CN109270809A - Layout exposure device and its exposure method of the subregion to bit pattern - Google Patents
Layout exposure device and its exposure method of the subregion to bit pattern Download PDFInfo
- Publication number
- CN109270809A CN109270809A CN201811125799.1A CN201811125799A CN109270809A CN 109270809 A CN109270809 A CN 109270809A CN 201811125799 A CN201811125799 A CN 201811125799A CN 109270809 A CN109270809 A CN 109270809A
- Authority
- CN
- China
- Prior art keywords
- exposure
- pcb board
- camera
- bracket
- stage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The present invention relates to field of optical equipment, solve the problems, such as that the pcb board exposure sources exposure efficiency of the prior art is low.It include pedestal, it is set on the base exposure stage, camera for the identification of pcb board Mark point, and the exposure device of pcb board exposure, two groups are respectively equipped in exposure stage for placing the left pcb board positioning strip and right pcb board positioning strip of pcb board, left exposure region is corresponded on camera bracket and right exposure region is respectively equipped with a camera, and camera is slidably arranged on camera bracket；Left exposure region is corresponded on exposure device bracket and right exposure region is respectively equipped with more than one exposure device, and pedestal is equipped with the exposure stage driving mechanism of driving exposure stage vertical camera bracket and the movement of exposure device bracket.Mark can be carried out to two pieces of pcb boards simultaneously to take a little, while two pieces of pcb boards are exposed, increase exposure stage utilization rate, while improving exposure efficiency, improve making sheet production capacity.
Description
Technical field
The present invention relates to field of optical equipment more particularly to a kind of subregion to the layout exposure device of bit pattern and its exposure
Method.
Background technique
With the high speed development for moving smart machine in recent years, the new opportunity that PCB industry also welcomes.It is wherein flexible
PCB product is widely used in the every field such as consumer electronics, automobile, industry control, medical treatment, instrument and meter, it has also become electronics produces
One of most important component in product field.It is soft under the double drive that smart terminal product develops to more frivolous, more accurate direction
The the size of property pcb board also can be the smart smaller, for existing big table top exposure sources, how to have made full use of platform size,
It is extremely urgent to improve production efficiency.
Summary of the invention
It is an object of the invention to solve the problems, such as that the pcb board exposure sources exposure efficiency of the prior art is low.
To solve the technical solution that technical problem proposed by the invention uses are as follows: the spelling of subregion of the invention to bit pattern
Version exposure device includes pedestal, is set on the base exposure stage, the camera and PCB for the identification of pcb board Mark point
The exposure device of plate exposure, it is characterised in that: two groups are respectively equipped in the exposure stage for placing the left PCB of pcb board
Exposure stage is divided into left exposure region and right exposure region by plate positioning strip and right pcb board positioning strip, two groups of positioning strips, and left pcb board is fixed
It is respectively provided on position item and right pcb board positioning strip and pcb board is adsorbed on left pcb board positioning strip and right pcb board positioning strip
The positioning suction nozzle of positioning, the pedestal are equipped with camera bracket and exposure device bracket across exposure stage, and described takes the photograph
It is respectively equipped with a camera as corresponding to left exposure region and right exposure region on head bracket, camera is slidably arranged in camera bracket
On；Left exposure region is corresponded on the exposure device bracket and right exposure region is respectively equipped with more than one exposure device；It is described
Pedestal be equipped with the vertical camera bracket of driving exposure stage and the mobile exposure stage driving mechanism of exposure device bracket.
Subregion of the invention includes the following steps: the exposure method of the layout exposure device of bit pattern
The positioning of A:PCB plate: Layout mode, inter-pattern space are formulated, and layout designs；It is fixed in left pcb board positioning strip and right pcb board
Pcb board is placed respectively on the item of position, and then pcb board is adsorbed by positioning suction nozzle and is positioned；
B: camera identifies pcb board Mark point: two cameras carry out Mark to the pcb board of left exposure region and right exposure region respectively
Point extracts；
The exposure of C:PCB plate: exposure stage driving mechanism drives exposure stage mobile, the exposure device of left exposure region and right exposure region
Exposure device two pcb boards are exposed simultaneously respectively.
Include: to the technical solution of the invention being further qualified
The camera bracket is equipped with the camera linear motor driving of driving camera sliding.
The exposure stage driving mechanism is the driving of exposure stage linear motor.
Through the above technical solutions, the invention has the benefit that subregion of the invention exposes dress to the layout of bit pattern
It sets two groups of positioning strips and exposure stage is divided into left exposure region and right exposure region, one piece of pcb board can be placed on every group of positioning strip, it is right
It answers left exposure region and right exposure region to be respectively equipped with camera and exposure device, mark can be carried out to two pieces of pcb boards simultaneously and taken a little,
Two pieces of pcb boards are exposed simultaneously, increases exposure stage utilization rate, while improving exposure efficiency, improves making sheet production capacity.
Detailed description of the invention
Fig. 1 is a kind of structural schematic diagram of the subregion of the present invention to the layout exposure device of bit pattern.
Specific embodiment
Structure of the invention is described further below in conjunction with attached drawing.
Referring to Fig.1, a kind of subregion includes pedestal 1 to the layout exposure device of bit pattern, and it is flat to be set on the base exposure
Platform 2 is respectively equipped in exposure stage 2 for the camera 3 of pcb board Mark point identification and the exposure device 4 of pcb board exposure
Two groups for placing the left pcb board positioning strip 5 and right pcb board positioning strip 6 of pcb board, exposure stage is divided into a left side by two groups of positioning strips
It is respectively provided on exposure region and right exposure region, left pcb board positioning strip 5 and right pcb board positioning strip 6 and pcb board is adsorbed onto a left side
The positioning suction nozzle 7 positioned on pcb board positioning strip and right pcb board positioning strip, pedestal are equipped with the camera bracket 8 across exposure stage
With exposure device bracket 9, left exposure region is corresponded on camera bracket and right exposure region is respectively equipped with a camera, camera is sliding
It is dynamic to be arranged on camera bracket；Left exposure region is corresponded on exposure device bracket and right exposure region is respectively equipped with more than one exposure
Electro-optical device；Pedestal is equipped with the exposure stage driving machine of driving exposure stage vertical camera bracket and the movement of exposure device bracket
Structure.In the present embodiment, camera bracket is equipped with the camera linear motor driving of driving camera sliding.So as to make to take the photograph
As head smoothly moves on camera bracket.Exposure stage driving mechanism is the driving of exposure stage linear motor.So as to
Move exposure stage smoothly on pedestal.
Subregion of the invention includes the following steps: the exposure method of the layout exposure device of bit pattern
The positioning of A:PCB plate: Layout mode, inter-pattern space are formulated, and layout designs；It is fixed in left pcb board positioning strip and right pcb board
Pcb board is placed respectively on the item of position, and then pcb board is adsorbed by positioning suction nozzle and is positioned；
B: camera identifies pcb board Mark point: two cameras carry out Mark to the pcb board of left exposure region and right exposure region respectively
Point extracts；Exposure stage driving mechanism drives exposure stage mobile, and two cameras carry out Mark point to corresponding pcb board respectively
It extracts.
The exposure of C:PCB plate: exposure stage driving mechanism drives exposure stage mobile, the exposure device of left exposure region and right exposure
The exposure device in light area respectively exposes two pcb boards simultaneously.
Subregion of the invention can carry out mark to two pieces of pcb boards simultaneously to the layout exposure device of bit pattern and take a little, together
When two pieces of pcb boards are exposed, increase exposure stage utilization rate, while improving exposure efficiency, improve making sheet production capacity.
Although being described in detail in conjunction with attached drawing to a specific embodiment of the invention, should not be construed as to this hair
The restriction of bright protection scope.In range described by claims, those skilled in the art are without creative work
The various modifications and deformation that can be made still fall within protection scope of the present invention.
Claims (4)
1. a kind of subregion includes pedestal, be set on the base exposure stage to the layout exposure device of bit pattern, it to be used for PCB
The camera of plate Mark point identification and the exposure device of pcb board exposure, it is characterised in that: in the exposure stage respectively
Equipped with two groups for placing the left pcb board positioning strip and right pcb board positioning strip of pcb board, two groups of positioning strips are divided into exposure stage
It is respectively provided on left exposure region and right exposure region, left pcb board positioning strip and right pcb board positioning strip and pcb board is adsorbed onto a left side
The positioning suction nozzle positioned on pcb board positioning strip and right pcb board positioning strip, the pedestal are equipped with the camera across exposure stage
Bracket and exposure device bracket correspond to left exposure region on the camera bracket and right exposure region are respectively equipped with a camera shooting
Head, camera are slidably arranged on camera bracket；Left exposure region is corresponded on the exposure device bracket and right exposure is distinguished
It She You not more than one exposure device；The pedestal is equipped with the vertical camera bracket of driving exposure stage and exposure device
The mobile exposure stage driving mechanism of bracket.
2. a kind of subregion as described in claim 1 is to the layout exposure device of bit pattern, it is characterised in that: the camera branch
Frame is equipped with the camera linear motor driving of driving camera sliding.
3. a kind of subregion as described in claim 1 is to the layout exposure device of bit pattern, it is characterised in that: the exposure stage
Driving mechanism is the driving of exposure stage linear motor.
4. subregion a method according to any one of claims 1-3 is to the exposure method of the layout exposure device of bit pattern, it is characterised in that:
Include the following steps:
The positioning of A:PCB plate: Layout mode, inter-pattern space are formulated, and layout designs；It is fixed in left pcb board positioning strip and right pcb board
Pcb board is placed respectively on the item of position, and then pcb board is adsorbed by positioning suction nozzle and is positioned；
B: camera identifies pcb board Mark point: two cameras carry out Mark to the pcb board of left exposure region and right exposure region respectively
Point extracts；
The exposure of C:PCB plate: exposure stage driving mechanism drives exposure stage mobile, the exposure device of left exposure region and right exposure region
Exposure device two pcb boards are exposed simultaneously respectively.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811125799.1A CN109270809A (en) | 2018-09-26 | 2018-09-26 | Layout exposure device and its exposure method of the subregion to bit pattern |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811125799.1A CN109270809A (en) | 2018-09-26 | 2018-09-26 | Layout exposure device and its exposure method of the subregion to bit pattern |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109270809A true CN109270809A (en) | 2019-01-25 |
Family
ID=65198246
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811125799.1A Pending CN109270809A (en) | 2018-09-26 | 2018-09-26 | Layout exposure device and its exposure method of the subregion to bit pattern |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109270809A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110426922A (en) * | 2019-07-24 | 2019-11-08 | 苏州微影激光技术有限公司 | Bent exposure device and method |
| WO2023286732A1 (en) * | 2021-07-12 | 2023-01-19 | 株式会社ニコン | Exposure device and measurement system |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59923A (en) * | 1982-06-25 | 1984-01-06 | Toshiba Corp | Projection type light exposing device |
| JPH01117322A (en) * | 1987-10-30 | 1989-05-10 | Hoya Corp | Reduction stepper |
| CN202979476U (en) * | 2012-12-27 | 2013-06-05 | 胜宏科技（惠州）股份有限公司 | Exposure alignment mould |
| CN203896602U (en) * | 2014-07-11 | 2014-10-22 | 奥宝电子（深圳）有限公司 | Doubly-spliced FPC (flexible printed circuit) exposure positioning fixture |
| CN204215146U (en) * | 2014-11-27 | 2015-03-18 | 深圳市路维光电股份有限公司 | Litho machine and litho machine clamp |
| CN106773566A (en) * | 2017-03-07 | 2017-05-31 | 无锡影速半导体科技有限公司 | Direct-write type lithography machine exposes alignment device and method |
-
2018
- 2018-09-26 CN CN201811125799.1A patent/CN109270809A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59923A (en) * | 1982-06-25 | 1984-01-06 | Toshiba Corp | Projection type light exposing device |
| JPH01117322A (en) * | 1987-10-30 | 1989-05-10 | Hoya Corp | Reduction stepper |
| CN202979476U (en) * | 2012-12-27 | 2013-06-05 | 胜宏科技（惠州）股份有限公司 | Exposure alignment mould |
| CN203896602U (en) * | 2014-07-11 | 2014-10-22 | 奥宝电子（深圳）有限公司 | Doubly-spliced FPC (flexible printed circuit) exposure positioning fixture |
| CN204215146U (en) * | 2014-11-27 | 2015-03-18 | 深圳市路维光电股份有限公司 | Litho machine and litho machine clamp |
| CN106773566A (en) * | 2017-03-07 | 2017-05-31 | 无锡影速半导体科技有限公司 | Direct-write type lithography machine exposes alignment device and method |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110426922A (en) * | 2019-07-24 | 2019-11-08 | 苏州微影激光技术有限公司 | Bent exposure device and method |
| WO2023286732A1 (en) * | 2021-07-12 | 2023-01-19 | 株式会社ニコン | Exposure device and measurement system |
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| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
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| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20190125 |