CN111010795B - 等离子体腔室的传输线rf施加器 - Google Patents

等离子体腔室的传输线rf施加器 Download PDF

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Publication number
CN111010795B
CN111010795B CN201911183526.7A CN201911183526A CN111010795B CN 111010795 B CN111010795 B CN 111010795B CN 201911183526 A CN201911183526 A CN 201911183526A CN 111010795 B CN111010795 B CN 111010795B
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China
Prior art keywords
conductor
applicator
holes
outer conductor
power
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CN201911183526.7A
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Chinese (zh)
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CN111010795A (zh
Inventor
J·库德拉
T·塔纳卡
C·A·索伦森
S·安瓦尔
J·M·怀特
R·I·欣德
S-M·赵
D·D·特鲁翁
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Applied Materials Inc
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Applied Materials Inc
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/3211—Antennas, e.g. particular shapes of coils
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/3222—Antennas
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/461—Microwave discharges
    • H05H1/463—Microwave discharges using antennas or applicators

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
CN201911183526.7A 2011-06-21 2012-06-21 等离子体腔室的传输线rf施加器 Active CN111010795B (zh)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US201161499205P 2011-06-21 2011-06-21
US61/499,205 2011-06-21
US13/282,469 US20120326592A1 (en) 2011-06-21 2011-10-27 Transmission Line RF Applicator for Plasma Chamber
US13/282,469 2011-10-27
CN201280033414.3A CN104094676B (zh) 2011-06-21 2012-06-21 等离子体腔室的传输线rf施加器
PCT/US2012/000298 WO2012177293A2 (en) 2011-06-21 2012-06-21 Transmission line rf applicator for plasma chamber

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CN201280033414.3A Division CN104094676B (zh) 2011-06-21 2012-06-21 等离子体腔室的传输线rf施加器

Publications (2)

Publication Number Publication Date
CN111010795A CN111010795A (zh) 2020-04-14
CN111010795B true CN111010795B (zh) 2022-05-24

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Family Applications (4)

Application Number Title Priority Date Filing Date
CN201911183526.7A Active CN111010795B (zh) 2011-06-21 2012-06-21 等离子体腔室的传输线rf施加器
CN201280033414.3A Active CN104094676B (zh) 2011-06-21 2012-06-21 等离子体腔室的传输线rf施加器
CN201711072744.4A Active CN107846769B (zh) 2011-06-21 2012-06-21 等离子体腔室的传输线rf施加器
CN201711070889.0A Active CN108010828B (zh) 2011-06-21 2012-06-21 等离子体腔室的传输线rf施加器

Family Applications After (3)

Application Number Title Priority Date Filing Date
CN201280033414.3A Active CN104094676B (zh) 2011-06-21 2012-06-21 等离子体腔室的传输线rf施加器
CN201711072744.4A Active CN107846769B (zh) 2011-06-21 2012-06-21 等离子体腔室的传输线rf施加器
CN201711070889.0A Active CN108010828B (zh) 2011-06-21 2012-06-21 等离子体腔室的传输线rf施加器

Country Status (5)

Country Link
US (1) US20120326592A1 (enExample)
JP (1) JP6076337B2 (enExample)
KR (1) KR101696198B1 (enExample)
CN (4) CN111010795B (enExample)
WO (1) WO2012177293A2 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9048518B2 (en) * 2011-06-21 2015-06-02 Applied Materials, Inc. Transmission line RF applicator for plasma chamber
US20150243483A1 (en) * 2014-02-21 2015-08-27 Lam Research Corporation Tunable rf feed structure for plasma processing
JP6240042B2 (ja) * 2014-08-05 2017-11-29 東芝メモリ株式会社 半導体製造装置および半導体装置の製造方法
US9456532B2 (en) * 2014-12-18 2016-09-27 General Electric Company Radio-frequency power generator configured to reduce electromagnetic emissions
JP6483546B2 (ja) * 2015-06-24 2019-03-13 トヨタ自動車株式会社 プラズマ化学気相成長装置
JP6561725B2 (ja) * 2015-09-25 2019-08-21 日新電機株式会社 アンテナ及びプラズマ処理装置
US10943768B2 (en) * 2018-04-20 2021-03-09 Applied Materials, Inc. Modular high-frequency source with integrated gas distribution
JP2022512764A (ja) * 2018-10-18 2022-02-07 アプライド マテリアルズ インコーポレイテッド 放射デバイス、基板上に材料を堆積させるための堆積装置、及び基板上に材料を堆積させるための方法
WO2020117594A1 (en) 2018-12-04 2020-06-11 Applied Materials, Inc. Substrate supports including metal-ceramic interfaces

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6060836A (en) * 1997-02-14 2000-05-09 Nissin Electric Co., Ltd. Plasma generating apparatus and ion source using the same
JP2005223079A (ja) * 2004-02-04 2005-08-18 Shimadzu Corp 表面波励起プラズマｃｖｄ装置
JP2010080350A (ja) * 2008-09-26 2010-04-08 Tokai Rubber Ind Ltd マイクロ波プラズマ処理装置およびマイクロ波プラズマ処理方法
CN101803471A (zh) * 2007-09-20 2010-08-11 乔治洛德方法研究和开发液化空气有限公司 微波等离子体发生设备和等离子体炬
JP2010219004A (ja) * 2009-03-19 2010-09-30 Adtec Plasma Technology Co Ltd プラズマ発生装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63114974A (ja) * 1986-10-31 1988-05-19 Matsushita Electric Ind Co Ltd プラズマ装置
US5707452A (en) * 1996-07-08 1998-01-13 Applied Microwave Plasma Concepts, Inc. Coaxial microwave applicator for an electron cyclotron resonance plasma source
JP4025330B2 (ja) * 1996-07-08 2007-12-19 株式会社東芝 プラズマ処理装置
US7180392B2 (en) * 2004-06-01 2007-02-20 Verigy Pte Ltd Coaxial DC block
JP2006144099A (ja) * 2004-11-24 2006-06-08 Toppan Printing Co Ltd ３次元中空容器の薄膜成膜装置
KR100689037B1 (ko) * 2005-08-24 2007-03-08 삼성전자주식회사 마이크로파 공명 플라즈마 발생장치 및 그것을 구비하는플라즈마 처리 시스템
DE102006048815B4 (de) * 2006-10-16 2016-03-17 Iplas Innovative Plasma Systems Gmbh Vorrichtung und Verfahren zur Erzeugung von Mikrowellenplasmen hoher Leistung
US8147614B2 (en) * 2009-06-09 2012-04-03 Applied Materials, Inc. Multi-gas flow diffuser

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6060836A (en) * 1997-02-14 2000-05-09 Nissin Electric Co., Ltd. Plasma generating apparatus and ion source using the same
JP2005223079A (ja) * 2004-02-04 2005-08-18 Shimadzu Corp 表面波励起プラズマｃｖｄ装置
CN101803471A (zh) * 2007-09-20 2010-08-11 乔治洛德方法研究和开发液化空气有限公司 微波等离子体发生设备和等离子体炬
JP2010080350A (ja) * 2008-09-26 2010-04-08 Tokai Rubber Ind Ltd マイクロ波プラズマ処理装置およびマイクロ波プラズマ処理方法
JP2010219004A (ja) * 2009-03-19 2010-09-30 Adtec Plasma Technology Co Ltd プラズマ発生装置

Also Published As

Publication number Publication date
CN111010795A (zh) 2020-04-14
KR101696198B1 (ko) 2017-01-23
CN107846769A (zh) 2018-03-27
CN107846769B (zh) 2019-12-20
JP2014526113A (ja) 2014-10-02
KR20140050633A (ko) 2014-04-29
JP6076337B2 (ja) 2017-02-08
CN104094676A (zh) 2014-10-08
CN104094676B (zh) 2017-12-05
US20120326592A1 (en) 2012-12-27
WO2012177293A3 (en) 2013-03-14
CN108010828B (zh) 2020-09-22
WO2012177293A2 (en) 2012-12-27
CN108010828A (zh) 2018-05-08

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