CN212341676U

CN212341676U - Controllable lifting device with precision measurement and photoetching equipment comprising same

Info

Publication number: CN212341676U
Application number: CN202022170608.2U
Authority: CN
Inventors: 成荣; 朱煜; 张鸣; 杨开明; 刘相波
Original assignee: Tsinghua University
Current assignee: Tsinghua University
Priority date: 2020-09-28
Filing date: 2020-09-28
Publication date: 2021-01-12
Anticipated expiration: 2030-09-28

Abstract

The utility model discloses a controllable lifting device with precision measurement and lithography equipment, the device comprises a fixed base, a guide seat, a moving assembly and a driving assembly, the fixed base is fixedly connected with the guide seat, the fixed base is provided with a guide sleeve with a vertical axis, the moving assembly comprises a lifting head, a guide rod and magnetic steel, the upper end of the guide rod is provided with a mounting hole, the guide rod passes through the guide sleeve, and an air floatation contact surface is formed between the guide rod and the guide sleeve as well as between the fixed base and the guide seat; magnet steel, lift head pack into the mounting hole of guide bar in proper order, make the lift head stretch out the uide bushing upper end, drive assembly includes motor coil and iron core, and the iron core setting is in the annular space between guide bar and uide bushing, and motor coil twines on the iron core, and there is the gas pocket at removal subassembly center, and fixed baseplate provides malleation or negative pressure gas through the air flue of guide bar to the gas pocket. The utility model discloses an air supporting contact surface direction reduces the friction between the spare part, avoids the granule to produce to improve the motion precision, reduce the motor drive power requirement.

Description

Controllable lifting device with precision measurement and photoetching equipment comprising same

Technical Field

The utility model relates to a photoetching technical field, specifically speaking relates to a take precision measurement's controllable elevating gear and contain its lithography apparatus.

Background

The silicon wafer handing-over device of the photoetching equipment is matched with the transmission manipulator, so that the silicon wafer handing-over function can be realized. The device used to controllably lift and lower the silicon wafer in a lithographic apparatus is commonly referred to as an E-pin. The E-pin is arranged on the wafer bearing table, and the photoetching equipment needs to carry out wafer loading and unloading operations on a silicon wafer during working. When loading, the silicon chip is transferred to a set position by the mechanical arm, the pin rod of the E-pin extends out of the mechanical arm to take down the silicon chip, then the pin rod retracts, and the silicon chip is placed on the wafer bearing table. When the silicon wafer is discharged, the pin rod extends out to lift the silicon wafer to a set height from the wafer bearing platform, and then the silicon wafer is taken away by the mechanical arm. Therefore, the E-pin not only needs a telescopic function for lifting and lowering the silicon wafer; and the function of position measurement is needed, so that the silicon wafer and parts are prevented from being damaged due to the fact that the silicon wafer is not lifted in place.

The applicant finds that particle pollution can be caused by the adoption of the existing sliding and rolling transmission structure when the silicon wafer is placed on the sucker, and particle pollution can be caused by the adoption of sliding guide and the adoption of high-hardness wear-resistant materials for the guide rod and the guide sleeve, although the quantity of particles can be reduced; and rolling guide is adopted, and the guide rod and the guide sleeve or the fixed seat and the guide base are guided by the roller, so that grease can be introduced, particle pollution is caused, and the photoetching environment is damaged.

Therefore, a structure which can guide and does not pollute the photoetching environment is adopted, and a better solution is not provided at present.

SUMMERY OF THE UTILITY MODEL

In order to solve the problems, the utility model provides a controllable lifting device with precision measurement, which comprises a fixed base, a guide seat, a moving assembly and a driving assembly,

wherein the fixed base is fixedly connected with the guide seat, a guide sleeve with vertical axis is arranged on the fixed base,

wherein, the removal subassembly includes:

the lifting head is arranged on the base plate,

the upper end of the guide rod is provided with a mounting hole coaxial with the guide sleeve, the guide rod coaxially penetrates through the guide sleeve, and air floatation contact surfaces are formed between the upper part of the guide rod and the guide sleeve, and between the lower part of the guide rod and the fixed base as well as between the lower part of the guide rod and the guide seat;

the magnetic steel, the magnetic steel and the lifting head are sequentially arranged in the mounting hole of the guide rod, so that the lifting head extends out of the upper end part of the guide sleeve,

wherein, drive assembly includes:

a motor coil and an iron core, the iron core is coaxially arranged in the annular space between the guide rod and the guide sleeve, the motor coil is wound on the iron core,

the center of the moving assembly is coaxially provided with an air hole penetrating to the upper end of the lifting head, the guide rod is provided with an air inlet hole and an air passage communicating the air inlet hole with the air hole, the fixed base is provided with an air source hole and an air outlet hole, the air source hole is communicated with an air source, the air outlet hole is communicated with the air inlet hole in the guide rod through a hose, and positive pressure or negative pressure air is provided for the air hole through the air source hole.

Preferably, the moving assembly further comprises a first rubber ring, a supporting rod and a fixing sleeve, and the fixing sleeve, the supporting rod, the first rubber ring and the lifting head are sequentially connected and installed in the installation hole of the guide rod.

Preferably, a cooling water tank for cooling the motor coil is arranged on the fixing base, the cooling water fixing sleeve surrounds the periphery of the fixing base to seal the cooling water tank, and a water inlet and a water outlet which are communicated with the cooling water tank are arranged on the fixing base.

Preferably, the fixed base is provided with a grating scale reading head mounting hole penetrating through the fixed base to the guide rod, the grating scale reading head is mounted on the fixed base through the grating scale reading head mounting hole, and the guide rod is provided with a grating scale.

Preferably, be provided with vertical spacing groove on the guide bar be provided with the gag lever post mounting hole on the fixed baseplate, the gag lever post passes the gag lever post mounting hole is fixed on the guide holder through threaded connection, and the tip that the guide holder was worn out to the gag lever post inserts the spacing inslot to, the tip cover that the guide holder was worn out to the gag lever post is equipped with the second rubber circle.

Preferably, the guide rod is provided with two air inlet holes and an air passage communicated with the air holes through the air inlet holes, the fixed base is provided with two air source holes, one air source hole is communicated with the positive pressure air source, the other air source hole is communicated with the negative pressure air source, the fixed base is further provided with two air outlet holes, and the two air outlet holes are communicated with the corresponding air inlet holes in the guide rod through hoses.

Preferably, the upper and lower both ends of magnet steel are provided with the iron core dish respectively to, still be provided with the adjusting pad between iron core dish and the fixed cover of upper end.

Preferably, the guide rod comprises a cylinder and a square block body coaxially connected below the cylinder, an air floatation contact surface is formed between the upper part of the cylinder and the guide sleeve, an air floatation contact surface is formed between a plurality of first vertical planes which are protruded and parallel to each other and the guide seat on one of two opposite side surfaces of the square block body, and an air floatation contact surface is formed between a second vertical plane which extends obliquely relative to the fixed base on the other of the two opposite side surfaces of the square block body.

Preferably, at least three positioning struts extend out of the fixing base, coplanar positioning planes are formed at the ends of all the positioning struts, and positioning pin holes are formed in the positioning planes.

The utility model also provides a lithography apparatus, including the wafer bearing platform that bears the silicon chip, still include as above take precision measurement's controllable elevating gear, controllable elevating gear installs the wafer bearing bench is last.

The utility model discloses a take precision measurement's controllable elevating gear and contain its lithography apparatus has following technological effect:

(1) the air floatation contact surface is adopted for guiding, and only the vertical degree of freedom of the guide rod is reserved, so that the friction between parts can be reduced, the generation of particles is avoided, the movement precision can be improved, and the requirement of the driving force of a motor is reduced;

(2) through the matching of the limiting groove and the limiting rod, the silicon wafer is prevented from exceeding the stroke range and damaging the silicon wafer and other parts of the photoetching equipment, such as a forked piece manipulator, an objective lens and the like, under special conditions;

(3) the first rubber ring enables the silicon wafer to avoid direct rigid contact with a pin, prevents the silicon wafer from being damaged when the silicon wafer contacts a structural member with high rigidity, and can realize small adjustment of Rx, Ry and Z-direction (vertical is a rectangular coordinate system of a Z axis) freedom degree.

(4) The rising and the falling of the silicon chip can be monitored in real time, and the position of the silicon chip can be accurately controlled.

(5) The up-and-down movement of the lifting head depends on the electromagnetic interaction, so that the space is saved, and the requirements of stable and reliable transmission of the silicon wafer up and down are met.

Drawings

The above features and technical advantages of the present invention will become more apparent and readily appreciated from the following description of the embodiments thereof, taken in conjunction with the accompanying drawings.

Fig. 1 is a front cross-sectional view showing a controllable lifting device with precision measurement according to an embodiment of the present invention;

FIG. 2 is a side cross-sectional view of a controllable lifting device with precision measurement illustrating an embodiment of the present invention;

FIG. 3 is a schematic structural view showing the connection between the lifting head, the first rubber ring and the support rod according to the embodiment of the present invention;

FIG. 4 is a schematic view of the air holes and air passages according to the embodiment of the present invention;

fig. 5 is a perspective view showing a fixing base according to an embodiment of the present invention;

fig. 6 is a perspective view of a moving assembly according to an embodiment of the present invention;

fig. 7 is a bottom view of the controllable lifting device with precision measurement according to the embodiment of the present invention.

The figure includes: the lifting head comprises a lifting head 1, a first rubber ring 2, a support rod 3, a fixing sleeve 4, an E-pin guide rod 5, a guide sleeve 6, an adjusting pad 7, an iron core disc 8, magnetic steel 9, a cooling water fixing sleeve 10, a cooling water sealing ring 11, a coil iron core 12, a motor coil 13, a fixing base 14, a grating ruler reading head 15, a grating ruler 16, a guide seat 17, a limiting rod 18, a limiting rod second rubber ring 19, a flexible air pipe 20, an air pipe joint 21, a screw 22, a limiting groove 23, an air hole 400, an air inlet hole 51, an air passage 52, an air outlet hole 141, a screw hole 142, a limiting rod mounting hole 143, a cylinder 55, a square block body 56, a first vertical plane 300, a second vertical plane 200, a connecting vertical plane 561, a positioning plane 147, a positioning support rod 146 and a positioning pin hole 148.

Detailed Description

Embodiments of the controllable lifting device with precision measurement and the lithographic apparatus comprising the same according to the invention will be described below with reference to the accompanying drawings. Those of ordinary skill in the art will recognize that the described embodiments can be modified in various different ways, or combinations thereof, without departing from the spirit and scope of the present invention. Accordingly, the drawings and description are illustrative in nature and not intended to limit the scope of the claims. Furthermore, in the present description, the drawings are not to scale and like reference numerals refer to like parts.

As shown in fig. 1, the controllable lifting device with precision measurement includes a fixed base 14, a guide seat 17, a moving assembly, and a driving assembly, wherein the fixed base 14 is fixedly connected with the guide seat 17, and fig. 5 is a schematic perspective view of the fixed base, wherein a screw hole 142 is processed on the fixed base 14, and the guide seat 17 is fixedly connected with the fixed base 14 through the screw hole 142. A guide sleeve 6 with a vertical axis is arranged on the fixed base 14. Wherein, remove the subassembly and include lift head 1, guide bar 5, magnet steel 9, the upper end of guide bar 5 has the mounting hole coaxial with uide bushing 6, and guide bar 5 is coaxial to be passed uide bushing 6, penetrates in the space that fixed baseplate 14, guide holder 17 enclose. An annular space is formed between the guide sleeve 6 and the guide rod 5. And, air supporting contact is formed between the guide rod 5 and the guide sleeve 6, and between the fixed base 14 and the guide seat 17, so as to limit the freedom degree of the guide rod 5 in five directions and keep the freedom degree of the guide rod in the vertical direction. The air floatation contact means that a certain gap is formed between two contact surfaces, and air is arranged between the gaps, so that the two contact surfaces have a certain guiding function, and have the characteristics of small friction coefficient and smooth sliding. Of course, the gap should not be too large, otherwise it will not play a guiding role.

Magnet steel 9, the first mounting hole of 5 guide bars of packing into in proper order of lift for lift 1 stretches out the upper end of uide bushing 6, preferably, removes the subassembly and still includes first rubber circle 2, bracing piece 3, fixed cover 4, as shown in fig. 3, fig. 4, lift 1 is connected with first rubber circle 2, and first rubber circle 2 is connected with bracing piece 3, and bracing piece 3 is connected with fixed cover 4 of below, then installs fixed cover 4 in the mounting hole of guide bar 5. The first rubber ring 2 is used for ensuring that the lifting head 1 has certain flexibility in Rx, Ry and Z directions. In addition, the upper end and the lower end of the magnetic steel 9 are both provided with the iron core discs 8, and the iron core discs 8 are used for optimizing the magnetic field of the magnetic steel 9, so that the magnetic induction lines in the magnetic steel 9 form a closed loop. An iron core plate 8 is arranged in the mounting hole, then the magnetic steel 9 is arranged in the mounting hole, then the iron core plate 8 is arranged in the mounting hole, an adjusting pad 7 can be arranged above the iron core plate 8, and the adjusting pad 7 is used for adjusting the whole height. Then the fixed sleeve 4, the support rod 3, the first rubber ring 2 and the lifting head 1 are sequentially arranged in the mounting hole.

Wherein, drive assembly includes motor coil 13 and coil core 12, circular bead in the uide bushing 6 has for form the different annular space in clearance between guide bar 5 and the uide bushing 6, the annular space clearance on its upper portion is less relatively, is the air supporting contact surface between guide bar 5 and the uide bushing, and the annular space clearance of lower part is great, and coil core 12 sets up in the annular space of lower part coaxially, and motor coil 13 twines on coil core 12. Threading holes for the two ends of the coil 13 of the power supply machine to penetrate out and be connected with a power supply are arranged on the guide sleeve and the fixed base.

As shown in fig. 4, an air hole 400 is coaxially formed in the center of the moving assembly, that is, the air hole 400 penetrates through the lifting head 1, the first rubber ring 2, the support rod 3, the fixing sleeve 4, the adjusting pad 7, the iron core disc 8 and the magnetic steel 9 to enter the guide rod 5, the air hole is sealed at the lower end of the guide rod 5, and as shown in fig. 1, the lower end of the air hole is sealed at the bottom end of the air hole 400 by screwing a bolt. The guide rod 5 is provided with an air inlet 51 and an air passage 52 for communicating the air inlet 51 with the air hole 400, the fixed base 14 is provided with an air source hole, the air source hole is communicated with an air source, the fixed base is also provided with an air outlet 141, the air outlet 141 is communicated with the air inlet 51 on the guide rod 5 through a flexible air pipe 20 and an air pipe joint 21, and positive pressure or negative pressure air is provided for the air hole 400 through the air source hole.

Preferably, the guide rod 5 is provided with two air inlet holes and an air passage communicated with the air holes through the air inlet holes, the fixed base is provided with two air source holes, one air source hole is communicated with a positive pressure air source, the other air source hole is communicated with a negative pressure air source, the fixed base is further provided with two air outlet holes, and the two air outlet holes are respectively communicated with the air inlet holes in the guide rod 5 through hoses. The air source holes can be processed at the bottom of the fixed base 14 and are respectively used for realizing the vacuum extraction and back blowing functions of the silicon wafer.

Further, a cooling water tank for cooling the motor coil is opened on the fixing base 14, and the cooling water fixing sleeve 10 seals the cooling water tank around the periphery of the fixing base. As shown in fig. 2, the cooling water fixing sleeve 10 is connected to the fixing base 14 by screws 22, a water inlet and a water outlet communicated with the cooling water tank are provided on the fixing base 14, and cooling water sealing rings 11 are provided between the cooling water fixing sleeve 10 and the fixing base 14 at upper and lower sides thereof for sealing the cooling water.

Further, a grating scale head mounting hole is formed in the fixed base 14, the grating scale head 15 is mounted on the fixed base 14 through the grating scale head mounting hole, a vertical grating scale is arranged on the outer circumference of the guide rod 5, and the grating scale head 15 can read the reading of the grating scale 16 in the process that the guide rod 5 moves up and down.

Further, be provided with vertical spacing groove 23 on guide bar 5 be provided with gag lever post mounting hole 143 on the fixed baseplate 14, gag lever post 18 passes gag lever post mounting hole 143 is fixed on guide holder 17 through threaded connection, and the tip that guide holder 17 was worn out to gag lever post 18 inserts in spacing groove 23 to, the tip cover that guide holder 17 was worn out to gag lever post 18 is equipped with gag lever post second rubber ring 19, avoids the direct rigid contact of gag lever post 18 with the spacing groove 23 of guide bar, plays the limiting displacement to the guide bar simultaneously.

Further, as shown in fig. 6, the guide rod 5 includes a cylinder 55 and a square block 56 coaxially connected below the cylinder, an air-floating contact surface is formed between the upper portion of the cylinder 55 and the guide sleeve 6, and an air-floating contact surface is formed between the guide seat 17 and a plurality of first vertical planes 300 protruding in parallel on one of two opposite sides of the square block 56, two first vertical planes 300 are used in fig. 6. Of course, the number of the first vertical planes 300 is not limited in this embodiment, and may be one. The other of the two opposite sides of the square block 56 forms an air floating contact surface with the fixed base through two second vertical planes 200 extending obliquely relative to each other. The two second vertical planes 200 may also be vertical tangent planes with different inclination angles. The air-floating contact surface between the cylinder 55 and the guide sleeve may be formed by only providing a portion of the outer diameter of the cylinder for air-floating contact with the guide sleeve, and the outer diameter of the other portion may be relatively reduced to enable smooth sliding. For example, in fig. 6, the outer diameter of the annular boss 100 is larger than the outer diameter of the cylinder 55, and the annular boss 100 is in air-floating contact with the guide sleeve 6.

The second vertical planes 200 may be two vertical planes which are symmetrically and vertically cut from the two horizontal ends of the side at a certain inclination angle, for example, in fig. 6, the two vertical planes are respectively inclined from the two horizontal ends of the side to the middle, a concave connecting vertical surface 561 is formed between the two second vertical planes 200, and the grating ruler 16 is installed on the connecting vertical surface 561, so that the grating ruler can be protected from collision and damage in the process of moving up and down. This embodiment is not intended to limit the number of such vapor floating contact surfaces.

Further, at least three positioning struts 146 extend from the fixed base 14, coplanar positioning planes 147 are formed at the ends of all the positioning struts 146, and positioning pin holes 148 are provided on the positioning planes 147. The fixed base 14 is mounted on the reference surface through the positioning plane 147.

The operation of the controllable lifting device with precision measurement is described as follows:

before operation, the assembled controllable lifting device is fixed on a reference surface through a positioning surface 147 on the fixing base 14 and fixed in position by a positioning pin through a positioning pin hole 148 processed on the fixing base 14.

When the silicon wafer lifting device works, when the silicon wafer needs to be taken down from the fork piece manipulator, in order to prevent the silicon wafer from sliding off, the lifting head 1 provides back vacuum suction force to enable the silicon wafer to be adsorbed on the lifting head 1, when the silicon wafer is adsorbed on the lifting head 1, the motor coil 13 is controlled to interact with the magnetic force of the magnetic steel 9, the part of the guide rod 5 with the lifting head 1 is enabled to move downwards integrally, the descending height of the silicon wafer is monitored in real time through the action of the grating ruler reading head 15 and the grating ruler 16, when the specified position is reached, an air source providing a vacuum environment is closed, back blowing air is provided for the lifting head 1, the silicon wafer is enabled to be separated from the lifting head 1, the separated silicon wafer can fall on the sucker at the moment, and subsequent operation is carried.

When the processed silicon wafer needs to be separated from the sucker, the air hole in the lifting head 1 provides back vacuum suction again to adsorb the silicon wafer on the lifting head, then the lifting head 1 drives the silicon wafer to move upwards through the interaction of the motor coil 13 and the magnetic steel 9, after the specified position is reached, when the silicon wafer is taken away by the required fork piece manipulator, the back vacuum suction is stopped to be provided, and the silicon wafer can be taken away.

In the whole moving process, an air floatation guide structure is provided in the device, and a cooling water cooling structure, a limiting structure and real-time position detection are carried out to ensure that the silicon wafer can stably and safely run in the process from the sheet forking mechanical arm to the sucking disc or from the sucking disc to the sheet forking mechanical arm.

The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims

1. A controllable lifting device with precision measurement is characterized by comprising a fixed base, a guide seat, a moving assembly and a driving assembly,

wherein, the removal subassembly includes:

the lifting head is arranged on the base plate,

wherein, drive assembly includes:

2. The controllable lifting device with precision measurement as claimed in claim 1, wherein the moving assembly further comprises a first rubber ring, a support rod and a fixing sleeve, and the fixing sleeve, the support rod, the first rubber ring and the lifting head are sequentially connected and installed in the installation hole of the guide rod.

3. The controllable lifting device with precision measurement as claimed in claim 1, wherein a cooling water tank for cooling the motor coil is opened on the fixed base, a cooling water fixing sleeve surrounds the periphery of the fixed base to seal the cooling water tank, and a water inlet and a water outlet communicated with the cooling water tank are provided on the fixed base.

4. A controllable lifting device with precision measurement as claimed in claim 1, characterized in that the fixed base is provided with a grating reading head mounting hole penetrating through the fixed base to the guide bar, the grating reading head is mounted on the fixed base through the grating reading head mounting hole, and the guide bar is provided with a grating ruler.

5. The controllable lifting device with the precision measurement function according to claim 1, wherein a vertical limiting groove is formed in the guide rod, a limiting rod mounting hole is formed in the fixing base, the limiting rod penetrates through the limiting rod mounting hole and is fixed on the guide seat through threaded connection, the end portion, penetrating out of the guide seat, of the limiting rod is inserted into the limiting groove, and a second rubber ring is sleeved on the end portion, penetrating out of the guide seat, of the limiting rod.

6. A controllable lifting device with precision measurement as claimed in claim 1, characterized in that the guide bar is provided with two air inlets and an air passage communicating with the air holes through the air inlets, respectively, the fixed base is provided with two air source holes, one air source hole is communicated with a positive pressure air source, the other air source hole is communicated with a negative pressure air source, the fixed base is further provided with two air outlets, and the two air outlets are communicated with the corresponding air inlets on the guide bar through hoses, respectively.

7. A controllable lifting device with precision measurement as claimed in claim 2, characterized in that the upper and lower ends of the magnetic steel are respectively provided with a core plate, and an adjusting pad is further provided between the core plate at the upper end and the fixing sleeve.

8. A controllable lifting device with precision measurement as claimed in claim 1, characterized in that the guiding rod comprises a cylinder and a square block coaxially connected below the cylinder, an air-floating contact surface is formed between the upper part of the cylinder and the guiding sleeve, one of the two opposite sides of the square block is formed by an air-floating contact surface formed between a plurality of first vertical planes protruding in parallel and the guiding seat, and the other of the two opposite sides of the square block is formed by an air-floating contact surface formed between two second vertical planes extending obliquely and the fixed base.

9. A controllable lifting device with precision measurement as claimed in claim 1, characterized in that at least three positioning struts extend from the fixed base, the ends of all the positioning struts are formed with coplanar positioning planes, and positioning pin holes are provided on the positioning planes.

10. A lithographic apparatus comprising a stage for carrying a silicon wafer, further comprising a controllable lifting device with precision measurement according to any of claims 1 to 9, said controllable lifting device being mounted on said stage.