CN110794654A

CN110794654A - Novel exposure machine structure exposure method capable of producing super-long products

Info

Publication number: CN110794654A
Application number: CN201911136716.3A
Authority: CN
Inventors: 戚胜利; 王健; 孙彬; 沈洪; 李晓华
Original assignee: Jiangsu Shangda Electronics Co Ltd
Current assignee: Jiangsu Shangda Electronics Co Ltd
Priority date: 2019-11-19
Filing date: 2019-11-19
Publication date: 2020-02-14

Abstract

The invention provides a novel exposure machine structure exposure method capable of producing super-long products, and relates to the technical field of PCS (process control system) exposure. The novel exposure machine structure exposure method capable of producing the ultra-long product comprises the following steps: s1, arranging the glass bottom plate 1, the glass bottom plate 2, the glass bottom plate 3, the glass bottom plate 4 and the like in a rotatable crawler-type metal frame in an exposure machine in sequence according to a design sequence, wherein the glass bottom plate 1 is positioned right below a UV light source during exposure; s2, the tape substrate passes through the lower part of the glass negative film, and the exposure operation of the glass negative film 1 is firstly carried out; s3, after the exposure of the glass film 1 is finished, the tape type base material is conveyed according to the set size, and meanwhile, the driving wheel rotates to drive the crawler type frame to rotate until the glass film 2 is positioned below the UV light source. According to the invention, the alignment mark is designed on the glass film to improve the alignment precision of the connecting position, so that the exposure alignment yield is improved, and the fine development of a product circuit is facilitated.

Description

Novel exposure machine structure exposure method capable of producing super-long products

Technical Field

The invention relates to the technical field of PCS (personal communications systems) exposure, in particular to a novel exposure machine structure exposure method capable of producing super-long products.

Background

With the application of circuit board products in the fields of medical treatment, wearable equipment and the like, an ultra-long single PCS product becomes a market segment under the circuit board products, with the rapid development of the fields of medical treatment, wearable equipment and the like, the ultra-long single PCS circuit board product faces huge requirements, the most widely applied technology in COF products at present is the exposure of a single small PCS product, the single PCS product is designed on a glass substrate after the circuit is typeset, a layer of photoresist is coated before the product is exposed, the photoresist of a non-circuit light-transmitting part on the glass substrate generates decomposition reaction after receiving exposure energy during exposure, and circuit patterns on the glass substrate are transferred to the photoresist to complete exposure operation.

According to the traditional exposure principle, due to the limitations of an exposure machine platform, the uniformity of exposure energy, the size of a glass film and the like, the exposure operation of an ultra-long single PCS cannot be realized by increasing the size of the glass film at present, the continuous exposure of a circuit can be realized only by manually replacing the glass film to perform re-alignment, and the fine development of the circuit of an ultra-long product is influenced due to the large alignment tolerance; in addition, the manual replacement of the glass bottom plate takes long time and has low production efficiency; the glass bottom sheet is easy to be mistaken in the manual replacement process, so that the reject ratio is increased; dust is easily brought in the process of manually replacing the glass negative film for many times, so that poor exposure fixed point is caused.

Disclosure of Invention

Technical problem to be solved

Aiming at the defects of the prior art, the invention provides a novel exposure machine structure exposure method capable of producing super-long products, and the defects in the prior art are overcome.

(II) technical scheme

In order to achieve the purpose, the invention is realized by the following technical scheme: the novel exposure machine structure exposure method capable of producing super-long products comprises the following steps:

s1, arranging the glass bottom plate 1, the glass bottom plate 2, the glass bottom plate 3, the glass bottom plate 4 and the like in a rotatable crawler-type metal frame in an exposure machine in sequence according to a design sequence, wherein the glass bottom plate 1 is positioned right below a UV light source during exposure;

s2, the tape substrate passes through the lower part of the glass negative film, and the exposure operation of the glass negative film 1 is firstly carried out;

s3, after the exposure of the glass film 1 is finished, the tape type base material is conveyed according to the set size, and meanwhile, the driving wheel rotates to drive the crawler type frame to rotate until the glass film 2 is positioned below the UV light source;

and S4, performing the exposure operation of the glass film 2, and circularly completing the exposure of the glass film 3 and the glass film 4 so as to complete the continuous exposure operation of the whole overlong single PCS product.

(III) advantageous effects

The invention provides a novel exposure machine structure exposure method capable of producing super-long products. The method has the following beneficial effects:

1. the alignment mark is designed on the glass film to improve the alignment precision of the connecting position, improve the exposure alignment yield and simultaneously facilitate the fine development of a product circuit.

2. The number of the glass negative sheets and the length of the single glass negative sheet after the product is segmented can be freely designed according to the length of the product, and the method has the advantages of wide applicable product type range, flexible use and the like.

3. For the same circuit pattern in a longer area, the circuit can be designed into one glass negative film through calculation, and the exposure machine program is set to only carry the product without replacing the glass negative film, so that the continuous multiple exposure of a single glass negative film is realized, the number of the glass negative films is reduced, the cost is reduced, and the application is flexible.

4. The structure size of the exposure machine in the horizontal direction is small, the size of the exposure machine produced is not obviously increased compared with the size of the traditional exposure machine, and the large-scale popularization and application to the market are facilitated.

5. The continuous exposure production without replacing the glass negative can be realized through the program, the functional compatibility of the exposure machine applied in the current industry can be realized, and the method is also suitable for the exposure production of the traditional circuit board product.

Drawings

FIG. 1 is a schematic diagram of a first embodiment of the present invention;

FIG. 2 is a schematic view of a second embodiment of the present invention;

FIG. 3 is a schematic view of a third embodiment of the present invention;

fig. 4 is a schematic view of a fourth embodiment of the present invention.

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

The first embodiment is as follows:

as shown in fig. 1, the embodiment of the present invention provides a novel exposure machine structure exposure method capable of producing ultra-long products, which includes the following steps:

Example two:

as shown in fig. 2, the embodiment of the present invention provides a novel exposure machine structure exposure method capable of producing ultra-long products, which includes the following steps:

s1, arranging the glass bottom sheet 1, the glass bottom sheet 2, the glass bottom sheet 3 and the glass bottom sheet 4 in a metal frame supported by two wheel type conveyor belts in the exposure machine in sequence according to a design sequence, wherein the metal frame is suspended between the wheel type conveyor belts at the two sides through support frames at the two sides;

s2, when exposure operation is carried out, the glass negative film 1 is positioned under the UV light source, the tape-wound substrate passes through the lower part of the glass negative film 1, and the exposure operation of the glass negative film 1 is firstly carried out;

s3, after the exposure of the glass film 1 is finished, the tape type base material is conveyed according to the set size, and meanwhile, the driving wheel rotates the conveyor belt to drive the metal frame to rotate until the glass film 2 is positioned below the UV light source;

Example three:

as shown in fig. 3, the embodiment of the present invention provides a novel exposure machine structure exposure method capable of producing ultra-long products, which includes the following steps:

s1, arranging the glass bottom plate 1, the glass bottom plate 2 and the glass bottom plate 3 in turn in a multi-layer box type structure body capable of lifting up and down integrally in an exposure machine according to the design sequence;

s2, when exposure operation is carried out, the glass negative film 1 is moved to be positioned under the UV light source by the mechanical arm through the slide rail, the tape type base material passes through the lower part of the glass negative film 1, and the exposure operation of the glass negative film 1 is carried out firstly;

s3, after the exposure of the glass film 1 is finished, carrying the tape-wound substrate according to a set size, simultaneously moving the glass film 1 into the box-type structure body through the slide rail by the mechanical arm, lowering the box-type structure body to a position where the glass film 2 is located to be just aligned with the slide rail plane, and moving the glass film 2 to a position below the UV light source through the slide rail by the mechanical arm;

s4, performing exposure operation of the glass film 2, and circularly completing the exposure of the glass film 3.

And S5, lifting the whole multi-layer box-type structure body to the position where the glass substrate 1 is located and just aligning to the plane of the slide rail, and continuously carrying out continuous exposure operation on the ultra-long single PCS product by circularly carrying out the steps.

Example four:

as shown in fig. 4, the embodiment of the present invention provides a novel exposure machine structure exposure method capable of producing an ultra-long product, including the following steps:

s1, arranging the glass bottom plate 1, the glass bottom plate 2 and the glass bottom plate 3 in turn on a multi-layer structure frame which can be independently rotated and can be integrally lifted up and down in an exposure machine according to the design sequence;

s2, adjusting the glass negative film 1 on the exposure operation plane when performing exposure operation, rotating the glass negative film to be positioned under the UV light source around the rotating shaft, positioning the rest glass negative films on the opposite direction of the glass negative film 1 relative to the rotating shaft, passing the tape-wound substrate from the lower part of the glass negative film 1, and performing the exposure operation of the glass negative film 1;

s3, after the exposure of the glass film 1 is finished, the tape type base material is conveyed according to the set size, meanwhile, the glass film 1 rotates to the position below the glass film 2 around the rotating shaft, the whole multi-layer rotating structure descends to the position where the glass film 2 is aligned with the exposure operation plane, and the glass film 2 rotates to the position right below the UV light source around the rotating shaft;

S5, the multi-layer rotating structure is integrally lifted to the position where the glass substrate 1 is located, and the plane is just aligned with the plane of the slide rail, and the steps are circularly performed, so that the continuous exposure operation of the ultra-long single PCS product can be continuously performed.

Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.

Claims

1. The novel exposure method of the exposure machine structure capable of producing the super-long products is characterized in that: the method comprises the following steps: