CN202499901U - Magnetic control dartboard with convertible angle - Google Patents
Magnetic control dartboard with convertible angle Download PDFInfo
- Publication number
- CN202499901U CN202499901U CN2012201022818U CN201220102281U CN202499901U CN 202499901 U CN202499901 U CN 202499901U CN 2012201022818 U CN2012201022818 U CN 2012201022818U CN 201220102281 U CN201220102281 U CN 201220102281U CN 202499901 U CN202499901 U CN 202499901U
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- CN
- China
- Prior art keywords
- magnetic control
- dartboard
- circle target
- control circle
- target
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Abstract
The utility model discloses a magnetic control dartboard with a convertible angle. The upper portion of the magnetic control dartboard is vertically mounted on an upper cover of a chamber, the lower portion of the magnetic control dartboard is bent towards a base, and the magnetic control dartboard is provided with an axial movement device and an axial angle adjusting device. The magnetic control dartboard is capable of axially moving and axially adjusting the angle, is high in efficiency and can meet the requirements of different coated films.
Description
Technical field
The utility model relates to a kind of magnetron sputtering film device, relates in particular to a kind of magnetic control circle target of indexable.
Background technology
The magnetron sputtering film device is to use the magnetron sputtering principle, uses the magnetic control circle target of unlike material target, the various metallic membranes of preparation, alloy film, compound film, deielectric-coating or the like on matrixes such as glass, pottery, semi-conductor, metal.Magnetic control circle target is a most key part in the magnetron sputtering film device.
Magnetron sputtering film device of the prior art is as shown in Figure 1, and matrix 1 is located in the chamber, uses magnetic control circle target 2 to carry out many targets and spatters altogether, and magnetic control circle target 2 tilts to be loaded on the cavity top cover 3, in the sputter procedure, and matrix 1 rotates, and magnetic control circle target 2 moves along the K direction.
The shortcoming of above-mentioned prior art is: magnetic control circle target 2 can only move along the K direction, in the sputter procedure, must rotate through matrix 1 and realize that efficient is low, versatility is poor.
Summary of the invention
The purpose of the utility model provide a kind of efficient high, can satisfy the magnetic control circle target that difference is coated with the indexable that rete requires.
The purpose of the utility model realizes through following technical scheme:
The magnetic control of the indexable of the utility model circle target, the upper vertical of said magnetic control circle target is installed on the cavity top cover, and the lower knuckle of said magnetic control circle target and towards matrix, said magnetic control circle target are provided with axial moving device and around axial adjustment angle device.
Technical scheme by above-mentioned the utility model provides can be found out; The magnetic control of the indexable that the utility model provides circle target, because the upper vertical of magnetic control circle target is installed on the cavity top cover, the lower knuckle of magnetic control circle target and towards matrix; Magnetic control circle target is provided with circumferential wheelwork and axial moving device; Magnetic control circle target both can move vertically, again can be around axial adjustment angle, and efficient is high, can satisfy difference is coated with the rete requirement.
Description of drawings
Fig. 1 is the structural representation of the magnetic control circle target of prior art;
The structural representation of the magnetic control circle target of the indexable that Fig. 2 provides for the utility model embodiment.
Embodiment
To combine accompanying drawing that the utility model embodiment is done to describe in detail further below.
The magnetic control circle target of the indexable of the utility model, its preferable embodiment is as shown in Figure 2:
The upper vertical of the magnetic control of said indexable circle target 4 is installed on the cavity top cover 3, and the lower knuckle of said magnetic control circle target 4 and towards matrix 1, said magnetic control circle target 4 are provided with axial moving device and around axial adjustment angle device (not shown).
Said magnetic control circle target has a plurality of.
The magnetic control of the indexable of the utility model circle target carries out many targets when spattering altogether, and magnetic control circle target 4 both can be mobile along K direction (axially), can rotate along W direction (circumferentially) again.
Can satisfy the requirement that following difference is coated with rete:
Satisfy general inhomogeneity requirement, pursue thicknesses of layers, just high sputter rate;
Satisfy the requirement of general sputter rate, pursue high inhomogeneity rete.
The above; Be merely the preferable embodiment of the utility model; But the protection domain of the utility model is not limited thereto; Any technician who is familiar with the present technique field is in the technical scope that the utility model discloses, and the variation that can expect easily or replacement all should be encompassed within the protection domain of the utility model.Therefore, the protection domain of the utility model should be as the criterion with the protection domain of claims.
Claims (2)
1. the magnetic control of an indexable is justified target; It is characterized in that; The upper vertical of said magnetic control circle target is installed on the cavity top cover, and the lower knuckle of said magnetic control circle target and towards matrix, said magnetic control circle target are provided with axial moving device and around axial adjustment angle device.
2. the magnetic control of indexable according to claim 1 circle target is characterized in that, said magnetic control circle target has a plurality of.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012201022818U CN202499901U (en) | 2012-03-16 | 2012-03-16 | Magnetic control dartboard with convertible angle |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012201022818U CN202499901U (en) | 2012-03-16 | 2012-03-16 | Magnetic control dartboard with convertible angle |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202499901U true CN202499901U (en) | 2012-10-24 |
Family
ID=47036521
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2012201022818U Expired - Fee Related CN202499901U (en) | 2012-03-16 | 2012-03-16 | Magnetic control dartboard with convertible angle |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202499901U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109957770A (en) * | 2017-12-14 | 2019-07-02 | 湘潭宏大真空技术股份有限公司 | Vehicle glass continuous coating production line |
| CN109957769A (en) * | 2017-12-14 | 2019-07-02 | 湘潭宏大真空技术股份有限公司 | Arc glass vacuum magnetron sputtering coating film production line |
| CN109957781A (en) * | 2017-12-14 | 2019-07-02 | 湘潭宏大真空技术股份有限公司 | The vertical compound film system continuous magnetron sputtering production line of vehicle glass |
-
2012
- 2012-03-16 CN CN2012201022818U patent/CN202499901U/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109957770A (en) * | 2017-12-14 | 2019-07-02 | 湘潭宏大真空技术股份有限公司 | Vehicle glass continuous coating production line |
| CN109957769A (en) * | 2017-12-14 | 2019-07-02 | 湘潭宏大真空技术股份有限公司 | Arc glass vacuum magnetron sputtering coating film production line |
| CN109957781A (en) * | 2017-12-14 | 2019-07-02 | 湘潭宏大真空技术股份有限公司 | The vertical compound film system continuous magnetron sputtering production line of vehicle glass |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20121024 Termination date: 20200316 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |