 2023-01-26 Tcl华星光电技术有限公司 阵列基板及其制备方法以及显示面板

Also Published As

Publication number Publication date
US20220187664A1 (en) 2022-06-16
WO2021174647A1 (zh) 2021-09-10

Similar Documents

Publication Publication Date Title
CN102722058B (zh) 一种液晶阵列基板及其制造方法、修复方法
JPS59101693A (ja) アクティブマトリクス液晶表示装置の画像欠陥救済方法
CN110609425B (zh) 阵列基板、面板、修补方法及显示面板
CN111198463A (zh) 一种显示面板及其缺陷修补方法
CN102650784B (zh) 一种阵列基板、液晶显示器件及其修复方法
CN101866084B (zh) 像素单元、液晶显示装置及缺陷修复方法
CN108646476A (zh) 一种液晶面板的断线修复方法
CN113219746A (zh) 一种阵列基板、显示面板和暗点化处理方法
CN108957804B (zh) 一种阵列基板及其维修方法、显示面板和显示装置
JP2001330850A (ja) 液晶表示装置およびその欠陥修正方法
CN210323699U (zh) 阵列基板、面板及显示面板
TWI387810B (zh) 液晶顯示器修補結構與方法
CN106802526A (zh) 阵列基板及其开路修理方法、显示装置
JP3832040B2 (ja) マトリックス型表示装置
CN110109303B (zh) 一种阵列基板及其缺陷修补方法
KR100488942B1 (ko) 차광 및 리페어 겸용 더미 패턴이 구비된 박막 트랜지스터액정표시장치
JP2962932B2 (ja) 液晶表示装置の修正方法
CN111308817A (zh) 阵列基板及其修复方法、液晶显示面板
US6600523B2 (en) Structure of storage capacitor on common of TFT-LCD panel and fabrication method thereof
JP2994905B2 (ja) アクティブマトリクス表示装置の修正方法
CN210605299U (zh) 一种显示面板和显示装置
JP3244447B2 (ja) 液晶表示装置
CN210323698U (zh) 一种显示面板和显示装置
CN112599543B (zh) 一种阵列基板、显示面板和阵列基板的修复方法
JP3347666B2 (ja) 液晶表示パネルの製造方法

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication

Application publication date: 20200526

RJ01 Rejection of invention patent application after publication