CN109725488A - 黑色基质用颜料分散组合物及含有其的黑色基质用颜料分散抗蚀剂组合物 - Google Patents

黑色基质用颜料分散组合物及含有其的黑色基质用颜料分散抗蚀剂组合物 Download PDF

Info

Publication number
CN109725488A
CN109725488A CN201811252561.5A CN201811252561A CN109725488A CN 109725488 A CN109725488 A CN 109725488A CN 201811252561 A CN201811252561 A CN 201811252561A CN 109725488 A CN109725488 A CN 109725488A
Authority
CN
China
Prior art keywords
pigment
black
black matix
matix
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201811252561.5A
Other languages
English (en)
Chinese (zh)
Inventor
辻康人
户田光信
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sakata Inx Corp
Original Assignee
Sakata Inx Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sakata Inx Corp filed Critical Sakata Inx Corp
Publication of CN109725488A publication Critical patent/CN109725488A/zh
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Pigments, Carbon Blacks, Or Wood Stains (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
CN201811252561.5A 2017-10-30 2018-10-25 黑色基质用颜料分散组合物及含有其的黑色基质用颜料分散抗蚀剂组合物 Pending CN109725488A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017208973A JP6960304B2 (ja) 2017-10-30 2017-10-30 ブラックマトリックス用顔料分散組成物及びそれを含有するブラックマトリックス用顔料分散レジスト組成物
JP2017-208973 2017-10-30

Publications (1)

Publication Number Publication Date
CN109725488A true CN109725488A (zh) 2019-05-07

Family

ID=66295715

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201811252561.5A Pending CN109725488A (zh) 2017-10-30 2018-10-25 黑色基质用颜料分散组合物及含有其的黑色基质用颜料分散抗蚀剂组合物

Country Status (4)

Country Link
JP (1) JP6960304B2 (fr)
KR (1) KR102605836B1 (fr)
CN (1) CN109725488A (fr)
TW (1) TWI772548B (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114539849A (zh) * 2020-11-25 2022-05-27 阪田油墨株式会社 黑矩阵用颜料分散组合物、黑矩阵用抗蚀剂组合物以及黑矩阵

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7401389B2 (ja) 2020-04-27 2023-12-19 サカタインクス株式会社 ブラックマトリックス用顔料分散組成物、およびブラックマトリックス用顔料分散レジスト組成物
JP7479189B2 (ja) 2020-05-07 2024-05-08 サカタインクス株式会社 ブラックマトリックス用顔料分散組成物、およびブラックマトリックス用顔料分散レジスト組成物
JP2023035083A (ja) 2021-08-31 2023-03-13 富士フイルム株式会社 組成物、遮光膜、固体撮像素子、画像表示装置、硬化膜の製造方法
WO2023068201A1 (fr) * 2021-10-20 2023-04-27 三菱ケミカル株式会社 Dispersion de pigment, composition de résine photosensible, produit durci, matrice noire et dispositif d'affichage d'image
JP2023128803A (ja) 2022-03-04 2023-09-14 富士フイルム株式会社 組成物、遮光膜、固体撮像素子、画像表示装置、硬化膜の製造方法
WO2023176899A1 (fr) * 2022-03-18 2023-09-21 三菱ケミカル株式会社 Composition de résine photosensible, dispersion de pigment, produit durci, matrice noire et dispositif d'affichage d'image

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000329926A (ja) * 1999-05-18 2000-11-30 Toray Ind Inc 顔料分散樹脂溶液組成物、その製造方法およびカラーフィルター
JP2014102346A (ja) * 2012-11-19 2014-06-05 Sakata Corp ブラックマトリックス用顔料分散組成物及びそれを含有するブラックマトリックス用顔料分散レジスト組成物
CN105026963A (zh) * 2013-03-07 2015-11-04 东丽株式会社 黑矩阵基板
CN105504890A (zh) * 2014-10-14 2016-04-20 阪田油墨股份有限公司 黑色基质用颜料分散组合物
JP2016125027A (ja) * 2015-01-07 2016-07-11 株式会社Adeka 着色剤分散液、着色組成物及びカラーフィルタ

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5932435B2 (ja) * 2012-03-29 2016-06-08 サカタインクス株式会社 カラーフィルター用青色顔料分散組成物及びそれを含有するカラーフィルター用青色顔料分散レジスト組成物
JP2014157179A (ja) 2013-02-14 2014-08-28 Toppan Printing Co Ltd ブラックマトリックス、カラーフィルタ、液晶表示装置及びブラックマトリックスの形成方法
JP2015102792A (ja) 2013-11-27 2015-06-04 凸版印刷株式会社 黒色感光性樹脂組成物、ブラックマトリックス基板、カラーフィルタ、液晶表示装置及び有機エレクトロルミネッセンス表示装置
JP2015138180A (ja) 2014-01-23 2015-07-30 凸版印刷株式会社 カラーフィルタ、液晶表示パネルおよび液晶表示装置
JP2016091015A (ja) * 2014-10-31 2016-05-23 サカタインクス株式会社 トリアリールメタン系色素含有カラーフィルター用着色組成物及びそれを含有するトリアリールメタン系色素含有カラーフィルター用レジスト組成物

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000329926A (ja) * 1999-05-18 2000-11-30 Toray Ind Inc 顔料分散樹脂溶液組成物、その製造方法およびカラーフィルター
JP2014102346A (ja) * 2012-11-19 2014-06-05 Sakata Corp ブラックマトリックス用顔料分散組成物及びそれを含有するブラックマトリックス用顔料分散レジスト組成物
CN105026963A (zh) * 2013-03-07 2015-11-04 东丽株式会社 黑矩阵基板
CN105504890A (zh) * 2014-10-14 2016-04-20 阪田油墨股份有限公司 黑色基质用颜料分散组合物
JP2016125027A (ja) * 2015-01-07 2016-07-11 株式会社Adeka 着色剤分散液、着色組成物及びカラーフィルタ

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114539849A (zh) * 2020-11-25 2022-05-27 阪田油墨株式会社 黑矩阵用颜料分散组合物、黑矩阵用抗蚀剂组合物以及黑矩阵

Also Published As

Publication number Publication date
KR102605836B1 (ko) 2023-11-27
TWI772548B (zh) 2022-08-01
TW201925379A (zh) 2019-07-01
JP6960304B2 (ja) 2021-11-05
JP2019082533A (ja) 2019-05-30
KR20190049500A (ko) 2019-05-09

Similar Documents

Publication Publication Date Title
CN109725488A (zh) 黑色基质用颜料分散组合物及含有其的黑色基质用颜料分散抗蚀剂组合物
JP5281412B2 (ja) ブラックマトリックス用顔料分散組成物およびそれを含有するブラックマトリックス用顔料分散レジスト組成物
JP6543453B2 (ja) ブラックマトリックス用顔料分散組成物
TWI791651B (zh) 黑色顏料分散組成物及含有其的黑色顏料分散抗蝕劑組成物
TWI608057B (zh) 彩色濾光片用藍色顏料分散組合物及含有其之彩色濾光片用藍色顏料分散抗蝕劑組合物
CN105518087A (zh) 黑矩阵用颜料分散物和含有该黑矩阵用颜料分散物的黑矩阵用颜料分散抗蚀剂组合物
JP6113466B2 (ja) ブラックマトリックス用顔料分散組成物及びそれを含有するブラックマトリックス用顔料分散レジスト組成物
JP3998304B2 (ja) カラーフィルター
JP4302075B2 (ja) ブラックマトリックス形成用ブラックレジスト組成物
TW202142616A (zh) 黑矩陣用顏料分散組成物、及黑矩陣用顏料分散光阻組成物
TW202231793A (zh) 黑矩陣用顏料分散組成物、黑矩陣用光阻組成物及黑矩陣
JP4090279B2 (ja) ブラックマトリックス用レジスト組成物
TW202140654A (zh) 黑矩陣用顏料分散組成物、及黑矩陣用顏料分散光阻組成物
TW202225336A (zh) 黑矩陣用顏料分散組成物、黑矩陣用光阻組成物、及黑矩陣
TW202231797A (zh) 黑矩陣用顏料分散組成物、黑矩陣用光阻組成物、及黑矩陣
CN109814192A (zh) 彩色滤光片用蓝色颜料分散组合物
JP2022129982A (ja) ブラックマトリックス用顔料分散組成物、ブラックマトリックス用レジスト組成物、及び、ブラックマトリックス
TW202344628A (zh) 黑矩陣用顏料分散組成物、黑矩陣用光阻組成物、及黑矩陣
TW202147028A (zh) 黑矩陣用光阻組成物、及黑矩陣

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination