CN110494588A - 层压系统 - Google Patents
层压系统 Download PDFInfo
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- CN110494588A CN110494588A CN201880024779.7A CN201880024779A CN110494588A CN 110494588 A CN110494588 A CN 110494588A CN 201880024779 A CN201880024779 A CN 201880024779A CN 110494588 A CN110494588 A CN 110494588A
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- refractive index
- index layer
- laminating system
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
- C03C17/2456—Coating containing TiO2
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/225—Nitrides
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/34—Nitrides
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
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- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/211—SnO2
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- C03C2217/00—Coatings on glass
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- C03C2217/21—Oxides
- C03C2217/212—TiO2
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- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
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- C03C2217/214—Al2O3
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- C03C2217/00—Coatings on glass
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- C03C2217/21—Oxides
- C03C2217/216—ZnO
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- C03C2217/00—Coatings on glass
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- C03C2217/21—Oxides
- C03C2217/218—V2O5, Nb2O5, Ta2O5
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Abstract
本发明提供了层压系统,其包括基板和高折射层,所述高折射层形成在所述基板上并且具有2.0或更大的折射率和70nm或更小的厚度。
Description
技术领域
本发明涉及层压系统。
背景技术
近来,诸如智能手机、平板PC等的移动装置已经迅速普及,因此,消费者的要求变得越来越高。特别地,从软件到硬件,为了满足那些要求,这些装置正在日新月异地发展。
作为高级策略之一,在硬件的情况下,屏幕变大,并且通过添加设计元素,每个制造商都采用高级策略来构建独特的图像。
通常,由于移动装置与各种外部环境以及用户的手有许多接触,因此它们在功能上不仅需要优异的耐腐蚀性和耐磨性,而且还需要相当大的表面硬度和强度以及优异的附着力,并且在外观方面,对于这种设备,高品质的颜色表现以及优异的表面纹理是非常重要的。
应用于基板以用于高品质的颜色表现的多种化学和物理涂覆方法是已知的。例如,已经研究使用分散在聚酯树脂中的无机颜料的颜色涂覆方法,通过真空沉积法使用ITO在基板表面上的颜色表现方法,以及通过PVD用薄膜涂覆基板的表面并且通过注入使用离子注入方法离子化的金属离子或气体离子来改变颜色的涂覆方法。
然而,作为表现最多样化的颜色的方法,可以使用阳极氧化,但是该方法的缺点在于使用的材料昂贵并且在情感时代不需要高品质的颜色或透明性。
因此,需要一种新的趋势,即利用透明基板原样并且通过实现类陶瓷的深且柔和的颜色来赋予奢华的技术,并且这种技术可以应用于各种领域以及移动装置中。例如,需要可以用于包括显示面板的电子装置并且通过在诸如家具和家用电器的各种领域中实现深色和柔和颜色来赋予奢华的技术。
(专利文献1)第2014-0138467号韩国未审查的专利申请公开
公开内容
技术问题
本发明涉及提供高反射层压系统。
技术方案
在一个方面,本发明提供了层压系统,所述层压系统包括基板和在基板上形成的具有2.0或更大的折射率和70nm或更小的厚度的高折射率层。
有益效果
由于根据本发明的示例性实施方案的层压系统可以表现出透明性、柔和颜色和反射效果,因此当应用根据本发明的层压系统时,可以实现具有深且柔和的颜色以及陶瓷纹理和/或高品质纹理的基板。
附图说明
提供以下附带说明的附图以说明本发明的优选实施方案,并且通过本发明的上述内容促进对本发明的技术精神的进一步理解,因此,本发明不应被解释为仅限于这些附图中所示的细节。
图1是根据本发明的示例性实施方案的单层层压系统100的示意图,所述单层层压系统100包括在基板110上的高折射率层120。
图2是根据本发明的示例性实施方案的双层层压系统200的示意图,所述双层层压系统200依次包括在基板210上的高折射率层220和低折射率层230。
图3是根据本发明的示例性实施方案的三层层压系统300的示意图,所述三层层压系统300依次包括在基板310上的高折射率层320、低折射率层330和高折射率层340。
图4是根据本发明的示例性实施方案的包括层压系统400、底涂层410和防指纹涂膜420的结构的实例的示意图。
图5是根据本发明的示例性实施方案的包括涂料涂层530、层压系统500、底涂层510和防指纹涂膜520的结构的实例的示意图。
说明书所附的附图中使用的参考数字表示以下:
100、200、300、400、500:层压系统
110、210、310:玻璃基板
120、220、320、340:高折射率层
230、330:低折射率层
410、510:底涂层(SiO2)
420、520:防指纹涂膜
530:涂料涂层
具体实施方式
在下文中,将进一步详细描述实施方案以帮助理解本发明。
说明书和权利要求书中使用的术语和词语不应被解释为局限于一般含义或字典含义,而应基于发明人已经适当定义术语的概念的原则根据本发明的技术思想的含义和概念来解释以便以最佳方式解释本发明。
根据本发明的示例性实施方案的层压系统包括基板;以及在所述基板形成上的折射率为2.0或更大并且厚度为70nm或更小的高折射率层。
根据本发明的示例性实施方案的层压系统包括在基板上形成的折射率为2.0或更大并且厚度为70nm或更小的高折射率层,从而表现出透明性、柔和颜色和反射效果,因此对基板赋予深且柔和的颜色以及陶瓷纹理或奢华纹理。
在下文,将详细描述本发明。
根据本发明的示例性实施方案,层压系统可以包括基板,并且所述基板可以包括透明基板和不透明基板两者,其具体地由玻璃、聚对苯二甲酸乙二醇酯(PET)、高光泽度涂覆材料(也称为高光泽的)、金属或玻璃/PET形成。基板的折射率可以是例如1.50至1.52,但是本发明不限于此。基板的厚度可以是例如0.3mm至6mm,但是本发明不限于此。
另外,根据本发明的示例性实施方案,层压系统可以包括在基板上形成的具有折射率为2.0或更大且厚度为70nm或更小的高折射率层。
具体地,在层压系统中,高折射率层的折射率为2.0或更大,更具体地为2.0至3.0,并且当高折射率层的折射率在上述范围内时,在本发明中,可以很好地实现期望的柔和和多样的颜色以及反射效果。在本发明中,可以使用例如椭偏仪设备来测量折射率,但本发明不限于此。
另外,高折射率层的厚度可以为70nm或更小,具体地为3nm至70nm,并且更具体地为3nm至60nm。层压系统可以在其表面或涂层表面具有反射比,所述反射比根据高折射率层的厚度而变化,因此可以改变颜色和层次感。当高折射率层的厚度大于70nm时,可能无法实现本发明中的期望的反射比或颜色,因此高品质的颜色或透明性可能劣化。
所实现的层压系统可以具有包括基板和高折射率层的各种结构。
具体地,根据本发明的示例性实施方案的层压系统100可以是单层系统,如图1所示,包括基板110和在基板110上形成的高折射率层120。
根据本发明的另一示例性实施方案,层压系统可以是多层系统,其包括在基板上形成的高折射率层并且还包括低折射率层,所述低折射率层形成在高折射率层上并且具有低于高折射率层的折射率。即,层压系统可以包括高折射率层、低折射率层或其中两个或多个此类折射层重复堆叠的多层涂层。
如图2所示,根据本发明的示例性实施方案的层压系统200可以包括基板210、在基板210上形成的高折射率层220和在高折射率层220上形成的低折射率层230。
另外,如图3所示,根据本发明的示例性实施方案的层压系统300可以包括顺序层压的基板310、在基板310上形成的高折射率层320、在高折射率层320上形成的低折射率层330以及在低折射率层330上形成的高折射率层340。
另外,根据本发明的又一示例性实施方案的层压系统可以包括顺序堆叠在基板上的高折射率层、低折射率层、高折射率层、低折射率层和高折射率层。
在层压系统中,高折射率层和低折射率层的重复堆叠数可以在不会抑制本发明的效果的情况下根据期望的设计或期望的性能而不同地变化。
另外,当层压系统包括多层涂层时,所述多层涂层的最外层可以是低折射率层或高折射率层,并且优选地是高折射率层以实现在本发明中的期望的反射比和颜色,但本发明不限于此。
低折射率层可以具有例如1.8或更小、更具体地1.0至1.8的折射率。根据本发明的示例性实施方案,在上述范围内,由于高折射率层与低折射率层之间的折射率的差,本发明可以实现期望的反射比,因此可以优异地表现深、柔和以及多样的颜色。
另外,低折射率层的厚度可以为70nm或更小,具体地为3nm至70nm,并且更具体地为3nm至60nm。根据低折射率层的厚度,层压系统可以在其表面或涂层表面上具有不同的反射比,因此,颜色和层次感可以变化。当低折射率层的厚度大于70nm时,由于可能无法实现本发明中的期望的反射比或颜色,因此高品质的颜色或透明性可能劣化。
另外,在层压系统中,由于层之间的折射率的差和/或表面反射比的差,具有不同折射率的高折射率层和低折射率层可以实现柔和且多样的颜色,但本发明的机制不限于此。
例如,在层压系统中,高折射率层与低折射率层之间的折射率的差可以为0.2至1.5,并且具体地为0.3至1.2。满足上述范围的包括高折射率层和低反折射率层的层压系统在本发明中可以满足期望的反射比和颜色,并且具体地,表面反射比为8%至40%,表面涂层(层压表面)的颜色的a*值为-5至+5,并且其b*值为-10至+10。
另外,在层压系统中,高折射率层和低折射率层的光学厚度对于实现上述范围可能是重要的。在此,光学厚度是指作为各向同性光学元件的高折射率层和低折射率层各自的折射率与物理厚度的乘积,即折射率(n)与介质厚度(d)的乘积(nd)。
在本发明中,低折射率层的光学厚度可以为3nm至100nm,具体地为3nm至70nm,并且当低折射率层的光学厚度大于100nm或小于3mm时,可能无法实现本发明中的期望的反射比或颜色,因此高品质的颜色或透明性可能劣化。
在本发明中,高折射率层的光学厚度可以为6nm至180nm、具体地为6nm至100nm,并且当高折射率层的光学厚度大于180nm或小于6nm时,由于可能无法实现本发明中的期望的反射比或颜色,因此高品质的颜色或透明性可能劣化。
另外,当根据本发明的层压系统是多层系统时,每个高折射率层和每个低折射率层的厚度可以彼此相同或不同。例如,可以将都具有20nm的厚度的高折射率层、低折射率层和高折射率层依次层压在基板上,或者可以将具有15nm的厚度的高折射率层、具有13nm的厚度的低折射率层和具有25nm的厚度的高折射率层依次层压在基板上。
根据本发明的示例性实施方案,在层压系统中,高折射率层的材料满足2.0或更大的折射率,并且在不抑制本发明的效果的情况下可以使用各种材料。高折射率层的材料可以包括例如,选自氮化铝、氮化硅、氮化硅锆、氧化钛、氧化锌、氧化锡、氧化锆、氧化锌锡、氧化铬和氧化铌中的一种或多种材料。更具体地,高折射率层的材料可以包括氧化钛、氮化硅等,并且优选地,氮化硅。
另外,根据本发明的示例性实施方案,在层压系统中,低折射率层的材料满足1.8或更小的折射率,并且在不抑制本发明的效果的情况下可以使用各种材料。低折射率层的材料可以包括例如,选自氟化镁、氧化铝、氧化硅、氧氮化硅、碳氧化硅和硅铝混合的氧化物中的一种或多种材料。更具体地,低折射率层的材料可以包括氮化硅、氧化铝等。
另外,当层压系统是多层系统时,包括作为每个高折射率层和每个低折射率层的材料的材料类型可以在满足每个折射率的范围内彼此相同或不同。
根据本发明的示例性实施方案,层压系统的表面反射比可以为8%至40%,并且具体地为8%至30%。表面反射比,例如,在380nm至780nm波长范围内的表面或涂覆表面上的光反射比,可以使用分光光度透射计(型号名称:Lambda 950,Perkin Elmer)测量。所实现的颜色和层次感可以根据层压系统的表面反射比变化。当层压系统的表面反射比小于8%时,在美学方面,在实现陶瓷纹理方面可能存在问题,当层压系统的表面反射比大于40%时,由于高反射比,可能在实现柔和颜色方面存在问题。
另外,根据本发明的示例性实施方案,在层压系统中,由CIELAB颜色空间坐标以10°的观察者角度表示的涂层表面的颜色可以表示为-5至+5的a*值以及-10至+10的b*值。在此范围内,可以优异地实现具有陶瓷纹理的深且柔和的颜色。
在层压系统中,将高折射率层和低折射率层层压在基板上的方法可以是例如,选自溅射、蒸发、离子镀和化学气相沉积(CVD)中的一种或多种。
根据本发明的示例性实施方案,可以使用层压系统来实现各种结构。例如,可以以用于在层压系统的底表面和/或顶表面上涂覆或层叠各种涂层的方式实现各种结构。
例如,如图4所示,可以实现一种结构,所述结构包括:包括基板和高折射率层的单层或多层层压系统400、包括在层压系统400上形成的SiO2的底涂层410、以及防指纹涂膜420。
另外,如图5所示,可以实现一种结构,所述结构包括:包括基板和高折射率层的单层或多层层压系统500、包括在层压系统500上形成的SiO2的底涂层510、防指纹涂膜520以及在基板的底表面上形成的各种涂料涂层530。在此,涂料涂层530可以包括例如,选自玻璃底涂层、屏蔽层、屏蔽颜色层、UV层和防碎层中的一种或多种涂层。由于包括各种涂层,因此可以根据期望的目的实现颜色或其他物理效果。
由于根据本发明的示例性实施方案的层压系统包括形成在基板上的满足在特定范围内的折射率和厚度的折射率层,因此可以表现出透明且柔和的颜色以及反射效果,并且因此,基板可以表现出深且柔和的颜色以及陶瓷纹理或奢华纹理。另外,当将折射率层与施加在基板的底表面上的彩色涂料涂层组合物一起使用时,有机涂料的颜色可以实现为像陶瓷一样。因此,层压系统可以有效地用于包括移动装置的各种目的。
实施例
<层压系统的制造>
实施例1
通过溅射将折射率为2.4(椭偏仪)的TiO2层压在厚度为0.5mm的玻璃基板上至50nm的厚度,获得包括单层涂层的层压系统。
实施例2
通过溅射将折射率为2.4的TiO2(高折射率层)、折射率为1.4的SiO2(低折射率层)和TiO2(高折射率层)顺序层压在厚度为0.5mm的玻璃基板上至以下表1所示的相应厚度,获得包括多层涂层的层压系统。
实施例3至实施例6
除了如以下表1所示改变TiO2和SiO2的厚度以外,以与实施例2相同的方式获得包括多层涂层的层压系统。
实施例7
通过溅射将折射率为2.1的SixNy(x=3,y=4,高折射率层)、折射率为1.7的Al2O3(低折射率层)和SixNy(x=3,y=4,高折射率层)顺序层压在厚度为0.5mm的玻璃基板上至以下表2所示的相应厚度,获得包括多层涂层的层压系统。
实施例8和实施例9
除了以如下表2所示改变SiXNy和Al2O3的厚度以外,以与实施例7相同的方式获得包括多层涂层的层压系统。
比较例1至比较例4
除了如以下表3所示改变TiO2和SiO2的厚度以外,以与实施例2相同的方式获得包括多层涂层的层压系统。
比较例5至比较例7
通过溅射将折射率为1.97的AZO(高折射率层)、折射率为1.8的SnO(低折射率层)和AZO(高折射率层)顺序层压在厚度为0.5mm的玻璃基板上至以下表2所示的相应厚度,获得包括多层涂层的层压系统。
比较例8至比较例10
通过溅射将折射率为2.4的TiO2(高折射率层)、折射率为2.1的SixNy(x=3,y=4;低折射率层)和TiO2(高折射率层)顺序层压在厚度为0.5mm的玻璃基板上至以下表5所示的相应厚度,获得包括多层涂层的层压系统。
比较例11至比较例13
通过溅射将折射率为1.7的Al2O3(高折射率层)、折射率为1.4的SiO2(低折射率层)和Al2O3(高折射率层)层压在厚度为0.5mm的玻璃基板上至以下表6所示的相应厚度,获得包括多层涂层的层压系统。
[表1]
[表2]
[表3]
[表4]
[表5]
[表6]
实验性实施例
如下使用根据每个实施例和比较例获得的单层或多层层压系统来测量涂层表面的反射比和颜色,结果示于以下表7至表12中。
(1)反射比评估
使用分光光度透射计(型号名称:Lambda 950,Perkin Elmer)测量在每个实施例和比较实施例中制备的层压系统的涂层(表面)在380nm至780nm的波长范围内的光反射比。根据ISO 9050标准,通过将测量的光反射比与对应于AM1.5的加权函数相乘获得平均值(Y)。
(2)涂层表面颜色
观察者角度为10°的CIELAB颜色空间坐标(CIE L*,CIE a*,CIE b*)表示根据F.W.Billmeyer,Jr.,“Current American Practice in Color Measurement”AppliedOptics,第8卷,第4期,第737-750页(1969年4月)获得的值。
[表7]
反射比(%) | 实施例1 | 实施例2 | 实施例3 | 实施例4 | 实施例5 | 实施例6 |
Y | 32.1 | 25.7 | 15.8 | 17.3 | 10.9 | 11.4 |
L* | 63.5 | 57.8 | 46.7 | 48.6 | 39.4 | 40.3 |
a* | -2.2 | -2.1 | -1.8 | -2.2 | -0.9 | -0.9 |
b* | -5.1 | -6.0 | -1.8 | 0.6 | -1.8 | -4.3 |
[表8]
反射比(%) | 实施例7 | 实施例8 | 实施例9 |
Y | 21.8 | 18.1 | 18.2 |
L* | 53.8 | 49.7 | 49.7 |
a* | -2.1 | -1.6 | -1.9 |
b* | 3.7 | 0.3 | 3.7 |
[表9]
反射比(%) | 比较例1 | 比较例2 | 比较例3 | 比较例4 |
Y | 18.6 | 8.3 | 13.4 | 48.9 |
L* | 50.3 | 34.6 | 43.3 | 75.4 |
a* | 2.2 | 23.3 | 13.1 | -1.5 |
b* | -24.8 | -34.9 | -25.9 | 60.5 |
[表10]
反射比(%) | 比较例5 | 比较例6 | 比较例7 |
Y | 10.8 | 10.7 | 9.6 |
L* | 39.3 | 39.1 | 37.2 |
a* | 10.8 | 10.7 | 13.6 |
b* | 0.3 | 2.3 | -14.2 |
[表11]
反射比(%) | 比较例8 | 比较例9 | 比较例10 |
Y | 10.9 | 12.9 | 9.3 |
L* | 39.4 | 42.6 | 36.5 |
a* | 17.4 | 14.4 | 21.5 |
b* | -38.8 | -33.2 | -39.4 |
[表12]
反射比(%) | 比较例11 | 比较例12 | 比较例13 |
Y | 7.1 | 6.9 | 6.6 |
L* | 32.1 | 31.6 | 30.8 |
a* | -0.5 | 0 | 0.3 |
b* | 0.4 | 4.4 | 4.1 |
根据本发明的实施例1至实施例9获得的所有层压系统均满足8%至40%的反射比,涂层表面颜色的a*值为-5至+5,并且其b*值为-10至+10。另一方面,比较例1至比较例13的层压系统不满足上述范围的反射比和涂膜表面颜色。
具体地,在通过将折射率为2.4的TiO2(高折射率层)、折射率为1.4的SiO2(低折射率层)和TiO2(高折射率层)顺序层压在玻璃基板上至70nm或更小的相应厚度制造的实施例2至实施例6的层压系统中,反射比为约10%至26%,涂层表面颜色的a*值为-3至0,并且其b*值为-6.0至+0.6。
另一方面,在比较实例1至比较例4的层压系统中,其中尽管如实施例2至实施例6中那样在玻璃基板上层压TiO2、SiO2和TiO2,但高折射率层和低折射率层中的至少一个的厚度大于70nm,证实了反射比和涂层表面颜色值超出本发明的期望范围。
另外,尽管具有不同于实施例2至实施例6的反射比,但在实施例7至实施例9的层压系统中,其中将折射率为2.1的SixNy(x=3,y=4;高折射率层)、折射率为1.7的Al2O3(低折射率层)和SixNy(x=3,y=4;高折射率层)层压在玻璃基板上至70nm或更小的相应厚度,反射比为约18%至22%,涂层表面颜色的a*值为-3至0,并且其b*值为0至+4。
然而,当高折射率和低折射率的范围均超出本发明的范围时,即,在比较例5至比较例7中,其中折射率为1.97的AZO、折射率为1.88的SnO和AZO被层压,尽管各自被层压至70nm或更小的厚度,但证实涂层表面颜色的a*值超出本发明的范围,并且比较例7中的涂层表面颜色的a*和b*值二者均超出本发明的范围。
另外,在比较例8至比较例10中,其中在玻璃基板上形成实现为高折射率层的三个层中的每个层至70nm或更小的厚度,证实涂层表面颜色的a*和b*值二者均超出本发明的范围。
另外,在比较例11至比较例13中,其中在玻璃基板上形成实现为低折射率层的三个层中的每个层至70nm或更小的厚度,证实涂层表面颜色的a*和b*值二者均满足本发明的范围,但是反射比小于8%,并且为6.6%至7.1%。
Claims (13)
1.层压系统,包括:
基板;以及
在所述基板上形成的具有2.0或更大的折射率和70nm或更小的厚度的高折射率层。
2.如权利要求1所述的层压系统,其中通过将具有比高折射率层的折射率低的折射率的低折射率层层压在所述高折射率层上、或重复地层压所述高折射率层和所述低折射率层来形成包括两层或更多层的多层涂层。
3.如权利要求2所述的层压系统,其中所述低折射率层具有1.8或更小的折射率以及70nm或更小的厚度。
4.如权利要求2所述的层压系统,其中所述高折射率层与所述低折射率层之间的折射率的差为0.2至1.5。
5.如权利要求1所述的层压系统,其中所述高折射率层具有6nm至180nm的光学厚度。
6.如权利要求2所述的层压系统,其中所述低折射率层具有3nm至100nm的光学厚度。
7.如权利要求1所述的层压系统,其中所述高折射率层包括选自氮化铝、氮化硅、氮化硅锆、氧化钛、氧化锌、氧化锡、氧化锆、氧化锌锡、氧化铬和氧化铌中的一种或多种材料。
8.如权利要求2所述的层压系统,其中所述低折射率层包括选自氟化镁、氧化铝、氧化硅、氮氧化硅、碳氧化硅和硅铝混合氧化物中的一种或多种材料。
9.如权利要求2所述的层压系统,其中所述多层涂层的最外层是高折射率层。
10.如权利要求1所述的层压系统,其中所述层压系统的表面反射比为8%至40%。
11.如权利要求1所述的层压系统,其中在所述层压系统中,由CIELAB颜色空间坐标表示的涂层表面的颜色的a*值对于10°的观察者角度为-5至+5,并且其b*值为-10至+10。
12.如权利要求1所述的层压系统,其中所述基板由玻璃、聚对苯二甲酸乙二醇酯(PET)或玻璃/PET形成。
13.如权利要求1所述的层压系统,其中通过选自溅射、蒸发、离子镀和化学气相沉积(CVD)中的一种或多种方法形成所述层压系统。
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CN110937821A (zh) * | 2019-12-30 | 2020-03-31 | 青岛锦绣前程节能玻璃有限公司 | 一种可钢化阳光控制镀膜玻璃及制备方法 |
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FR3082199B1 (fr) * | 2018-06-12 | 2020-06-26 | Saint-Gobain Glass France | Materiau comprenant un empilement a proprietes thermiques et esthetiques |
FR3082198B1 (fr) * | 2018-06-12 | 2020-06-26 | Saint-Gobain Glass France | Materiau comprenant un empilement a proprietes thermiques et esthetique |
KR102281299B1 (ko) * | 2019-04-15 | 2021-07-23 | 도레이첨단소재 주식회사 | 비산방지 데코필름, 이를 포함하는 전자 디스플레이 및 전자장치, 및 상기 비산방지 데코필름의 제작방법 |
CN113549872B (zh) * | 2020-04-07 | 2023-11-17 | 纳峰真空镀膜(上海)有限公司 | 黑色涂层 |
KR102536801B1 (ko) * | 2021-02-09 | 2023-05-26 | (주) 비엘에스 | 유리 용기에 레인보우 색상 코팅 방법 |
CN113233785B (zh) * | 2021-05-25 | 2023-11-03 | 广东旗滨节能玻璃有限公司 | 半反半透膜玻璃及其制备方法 |
WO2023101299A1 (ko) * | 2021-11-30 | 2023-06-08 | 한국항공대학교산학협력단 | 시각적 내부 거칠기를 가지는 유리 및 이의 제조방법 |
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