CN203411602U - Bell jar-shaped device for coating cylindrical inner walls - Google Patents

Bell jar-shaped device for coating cylindrical inner walls Download PDF

Info

Publication number
CN203411602U
CN203411602U CN201320303370.3U CN201320303370U CN203411602U CN 203411602 U CN203411602 U CN 203411602U CN 201320303370 U CN201320303370 U CN 201320303370U CN 203411602 U CN203411602 U CN 203411602U
Authority
CN
China
Prior art keywords
bell
jar
target
vacuum
cylindrical workpieces
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201320303370.3U
Other languages
Chinese (zh)
Inventor
刘玮
王守国
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to CN201320303370.3U priority Critical patent/CN203411602U/en
Application granted granted Critical
Publication of CN203411602U publication Critical patent/CN203411602U/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Landscapes

  • Physical Vapour Deposition (AREA)

Abstract

The utility model discloses a bell jar-shaped device for coating cylindrical inner walls. The device comprises a bell jar-shaped vacuum cavity, a workpiece table, a power supply, a vacuum system and the like, wherein a plurality of target electrodes are arranged in the bell jar-shaped vacuum cavity; the workpiece table can move up and down. The device is characterized in that the vacuum cavity is fixed on a support; the target electrodes are arranged in the bell jar-shaped vacuum cavity; the round workpiece table is placed under the bell jar-shaped vacuum cavity and can move up and down; positioning brackets for cylindrical workpieces are arranged on the workpiece table. When the workpiece table is raised, vacuum seal is formed between the workpiece table and the bell jar-shaped vacuum cavity; at the same time, the target electrodes are inserted to the cylindrical workpieces and reach the central positions of the cylindrical workpieces; after the power supply of the target electrodes is switched on, sputtering plasma is generated around the target electrodes; particles on the target electrodes are sputtered out and then deposit in the inner surfaces of the cylindrical workpieces; bias voltage electric fields can be applied between the target electrodes and the cylindrical workpieces to increase the binding force of the deposit layers. The device is used for coating the inner walls of the cylindrical workpieces so as to improve the rigidity and wear resistance of the inner walls of the cylindrical workpieces.

Description

Bell-jar filming equipment for cylinder inner wall
Technical field
The utility model relates to a kind of bell-jar filming equipment for cylinder inner wall, refers in particular to bell jar chamber and maintains static, and is provided with a plurality of target electrodes in it, and the device that is specifically designed to cylinder inner wall plated film that the round piece platform that bell jar chamber is transferred can move up and down.
background technology
Magnetron sputtering is to utilize in a vacuum high-energy particle bombardment target surface, makes to be bombarded the target ion sputtering and is deposited on substrate.During sputter, after gas is ionized, gaseous ion flies to electrode target under the effect of electric field, and with high-energy bombardment target surface, makes target material generation sputter, and the target particle sputtering is deposited on substrate.Magnetron sputtering comprises broad variety, the principle of work of having nothing in common with each other and application.
Mostly our seen magnetron sputtering equipment, be for the plated film to outer surface of workpiece at present, for the Special Equipment of cylindrical duct inwall, there is not yet in the market.And middle bell-type vacuum coating film equipment, common way is to move up and down bell jar, work stage maintains static.To the larger bell-jar of volume and weight, adopt the mode moving up and down to be obviously just not suitable for.
In view of the filming equipment not yet having for cylindrical duct inwall, the utility model is to adopt bell jar chamber to maintain static, and the design that work stage can move up and down, when work stage moves to extreme higher position, worktable and bell jar chamber form vacuum seal, and at this moment target electrode is the central position that is just in time inserted in cylinder interior.This uses novel advantage to be: (1) bell jar chamber maintains static, and work stage moves up and down, and is conducive to the fixing of bell jar chamber and installs, and reduces difficulty of construction.(2) electric field between substrate and the target utmost point can improve sputtering yield, improve film density and with the bonding force of substrate material.
utility model content
Consider the existing problem of prior art, the purpose of this utility model is to provide a kind of bell-jar filming equipment for cylinder inner wall, comprise the bell-jar vacuum cavity of establishing a plurality of target electrodes in one, the work stage that can move up and down, power supply, vacuum system etc., it is characterized in that: a bell-jar vacuum chamber is fixed on a support, in its vacuum chamber, be provided with a plurality of target electrodes, below bell-jar vacuum chamber, place a round piece platform that can move up and down, in this work stage, be provided with cylindrical workpieces locating support, after work stage is risen, this work stage and bell-jar vacuum chamber form vacuum-sealing, at this moment target electrode is the central position inserting at cylindrical workpieces, after target electrode switches on power, at target electrode, form sputter plasma around, and sputter
A kind of bell-jar filming equipment for cylinder inner wall, comprise the bell-jar vacuum cavity of establishing a plurality of target electrodes in one, the work stage that can move up and down, power supply, vacuum system etc., it is characterized in that: a bell-jar vacuum chamber is the medium position that is fixed on a portal trestle, the side of this bell-jar vacuum chamber is provided with vacuum suction window and view port, and its top is provided with the stationary window of fixed target electrode.
A kind of bell-jar filming equipment for cylinder inner wall, comprise the bell-jar vacuum cavity of establishing a plurality of target electrodes in one, the work stage that can move up and down, power supply, vacuum system etc., it is characterized in that: in bell-jar vacuum chamber, be provided with a plurality of target electrodes, the plurality of target electrode insulate by insulating material and vacuum (-tight) housing, the plurality of target electrode can with radio-frequency power supply, also can with high frequency electric source, and be connected with direct supply, in placement magnetic field, the inside of target.
A kind of bell-jar filming equipment for cylinder inner wall, comprise the bell-jar vacuum cavity of establishing a plurality of target electrodes in one, the work stage that can move up and down, power supply, vacuum system etc., it is characterized in that: below bell-jar vacuum chamber, place a round piece platform that can move up and down, in this work piece platform, be provided with the locating support of a plurality of stationary cylinder workpiece.
A kind of bell-jar filming equipment for cylinder inner wall, comprise the bell-jar vacuum cavity of establishing a plurality of target electrodes in one, the work stage that can move up and down, power supply, vacuum system etc., it is characterized in that: when work piece platform rises to extreme higher position, work piece platform and bell-jar vacuum cavity form vacuum seal, and at this moment target electrode is the medium position just in time inserting at cylindrical workpieces.
A kind of bell-jar filming equipment for cylinder inner wall, comprise the bell-jar vacuum cavity of establishing a plurality of target electrodes in one, the work stage that can move up and down, power supply, vacuum system etc., it is characterized in that: after work stage rises, target electrode is the central position inserting at cylindrical workpieces, after target electrode switches on power, at target electrode, form sputter plasma around, and sputter particle deposition on target at the internal surface of cylindrical workpieces, between target electrode and cylindrical workpieces, can apply the bonding force that biasing electric field increases settled layer.
Accompanying drawing explanation
Below in conjunction with accompanying drawing, the utility model is conducted further description, wherein:
Fig. 1 is the embodiment of the present invention: open plated film chamber, device structure schematic diagram during place work piece;
Fig. 2 is the embodiment of the present invention: close plated film chamber, the device structure schematic diagram while starting plated film.
Embodiment:
With reference to the accompanying drawings, in conjunction with specific embodiments the utility model is described in detail.
First, consult Fig. 1 and Fig. 2, Fig. 1 opens plated film chamber, device structure schematic diagram during place work piece; Fig. 2 closes plated film chamber, the device structure schematic diagram while starting plated film.Two figure are depicted as the bell-jar filming equipment for cylinder inner wall, it is that a bell-jar vacuum chamber 101 is the medium positions that are fixed on a portal trestle 100, this portal trestle is to fix by angle bar 108 and ground, is provided with and strengthens support bar 109 on this portal trestle; The side of this bell-jar vacuum chamber 101 is provided with vacuum suction window 111 and view port 112, and its top is provided with the stationary window 113 of fixed target electrode, and vacuum machine measurement window 107.
In bell-jar vacuum chamber 101, be provided with a plurality of target electrodes 102, the plurality of target electrode 102 insulate by insulating material and vacuum cover body, fixed placement is in bell jar chamber 101, the plurality of target electrode 102 can be connected with power supply 110, this power supply can adopt radio-frequency power supply, also can with high frequency electric source, and be connected with direct supply, in placement magnetic field, the inside of target.
Below bell-jar vacuum chamber 101, place a round piece platform 106 that can move up and down, the positioning seat 104 and the positioning seat fulcrum 105 that in this work piece platform, are provided with a plurality of stationary cylinder workpiece 103, positioning seat 104 is positions of stationary cylinder workpiece 103; Positioning seat fulcrum 105 is positions of stationary positioned seat 104 and circular platform 106.Positioning seat 104 and positioning supporting point 105 and cylindrical workpieces can one be reinstated forklift and are taken out.
Opening plated film chamber 101, device structure schematic diagram during place work piece 103, as shown in Figure 1.
In work piece platform 106, be to realize and moving up and down by hydraulic efficiency installation 115, when work piece platform 106 rises to extreme higher position, work piece platform 106 forms vacuum seal with bell-jar vacuum cavity 101 by vaccum seal ring 114, and at this moment target electrode 102 is the medium positions that just in time insert at cylindrical workpieces 103.At target electrode 102, switch on power after 110, in surrounding's formation sputter plasma of target electrode 102, and sputter particle deposition on target at the internal surface of cylindrical workpieces, between target electrode and cylindrical workpieces, can apply the bonding force that biasing electric field increases settled layer.
In plated film engineering, the structural representation of equipment, as shown in Figure 2.
The lateral blister mouth 112 of bell-jar vacuum chamber 101 can adopt glass window, and vacuum suction window 111 is to be connected with vacuum-pumping system.
The positioning seat 104 of portal trestle 100, vacuum chamber 101, cylindrical workpieces 103 and positioning seat fulcrum 105, and work piece platform is to be made by metallic substance.Cylindrical workpieces 103 refers to metal circular tube, can be also non-metallic material.Target electrode 102 can be chosen different metallic substance, alloy and ceramic insulating material.
Above with reference to accompanying drawing, in conjunction with specific embodiments the utility model is described, yet, it should be noted that, for a person skilled in the art, in the situation that not departing from spirit and scope of the present utility model, can make many changes and modification to above-described embodiment, these changes and modification all drop in the scope of claim restriction of the present utility model.

Claims (6)

1. the utility model discloses a kind of bell-jar filming equipment for cylinder inner wall, comprise the bell-jar vacuum cavity of establishing a plurality of target electrodes in one, the work stage that can move up and down, power supply, vacuum system etc., it is characterized in that: a bell-jar vacuum chamber is fixed on a support, in its vacuum chamber, be provided with a plurality of target electrodes, below bell-jar vacuum chamber, place a round piece platform that can move up and down, in this work stage, be provided with cylindrical workpieces locating support, after work stage is risen, this work stage and bell-jar vacuum chamber form vacuum-sealing, at this moment target electrode is the central position inserting at cylindrical workpieces, after target electrode switches on power, at target electrode, form sputter plasma around, and sputter particle deposition on target at the internal surface of cylindrical workpieces, between target electrode and cylindrical workpieces, can apply biasing electric field increases the bonding force of settled layer.
2. a kind of bell-jar filming equipment for cylinder inner wall as claimed in claim 1, comprise the bell-jar vacuum cavity of establishing a plurality of target electrodes in one, the work stage that can move up and down, power supply, vacuum system etc., it is characterized in that: a bell-jar vacuum chamber is the medium position that is fixed on a portal trestle, the side of this bell-jar vacuum chamber is provided with vacuum suction window and view port, and its top is provided with the stationary window of fixed target electrode.
3. a kind of bell-jar filming equipment for cylinder inner wall as claimed in claim 1, comprise the bell-jar vacuum cavity of establishing a plurality of target electrodes in one, the work stage that can move up and down, power supply, vacuum system etc., it is characterized in that: in bell-jar vacuum chamber, be provided with a plurality of target electrodes, the plurality of target electrode insulate by insulating material and vacuum (-tight) housing, the plurality of target electrode can with radio-frequency power supply, also can with high frequency electric source, and be connected with direct supply, in placement magnetic field, the inside of target.
4. a kind of bell-jar filming equipment for cylinder inner wall as claimed in claim 1, comprise the bell-jar vacuum cavity of establishing a plurality of target electrodes in one, the work stage that can move up and down, power supply, vacuum system etc., it is characterized in that: below bell-jar vacuum chamber, place a round piece platform that can move up and down, in this work piece platform, be provided with the locating support of a plurality of stationary cylinder workpiece.
5. a kind of bell-jar filming equipment for cylinder inner wall as claimed in claim 1, comprise the bell-jar vacuum cavity of establishing a plurality of target electrodes in one, the work stage that can move up and down, power supply, vacuum system etc., it is characterized in that: when work piece platform rises to extreme higher position, work piece platform and bell-jar vacuum cavity form vacuum seal, and at this moment target electrode is the medium position just in time inserting at cylindrical workpieces.
6. a kind of bell-jar filming equipment for cylinder inner wall as claimed in claim 1, comprise the bell-jar vacuum cavity of establishing a plurality of target electrodes in one, the work stage that can move up and down, power supply, vacuum system etc., it is characterized in that: after work stage rises, target electrode is the central position inserting at cylindrical workpieces, after target electrode switches on power, at target electrode, form sputter plasma around, and sputter particle deposition on target at the internal surface of cylindrical workpieces, between target electrode and cylindrical workpieces, can apply the bonding force that biasing electric field increases settled layer.
CN201320303370.3U 2013-05-30 2013-05-30 Bell jar-shaped device for coating cylindrical inner walls Expired - Fee Related CN203411602U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201320303370.3U CN203411602U (en) 2013-05-30 2013-05-30 Bell jar-shaped device for coating cylindrical inner walls

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201320303370.3U CN203411602U (en) 2013-05-30 2013-05-30 Bell jar-shaped device for coating cylindrical inner walls

Publications (1)

Publication Number Publication Date
CN203411602U true CN203411602U (en) 2014-01-29

Family

ID=49974506

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201320303370.3U Expired - Fee Related CN203411602U (en) 2013-05-30 2013-05-30 Bell jar-shaped device for coating cylindrical inner walls

Country Status (1)

Country Link
CN (1) CN203411602U (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104746016A (en) * 2015-04-01 2015-07-01 浙江阳天包装材料有限公司 Vacuum aluminizing device
CN104746007A (en) * 2015-04-01 2015-07-01 浙江阳天包装材料有限公司 Vacuum aluminizing machine
CN104746004A (en) * 2015-04-01 2015-07-01 浙江阳天包装材料有限公司 Vacuum aluminum plating device for packaging material
CN105112872A (en) * 2015-09-22 2015-12-02 苏州格科特真空镀膜技术有限公司 Pulse magnetron sputtering device for preparing inner surface coating of cylinder part and application of pulse magnetron sputtering device
CN107794496A (en) * 2017-10-12 2018-03-13 中国科学院近代物理研究所 Magnetic-controlled sputtering coating equipment and magnetron sputtering coating method
CN108588843A (en) * 2018-06-15 2018-09-28 光奥科技(武汉)有限公司 A kind of high-precision transverse direction vacuum coating bonding apparatus
CN110643947A (en) * 2019-11-07 2020-01-03 安徽超文玻璃科技有限公司 Film coating machine in glassware
CN111962038A (en) * 2020-09-23 2020-11-20 兰州天亿石化设备维修技术有限公司 Large-diameter high-pressure metal hose inner wall coating device and method
CN112746249A (en) * 2020-12-25 2021-05-04 中国科学院宁波材料技术与工程研究所 Multi-arc ion plating arc striking device
CN115491645A (en) * 2022-09-19 2022-12-20 中核四0四有限公司 Film coating system and method based on magnetron sputtering

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104746007A (en) * 2015-04-01 2015-07-01 浙江阳天包装材料有限公司 Vacuum aluminizing machine
CN104746004A (en) * 2015-04-01 2015-07-01 浙江阳天包装材料有限公司 Vacuum aluminum plating device for packaging material
CN104746016A (en) * 2015-04-01 2015-07-01 浙江阳天包装材料有限公司 Vacuum aluminizing device
CN105112872A (en) * 2015-09-22 2015-12-02 苏州格科特真空镀膜技术有限公司 Pulse magnetron sputtering device for preparing inner surface coating of cylinder part and application of pulse magnetron sputtering device
CN107794496A (en) * 2017-10-12 2018-03-13 中国科学院近代物理研究所 Magnetic-controlled sputtering coating equipment and magnetron sputtering coating method
CN108588843B (en) * 2018-06-15 2023-08-11 光奥科技(武汉)有限公司 High-precision transverse vacuum coating bonding device
CN108588843A (en) * 2018-06-15 2018-09-28 光奥科技(武汉)有限公司 A kind of high-precision transverse direction vacuum coating bonding apparatus
CN110643947A (en) * 2019-11-07 2020-01-03 安徽超文玻璃科技有限公司 Film coating machine in glassware
CN110643947B (en) * 2019-11-07 2021-09-14 安徽超文玻璃科技有限公司 Film coating machine in glassware
CN111962038B (en) * 2020-09-23 2023-05-12 兰州天亿石化设备维修技术有限公司 Device and method for coating inner wall of large-caliber high-pressure metal hose
CN111962038A (en) * 2020-09-23 2020-11-20 兰州天亿石化设备维修技术有限公司 Large-diameter high-pressure metal hose inner wall coating device and method
CN112746249A (en) * 2020-12-25 2021-05-04 中国科学院宁波材料技术与工程研究所 Multi-arc ion plating arc striking device
CN112746249B (en) * 2020-12-25 2022-12-23 中国科学院宁波材料技术与工程研究所 Multi-arc ion plating arc striking device
CN115491645A (en) * 2022-09-19 2022-12-20 中核四0四有限公司 Film coating system and method based on magnetron sputtering

Similar Documents

Publication Publication Date Title
CN203411602U (en) Bell jar-shaped device for coating cylindrical inner walls
KR102188022B1 (en) Configurable variable position closed track magnetron
CN104969331B (en) The optional magnetron of physical vapour deposition (PVD) radio frequency direct current open closed loop
US10283331B2 (en) PVD plasma control using a magnet edge lift mechanism
JP5265811B2 (en) Sputter deposition system
WO2007010798A1 (en) Sputtering apparatus and method for manufacturing transparent conducting film
WO2009014394A3 (en) Method for depositing ceramic thin film by sputtering using non-conductive target
TWI682048B (en) Apparatus for pvd dielectric deposition
JP5186297B2 (en) Sputtering equipment
CN103436837A (en) Improved rotary target spraying system
JP2011202217A (en) Magnetron sputtering apparatus and sputtering method
US9028659B2 (en) Magnetron design for extended target life in radio frequency (RF) plasmas
CN105441871A (en) Method and device for industrial preparation of superhard DLC carbon coating through physical vapor deposition (PVD) and high power impulse magnetron sputter (HIPIMS)
CN210287498U (en) Inner plating device for insulating tubular workpiece
WO2015023400A1 (en) Encapsulated magnetron
JP2013122080A (en) Sputtering device
CN105088156A (en) Magnetron sputtering apparatus
CN103572244A (en) Film deposition apparatus and film deposition method
CN202157113U (en) Magnetic-control sputtering coating device
CN204779787U (en) Magnetron sputtering target rifle
CN210657118U (en) Device for increasing deposition rate of magnetron sputtering coating
CN110578127B (en) Device for improving deposition rate of magnetron sputtering coating
JP6045031B2 (en) Deposition equipment
RU2015108566A (en) METHOD FOR SPRAYING THIN-FILM COATINGS ON THE SURFACE OF SEMICONDUCTOR HETEROEPITAXIAL STRUCTURES BY MAGNETRON SPRAYING
CN102230160B (en) Overvoltage pulse-enhanced magnetic control sputtering film plating method

Legal Events

Date Code Title Description
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20140129

Termination date: 20150530

EXPY Termination of patent right or utility model