CN109957766B - Coating device of double-sided coating production line - Google Patents
Coating device of double-sided coating production line Download PDFInfo
- Publication number
- CN109957766B CN109957766B CN201711336448.0A CN201711336448A CN109957766B CN 109957766 B CN109957766 B CN 109957766B CN 201711336448 A CN201711336448 A CN 201711336448A CN 109957766 B CN109957766 B CN 109957766B
- Authority
- CN
- China
- Prior art keywords
- double
- coating
- production line
- box body
- rotating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a coating device of a double-sided coating production line, which comprises a coating box body and a magnetron sputtering device, wherein the magnetron sputtering device is arranged in the box body; still be equipped with rotating assembly in the box, rotating assembly includes rotating electrical machines and swivel mount, the both sides of swivel mount are equipped with the positioning disk, the positioning disk passes through motor drive and rotates, rotating electrical machines drive swivel mount rotates, be equipped with the recess on the positioning disk, the substrate erects in the recess. The coating device of the double-sided coating production line has good crystallization performance and improves the sputtering effect.
Description
Technical Field
The invention relates to the technical field of glass coating structures, in particular to a coating device of a double-sided coating production line.
Background
Coated glass (Coated glass) is also known as reflective glass. The coated glass is prepared by coating one or more layers of metal, alloy or metal compound films on the surface of glass to change the optical performance of the glass and meet certain specific requirements. The coated glass can be divided into the following types according to different characteristics of products: heat reflective glass, Low emissivity glass (Low-E), conductive film glass, and the like.
The production methods of coated glass are many, and mainly include a vacuum magnetron sputtering method, a vacuum evaporation method, a chemical vapor deposition method, a sol-gel method and the like. The magnetron sputtering coated glass can be designed and manufactured into a multilayer complex film system by utilizing a magnetron sputtering technology, can be coated with various colors on a white glass substrate, has better corrosion resistance and wear resistance of a film layer, and is one of the most produced and used products. The variety and quality of vacuum evaporation coated glass have certain differences compared with magnetron sputtering coated glass, and the vacuum evaporation coated glass is gradually replaced by a vacuum sputtering method. The chemical vapor deposition method is to introduce reaction gas into float glass production line to decompose on the surface of glowing glass and to deposit on the surface of glass uniformly to form coated glass. The method has the characteristics of less equipment investment, easy regulation, low product cost, good chemical stability, and capability of carrying out hot processing, and is one of the production methods with the most development prospects. The sol-gel method for producing the coated glass has simple process and good stability, and has the defects of high light transmittance and poor decoration of the product.
The prior film coating equipment adopts a double-sided film coating mode, the equipment is provided with a front side and a back side which are distinguished, targets are arranged on two sides of the equipment simultaneously, a substrate frame for loading glass is also divided into the front side and the back side, a heater is arranged at the central position of a vacuum chamber and is integrated up and down, the glass is suspended and hung in a hoisting mode, the glass is loaded on the front side and the back side of the substrate frame respectively during the film coating process, the substrate frame with the glass is moved in the vacuum chamber during the film coating, the front side and the back side of the substrate frame are respectively positioned at two sides of a middle heater, the film coating is carried out in a magnetron sputtering mode through a target area, the mode only can plate one side of the glass once, if the other side of the glass needs to be coated with the film, the glass coated with one side is cleaned again after being coated with the glass, and then the film coating is carried out through the vacuum chamber again, namely, the film coating process needs to be repeated twice, thus manpower is wasted, the two times of film coating can be carried out, The financial resources and the yield are low, and the yield of the glass is greatly reduced after the glass is circulated for many times.
The structural design of the whole vacuum cavity can only complete the film preparation of a single surface of a glass substrate once, if films are required to be prepared on two surfaces of the glass substrate, the method in the prior art can only complete the preparation of a second film layer by repeating the first film coating process on the glass substrate after the film layer on one surface of the glass substrate is prepared, the process can influence the performance of the first film layer in the process of preparing the film layer for the second time, and the overall production cost is higher because the yield is reduced due to the secondary film coating.
Disclosure of Invention
The technical problem to be solved by the invention is as follows: aiming at the technical problems in the prior art, the invention provides the coating device for the double-sided coating production line, which has good crystallization performance and improves the sputtering effect.
In order to solve the technical problems, the technical scheme provided by the invention is as follows:
a coating device of a double-sided coating production line comprises a coating box body and a magnetron sputtering device, wherein the magnetron sputtering device is arranged in the box body, a magnet is arranged at the position of a substrate frame in the box body, and a side plate of the box body is provided with a magnetic field; still be equipped with rotating assembly in the box, rotating assembly includes rotating electrical machines and swivel mount, the both sides of swivel mount are equipped with the positioning disk, the positioning disk passes through motor drive and rotates, rotating electrical machines drive swivel mount rotates, be equipped with the recess on the positioning disk, the substrate erects in the recess.
As a further improvement of the above technical solution:
the magnetic field is arranged on a door plate of the box body.
The number of the magnetic fields is two.
And a bearing is arranged between the positioning disc and the rotating frame.
The rotating motor is located below the bottom plate of the box body and connected with the rotating frame through a rotating shaft, and a bearing is arranged between the rotating shaft and the bottom plate.
The magnet is located below the rotating frame.
Compared with the prior art, the invention has the advantages that:
the coating device of the double-sided coating production line has the advantages that the concentration of ions in a sputtering space is greatly improved by an external magnetic field, and the crystallization performance is good. The film coating device of the double-sided film coating production line is provided with the rotating frame and the positioning disc, the direction of the substrate frame is changed through the rotation of the positioning disc, the double-sided film coating of the substrate frame is completed, the position of the substrate frame can be adjusted through the rotating frame, and the sputtering effect is improved.
Drawings
FIG. 1 is a schematic diagram of the structure of the magnetic field of the present invention.
Fig. 2 is a schematic structural view of the rotating frame of the present invention.
Description of the figure numbers:
1. a box body; 2. a rotating electric machine; 3. a rotating frame; 4. positioning a plate; 41. a groove; 5. a rotating shaft; 6. a magnetic field.
Detailed Description
The following detailed description of embodiments of the invention refers to the accompanying drawings. It should be understood that the detailed description and specific examples, while indicating the present invention, are given by way of illustration and explanation only, not limitation.
Fig. 1 and 2 show an embodiment of a coating device of a double-sided coating production line according to the invention, and as shown in fig. 1 and 2, the coating device of the double-sided coating production line of the embodiment comprises a coating box body 1 and a magnetron sputtering device, wherein the magnetron sputtering device is arranged in the box body 1, a magnet is arranged at a substrate holder position in the box body 1, and a magnetic field 6 is arranged on a side plate of the box body 1; still be equipped with rotating assembly in the box 1, rotating assembly includes rotating electrical machines 2 and swivel mount 3, and the both sides of swivel mount 3 are equipped with positioning disk 4, and positioning disk 4 passes through motor drive and rotates, and rotating electrical machines 2 drive swivel mount 3 rotates, is equipped with recess 41 on the positioning disk 4, and the substrate erects in recess 41.
In this embodiment, the magnetic field 6 is provided on the door panel of the box body 1, and the number of the magnetic field 6 is two. The external magnetic field 6 greatly improves the ion concentration in the sputtering space, the sputtering target ions form a glow appearance under the action of the magnetic field 6, the self-bias voltage is reduced, and the deposition rate of the film is improved. These changes are also caused by the action of the magnetic field 6 on the ions. The magnetic field 6 causes a large change in the appearance of the deposited film, which also causes a change in the intrinsic microstructure of the film. The crystallinity of the deposited film varies for substrates at different positions in the magnetic field 6. Note that the deposition rates of the films are different when the substrate is placed at different positions in the magnetic field 6, and the lower the deposition rate, the better the crystallinity of the film.
In this embodiment, a bearing is provided between the positioning plate 4 and the rotating frame 3.
In this embodiment, rotating electrical machines 2 is located the below of 1 bottom plate of box, and rotating electrical machines 2 is connected with swivel mount 3 through pivot 5, is equipped with the bearing between pivot 5 and the bottom plate.
In this embodiment, the magnet is located below the rotating frame 3.
According to the film coating device of the double-sided film coating production line, the two substrate frames are fixed in the groove 41, and after the first side of the substrate is coated with a film, the positioning disc 4 is rotated to coat the second side of the substrate; the position of the substrate during sputtering is adjusted by rotating the rotating frame 3 to achieve the best coating effect.
When the large-area substrate is coated, the substrate frame is fixed in the grooves 41 of the two positioning discs 4, and after the first surface is coated, the rotating frame 3 is rotated to coat the second surface.
The foregoing is considered as illustrative of the preferred embodiments of the invention and is not to be construed as limiting the invention in any way. Although the present invention has been described with reference to the preferred embodiments, it is not intended to be limited thereto. Therefore, any simple modification, equivalent change and modification made to the above embodiments according to the technical spirit of the present invention should fall within the protection scope of the technical scheme of the present invention, unless the technical spirit of the present invention departs from the content of the technical scheme of the present invention.
Claims (6)
1. The coating device of the double-sided coating production line is characterized by comprising a coating box body (1) and a magnetron sputtering device, wherein the magnetron sputtering device is arranged in the box body (1), a magnet is arranged at a substrate rack position in the box body (1), and a side plate of the box body (1) is provided with a magnetic field (6); still be equipped with rotating assembly in box (1), rotating assembly includes rotating electrical machines (2) and swivel mount (3), the both sides of swivel mount (3) are equipped with positioning disk (4), positioning disk (4) rotate through motor drive, rotating electrical machines (2) drive swivel mount (3) rotate, be equipped with recess (41) on positioning disk (4), the substrate erects in recess (41).
2. The coating device of a double-sided coating production line according to claim 1, wherein the magnetic field (6) is provided on a door panel of the box body (1).
3. The coating device of a double-sided coating production line according to claim 2, wherein two magnetic fields (6) are provided.
4. The coating device of a double-sided coating production line according to claim 1, wherein a bearing is arranged between the positioning plate (4) and the rotating frame (3).
5. The coating device of a double-sided coating production line according to claim 1, wherein the rotating motor (2) is located below a bottom plate of the box body (1), the rotating motor (2) is connected with the rotating frame (3) through a rotating shaft (5), and a bearing is arranged between the rotating shaft (5) and the bottom plate.
6. The coating device of a double-sided coating production line according to claim 1, wherein the magnet is located below the rotating frame (3).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711336448.0A CN109957766B (en) | 2017-12-14 | 2017-12-14 | Coating device of double-sided coating production line |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711336448.0A CN109957766B (en) | 2017-12-14 | 2017-12-14 | Coating device of double-sided coating production line |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN109957766A CN109957766A (en) | 2019-07-02 |
| CN109957766B true CN109957766B (en) | 2021-09-28 |
Family
ID=67017692
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201711336448.0A Active CN109957766B (en) | 2017-12-14 | 2017-12-14 | Coating device of double-sided coating production line |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109957766B (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN201272828Y (en) * | 2008-08-18 | 2009-07-15 | 凌嘉科技股份有限公司 | Quick-dismantling structure for inner-transmission rotating shaft unit |
| CN101886248A (en) * | 2009-05-15 | 2010-11-17 | 鸿富锦精密工业（深圳）有限公司 | Sputtering coating device |
| CN102330057A (en) * | 2011-06-14 | 2012-01-25 | 星弧涂层科技(苏州工业园区)有限公司 | Method for preparing metal ruthenium film for hard semiconductor component |
| CN102453880A (en) * | 2010-11-01 | 2012-05-16 | 上海纳米技术及应用国家工程研究中心有限公司 | Method for improving uniformity of magnetron sputtering thin film |
| CN106835049A (en) * | 2017-03-14 | 2017-06-13 | 凯盛科技股份有限公司 | A kind of method of glass substrate vacuum coating fluctuating plate |
-
2017
- 2017-12-14 CN CN201711336448.0A patent/CN109957766B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN201272828Y (en) * | 2008-08-18 | 2009-07-15 | 凌嘉科技股份有限公司 | Quick-dismantling structure for inner-transmission rotating shaft unit |
| CN101886248A (en) * | 2009-05-15 | 2010-11-17 | 鸿富锦精密工业（深圳）有限公司 | Sputtering coating device |
| CN102453880A (en) * | 2010-11-01 | 2012-05-16 | 上海纳米技术及应用国家工程研究中心有限公司 | Method for improving uniformity of magnetron sputtering thin film |
| CN102330057A (en) * | 2011-06-14 | 2012-01-25 | 星弧涂层科技(苏州工业园区)有限公司 | Method for preparing metal ruthenium film for hard semiconductor component |
| CN106835049A (en) * | 2017-03-14 | 2017-06-13 | 凯盛科技股份有限公司 | A kind of method of glass substrate vacuum coating fluctuating plate |
Also Published As
| Publication number | Publication date |
|---|---|
| CN109957766A (en) | 2019-07-02 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN105543792B (en) | Magnetic control sputtering device and magnetically controlled sputter method | |
| CN103358619B (en) | High-transparency can the two silver low-radiation coated glass of tempering and preparation method thereof | |
| US2886502A (en) | Cathodic sputtering of metal and dielectric films | |
| CN107740059B (en) | Ionization method of electrochromic device, preparation method and product | |
| CN1718847A (en) | Pair target twin magnetic controlled sputtering ion plating deposition device | |
| CN203391418U (en) | High permeable type temperable double-silver low-emissivity coated glass | |
| CN110467356B (en) | Coated glass apparatus for producing | |
| CN101634012A (en) | Ion beam assisting magnetic control sputtering deposition device and method for surface protection | |
| CN109957766B (en) | Coating device of double-sided coating production line | |
| US20120128948A1 (en) | Coated article and method for manufacturing same | |
| CN101403101A (en) | Quick solid-ceramic coating ion plating apparatus | |
| CN204714886U (en) | Two-way deposition plating apparatus | |
| CN103265182A (en) | Manufacturing method of low emissivity (Low-e) glass | |
| CN109957767A (en) | Transmission rotating device for double-sided glass plated film | |
| CN202181344U (en) | Vacuum film coating device | |
| CN109912233A (en) | The three glass evacuated coating film production lines of silver medal LOW-E | |
| CN211921682U (en) | Substrate bearing and shielding device applied in vacuum coating machine | |
| CN109913847A (en) | The glass evacuated magnetron sputtering film production line of LOW-E | |
| CN109957782A (en) | Mobile phone glass cover board metal flag vacuum coating production line | |
| CN112194384A (en) | Coated glass processing technology | |
| CN103074586B (en) | Low-temperature and low-damage multifunctional composite coating device and method | |
| CN107293605A (en) | Back electrode of solar cell and solar cell and preparation method thereof | |
| CN109957770A (en) | Vehicle glass continuous coating production line | |
| CN109957771A (en) | Hand-set lid color film horizontal film coating production line | |
| CN109957769A (en) | Arc glass vacuum magnetron sputtering coating film production line |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |