CN109269771B - Light path structure of echelle grating efficiency tester with adjustable offset angle and testing method - Google Patents
Light path structure of echelle grating efficiency tester with adjustable offset angle and testing method Download PDFInfo
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Abstract
The invention relates to an optical path structure of an echelle grating diffraction efficiency tester with an adjustable offset angle. The light path structure comprises a light source, a preposed light path, a measuring light path and a detection system; the measuring light path comprises a middle slit, a collimating lens, an element to be measured, a focusing lens module and an emergent slit according to the sequence of the propagation track of the light beam; the element to be tested is arranged in the light path through a double-layer rotating platform, so that the setting of different offset angles of the echelle grating to be tested and the scanning of different test wavelength ranges of the echelle grating are realized; the focusing mirror module is provided with a scale ruler, the scale of the scale ruler is arranged according to the offset angle of the echelle grating to be measured, and the focusing mirror module is arranged on the scale position of the scale ruler corresponding to the offset angle. The invention realizes the test of the diffraction efficiency of the echelle grating in the real working state and can more accurately evaluate the energy transmission performance of the echelle grating in the spectrometer.
Description
Technical Field
The invention belongs to the technical field of optical system design and optical instruments, and particularly relates to an optical path structure of an echelle grating diffraction efficiency tester with an adjustable offset angle and a testing method.
Background
The echelle grating spectrometer is widely applied to modern spectrum instruments by virtue of excellent performances such as high spectral resolution, wide spectral band, full-spectrum direct reading and the like. The echelle grating is used as a key element in the spectrometer, the diffraction efficiency is one of the most important parameters of the echelle grating, and the performance of the echelle grating spectrometer plays a decisive role. The diffraction efficiency is classified into an absolute diffraction efficiency and a relative diffraction efficiency. In practical measurements, diffraction efficiency generally refers to the relative diffraction efficiency, i.e. the ratio of the diffracted light flux of a given diffraction order and wavelength received by the detector to the reflected light flux of the reference mirror received. Unless otherwise specified, the diffraction efficiencies mentioned below are relative diffraction efficiencies.
In order to measure the working state and energy transmission effect of the echelle grating in the spectrometer more accurately, it is necessary to measure the diffraction efficiency of the echelle grating in the working state. However, the diffraction efficiency curve provided by the echelle grating manufacturer cannot accurately reflect the performance level of the echelle grating in the working state, which imposes a certain limitation on the design and use of the echelle grating spectrometer. In the prior art, chinese patent application No.201810032110.4 discloses a self-collimating echelle grating diffraction efficiency testing device, which can only test the relative diffraction efficiency of the central wavelength of each diffraction order of the echelle grating in the self-collimating state, and cannot evaluate the energy transmission capability of the echelle grating in the real state of the spectrometer.
Disclosure of Invention
The invention aims to provide an optical path structure of an echelle grating diffraction efficiency tester with an adjustable offset angle and a testing method thereof. And designing the working state of the echelle grating in the tester according to the echelle grating conical surface diffraction theory. The light path structure can realize the measurement of the diffraction efficiency of the echelle grating with different structure sizes and different technical parameters. Meanwhile, the offset angle of the diffraction efficiency tester is adjusted according to the working state of the echelle grating provided by a user, so that the diffraction efficiency of the echelle grating in the real working state is measured.
The design idea of the invention is to design a double-layer rotating platform for placing the echelle grating according to the echelle grating conical surface diffraction theory and by combining the working state of the echelle grating in a spectrometer, change the bias angle of the echelle grating and adjust the wavelength range by rotating the double-layer rotating platform, and realize the measurement of the diffraction efficiency of the echelle grating in the working state.
In order to achieve the purpose, the invention provides the following technical scheme:
the invention provides a light path structure of an echelle grating diffraction efficiency tester with an adjustable offset angle, which comprises a light source 1, a preposed light path 2, a measuring light path 3 and a detection system 4, wherein the light source 1 is used for providing continuous test wavelength for measuring the diffraction efficiency of the echelle grating, the preposed light path 2 splits light emitted by the light source 1 and is used for providing monochromatic light for measuring the diffraction efficiency of the echelle grating, the measuring light path 3 is used for realizing the measurement of the diffraction efficiency of the echelle grating, and the detection system 4 is used for receiving a photoelectric signal emitted from the measuring light path 3.
The measuring light path 3 comprises a middle slit 5, a collimating mirror 6, an element to be measured, a focusing mirror module 10 and an emergent slit 11 according to the sequence of the propagation track of the light beam.
The element to be measured is arranged in the light path through a double-layer rotating platform 7, and the element to be measured is a echelle grating 8 or a reference reflector 9 to be measured.
The double-layer rotating platform 7 comprises an upper rotating platform and a lower rotating platform, the lower rotating platform realizes the setting of different offset angles of the echelle grating 8 to be tested through rotation, and the upper rotating platform realizes the scanning of different test wavelength ranges of the echelle grating 8.
The focusing lens module 10 is provided with a graduated scale 12, the scales of the graduated scale 12 are arranged according to the offset angle of the echelle grating 8 to be measured, and the focusing lens module 10 is arranged on the scale position of the graduated scale 12 corresponding to the offset angle.
The adjustable range of the bias angle of the echelle grating 8 to be measured is 3-10 degrees.
The light source 1 is a deuterium lamp or a tungsten lamp.
The echelle grating 8 and the reference reflector 9 are provided with corresponding to-be-measured element clamps respectively.
The preposed light path 2 adopts a C-T horizontal scanning raster monochromator, a cross scanning raster monochromator or a prism scanning monochromator.
Selecting a corresponding focusing mirror module 10 according to the basic parameters and the test bias angle of the echelle grating 8 to be tested; the basic parameters include reticle density and blaze angle.
The focusing mirror module 10 includes a plurality of switchable focusing mirrors, and can select a desired focusing mirror according to different offset angles.
The invention provides a method for measuring the diffraction efficiency of an echelle grating by using a light path structure, which comprises the following steps:
1) selecting and setting the focusing mirror module 10:
installing the echelle grating 8 to be tested on the double-layer rotating platform 7, and setting the test offset angle of the echelle grating 8 to be tested as a target offset angle of the echelle grating 8 to be tested in a working state by rotating the lower-layer rotating platform of the double-layer rotating platform 7; then, according to the basic parameters and the test offset angle of the echelle grating 8 to be tested, selecting a corresponding focusing mirror module 10 and placing the focusing mirror module on a position of the graduated scale 12 corresponding to the test offset angle; the basic parameters comprise reticle density and blaze angle;
2) and (3) testing the diffraction light flux of the echelle grating 8 in the sample to be tested:
according to the test wavelength emitted by the light source 1, the preposed light path 2 provides monochromatic light with corresponding wavelength, diffracted light with different wavelengths of the echelle grating 8 to be tested is irradiated onto the focusing mirror module 10 through the rotation of the upper layer rotating platform of the double-layer rotating platform 7, the focusing mirror module 10 focuses the light beam to the position of the emergent slit 11, and the detection system 4 collects diffracted light fluxes of different diffraction orders and different free spectral regions of the echelle grating 8 to be tested;
3) test of the light flux reflected by the reference mirror 9:
detaching the echelle grating 8 from the double-layer rotating platform 7, and fixing the reference reflector 9 on the double-layer rotating platform 7;
consistent with the step 2), according to the test wavelength, the front light path 2 provides monochromatic light with corresponding wavelength, reflected light with different wavelengths of the reference reflector 9 is irradiated onto the focusing mirror module 10 through the rotation of the upper layer rotating platform of the double-layer rotating platform 7, the focusing mirror module 10 focuses the light beam to the exit slit 11, and the detection system 4 collects the reflected light flux with different wavelengths of the reference reflector 9;
4) comparing the diffraction light flux of the step 2) with the reflection light flux of the step 3), obtaining the diffraction efficiency of the echelle grating 8 to be measured, and drawing a curve of the diffraction efficiency with respect to the wavelength.
Compared with the prior art, the invention has the beneficial effects that:
according to the working state of the echelle grating to be measured in the spectrometer, the setting of the bias angle of the echelle grating to be measured and the scanning of the wavelength to be measured are realized by utilizing the double-layer rotating platform, and the collection of diffraction light flux and reflection light flux is realized by selecting a proper focusing mirror module, so that the test of the diffraction efficiency of the echelle grating in the real working state is realized, and the energy transmission performance of the echelle grating in the spectrometer can be more accurately evaluated.
Drawings
FIG. 1 is a schematic structural diagram of an optical path structure of a echelle grating diffraction efficiency tester with an adjustable offset angle according to the present invention;
fig. 2 is a schematic diagram of the position of the focusing mirror module 10 on the graduated scale 12 under different offset angles of the echelle grating;
FIG. 3 is a comparison graph of an energy transmission capability simulation curve in an operating state of a spectrometer and a diffraction efficiency simulation curve tested by an efficiency tester under different bias angles.
Wherein the reference numerals are:
1 light source
2 front light path
3 measuring light path
4 detection system
5 middle slit
6 collimating mirror
7 double-layer rotating platform
8 echelle grating to be measured
9 reference mirror
10 focusing mirror module
11 exit slit
12 graduation ruler
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings.
The light path structure of the echelle grating diffraction efficiency tester with the adjustable offset angle comprises a light source 1, a preposed light path 2, a measuring light path 3 and a detection system 4.
The light source 1 provides continuous testing wavelength for the measurement of the diffraction efficiency of the echelle grating, the preposed light path 2 splits the light emitted by the light source 1 to provide monochromatic light for the measurement of the diffraction efficiency of the echelle grating, the measuring light path 3 is used for realizing the measurement of the diffraction efficiency of the echelle grating, and the detection system 4 is used for receiving a photoelectric signal emitted from the measuring light path 3.
The measuring light path 3 comprises a middle slit 5, a collimating mirror 6, an element to be measured, a focusing mirror module 10 and an emergent slit 11 according to the sequence of the propagation track of the light beam.
The element to be measured is arranged in the light path through a double-layer rotating platform 7, and the element to be measured is a echelle grating 8 or a reference reflector 9 to be measured.
The double-layer rotating platform 7 comprises an upper rotating platform and a lower rotating platform, the lower rotating platform realizes the setting of an 8-step grating offset angle to be tested, and the upper rotating platform realizes the scanning of the 8-step grating test wavelength range.
The focusing lens module 10 is provided with a graduated scale 12, the scales of the graduated scale 12 are arranged according to the offset angle of the echelle grating 8 to be measured, and the focusing lens module 10 is arranged on the scale position of the graduated scale 12 corresponding to the offset angle.
The adjustable range of the bias angle of the echelle grating 8 to be measured is 3-10 degrees, and the echelle grating can adapt to the working state of most echelle gratings.
The echelle grating 8 and the reference mirror 9 have corresponding element holders to be measured.
The prepositive light path 2 for providing monochromatic light for testing adopts a scanning monochromator, and can select a C-T horizontal scanning raster monochromator, a cross scanning raster monochromator or a prism scanning monochromator and the like according to requirements.
The focusing mirror module 10 is designed with various focusing mirrors for different bias angles of the echelle grating 8 to be tested, and can be directly replaced according to the test requirements.
The invention is implemented according to a schematic structural diagram. As shown in fig. 1, a suitable light source is selected according to the test wavelength range. In the invention, a deuterium lamp is selected for testing the wavelength of 190nm-400nm, a tungsten lamp is selected for testing the wavelength of 400nm-2500 nm. As shown in fig. 2, when the offset angle of the echelle grating 8 to be measured is 3 °, the focusing mirror module 10 should be placed at the position corresponding to 3 ° marked by the graduated scale 12; when the offset angle of the echelle grating 8 to be measured is 4 degrees, the focusing mirror module 10 should be placed at the position corresponding to 4 degrees marked by the scale 12; when the offset angle of the echelle grating 8 to be measured is 5 degrees, the focusing mirror module 10 should be placed at the position corresponding to 5 degrees marked by the scale 12, and so on … …, and when the offset angle of the echelle grating 8 to be measured is 10 degrees, the focusing mirror module 10 should be placed at the position corresponding to 10 degrees marked by the scale 12. The graduated scale 12 only marks the positions corresponding to the offset angles of 3-10 degrees at intervals of 1 degree, but is not limited to the range and can be divided into smaller parts according to requirements. When the offset angle is a number between integers, it can be rounded off, and the diffraction efficiency measurement is made from the approximate offset angle.
The measurement of the diffraction efficiency of the echelle grating 8 to be measured is implemented by the following steps:
the method comprises the following steps that firstly, the echelle grating 8 to be tested is installed on a double-layer rotating platform 7, and a lower-layer rotating platform of the double-layer rotating platform 7 is rotated to set a test offset angle of the echelle grating 8 to be tested as a target offset angle of the echelle grating 8 to be tested in a working state; then, according to the basic parameters and the test offset angle of the echelle grating 8 to be tested, selecting a corresponding focusing mirror module 10 and placing the focusing mirror module on a position of the graduated scale 12 corresponding to the test offset angle; the basic parameters include reticle density and blaze angle.
And a second step of testing the diffraction light flux of the echelle grating 8 in the sample to be tested.
Light emitted by the light source 1 is split by the preposed light path 2 and enters the measuring light path 3 through the middle slit 5, and light beams irradiate on the collimating mirror 6 through the middle slit 5 and irradiate on the echelle grating 8 to be measured after being reflected by the collimating mirror 6.
According to the test wavelength emitted by the light source 1, the preposed light path 2 provides monochromatic light with corresponding wavelength, diffracted light with different wavelengths of the echelle grating 8 to be tested is irradiated onto the focusing mirror module 10 through the rotation of the upper layer rotating platform of the double-layer rotating platform 7, the focusing mirror module 10 focuses the light beam to the position of the emergent slit 11, and the detection system 4 collects diffracted light fluxes of different diffraction orders and different free spectral regions of the echelle grating 8 to be tested;
in a third step, reference is made to the measurement of the light flux reflected by the mirror 9.
The echelle grating 8 is detached from the double-layer rotating platform 7, and the reference reflector 9 is fixed on the double-layer rotating platform 7.
In accordance with the second step, according to the test wavelength, the front light path 2 provides monochromatic light with corresponding wavelength, reflected light with different wavelengths of the reference reflector 9 is irradiated onto the focusing mirror module 10 through the rotation of the upper layer rotating platform of the double-layer rotating platform 7, the focusing mirror module 10 focuses the light beam to the exit slit 11, and the detection system 4 collects the reflected light flux with different wavelengths of the reference reflector 9;
and a fourth step of comparing the diffracted light flux of the second step with the reflected light flux of the third step to obtain a diffraction efficiency curve of the echelle grating 8 to be tested about the test wavelength.
Examples
The invention only uses the parameters of the echelle grating to be tested in the embodiment to explain the importance of the diffraction efficiency of the echelle grating in the working state in the test.
The basic parameters of the echelle grating to be measured in the embodiment are as follows: the reticle density is 54.49l/mm, the blaze angle is 46 degrees, and the wavelength ranges under the conditions that the diffraction order of the echelle grating to be measured is fixed and the offset angle is changed are respectively calculated, as shown in table 1.
TABLE 1
The ultimate goal of testing diffraction efficiency is to obtain a plot of efficiency versus wavelength. As can be seen from Table 1, for a certain type of echelle grating to be measured, the basic parameters are fixed, the diffraction order is fixed, the offset angle is changed, and the corresponding wavelength range is greatly changed. As shown in fig. 3, the diffraction order of the echelle grating to be measured is 60, if the offset angle of the efficiency tester is 3 °, the efficiency peak value corresponds to a wavelength of 439.44nm, the efficiency values of other wavelengths within the scanning wavelength range are decreased from 439.44nm to both sides of the short wavelength and the short wavelength, and the efficiency value at 435.78nm is greatly lower than the efficiency peak value; if the bias angle of the working state of the echelle grating to be measured is 8 degrees, the wavelength corresponding to the efficiency peak is 435.76nm, the energy transmission performance of the spectrometer at 435.76nm is not the diffraction efficiency value obtained by the efficiency tester, i.e. the difference between the wavelengths corresponding to the peak of the diffraction efficiency is larger under the condition that the simulation curve of the diffraction efficiency is at different bias angles, so the diffraction efficiency corresponding to the wavelength given by the efficiency tester cannot reflect the energy transmission performance of the echelle grating to be measured at the working state of the spectrometer, and therefore the method of the invention is needed to be used for measuring the diffraction efficiency of the echelle grating to be measured 8.
Claims (8)
1. The utility model provides an optical path structure of adjustable echelle grating relative diffraction efficiency tester of bias angle, includes light source (1), leading light path (2), measures light path (3) and detecting system (4), light source (1) are used for providing continuous test wavelength for the measurement of echelle grating diffraction efficiency, leading light path (2) are split the light that light source (1) sent for the measurement for echelle grating diffraction efficiency provides monochromatic light, measure light path (3) and be used for realizing the measurement of echelle grating diffraction efficiency, detecting system (4) are used for receiving the photoelectric signal from measuring light path (3) outgoing, its characterized in that:
the measuring light path (3) comprises a middle slit (5), a collimating lens (6), an element to be measured, a focusing lens module (10) and an emergent slit (11) according to the sequence of the propagation track of the light beam;
the element to be measured is arranged in the light path through a double-layer rotating platform (7), and the element to be measured is an echelle grating (8) to be measured or a reference reflector (9);
the double-layer rotating platform (7) comprises an upper layer rotating platform and a lower layer rotating platform, the lower layer rotating platform realizes the setting of different offset angles of the echelle grating (8) to be tested through rotation, and the upper layer rotating platform realizes the scanning of the echelle grating (8) in different test wavelength ranges;
focus on mirror module (10) department and be provided with scale (12), the scale of scale (12) sets up according to the bias angle that awaits measuring echelle grating (8), focus on mirror module (10) and set up on the scale position of scale (12) corresponding with the bias angle.
2. The optical path structure of the bias angle adjustable echelle grating relative diffraction efficiency tester as claimed in claim 1, wherein: the adjustable range of the bias angle of the echelle grating (8) to be measured is 3-10 degrees.
3. The optical path structure of the bias angle adjustable echelle grating relative diffraction efficiency tester as claimed in claim 1, wherein: the light source (1) is a deuterium lamp or a tungsten lamp.
4. The optical path structure of the bias angle adjustable echelle grating relative diffraction efficiency tester as claimed in claim 1, wherein: the echelle grating (8) and the reference reflector (9) are provided with corresponding to-be-detected element clamps respectively.
5. The optical path structure of the bias angle adjustable echelle grating relative diffraction efficiency tester as claimed in claim 1, wherein: the preposed light path (2) adopts a C-T horizontal scanning raster monochromator, a cross scanning raster monochromator or a prism scanning monochromator.
6. The optical path structure of the bias angle adjustable echelle grating relative diffraction efficiency tester as claimed in claim 1, wherein: selecting a corresponding focusing mirror module (10) according to the basic parameters and the test bias angle of the echelle grating (8) to be tested; the basic parameters include reticle density and blaze angle.
7. The optical path structure of the bias angle adjustable echelle grating relative diffraction efficiency tester as claimed in claim 1, wherein: the focusing mirror module (10) comprises a plurality of switchable focusing mirrors, and the required focusing mirror can be selected according to different offset angles.
8. A method for measuring relative diffraction efficiency of an echelle grating using the optical path structure of claim 1, characterized in that: the method comprises the following steps:
1) selecting and setting a focusing mirror module (10):
installing the echelle grating (8) to be tested on a double-layer rotating platform (7), and setting a test offset angle of the echelle grating (8) to be tested as a target offset angle of the echelle grating (8) to be tested in a working state by rotating a lower-layer rotating platform of the double-layer rotating platform (7); then, according to the basic parameters and the test offset angle of the echelle grating (8) to be tested, selecting a corresponding focusing mirror module (10) and placing the focusing mirror module at the position of the graduated scale (12) corresponding to the test offset angle; the basic parameters comprise reticle density and blaze angle;
2) and (3) testing the diffraction light flux of the echelle grating (8) in the sample to be tested:
according to the test wavelength emitted by the light source (1), the preposed light path (2) provides monochromatic light with corresponding wavelength, diffracted light with different wavelengths of the echelle grating (8) to be tested is irradiated onto the focusing mirror module (10) through the rotation of the upper layer rotating platform of the double-layer rotating platform (7), the focusing mirror module (10) focuses the light beam to the position of the emergent slit (11), and the detection system (4) collects diffracted light fluxes of different diffraction orders and different free spectral regions of the echelle grating (8) to be tested;
3) measurement of the light flux reflected by the reference mirror (9):
the echelle grating (8) is detached from the double-layer rotating platform (7), and the reference reflector (9) is fixed on the double-layer rotating platform (7);
consistent with the step 2), according to the test wavelength, the preposed light path (2) provides monochromatic light with corresponding wavelength, reflected light with different wavelengths of the reference reflector (9) is irradiated onto the focusing mirror module (10) through the rotation of the upper layer rotating platform of the double-layer rotating platform (7), the focusing mirror module (10) focuses the light beam to the position of the emergent slit (11), and the detection system (4) collects the reflected light flux with different wavelengths of the reference reflector (9);
4) comparing the diffraction light flux of the step 2) with the reflection light flux of the step 3), obtaining the diffraction efficiency of the echelle grating (8) to be measured, and drawing a curve of the diffraction efficiency with respect to the wavelength.
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| CN113566961B (en) * | 2021-07-12 | 2023-10-13 | 钢研纳克检测技术股份有限公司 | Echelle grating small-sized fixing device and posture adjustment method |
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| CN101701867B (en) * | 2009-11-13 | 2011-01-05 | 中国科学院光电技术研究所 | Grating diffraction efficiency tester keeping invariable incident angle |
| CN101957257B (en) * | 2010-09-10 | 2012-04-11 | 中国科学院长春光学精密机械与物理研究所 | Measurement method of diffraction efficiency of concave grating |
| CN102226716A (en) * | 2011-03-28 | 2011-10-26 | 中国科学院长春光学精密机械与物理研究所 | Light path structure of echelle grating spectrometer |
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