WO2022062959A1 - Controllable lifting device with precision measurement capability and photolithography apparatus containing same - Google Patents

Controllable lifting device with precision measurement capability and photolithography apparatus containing same Download PDF

Info

Publication number
WO2022062959A1
WO2022062959A1 PCT/CN2021/118176 CN2021118176W WO2022062959A1 WO 2022062959 A1 WO2022062959 A1 WO 2022062959A1 CN 2021118176 W CN2021118176 W CN 2021118176W WO 2022062959 A1 WO2022062959 A1 WO 2022062959A1
Authority
WO
WIPO (PCT)
Prior art keywords
air
hole
fixed base
guide
guide rod
Prior art date
Application number
PCT/CN2021/118176
Other languages
French (fr)
Chinese (zh)
Inventor
成荣
朱煜
张鸣
杨开明
刘相波
Original Assignee
清华大学
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 清华大学 filed Critical 清华大学
Publication of WO2022062959A1 publication Critical patent/WO2022062959A1/en

Links

Images

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/70775Position control, e.g. interferometers or encoders for determining the stage position
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/70733Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece

Definitions

  • the invention relates to the technical field of lithography, in particular to a controllable lifting device with precise measurement and a lithography apparatus including the same.
  • the silicon wafer handover device of the lithography equipment cooperates with the transfer manipulator to realize the handover function of the silicon wafer.
  • the device used for controllable lifting and lowering of silicon wafers in lithography equipment is usually called E-pin.
  • the E-pin is installed on the wafer stage, and the lithography equipment needs to perform loading and unloading operations on the silicon wafer during operation.
  • the wafer is transferred to the set position by the robot, and the pin bar of the E-pin extends to remove the wafer from the robot, and then the pin bar retracts to place the wafer on the wafer stage.
  • the pin rod extends to lift the wafer from the wafer stage to the set height, and then is taken away by the robot. Therefore, E-pin not only needs a retractable function for lifting and lowering the silicon wafer, but also needs a function of position measurement to prevent the silicon wafer and components from being damaged due to improper lifting of the silicon wafer.
  • the present invention provides a controllable lifting device with precise measurement, including a fixed base, a guide seat, a moving component, and a driving component,
  • the fixed base is fixedly connected with the guide seat, and a guide sleeve with a vertical axis is installed on the fixed base,
  • the mobile components include:
  • the guide rod has a mounting hole coaxial with the guide sleeve at the upper end, the guide rod passes through the guide sleeve coaxially, and the upper part of the guide rod and the guide sleeve, the lower part of the guide rod and the fixed base and the guide seat form an air-floating contact surface ;
  • the magnetic steel, the magnetic steel and the lifting head are sequentially installed into the installation holes of the guide rod, so that the lifting head extends out of the upper end of the guide sleeve,
  • the drive components include:
  • the motor coil and the iron core, the iron core is coaxially arranged in the annular space between the guide rod and the guide sleeve, the motor coil is wound on the iron core,
  • an air hole penetrating to the upper end of the lifting head is coaxially opened in the center of the moving assembly, an air inlet hole and an air passage connecting the air inlet hole and the air hole are arranged on the guide rod, and an air hole is opened on the fixed base.
  • Air source hole and air outlet hole the air source hole is communicated with the air source, the air outlet hole is communicated with the air inlet hole on the guide rod through a hose, and the air source hole provides positive or negative pressure to the air hole gas.
  • the moving assembly further includes a first rubber ring, a support rod, and a fixing sleeve, and the fixing sleeve, the support rod, the first rubber ring, and the lifting head are sequentially connected and installed into the installation holes of the guide rod.
  • a cooling water groove for cooling the motor coil is opened on the fixed base, a cooling water fixing sleeve surrounds the periphery of the fixed base to seal the cooling water groove, and a cooling water groove is provided on the fixed base to communicate with the cooling water groove water inlet and outlet.
  • the fixed base is provided with a grating scale reading head mounting hole penetrating the fixed base to the guide rod, the grating scale reading head is installed on the fixed base through the grating scale reading head mounting hole, and the guide rod There is a grating ruler on it.
  • a vertical limit groove is provided on the guide rod
  • a limit rod installation hole is provided on the fixing base
  • the limit rod passes through the limit rod installation hole and is fixed to the guide seat by screw connection
  • the end of the limit rod passing through the guide seat is inserted into the limit groove, and the end of the limit rod passing through the guide seat is sleeved with a second rubber ring.
  • the guide rod is provided with two air inlet holes and air passages respectively communicated with the air holes by the air inlet holes, and two air source holes are opened on the fixed base, one air source hole is connected to the positive pressure The air source is communicated, and the other air source hole is communicated with the negative pressure air source.
  • the fixed base is also provided with two air outlet holes, and the two air outlet holes are respectively communicated with the corresponding air inlet holes on the guide rod through hoses.
  • the upper and lower ends of the magnetic steel are respectively provided with iron core disks, and an adjustment pad is also provided between the iron core disk at the upper end and the fixing sleeve.
  • the guide rod comprises a cylinder and a block coaxially connected under the cylinder, an air-floating contact surface is formed between the upper part of the cylinder and the guide sleeve, and the two opposite sides of the block are in contact with each other.
  • One side is formed by protruding a plurality of first vertical planes parallel to each other and the guide seat to form an air-floating contact surface, and the other side of the two opposite sides of the square body is formed by two relatively inclined extending first.
  • An air-floating contact surface is formed between the two vertical planes and the fixed base.
  • At least three positioning support rods extend from the fixed base, and coplanar positioning planes are formed at the ends of all positioning support rods, and positioning pin holes are provided on the positioning planes.
  • the present invention also provides a lithography apparatus, which includes a wafer-bearing stage for carrying silicon wafers, and also includes the above-mentioned controllable lifting device with precise measurement, wherein the controllable lifting device is installed on the wafer-bearing stage.
  • the first rubber ring prevents the silicon wafer from directly contacting the pin rigidly, prevents the silicon wafer from being damaged when it contacts the structural member with high rigidity, and can realize Rx, Ry, Z direction (the vertical direction is the Z axis) of Cartesian coordinates) minor adjustments to the degrees of freedom.
  • the rise and fall of the silicon wafer can be monitored in real time, and the position of the silicon wafer can be precisely controlled.
  • FIG. 1 is a front sectional view showing a controllable lifting device with precise measurement according to an embodiment of the present invention
  • FIG. 2 is a side cross-sectional view showing a controllable lifting device with precise measurement according to an embodiment of the present invention
  • FIG. 3 is a schematic structural diagram showing the connection between the lifting head, the first rubber ring and the support rod according to the embodiment of the present invention
  • FIG. 4 is a schematic diagram showing pores and air passages according to an embodiment of the present invention.
  • FIG. 5 is a perspective view showing a fixed base according to an embodiment of the present invention.
  • FIG. 6 is a perspective view showing a moving assembly according to an embodiment of the present invention.
  • FIG. 7 is a bottom view showing a controllable lift device with precise measurement according to an embodiment of the present invention.
  • the figure includes: lifting head 1, first rubber ring 2, support rod 3, fixing sleeve 4, E-pin guide rod 5, guide sleeve 6, adjusting pad 7, iron core plate 8, magnetic steel 9, cooling water fixing sleeve 10. Cooling water sealing ring 11, coil iron core 12, motor coil 13, fixed base 14, grating scale reading head 15, grating scale 16, guide seat 17, limit rod 18, limit rod second rubber ring 19, Flexible air pipe 20, air pipe joint 21, screw 22, limit slot 23, air hole 400, air intake hole 51, air passage 52, air outlet hole 141, screw hole 142, limit rod mounting hole 143, cylinder 55, block body 56 , a first vertical plane 300 , a second vertical plane 200 , a connecting vertical plane 561 , a positioning plane 147 , a positioning strut 146 , and a positioning pin hole 148 .
  • the controllable lifting device with precise measurement includes a fixed base 14, a guide base 17, a moving component, and a driving component, wherein the fixed base 14 is fixedly connected with the guide base 17, and FIG. 5 shows the fixed base A three-dimensional schematic diagram, wherein a screw hole 142 is processed on the fixing base 14 , and the guide base 17 is fixedly connected to the fixing base 14 through the screw hole 142 .
  • a guide sleeve 6 with a vertical axis is mounted on the fixed base 14 .
  • the moving assembly includes a lifting head 1, a guide rod 5, and a magnetic steel 9. The upper end of the guide rod 5 has a mounting hole coaxial with the guide sleeve 6.
  • the guide rod 5 passes through the guide sleeve 6 coaxially and penetrates into the fixed position. In the space enclosed by the base 14 and the guide seat 17 . An annular space is formed between the guide sleeve 6 and the guide rod 5 . Moreover, air-floating contact is formed between the guide rod 5 and the guide sleeve 6, the fixed base 14, and the guide seat 17 to limit the freedom of the guide rod 5 in five directions and retain its vertical freedom.
  • the air-floating contact means that there is a certain gap between the two contact surfaces, and there is air between the gaps, which makes the two contact surfaces have a certain guiding effect, and has the characteristics of small friction coefficient and smooth sliding. . Of course, the gap should not be too large, otherwise it will not play a guiding role.
  • the moving assembly also includes a first rubber ring 2, a support rod 3, and a fixed sleeve 4.
  • the lifting head 1 is connected with the first rubber ring 2
  • the first rubber ring 2 is connected with the support rod 3
  • the support rod 3 is connected with the fixing sleeve 4 below
  • the fixing sleeve 4 is installed in the mounting hole of the guide rod 5.
  • the function of the first rubber ring 2 is to ensure that the lifting head 1 can have certain flexibility in the Rx, Ry and Z directions.
  • the upper and lower ends of the magnetic steel 9 are provided with iron core disks 8 , and the function of the iron core disk 8 is to optimize the magnetic field of the magnetic steel 9 itself, so that the magnetic field lines in the magnetic steel 9 form a closed loop.
  • An iron core disc 8 is inserted into the mounting hole, then the magnetic steel 9 is inserted, and then the iron core disc 8 is inserted.
  • An adjustment pad 7 can also be arranged above the iron core disc 8, and the adjustment pad 7 is used to adjust the overall height. Then, install the fixing sleeve 4, the support rod 3, the first rubber ring 2, and the lifting head 1 into the installation holes in sequence.
  • the drive assembly includes a motor coil 13 and a coil iron core 12, and the guide sleeve 6 has an annular inner shoulder, so that an annular space with different gaps is formed between the guide rod 5 and the guide sleeve 6, and the upper annular space has a relatively larger gap.
  • the guide rod 5 and the guide sleeve are the air-floating contact surface
  • the lower annular space has a large gap
  • the coil iron core 12 is coaxially arranged in the lower annular space
  • the motor coil 13 is wound on the coil iron core 12.
  • the guide sleeve and the fixed base are provided with threading holes through which the two ends of the motor coil 13 are connected to the power supply.
  • an air hole 400 is coaxially opened in the center of the moving component, that is to say, the air hole 400 penetrates the lifting head 1, the first rubber ring 2, the support rod 3, the fixing sleeve 4, the adjustment pad 7, the iron The core disc 8 and the magnetic steel 9 enter the guide rod 5, and the air hole is closed at the lower end of the guide rod 5.
  • the air hole 400 is coaxially opened in the center of the moving component, that is to say, the air hole 400 penetrates the lifting head 1, the first rubber ring 2, the support rod 3, the fixing sleeve 4, the adjustment pad 7, the iron The core disc 8 and the magnetic steel 9 enter the guide rod 5, and the air hole is closed at the lower end of the guide rod 5.
  • An air inlet hole 51 and an air passage 52 connecting the air inlet hole 51 and the air hole 400 are provided on the guide rod 5 , and an air source hole is opened on the fixed base 14 , and the air source hole communicates with the air source , the fixed base is also provided with an air outlet 141, the air outlet 141 communicates with the air inlet 51 on the guide rod 5 through the flexible air pipe 20 and the air pipe joint 21, and provides positive pressure or pressure to the air hole 400 through the air source hole. Negative pressure gas.
  • the guide rod 5 is provided with two air inlet holes and air passages respectively communicated with the air holes by the air inlet holes, and two air source holes are opened on the fixed base, and one air source hole is connected with the positive air hole.
  • the pressure air source is connected, the other air source hole is connected with the negative pressure air source, and the fixed base is also provided with two air outlet holes, and the two air outlet holes are respectively connected with the air inlet holes on the guide rod 5 through the hose.
  • the air source holes can be processed at the bottom of the fixed base 14, respectively, to realize the functions of vacuum extraction and back blowing of the silicon wafer.
  • the fixing base 14 is provided with a cooling water groove for cooling the motor coil, and the cooling water fixing sleeve 10 seals the cooling water groove around the periphery of the fixing base.
  • the cooling water fixing sleeve 10 is connected to the fixing base 14 by screws 22 , and the fixing base 14 is provided with a water inlet and a water outlet communicating with the cooling water tank.
  • the cooling water fixing sleeve 10 is connected to the fixing base 14
  • Cooling water sealing rings 11 are installed on the upper and lower sides of the room to seal the cooling water.
  • a grating ruler reading head mounting hole is provided on the fixed base 14, and the grating ruler reading head 15 is installed on the fixed base 14 through the grating ruler reading head mounting hole, on the outer circumference of the guide rod 5.
  • a vertical grating ruler is provided, and the grating ruler reading head 15 can read the reading of the grating ruler 16 during the upward and downward movement of the guide rod 5 .
  • the guide rod 5 is provided with a vertical limit groove 23
  • the fixed base 14 is provided with a limit rod installation hole 143
  • the limit rod 18 passes through the limit rod installation hole 143 and passes through
  • the threaded connection is fixed on the guide seat 17, the end of the limit rod 18 passing through the guide seat 17 is inserted into the limit groove 23, and the end of the limit rod 18 passing through the guide seat 17 is sleeved with a limit rod
  • the second rubber ring 19 avoids the direct rigid contact between the limit rod 18 and the limit groove 23 of the guide rod, and at the same time acts as a limiter for the guide rod.
  • the guide rod 5 includes a cylinder 55 and a block 56 coaxially connected to the bottom of the cylinder, and an air-floating contact surface is formed between the upper part of the cylinder 55 and the guide sleeve 6,
  • One of the opposite sides of the block body 56 is formed by protruding a plurality of mutually parallel first vertical planes 300 and the guide seat 17 to form an air-floating contact surface.
  • two first vertical planes are used. towards plane 300.
  • this embodiment does not limit the number of the first vertical planes 300 , and may also be one.
  • the other side of the two opposite sides of the block body 56 forms an air-floating contact surface between the two second vertical planes 200 extending relatively obliquely and the fixed base.
  • the two second vertical planes 200 may also be vertical cut planes with different inclination angles.
  • the air-floating contact surface between the cylinder 55 and the guide sleeve can be only a part of the outer diameter of the cylinder and the guide sleeve for air-floating contact, while the outer diameter of other parts can be relatively reduced to make the sliding smooth. .
  • the outer diameter of the annular boss 100 is larger than the outer diameter of the cylinder 55 , and the annular boss 100 and the guide sleeve 6 are in air-floating contact.
  • the second vertical plane 200 may be two symmetrical vertical planes that are vertically cut from the horizontal ends of the side at a certain inclination angle, as shown in FIG.
  • a concave connecting vertical plane 561 is formed between the two second vertical planes 200.
  • the grating ruler 16 is installed on the connecting vertical plane 561, which can protect the grating scale from collision during the up and down movement. damage. This embodiment is not used to limit the number of the floating contact surfaces.
  • At least three positioning struts 146 extend from the fixed base 14 , the ends of all the positioning struts 146 are formed with coplanar positioning planes 147 , and positioning pin holes 148 are provided on the positioning planes 147 .
  • the fixing base 14 is mounted on the reference plane.
  • the present invention also provides a lithography apparatus, which includes a wafer-bearing stage for carrying silicon wafers, and also includes the above-mentioned controllable lifting device with precise measurement, wherein the controllable lifting device is installed on the wafer-bearing stage.
  • the assembled controllable lifting device is fixed on the reference plane through the positioning surface 147 on the fixed base 14 , and its position is fixed by the positioning pin through the positioning pin hole 148 processed on the fixed base 14 .
  • the lifting head 1 When working, when the silicon wafer needs to be removed from the fork manipulator, in order to prevent the silicon wafer from slipping off, the lifting head 1 provides back vacuum suction, so that the silicon wafer is adsorbed on the lifting head 1. When the silicon wafer is adsorbed on the lifting head 1
  • the motor coil 13 When the motor coil 13 is controlled, the motor coil 13 interacts with the magnetic force of the magnetic steel 9, so that the part of the guide rod 5 with the lifting head 1 moves down as a whole.
  • Real-time monitoring of the falling height of the silicon wafer when reaching the designated position, turn off the air source that provides the vacuum environment, and provide back blowing gas to the lifting head 1 to make the silicon wafer detach from the lifting head 1, and the detached silicon wafer will fall on the suction cup at this time. , and perform subsequent operations.
  • the air hole in the lift head 1 provides back vacuum suction again, and the silicon wafer is adsorbed on the lift head, and then through the interaction between the motor coil 13 and the magnetic steel 9, the lift 1 drives the silicon wafer The wafer moves upwards and reaches the designated position.
  • the wafer manipulator needs to remove the wafer, the back vacuum suction is stopped, and the wafer can be removed.
  • the device provides air-floating guide structure, cooling water cooling structure, limit structure and real-time position detection to ensure the smooth and safe process of the silicon wafer from the fork manipulator to the suction cup or from the suction cup to the fork manipulator. operation.

Abstract

Disclosed are a controllable lifting device with precision measurement capability and a photolithography apparatus containing the same. The device comprises a fixing base, a guiding base, a moving assembly and a driving assembly. The fixing base has fixed connection to the guiding base. The fixing base is provided with a guiding bushing having a vertical axis. The moving assembly comprises a lifting head, a guiding rod and a magnetic steel. A mounting hole is arranged on the upper end of the guiding rod. The guiding rod passes through the guiding bushing and forms air-bearing contact surfaces with the guiding bushing, the fixing base and the guiding base. The magnetic steel and the lifting head are mounted in sequence into the mounting hole of the guiding rod such that the lifting head protrudes from the upper end of the guiding bushing. The driving assembly comprises a motor coil and an iron core. The iron core is arranged in the annular space between the guiding rod and the guiding bushing. The motor coil is wound onto the iron core. An air hole is provided at the center of the moving assembly. The fixing base provides a positive-pressure or negative-pressure gas to the air hole by means of an air passage of the guiding rod. According to the present disclosure, air-bearing contact surfaces are used to guide the direction. The friction between parts is reduced, particles are not generated, motion precision is improved, and the requirement of motor driving force is reduced.

Description

带精密测量的可控升降装置以及包含其的光刻设备Controllable lift device with precision measurement and lithography apparatus containing the same 技术领域technical field
本发明涉及光刻技术领域,具体地说,涉及一种带精密测量的可控升降装置以及包含其的光刻设备。The invention relates to the technical field of lithography, in particular to a controllable lifting device with precise measurement and a lithography apparatus including the same.
背景技术Background technique
光刻设备的硅片交接装置配合传输机械手,可实现硅片的交接功能。光刻设备中用来对硅片进行可控升降的装置通常称为E-pin。E-pin被安装在承片台上,光刻设备在工作时需要对硅片进行上片和下片操作。上片时,硅片被机械手传输至设定的位置,E-pin的pin杆伸出从机械手上取下硅片,然后pin杆缩回,将硅片放置在承片台上。下片时,pin杆伸出将硅片从承片台上抬起至设定高度,然后被机械手取走。因此,E-pin既需要可伸缩功能,用于举升和下降硅片;又需要有位置测量的功能,防止硅片升降不到位造成硅片及零部件的损坏。The silicon wafer handover device of the lithography equipment cooperates with the transfer manipulator to realize the handover function of the silicon wafer. The device used for controllable lifting and lowering of silicon wafers in lithography equipment is usually called E-pin. The E-pin is installed on the wafer stage, and the lithography equipment needs to perform loading and unloading operations on the silicon wafer during operation. When loading the wafer, the wafer is transferred to the set position by the robot, and the pin bar of the E-pin extends to remove the wafer from the robot, and then the pin bar retracts to place the wafer on the wafer stage. When the wafer is unloaded, the pin rod extends to lift the wafer from the wafer stage to the set height, and then is taken away by the robot. Therefore, E-pin not only needs a retractable function for lifting and lowering the silicon wafer, but also needs a function of position measurement to prevent the silicon wafer and components from being damaged due to improper lifting of the silicon wafer.
发明人发现,在将硅片取放到吸盘上,采用目前的滑动和滚动传动结构会引入颗粒污染,采用滑动导向,导向杆与导向套采用硬度较高且耐磨材料,虽然可降低颗粒的数量,但是还是会引入颗粒污染;采用滚动导向,是导向杆与导向套或者固定座、导向基座之间采用滚轮导向,这样会引入油脂,造成颗粒污染,破坏光刻环境。The inventor found that when the silicon wafer is taken and placed on the suction cup, particle pollution will be introduced by using the current sliding and rolling transmission structure. However, particle contamination will still be introduced; with rolling guide, roller guide is used between the guide rod and the guide sleeve or the fixed seat and the guide base, which will introduce grease, cause particle contamination, and destroy the lithography environment.
为此应采用可导向而又不污染光刻环境的结构,而截至目前,暂未有较好的解决方案。To this end, a structure that can be guided without polluting the lithography environment should be adopted, and so far, there is no better solution.
发明内容SUMMARY OF THE INVENTION
为解决以上问题,本发明提供一种带精密测量的可控升降装置,包括固定基座、导向座、移动组件、驱动组件,In order to solve the above problems, the present invention provides a controllable lifting device with precise measurement, including a fixed base, a guide seat, a moving component, and a driving component,
其中,固定基座与导向座固定连接,在固定基座上安装有轴线竖向的导向套,Among them, the fixed base is fixedly connected with the guide seat, and a guide sleeve with a vertical axis is installed on the fixed base,
其中,移动组件包括:Among them, the mobile components include:
升降头,lift head,
导向杆,上端具有与导向套同轴的安装孔,导向杆同轴穿过导向套,并且,导向杆上部与导向套,导向杆下部与固定基座、导向座之间都形成气浮接触面;The guide rod has a mounting hole coaxial with the guide sleeve at the upper end, the guide rod passes through the guide sleeve coaxially, and the upper part of the guide rod and the guide sleeve, the lower part of the guide rod and the fixed base and the guide seat form an air-floating contact surface ;
磁钢,磁钢、升降头依次装入导向杆的安装孔,使得升降头伸出导向套的上端部,The magnetic steel, the magnetic steel and the lifting head are sequentially installed into the installation holes of the guide rod, so that the lifting head extends out of the upper end of the guide sleeve,
其中,驱动组件包括:Among them, the drive components include:
电机线圈和铁芯,铁芯同轴设置在导向杆与导向套之间的环形空间内,电机线圈缠绕在铁芯上,The motor coil and the iron core, the iron core is coaxially arranged in the annular space between the guide rod and the guide sleeve, the motor coil is wound on the iron core,
其中,在移动组件中心同轴开设有穿透至升降头上端的气孔,在导向杆上设置有进气孔以及连通所述进气孔与所述气孔的气道,在固定基座上开设有气源孔和出气孔,所述气源孔与气源连通,所述出气孔通过软管与导向杆上的所述进气孔连通,通过气源孔向所述气孔提供正压或负压气体。Wherein, an air hole penetrating to the upper end of the lifting head is coaxially opened in the center of the moving assembly, an air inlet hole and an air passage connecting the air inlet hole and the air hole are arranged on the guide rod, and an air hole is opened on the fixed base. Air source hole and air outlet hole, the air source hole is communicated with the air source, the air outlet hole is communicated with the air inlet hole on the guide rod through a hose, and the air source hole provides positive or negative pressure to the air hole gas.
优选地,移动组件还包括第一橡胶圈、支撑杆和固定套,所述固定套、支撑杆、第一橡胶圈、升降头依次连接装入到导向杆的安装孔中。Preferably, the moving assembly further includes a first rubber ring, a support rod, and a fixing sleeve, and the fixing sleeve, the support rod, the first rubber ring, and the lifting head are sequentially connected and installed into the installation holes of the guide rod.
优选地,在固定基座上开设有用于冷却所述电机线圈的冷却水槽,冷却水固定套围绕在固定基座的外围密封所述冷却水槽,在所述固定基座上设置有与冷却水槽连通的进水口和出水口。Preferably, a cooling water groove for cooling the motor coil is opened on the fixed base, a cooling water fixing sleeve surrounds the periphery of the fixed base to seal the cooling water groove, and a cooling water groove is provided on the fixed base to communicate with the cooling water groove water inlet and outlet.
优选地,固定基座上设置有穿透固定基座至导向杆的光栅尺读数头安装孔,光栅尺读数头通过所述光栅尺读数头安装孔安装在固定基座上,在所述导向杆上设置有光栅尺。Preferably, the fixed base is provided with a grating scale reading head mounting hole penetrating the fixed base to the guide rod, the grating scale reading head is installed on the fixed base through the grating scale reading head mounting hole, and the guide rod There is a grating ruler on it.
优选地,在导向杆上设置有竖向的限位槽,在所述固定基座上设置有限位杆安装孔,限位杆穿过所述限位杆安装孔并通过螺纹连接固定在导向座上,限位杆穿出导向座的端部插入在所述限位槽内,并且,限位杆穿出导向座的端部套设有第二橡胶圈。Preferably, a vertical limit groove is provided on the guide rod, a limit rod installation hole is provided on the fixing base, and the limit rod passes through the limit rod installation hole and is fixed to the guide seat by screw connection The end of the limit rod passing through the guide seat is inserted into the limit groove, and the end of the limit rod passing through the guide seat is sleeved with a second rubber ring.
优选地,在导向杆上设置有两个进气孔以及由各进气孔分别与所述气孔连通的气道,在固定基座上开设有两个气源孔,一个气源孔与正压气源连通,另一个气源孔与负压气源连通,固定基座上还设置有两个出气孔,两个出气孔分别通过软管与导向杆上对应的进气孔连通。Preferably, the guide rod is provided with two air inlet holes and air passages respectively communicated with the air holes by the air inlet holes, and two air source holes are opened on the fixed base, one air source hole is connected to the positive pressure The air source is communicated, and the other air source hole is communicated with the negative pressure air source. The fixed base is also provided with two air outlet holes, and the two air outlet holes are respectively communicated with the corresponding air inlet holes on the guide rod through hoses.
优选地,所述磁钢的上下两端分别设置有铁芯盘,并且,在上端的铁芯盘与固定套之间还设置有调整垫。Preferably, the upper and lower ends of the magnetic steel are respectively provided with iron core disks, and an adjustment pad is also provided between the iron core disk at the upper end and the fixing sleeve.
优选地,所述导向杆包括圆柱体以及同轴连接于圆柱体下方的方块体,所述圆柱体的上部与导向套之间形成气浮接触面,所述方块体的相对的两侧面中的一侧是通过突出的相互平行的多个第一竖向平面与导向座之间形成气浮接触面,所述方块体的相对的两侧面中的另一侧是通过两个相对倾斜延伸的第二竖向平面与固定基座之间形成气浮接触面。Preferably, the guide rod comprises a cylinder and a block coaxially connected under the cylinder, an air-floating contact surface is formed between the upper part of the cylinder and the guide sleeve, and the two opposite sides of the block are in contact with each other. One side is formed by protruding a plurality of first vertical planes parallel to each other and the guide seat to form an air-floating contact surface, and the other side of the two opposite sides of the square body is formed by two relatively inclined extending first. An air-floating contact surface is formed between the two vertical planes and the fixed base.
优选地,固定基座上延伸出至少三个定位支杆,所有定位支杆的端部形成有共面的定位平面,且在定位平面上都设置有定位销孔。Preferably, at least three positioning support rods extend from the fixed base, and coplanar positioning planes are formed at the ends of all positioning support rods, and positioning pin holes are provided on the positioning planes.
本发明还提供一种光刻设备,包括承载硅片的承片台,还包括如上所述的带精密测量的可控升降装置,所述可控升降装置安装在所述承片台上。The present invention also provides a lithography apparatus, which includes a wafer-bearing stage for carrying silicon wafers, and also includes the above-mentioned controllable lifting device with precise measurement, wherein the controllable lifting device is installed on the wafer-bearing stage.
本发明的带精密测量的可控升降装置以及包含其的光刻设备具有以下技术效果:The controllable lifting device with precise measurement of the present invention and the lithography apparatus comprising the same have the following technical effects:
(1)采用气浮接触面导向仅保留导向杆在竖向的自由度,可以减少零部件之间的摩擦,避免颗粒的产生,并可以提高运动精度,减少了电机驱动力的要求;(1) The use of air-floating contact surface guidance only retains the vertical degree of freedom of the guide rod, which can reduce the friction between the parts, avoid the generation of particles, improve the motion accuracy, and reduce the requirements of the motor driving force;
(2)通过限位槽和限位杆的配合,防止出现特殊情况下,硅片超出行程范围,损坏硅片及其它光刻设备零部件,如叉片机械手、物镜等;(2) Through the cooperation of the limit groove and the limit rod, it is possible to prevent the silicon wafer from exceeding the stroke range under special circumstances and damage the silicon wafer and other lithography equipment parts, such as fork manipulators, objective lenses, etc.;
(3)第一橡胶圈使硅片避免直接与pin脚产生刚性接触,防止硅片接触刚度较大结构件时出现硅片的损坏,并可实现Rx、Ry、Z向(竖向为Z轴的直角坐标系)自由度的微小调整。(3) The first rubber ring prevents the silicon wafer from directly contacting the pin rigidly, prevents the silicon wafer from being damaged when it contacts the structural member with high rigidity, and can realize Rx, Ry, Z direction (the vertical direction is the Z axis) of Cartesian coordinates) minor adjustments to the degrees of freedom.
(4)可以实时监测硅片的上升和下降,精准控制硅片位置。(4) The rise and fall of the silicon wafer can be monitored in real time, and the position of the silicon wafer can be precisely controlled.
(5)升降头的上下运动是依靠电磁的相互作用,既节省空间,又满足硅片上下平稳、可靠的传输的需求。(5) The up and down movement of the lifting head relies on electromagnetic interaction, which not only saves space, but also meets the needs of stable and reliable transmission of silicon wafers up and down.
附图说明Description of drawings
通过结合下面附图对其实施例进行描述,本发明的上述特征和技术优点将会变得更加清楚和容易理解。The above-described features and technical advantages of the present invention will become more clearly and easily understood by describing its embodiments in conjunction with the following drawings.
图1是表示本发明实施例的带精密测量的可控升降装置的正向剖视图;1 is a front sectional view showing a controllable lifting device with precise measurement according to an embodiment of the present invention;
图2是表示本发明实施例的带精密测量的可控升降装置的侧向剖视图;FIG. 2 is a side cross-sectional view showing a controllable lifting device with precise measurement according to an embodiment of the present invention;
图3是表示本发明实施例的升降头与第一橡胶圈、支撑杆连接的结构示意图;3 is a schematic structural diagram showing the connection between the lifting head, the first rubber ring and the support rod according to the embodiment of the present invention;
图4是表示本发明实施例的气孔、气道的示意图;FIG. 4 is a schematic diagram showing pores and air passages according to an embodiment of the present invention;
图5是表示本发明实施例的固定基座的立体示意图;5 is a perspective view showing a fixed base according to an embodiment of the present invention;
图6是表示本发明实施例的移动组件的立体示意图;FIG. 6 is a perspective view showing a moving assembly according to an embodiment of the present invention;
图7是表示本发明实施例的带精密测量的可控升降装置的仰视图。FIG. 7 is a bottom view showing a controllable lift device with precise measurement according to an embodiment of the present invention.
图中包括:升降头1、第一橡胶圈2、支撑杆3、固定套4、E-pin导向杆5、导向套6、调整垫7、铁芯盘8、磁钢9、冷却水固定套10、冷却水密封圈11、线圈铁芯12、电机线圈13、固定基座14、光栅尺读数头15、光栅尺16、导向座17、限位杆18、限位杆第二橡胶圈19、柔性气管20、气管接头21、螺钉22、限位槽23、气孔400、进气孔51、气道52、出气孔141,螺钉孔142、限位杆安装孔143、圆柱体55、方块体56、第一竖向平面300、第二竖向平面200、连接竖面561、定位平面147、定位支杆146、定位销孔148。The figure includes: lifting head 1, first rubber ring 2, support rod 3, fixing sleeve 4, E-pin guide rod 5, guide sleeve 6, adjusting pad 7, iron core plate 8, magnetic steel 9, cooling water fixing sleeve 10. Cooling water sealing ring 11, coil iron core 12, motor coil 13, fixed base 14, grating scale reading head 15, grating scale 16, guide seat 17, limit rod 18, limit rod second rubber ring 19, Flexible air pipe 20, air pipe joint 21, screw 22, limit slot 23, air hole 400, air intake hole 51, air passage 52, air outlet hole 141, screw hole 142, limit rod mounting hole 143, cylinder 55, block body 56 , a first vertical plane 300 , a second vertical plane 200 , a connecting vertical plane 561 , a positioning plane 147 , a positioning strut 146 , and a positioning pin hole 148 .
具体实施方式detailed description
下面将参考附图来描述本发明所述的带精密测量的可控升降装置以及包含其的光刻设备的实施例。本领域的普通技术人员可以认识到,在不偏离本发明的精神和范围的情况下,可以用各种不同的方式或其组合对所描述的实施例进行修正。因此,附图和描述在本质上是说明性的,而不是用于限制权利要求的保护范围。此外,在本说明书中,附图未按比例画出,并且相同的附图标记表示相同的部分。Embodiments of the controllable lift device with precision measurement according to the present invention and a lithographic apparatus including the same will be described below with reference to the accompanying drawings. As those of ordinary skill in the art would realize, the described embodiments may be modified in various different ways or combinations thereof, all without departing from the spirit and scope of the present invention. Accordingly, the drawings and description are illustrative in nature and are not intended to limit the scope of protection of the claims. Furthermore, in this specification, the drawings are not drawn to scale, and the same reference numerals refer to the same parts.
如图1所示,带精密测量的可控升降装置包括固定基座14、导向座17、移动组件、驱动组件,其中,固定基座14与导向座17固定连接,图5是固定基座的立体示意图,其中,在固定基座14上加工有螺钉孔142,所述导向座17通过螺钉孔142与固定基座14固定连接。在固定基座14上安装有轴线竖向的导向套6。其中,移动组件包括升降头1、导向杆5、磁钢9,所述导向杆5的上端具有与导向套6同轴的安装孔,导向杆5同轴穿过导向套6,穿入到固定基座14、导向座17围成的空间内。在导向套6与导向杆5之间形成有环形空间。并且,导向杆5与导向套6以及固定基座14、导向座17之间形成有气浮接触,用以限制导向杆5在五个方向的自由度,保留其在竖向的自 由度。所述气浮接触是指两个接触面之间具有一定的间隙,在间隙之间具有空气,这使得两个接触面之间既具有一定的导向作用,又具有摩擦系数小,滑动顺畅的特点。当然,间隙也不宜过大,否则也起不到导向的作用。As shown in FIG. 1, the controllable lifting device with precise measurement includes a fixed base 14, a guide base 17, a moving component, and a driving component, wherein the fixed base 14 is fixedly connected with the guide base 17, and FIG. 5 shows the fixed base A three-dimensional schematic diagram, wherein a screw hole 142 is processed on the fixing base 14 , and the guide base 17 is fixedly connected to the fixing base 14 through the screw hole 142 . A guide sleeve 6 with a vertical axis is mounted on the fixed base 14 . The moving assembly includes a lifting head 1, a guide rod 5, and a magnetic steel 9. The upper end of the guide rod 5 has a mounting hole coaxial with the guide sleeve 6. The guide rod 5 passes through the guide sleeve 6 coaxially and penetrates into the fixed position. In the space enclosed by the base 14 and the guide seat 17 . An annular space is formed between the guide sleeve 6 and the guide rod 5 . Moreover, air-floating contact is formed between the guide rod 5 and the guide sleeve 6, the fixed base 14, and the guide seat 17 to limit the freedom of the guide rod 5 in five directions and retain its vertical freedom. The air-floating contact means that there is a certain gap between the two contact surfaces, and there is air between the gaps, which makes the two contact surfaces have a certain guiding effect, and has the characteristics of small friction coefficient and smooth sliding. . Of course, the gap should not be too large, otherwise it will not play a guiding role.
磁钢9、升降头1依次装入导向杆5的安装孔,使得升降头1伸出导向套6的上端部,优选地,移动组件还包括第一橡胶圈2、支撑杆3、固定套4,如图3、图4所示,升降头1与第一橡胶圈2连接,第一橡胶圈2与支撑杆3连接,支撑杆3与下方的固定套4连接,然后再把固定套4安装在导向杆5的安装孔中。第一橡胶圈2的作用是保证升降头1可以在Rx、Ry和Z方向有一定的柔性。另外,所述磁钢9的上下两端都设置有铁芯盘8,铁芯盘8的作用是优化磁钢9自身的磁场,使磁钢9中的磁感线形成闭环。一个铁芯盘8装入安装孔,然后装入磁钢9,然后再装入铁芯盘8,还可以在铁芯盘8上方设置调整垫7,调整垫7是为了调整整体高度。然后再将固定套4、支撑杆3、第一橡胶圈2、升降头1依次装入到安装孔中。The magnetic steel 9 and the lifting head 1 are sequentially inserted into the mounting holes of the guide rod 5, so that the lifting head 1 protrudes from the upper end of the guide sleeve 6. Preferably, the moving assembly also includes a first rubber ring 2, a support rod 3, and a fixed sleeve 4. , as shown in Figures 3 and 4, the lifting head 1 is connected with the first rubber ring 2, the first rubber ring 2 is connected with the support rod 3, the support rod 3 is connected with the fixing sleeve 4 below, and then the fixing sleeve 4 is installed in the mounting hole of the guide rod 5. The function of the first rubber ring 2 is to ensure that the lifting head 1 can have certain flexibility in the Rx, Ry and Z directions. In addition, the upper and lower ends of the magnetic steel 9 are provided with iron core disks 8 , and the function of the iron core disk 8 is to optimize the magnetic field of the magnetic steel 9 itself, so that the magnetic field lines in the magnetic steel 9 form a closed loop. An iron core disc 8 is inserted into the mounting hole, then the magnetic steel 9 is inserted, and then the iron core disc 8 is inserted. An adjustment pad 7 can also be arranged above the iron core disc 8, and the adjustment pad 7 is used to adjust the overall height. Then, install the fixing sleeve 4, the support rod 3, the first rubber ring 2, and the lifting head 1 into the installation holes in sequence.
其中,驱动组件包括电机线圈13和线圈铁芯12,所述导向套6具有环形内台肩,使得导向杆5与导向套6之间形成间隙不同的环形空间,其上部的环形空间间隙相对较小,导向杆5与导向套之间为气浮接触面,下部的环形空间间隙较大,线圈铁芯12同轴设置在下部的环形空间内,电机线圈13缠绕在线圈铁芯12上。在导向套和固定基座上设置有供电机线圈13两端穿出与电源连接的穿线孔。The drive assembly includes a motor coil 13 and a coil iron core 12, and the guide sleeve 6 has an annular inner shoulder, so that an annular space with different gaps is formed between the guide rod 5 and the guide sleeve 6, and the upper annular space has a relatively larger gap. Small, the guide rod 5 and the guide sleeve are the air-floating contact surface, the lower annular space has a large gap, the coil iron core 12 is coaxially arranged in the lower annular space, and the motor coil 13 is wound on the coil iron core 12. The guide sleeve and the fixed base are provided with threading holes through which the two ends of the motor coil 13 are connected to the power supply.
其中,如图4所示,在移动组件中心同轴开设有气孔400,也就是说,气孔400穿透升降头1、第一橡胶圈2、支撑杆3、固定套4、调整垫7、铁芯盘8、磁钢9进入导向杆5,在导向杆5的下端将该气孔封闭,如图1所示,通过螺栓旋合在气孔400的底端将该气孔下端封闭。在导向杆5上设置有进气孔51以及连通所述进气孔51与所述气孔400的气道52,在固定基座14上开设有气源孔,所述气源孔与气源连通,固定基座上还设置有出气孔141,所述出气孔141通过柔性气管20、气管接头21与导向杆5上的进气孔51连通,通过气源孔向所述气孔400提供正压或负压气体。Among them, as shown in FIG. 4 , an air hole 400 is coaxially opened in the center of the moving component, that is to say, the air hole 400 penetrates the lifting head 1, the first rubber ring 2, the support rod 3, the fixing sleeve 4, the adjustment pad 7, the iron The core disc 8 and the magnetic steel 9 enter the guide rod 5, and the air hole is closed at the lower end of the guide rod 5. As shown in FIG. An air inlet hole 51 and an air passage 52 connecting the air inlet hole 51 and the air hole 400 are provided on the guide rod 5 , and an air source hole is opened on the fixed base 14 , and the air source hole communicates with the air source , the fixed base is also provided with an air outlet 141, the air outlet 141 communicates with the air inlet 51 on the guide rod 5 through the flexible air pipe 20 and the air pipe joint 21, and provides positive pressure or pressure to the air hole 400 through the air source hole. Negative pressure gas.
优选地,在导向杆5上设置有两个进气孔以及由各进气孔分别与所述气孔连通的气道,在固定基座上开设有两个气源孔,一个气源孔与正压气源连通,另一个气源孔与负压气源连通,固定基座上还设置有两个出气孔,两个 出气孔通过软管分别与导向杆5上的进气孔连通。气源孔可以加工在固定基座14底部,分别用来实现对硅片的真空抽取及背吹功能。Preferably, the guide rod 5 is provided with two air inlet holes and air passages respectively communicated with the air holes by the air inlet holes, and two air source holes are opened on the fixed base, and one air source hole is connected with the positive air hole. The pressure air source is connected, the other air source hole is connected with the negative pressure air source, and the fixed base is also provided with two air outlet holes, and the two air outlet holes are respectively connected with the air inlet holes on the guide rod 5 through the hose. The air source holes can be processed at the bottom of the fixed base 14, respectively, to realize the functions of vacuum extraction and back blowing of the silicon wafer.
进一步地,在固定基座14上开设有用于冷却所述电机线圈的冷却水槽,冷却水固定套10围绕在固定基座的外围密封所述冷却水槽。如图2所示,冷却水固定套10通过螺钉22与固定基座14连接,在固定基座14上设置有与冷却水槽连通的进水口和出水口,冷却水固定套10与固定基座14间上下两侧装有冷却水密封圈11,用以密封冷却水。Further, the fixing base 14 is provided with a cooling water groove for cooling the motor coil, and the cooling water fixing sleeve 10 seals the cooling water groove around the periphery of the fixing base. As shown in FIG. 2 , the cooling water fixing sleeve 10 is connected to the fixing base 14 by screws 22 , and the fixing base 14 is provided with a water inlet and a water outlet communicating with the cooling water tank. The cooling water fixing sleeve 10 is connected to the fixing base 14 Cooling water sealing rings 11 are installed on the upper and lower sides of the room to seal the cooling water.
进一步地,在固定基座14上设置有光栅尺读数头安装孔,光栅尺读数头15通过所述光栅尺读数头安装孔安装在固定基座14上,在所述导向杆5的外圆周上设置有竖向的光栅尺,在所述导向杆5上下移动的过程中,所述光栅尺读数头15可以读取光栅尺16的读数。Further, a grating ruler reading head mounting hole is provided on the fixed base 14, and the grating ruler reading head 15 is installed on the fixed base 14 through the grating ruler reading head mounting hole, on the outer circumference of the guide rod 5. A vertical grating ruler is provided, and the grating ruler reading head 15 can read the reading of the grating ruler 16 during the upward and downward movement of the guide rod 5 .
进一步地,在导向杆5上设置有竖向的限位槽23,在所述固定基座14上设置有限位杆安装孔143,限位杆18穿过所述限位杆安装孔143并通过螺纹连接固定在导向座17上,限位杆18穿出导向座17的端部插入在所述限位槽23内,并且,限位杆18穿出导向座17的端部套设有限位杆第二橡胶圈19,避免限位杆18与导向杆的限位槽23的直接刚性接触,同时起对导向杆的限位作用。Further, the guide rod 5 is provided with a vertical limit groove 23 , the fixed base 14 is provided with a limit rod installation hole 143 , and the limit rod 18 passes through the limit rod installation hole 143 and passes through The threaded connection is fixed on the guide seat 17, the end of the limit rod 18 passing through the guide seat 17 is inserted into the limit groove 23, and the end of the limit rod 18 passing through the guide seat 17 is sleeved with a limit rod The second rubber ring 19 avoids the direct rigid contact between the limit rod 18 and the limit groove 23 of the guide rod, and at the same time acts as a limiter for the guide rod.
进一步地,如图6所示,所述导向杆5包括圆柱体55以及同轴连接于圆柱体下方的方块体56,所述圆柱体55的上部与导向套6之间形成气浮接触面,所述方块体56的相对的两侧中的一侧是通过突出的多个相互平行的第一竖向平面300与导向座17之间形成气浮接触面,图6中采用两个第一竖向平面300。当然本实施例不限制第一竖向平面300的数量,也可以是一个。所述方块体56的相对的两侧中的另一侧是通过两个相对倾斜延伸的第二竖向平面200与固定基座之间形成气浮接触面。两个第二竖向平面200也可以是倾斜角度不同的竖向切面。圆柱体55与导向套之间的气浮接触面可以是仅在圆柱体上设置一部分外径与导向套之间为气浮接触,而其他部分的外径则可以相对减小,以使得滑动顺畅。例如图6中,环形凸台100的外径比圆柱体55的外径大,环形凸台100与导向套6之间为气浮接触。Further, as shown in FIG. 6 , the guide rod 5 includes a cylinder 55 and a block 56 coaxially connected to the bottom of the cylinder, and an air-floating contact surface is formed between the upper part of the cylinder 55 and the guide sleeve 6, One of the opposite sides of the block body 56 is formed by protruding a plurality of mutually parallel first vertical planes 300 and the guide seat 17 to form an air-floating contact surface. In FIG. 6 , two first vertical planes are used. towards plane 300. Of course, this embodiment does not limit the number of the first vertical planes 300 , and may also be one. The other side of the two opposite sides of the block body 56 forms an air-floating contact surface between the two second vertical planes 200 extending relatively obliquely and the fixed base. The two second vertical planes 200 may also be vertical cut planes with different inclination angles. The air-floating contact surface between the cylinder 55 and the guide sleeve can be only a part of the outer diameter of the cylinder and the guide sleeve for air-floating contact, while the outer diameter of other parts can be relatively reduced to make the sliding smooth. . For example, in FIG. 6 , the outer diameter of the annular boss 100 is larger than the outer diameter of the cylinder 55 , and the annular boss 100 and the guide sleeve 6 are in air-floating contact.
所述第二竖向平面200可以是对称的从该侧的水平两端以一定倾斜角度竖向切得的两个竖向平面,如图6中是分别从该侧的水平两端向中间倾斜切 得的竖向平面,在两个第二竖向平面200之间形成有凹陷的连接竖面561,光栅尺16安装在该连接竖面561上,可以保护光栅尺在上下移动的过程中碰撞损坏。本实施例并不用于限制该汽浮接触面的数量。The second vertical plane 200 may be two symmetrical vertical planes that are vertically cut from the horizontal ends of the side at a certain inclination angle, as shown in FIG. In the cut vertical plane, a concave connecting vertical plane 561 is formed between the two second vertical planes 200. The grating ruler 16 is installed on the connecting vertical plane 561, which can protect the grating scale from collision during the up and down movement. damage. This embodiment is not used to limit the number of the floating contact surfaces.
进一步地,在固定基座14上延伸出至少三个定位支杆146,所有定位支杆146的端部形成有共面的定位平面147,且在定位平面147上设置有定位销孔148。通过所述定位平面147,将固定基座14安装在基准面上。Further, at least three positioning struts 146 extend from the fixed base 14 , the ends of all the positioning struts 146 are formed with coplanar positioning planes 147 , and positioning pin holes 148 are provided on the positioning planes 147 . Through the positioning plane 147, the fixing base 14 is mounted on the reference plane.
本发明还提供一种光刻设备,包括承载硅片的承片台,还包括如上所述的带精密测量的可控升降装置,所述可控升降装置安装在所述承片台上。The present invention also provides a lithography apparatus, which includes a wafer-bearing stage for carrying silicon wafers, and also includes the above-mentioned controllable lifting device with precise measurement, wherein the controllable lifting device is installed on the wafer-bearing stage.
下面说明一下该带精密测量的可控升降装置的工作过程:The working process of the controllable lifting device with precise measurement is described below:
工作之前,将装配后的可控升降装置通过固定基座14上的定位面147固定在基准面上,并用定位销通过固定基座14上加工的定位销孔148将其位置固定。Before working, the assembled controllable lifting device is fixed on the reference plane through the positioning surface 147 on the fixed base 14 , and its position is fixed by the positioning pin through the positioning pin hole 148 processed on the fixed base 14 .
工作时,当需要从叉片机械手上取下硅片时,为了防止硅片的滑落,升降头1提供背部真空吸力,让硅片吸附在升降头1上,当硅片吸附在升降头1上时,通过控制电机线圈13,电机线圈13与磁钢9的磁力相互作用,使带有升降头1的导向杆5的部分整体下移,通过光栅尺读数头15与光栅尺16的作用,来实时监测硅片的下降高度,当达到指定位置时,关闭提供真空环境的气源,给升降头1提供背吹气体,使硅片脱离升降头1,脱离的硅片此时会落在吸盘上,进行后续操作。When working, when the silicon wafer needs to be removed from the fork manipulator, in order to prevent the silicon wafer from slipping off, the lifting head 1 provides back vacuum suction, so that the silicon wafer is adsorbed on the lifting head 1. When the silicon wafer is adsorbed on the lifting head 1 When the motor coil 13 is controlled, the motor coil 13 interacts with the magnetic force of the magnetic steel 9, so that the part of the guide rod 5 with the lifting head 1 moves down as a whole. Real-time monitoring of the falling height of the silicon wafer, when reaching the designated position, turn off the air source that provides the vacuum environment, and provide back blowing gas to the lifting head 1 to make the silicon wafer detach from the lifting head 1, and the detached silicon wafer will fall on the suction cup at this time. , and perform subsequent operations.
当加工完成的硅片需要脱离吸盘时,升降头1内的气孔重新提供背部真空吸力,将硅片吸附在升降头上,然后通过电机线圈13和磁钢9的相互作用,使升降1带动硅片向上移动,达到指定位置后,当需要叉片机械手取走硅片时,停止提供背部真空吸力,硅片就可以被取走。When the processed silicon wafer needs to be released from the suction cup, the air hole in the lift head 1 provides back vacuum suction again, and the silicon wafer is adsorbed on the lift head, and then through the interaction between the motor coil 13 and the magnetic steel 9, the lift 1 drives the silicon wafer The wafer moves upwards and reaches the designated position. When the wafer manipulator needs to remove the wafer, the back vacuum suction is stopped, and the wafer can be removed.
整个移动过程中,该装置中提供了气浮导向结构,冷却水冷却结构、限位结构及实时位置检测,保证硅片从叉片机械手到吸盘或者从吸盘到叉片机械手的过程中能平稳安全的运行。During the whole moving process, the device provides air-floating guide structure, cooling water cooling structure, limit structure and real-time position detection to ensure the smooth and safe process of the silicon wafer from the fork manipulator to the suction cup or from the suction cup to the fork manipulator. operation.
以上所述仅为本发明的优选实施例,并不用于限制本发明,对于本领域的技术人员来说,本发明可以有各种更改和变化。凡在本发明的精神和原则之内,所作的任何修改、等同替换、改进等,均应包含在本发明的保护范围之内。The above descriptions are only preferred embodiments of the present invention, and are not intended to limit the present invention. For those skilled in the art, the present invention may have various modifications and changes. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention shall be included within the protection scope of the present invention.

Claims (10)

  1. 一种带精密测量的可控升降装置,其特征在于,包括固定基座、导向座、移动组件、驱动组件,A controllable lifting device with precise measurement is characterized in that it includes a fixed base, a guide seat, a moving component, and a driving component,
    其中,固定基座与导向座固定连接,在固定基座上安装有轴线竖向的导向套,Among them, the fixed base is fixedly connected with the guide seat, and a guide sleeve with a vertical axis is installed on the fixed base,
    其中,移动组件包括:Among them, the mobile components include:
    升降头,lift head,
    导向杆,上端具有与导向套同轴的安装孔,导向杆同轴穿过导向套,并且,导向杆上部与导向套,导向杆下部与固定基座、导向座之间都形成气浮接触面;The guide rod has a mounting hole coaxial with the guide sleeve at the upper end, the guide rod passes through the guide sleeve coaxially, and the upper part of the guide rod and the guide sleeve, the lower part of the guide rod and the fixed base and the guide seat form an air-floating contact surface ;
    磁钢,磁钢、升降头依次装入导向杆的安装孔,使得升降头伸出导向套的上端部,The magnetic steel, the magnetic steel and the lifting head are sequentially installed into the installation holes of the guide rod, so that the lifting head extends out of the upper end of the guide sleeve,
    其中,驱动组件包括:Among them, the drive components include:
    电机线圈和铁芯,铁芯同轴设置在导向杆与导向套之间的环形空间内,电机线圈缠绕在铁芯上,The motor coil and the iron core, the iron core is coaxially arranged in the annular space between the guide rod and the guide sleeve, the motor coil is wound on the iron core,
    其中,在移动组件中心同轴开设有穿透至升降头上端的气孔,在导向杆上设置有进气孔以及连通所述进气孔与所述气孔的气道,在固定基座上开设有气源孔和出气孔,所述气源孔与气源连通,所述出气孔通过软管与导向杆上的所述进气孔连通,通过气源孔向所述气孔提供正压或负压气体。Wherein, an air hole penetrating to the upper end of the lifting head is coaxially opened in the center of the moving assembly, an air inlet hole and an air passage connecting the air inlet hole and the air hole are arranged on the guide rod, and an air hole is opened on the fixed base. Air source hole and air outlet hole, the air source hole is communicated with the air source, the air outlet hole is communicated with the air inlet hole on the guide rod through a hose, and the air source hole provides positive or negative pressure to the air hole gas.
  2. 根据权利要求1所述的带精密测量的可控升降装置,其特征在于,移动组件还包括第一橡胶圈、支撑杆和固定套,所述固定套、支撑杆、第一橡胶圈、升降头依次连接装入到导向杆的安装孔中。The controllable lifting device with precise measurement according to claim 1, wherein the moving component further comprises a first rubber ring, a support rod and a fixed sleeve, the fixed sleeve, the support rod, the first rubber ring, and the lifting head Connect them into the mounting holes of the guide rod in sequence.
  3. 根据权利要求1所述的带精密测量的可控升降装置,其特征在于,在固定基座上开设有用于冷却所述电机线圈的冷却水槽,冷却水固定套围绕在固定基座的外围密封所述冷却水槽,在所述固定基座上设置有与冷却水槽连通的进水口和出水口。The controllable lifting device with precise measurement according to claim 1, wherein a cooling water tank for cooling the motor coil is opened on the fixed base, and the cooling water fixing sleeve surrounds the outer sealing area of the fixed base. In the cooling water tank, a water inlet and a water outlet communicated with the cooling water tank are arranged on the fixed base.
  4. 根据权利要求1所述的一种带精密测量的可控升降装置,其特征在于,固定基座上设置有穿透固定基座至导向杆的光栅尺读数头安装孔,光栅尺读数头通过所述光栅尺读数头安装孔安装在固定基座上,在所述导向杆上设置 有光栅尺。A controllable lifting device with precise measurement according to claim 1, wherein the fixed base is provided with a grating reading head mounting hole penetrating the fixed base to the guide rod, and the grating reading head passes through the The grating ruler reading head mounting hole is installed on the fixed base, and the grating ruler is arranged on the guide rod.
  5. 根据权利要求1所述的一种带精密测量的可控升降装置,其特征在于,在导向杆上设置有竖向的限位槽,在所述固定基座上设置有限位杆安装孔,限位杆穿过所述限位杆安装孔并通过螺纹连接固定在导向座上,限位杆穿出导向座的端部插入在所述限位槽内,并且,限位杆穿出导向座的端部套设有第二橡胶圈。The controllable lifting device with precise measurement according to claim 1, wherein a vertical limit groove is provided on the guide rod, and a limit rod mounting hole is provided on the fixed base to limit the limit rod. The limit rod passes through the limit rod installation hole and is fixed on the guide seat by threaded connection, the end of the limit rod passing out of the guide seat is inserted into the limit slot, and the limit rod passes out of the guide seat. The end is sleeved with a second rubber ring.
  6. 根据权利要求1所述的一种带精密测量的可控升降装置,其特征在于,在导向杆上设置有两个进气孔以及由各进气孔分别与所述气孔连通的气道,在固定基座上开设有两个气源孔,一个气源孔与正压气源连通,另一个气源孔与负压气源连通,固定基座上还设置有两个出气孔,两个出气孔分别通过软管与导向杆上对应的进气孔连通。A controllable lifting device with precise measurement according to claim 1, characterized in that, two air inlet holes and air passages respectively communicated with the air holes are provided on the guide rod, There are two air source holes on the fixed base, one air source hole is connected with the positive pressure air source, the other air source hole is connected with the negative pressure air source, and the fixed base is also provided with two air outlet holes, two outlet holes. The air holes are respectively communicated with the corresponding air inlet holes on the guide rod through hoses.
  7. 根据权利要求2所述的一种带精密测量的可控升降装置,其特征在于,所述磁钢的上下两端分别设置有铁芯盘,并且,在上端的铁芯盘与固定套之间还设置有调整垫。The controllable lifting device with precise measurement according to claim 2, wherein the upper and lower ends of the magnetic steel are respectively provided with iron core disks, and between the iron core disk at the upper end and the fixed sleeve Adjustment pads are also provided.
  8. 根据权利要求1所述的一种带精密测量的可控升降装置,其特征在于,所述导向杆包括圆柱体以及同轴连接于圆柱体下方的方块体,所述圆柱体的上部与导向套之间形成气浮接触面,所述方块体的相对的两侧面中的一侧是通过突出的相互平行的多个第一竖向平面与导向座之间形成气浮接触面,所述方块体的相对的两侧面中的另一侧是通过两个相对倾斜延伸的第二竖向平面与固定基座之间形成气浮接触面。The controllable lifting device with precise measurement according to claim 1, wherein the guide rod comprises a cylinder and a block coaxially connected below the cylinder, the upper part of the cylinder and the guide sleeve An air-floating contact surface is formed between them, and one of the two opposite sides of the block body is formed by protruding a plurality of first vertical planes that are parallel to each other and the guide seat to form an air-floating contact surface. The other side of the two opposite sides is formed by two relatively inclined second vertical planes and the fixed base to form an air-floating contact surface.
  9. 根据权利要求1所述的一种带精密测量的可控升降装置,其特征在于,固定基座上延伸出至少三个定位支杆,所有定位支杆的端部形成有共面的定位平面,且在定位平面上都设置有定位销孔。The controllable lifting device with precise measurement according to claim 1, wherein at least three positioning struts extend from the fixed base, and the ends of all the positioning struts are formed with coplanar positioning planes, And the positioning pin holes are arranged on the positioning plane.
  10. 一种光刻设备,包括承载硅片的承片台,其特征在于,还包括如权利要求1至9中任一项所述的带精密测量的可控升降装置,所述可控升降装置安装在所述承片台上。A lithography apparatus, comprising a wafer-bearing stage for carrying silicon wafers, characterized in that it further comprises a controllable lifting device with precise measurement according to any one of claims 1 to 9, the controllable lifting device is installed on the stage.
PCT/CN2021/118176 2020-09-28 2021-09-14 Controllable lifting device with precision measurement capability and photolithography apparatus containing same WO2022062959A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN202011040473.6 2020-09-28
CN202011040473.6A CN112051715A (en) 2020-09-28 2020-09-28 Controllable lifting device with precision measurement and photoetching equipment comprising same

Publications (1)

Publication Number Publication Date
WO2022062959A1 true WO2022062959A1 (en) 2022-03-31

Family

ID=73604960

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2021/118176 WO2022062959A1 (en) 2020-09-28 2021-09-14 Controllable lifting device with precision measurement capability and photolithography apparatus containing same

Country Status (2)

Country Link
CN (1) CN112051715A (en)
WO (1) WO2022062959A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112051715A (en) * 2020-09-28 2020-12-08 清华大学 Controllable lifting device with precision measurement and photoetching equipment comprising same

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0129732A1 (en) * 1983-06-15 1985-01-02 The Perkin-Elmer Corporation Wafer transferring chuck assembly
WO2005087969A1 (en) * 2004-03-11 2005-09-22 Ulvac, Inc. Alignment equipment and film forming equipment
CN109597279A (en) * 2017-09-30 2019-04-09 上海微电子装备(集团)股份有限公司 Vacuum suction hand, substrate connection device and litho machine
CN110824850A (en) * 2018-08-10 2020-02-21 上海微电子装备(集团)股份有限公司 Silicon wafer handing-over manipulator and silicon wafer handing-over device
CN112051715A (en) * 2020-09-28 2020-12-08 清华大学 Controllable lifting device with precision measurement and photoetching equipment comprising same

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0129732A1 (en) * 1983-06-15 1985-01-02 The Perkin-Elmer Corporation Wafer transferring chuck assembly
WO2005087969A1 (en) * 2004-03-11 2005-09-22 Ulvac, Inc. Alignment equipment and film forming equipment
CN109597279A (en) * 2017-09-30 2019-04-09 上海微电子装备(集团)股份有限公司 Vacuum suction hand, substrate connection device and litho machine
CN110824850A (en) * 2018-08-10 2020-02-21 上海微电子装备(集团)股份有限公司 Silicon wafer handing-over manipulator and silicon wafer handing-over device
CN112051715A (en) * 2020-09-28 2020-12-08 清华大学 Controllable lifting device with precision measurement and photoetching equipment comprising same

Also Published As

Publication number Publication date
CN112051715A (en) 2020-12-08

Similar Documents

Publication Publication Date Title
WO2022062959A1 (en) Controllable lifting device with precision measurement capability and photolithography apparatus containing same
US9423000B2 (en) Magnetically suspended vibration isolator with zero stiffness whose angle degree of freedom is decoupled with a joint ball bearing
KR20150103153A (en) Warped silicon-chip adsorption device and adsorption method thereof
EP0383336A2 (en) Article assembling device
JPH10247682A (en) Lift pin guidance apparatus
RU2510546C2 (en) Device to transfer substrates without formation of particles
KR20220002620A (en) drive
EP3121845B1 (en) Purge apparatus and purge method
US6491435B1 (en) Linear robot
US6443618B1 (en) Particulate free air bearing and seal
US11267659B2 (en) Apparatus for taking out workpiece
JP6801166B2 (en) Prober and probe inspection method
CN212341676U (en) Controllable lifting device with precision measurement and photoetching equipment comprising same
JP2018142615A (en) Wafer carrying/holding device
JP6211424B2 (en) Substrate processing equipment
JP6416506B2 (en) Vacuum gate valve
JP2012110907A (en) Machining apparatus
JP2004358642A (en) Shaft inserting method and shaft inserting device
JPH01143336A (en) Retaining device of plate-like body
JP2011041444A (en) Planar motor
TWI810130B (en) Platform device, charged particle beam device and vacuum device
KR20230130982A (en) Picker for transferring die and die bonding apparatus comprising the same
KR102475430B1 (en) Robot for transferring semiconductor substrate using the same
KR102385815B1 (en) Dual pod SMIF Open Device
CN219777522U (en) Non-contact sucking disc, crystal grain carrying device and crystal grain detecting device

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 21871330

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 21871330

Country of ref document: EP

Kind code of ref document: A1