CN109957769A - Arc glass vacuum magnetron sputtering coating film production line - Google Patents
Arc glass vacuum magnetron sputtering coating film production line Download PDFInfo
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- CN109957769A CN109957769A CN201711342043.8A CN201711342043A CN109957769A CN 109957769 A CN109957769 A CN 109957769A CN 201711342043 A CN201711342043 A CN 201711342043A CN 109957769 A CN109957769 A CN 109957769A
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- chamber
- magnetron sputtering
- production line
- quality inspection
- coating film
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
Abstract
The invention discloses arc glass vacuum magnetron sputtering coating film production lines, including sequentially connected upper section, inlet plenum, import buffer chamber, import transfer chamber, sputtering chamber, export transfer chamber, export buffer chamber, outlet chamber, quality inspection chamber and unload section, the upper section, inlet plenum, import buffer chamber, import transfer chamber, sputtering chamber, export transfer chamber, export buffer chamber, it outlet chamber and unloads and is equipped with sequentially connected transmission platform in section, plated film quality inspection bench and quality inspection system are equipped in the quality inspection chamber, transmission platform is connected with plated film quality inspection bench in the outlet chamber.Arc glass vacuum magnetron sputtering coating film production line provided by the invention can be realized the high-volume of all kinds of plated films, low cost production, and sputter deposition rate is high, and technique is versatile, is particularly suitable for large-scale industrial production.
Description
Technical field
The present invention relates to arc glass vacuum magnetron sputtering coating film production lines, belong to technical field of vacuum plating.
Background technique
Glass is important construction material, and with the continuous improvement required decorating building, glass is in building trade
In usage amount also constantly increase.However, people are when selecting the glass door and window of building now, in addition to considering its aesthetics with other than
It sees outside feature, more focuses on the problems such as control of its heat, refrigeration cost and internal sunlight project comfortable balance.This allows for plated film glass
Upstart in glass family --- Low-E glass is shown one's talent, and becomes focus concerned by people.
Low-E glass is also known as low emissivity glass, is to plate the film of multiple layer metal or other compounds composition in glass surface
It is product.Its film plating layer has to the characteristic of visible light high transmission and centering far infrared high reflection, make it with simple glass and
Traditional coated glass for building is compared, and has following clear superiority:
(1) excellent hot property
The heat loss of outer door glass is the major part of building energy consumption, accounts for 50% of building energy consumption or more.It is related
Research data shows that the heat transfer of interior surfaces of glass based on radiating, accounts for 58%, it means that subtract from the performance for changing glass
The loss of few thermal energy, most efficient method are to inhibit the radiation of its inner surface.The radiance of common float glass is up to 0.84, when
After plating one layer of low radiation film based on silver, radiance can be down to 0.1 or less.Therefore, it is built with Low-E glass manufacture
Object door and window is built, indoor heat caused by due to radiation can be substantially reduced to outdoor transmitting, reach ideal energy-saving effect.
Another significant benefit brought by the reduction of indoor thermal loss is environmental protection.Cold season, because of constructure heating
The discharge of the pernicious gases such as caused CO2, SO2 is important pollution sources.If using Low-E glass, due to heat loss
It reduces, can be greatly decreased because of fuel consumed by heating, to reduce the discharge of pernicious gas.
(2) good optical property
Low-E glass has high transmittance to visible light in sunlight, and up to 80% or more, and reflectivity is then very low, this
Make it compared with traditional coated glass, optical property is greatly taken on a new look.From outdoor viewing, appearance is more transparent, clear, that is, ensure that
The good daylighting of building in turn avoids light pollution caused by previous large-area glass curtain wall, the reflection of hollow glass door and window light
Phenomenon builds more soft, comfortable luminous environment.
The above-mentioned characteristic of Low-E glass makes it obtain increasingly extensive application in developed country.China is an energy
The relatively deficient country in source, the occupancy volume per person of the energy is very low, and building energy consumption has accounted for 27.5% or so of national total energy consumption.
Therefore, the production technology of Devoting Major Efforts To Developing Low-E glass and its application field is promoted, significant social benefit and economy will be brought
Benefit.
It is as follows to lead two kinds of Low-E glass making processes difference to be used both at home and abroad at present:
(1) online high temperature pyrolysis sedimentation
Online high temperature pyrolysis sedimentation is completed during float glass cooling technique, liquid metals or metal powder
It is directly injected on hot glass surface, with the cooling of glass, metallic diaphragm becomes a part of glass.Gu this, the film layer is hard
It is hard durable." Low-E " glass of this method production has many advantages: it can be with hot bending, tempering, it is not necessary under hollow state
It uses, it can be with long term storage.Its shortcomings that is that thermal property is poor.Unless film layer is very thick, otherwise its " u " value is only sputtered
The half of method " Low-E " coated glass.If it is desired to improve its thermal property by increasing film thickness, then its transparency is just very
Difference.
(2) offline vacuum sputtering
Vacuum coating technology is begun to show in the 1930s, four the fifties start industrial application occur, and industrialization is big to advise
Mould production starts from widely answering in the 1980s, obtaining in the industry such as electronics, aerospace, packaging, decoration, gold stamping printing
With.Vacuum coating technology is the new technology of a kind of novel materials synthesis and processing, is the important set of field of surface engineering technique
At part.Vacuum coating technology is the plated film that the surface of solids is coated to one layer of property using physics, chemical means, to make
There is the surface of solids wear-resistant, high temperature resistant, corrosion-resistant, anti-oxidant, radiation protection, conduction, magnetic conduction, insulation and ornament lamp many to be better than
The superior function of solid material itself reaches and improves product quality, extends life of product, the significant technology warp of energy saving and acquisition
The effect for benefit of helping.Need plated film is referred to as substrate, and the material of plating is referred to as target.
Magnetron sputtering is to make target atom or molecule be sputtered out using lotus energy particle bombardment solid target and deposit to
A kind of technique of substrate surface.Metallic target and ceramic target can be selected in target.Magnetron sputtering the preparation method has deposition rate height, substrate
The advantages of temperature is low, film forming adhesion is good, easy to control, at low cost, suitable large area is film-made.Exactly needs are made for vacuum evaporation
The substance of film, which is put in vacuum, to be evaporated or distils, and is allowed to be precipitated over the substrate surface.The device of vacuum evaporation is simpler
Single, technological parameter is less, the growth of easily-controllable made membrane, and impurity content is low in film.But the height of vacuum degree directly affects film
Structure and performance, vacuum degree is low, and material is seriously polluted by residual gas molecule, film performance be deteriorated, improve underlayer temperature have
Conducive to the desorption of gas molecule.
Off-line process produces Low-E glass, is to generally use vacuum magnetron sputtering coating film technology in the world at present.And Gao Wenre
It is different to solve sedimentation, using in sputtering method production technology, glass horizontal is placed on transfer roller, is sent into 10-1The pa order of magnitude it is true
In Altitude, it is passed through suitable process gas (inert gas Ar or reaction gas O2、N2), and keep vacustat.By target
Ag, Si etc. are embedded in cathode, and are being placed in magnetic field with the horizontal direction of cathode vertical to constitute magnetic control target.It is yin with magnetic control target
Pole, in addition direct current or AC power source, under the action of high voltage, process gas is ionized, and forms plasma.Wherein, electric
Son carries out high-speed screw movement under the collective effect of electric and magnetic fields, and collision gas molecule generates more cations and electricity
Son；Cation hits cathode targets after reaching certain energy, the target material deposition being sputtered out is in glass under the action of electric field
Film is formed on substrate.In order to form uniform film layer, cathode target moves back and forth close to glass surface.In order to obtain multilayer
Film, it is necessary to use multiple cathodes, each cathode is moved back and forth in glass surface, and certain film thickness is formed.Sputtering method work
Skill produces " Low-E " glass, needs one layer of fine silver film as functional membrane.Fine silver film is between two layers of metal oxide film.Metal
Oxidation film provides protection to fine silver film, and increases the purity and luminous transparency of color as the middle layer between film layer.
Currently, the target product of domestic and most import magnetron sputtering film production lines be be coated with simple substance film and
Solar control film glass based on metal film.This kind of product technique is relatively easy, and the requirement to equipment is lower.Therefore, these are given birth to
Producing line is not able to satisfy the requirement for being coated with LOW-E glass.
With in field of vacuum coating coating technique make rapid progress, the requirement to coated product is also higher and higher, therefore
More and more improving also occurs in coating film production line, and the requirement of production line increases accordingly, the coating film production line of the prior art it is whole
Body stability and plating film uniformity, production efficiency is low and corresponding equipment cost is high.
Summary of the invention
In view of the above-mentioned problems existing in the prior art, the object of the present invention is to provide can vertical plated film arc glass vacuum
Magnetron sputtering film production line.
For achieving the above object, The technical solution adopted by the invention is as follows:
The purpose of the present invention is to provide arc glass vacuum magnetron sputtering coating film production line, including it is sequentially connected upper piece
Area, inlet plenum, import buffer chamber, import transfer chamber, sputtering chamber, outlet transfer chamber, outlet buffer chamber, outlet
Chamber, quality inspection chamber and unload section, the upper section, inlet plenum, import buffer chamber, import transfer chamber, sputtering chamber,
It exports transfer chamber, outlet buffer chamber, outlet chamber and unloads and be equipped with sequentially connected transmission platform in section, the quality inspection chamber
Interior is equipped with plated film quality inspection bench and quality inspection system, and transmission platform is connected with plated film quality inspection bench in the outlet chamber, the sputtering chamber
Room includes at least one plated film subregion, and each plated film subregion is equipped with an at least planar cathode device, the planar cathode device with
The connection of one angle adjustment device, the angle adjustment device pass through several linking arms and plated film subregion along longitudinal axis stretching, extension
Anode cabinet connection.
The plated film quality inspection bench includes at least a vacuum film plating substrate frame, a track and transmission mechanism, each vacuum
Film plating substrate frame slides in its respective carter back and forth, and the transmission mechanism connect with vacuum film plating substrate frame and provides for it
Power is equipped with several substrate holes on the vacuum film plating substrate frame, and vacuum film plating substrate is installed in substrate hole.
The plated film quality inspection bench includes two vacuum film plating substrate framves and two tracks and transmission mechanism, two tracks
It is bonded and is mounted in parallel, each vacuum film plating substrate frame slides in its respective carter back and forth.
The transmission mechanism includes permanent magnet transmission motor, magnetic steering part and Magnetic drive part, the permanent magnet transmission motor and magnetic
Guide part is connected with Magnetic drive part magnetism, and the Magnetic drive part is installed on vacuum film plating substrate frame bottom, the magnetic steering part peace
Loaded on track interior.
The linking arm includes at least one sub- linking arm, and the connecting pin of each sub- linking arm is equipped with axis hole or turns
Axis, the sub- linking arm are connect with angle adjustment device axis hole or shaft, between the sub- linking arm each other by axis hole or turn
Axis connection.
The angle adjustment device is two axis adjustment devices, which can revolve around its vertical axes and trunnion axis
Turn to adjust the sputtering angle of planar cathode device, i.e., it is described vertical when the angle adjustment device vertically stands on ground
Axis is parallel to ground perpendicular to ground, the trunnion axis.
The angle adjustment device includes vertical actuator, vertical rack and horizontal drive part, the vertical rack and perpendicular
Straight actuator is connected and can rotate under the drive of vertical actuator around vertical axes；The horizontal drive part is fixedly installed on vertically
End of the bracket far from vertical actuator, the planar cathode device are connected with horizontal drive part and in the drives of horizontal drive part
Under rotated around trunnion axis.
The planar cathode device is followed successively by target, target backboard, magnet and yoke, the target backboard and magnet from outside to inside
Between be equipped with felt pad, the target is fixedly connected with target backboard, and the magnet is fixed on yoke, the yoke by insulating part with
Angle adjustment device connection.
Compared with prior art, arc glass vacuum magnetron sputtering coating film production line provided by the invention has following excellent
Gesture:
1. using the magnetron sputtering mode of continuity vertical film substrate, so that film reduces environment in coating process
Influence of the middle impurity to coating quality.
2. adjusting the height of cathode construction by angle adjustment device and sputtering angle, rotary target improving the utilization of target
The uniformity of rate and plated film film layer, target are not in pit when being bombarded, and avoid the formation of sputtering oxide layer, and target utilizes
Rate is high, and average film thickness is small, even film layer.
3. magnetron sputtering has the characteristics that high speed pellets, almost all of metal and alloy, conductor and insulator can be plated,
And can on the metal of low melting point and plastics plated film, and the speed of plated film is high.
4. multi-stage vacuum degree setting technology can be realized vacuum degree adjusting when plated film, while in the case where high temperature plated film,
Guarantee the uniformity that substrate is heated in condition of high vacuum degree, energy saving.
5. transmission platform and quality inspection bench structure are simple, substrate transfer is carried out by belt sheave structure, reliable for operation, processing and manufacturing
It is easy, substrate transmits smoothness height, and friction pulley replacement is convenient, to ensure that coating quality, and can reduce the system of production line
It makes and maintenance cost, transmission stroke control accuracy error is very small.
6. the setting that the two-stage vacuum of pumping equipment pumps, vacuum degree pumpdown time is short, operates the sealing effect of door in addition
Fruit is uniform, and sputtering chamber final vacuum reaches 10-5Pa is suitable for all kinds of coating film production lines.
7. directly automatic after plated film carry out quality inspection, vacuum coating is realized simultaneously with quality inspection, improves production efficiency.
In short, arc glass vacuum magnetron sputtering coating film production line provided by the invention can be realized the large quantities of of all kinds of plated films
Amount, low cost production, and sputter deposition rate is high, and technique is versatile.Plain diffusion path is short, no intermediate product, element-free
Evaporation, thus preparation speed is fast, high-efficient, yields is up to 95% or more, is particularly suitable for large-scale industrial production.
Detailed description of the invention
Fig. 1 is the transmission layout of arc glass vacuum magnetron sputtering coating film production line provided by the invention；
Fig. 2 is a preferred embodiment schematic diagram of plated film quality inspection bench provided by the invention；
Fig. 3 is planar cathode schematic device provided by the invention；
Fig. 4 is angle adjustment device structural schematic diagram provided by the invention；
Wherein, 11, substrate frame, 12, substrate hole, 13, transmission mechanism；61, planar cathode device；611, target；612, target
Backboard；613, magnet；614, yoke；615, felt pad；616, insulating part；62, angle adjustment device；621, vertical actuator；
622, vertical rack；623, horizontal drive part.
Specific embodiment
The present invention is made further to illustrate in detail, completely below with reference to embodiment and comparative example.
As shown in Fig. 1 ` Fig. 4, in the present embodiment, arc glass vacuum magnetron sputtering coating film production line includes sequentially connected
Upper section, inlet plenum, import buffer chamber, import transfer chamber, sputtering chamber, outlet transfer chamber, outlet buffer chamber,
Outlet chamber, quality inspection chamber and unload section, upper section, inlet plenum, import buffer chamber, import transfer chamber, sputtering chamber,
It exports transfer chamber, outlet buffer chamber, outlet chamber and unloads and be equipped with sequentially connected transmission platform in section, in quality inspection chamber
Equipped with plated film quality inspection bench and quality inspection system, transmission platform is connected with plated film quality inspection bench in outlet chamber, and sputtering chamber includes at least one
A plated film subregion, each plated film subregion are equipped with an at least planar cathode device 61, and planar cathode device 61 and an angular adjustment fill
62 connections are set, angle adjustment device 62 is connected by several along the linking arm of longitudinal axis stretching, extension and the anode cabinet of plated film subregion
It connects.
In the present embodiment, plated film quality inspection bench includes at least a vacuum film plating substrate frame 11, a track and transmission mechanism 13, often
A vacuum film plating substrate frame 11 slides in its respective carter back and forth, and transmission mechanism 13 is connect simultaneously with vacuum film plating substrate frame 11
Power is provided for it, several substrate holes 12 are installed on vacuum film plating substrate frame 11, vacuum film plating substrate is installed on substrate hole 12
It is interior.
In the present embodiment, plated film quality inspection bench includes two vacuum film plating substrate framves 11 and two tracks and transmission mechanism 13,
Two tracks are bonded and are mounted in parallel, and each vacuum film plating substrate frame 11 slides in its respective carter back and forth.
In the present embodiment, transmission mechanism 13 includes permanent magnet transmission motor, magnetic steering part and Magnetic drive part, permanent magnet transmission motor
It is connect with magnetic steering part and Magnetic drive part magnetism, Magnetic drive part is installed on 11 bottom of vacuum film plating substrate frame, the installation of magnetic steering part
In track interior.
In the present embodiment, linking arm includes at least one sub- linking arm, the connecting pin of every sub- linking arm be equipped with axis hole or
Shaft, sub- linking arm are connect with 62 axis hole of angle adjustment device or shaft, are connected between sub- linking arm each other by axis hole or shaft
It connects.
In the present embodiment, angle adjustment device 62 is two axis adjustment devices, which can be around its vertical axes
It is rotated with trunnion axis to adjust the sputtering angle of planar cathode device 61, i.e., when angle adjustment device 62 vertically stands on ground
When, vertical axes are parallel to ground perpendicular to ground, trunnion axis.
In the present embodiment, angle adjustment device 62 includes vertical actuator 621, vertical rack 622 and horizontal drive part
623, vertical rack 622 is connected with vertical actuator 621 and can rotate under the drive of vertical actuator 621 around vertical axes；Water
Flat actuator 623 is fixedly installed on end of the vertical rack 622 far from vertical actuator 621, planar cathode device 61 and level
Actuator 623 is connected and rotates under the drive of horizontal drive part 623 around trunnion axis.
In the present embodiment, planar cathode device 61 is followed successively by target 611, target backboard 612, magnet 613 and yoke from outside to inside
Iron 614 is equipped with felt pad 615 between target backboard 612 and magnet 613, target 611 is fixedly connected with target backboard 612, and magnet 613 is fixed
In on yoke 614, yoke 614 is connect by insulating part 616 with angle adjustment device 63.
In the present embodiment, quality inspection system is configured in quality inspection chamber, completely configure altogether a scanning transmission spectral measurement probe,
Two scanning reflection spectral measurement probes, a surface resistance measuring probe.
Above-mentioned spectral measurement is popped one's head on the interior transmission transition bench of the quality inspection chamber after being mounted on outlet chamber, for measuring product
Transmitted spectrum, transmitted colors；The parameters such as reflectance spectrum and the reflection colour of product film surface and non-coated surface are measured, product is measured
The surface resistance of film layer.Probe can be scanned perpendicular to glass motion direction, and table 1 is on-line checking supplemental characteristic.
Table 1
Be it is necessary to described herein finally: above embodiments are served only for making technical solution of the present invention further detailed
Ground explanation, should not be understood as limiting the scope of the invention, those skilled in the art's above content according to the present invention
The some nonessential modifications and adaptations made all belong to the scope of protection of the present invention.
Claims (8)
1. arc glass vacuum magnetron sputtering coating film production line, it is characterised in that: including sequentially connected upper section, snout cavity
Room, import buffer chamber, import transfer chamber, sputtering chamber, outlet transfer chamber, outlet buffer chamber, outlet chamber, quality inspection
Chamber is transmitted with section, the upper section, inlet plenum, import buffer chamber, import transfer chamber, sputtering chamber, outlet is unloaded
It chamber, outlet buffer chamber, outlet chamber and unloads and is equipped with sequentially connected transmission platform in section, be equipped in the quality inspection chamber
Plated film quality inspection bench and quality inspection system, transmission platform is connected with plated film quality inspection bench in the outlet chamber, and the sputtering chamber includes extremely
A few plated film subregion, each plated film subregion are equipped with an at least planar cathode device (61), the planar cathode device (61) with
One angle adjustment device (62) connection, the angle adjustment device (62) by it is several along longitudinal axis stretching, extension linking arms with
The anode cabinet of plated film subregion connects.
2. arc glass vacuum magnetron sputtering coating film production line according to claim 1, it is characterised in that: the plating film quality
It examines platform and includes at least a vacuum film plating substrate frame (11), a track and transmission mechanism (13), each vacuum film plating substrate frame
(11) it is slided back and forth in its respective carter, the transmission mechanism (13) connect with vacuum film plating substrate frame (11) and mentions for it
For power, several substrate holes (12) are installed on the vacuum film plating substrate frame (11), vacuum film plating substrate is installed on substrate hole
(12) in.
3. arc glass vacuum magnetron sputtering coating film production line according to claim 2, it is characterised in that: the plating film quality
Examining platform includes two vacuum film plating substrate framves (11) and two tracks and transmission mechanism (13), two tracks fitting and parallel
Installation, each vacuum film plating substrate frame (11) are slided in its respective carter back and forth.
4. arc glass vacuum magnetron sputtering coating film production line according to claim 3, it is characterised in that: the driver
Structure (13) includes permanent magnet transmission motor, magnetic steering part and Magnetic drive part, the permanent magnet transmission motor and magnetic steering part and Magnetic drive
The connection of part magnetism, the Magnetic drive part are installed on vacuum film plating substrate frame (11) bottom, and the magnetic steering part is installed in track
Portion.
5. arc glass vacuum magnetron sputtering coating film production line according to claim 1, it is characterised in that: the linking arm
Including at least one sub- linking arm, the connecting pin of each sub- linking arm is equipped with axis hole or shaft, the sub- linking arm and angle
Regulating device (62) axis hole or shaft connection are spent, is connected between the sub- linking arm each other by axis hole or shaft.
6. arc glass vacuum magnetron sputtering coating film production line according to claim 1, it is characterised in that: the angle tune
Regulating device (62) is two axis adjustment devices, which can be around its vertical axes and trunnion axis rotation to adjust plane yin
The sputtering angle of pole device (61), i.e., when the angle adjustment device (62) vertically stands on ground, the vertical axes are vertical
In ground, the trunnion axis is parallel to ground.
7. arc glass vacuum magnetron sputtering coating film production line according to claim 6, it is characterised in that: the angle tune
Regulating device (62) includes vertical actuator (621), vertical rack (622) and horizontal drive part (623), the vertical rack
(622) it is connected and can be rotated under the drive of vertical actuator (621) around vertical axes with vertical actuator (621)；The level
Actuator (623) is fixedly installed on the end of vertical rack (622) far from vertical actuator (621), the planar cathode device
(61) it is connected with horizontal drive part (623) and is rotated under the drive of horizontal drive part (623) around trunnion axis.
8. arc glass vacuum magnetron sputtering coating film production line according to claim 1, it is characterised in that: the plane yin
Pole device (61) is followed successively by target (611), target backboard (612), magnet (613) and yoke (614), the target backboard from outside to inside
(612) felt pad (615) are equipped between magnet (613), the target (611) is fixedly connected with target backboard (612), the magnet
(613) it is fixed on yoke (614), the yoke (614) is connect by insulating part (616) with angle adjustment device (63).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711342043.8A CN109957769A (en) | 2017-12-14 | 2017-12-14 | Arc glass vacuum magnetron sputtering coating film production line |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201711342043.8A CN109957769A (en) | 2017-12-14 | 2017-12-14 | Arc glass vacuum magnetron sputtering coating film production line |
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| CN109957769A true CN109957769A (en) | 2019-07-02 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN112647052A (en) * | 2020-12-17 | 2021-04-13 | 凯盛科技股份有限公司蚌埠华益分公司 | One-inlet transition vacuum cavity and magnetron sputtering coating production line |
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Application publication date: 20190702 |