CN109597279B - Vacuum adsorption hand, substrate handing-over device and photoetching machine - Google Patents
Vacuum adsorption hand, substrate handing-over device and photoetching machine Download PDFInfo
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- CN109597279B CN109597279B CN201710944128.7A CN201710944128A CN109597279B CN 109597279 B CN109597279 B CN 109597279B CN 201710944128 A CN201710944128 A CN 201710944128A CN 109597279 B CN109597279 B CN 109597279B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
Abstract
The invention provides a vacuum adsorption hand, a substrate delivery device and a photoetching machine. The vacuum adsorption hand comprises an adsorption shaft, a suction head, a main body bracket, a driving assembly and an anti-rotation structure. The substrate handing-over device includes base and symmetrical in a plurality of vacuum adsorption hands of base. The photoetching machine comprises a substrate table, wherein the substrate table is provided with a substrate connecting area, the substrate table is internally provided with a substrate connecting device, the substrate connecting device is positioned below the substrate connecting area, and the surface of the substrate connecting area is provided with a through hole corresponding to the position of the vacuum adsorption hand; when the substrate is handed over, the vacuum suction hand can extend upwards through the through hole. The substrate handover device provided by the invention improves the space utilization rate of the substrate handover device and reduces the space size; in addition, the substrate delivery device adopts a circular air-float guide rail, so that the device is easy to manufacture and can easily meet the requirement of guide rail manufacturing precision.
Description
Technical Field
The invention relates to the field of semiconductor manufacturing, in particular to a vacuum adsorption hand, a substrate delivery device and a photoetching machine.
Background
A lithographic apparatus is a process technology apparatus that images a mask pattern exposure onto a substrate. Known lithographic apparatus include step-and-repeat systems and step-and-scan systems. In the above-mentioned lithography apparatus, a corresponding device is required to be configured as a carrier for a mask and a substrate and a connection mechanism for the mask and the substrate, and the carrier loaded with the mask and the carrier loaded with the substrate generate relative movement to meet the lithography requirement.
The carrier of the reticle is called a stage, the carrier of the substrate is called a wafer stage, and the substrate transfer mechanism is called a substrate transfer device. The plate bearing table and the wafer bearing table are respectively positioned in a mask table subsystem and a workpiece table subsystem of the lithography equipment, and are core modules of the subsystem. When the mask support and the wafer support move relatively, the mask and the substrate are ensured to be positioned reliably all the time, namely six degrees of freedom of the mask and the substrate are limited. In addition, before the exposure operation of the lithography equipment, the substrate is moved from the transfer manipulator to the wafer carrying platform by the substrate transfer device, and after the exposure is completed, the substrate is moved from the wafer carrying platform to the transfer manipulator by the substrate transfer device.
The existing substrate connecting device mainly adopts a mechanical guide rail or an air-float guide rail to realize silicon chip adsorption, and can be driven to move by a motor or compressed air respectively. Whether a mechanical guide rail or an air-float guide rail, an anti-rotation structure is required to be additionally arranged to limit the rotation of the substrate connecting device, so that the whole substrate connecting device has large space size, and the space layout of the whole device is limited. In the prior art, the anti-rotation structure of the substrate connecting device adopting the air-float guide rail is provided with a plurality of guide surfaces, and the conventional manufacturing technology is difficult to simultaneously meet the requirements on the manufacturing precision of the plurality of guide surfaces, so that the manufacturing difficulty of the substrate connecting device in the form is high.
Disclosure of Invention
The invention aims to provide a vacuum adsorption hand, a substrate transfer device and a photoetching machine, which are used for solving the problems that the substrate transfer device in the prior art is large in space size and manufacturing difficulty and cannot meet the manufacturing precision requirement of a guide rail.
In order to achieve the above purpose, the invention provides a vacuum adsorption hand, which comprises an adsorption shaft, a suction head, a main body support, a driving component and an anti-rotation structure, wherein the adsorption shaft is connected with the anti-rotation structure, the driving component drives the adsorption shaft and the anti-rotation structure to axially slide in the main body support, the anti-rotation structure limits the adsorption shaft to axially rotate around the main body support relative to the main body support, the top end of the adsorption shaft is connected with the suction head, a vacuum channel is arranged in the adsorption shaft, and the suction head is communicated with the vacuum channel.
Optionally, the anti-rotation structure has a plurality of first anti-rotation surfaces that are the contained angle setting towards the direction of main part support, have in the main part support with a plurality of first anti-rotation surfaces assorted is a plurality of second anti-rotation surfaces that same contained angle setting, a plurality of first anti-rotation surfaces with a plurality of second anti-rotation surfaces are used for limiting jointly anti-rotation structure is in around axial rotation in the main part support.
Optionally, be equipped with in the main part support and supply the first guiding hole that the absorption axle axially slid and supply the second guiding hole that the anti-rotation structure axially slid, the absorption axle with prevent being connected off-axis between the anti-rotation structure, first guiding hole with off-axis setting that the second guiding hole corresponds.
Optionally, the driving assembly includes a stator and a mover, the stator is arranged concentrically with the mover, the stator is fixed in the main body support, and the mover is mounted on the anti-rotation structure and arranged concentrically with the adsorption shaft.
Optionally, the offset axial distance between the adsorption shaft and the anti-rotation structure is 1mm to 2mm.
Optionally, compressed air is introduced between the main body support and the adsorption shaft to form an air floatation guiding film.
Optionally, compressed air is introduced between the main body support and the anti-rotation structure to form an air floatation guiding film.
Optionally, a plurality of first orifice and with the compressed air passageway of first orifice intercommunication are provided with in the absorption axle, compressed air loops through compressed air passageway, first orifice get into between absorption axle and the main part support.
Optionally, a plurality of second orifices are arranged on the anti-rotation structure, and the compressed air enters between the anti-rotation structure and the main body bracket through the second orifices.
Optionally, the anti-rotation structure is provided with a compressed air circulation groove communicated with the compressed air channel, and the compressed air circulation groove is used for being communicated with an external compressed air source.
Optionally, the anti-rotation structure is further provided with a vacuum inlet communicated with the vacuum channel in the adsorption shaft, and the vacuum inlet is used for communicating with an external vacuum source.
Optionally, the bottom part of absorption axle inserts and fixes in preventing changeing the structure, prevent changeing the structure with still be provided with a plurality of sealing washer between the absorption axle, be used for the isolation seal prevent changeing the structure with vacuum and compressed air between the absorption axle.
Optionally, the vacuum adsorption hand further includes a preloading mechanism, the preloading mechanism includes a metal object and a magnet, the metal object is disposed on at least one of the plurality of first anti-rotation surfaces, the magnet is correspondingly disposed on at least one of the plurality of second anti-rotation surfaces, or the metal object is disposed on at least one of the plurality of second anti-rotation surfaces, and the magnet is correspondingly disposed on at least one of the plurality of first anti-rotation surfaces.
Optionally, the adsorption shaft is a cylinder, and the anti-rotation structure is a trapezoid table.
Optionally, the adsorption shaft and the anti-rotation structure are both cylinders.
Furthermore, the invention also provides a substrate handover device which comprises a base and a plurality of vacuum adsorption hands symmetrically distributed on the base.
Still further, the present invention provides a lithographic apparatus, comprising a substrate table, wherein the substrate table is provided with a substrate handover area, the substrate table is internally provided with a substrate handover device, the substrate handover device is positioned below the substrate handover area, and a through hole is formed on the surface of the substrate handover area corresponding to the position of the vacuum suction hand; when the substrate is handed over, the vacuum suction hand can extend upwards through the through hole.
In summary, the substrate handover device provided by the invention comprises a base and a plurality of vacuum adsorption hands symmetrically distributed on the base, wherein the vacuum adsorption hands comprise an adsorption shaft, a suction head, a main body support, a driving component and an anti-rotation structure, the adsorption shaft is connected with the anti-rotation structure, the driving component drives the adsorption shaft and the anti-rotation structure to axially slide in the main body support, the anti-rotation structure limits the adsorption shaft to axially rotate relative to the main body support, the top end of the adsorption shaft is connected with the suction head, a vacuum channel is arranged in the adsorption shaft, and the suction head is communicated with the vacuum channel. In particular, the anti-rotation structure is provided with a plurality of first air floatation surfaces which are arranged at an included angle, the main body support is provided with a plurality of second air floatation surfaces which are arranged at the same included angle and matched with the first air floatation surfaces, and the first air floatation surfaces and the second air floatation surfaces are used for limiting the rotor part to rotate in the circumferential direction of the adsorption shaft together, so that compared with the additional anti-rotation structure in the prior art, the invention improves the utilization rate of the internal space of the substrate connecting device and reduces the space size of the substrate connecting device.
In addition, the anti-rotation structure preferably comprises an air bearing block mounted on an adsorption shaft, the adsorption shaft is of a cylindrical structure, and the main body support is provided with a guide surface matched with the outer circumferential surface of the adsorption shaft in a direction. Simultaneously, the air floatation block is provided with two planes parallel to the axial direction of the adsorption shaft, and the two planes are matched with the other two planes of the main body bracket and are used for limiting the rotation of the rotor part in the circumferential direction of the adsorption shaft; or, the absorption shaft is of a cylindrical structure and comprises a first part and a second part, the axes of the first part and the second part are eccentrically arranged, and the outer peripheral surface of the first part and the outer peripheral surface of the second part are matched with the other two outer peripheral surfaces of the main body bracket and are used for limiting the rotor part to rotate in the circumferential direction of the absorption shaft. Thus, the plane or the eccentrically arranged cylindrical surface is used as the guide surface for the linear motion of the rotor part, so that the substrate connecting device is easy to manufacture in industry, and the manufacturing precision requirement of the guide rail is easy to meet.
Drawings
FIG. 1 is a schematic view of a vacuum chuck according to an embodiment of the present invention;
FIG. 2 is a top view of the vacuum chuck shown in FIG. 1;
FIG. 3 is a schematic view of the eccentric adsorption shaft and the main body support according to the preferred embodiment of the present invention;
the reference numerals are explained as follows:
01/11-body scaffold; 021-air-floating block; 031-adsorption shaft; 04-motor rotor; 05-a motor stator;
07-tip; 08-oriented film; 034-a first orifice; 033-compressed air passage;
024-vacuum inlet; 025-compressed air inlet; 022-compressed air communication groove; 023-a seal ring;
032-vacuum channel; 101-a first air floatation space; 102-a second air floatation space; 026-a second orifice;
061-preloading the steel bar; 062—preloading a magnet; 091-displacement sensor; 092-measuring target surface;
12-eccentric adsorption shaft; 13/14-cylindrical air bearing surface; 401/501 substrate interface.
Detailed Description
Specific embodiments of the present invention will be described in more detail below with reference to the drawings. The advantages and features of the present invention will become more apparent from the following description. It should be noted that the drawings are in a very simplified form and are all to a non-precise scale, merely for convenience and clarity in aiding in the description of embodiments of the invention.
Example 1
Fig. 1 is a schematic structural diagram of a vacuum chuck according to an embodiment of the present invention, and fig. 2 is a top view of the vacuum chuck shown in fig. 1. As shown in fig. 1 and 2, the vacuum adsorption hand of this embodiment includes an adsorption shaft 031, a suction head 07, a main body support 01, a driving component and an anti-rotation structure, wherein the adsorption shaft 031 is connected with the anti-rotation structure, the driving component drives the adsorption shaft 031 and the anti-rotation structure to slide in the main body support 01 along an axial direction, the anti-rotation structure limits the adsorption shaft 031 to rotate around the axial direction relative to the main body support 01, the top end of the adsorption shaft 031 is connected with the suction head 07, a vacuum channel is arranged in the adsorption shaft 031, and the suction head 07 is communicated with the vacuum channel.
Wherein, the absorption shaft 031 movably passes through the main body bracket 01, so that the absorption shaft 031 can move along the main body bracket 01 in the axial direction. In particular, the anti-rotation structure has a plurality of first air-floating surfaces (see 101 and 102 in fig. 2) disposed at an included angle, and the main body support 01 has a plurality of second air-floating surfaces (see 101 and 102 in fig. 2) disposed at the same included angle, the first air-floating surfaces are matched with the second air-floating surfaces, and the plurality of first air-floating surfaces and the plurality of second air-floating surfaces are used together to limit the rotation of the adsorption shaft 031 in the circumferential direction.
The vacuum adsorption hand provided by the embodiment is provided with an anti-rotation structure which is separated from or integrated with the adsorption shaft 031, the anti-rotation structure is provided with a plurality of first air floatation surfaces which form an included angle, and the rotation of the adsorption shaft 031 can be well limited through the plurality of first air floatation surfaces which form the included angle, so that the additional anti-rotation structure is not needed to be added in the prior art, the utilization rate of the internal space of the vacuum adsorption hand is improved, and the space size of the vacuum adsorption hand is reduced.
Further, with continued reference to fig. 1 and 2, the anti-rotation structure further includes an air floatation block 021, and the driving assembly includes a motor stator 05 and a motor rotor 04, and the motor rotor 04 is mounted on the air floatation block 021 and is arranged concentrically with the adsorption shaft 031.
The suction shaft 031 is preferably a cylindrical shaft, and the cross-section diameter of the suction shaft 031 is preferably 7mm to 8mm, so that the internal vacuum channels and the compressed air channels of the suction shaft 031 are more reasonably distributed while the space utilization rate of the substrate delivering device is improved.
Wherein the motor stator 05 is connected with the main body bracket 01 and forms a stator part of a substrate connecting device. The air floatation block 021, the adsorption shaft 031, the motor rotor 04 and the suction head 07 together form a rotor part of the substrate transfer device. The suction head 07 is disposed at one end of the suction shaft 031, and a vacuum channel 032 is disposed in the suction shaft 031, and at the same time, the suction head 07 is provided with another vacuum channel which can be communicated with the vacuum channel 032, so that the substrate can be sucked by the suction head 07 in a vacuum suction manner.
A guide film 08 is preferably arranged between the main body bracket 01 and the adsorption shaft 031, and the guide film 08 is equivalent to the main guide rail of the whole rotor part, so that the rotor part can be guided with high precision and low friction. Then, the suction shaft 031 can move linearly along the guide film 08 by the motor mover 04. In this embodiment, the adsorption shaft 031 is provided with a first orifice 034 and a compressed air channel 033, and the compressed air channel 033 is communicated with the first orifice 034, so that compressed air sequentially passes through the compressed air channel 033 and the first orifice 034 to enter between the main body support 01 and the adsorption shaft 031 to form the guiding membrane 08. Preferably, the compressed air channel 033 is also connected to the compressed air communication groove 022 on the air floatation block 021 and the compressed air inlet 025.
Preferably, the center of the adsorption shaft 031 is provided with the vacuum channel 032, the inlet of the vacuum channel 032 may be connected with the vacuum inlet 024 on the air-floating block 021, and the outlet of the vacuum channel 032 is connected with the inlet of the other vacuum channel of the suction head 07, so as to provide vacuum adsorption force for the suction head 07 to adsorb silicon wafers.
The cross section of the vacuum channel 032 may be circular, and the diameter is preferably between 1.6mm and 2mm, if the diameter of the vacuum channel is too small, a larger pressure drop will be caused to affect the adsorption of the silicon wafer, and if the diameter of the vacuum channel is too large, the size of the adsorption shaft 031 will be correspondingly increased, so as to increase the manufacturing cost. The cross-sectional shape of the compressed air channel 033 may also be circular, and the diameter is preferably between 0.8mm and 1mm, and if the compressed air channel 033 is too small, the compressed air flow rate may be reduced, which affects the performance of the air rail.
In one embodiment, the main body support 01 has a guiding surface matched with the outer circumferential surface of the adsorption shaft 031, the air floatation block 021 has a plurality of first anti-rotation surfaces parallel to the axial direction of the adsorption shaft 031 and disposed at an included angle, and at the same time, the main body support 01 also has a plurality of second anti-rotation surfaces matched with the plurality of first anti-rotation surfaces, and gaps are left between the plurality of first anti-rotation surfaces and the plurality of second anti-rotation surfaces. In this embodiment, the air-floating block 021 is a trapezoid table, and has three first rotation preventing surfaces, wherein the first rotation preventing surfaces on two sides are two first air-floating surfaces, two second air-floating surfaces are provided on the corresponding main support 01, and compressed air is introduced between the two first air-floating surfaces and the two second air-floating surfaces matched with the first air-floating surfaces to form a first air-floating space 101 and a second air-floating space 102, so as to provide an air-floating guiding film for the axial movement of the rotation preventing structure in the main support 01. An included angle, preferably 90 degrees, is formed between the first air-floating space 101 and the second air-floating space 102.
The first air-bearing space 101 and the second air-bearing space 102 may be provided with compressed air by a second orifice 026 connected to a compressed air inlet 025 such that compressed air enters the first air-bearing space 101 and the second air-bearing space 102 sequentially through the compressed air inlet 025 and the second orifice 026.
Preferably, the body bracket 01 is further provided with a pre-load steel bar 061, and the air floatation block 021 is correspondingly provided with a pre-load magnet 062, wherein the pre-load steel bar 061 and the pre-load magnet 062 generate a certain attractive force, and the attractive force provides proper pre-load adsorption shafts for the first air floatation space 101 and the second air floatation space 102. However, the present invention includes, but is not limited to, steel bars, as long as they are made of metal. In addition, the pre-load steel bars 061 may also be disposed on the air floating block 021, and the pre-load magnets 062 are disposed on the main body bracket 01.
The first air-floating space 101 and the second air-floating space 102 are also parallel to the axial direction of the guiding film 08, and the absorption axes of the first air-floating space 101 and the second air-floating space 102 and the guiding film 08 form the guiding surface of the whole device. In addition, since the first air floating space 101 and the second air floating space 102 form a certain angle, the axial rotation of the mover portion around the guide film 08 can be restricted. In addition, the adsorption shaft is provided with a plurality of sealing rings 023 between the adsorption shaft 031 and the air-float block 021 to isolate and seal the compressed air from the vacuum of the adsorption shaft.
The mover part of the vacuum adsorption hand is driven by a motor mover 04 arranged on an air floatation block 021, wherein a measurement target surface 092 is arranged on the air floatation block 021, a displacement sensor 091 is correspondingly arranged on a main body support 01, and the displacement sensor 091 acquires the position information of the measurement target surface 092, so that the displacement measurement of the mover part is realized.
Example 2
As shown in fig. 3, which is a schematic structural diagram of the eccentric adsorption shaft and the guide film according to the preferred embodiment of the present invention, the difference between the eccentric adsorption shaft and the guide film according to the preferred embodiment of the present invention and the guide film according to embodiment 1 is that the eccentric adsorption shaft 12 and the main body bracket 11 are used for limiting. The eccentric adsorption shaft 12 is movably arranged in the main body bracket 11 in a penetrating way, and a guide film is arranged between the eccentric adsorption shaft and the main body bracket 11 so that the eccentric adsorption shaft 12 can flexibly move along the main body bracket 11. The eccentric adsorption shaft 12 comprises two cylindrical structures which are eccentrically arranged and are connected at one end, and the outer peripheral surfaces of the two cylindrical structures can form two first air floatation surfaces. The two cylindrical structures are preferably identical in shape.
Correspondingly, the main body support 11 has another two peripheral surfaces matched with the two peripheral surfaces, the another two peripheral surfaces form two second air-floating surfaces, the main body support 11 also has two eccentric round holes, the hole walls of the two round holes are matched with a cylindrical air-floating surface 13 and a cylindrical air-floating surface 14 formed by the eccentric adsorption shaft 12, and the cylindrical air-floating surface 13 and the cylindrical air-floating surface 14 provide guidance for the substrate connecting device and limit the rotation of the eccentric adsorption shaft. The eccentricity of the eccentric adsorption shaft is preferably between 1mm and 2mm.
It should be noted that, the suction shaft 031 and the main body bracket 01 of the vacuum suction hand in fig. 1 are replaced by the eccentric suction shaft 12 and the main body bracket 11 in the present embodiment, so that another vacuum suction hand can be formed; wherein the suction shaft 031 has a vacuum channel and a compressed air channel, the eccentric suction shaft 12 also has a vacuum inlet and a compressed air communication groove, and the main body bracket 01 also has a main body bracket 11; the rest of the structure is not changed.
Still further, a plurality of vacuum adsorption hands are distributed on the base, so that the substrate delivery device can be formed. When the substrate (i.e., the wafer to be adsorbed) is large in size, one of the substrate transfer devices is disadvantageous for transfer of the large-sized substrate, a plurality of substrate transfer devices need to be combined for use. And combining a plurality of substrate connecting devices to form a substrate connecting system by reasonable arrangement, and synchronously controlling the plurality of substrate connecting devices so as to realize the connection of large-size substrates.
The combination of the substrate delivery device provided by the implementation realizes the support of the large-size silicon wafer by combining a plurality of substrate delivery devices and synchronously controlling the plurality of substrate delivery devices. The requirement on space size is also small because of the separate individual devices, and at the same time, the requirement on the installation precision of 3 or more substrate cross-connecting devices is not high by the scheme, and the coplanarity of the supporting points can be realized by the high-precision positioning of each individual device. In addition, the embodiment of the invention also provides a lithography machine, which comprises a substrate table, wherein the substrate table is provided with a substrate connecting area, the substrate connecting device is arranged in the substrate table, the substrate connecting device is positioned below the substrate connecting area, and a through hole is formed in the surface of the substrate connecting area at a position corresponding to the vacuum adsorption hand; when the substrate is handed over, the vacuum suction hand can extend upwards through the through hole.
In summary, in the vacuum chuck, the substrate transfer device and the lithography machine provided by the invention, the substrate transfer device adsorbs or releases the substrate through the suction head, and the transfer of the substrate is realized through the movement of the adsorption shaft. Meanwhile, the substrate connecting device provided by the invention improves the air floatation structure, does not need an additional anti-rotation structure, improves the space utilization rate of the substrate connecting device, and reduces the space size of the substrate connecting device; in addition, the substrate delivery device adopts a circular air-float guide rail (namely, the eccentric adsorption shaft is used for limiting the rotation of the adsorption shaft), so that the device is easy to manufacture and can easily meet the requirement of the guide rail manufacturing precision.
The foregoing is merely a preferred embodiment of the present invention and is not intended to limit the present invention in any way. Any person skilled in the art will make any equivalent substitution or modification to the technical solution and technical content disclosed in the invention without departing from the scope of the technical solution of the invention, and the technical solution of the invention is not departing from the scope of the invention.
Claims (16)
1. The substrate delivery device is characterized by comprising a base and a plurality of vacuum adsorption hands symmetrically distributed on the base;
every vacuum adsorption hand includes adsorption shaft, suction head, main part support, drive assembly and prevents changeing the structure, the adsorption shaft is connected prevent changeing the structure, the drive assembly drive the adsorption shaft with prevent changeing the structure and be in along axial slip in the main part support, prevent changeing the structure restriction the adsorption shaft is relative main part support is rotated around the axial, the adsorption shaft top is connected the suction head, be equipped with the vacuum channel in the adsorption shaft, the suction head with the vacuum channel intercommunication.
2. The substrate handoff apparatus of claim 1, wherein the anti-rotation structure has a plurality of first anti-rotation surfaces disposed at an included angle in a direction facing the main body support, the main body support has a plurality of second anti-rotation surfaces disposed at an identical included angle in a matching manner with the plurality of first anti-rotation surfaces, and the plurality of first anti-rotation surfaces and the plurality of second anti-rotation surfaces are used together to limit the anti-rotation structure from rotating in the main body support about an axial direction.
3. The substrate transfer apparatus of claim 1, wherein a first guide hole for the adsorption shaft to slide axially and a second guide hole for the anti-rotation structure to slide axially are provided in the main body support, the adsorption shaft is connected with the anti-rotation structure by a deflection shaft, and the first guide hole and the second guide hole are arranged by a deflection shaft corresponding to each other.
4. The substrate interface of claim 1, wherein the drive assembly includes a stator and a mover, the stator being disposed concentric with the mover, the stator being secured within the body support, the mover being mounted on the anti-rotation structure and disposed concentric with the suction shaft.
5. The substrate handler of claim 3, wherein an offset distance between the suction axis and the anti-rotation structure is 1mm to 2mm.
6. A substrate transfer apparatus according to claim 1, 2 or 3, wherein compressed air is introduced between the main body support and the suction shaft to form an air-bearing guide film.
7. A substrate interface as claimed in claim 1, 2 or 3 wherein compressed air is introduced between the body support and the anti-rotation structure to form an air-bearing guide membrane.
8. The substrate transfer apparatus of claim 6, wherein the suction shaft is provided therein with a plurality of first throttle holes and a compressed air passage communicating with the first throttle holes, the compressed air sequentially passing through the compressed air passage and the first throttle holes to enter between the suction shaft and the main body holder.
9. The substrate interface of claim 7, wherein the anti-rotation structure is provided with a plurality of second orifices through which the compressed air enters between the anti-rotation structure and the body mount.
10. A substrate transfer device according to claim 8 or 9, wherein the anti-rotation structure is provided with a compressed air flow channel in communication with the compressed air channel, the compressed air flow channel being adapted to communicate with an external compressed air source.
11. The substrate handoff apparatus of claim 10, wherein said anti-rotation structure is further provided with a vacuum inlet in communication with said vacuum channel in said suction shaft for communication with an external vacuum source.
12. The substrate handoff apparatus of claim 11, wherein a bottom end portion of the suction shaft is inserted and fixed in the rotation preventing structure, and a plurality of sealing rings are further provided between the rotation preventing structure and the suction shaft for isolating and sealing vacuum and compressed air between the rotation preventing structure and the suction shaft.
13. The substrate handling apparatus of claim 2, wherein the vacuum chuck further comprises a preload mechanism comprising a metal object disposed on at least one of the plurality of first anti-rotation surfaces and a magnet disposed on at least one of the plurality of second anti-rotation surfaces or the metal object disposed on at least one of the plurality of second anti-rotation surfaces and the magnet disposed on at least one of the plurality of first anti-rotation surfaces.
14. The substrate handoff apparatus of claim 2, wherein the suction shaft is a cylinder and the anti-rotation structure is a trapezoidal table.
15. The substrate handoff apparatus of claim 3 wherein said suction shaft and said anti-rotation structure are each cylindrical.
16. A lithographic apparatus comprising a substrate table having a substrate interface, wherein a substrate interface according to any one of claims 1 to 15 is mounted in the substrate table, the substrate interface being located below the substrate interface, the substrate interface having a through hole in a surface thereof corresponding to the position of the vacuum chuck; when the substrate is handed over, the vacuum suction hand can extend upwards through the through hole.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710944128.7A CN109597279B (en) | 2017-09-30 | 2017-09-30 | Vacuum adsorption hand, substrate handing-over device and photoetching machine |
| TW107134562A TWI673223B (en) | 2017-09-30 | 2018-09-28 | Vacuum adsorption hand, substrate transfer device and lithography machine |
| PCT/CN2018/108631 WO2019062911A1 (en) | 2017-09-30 | 2018-09-29 | Vacuum suction manipulator, substrate transfer device, and photoetching machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710944128.7A CN109597279B (en) | 2017-09-30 | 2017-09-30 | Vacuum adsorption hand, substrate handing-over device and photoetching machine |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN109597279A CN109597279A (en) | 2019-04-09 |
| CN109597279B true CN109597279B (en) | 2023-09-29 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201710944128.7A Active CN109597279B (en) | 2017-09-30 | 2017-09-30 | Vacuum adsorption hand, substrate handing-over device and photoetching machine |
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| Country | Link |
|---|---|
| CN (1) | CN109597279B (en) |
| TW (1) | TWI673223B (en) |
| WO (1) | WO2019062911A1 (en) |
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| Publication number | Publication date |
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| TW201914939A (en) | 2019-04-16 |
| TWI673223B (en) | 2019-10-01 |
| CN109597279A (en) | 2019-04-09 |
| WO2019062911A1 (en) | 2019-04-04 |
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