CN110824828B - 光掩模和显示装置的制造方法 - Google Patents
光掩模和显示装置的制造方法 Download PDFInfo
- Publication number
- CN110824828B CN110824828B CN201911133180.XA CN201911133180A CN110824828B CN 110824828 B CN110824828 B CN 110824828B CN 201911133180 A CN201911133180 A CN 201911133180A CN 110824828 B CN110824828 B CN 110824828B
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- pattern
- photomask
- film
- light
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Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 56
- 238000000034 method Methods 0.000 title abstract description 21
- 238000002834 transmittance Methods 0.000 claims abstract description 78
- 238000012546 transfer Methods 0.000 claims abstract description 76
- 239000000758 substrate Substances 0.000 claims abstract description 66
- 230000005540 biological transmission Effects 0.000 claims description 56
- 239000000463 material Substances 0.000 claims description 32
- 230000010363 phase shift Effects 0.000 claims description 25
- 230000003287 optical effect Effects 0.000 claims description 15
- 238000001039 wet etching Methods 0.000 claims description 14
- 238000005286 illumination Methods 0.000 claims description 5
- 238000010030 laminating Methods 0.000 claims description 5
- 150000004767 nitrides Chemical class 0.000 claims description 4
- 229910052726 zirconium Inorganic materials 0.000 claims description 3
- 239000010408 film Substances 0.000 description 194
- 230000000052 comparative effect Effects 0.000 description 25
- 238000005530 etching Methods 0.000 description 23
- 230000000694 effects Effects 0.000 description 16
- 238000013461 design Methods 0.000 description 12
- 229920002120 photoresistant polymer Polymers 0.000 description 9
- 239000010410 layer Substances 0.000 description 8
- 239000004973 liquid crystal related substance Substances 0.000 description 8
- 238000000059 patterning Methods 0.000 description 6
- 238000001312 dry etching Methods 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 4
- 239000011651 chromium Substances 0.000 description 4
- 238000011161 development Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 238000013041 optical simulation Methods 0.000 description 4
- 239000011148 porous material Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 238000004088 simulation Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- AFCARXCZXQIEQB-UHFFFAOYSA-N N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CCNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 AFCARXCZXQIEQB-UHFFFAOYSA-N 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000012788 optical film Substances 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 229910021332 silicide Inorganic materials 0.000 description 2
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- YLZOPXRUQYQQID-UHFFFAOYSA-N 3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-1-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]propan-1-one Chemical compound N1N=NC=2CN(CCC=21)CCC(=O)N1CCN(CC1)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F YLZOPXRUQYQQID-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
- G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
- G03F1/34—Phase-edge PSM, e.g. chromeless PSM; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/121—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements
- H10K59/1213—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements the pixel elements being TFTs
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Nonlinear Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Geometry (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911133180.XA CN110824828B (zh) | 2014-09-29 | 2015-09-25 | 光掩模和显示装置的制造方法 |
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014199013A JP6335735B2 (ja) | 2014-09-29 | 2014-09-29 | フォトマスク及び表示装置の製造方法 |
| JP2014-199013 | 2014-09-29 | ||
| CN201510624801.XA CN105467745B (zh) | 2014-09-29 | 2015-09-25 | 光掩模和显示装置的制造方法 |
| CN201911133180.XA CN110824828B (zh) | 2014-09-29 | 2015-09-25 | 光掩模和显示装置的制造方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510624801.XA Division CN105467745B (zh) | 2014-09-29 | 2015-09-25 | 光掩模和显示装置的制造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN110824828A CN110824828A (zh) | 2020-02-21 |
| CN110824828B true CN110824828B (zh) | 2023-12-29 |
Family
ID=55605593
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201911133180.XA Active CN110824828B (zh) | 2014-09-29 | 2015-09-25 | 光掩模和显示装置的制造方法 |
| CN201510624801.XA Active CN105467745B (zh) | 2014-09-29 | 2015-09-25 | 光掩模和显示装置的制造方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510624801.XA Active CN105467745B (zh) | 2014-09-29 | 2015-09-25 | 光掩模和显示装置的制造方法 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP6335735B2 (cg-RX-API-DMAC7.html) |
| KR (3) | KR20160037806A (cg-RX-API-DMAC7.html) |
| CN (2) | CN110824828B (cg-RX-API-DMAC7.html) |
| TW (4) | TWI635353B (cg-RX-API-DMAC7.html) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6259509B1 (ja) * | 2016-12-28 | 2018-01-10 | 株式会社エスケーエレクトロニクス | ハーフトーンマスク、フォトマスクブランクス及びハーフトーンマスクの製造方法 |
| JP6808665B2 (ja) * | 2017-03-10 | 2021-01-06 | Hoya株式会社 | 表示装置製造用フォトマスク、及び表示装置の製造方法 |
| JP7080070B2 (ja) * | 2017-03-24 | 2022-06-03 | Hoya株式会社 | フォトマスク、及び表示装置の製造方法 |
| JP6368000B1 (ja) * | 2017-04-04 | 2018-08-01 | 株式会社エスケーエレクトロニクス | フォトマスク及びフォトマスクブランクス並びにフォトマスクの製造方法 |
| TWI659262B (zh) * | 2017-08-07 | 2019-05-11 | 日商Ｈｏｙａ股份有限公司 | 光罩之修正方法、光罩之製造方法、光罩及顯示裝置之製造方法 |
| TWI691608B (zh) * | 2017-09-12 | 2020-04-21 | 日商Ｈｏｙａ股份有限公司 | 光罩之修正方法、光罩之製造方法、光罩及顯示裝置之製造方法 |
| JP6731441B2 (ja) * | 2018-05-01 | 2020-07-29 | Hoya株式会社 | フォトマスク及び表示装置の製造方法 |
| KR102254646B1 (ko) | 2018-07-30 | 2021-05-21 | 호야 가부시키가이샤 | 포토마스크 수정 방법, 포토마스크의 제조 방법, 포토마스크, 및 표시 장치용 디바이스의 제조 방법 |
| KR102367141B1 (ko) * | 2019-02-27 | 2022-02-23 | 호야 가부시키가이샤 | 포토마스크, 포토마스크의 제조 방법, 및 표시 장치의 제조 방법 |
| JP7437959B2 (ja) * | 2019-03-07 | 2024-02-26 | Hoya株式会社 | 修正フォトマスク、及び表示装置の製造方法 |
| CN116360205A (zh) * | 2019-08-29 | 2023-06-30 | 上海华力集成电路制造有限公司 | 优化通孔层工艺窗口的辅助图形 |
| JP7383490B2 (ja) * | 2020-01-07 | 2023-11-20 | 株式会社エスケーエレクトロニクス | フォトマスク |
| TWI893977B (zh) * | 2024-09-06 | 2025-08-11 | 力晶積成電子製造股份有限公司 | 檢測微影製程中缺陷圖案印出風險的方法及其具有電腦可執行指令的電腦程式產品 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0695360A (ja) * | 1992-09-10 | 1994-04-08 | Fujitsu Ltd | 光学マスク |
| JP2013140236A (ja) * | 2011-12-29 | 2013-07-18 | Hoya Corp | マスクブランク及び位相シフトマスクの製造方法 |
| CN103383523A (zh) * | 2012-05-02 | 2013-11-06 | Hoya株式会社 | 光掩模、图案转印方法以及平板显示器的制造方法 |
| JP2013250478A (ja) * | 2012-06-01 | 2013-12-12 | Hoya Corp | フォトマスク、フォトマスクの製造方法及びパターンの転写方法 |
| CN103777462A (zh) * | 2012-10-25 | 2014-05-07 | Hoya株式会社 | 显示装置制造用光掩模和图案转印方法 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0315845A (ja) | 1989-06-14 | 1991-01-24 | Hitachi Ltd | マスク及びマスク作製方法 |
| JP2000019710A (ja) * | 1998-07-07 | 2000-01-21 | Hitachi Ltd | 半導体集積回路装置の製造方法 |
| JP2000181048A (ja) * | 1998-12-16 | 2000-06-30 | Sharp Corp | フォトマスクおよびその製造方法、並びにそれを用いた露光方法 |
| JP3746497B2 (ja) * | 2003-06-24 | 2006-02-15 | 松下電器産業株式会社 | フォトマスク |
| JP4645076B2 (ja) * | 2004-06-28 | 2011-03-09 | 凸版印刷株式会社 | 位相シフトマスクおよびその製造方法およびパターン転写方法 |
| EP1746460B1 (en) * | 2005-07-21 | 2011-04-06 | Shin-Etsu Chemical Co., Ltd. | Photomask blank, photomask and fabrication method thereof |
| JP3971775B2 (ja) * | 2005-10-17 | 2007-09-05 | 松下電器産業株式会社 | フォトマスク |
| JP3971774B2 (ja) * | 2005-10-17 | 2007-09-05 | 松下電器産業株式会社 | パターン形成方法 |
| JP2007219038A (ja) * | 2006-02-15 | 2007-08-30 | Hoya Corp | マスクブランク及びフォトマスク |
| JP4484909B2 (ja) * | 2007-07-24 | 2010-06-16 | キヤノン株式会社 | 原版データ作成方法、原版作成方法、露光方法および原版データ作成プログラム |
| JPWO2010119811A1 (ja) * | 2009-04-16 | 2012-10-22 | Hoya株式会社 | マスクブランク及び転写用マスク並びに膜緻密性評価方法 |
| JP5611581B2 (ja) * | 2009-12-21 | 2014-10-22 | Hoya株式会社 | マスクブランク及びその製造方法、並びに、転写マスク及びその製造方法 |
| TWI547751B (zh) * | 2011-12-21 | 2016-09-01 | Dainippon Printing Co Ltd | 大型相位移遮罩及大型相位移遮罩之製造方法 |
| CN104040428B (zh) * | 2012-02-15 | 2018-11-13 | 大日本印刷株式会社 | 相移掩模及使用该相移掩模的抗蚀图案形成方法 |
-
2014
- 2014-09-29 JP JP2014199013A patent/JP6335735B2/ja active Active
-
2015
- 2015-08-25 TW TW106130522A patent/TWI635353B/zh active
- 2015-08-25 TW TW104127730A patent/TWI604264B/zh active
- 2015-08-25 TW TW108109637A patent/TWI694302B/zh active
- 2015-08-25 TW TW106130523A patent/TWI658320B/zh active
- 2015-09-25 CN CN201911133180.XA patent/CN110824828B/zh active Active
- 2015-09-25 CN CN201510624801.XA patent/CN105467745B/zh active Active
- 2015-09-25 KR KR1020150136927A patent/KR20160037806A/ko not_active Ceased
-
2017
- 2017-10-11 KR KR1020170129436A patent/KR102182505B1/ko active Active
-
2020
- 2020-11-18 KR KR1020200154522A patent/KR102304206B1/ko active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0695360A (ja) * | 1992-09-10 | 1994-04-08 | Fujitsu Ltd | 光学マスク |
| JP2013140236A (ja) * | 2011-12-29 | 2013-07-18 | Hoya Corp | マスクブランク及び位相シフトマスクの製造方法 |
| CN103383523A (zh) * | 2012-05-02 | 2013-11-06 | Hoya株式会社 | 光掩模、图案转印方法以及平板显示器的制造方法 |
| JP2013250478A (ja) * | 2012-06-01 | 2013-12-12 | Hoya Corp | フォトマスク、フォトマスクの製造方法及びパターンの転写方法 |
| CN103777462A (zh) * | 2012-10-25 | 2014-05-07 | Hoya株式会社 | 显示装置制造用光掩模和图案转印方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI694302B (zh) | 2020-05-21 |
| TWI635353B (zh) | 2018-09-11 |
| CN105467745A (zh) | 2016-04-06 |
| TWI658320B (zh) | 2019-05-01 |
| TWI604264B (zh) | 2017-11-01 |
| TW201740184A (zh) | 2017-11-16 |
| TW201743129A (zh) | 2017-12-16 |
| CN105467745B (zh) | 2019-12-20 |
| KR20200132813A (ko) | 2020-11-25 |
| KR20170117988A (ko) | 2017-10-24 |
| JP2016071059A (ja) | 2016-05-09 |
| KR102182505B1 (ko) | 2020-11-24 |
| JP6335735B2 (ja) | 2018-05-30 |
| KR20160037806A (ko) | 2016-04-06 |
| TW201928507A (zh) | 2019-07-16 |
| CN110824828A (zh) | 2020-02-21 |
| KR102304206B1 (ko) | 2021-09-17 |
| TW201627751A (zh) | 2016-08-01 |
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