CN110741106A - 氧化物烧结体及溅射靶 - Google Patents

氧化物烧结体及溅射靶 Download PDF

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Publication number
CN110741106A
CN110741106A CN201880038930.2A CN201880038930A CN110741106A CN 110741106 A CN110741106 A CN 110741106A CN 201880038930 A CN201880038930 A CN 201880038930A CN 110741106 A CN110741106 A CN 110741106A
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CN
China
Prior art keywords
mass
sintered body
oxide sintered
transparent conductive
conductive film
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Pending
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CN201880038930.2A
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English (en)
Chinese (zh)
Inventor
松元谦士
井上雅树
中村信一郎
矢野智泰
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MITSUI METAL MINING CO Ltd
Mitsui Mining and Smelting Co Ltd
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MITSUI METAL MINING CO Ltd
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Application filed by MITSUI METAL MINING CO Ltd filed Critical MITSUI METAL MINING CO Ltd
Publication of CN110741106A publication Critical patent/CN110741106A/zh
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/46—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/453—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates
    • C04B35/457—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates based on tin oxides or stannates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/06—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
    • H01B1/08—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances oxides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
    • H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
    • C04B2235/74—Physical characteristics
    • C04B2235/77—Density

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Manufacturing & Machinery (AREA)
  • Structural Engineering (AREA)
  • Physical Vapour Deposition (AREA)
  • Compositions Of Oxide Ceramics (AREA)
CN201880038930.2A 2017-08-08 2018-07-02 氧化物烧结体及溅射靶 Pending CN110741106A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2017-153043 2017-08-08
JP2017153043 2017-08-08
PCT/JP2018/025106 WO2019031105A1 (ja) 2017-08-08 2018-07-02 酸化物焼結体およびスパッタリングターゲット

Publications (1)

Publication Number Publication Date
CN110741106A true CN110741106A (zh) 2020-01-31

Family

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Family Applications (1)

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CN201880038930.2A Pending CN110741106A (zh) 2017-08-08 2018-07-02 氧化物烧结体及溅射靶

Country Status (5)

Country Link
JP (1) JP7086080B2 (ko)
KR (1) KR102375637B1 (ko)
CN (1) CN110741106A (ko)
TW (1) TWI778100B (ko)
WO (1) WO2019031105A1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114620996A (zh) * 2022-02-23 2022-06-14 洛阳晶联光电材料有限责任公司 一种高效太阳能电池用旋转陶瓷靶材

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117043122A (zh) * 2021-12-28 2023-11-10 三井金属矿业株式会社 氧化物烧结体及其制造方法以及溅射靶材

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0754132A (ja) * 1993-08-11 1995-02-28 Tosoh Corp Ｉｔｏ焼結体及びスパッタリングターゲット
JPH09262926A (ja) * 1996-03-27 1997-10-07 Teijin Ltd タッチパネル用透明導電積層体及びその製造方法
CN1302442A (zh) * 1999-02-24 2001-07-04 帝人株式会社 透明导电层叠片,及其制造方法和采用透明导电层叠片的显示器件
CN1397661A (zh) * 2001-06-26 2003-02-19 三井金属矿业株式会社 高电阻透明导电膜用溅射靶及高电阻透明导电膜的制造方法
CN104937676A (zh) * 2013-01-16 2015-09-23 日东电工株式会社 透明导电薄膜及其制造方法
CN105452520A (zh) * 2014-04-30 2016-03-30 日东电工株式会社 透明导电性薄膜
CN105481352A (zh) * 2014-10-06 2016-04-13 吉坤日矿日石金属株式会社 氧化物烧结体、氧化物溅射靶和导电性氧化物薄膜以及氧化物烧结体的制造方法
CN105821377A (zh) * 2015-01-22 2016-08-03 吉坤日矿日石金属株式会社 氧化物烧结体、溅射靶以及氧化物薄膜

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5726752B2 (ko) 1974-09-17 1982-06-07
JPH04277408A (ja) 1991-03-01 1992-10-02 Kojundo Chem Lab Co Ltd 透明電極
JP3629333B2 (ja) * 1996-03-27 2005-03-16 帝人株式会社 タッチパネル用透明導電積層体及びその製造方法
JP3785109B2 (ja) * 2002-04-08 2006-06-14 日東電工株式会社 透明導電積層体の製造方法
JP5726752B2 (ja) * 2009-11-19 2015-06-03 株式会社アルバック 透明導電膜の製造方法、透明導電膜の製造装置、スパッタリングターゲット及び透明導電膜
JP5301021B2 (ja) * 2011-09-06 2013-09-25 出光興産株式会社 スパッタリングターゲット
JP5498537B2 (ja) * 2012-07-06 2014-05-21 日東電工株式会社 透明導電性フィルム、その製造方法及びそれを備えたタッチパネル
CN103510047A (zh) * 2013-10-21 2014-01-15 研创应用材料（赣州）有限公司 一种制备新型导电氧化铟锡材料及其薄膜的方法
KR20220013022A (ko) * 2014-05-20 2022-02-04 닛토덴코 가부시키가이샤 투명 도전성 필름

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0754132A (ja) * 1993-08-11 1995-02-28 Tosoh Corp Ｉｔｏ焼結体及びスパッタリングターゲット
JPH09262926A (ja) * 1996-03-27 1997-10-07 Teijin Ltd タッチパネル用透明導電積層体及びその製造方法
CN1302442A (zh) * 1999-02-24 2001-07-04 帝人株式会社 透明导电层叠片,及其制造方法和采用透明导电层叠片的显示器件
CN1397661A (zh) * 2001-06-26 2003-02-19 三井金属矿业株式会社 高电阻透明导电膜用溅射靶及高电阻透明导电膜的制造方法
CN104937676A (zh) * 2013-01-16 2015-09-23 日东电工株式会社 透明导电薄膜及其制造方法
CN105452520A (zh) * 2014-04-30 2016-03-30 日东电工株式会社 透明导电性薄膜
CN105481352A (zh) * 2014-10-06 2016-04-13 吉坤日矿日石金属株式会社 氧化物烧结体、氧化物溅射靶和导电性氧化物薄膜以及氧化物烧结体的制造方法
CN105821377A (zh) * 2015-01-22 2016-08-03 吉坤日矿日石金属株式会社 氧化物烧结体、溅射靶以及氧化物薄膜

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114620996A (zh) * 2022-02-23 2022-06-14 洛阳晶联光电材料有限责任公司 一种高效太阳能电池用旋转陶瓷靶材

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TWI778100B (zh) 2022-09-21
JP7086080B2 (ja) 2022-06-17
JPWO2019031105A1 (ja) 2020-07-09
TW201910539A (zh) 2019-03-16
KR102375637B1 (ko) 2022-03-17
WO2019031105A1 (ja) 2019-02-14
KR20200008583A (ko) 2020-01-28

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