CN109597279A - Vacuum suction hand, substrate connection device and litho machine - Google Patents
Vacuum suction hand, substrate connection device and litho machine Download PDFInfo
- Publication number
- CN109597279A CN109597279A CN201710944128.7A CN201710944128A CN109597279A CN 109597279 A CN109597279 A CN 109597279A CN 201710944128 A CN201710944128 A CN 201710944128A CN 109597279 A CN109597279 A CN 109597279A
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- absorption axis
- vacuum suction
- rotation
- main body
- suction hand
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
The present invention provides a kind of vacuum suction hand, substrate connection device and litho machine.The vacuum suction hand includes absorption axis, suction nozzle, main body rack, driving assembly and anti-rotation structure.The substrate connection device includes pedestal and several vacuum suction hands for being symmetrically distributed in the pedestal.The litho machine includes base station, the base station is equipped with substrate cross-connecting area, the substrate connection device is installed, the substrate connection device is located at the lower section of the substrate cross-connecting area, and the position that substrate cross-connecting area surface corresponds to the vacuum suction hand is provided with through-hole in the base station；When joining substrate, the vacuum suction hand can be upwardly extended via the through-hole.Substrate connection device provided by the invention improves self space utilization rate, reduces bulk；In addition, the substrate connection device uses circular air-float guide rail, keeps device easily fabricated, readily satisfy the requirement of the guide rail accuracy of manufacture.
Description
Technical field
The present invention relates to field of semiconductor manufacture, and in particular to a kind of vacuum suction hand, substrate connection device and litho machine.
Background technique
Lithographic equipment is a kind of process technology equipment by mask pattern exposure image to substrate.Known lithographic equipment
Including stepping repetitive and step-by-step scanning type.In above-mentioned lithographic equipment, corresponding device need to be configured as mask and base
The carrier and mask plate at bottom and the connecting mechanism of substrate, are mounted with the carrier of mask and the carrier equipped with substrate generates relatively
Movement is to meet photoetching needs.
The carrier of aforementioned mask version is referred to as holding bed, and the carrier of above-mentioned substrate is referred to as wafer-supporting platform, the friendship of substrate
Connection mechanism is referred to as substrate connection device.It holds bed and wafer-supporting platform is located at the mask platform subsystem and workpiece of lithographic equipment
In platform subsystem, holds bed and wafer-supporting platform is the nucleus module of place subsystem.Wherein, the relative motion of bed and wafer-supporting platform is held
When, it must guarantee that mask and substrate are reliably positioned always, that is, limit the six-freedom degree of mask plate and substrate.In addition,
Before lithographic equipment is exposed operation, substrate is moved to by wafer-supporting platform from transmission manipulator by substrate connection device, is exposed
Substrate is separately moved to by transmission manipulator from wafer-supporting platform by substrate connection device after the completion.
Existing substrate connection device mainly uses mechanical guide or air-float guide rail to realize silicon wafer absorption, can pass through respectively
Its movement of motor or compressed air-driven.Either mechanical guide or air-float guide rail are required to additionally configure anti-rotation structure
The rotation for limiting substrate connection device, it is big to will cause entire substrate connection device bulk in this way, limits whole device
Space layout.In the prior art, there are multiple guide surfaces using the anti-rotation structure of the substrate connection device of air-float guide rail, it is existing
Manufacturing technology is difficult the accuracy of manufacture of multiple guide surfaces while meeting the requirements, thus the system of the substrate connection device of this form
It is big to make difficulty.
Summary of the invention
The purpose of the present invention is to provide a kind of vacuum suction hand, substrate connection device and litho machines, to solve existing skill
Substrate connection device bulk in art is big and manufacture difficulty is big, is unable to satisfy and asks what the accuracy of manufacture of guide rail required
Topic.
To achieve the above object, the present invention provides a kind of vacuum suction hand, including absorption axis, suction nozzle, main body rack, driving
Component and anti-rotation structure, anti-rotation structure described in the absorption axis connection, the driving component drive the absorption axis and described prevent
Rotation structure slides axially in the main body rack, the anti-rotation structure limit the relatively described main body rack of absorption axis around
Axial rotation, the absorption axis top connect the suction nozzle, are equipped with vacuum passage in the absorption axis, the suction nozzle with it is described very
Empty channel connection.
Optionally, the anti-rotation structure has multiple first anti-rotations in angle setting towards the direction of the main body rack
Face, the main body rack is interior to have multiple second anti-rotations in the setting of same angle to match with the multiple first anti-rotation face
Face, the multiple first anti-rotation face and the multiple second anti-rotation face are provided commonly for limiting the anti-rotation structure in the main body branch
Around axial rotation in frame.
Optionally, equipped with for the absorption axis, the first pilot hole and confession are described anti-in axial sliding in the main body rack
Rotation structure the second pilot hole in axial sliding, off-axis connects between the absorption axis and the anti-rotation structure, first guiding
Hole off-axis setting corresponding with second pilot hole.
Optionally, the driving component includes stator and mover, the stator and the mover arranged concentric, the stator
Be fixed in the main body rack, the mover be mounted on the anti-rotation structure and with the absorption axis arranged concentric.
Optionally, the off-axis between the absorption axis and the anti-rotation structure is away from for 1mm to 2mm.
Optionally, compressed air has been passed through between the main body rack and the absorption axis to form air bearing oriented film.
Optionally, compressed air has been passed through between the main body rack and the anti-rotation structure to form air bearing guiding
Film.
Optionally, the compression for being provided with several first segment discharge orifices in the absorption axis and being connected to the first segment discharge orifice
Air duct, the compressed air pass sequentially through the compressed air channel, first segment discharge orifice enter the absorption axis with it is described
Between main body rack.
Optionally, several second throttle orifices are provided on the anti-rotation structure, the compressed air passes through second section
Discharge orifice enters between the anti-rotation structure and the main body rack.
Optionally, the compressed air circulation groove being connected to the compressed air channel, institute are provided on the anti-rotation structure
Compressed air circulation groove is stated for being connected to external compressed air source.
Optionally, the vacuum being connected to the vacuum passage in the absorption axis is additionally provided on the anti-rotation structure to enter
Mouthful, for being connected to external vacuum source.
Optionally, it is described absorption axis bottom part be inserted and secured in the anti-rotation structure, the anti-rotation structure with
Several sealing rings are additionally provided between the absorption axis, for true between anti-rotation structure described in isolating seal and the absorption axis
Empty and compressed air.
Optionally, the vacuum suction hand further includes pre- mounted mechanism, and the pre- mounted mechanism includes metal object and magnet, described
Metal object is arranged at least one of the multiple first anti-rotation face, and it is anti-that the magnet is correspondingly arranged at the multiple second
Turn at least one of face or the metal object is arranged at least one of the multiple second anti-rotation face, the magnetic
Iron is correspondingly arranged at least one of the multiple first anti-rotation face.
Optionally, the absorption axis is cylindrical body, and the anti-rotation structure is bucking ladder.
Optionally, the absorption axis and the anti-rotation structure are cylindrical body.
Further, the present invention also provides a kind of substrate connection devices, including pedestal and are symmetrically distributed in the several of pedestal
The vacuum suction hand.
Further, the present invention also provides a kind of litho machine, including base station, the base station joins equipped with substrate
Area is equipped with the substrate connection device in the base station, and the substrate connection device is located under the substrate cross-connecting area
Side, the position that substrate cross-connecting area surface corresponds to the vacuum suction hand are provided with through-hole；When joining substrate, the vacuum is inhaled
Attached hand can be upwardly extended via the through-hole.
To sum up, if the substrate connection device that the invention of this reality provides includes pedestal and the dry vacuum for being symmetrically distributed in the pedestal
Hand is adsorbed, the vacuum suction hand includes absorption axis, suction nozzle, main body rack, driving assembly and anti-rotation structure, and the absorption axis connects
The anti-rotation structure is connect, the driving component drives the absorption axis and the anti-rotation structure in the main body rack along axial direction
Sliding, the anti-rotation structure limit the absorption axis relative to the main body rack around axial rotation, the absorption axis top connection
The suction nozzle, the absorption axis is interior to be equipped with vacuum passage, and the suction nozzle is connected to the vacuum passage.Particularly, the anti-rotation
Structure have in angle setting multiple first air bearing surfaces, the main body rack have in same angle be arranged and with the first air bearing
Matched multiple second air bearing surfaces in face, to be provided commonly for limiting by multiple first air bearing surfaces and multiple second air bearing surfaces
It makes rotation of the subpart in the absorption axis circumferential direction and so and increases additional anti-rotation knot in the prior art
Structure is compared, and the present invention improves the inner space utilization rate of substrate connection device, meanwhile, reduce the space of substrate connection device
Size.
In addition, the anti-rotation structure preferably includes the air bearing block being mounted on absorption axis, the absorption axis is cylindrical knot
Structure, the main body rack have with the periphery of absorption axis towards matched guide surface.The air bearing block has and absorption axis simultaneously
Parallel two planes of axial direction, which, which is used to match with another two planes of main body rack, is provided commonly for limitation institute
State rotation of the subpart in the absorption axis circumferential direction；Either, the absorption axis is cylindrical structure and inclined including axis
The first part of heart setting and second part, the outer peripheral surface of the first part and the outer peripheral surface of second part are used for and main body branch
Another two outer peripheral surfaces of frame, which match, is provided commonly for limiting the subpart in the rotation adsorbed in axis circumferential direction.In this way,
The guide surface moved in a straight line by the cylindrical surface of plane or eccentric setting as subpart not only makes substrate connection device easy
In industrially manufacturing, and readily satisfy the accuracy of manufacture requirement of guide rail.
Detailed description of the invention
Fig. 1 is the structural schematic diagram for the vacuum suction hand that one embodiment of the invention provides；
Fig. 2 is the top view of vacuum suction hand described in Fig. 1；
Fig. 3 is the structural schematic diagram of eccentric absorption axis and main body rack that the preferred embodiment of the present invention provides；
The reference numerals are as follows:
Main body rack；021- air bearing block；031- adsorbs axis；04- electric mover；05- motor stator；
07- suction nozzle；08- oriented film；034- first segment discharge orifice；033- compressed air channel；
024- vacuum inlet；The compressed air inlet 025-；022- compressed air communication slot；023- sealing ring；
032- vacuum passage；The first air bearing of 101- space；The second air bearing of 102- space；The second throttle orifice of 026-；
061- preloads steel bar；062- preloads magnet；091- displacement sensor；092- measures target surface；
12- bias adsorbs axis；Cylinder air bearing surface；Substrate connection device.
Specific embodiment
A specific embodiment of the invention is described in more detail below in conjunction with schematic diagram.According to following description,
Advantages and features of the invention will become apparent from.It should be noted that attached drawing is all made of very simplified form and using non-accurate
Ratio, only for the purpose of facilitating and clarifying the purpose of the embodiments of the invention.
Embodiment 1
Fig. 1 is the structural schematic diagram for the vacuum suction hand that one embodiment of the invention provides, and Fig. 2 is that vacuum described in Fig. 1 is inhaled
The top view of attached hand.As depicted in figs. 1 and 2, the vacuum suction hand of the present embodiment includes absorption axis 031, suction nozzle 07, main body rack
01, driving assembly and anti-rotation structure, the absorption axis 031 connect the anti-rotation structure, and the driving component drives the absorption
Axis 031 and the anti-rotation structure slide axially in the main body rack 01, and the anti-rotation structure limits the absorption axis 031
Relative to the main body rack 01 around axial rotation, 031 top of absorption axis connects the suction nozzle 07, in the absorption axis 031
Equipped with vacuum passage, the suction nozzle 07 is connected to the vacuum passage.
Wherein, the absorption axis 031 is actively located in the main body rack 01, can be along master in order to adsorb axis 031
Body support frame 01 moves in the axial direction.Particularly, the anti-rotation structure has (sees in multiple first air bearing surfaces of angle setting
Fig. 2 101 and 102), while the main body rack 01 have in same angle setting multiple second air bearing surfaces (see Fig. 2
101 and 102), first air bearing surface matches with second air bearing surface, and multiple first air bearing surfaces and multiple institutes
The second air bearing surface is stated to be provided commonly for limiting the rotation in absorption 031 circumferential direction of axis.
Vacuum suction hand provided in this embodiment has an anti-rotation structure seperated or integrated with absorption axis 031, this is anti-
Rotation structure has multiple first air bearing surfaces in angle, can be good at limiting by multiple first air bearing surfaces in angle
The rotation for adsorbing axis 031, to improve vacuum suction hand in this way not necessarily like additional anti-rotation structure is increased in the prior art
Inner space utilization rate reduces the bulk of vacuum suction hand.
Further, with continued reference to Fig. 1 and Fig. 2, the anti-rotation structure further includes air bearing block 021, the driving component packet
Include motor stator 05 and electric mover 04, the electric mover 04 be mounted on air bearing block 021 and with the absorption concentric cloth of axis 031
It sets.
The absorption axis 031 be preferably a cylindrical shaft, it is described absorption axis 031 cross-sectional diameter be preferably 7mm extremely
8mm, while promoting the substrate connection device space utilization rate, make it is described absorption axis 031 inner vacuum channel and
Compressed air channel is more reasonably laid out.
Wherein, the motor stator 05 is connect with the main body rack 01, and constitutes the stationary part of substrate connection device.
The air bearing block 021, absorption axis 031, electric mover 04 and suction nozzle 07 constitute the mover portion of the substrate connection device together
Point.The suction nozzle 07 is set to one end of the absorption axis 031, and is provided with vacuum passage 032 in the absorption axis 031, together
Shi Suoshu suction nozzle 07 is provided with another vacuum passage that can be connected to vacuum passage 032, in this way can be by suction nozzle 07 with vacuum
The mode absorbable substrate of absorption.
It is preferably provided with oriented film 08 between the main body rack 01 and absorption axis 031, the oriented film 08 is equivalent to whole
The main guide rail of a subpart realizes the guiding of the high-precision low friction of subpart.So, the absorption axis 031 is described
It can be moved in a straight line along the oriented film 08 under the driving of electric mover 04.In the present embodiment, set on the absorption axis 031
There are first segment discharge orifice 034 and compressed air channel 033, the compressed air channel 033 is connected with first segment discharge orifice 034, with
Make compressed air passes sequentially through compressed air channel 033, first segment discharge orifice 034 enters main body rack 01 between absorption axis 031
Form the oriented film 08.Preferably, the compressed air channel 033 also with the compressed air communication slot 022 on air bearing block 021
And compressed air inlet 025 is connected.
It is preferred that the absorption axis 031 is provided centrally with the vacuum passage 032, the entrance of the vacuum passage 032 can
It is connected with the vacuum inlet 024 on air bearing block 021, the outlet of the vacuum passage 032 and another vacuum of suction nozzle 07 are logical
The entrance in road is connected, and vacuum adsorption force is provided for suction nozzle 07, to carry out the absorption of silicon wafer.
The cross-sectional shape of the vacuum passage 032 can be circle, and diameter is preferably in 1.6mm between 2mm, if very
The too small absorption that will cause larger pressure drop influence to silicon wafer of the diameter in empty channel, if the diameter of vacuum passage is too big to be made to adsorb axis
031 size increases accordingly, and promotes manufacturing cost.The cross-sectional shape of compressed air channel 033 also can be circle, and diameter is excellent
0.8mm is selected between 1mm, compressed air require can be made to reduce if the size of compressed air channel 033 is too small, influence air bearing and lead
The performance of rail.
In one embodiment, the main body rack 01 has the guide surface to match with the outer peripheral surface of absorption axis 031, institute
Stating air bearing block 021 has the multiple first anti-rotation face in angle setting parallel with the absorption axial direction of axis 031, while the main body
Bracket 01 also has multiple second anti-rotations face for matching with the multiple first anti-rotation face, the multiple first anti-rotation face and more
There are gaps between a second anti-rotation face.In the present embodiment, the air bearing block 021 is bucking ladder, is had there are three the first anti-rotation face,
Wherein the first anti-rotation face positioned at two sides is as two the first air bearing surfaces, and there are two the second air bearings for tool on corresponding main body rack 01
Face, be passed through between two the first air bearing surfaces and two the second air bearing surfaces to match with first air bearing surface compressed air with
The first air bearing space 101 and the second air bearing space 102 are constituted, provides gas for axial movement of the anti-rotation structure in main body rack 01
Floating oriented film.It is preferably 90 ° that an angle is formed between first air bearing space 101 and second air bearing space 102.
First air bearing space 101 and the second air bearing space 102 can be by the second sections for being connected with compressed air inlet 025
Discharge orifice 026 provides compressed air, so that compressed air passes sequentially through compressed air inlet 025, the second throttle orifice 026 enters first
Air bearing space 101 and the second air bearing space 102.
Preferably, preloading steel bar 061 is also equipped on the main body rack 01, and corresponding installation on the air bearing block 021
There is preloading magnet 062, the preloading steel bar 061 can generate certain attraction with preloading magnet 062, and the attraction is described
First air bearing space 101 and the second air bearing space 102 provide preloading absorption axis appropriate.However, the present invention includes but is not limited to
Steel bar, as long as the object of metal material.In addition, the preloading steel bar 061 also may be provided on air bearing block 021, and institute
Preloading magnet 062 is stated to be arranged on main body rack 01.
First air bearing space 101 and the second air bearing space 102 also with axial parallel, first gas of oriented film 08
The 101, second air bearing space 102 absorption axis constitutes the guide surface of whole device with oriented film 08 together between floating.Further, since the
One air bearing space 101 and the second air bearing space 102 are a certain included angle, and therefore, can limit the subpart around oriented film 08
Axial-rotation.In addition, absorption axis absorption axis is provided with multiple sealing rings 023 between absorption axis 031 and air bearing block 021, with
Compressed air and absorption axis vacuum are subjected to isolating seal.
The subpart of the vacuum suction hand drives by electric mover 04 on air bearing block 021 is installed on, wherein described
Measurement target surface 092 is installed, correspondence is equipped with displacement sensor 091, the displacement on the main body rack 01 on air bearing block 021
The location information of the acquisition measurement target surface 092 of sensor 091, to realize the displacement measurement to the subpart.
Embodiment 2
As shown in figure 3, the structural schematic diagram of its eccentric the absorption axis and oriented film that are provided for the preferred embodiment of the present invention, also
Can the difference from embodiment 1 is that, the present embodiment adsorbs axis 12 and matched main body rack 11 by bias to limit.It is described inclined
Heart absorption axis 12 is actively located in main body rack 11, there is oriented film between the two, in order to which bias absorption axis 12 is along master
11 flexible motion of body support frame.The eccentric absorption axis 12 includes eccentric setting and two cylindrical structures that one end is connected, this two
The outer peripheral surface of a cylindrical structure can constitute two the first air bearing surfaces.Two cylindrical structure preferable shapes are identical.
Correspondingly, the main body rack 11 has another two outer peripheral surfaces to match with two outer peripheral surfaces, it is described another
Two outer peripheral surfaces constitute two second air bearing surfaces, also have two eccentric circular holes on the main body rack 11, and described two
The cylinder air bearing surface 13 and cylinder air bearing surface 14 that the hole wall of a circular hole is formed with the eccentric absorption axis 12 match, the cylinder
Air bearing surface 13 and the cylinder air bearing surface 14 provide guiding, and the limitation eccentric absorption axis rotation for the substrate connection device
Turn.The eccentricity of the eccentric absorption axis is preferably in 1mm between 2mm.
It should be noted that the absorption axis 031 of vacuum suction hand in Fig. 1 and main body rack 01 are replaced in the present embodiment
Eccentric absorption axis 12 and main body rack 11, another vacuum suction hand can be constituted；It is logical wherein to adsorb vacuum possessed by axis 031
Road and compressed air channel, bias absorption axis 12 similarly have, and the vacuum inlet and compressed air that main body rack 01 has connect
Through slot, main body rack 11 similarly have；Remaining structure is without modification.
Further, several vacuum suction hands are distributed on pedestal, may make up substrate connection device.Work as substrate
When (silicon wafer i.e. to be adsorbed) size is larger, when a substrate connection device is unfavorable for the handover of larger size substrate, need
Multiple substrate connection devices are combined use.Multiple substrate connection devices are combined use, and by rationally arranging,
Substrate delivery system is formed, control is synchronized to the multiple substrate connection device, to realize the friendship to large-sized substrates
It connects.
The combination of substrate connection device provided by the embodiment is made by being combined to multiple substrate connection devices
With, and control is synchronized to multiple substrate connection devices, realize the support to large-sized silicon wafers.Due to being separation
Isolated system, thus same very little is required to bulk, meanwhile, such scheme is to 3 or multiple substrate connection devices
Installation accuracy is of less demanding, and supporting point is coplanar to be realized by the high accuracy positioning of each isolated system.In addition, the present invention is implemented
Example also provides a kind of litho machine, including base station, and the base station is equipped with substrate cross-connecting area, is equipped in the base station described
Substrate connection device, the substrate connection device are located at the lower section of the substrate cross-connecting area, and substrate cross-connecting area surface is corresponding
Through-hole is provided in the position of the vacuum suction hand；When joining substrate, the vacuum suction hand can prolong upwards via the through-hole
It stretches.
In conclusion in vacuum suction hand provided by the invention, substrate connection device and litho machine, the substrate handover dress
It sets and substrate is adsorbed or discharged by suction nozzle, and by the movement of absorption axis, realize the handover to the substrate.Meanwhile this hair
The substrate connection device of bright offer improves air floating structure, without additional anti-rotation structure, improves substrate connection device
Space utilization rate, reduce the bulk of substrate connection device；In addition, the substrate connection device is led using circular air bearing
Rail (i.e. eccentric to adsorb axis to limit the rotation of absorption axis), keeps device easily fabricated, readily satisfies the requirement of the guide rail accuracy of manufacture.
The above is only a preferred embodiment of the present invention, does not play the role of any restrictions to the present invention.Belonging to any
Those skilled in the art, in the range of not departing from technical solution of the present invention, to the invention discloses technical solution and
Technology contents make the variation such as any type of equivalent replacement or modification, belong to the content without departing from technical solution of the present invention, still
Within belonging to the scope of protection of the present invention.
Claims (17)
1. a kind of vacuum suction hand, which is characterized in that including adsorbing axis, suction nozzle, main body rack, driving assembly and anti-rotation structure,
Anti-rotation structure described in the absorption axis connection, the driving component drive the absorption axis and the anti-rotation structure in the main body
It slides axially in bracket, the anti-rotation structure limits the absorption axis relative to the main body rack around axial rotation, the suction
Noncoupled axle top connects the suction nozzle, is equipped with vacuum passage in the absorption axis, the suction nozzle is connected to the vacuum passage.
2. vacuum suction hand as described in claim 1, which is characterized in that side of the anti-rotation structure towards the main body rack
To having the multiple first anti-rotations face being arranged in angle, has in the main body rack and match with the multiple first anti-rotation face
In same angle setting multiple second anti-rotations face, the multiple first anti-rotation face is used jointly with the multiple second anti-rotation face
In the limitation anti-rotation structure around axial rotation in the main body rack.
3. vacuum suction hand as described in claim 1, which is characterized in that be equipped in the main body rack for the absorption axis
First pilot hole and for the anti-rotation structure the second pilot hole in axial sliding, the absorption axis and the anti-rotation in axial sliding
Off-axis connects between structure, first pilot hole off-axis setting corresponding with second pilot hole.
4. vacuum suction hand as described in claim 1, which is characterized in that the driving component includes stator and mover, described
Stator and the mover arranged concentric, the stator are fixed in the main body rack, and the mover is mounted on the anti-rotation knot
On structure and with the absorption axis arranged concentric.
5. vacuum suction hand as claimed in claim 3, which is characterized in that inclined between the absorption axis and the anti-rotation structure
Wheelbase is 1mm to 2mm.
6. vacuum suction hand as claimed in claim 1,2 or 3, which is characterized in that in the main body rack and the absorption axis
Between be passed through compressed air to form air bearing oriented film.
7. vacuum suction hand as claimed in claim 1,2 or 3, which is characterized in that in the main body rack and the anti-rotation knot
Compressed air has been passed through between structure to form air bearing oriented film.
8. vacuum suction hand as claimed in claim 6, which is characterized in that be provided with several first segment discharge orifices in the absorption axis
And the compressed air channel being connected to the first segment discharge orifice, the compressed air pass sequentially through the compressed air channel,
First segment discharge orifice enters between the absorption axis and the main body rack.
9. vacuum suction hand as claimed in claim 7, which is characterized in that be provided with several second throttlings on the anti-rotation structure
Hole, the compressed air are entered between the anti-rotation structure and the main body rack by second throttle orifice.
10. vacuum suction hand as claimed in claim 8 or 9, which is characterized in that be provided on the anti-rotation structure and the pressure
The compressed air circulation groove of contracting air duct connection, the compressed air circulation groove with external compressed air source for being connected to.
11. vacuum suction hand as claimed in claim 10, which is characterized in that be additionally provided on the anti-rotation structure and the suction
The vacuum inlet of vacuum passage connection in noncoupled axle, for being connected to external vacuum source.
12. vacuum suction hand as claimed in claim 11, which is characterized in that the bottom part of the absorption axis is inserted and fixed
In the anti-rotation structure, several sealing rings are additionally provided between the anti-rotation structure and the absorption axis, are used for isolating seal
Vacuum and compressed air between the anti-rotation structure and the absorption axis.
13. vacuum suction hand as claimed in claim 2, which is characterized in that the vacuum suction hand further includes pre- mounted mechanism, institute
Stating pre- mounted mechanism includes metal object and magnet, and the metal object is arranged at least one of the multiple first anti-rotation face,
The magnet is correspondingly arranged at least one of the multiple second anti-rotation face or the metal object is arranged the multiple
On at least one of second anti-rotation face, the magnet is correspondingly arranged at least one of the multiple first anti-rotation face.
14. vacuum suction hand as claimed in claim 2, which is characterized in that the absorption axis is cylindrical body, the anti-rotation structure
For bucking ladder.
15. vacuum suction hand as claimed in claim 3, which is characterized in that the absorption axis and the anti-rotation structure are circle
Cylinder.
16. a kind of substrate connection device, which is characterized in that including pedestal and several vacuum suctions for being symmetrically distributed in pedestal
Hand.
17. a kind of litho machine, including base station, the base station is equipped with substrate cross-connecting area, which is characterized in that in the base station
Substrate connection device as claimed in claim 16 is installed, the substrate connection device is located under the substrate cross-connecting area
Side, the position that substrate cross-connecting area surface corresponds to the vacuum suction hand are provided with through-hole；When joining substrate, the vacuum is inhaled
Attached hand can be upwardly extended via the through-hole.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710944128.7A CN109597279B (en) | 2017-09-30 | 2017-09-30 | Vacuum adsorption hand, substrate handing-over device and photoetching machine |
| TW107134562A TWI673223B (en) | 2017-09-30 | 2018-09-28 | Vacuum adsorption hand, substrate transfer device and lithography machine |
| PCT/CN2018/108631 WO2019062911A1 (en) | 2017-09-30 | 2018-09-29 | Vacuum suction manipulator, substrate transfer device, and photoetching machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710944128.7A CN109597279B (en) | 2017-09-30 | 2017-09-30 | Vacuum adsorption hand, substrate handing-over device and photoetching machine |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN109597279A true CN109597279A (en) | 2019-04-09 |
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| CN201710944128.7A Active CN109597279B (en) | 2017-09-30 | 2017-09-30 | Vacuum adsorption hand, substrate handing-over device and photoetching machine |
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| Country | Link |
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| CN (1) | CN109597279B (en) |
| TW (1) | TWI673223B (en) |
| WO (1) | WO2019062911A1 (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112965342A (en) * | 2021-02-05 | 2021-06-15 | 三河建华高科有限责任公司 | Bottom nitrogen-blowing vacuum copying exposure mode close to contact photoetching machine |
| CN113263490A (en) * | 2020-06-12 | 2021-08-17 | 台湾积体电路制造股份有限公司 | Manipulator, manipulator blade and operation method thereof |
| WO2022057179A1 (en) * | 2020-09-16 | 2022-03-24 | 北京华卓精科科技股份有限公司 | Silicon wafer adsorption unit and silicon wafer conveying device |
| WO2022062959A1 (en) * | 2020-09-28 | 2022-03-31 | 清华大学 | Controllable lifting device with precision measurement capability and photolithography apparatus containing same |
| CN118107004A (en) * | 2024-04-28 | 2024-05-31 | 德瑞精工（深圳）有限公司 | ZR shaft manipulator |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110067811B (en) * | 2019-05-30 | 2024-03-26 | 中国工程物理研究院机械制造工艺研究所 | Air-floating rotary table |
| CN115692299B (en) * | 2022-12-27 | 2023-04-18 | 苏州猎奇智能设备有限公司 | Air floatation rotary adsorption structure and use method thereof |
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Also Published As
| Publication number | Publication date |
|---|---|
| CN109597279B (en) | 2023-09-29 |
| WO2019062911A1 (en) | 2019-04-04 |
| TWI673223B (en) | 2019-10-01 |
| TW201914939A (en) | 2019-04-16 |
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