CN110886001B - 一种有效提高钛合金耐应力腐蚀性能的方法 - Google Patents
一种有效提高钛合金耐应力腐蚀性能的方法 Download PDFInfo
- Publication number
- CN110886001B CN110886001B CN201911239110.2A CN201911239110A CN110886001B CN 110886001 B CN110886001 B CN 110886001B CN 201911239110 A CN201911239110 A CN 201911239110A CN 110886001 B CN110886001 B CN 110886001B
- Authority
- CN
- China
- Prior art keywords
- sample
- magnetron sputtering
- anodic oxidation
- corrosion resistance
- alloy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 229910001069 Ti alloy Inorganic materials 0.000 title claims abstract description 78
- 230000007797 corrosion Effects 0.000 title claims abstract description 41
- 238000005260 corrosion Methods 0.000 title claims abstract description 41
- 238000000034 method Methods 0.000 title claims abstract description 30
- 239000010936 titanium Substances 0.000 claims abstract description 79
- 238000001755 magnetron sputter deposition Methods 0.000 claims abstract description 66
- 230000003647 oxidation Effects 0.000 claims abstract description 53
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 53
- 239000002131 composite material Substances 0.000 claims abstract description 40
- 150000002500 ions Chemical class 0.000 claims abstract description 38
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 19
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract description 13
- 229910052763 palladium Inorganic materials 0.000 claims abstract description 13
- 238000007789 sealing Methods 0.000 claims abstract description 6
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 28
- 238000004544 sputter deposition Methods 0.000 claims description 22
- 239000000758 substrate Substances 0.000 claims description 18
- 239000007789 gas Substances 0.000 claims description 16
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 15
- 229910052786 argon Inorganic materials 0.000 claims description 14
- 239000007788 liquid Substances 0.000 claims description 14
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 12
- 238000004140 cleaning Methods 0.000 claims description 11
- 238000000151 deposition Methods 0.000 claims description 11
- 238000005238 degreasing Methods 0.000 claims description 10
- 229910052751 metal Inorganic materials 0.000 claims description 10
- 239000002184 metal Substances 0.000 claims description 10
- 239000011259 mixed solution Substances 0.000 claims description 9
- 238000001035 drying Methods 0.000 claims description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 8
- 230000008021 deposition Effects 0.000 claims description 6
- 239000008367 deionised water Substances 0.000 claims description 5
- 229910021641 deionized water Inorganic materials 0.000 claims description 5
- 238000000227 grinding Methods 0.000 claims description 5
- 238000005498 polishing Methods 0.000 claims description 5
- CDBYLPFSWZWCQE-UHFFFAOYSA-L sodium carbonate Substances [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 claims description 5
- 229910000029 sodium carbonate Inorganic materials 0.000 claims description 5
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 claims description 5
- 229910000406 trisodium phosphate Inorganic materials 0.000 claims description 5
- 238000000861 blow drying Methods 0.000 claims description 2
- 238000004806 packaging method and process Methods 0.000 claims description 2
- 238000005070 sampling Methods 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 abstract description 5
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 abstract description 2
- 239000004411 aluminium Substances 0.000 abstract description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract description 2
- 230000035882 stress Effects 0.000 description 43
- 239000010408 film Substances 0.000 description 34
- 239000010410 layer Substances 0.000 description 20
- 239000000243 solution Substances 0.000 description 8
- 238000005336 cracking Methods 0.000 description 6
- 239000010407 anodic oxide Substances 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 229910052718 tin Inorganic materials 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 3
- 238000009835 boiling Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000011049 filling Methods 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 238000007373 indentation Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 3
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 239000011247 coating layer Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 230000010287 polarization Effects 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000012876 topography Methods 0.000 description 2
- -1 TA4 (Ti)3Al) Chemical compound 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000003487 electrochemical reaction Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000006355 external stress Effects 0.000 description 1
- 238000005242 forging Methods 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 238000011534 incubation Methods 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 238000005482 strain hardening Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 150000003608 titanium Chemical class 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- 230000003313 weakening effect Effects 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/26—Anodisation of refractory metals or alloys based thereon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
- C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Electrochemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (5)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201911239110.2A CN110886001B (zh) | 2019-12-06 | 2019-12-06 | 一种有效提高钛合金耐应力腐蚀性能的方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201911239110.2A CN110886001B (zh) | 2019-12-06 | 2019-12-06 | 一种有效提高钛合金耐应力腐蚀性能的方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN110886001A CN110886001A (zh) | 2020-03-17 |
CN110886001B true CN110886001B (zh) | 2020-10-27 |
Family
ID=69750735
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201911239110.2A Active CN110886001B (zh) | 2019-12-06 | 2019-12-06 | 一种有效提高钛合金耐应力腐蚀性能的方法 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN110886001B (zh) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113416955A (zh) * | 2021-06-25 | 2021-09-21 | 浙江天力机车部件有限公司 | 一种钛合金紧固件阳极氧化与磁控溅射表面复合处理方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0211798A (ja) * | 1988-06-28 | 1990-01-16 | Nippon Kentetsu Co Ltd | チタンまたはチタン合金の着色方法 |
US8252126B2 (en) * | 2004-05-06 | 2012-08-28 | Global Advanced Metals, Usa, Inc. | Sputter targets and methods of forming same by rotary axial forging |
CN101238244B (zh) * | 2005-01-24 | 2011-03-30 | 株式会社昭和 | 采用阳极电解氧化处理的结晶性氧化钛被膜的制造方法 |
CN101255544B (zh) * | 2008-03-21 | 2012-06-27 | 中国科学院上海硅酸盐研究所 | 纳米金属或金属氧化物/碳纳米管复合材料的制备方法 |
JP2010236083A (ja) * | 2009-03-11 | 2010-10-21 | Kobe Steel Ltd | 電極用チタン材および電極用チタン材の表面処理方法 |
KR101274229B1 (ko) * | 2011-03-15 | 2013-06-17 | 순천대학교 산학협력단 | HA 블라스팅, TiO₂ 양극산화 및 RF마그네트론 스퍼터링에 의한 티타늄 표면 코팅 방법 |
CN103540989A (zh) * | 2013-09-12 | 2014-01-29 | 云南钛业股份有限公司 | 一种钛及钛合金交流电两极同时氧化着色方法 |
CN104404565B (zh) * | 2014-11-13 | 2016-08-24 | 苏州大学 | Au/TiO2纳米管复合结构的光电极及其制备方法 |
CN108977806B (zh) * | 2018-08-03 | 2020-04-28 | 南昌航空大学 | Gamma-TiAl金属间化合物表面金属/陶瓷复合涂层的制备方法 |
CN110218971B (zh) * | 2019-07-02 | 2021-05-18 | 重庆文理学院 | 一种适用于钛合金表面的纳米多层薄膜及其制备方法 |
CN110359075B (zh) * | 2019-08-27 | 2020-06-26 | 北京化工大学 | 一种钛合金涂层材料及其制备方法和应用 |
-
2019
- 2019-12-06 CN CN201911239110.2A patent/CN110886001B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
CN110886001A (zh) | 2020-03-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2021143256A1 (zh) | 二硫化钼/二硫化钨多层掺钽薄膜及其制备方法与应用 | |
CN110218971B (zh) | 一种适用于钛合金表面的纳米多层薄膜及其制备方法 | |
CN110886001B (zh) | 一种有效提高钛合金耐应力腐蚀性能的方法 | |
WO2023284596A1 (zh) | 高导电耐蚀长寿命max相固溶复合涂层、其制法与应用 | |
CN105671499A (zh) | 一种耐磨耐蚀CrAlSiN复合涂层及其制备方法 | |
CN117364041A (zh) | 一种耐磨蚀的梯度碳氮高熵陶瓷涂层及制备方法 | |
CN110551992A (zh) | 一种在超级马氏体不锈钢表面制备dlc薄膜的方法 | |
CN112746253A (zh) | 一种钢基表面复合改性层及其制备方法 | |
CN107858684A (zh) | 金属‑类金刚石复合涂层及其制备方法与用途以及涂层工具 | |
CN111321384A (zh) | 一种在镍基合金上制备二氧化锆薄膜的方法 | |
CN109136829B (zh) | 一种钢基表面合金化-离子渗氮耐磨耐蚀复合改性层及其制备方法 | |
CN112359319B (zh) | 一种双周期耐磨抗菌和高韧性复合薄膜的制备方法 | |
CN107195909A (zh) | 一种燃料电池双极板及其表面钛金薄膜的制备方法 | |
CN112962065B (zh) | 一种镍基合金表面复合结构涂层及其制备方法 | |
CN113235051A (zh) | 一种纳米双相高熵合金薄膜及其制备方法 | |
CN113512710A (zh) | 一种45钢表面CrN-Cr梯度涂层及其制备方法与应用 | |
Decho et al. | Optimization of chromium nitride (CrNx) interlayers for hydrogenated amorphous carbon (aC: H) film systems with respect to the corrosion protection properties by high power impulse magnetron sputtering (HiPIMS) | |
CN112210756A (zh) | 一种铁基合金表面强耐蚀性高铬复合渗氮层的制备方法 | |
CN102400091B (zh) | 铝合金的表面处理方法及由铝合金制得的壳体 | |
CN104087902A (zh) | 金属材料表面的绝缘涂层及其制备方法 | |
CN114220982A (zh) | 一种膜层、双极板及制备方法 | |
CN112226768B (zh) | 一种微弧氧化CrAlN涂层的复合制备方法 | |
CN110783595B (zh) | 一种金属双极板及其制备方法以及燃料电池 | |
CN112281115B (zh) | 一种低温下获得的晶态立方三氧化二铝铬稳定结构涂层及其制备方法 | |
CN107435133A (zh) | 一种调节薄膜应力的方法和由此制备得到的薄膜 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20240409 Address after: Room 1018-15, Building 23, Times Square, Suzhou Industrial Park, Suzhou Area, China (Jiangsu) Pilot Free Trade Zone, Suzhou City, Jiangsu Province, 215000 Patentee after: Suzhou 30 billion Technology Co.,Ltd. Country or region after: China Address before: 402160 Shuangzhu Town, Yongchuan District, Chongqing Patentee before: CHONGQING University OF ARTS AND SCIENCES Country or region before: China |
|
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20240415 Address after: 721000 fanjiaya Industrial Park, Bayu Town, high tech Development Zone, Baoji City, Shaanxi Province Patentee after: Baoji Tongrun metal materials Co.,Ltd. Country or region after: China Address before: Room 1018-15, Building 23, Times Square, Suzhou Industrial Park, Suzhou Area, China (Jiangsu) Pilot Free Trade Zone, Suzhou City, Jiangsu Province, 215000 Patentee before: Suzhou 30 billion Technology Co.,Ltd. Country or region before: China |