CN110342901A - 釉下彩日用瓷的制备工艺 - Google Patents

釉下彩日用瓷的制备工艺 Download PDF

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CN110342901A
CN110342901A CN201910449864.4A CN201910449864A CN110342901A CN 110342901 A CN110342901 A CN 110342901A CN 201910449864 A CN201910449864 A CN 201910449864A CN 110342901 A CN110342901 A CN 110342901A
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梁忠诚
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Abstract

釉下彩日用瓷的制备工艺,日用瓷包括坯体和釉料,坯体包括以下原料:钙长石、伊利石、石英、硅灰石、海泡石、蛭石粉、赤玉土、氯化镁、氧化钛、碳酸锶、氧化锡,坯体采用钙长石、伊利石、石英、硅灰石为基础原料,通过加入海泡石、蛭石粉、赤玉土以提高制成的日用瓷的抗折强度和热稳定性,同时降低了坯体的烧结温度,降低了生产成本。

Description

釉下彩日用瓷的制备工艺
技术领域
本发明属于陶瓷制备领域,具体涉及一种釉下彩日用瓷的制备工艺。
背景技术
随着社会的进步和发展,对环保和使用安全的意识也越来越强烈,陶瓷餐具相比于塑料餐具有耐磨性好、易于清洗、经久耐用等优点。陶瓷餐具的烧制和应用在我国有着悠久的历史,其造型多样、色彩斑斓、手感清凉细滑、容易洗涤,深受国人喜爱,现有高档的餐具通常采用骨质瓷,骨质瓷采用骨粉、高岭土、石英、长石等原料制成,烧成温度在1300-1350℃之间,原料成本高、烧成温度高,且陶瓷餐具的脆性大,耐冲击能力低,易碎,有待进一步改进。
发明内容
本发明的目的是克服现有技术的缺点,提供一种釉下彩日用瓷的制备工艺。
本发明采用如下技术方案:
釉下彩日用瓷的制备工艺,所述日用瓷包括坯体和釉料,所述坯体包括以下重量份原料:钙长石15-18份、伊利石25-30份、石英30-40份、硅灰石12-15份、海泡石8-10份、蛭石粉5-8份、赤玉土3-5份、氯化镁1-3份、氧化钛1.8-2.5份、碳酸锶0.8-1.2份、氧化锡0.5-0.8份;
所述釉料包括以下重量份的原料:熔块30-40份、叶腊石8-10份、高岭土15-22份、石英20-25份、硅酸锆5-8份、蛤粉4-8份、氧化钴3-5份、钛白粉1-3份、磷酸钙1-2份、氧化钡0.5-0.8份;
所述熔块的化学百分含量为:SiO2:58-65%、Al2O3:13-16%、MgO:2-4%、Na2O:6-8%、CaCO3:5-8%、La2O3:4.7-5.2%、SnCl2:1-2%、TiO2:0.5-0.7%、SrCO3:0.3-0.6%;
其制备工艺包括以下步骤:
(1)将坯体的原料按其配比称重后,混合破碎,过筛后,湿球磨制得泥料;
(2)将釉料的原料按其配比称重后,经破碎机破碎,过筛后,湿球磨制得釉料;
(3)将步骤(2)制得的釉料经过磁选机多次除铁至釉料中的铁含量低于0.05%;
(4)将泥料进行除气、陈泥后,干燥制成粗坯;
(5)将坯体经过粗修、细修、精修后得精坯;
(6)将制得的精坯放入窑炉中煅烧,煅烧温度720-780℃、煅烧周期3-4小时,制得素坯;
(7)在素坯上彩绘图案,然后将制得的釉料施加在彩绘后的素坯上,放入窑炉中,升温至880-920℃,在氧化的氛围下烧结3.2-3.8h,然后继续升温至1020-1060℃,在还原气氛下烧结4-4.5h,得到所述日用瓷。
进一步的,所述步骤(1)中,泥料湿球磨时,按质量比料:球:水=1:1.2-1.5:1-1.2,湿球磨24-28h。
进一步的,所述步骤(2)中,釉料湿球磨时,按质量比料:球:水=1:1.6-2:1.2-1.5,湿球磨32-36h。
进一步的,所述釉料的施釉方式为喷釉。
进一步的,所述釉料的施釉厚度为0.08-0.12mm。
进一步的,所述步骤(3)中磁选机的磁场强度为19000-21000GS。
进一步的,所述步骤(4)中,泥料除气后,陈泥7-9天后,再干燥制成粗坯。
由上述对本发明的描述可知,与现有技术相比,本发明的有益效果是:本发明采用钙长石、伊利石、石英、硅灰石为基础原料,通过加入海泡石、蛭石粉、赤玉土以提高制成的日用瓷的抗折强度和热稳定性,同时降低了坯体的烧结温度,降低了生产成本;通过在素坯表面彩绘图案以增加日用瓷的装饰效果,并在彩绘图案上施加釉料以保护彩绘图案和增加制得的日用瓷的抗折强度,釉料经过磁选机多次除铁,使最后釉料的颜色接近透明,防止影响彩绘图案的装饰效果。
具体实施方式
以下通过具体实施方式对本发明作进一步的描述。
釉下彩日用瓷包括坯体和釉料,坯体包括以下重量份原料:钙长石15-18份、伊利石25-30份、石英30-40份、硅灰石12-15份、海泡石8-10份、蛭石粉5-8份、赤玉土3-5份、氯化镁1-3份、氧化钛1.8-2.5份、碳酸锶0.8-1.2份、氧化锡0.5-0.8份;
釉料包括以下重量份的原料:熔块30-40份、叶腊石8-10份、高岭土15-22份、石英20-25份、硅酸锆5-8份、蛤粉4-8份、氧化钴3-5份、钛白粉1-3份、磷酸钙1-2份、氧化钡0.5-0.8份;
熔块的化学百分含量为:SiO2:58-65%、Al2O3:13-16%、MgO:2-4%、Na2O:6-8%、CaCO3:5-8%、La2O3:4.7-5.2%、SnCl2:1-2%、TiO2:0.5-0.7%、SrCO3:0.3-0.6%;
其制备工艺包括以下步骤:
(1)将坯体的原料按其配比称重后,混合破碎,过筛后,湿球磨制得泥料;
(2)将釉料的原料按其配比称重后,经破碎机破碎,过筛后,湿球磨制得釉料;
(3)将步骤(2)制得的釉料经过磁选机多次除铁至釉料中的铁含量低于0.05%;
(4)将泥料进行除气、陈泥7-9天后,干燥制成粗坯;
(5)将坯体经过粗修、细修、精修后得精坯;
(6)将制得的精坯放入窑炉中煅烧,煅烧温度720-780℃、煅烧周期3-4小时,制得素坯;
(7)在素坯上彩绘图案,然后将制得的釉料施加在彩绘后的素坯上,放入窑炉中,升温至880-920℃,在氧化的氛围下烧结3.2-3.8h,然后继续升温至1020-1060℃,在还原气氛下烧结4-4.5h,得到所述日用瓷。
具体的,步骤(1)中,泥料湿球磨时,按质量比料:球:水=1:1.2-1.5:1-1.2,湿球磨24-28h。
步骤(2)中,釉料湿球磨时,按质量比料:球:水=1:1.6-2:1.2-1.5,湿球磨32-36h。
步骤(3)中磁选机的磁场强度为19000-21000GS。
釉料的施釉方式为喷釉。
釉料的施釉厚度为0.08-0.12mm。
实施例1
釉下彩日用瓷包括坯体和釉料,坯体包括以下重量份原料:钙长石15份、伊利石30份、石英30份、硅灰石15份、海泡石8份、蛭石粉8份、赤玉土3份、氯化镁3份、氧化钛1.8份、碳酸锶1.2份、氧化锡0.5份;
釉料包括以下重量份的原料:熔块30份、叶腊石10份、高岭土15份、石英25份、硅酸锆5份、蛤粉8份、氧化钴3份、钛白粉3份、磷酸钙1份、氧化钡0.8份;
熔块的化学百分含量为:SiO2:58%、Al2O3:16%、MgO:2%、Na2O:8%、CaCO3:8%、La2O3:5.2%、SnCl2:2%、TiO2:0.5%、SrCO3:0.3%;
其制备工艺包括以下步骤:
(1)将坯体的原料按其配比称重后,混合破碎,过筛后,湿球磨制得泥料;
(2)将釉料的原料按其配比称重后,经破碎机破碎,过筛后,湿球磨制得釉料;
(3)将步骤(2)制得的釉料经过磁选机多次除铁至釉料中的铁含量低于0.05%;
(4)将泥料进行除气、陈泥9天后,干燥制成粗坯;
(5)将坯体经过粗修、细修、精修后得精坯;
(6)将制得的精坯放入窑炉中煅烧,煅烧温度780℃、煅烧周期3小时,制得素坯;
(7)在素坯上彩绘图案,然后将制得的釉料施加在彩绘后的素坯上,放入窑炉中,升温至880℃,在氧化的氛围下烧结3.8h,然后继续升温至1020℃,在还原气氛下烧结4.5h,得到所述日用瓷。
具体的,步骤(1)中,泥料湿球磨时,按质量比料:球:水=1:1.2:1,湿球磨28h。
步骤(2)中,釉料湿球磨时,按质量比料:球:水=1:2:1.5,湿球磨32h。
步骤(3)中磁选机的磁场强度为19000GS。
釉料的施釉方式为喷釉。
釉料的施釉厚度为0.08mm。
将上述制得的日用瓷经试验获得如下性能参数:
实施例2
釉下彩日用瓷包括坯体和釉料,坯体包括以下重量份原料:钙长石18份、伊利石25份、石英40份、硅灰石12份、海泡石10份、蛭石粉5份、赤玉土5份、氯化镁1份、氧化钛2.5份、碳酸锶0.8份、氧化锡0.8份;
釉料包括以下重量份的原料:熔块40份、叶腊石8份、高岭土22份、石英20份、硅酸锆8份、蛤粉4份、氧化钴5份、钛白粉1份、磷酸钙2份、氧化钡0.5份;
熔块的化学百分含量为:SiO2:65%、Al2O3:13%、MgO:4%、Na2O:6%、CaCO3:5%、La2O3:4.7%、SnCl2:1%、TiO2:0.7%、SrCO3:0.6%;
其制备工艺包括以下步骤:
(1)将坯体的原料按其配比称重后,混合破碎,过筛后,湿球磨制得泥料;
(2)将釉料的原料按其配比称重后,经破碎机破碎,过筛后,湿球磨制得釉料;
(3)将步骤(2)制得的釉料经过磁选机多次除铁至釉料中的铁含量低于0.05%;
(4)将泥料进行除气、陈泥7天后,干燥制成粗坯;
(5)将坯体经过粗修、细修、精修后得精坯;
(6)将制得的精坯放入窑炉中煅烧,煅烧温度720℃、煅烧周期4小时,制得素坯;
(7)在素坯上彩绘图案,然后将制得的釉料施加在彩绘后的素坯上,放入窑炉中,升温至920℃,在氧化的氛围下烧结3.2h,然后继续升温至1060℃,在还原气氛下烧结4h,得到所述日用瓷。
具体的,步骤(1)中,泥料湿球磨时,按质量比料:球:水=1:1.5:1.2,湿球磨24h。
步骤(2)中,釉料湿球磨时,按质量比料:球:水=1:1.6:1.2,湿球磨36h。
步骤(3)中磁选机的磁场强度为21000GS。
釉料的施釉方式为喷釉。
釉料的施釉厚度为0.12mm。
实施例3
釉下彩日用瓷包括坯体和釉料,坯体包括以下重量份原料:钙长石16份、伊利石27份、石英35份、硅灰石13份、海泡石9份、蛭石粉7份、赤玉土4份、氯化镁2份、氧化钛2.2份、碳酸锶1份、氧化锡0.6份;
釉料包括以下重量份的原料:熔块35份、叶腊石9份、高岭土18份、石英22份、硅酸锆7份、蛤粉6份、氧化钴4份、钛白粉2份、磷酸钙1.5份、氧化钡0.6份;
熔块的化学百分含量为:SiO2:63%、Al2O3:14%、MgO:3%、Na2O:7%、CaCO3:6%、La2O3:4.5%、SnCl2:1.5%、TiO2:0.6%、SrCO3:0.4%;
其制备工艺包括以下步骤:
(1)将坯体的原料按其配比称重后,混合破碎,过筛后,湿球磨制得泥料;
(2)将釉料的原料按其配比称重后,经破碎机破碎,过筛后,湿球磨制得釉料;
(3)将步骤(2)制得的釉料经过磁选机多次除铁至釉料中的铁含量低于0.05%;
(4)将泥料进行除气、陈泥8天后,干燥制成粗坯;
(5)将坯体经过粗修、细修、精修后得精坯;
(6)将制得的精坯放入窑炉中煅烧,煅烧温度750℃、煅烧周期3.5小时,制得素坯;
(7)在素坯上彩绘图案,然后将制得的釉料施加在彩绘后的素坯上,放入窑炉中,升温至900℃,在氧化的氛围下烧结3.5h,然后继续升温至1040℃,在还原气氛下烧结4.2h,得到所述日用瓷。
具体的,步骤(1)中,泥料湿球磨时,按质量比料:球:水=1:1.3:1.1,湿球磨26h。
步骤(2)中,釉料湿球磨时,按质量比料:球:水=1:1.8:1.4,湿球磨34h。
步骤(3)中磁选机的磁场强度为20000GS。
釉料的施釉方式为喷釉。
釉料的施釉厚度为0.10mm。
上述三个实施例与现有的日用瓷经试验获得如下的性能参数:
表1各实施例的性能参数表
通过表1可知,采用本方法制得的日用瓷其抗折强度高、热稳定性好,在300℃至20℃热交换一次不炸裂,并且坯体上彩绘有图案,增加日用瓷的整体美观性。
以上所述,仅为本发明的较佳实施例而已,故不能以此限定本发明实施的范围,即依本发明申请专利范围及说明书内容所作的等效变化与修饰,皆应仍属本发明专利涵盖的范围内。

Claims (7)

1.釉下彩日用瓷的制备工艺,其特征在于:所述日用瓷包括坯体和釉料,所述坯体包括以下重量份原料:钙长石15-18份、伊利石25-30份、石英30-40份、硅灰石12-15份、海泡石8-10份、蛭石粉5-8份、赤玉土3-5份、氯化镁1-3份、氧化钛1.8-2.5份、碳酸锶0.8-1.2份、氧化锡0.5-0.8份;
所述釉料包括以下重量份的原料:熔块30-40份、叶腊石8-10份、高岭土15-22份、石英20-25份、硅酸锆5-8份、蛤粉4-8份、氧化钴3-5份、钛白粉1-3份、磷酸钙1-2份、氧化钡0.5-0.8份;
所述熔块的化学百分含量为:SiO2:58-65%、Al2O3:13-16%、MgO:2-4%、Na2O:6-8%、CaCO3:5-8%、La2O3:4.7-5.2%、SnCl2:1-2%、TiO2:0.5-0.7%、SrCO3:0.3-0.6%;
其制备工艺包括以下步骤:
(1)将坯体的原料按其配比称重后,混合破碎,过筛后,湿球磨制得泥料;
(2)将釉料的原料按其配比称重后,经破碎机破碎,过筛后,湿球磨制得釉料;
(3)将步骤(2)制得的釉料经过磁选机多次除铁至釉料中的铁含量低于0.05%;
(4)将泥料进行除气、陈泥后,干燥制成粗坯;
(5)将坯体经过粗修、细修、精修后得精坯;
(6)将制得的精坯放入窑炉中煅烧,煅烧温度720-780℃、煅烧周期3-4小时,制得素坯;
(7)在素坯上彩绘图案,然后将制得的釉料施加在彩绘后的素坯上,放入窑炉中,升温至880-920℃,在氧化的氛围下烧结3.2-3.8h,然后继续升温至1020-1060℃,在还原气氛下烧结4-4.5h,得到所述日用瓷。
2.根据权利要求1所述的釉下彩日用瓷的制备工艺,其特征在于:所述步骤(1)中,泥料湿球磨时,按质量比料:球:水=1:1.2-1.5:1-1.2,湿球磨24-28h。
3.根据权利要求1所述的釉下彩日用瓷的制备工艺,其特征在于:所述步骤(2)中,釉料湿球磨时,按质量比料:球:水=1:1.6-2:1.2-1.5,湿球磨32-36h。
4.根据权利要求1所述的釉下彩日用瓷的制备工艺,其特征在于:所述釉料的施釉方式为喷釉。
5.根据权利要求1所述的釉下彩日用瓷的制备工艺,其特征在于:所述釉料的施釉厚度为0.08-0.12mm。
6.根据权利要求1所述的釉下彩日用瓷的制备工艺,其特征在于:所述步骤(3)中磁选机的磁场强度为19000-21000GS。
7.根据权利要求1所述的釉下彩日用瓷的制备工艺,其特征在于:所述步骤(4)中,泥料除气后,陈泥7-9天后,再干燥制成粗坯。
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