CN109690365B - 耐蚀光学装置 - Google Patents

耐蚀光学装置 Download PDF

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CN109690365B
CN109690365B CN201680060850.8A CN201680060850A CN109690365B CN 109690365 B CN109690365 B CN 109690365B CN 201680060850 A CN201680060850 A CN 201680060850A CN 109690365 B CN109690365 B CN 109690365B
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CN109690365A (zh
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詹森·I·雷德利
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Materion Corp
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Abstract

公开了一种耐蚀光学装置。该装置包括衬底、该衬底上的银层以及提供耐磨性的绝缘层。该装置浸入富硫醇的溶液中。硫醇在任何暴露的银表面上形成缓蚀单层。这增加了该光学装置的环境抵抗力，从而使水不与该银层相互作用。

Description

耐蚀光学装置
相关申请
本申请要求于2015年10月19日提交的、第62/243,247号美国临时专利申请的优先权。
技术领域
本公开涉及应用了缓蚀单层来保护装置的银表面的光学装置。还公开了生产这种装置的方法。
背景技术
光学涂层是沉积在诸如透镜或反射镜之类的光学部件上的材料层，其可以改变光学部件反射和透射光的方式。因此，光学涂层广泛用于光学应用中，例如，天文照相机、静物照相机、视频摄像机和其它成像设备，电视机、计算机显示器、蜂窝电话屏幕和其他显示设备，各种光学传感器，诸如运动传感器、手势传感器等。根据应用的不同，涂层的厚度和设计可能会有所不同。
已经证实，银在可见光谱中具有优异的反射特性，特别是与金相比。然而，由于银的环境抵抗力较差，而且比较柔软，通常在高精度成像应用中避免使用银。例如，科学界已经对银会被潮湿空气中的含硫气体所硫化有着详尽记载。
电介质层有时被应用到金属膜之上，或者用作增加耐磨性的保护层，或者用于增强金属膜的反射率。金属和电介质的组合也用于定制对波长、角度和偏振敏感的高级涂层。光学装置的总体反射率和透射能力可基于其组成、厚度和层数来定制。然而，这些保护层中的缺陷部位(例如，针孔)却成为可以腐蚀银的硫化物的切入点。需要开发可以减少由不完善和/或穿孔的电介质层导致的硫化反应和其他不良反应的涂层，并且需要提供将该涂层应用于光学装置的方法。
发明内容
本公开涉及具有缓蚀单层的光学装置，特别是优先吸附到银上具有衍生自疏水硫醇单层其的光学装置。还包括将该单层应用到衬底表面的工艺。
鉴于此，本公开的各个实施例中公开的耐蚀光学装置包括：衬底；绝缘层；位于该衬底和绝缘层之间的银层；以及覆盖该银层的任何暴露表面至少一部分的缓蚀单层。
该缓蚀单层可以由至少一种疏水硫醇形成。在具体的实施例中，疏水硫醇的化学式为R-SH。其中，R是含有约1-24个碳原子的烷基。
该光学装置还可以包括该绝缘层和银层之间的结合层。该光学装置还可以包括该银层和衬底之间的合金层。该合金层可以与衬底直接接触，并且可以由镍铬合金形成。
在一些实施例中，该缓蚀单层被直接应用到绝缘层上。通过将该绝缘层浸入富硫醇的溶液(thiol-rich solution)中，可将该缓蚀单层应用到绝缘层上。该绝缘层可被浸入约4-36小时的时间。在具体的实施例中，该缓蚀单层由包括烷基硫醇(alkanethiol)和醇溶剂的溶液形成。
本公开还公开了用于形成耐蚀光学装置的方法，包括：在衬底上形成银层；在该银层上形成绝缘层以获得层叠衬底；以及将该层叠衬底浸入富硫醇的溶液中以形成覆盖该银层的任何暴露表面至少一部分的缓蚀单层。
下文将更具体地描述本公开的上述特征及其它非限制性特征。
附图说明
以下是对附图的简要描述，其出于说明、而非限制本公开示例性实施例的目的而呈现。
图1是具有绝缘层、银层和针孔缺陷的示例性光学装置的横截面图；以及
图2是具有绝缘层、银层、针孔缺陷和应用的疏水硫醇单层的示例性光学装置的横截面图。
具体实施方式
通过参考附图可以更全面地理解本文公开的组件、工艺和器件。这些附图仅是基于方便性和易于示范本公开的示意性表示，因此并非旨在指示装置或组件的相对大小和尺寸，和/或限定或限制示例性实施例的范围。
为了清楚起见，虽然在下文描述中使用了具体术语，但是这些术语旨在仅说明在附图中选择的实施例的特定结构，并非旨在限定或限制本公开的范围。在下文的附图和描述中，应当理解，相同的数字标号表示类似功能的组件。
除非上下文另有明确规定，否则单数形式“一种(a/an)”、“所述/该(the)”也包括复数形式。
如在说明书和权利要求中所使用的，术语“包括”可以包括实施例中的“由...组成”和“基本上由...组成”。本文使用的术语“包括(comprise/include)”、“具有(having/has)”、“可以”、“含有”及其变体为开放式过渡性短语、术语或词语，其要求存在指定组件/步骤，同时允许存在其它组件/步骤。然而，这样的描述应被解释为还描述了“由所列举的组件/步骤组成”和“基本上由所列举的组件/步骤组成”的组合物或工艺，其允许仅存在指定的组件/步骤，以及可能导致的任何混合物，但是不包括其它组件/步骤。
本申请的说明书和权利要求书中的数值应当理解为包括当减少到相同数量的有效数字时相同的数值、以及与设定值之差小于本公开中所述的那类传统测量技术的实验误差的数值，以确定该值。
本文公开的所有范围包括所列举的端点且可独立组合(例如，“2克至10克”的范围包括端点，2克和10克，以及所有中间值)。
由一个或多个术语(例如“大约”和“基本上”)修饰的值可以不限于所指定的精确值。修饰语“大约”也应该被认为是公开了由两个端点的绝对值定义的范围。例如，“从大约2到大约4”的范围也公开了“从2到4”的范围。术语“大约”可以表示所指数字的正负10％。例如，“约10％”可以表示9％至11％的范围，“约1”可以表示0.9-1.1。
本公开可以涉及某些工艺步骤的温度。应当注意，这些温度通常是指热源(例如，熔炉或者烤箱)设定的温度，并不一定是指材料暴露在热源时必须达到的温度。
说明书和权利要求书中所使用的术语“金属”是指较纯的元素金属(即，含有单一元素和杂质的金属)或由两种或更多种元素组成的合金。
本公开将涉及在第二层上形成的第一层。术语“在...之上(on/onto/upon)”是指第二层作为位于其顶部的第一层的底部或者支撑物。例如，如果有一个第三层位于第一层和第二层之间，即使第一层和第二层没有直接接触，也可以认为第一层位于第二层“之上”。
本公开涉及保护被电介质外涂层保护的银涂层/膜/层的方法。即使具有保护性外涂层，但是，诸如针孔等的缺陷部位还是可以作为硫化物的切入点。镀银的光学装置可以被浸入富硫醇(thiol-rich)的溶液中。硫醇会优先吸附在只在缺陷部位暴露的银上。硫醇的疏水尾部使水不与银层相互作用。
图1是传统光学装置100的横截面图。通常，该装置具有衬底105；在衬底105上形成银层103，然后在银层103上形成绝缘层101。如图所示，绝缘层101可以直接应用到结合层102上，以便与结合层充分物理接触，这样能够通过外部环境提供不渗透层。结合层102也与银层103完全物理接触，银层103又与合金层104完全物理接触。该合金层被直接应用到衬底105上，以便与衬底105完全物理接触。在图中，针孔缺陷107延伸穿过绝缘层101、结合层102、银层103和合金层104，使得衬底105的上表面被暴露。用箭头和附图标记106标记针孔缺陷107内的银层103的暴露部分/表面。应当注意，针孔缺陷不需要延伸穿过光学装置100的所有层。即使针孔仅延伸穿过绝缘层101和结合层102，也足以暴露银层103。
图2是示例性光学装置200的横截面图。类似图1所示的装置，在图2所示的横截面中，绝缘层201直接层叠到结合层202上。结合层202直接层叠到银层203上，银层203又直接层叠到合金涂层或合金层204上。合金层204直接层叠到衬底205上。针孔缺陷207再次暴露部分银层203。然而，在该图中，应用了疏水硫醇单层206。硫醇的亲水端基吸附到暴露的银上，并且硫醇的疏水端基延伸到针孔缺陷207中。疏水端基显著减少了暴露的银与水和其它水溶液的相互作用，并且充当了缓蚀单层。值得注意的是，理想情况下，硫醇单层/缓蚀单层覆盖了银层所有的暴露表面。但是，可以预期到该单层可以仅覆盖银层的任何给定暴露表面的一部分，或者仅覆盖银层的一些暴露表面。
至少一种疏水硫醇存在于单层206中。通常，疏水硫醇是化学式为R-SH的化合物，其中，R是含有约1-24个碳原子的烷基。在具体实施例中，用于形成单层的硫醇是正十八硫醇(1-octadecanethiol)，其对银的粘附性很好。硫醇与诸如乙醇的醇溶剂混合以形成富硫醇溶液。然后通过将该光学装置浸入富硫醇的乙醇溶液中约4-36小时(包括约24小时)来形成单层。
绝缘层101/201可以是用作银涂层或银层的绝缘/保护层的电介质涂层。该电介质层通常可以是无机材料膜、有机聚合物膜或有机-无机复合膜。例如，适合作为电介质层的无机材料包括：氧化硅、氮化硅、氧化铝、钛酸钡、钛酸锆酸钡等。例如，合适的有机聚合物包括：聚酯、聚碳酸酯、聚(乙烯基苯酚)、聚酰亚胺、聚苯乙烯、聚甲基丙烯酸酯、聚丙烯酸酯、环氧树脂等。该电介质层的厚度取决于所使用材料的介电常数。例如，其可以约为10-500nm。该电介质层的电导率可以，例如，小于约10-12西门子每厘米(S/cm)。该电介质层由本领域已知的常规工艺形成。
合金层104/204可以是金属合金。在具体实施例中，该合金是镍铬合金。在其他实施例中，该合金可以是镍、铬、铁、铝、钢、锌和本领域已知和应用的任何其他材料中的一种。
成像构件的衬底105/205可以是不透明或基本透明的，并且可以包括具有所需机械特性的任何合适的材料。例如，该衬底可以包括一非导电层、半导体层或诸如无机或有机组合物的导电材料层。可以使用各种树脂作为非导电材料，包括：聚酰亚胺、聚酯、聚碳酸酯、聚酰胺、聚氨酯等，其作为薄网时是柔性的。
虽然已经参考示例性实施例描述本公开，但显然，在阅读和理解上述详细描述后，其它技术人员也可对本公开进行修改和变更，旨在将本公开解释为包括在所附权利要求或其等值范围之内的所有这些修改和变更。

Claims (14)

1.一种耐蚀光学装置，包括：
衬底；
绝缘层；
位于所述衬底和所述绝缘层之间的银层，其中至少一个针孔缺陷延伸穿过所述绝缘层以暴露所述银层的表面的至少一部分；以及
缓蚀单层，由至少一种疏水硫醇形成；
其中通过将所述绝缘层浸入富硫醇的溶液中，将所述缓蚀单层直接施加至所述绝缘层上，其中所述缓蚀单层粘附至所述银层的暴露表面的至少一部分上，以覆盖所述至少一个针孔缺陷。
2.根据权利要求1所述的光学装置，其中所述疏水硫醇的化学式为R-SH，R为含有1-24个碳原子的烷基。
3.根据权利要求1所述的光学装置，还包括在所述绝缘层和所述银层之间的结合层。
4.根据权利要求1所述的光学装置，还包括在所述银层和所述衬底之间的合金层。
5.根据权利要求4所述的光学装置，其中所述合金层与所述衬底直接接触。
6.根据权利要求4所述的光学装置，其中所述合金层由镍铬合金形成。
7.根据权利要求1所述的光学装置，其中所述绝缘层被浸入4-36小时的时间。
8.根据权利要求1所述的光学装置，其中所述缓蚀单层由包括烷基硫醇和醇溶剂的溶液制成。
9.根据权利要求1所述的光学装置，其中所述缓蚀单层覆盖所述银层的所有暴露表面。
10.一种形成耐蚀光学装置的方法，包括：
在衬底上形成银层；
在所述银层上形成绝缘层以获得层叠衬底，其中至少一个针孔缺陷延伸穿过所述绝缘层以暴露所述银层的表面的至少一部分；以及
将所述层叠衬底浸入富硫醇的溶液中以形成粘附至所述银层的任何暴露表面至少一部分的缓蚀单层，以覆盖所述至少一个针孔缺陷；其中所述富硫醇的溶液含有至少一种疏水硫醇，以形成包含至少一种疏水硫醇的缓蚀单层。
11.根据权利要求10所述的方法，其中所述层叠衬底被浸入4-36小时的时间。
12.根据权利要求10所述的方法，其中所述至少一种疏水硫醇的化学式为R-SH，R为含有1-24个碳原子的烷基。
13.根据权利要求10所述的方法，其中所述富硫醇溶液包括烷基硫醇和醇溶剂。
14.由权利要求10-13中任一项所述的方法形成的所述耐蚀光学装置。
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