CN110636692A - 一种pcb和电机以及pcb的制作方法 - Google Patents
一种pcb和电机以及pcb的制作方法 Download PDFInfo
- Publication number
- CN110636692A CN110636692A CN201810644925.8A CN201810644925A CN110636692A CN 110636692 A CN110636692 A CN 110636692A CN 201810644925 A CN201810644925 A CN 201810644925A CN 110636692 A CN110636692 A CN 110636692A
- Authority
- CN
- China
- Prior art keywords
- pcb
- ionic liquid
- substrate
- copper
- graphene composite
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 13
- 229910021389 graphene Inorganic materials 0.000 claims abstract description 86
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 79
- 239000002608 ionic liquid Substances 0.000 claims abstract description 64
- 239000000758 substrate Substances 0.000 claims abstract description 60
- 239000002131 composite material Substances 0.000 claims abstract description 48
- 239000011248 coating agent Substances 0.000 claims abstract description 26
- 238000000576 coating method Methods 0.000 claims abstract description 26
- 238000009713 electroplating Methods 0.000 claims abstract description 25
- 238000000034 method Methods 0.000 claims abstract description 18
- 238000000151 deposition Methods 0.000 claims abstract description 16
- 239000007788 liquid Substances 0.000 claims abstract description 15
- 239000000463 material Substances 0.000 claims abstract description 14
- 229910021645 metal ion Inorganic materials 0.000 claims abstract description 11
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 33
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical group [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 27
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 claims description 18
- 229910001431 copper ion Inorganic materials 0.000 claims description 18
- 238000007747 plating Methods 0.000 claims description 16
- 238000003756 stirring Methods 0.000 claims description 15
- 229910052751 metal Inorganic materials 0.000 claims description 12
- 239000002184 metal Substances 0.000 claims description 12
- 239000001763 2-hydroxyethyl(trimethyl)azanium Substances 0.000 claims description 11
- 235000019743 Choline chloride Nutrition 0.000 claims description 11
- SGMZJAMFUVOLNK-UHFFFAOYSA-M choline chloride Chemical compound [Cl-].C[N+](C)(C)CCO SGMZJAMFUVOLNK-UHFFFAOYSA-M 0.000 claims description 11
- 229960003178 choline chloride Drugs 0.000 claims description 11
- 230000008021 deposition Effects 0.000 claims description 9
- 239000011888 foil Substances 0.000 claims description 6
- 238000005530 etching Methods 0.000 claims description 5
- 230000007797 corrosion Effects 0.000 abstract description 6
- 238000005260 corrosion Methods 0.000 abstract description 6
- 229910002804 graphite Inorganic materials 0.000 abstract 2
- 239000010439 graphite Substances 0.000 abstract 2
- -1 graphite alkene Chemical class 0.000 abstract 2
- 229910052802 copper Inorganic materials 0.000 description 21
- 239000010949 copper Substances 0.000 description 21
- 238000001237 Raman spectrum Methods 0.000 description 12
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 12
- 229910052697 platinum Inorganic materials 0.000 description 6
- 238000001069 Raman spectroscopy Methods 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 238000005411 Van der Waals force Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000008054 signal transmission Effects 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D15/00—Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/66—Electroplating: Baths therefor from melts
- C25D3/665—Electroplating: Baths therefor from melts from ionic liquids
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/18—Electroplating using modulated, pulsed or reversing current
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
- H05K1/092—Dispersed materials, e.g. conductive pastes or inks
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
Description
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201810644925.8A CN110636692A (zh) | 2018-06-21 | 2018-06-21 | 一种pcb和电机以及pcb的制作方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201810644925.8A CN110636692A (zh) | 2018-06-21 | 2018-06-21 | 一种pcb和电机以及pcb的制作方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN110636692A true CN110636692A (zh) | 2019-12-31 |
Family
ID=68967795
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201810644925.8A Pending CN110636692A (zh) | 2018-06-21 | 2018-06-21 | 一种pcb和电机以及pcb的制作方法 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN110636692A (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113481404A (zh) * | 2021-06-17 | 2021-10-08 | 云南新铜人实业有限公司 | 一种表面改性的铜母线及其制备方法 |
Citations (7)
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CN106298075A (zh) * | 2016-08-31 | 2017-01-04 | 王美玲 | 基于铜和石墨烯的导电线芯的制备工艺 |
CN106793533A (zh) * | 2017-01-16 | 2017-05-31 | 厦门大学 | 一种具有铜‑石墨烯复相图案化导电膜的印制电路板及导电膜制备方法 |
CN106993377A (zh) * | 2017-03-21 | 2017-07-28 | 昆山沪利微电有限公司 | 一种印刷电路板局部加厚铜厚的制作方法 |
CN107301892A (zh) * | 2017-06-21 | 2017-10-27 | 宁波柔碳电子科技有限公司 | 一种表面具有导电线路的石墨烯复合薄膜的制备方法 |
CN107658262A (zh) * | 2017-09-28 | 2018-02-02 | 江苏师范大学 | 一种基于石墨烯复合结构的三维硅通孔垂直互联方法 |
CN107946201A (zh) * | 2017-12-19 | 2018-04-20 | 哈尔滨工业大学 | 一种基于局域电沉积的引线键合焊点结构的制备方法 |
CN208597195U (zh) * | 2018-06-21 | 2019-03-12 | 四川聚创石墨烯科技有限公司 | 一种pcb和电机 |
-
2018
- 2018-06-21 CN CN201810644925.8A patent/CN110636692A/zh active Pending
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106298075A (zh) * | 2016-08-31 | 2017-01-04 | 王美玲 | 基于铜和石墨烯的导电线芯的制备工艺 |
CN106793533A (zh) * | 2017-01-16 | 2017-05-31 | 厦门大学 | 一种具有铜‑石墨烯复相图案化导电膜的印制电路板及导电膜制备方法 |
CN106993377A (zh) * | 2017-03-21 | 2017-07-28 | 昆山沪利微电有限公司 | 一种印刷电路板局部加厚铜厚的制作方法 |
CN107301892A (zh) * | 2017-06-21 | 2017-10-27 | 宁波柔碳电子科技有限公司 | 一种表面具有导电线路的石墨烯复合薄膜的制备方法 |
CN107658262A (zh) * | 2017-09-28 | 2018-02-02 | 江苏师范大学 | 一种基于石墨烯复合结构的三维硅通孔垂直互联方法 |
CN107946201A (zh) * | 2017-12-19 | 2018-04-20 | 哈尔滨工业大学 | 一种基于局域电沉积的引线键合焊点结构的制备方法 |
CN208597195U (zh) * | 2018-06-21 | 2019-03-12 | 四川聚创石墨烯科技有限公司 | 一种pcb和电机 |
Non-Patent Citations (2)
Title |
---|
GANG HUANG ET.AL.: "Preparation and characterization of the graphene-Cu composite film by electrodeposition process", 《MICROELECTRONIC ENGINEERING》, vol. 157, 6 February 2016 (2016-02-06), pages 7 - 12, XP029442441, DOI: 10.1016/j.mee.2016.02.006 * |
YAPING HE AND JIANBIN ZHENG: "One-pot ultrasonic-electrodeposition of copper–graphene nanoflowers in Ethaline for glucose sensing", 《ANAL. METHODS》, vol. 5, 23 November 2012 (2012-11-23), pages 767 - 772 * |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113481404A (zh) * | 2021-06-17 | 2021-10-08 | 云南新铜人实业有限公司 | 一种表面改性的铜母线及其制备方法 |
CN113481404B (zh) * | 2021-06-17 | 2022-10-18 | 云南新铜人实业有限公司 | 一种表面改性的铜母线及其制备方法 |
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PB01 | Publication | ||
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TA01 | Transfer of patent application right |
Effective date of registration: 20230925 Address after: Room 101, 201, 301, 401, 2nd Floor, Building 10, Shengyue Garden, No. 33 Shunye East Road, Xingtan Town, Shunde District, Foshan City, Guangdong Province, 528305 (Residence application) Applicant after: Foshan qiaoluan Technology Co.,Ltd. Address before: 629000 Electronic Testing Center, 1st and 6th floors, Yulong Road, Economic and Technological Development Zone, Suining City, Sichuan Province Applicant before: SICHUAN JUCHUANG SHIMOXI TECHNOLOGY Co.,Ltd. Applicant before: Huang Yingchun |
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TA01 | Transfer of patent application right | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20240104 Address after: Room 03, Shared Office Area, 2nd Floor, Building 22, No. 1889 Huandao East Road, Hengqin New District, Zhuhai City, Guangdong Province, 529031 Applicant after: Yaoling (Guangdong) New Energy Technology Co.,Ltd. Address before: Room 101, 201, 301, 401, 2nd Floor, Building 10, Shengyue Garden, No. 33 Shunye East Road, Xingtan Town, Shunde District, Foshan City, Guangdong Province, 528305 (Residence application) Applicant before: Foshan qiaoluan Technology Co.,Ltd. |
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TA01 | Transfer of patent application right |