CN112194384A - Coated glass processing technology - Google Patents
Coated glass processing technology Download PDFInfo
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- CN112194384A CN112194384A CN202011155861.9A CN202011155861A CN112194384A CN 112194384 A CN112194384 A CN 112194384A CN 202011155861 A CN202011155861 A CN 202011155861A CN 112194384 A CN112194384 A CN 112194384A
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- coating
- glass
- chamber
- magnetron sputtering
- vacuum magnetron
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- 239000011521 glass Substances 0.000 title claims abstract description 117
- 238000005516 engineering process Methods 0.000 title claims abstract description 11
- 238000000576 coating method Methods 0.000 claims abstract description 137
- 239000011248 coating agent Substances 0.000 claims abstract description 126
- 238000001755 magnetron sputter deposition Methods 0.000 claims abstract description 60
- 238000000034 method Methods 0.000 claims abstract description 30
- 238000004140 cleaning Methods 0.000 claims abstract description 27
- 230000001681 protective effect Effects 0.000 claims abstract description 23
- 238000005520 cutting process Methods 0.000 claims abstract description 12
- 238000002360 preparation method Methods 0.000 claims abstract description 11
- 238000007605 air drying Methods 0.000 claims abstract description 6
- 238000007688 edging Methods 0.000 claims abstract description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 64
- 239000008367 deionised water Substances 0.000 claims description 27
- 229910021641 deionized water Inorganic materials 0.000 claims description 27
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 10
- 238000007599 discharging Methods 0.000 claims description 10
- 238000005406 washing Methods 0.000 claims description 10
- 230000008569 process Effects 0.000 claims description 8
- 239000007789 gas Substances 0.000 claims description 7
- 230000003287 optical effect Effects 0.000 claims description 6
- 239000004677 Nylon Substances 0.000 claims description 5
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 5
- 239000000428 dust Substances 0.000 claims description 5
- 238000007689 inspection Methods 0.000 claims description 5
- 229910052757 nitrogen Inorganic materials 0.000 claims description 5
- 229920001778 nylon Polymers 0.000 claims description 5
- 238000004806 packaging method and process Methods 0.000 claims description 5
- 239000000843 powder Substances 0.000 claims description 5
- 235000012239 silicon dioxide Nutrition 0.000 claims description 5
- 239000000377 silicon dioxide Substances 0.000 claims description 5
- 229910052709 silver Inorganic materials 0.000 claims description 5
- 239000004332 silver Substances 0.000 claims description 5
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 5
- 229910001887 tin oxide Inorganic materials 0.000 claims description 5
- 238000002834 transmittance Methods 0.000 claims description 5
- 239000010410 layer Substances 0.000 abstract description 46
- 239000011247 coating layer Substances 0.000 abstract description 3
- 150000001768 cations Chemical class 0.000 description 9
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 6
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 6
- 239000003729 cation exchange resin Substances 0.000 description 6
- 150000007522 mineralic acids Chemical class 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 239000002253 acid Substances 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 239000003957 anion exchange resin Substances 0.000 description 3
- 150000001450 anions Chemical class 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 229910003460 diamond Inorganic materials 0.000 description 3
- 239000010432 diamond Substances 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 238000000227 grinding Methods 0.000 description 3
- -1 i.e. Substances 0.000 description 3
- 238000007373 indentation Methods 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 238000007517 polishing process Methods 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 238000000151 deposition Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000005344 low-emissivity glass Substances 0.000 description 2
- 239000002352 surface water Substances 0.000 description 2
- 239000013077 target material Substances 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3613—Coatings of type glass/inorganic compound/metal/inorganic compound/metal/other
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3639—Multilayers containing at least two functional metal layers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
Abstract
The invention discloses a coated glass processing technology, which comprises the following processing steps: s1, pretreating the glass sheet, cutting the glass sheet, and edging and chamfering the glass; s2, cleaning and air drying; s3, preparing coating, and entering a preparation chamber: after being cleaned, the glass waits to enter a coating chamber in a working procedure chamber, and after being cleaned, the glass waits to enter the coating chamber in the working procedure chamber, wherein the working procedure chamber adopts micro positive pressure; and S4, coating, namely, coating a first layer of dielectric film on the first vacuum magnetron sputtering coating chamber, coating a first layer of functional film and a protective film on the second vacuum magnetron sputtering coating chamber, coating a second layer of dielectric film on the third vacuum magnetron sputtering coating chamber, coating a second layer of functional film and a protective film on the fourth vacuum magnetron sputtering coating chamber, and coating an outer layer of protective film on the fifth vacuum magnetron sputtering coating chamber. The stability among the coating layers is improved and the yield is ensured by carrying out layered coating on the vacuum magnetron sputtering coating chambers.
Description
Technical Field
The invention relates to the technical field of coated glass processing, in particular to a coated glass processing technology.
Background
Coated glass is also known as reflective glass. The coated glass is prepared by coating one or more layers of metal, alloy or metal compound films on the surface of glass to change the optical performance of the glass and meet certain specific requirements. The coated glass can be divided into the following types according to different characteristics of products: heat reflective glass, Low emissivity glass (Low-E), conductive film glass, and the like. The production method of the coated glass mainly comprises a vacuum magnetron sputtering method, a vacuum evaporation method, a chemical vapor deposition method, a sol-gel method and the like, wherein the vacuum magnetron sputtering coating is sent into a sputtering chamber provided with a cathode by a conveying roller way, and different target materials and process gases are selected according to the requirements of a film layer. In the coating chamber, negative voltage is applied on the cathode, and permanent magnetic steel is arranged behind the target and fixed on the top surface (the surface facing to the glass) of the cathode. Under the action of the electric field, glow discharge starts to form plasma, and positive gas ions in the plasma are attracted by negative charges of the target material and fly to the target surface. When the target surface material is impacted strongly enough, the atoms on the target are ejected and sputtered onto the glass surface, and a layer of atomic particle aligned film is formed.
The existing coated glass is easy to have the condition of local shedding in the coating process, and the stability of a coating is difficult to ensure.
Disclosure of Invention
The invention aims to provide a coated glass processing technology, which solves the problems that the existing coated glass is easy to fall off locally in the coating process, and the stability of a coating is difficult to ensure.
In order to solve the technical problems, the invention adopts the following technical scheme:
a processing technology of coated glass is characterized in that: the method comprises the following processing steps: s1, pretreating the glass sheet, cutting the glass sheet, and edging and chamfering the glass; s2, cleaning and air drying; s3, preparing coating, and entering a preparation chamber: after being cleaned, the glass waits to enter a coating chamber in a working procedure chamber, and after being cleaned, the glass waits to enter the coating chamber in the working procedure chamber, wherein the working procedure chamber adopts micro positive pressure; s4, coating, namely, coating a first layer of dielectric film on a first vacuum magnetron sputtering coating chamber, coating a first layer of functional film and a protective film on a second vacuum magnetron sputtering coating chamber, coating a second layer of dielectric film on a third vacuum magnetron sputtering coating chamber, coating a second layer of functional film and a protective film on a fourth vacuum magnetron sputtering coating chamber, and coating an outer layer of protective film on a fifth vacuum magnetron sputtering coating chamber; s5, discharging the sheets, and discharging the sheets to a preparation room; s6, optical quality inspection, wherein a spectrophotometer is adopted to measure the transmittance and the reflectance; and S7, unloading, packaging and warehousing.
The further technical scheme is that before the cleaning in the step S2, a nylon brush is used for removing glass powder and dust on the surface of the glass.
In the step of S2 cleaning, firstly, the glass is sent into a glass cleaning machine and scrubbed by using cold water by using a high-speed horizontal roller brush, then the glass is sent into a washing chamber and washed by using hot water at the temperature of 35-45 ℃, and then the glass is sprayed and washed by using deionized water.
In the step of S4 coating, the vacuum degree of the first vacuum magnetron sputtering coating chamber, the second vacuum magnetron sputtering coating chamber, the third vacuum magnetron sputtering coating chamber, the fourth vacuum magnetron sputtering coating chamber and the fifth vacuum magnetron sputtering coating chamber is 9 x 10-5Pa to 9X 10-6Pa is between Pa.
In a further technical scheme, the meson gas used in the step of S4 coating is nitrogen.
According to a further technical scheme, in the S4 coating process, the dielectric film is a tin oxide film layer, the functional film is a silver film layer, and the protective film is a silicon dioxide film layer.
The further technical proposal is that the conductance value of the deionized water is less than or equal to 10 mu s/cm2The washing time of the deionized water is 40-50s, and the speed is 4-8 m/min.
Compared with the prior art, the invention has the beneficial effects that:
the process bombards a glass original sheet by plasma impact energy, removes a surface water film and forms a suede; and then sputtering and depositing a film on the suede, finally etching the film by using plasma to form suede transparent conductive glass, and performing layered coating on the suede transparent conductive glass in a plurality of vacuum magnetron sputtering coating chambers to improve the stability among the coating layers and ensure the yield.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is further described in detail with reference to the following examples. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
Example 1:
a processing technology of coated glass comprises the following processing steps: s1, pretreating the glass sheet, cutting the glass sheet, and edging and chamfering the glass; s2, cleaning and air drying; s3, preparing coating, and entering a preparation chamber: after being cleaned, the glass waits to enter a coating chamber in a working procedure chamber, and after being cleaned, the glass waits to enter the coating chamber in the working procedure chamber, wherein the working procedure chamber adopts micro positive pressure; s4, coating, namely, coating a first layer of dielectric film on a first vacuum magnetron sputtering coating chamber, coating a first layer of functional film and a protective film on a second vacuum magnetron sputtering coating chamber, coating a second layer of dielectric film on a third vacuum magnetron sputtering coating chamber, coating a second layer of functional film and a protective film on a fourth vacuum magnetron sputtering coating chamber, and coating an outer layer of protective film on a fifth vacuum magnetron sputtering coating chamber; s5, discharging the sheets, and discharging the sheets to a preparation room; s6, optical quality inspection, wherein a spectrophotometer is adopted to measure the transmittance and the reflectance; and S7, unloading, packaging and warehousing.
Specifically, in the step of S1, utilize vacuum chuck and roll-over stand to snatch the upset automatically and the level is placed on conveying platform with the former piece glass of vertical placing at the stripper platform, convey the cutting machine to the former piece. The cutting machine adopts high-hardness alloy rollers to continuously and uniformly press the surface of the glass by computer programming control. And then conveying the glass to a sheet breaking table, breaking the glass from the indentation, polishing the glass end by using a diamond grinding wheel, and performing water cooling in the polishing process.
And (S2) removing glass powder and dust on the surface of the glass by using a nylon brush before cleaning.
In the step of S2 cleaning, the glass is firstly sent into a glass cleaning machine and scrubbed by a high-speed horizontal roller brush with cold water, then the glass is sent into a washing chamber and washed by hot water with the temperature of 35 ℃, and then the glass is sprayed and washed by deionized water. And after cleaning, drying by hot air for later use. And the glass surface is cleaned completely by adopting multiple and staged cleaning.
Preparing deionized water: deionized water is prepared by passing water through cation exchange resin (such as styrene type strong acid cation exchange resin), so that cations in water are absorbed by the resin, and cations H + on the resin are replaced into water to form corresponding inorganic acid with the cations in water; the water containing the inorganic acid is then displaced into water by an anion exchange resin (e.g., a styrene-type strongly basic anion) OH-and combined with H + in the water to form water, i.e., deionized water.
In the step of S4 coating, the vacuum degree of the first vacuum magnetron sputtering coating chamber, the second vacuum magnetron sputtering coating chamber, the third vacuum magnetron sputtering coating chamber, the fourth vacuum magnetron sputtering coating chamber and the fifth vacuum magnetron sputtering coating chamber is 9 multiplied by 10-5Pa to 9X 10-6Pa is between Pa.
The meson gas used in the coating process of S4 is nitrogen.
In the S4 coating process, the dielectric film is a tin oxide film layer, the functional film is a silver film layer, and the protective film is a silicon dioxide film layer.
The conductivity value of the deionized water is less than or equal to 10 mu s/cm2The deionized water washing time was 40s, and the speed was 8 m/min.
Deionized water is adopted to ensure that the glass is cleaned, and the adhesive force of the first dielectric film layer is ensured to improve the stability of the plating layer.
Example 2:
a processing technology of coated glass comprises the following processing steps: s1, pretreating the glass sheet, cutting the glass sheet, and edging and chamfering the glass; s2, cleaning and air drying; s3, preparing coating, and entering a preparation chamber: after being cleaned, the glass waits to enter a coating chamber in a working procedure chamber, and after being cleaned, the glass waits to enter the coating chamber in the working procedure chamber, wherein the working procedure chamber adopts micro positive pressure; s4, coating, namely, coating a first layer of dielectric film on a first vacuum magnetron sputtering coating chamber, coating a first layer of functional film and a protective film on a second vacuum magnetron sputtering coating chamber, coating a second layer of dielectric film on a third vacuum magnetron sputtering coating chamber, coating a second layer of functional film and a protective film on a fourth vacuum magnetron sputtering coating chamber, and coating an outer layer of protective film on a fifth vacuum magnetron sputtering coating chamber; s5, discharging the sheets, and discharging the sheets to a preparation room; s6, optical quality inspection, wherein a spectrophotometer is adopted to measure the transmittance and the reflectance; and S7, unloading, packaging and warehousing.
Specifically, in the step of S1, utilize vacuum chuck and roll-over stand to snatch the upset automatically and the level is placed on conveying platform with the former piece glass of vertical placing at the stripper platform, convey the cutting machine to the former piece. The cutting machine adopts high-hardness alloy rollers to continuously and uniformly press the surface of the glass by computer programming control. And then conveying the glass to a sheet breaking table, breaking the glass from the indentation, polishing the glass end by using a diamond grinding wheel, and performing water cooling in the polishing process.
And (S2) removing glass powder and dust on the surface of the glass by using a nylon brush before cleaning.
In the step of S2 cleaning, the glass is firstly sent into a glass cleaning machine and scrubbed by a high-speed horizontal roller brush with cold water, then the glass is sent into a washing chamber and washed by hot water at 45 ℃, and then the glass is sprayed and washed by deionized water. And after cleaning, drying by hot air for later use. And the glass surface is cleaned completely by adopting multiple and staged cleaning.
Preparing deionized water: deionized water is prepared by passing water through cation exchange resin (such as styrene type strong acid cation exchange resin), so that cations in water are absorbed by the resin, and cations H + on the resin are replaced into water to form corresponding inorganic acid with the cations in water; the water containing the inorganic acid is then displaced into water by an anion exchange resin (e.g., a styrene-type strongly basic anion) OH-and combined with H + in the water to form water, i.e., deionized water.
In the step of S4 coating, the vacuum degree of the first vacuum magnetron sputtering coating chamber, the second vacuum magnetron sputtering coating chamber, the third vacuum magnetron sputtering coating chamber, the fourth vacuum magnetron sputtering coating chamber and the fifth vacuum magnetron sputtering coating chamber is 9 multiplied by 10-5Pa to 9X 10-6Pa is between Pa.
The meson gas used in the coating process of S4 is nitrogen.
In the S4 coating process, the dielectric film is a tin oxide film layer, the functional film is a silver film layer, and the protective film is a silicon dioxide film layer.
The conductivity value of the deionized water is less than or equal to 10 mu s/cm2The deionized water washing time was 50s, and the speed was 8 m/min.
Deionized water is adopted to ensure that the glass is cleaned, and the adhesive force of the first dielectric film layer is ensured to improve the stability of the plating layer.
Example 3:
a processing technology of coated glass comprises the following processing steps: s1, pretreating the glass sheet, cutting the glass sheet, and edging and chamfering the glass; s2, cleaning and air drying; s3, preparing coating, and entering a preparation chamber: after being cleaned, the glass waits to enter a coating chamber in a working procedure chamber, and after being cleaned, the glass waits to enter the coating chamber in the working procedure chamber, wherein the working procedure chamber adopts micro positive pressure; s4, coating, namely, coating a first layer of dielectric film on a first vacuum magnetron sputtering coating chamber, coating a first layer of functional film and a protective film on a second vacuum magnetron sputtering coating chamber, coating a second layer of dielectric film on a third vacuum magnetron sputtering coating chamber, coating a second layer of functional film and a protective film on a fourth vacuum magnetron sputtering coating chamber, and coating an outer layer of protective film on a fifth vacuum magnetron sputtering coating chamber; s5, discharging the sheets, and discharging the sheets to a preparation room; s6, optical quality inspection, wherein a spectrophotometer is adopted to measure the transmittance and the reflectance; and S7, unloading, packaging and warehousing.
Specifically, in the step of S1, utilize vacuum chuck and roll-over stand to snatch the upset automatically and the level is placed on conveying platform with the former piece glass of vertical placing at the stripper platform, convey the cutting machine to the former piece. The cutting machine adopts high-hardness alloy rollers to continuously and uniformly press the surface of the glass by computer programming control. And then conveying the glass to a sheet breaking table, breaking the glass from the indentation, polishing the glass end by using a diamond grinding wheel, and performing water cooling in the polishing process.
And (S2) removing glass powder and dust on the surface of the glass by using a nylon brush before cleaning.
In the step of S2 cleaning, the glass is firstly sent into a glass cleaning machine and scrubbed by a high-speed horizontal roller brush with cold water, then the glass is sent into a washing chamber and washed by hot water at 40 ℃, and then the glass is sprayed and washed by deionized water. And after cleaning, drying by hot air for later use. And the glass surface is cleaned completely by adopting multiple and staged cleaning.
Preparing deionized water: deionized water is prepared by passing water through cation exchange resin (such as styrene type strong acid cation exchange resin), so that cations in water are absorbed by the resin, and cations H + on the resin are replaced into water to form corresponding inorganic acid with the cations in water; the water containing the inorganic acid is then displaced into water by an anion exchange resin (e.g., a styrene-type strongly basic anion) OH-and combined with H + in the water to form water, i.e., deionized water.
In the step of S4 coating, the vacuum degree of the first vacuum magnetron sputtering coating chamber, the second vacuum magnetron sputtering coating chamber, the third vacuum magnetron sputtering coating chamber, the fourth vacuum magnetron sputtering coating chamber and the fifth vacuum magnetron sputtering coating chamber is 9 multiplied by 10-5Pa to 9X 10-6Pa is between Pa.
The meson gas used in the coating process of S4 is nitrogen.
In the S4 coating process, the dielectric film is a tin oxide film layer, the functional film is a silver film layer, and the protective film is a silicon dioxide film layer.
The conductivity value of the deionized water is less than or equal to 10 mu s/cm2The deionized water washing time was 45s, and the speed was 6 m/min.
Deionized water is adopted to ensure that the glass is cleaned, and the adhesive force of the first dielectric film layer is ensured to improve the stability of the plating layer.
The process bombards a glass original sheet by plasma impact energy, removes a surface water film and forms a suede; and then sputtering and depositing a film on the suede, finally etching the film by using plasma to form suede transparent conductive glass, and performing layered coating on the suede transparent conductive glass in a plurality of vacuum magnetron sputtering coating chambers to improve the stability among the coating layers and ensure the yield.
Although the invention has been described herein with reference to a number of illustrative embodiments thereof, it should be understood that numerous other modifications and embodiments can be devised by those skilled in the art that will fall within the spirit and scope of the principles of this disclosure. More specifically, various variations and modifications are possible in the component parts and/or arrangements of the subject combination arrangement within the scope of the disclosure and claims of this application. In addition to variations and modifications in the component parts and/or arrangements, other uses will also be apparent to those skilled in the art.
Claims (7)
1. A processing technology of coated glass is characterized in that: the method comprises the following processing steps: s1, pretreating the glass sheet, cutting the glass sheet, and edging and chamfering the glass; s2, cleaning and air drying; s3, preparing coating, and entering a preparation chamber: after being cleaned, the glass waits to enter a coating chamber in a working procedure chamber, and after being cleaned, the glass waits to enter the coating chamber in the working procedure chamber, wherein the working procedure chamber adopts micro positive pressure; s4, coating, namely, coating a first layer of dielectric film on a first vacuum magnetron sputtering coating chamber, coating a first layer of functional film and a protective film on a second vacuum magnetron sputtering coating chamber, coating a second layer of dielectric film on a third vacuum magnetron sputtering coating chamber, coating a second layer of functional film and a protective film on a fourth vacuum magnetron sputtering coating chamber, and coating an outer layer of protective film on a fifth vacuum magnetron sputtering coating chamber; s5, discharging the sheets, and discharging the sheets to a preparation room; s6, optical quality inspection, wherein a spectrophotometer is adopted to measure the transmittance and the reflectance; and S7, unloading, packaging and warehousing.
2. The process for processing coated glass according to claim 1, wherein: and removing glass powder and dust on the surface of the glass by using a nylon brush before cleaning in the step S2.
3. The process for processing coated glass according to claim 1, wherein: in the step of S2 cleaning, the glass is firstly sent into a glass cleaning machine and scrubbed by a high-speed horizontal roller brush with cold water, then the glass is sent into a washing chamber and washed by hot water with the temperature of 35-45 ℃, and then the glass is sprayed and washed by deionized water.
4. The process for processing coated glass according to claim 1, wherein: in the step of S4 coating, the vacuum degrees of the first vacuum magnetron sputtering coating chamber, the second vacuum magnetron sputtering coating chamber, the third vacuum magnetron sputtering coating chamber, the fourth vacuum magnetron sputtering coating chamber and the fifth vacuum magnetron sputtering coating chamber are 9 multiplied by 10-5Pa to 9X 10-6Pa is between Pa.
5. The process for processing coated glass according to claim 1, wherein: the meson gas used in the coating process of S4 is nitrogen.
6. The process for processing coated glass according to claim 1, wherein: in the S4 coating process, the dielectric film is a tin oxide film layer, the functional film is a silver film layer, and the protective film is a silicon dioxide film layer.
7. The coated glass processing technology of claim 3, wherein: the conductivity value of the deionized water is less than or equal to 10 mu s/cm2The washing time of the deionized water is 40-50s, and the speed is 4-8 m/min.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011155861.9A CN112194384A (en) | 2020-10-26 | 2020-10-26 | Coated glass processing technology |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011155861.9A CN112194384A (en) | 2020-10-26 | 2020-10-26 | Coated glass processing technology |
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| Publication Number | Publication Date |
|---|---|
| CN112194384A true CN112194384A (en) | 2021-01-08 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202011155861.9A Pending CN112194384A (en) | 2020-10-26 | 2020-10-26 | Coated glass processing technology |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114380513A (en) * | 2021-12-29 | 2022-04-22 | 凯盛信息显示材料(黄山)有限公司 | Glass coating process and coated glass prepared by same |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN101308882A (en) * | 2008-07-22 | 2008-11-19 | 东莞宏威数码机械有限公司 | Preparing method of transparent electricity conductive oxide suede |
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