CN109269771A - The light channel structure and test method of offset angle is adjustable echelle grating efficiency tester - Google Patents
The light channel structure and test method of offset angle is adjustable echelle grating efficiency tester Download PDFInfo
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Abstract
The present invention relates to a kind of light channel structures of the adjustable echelle grating diffraction efficiency tester of offset angle.The light channel structure includes light source, preposition optical path, optical path and detection system；Optical path includes middle slit, collimating mirror, element under test, focus lamp module and exit slit by the propagation trajectories sequence of light beam；Element under test in the optical path, realizes the setting of echelle grating difference offset angle to be measured and the scanning of echelle grating difference test wavelength range by Double layer rotating stage+module；Graduated scale is provided at focus lamp module, the scale of the graduated scale is arranged according to the offset angle of echelle grating to be measured, and focus lamp module is arranged on the graduation position of graduated scale corresponding with offset angle.The present invention realizes the test of diffraction efficiency under echelle grating real work state, can more accurately evaluate energy transmission performance of the echelle grating in spectrometer.
Description
Technical field
The invention belongs to Optical System Design, technical field of optical instrument, in particular to a kind of adjustable scala media of offset angle
The light channel structure and test method of terraced grating diffraction efficiency tester.
Background technique
Echelle spectrometer is by excellent performances such as its high spectral resolution, wide spectrum, full spectrum direct-reading in the modern times
It is used widely in spectral instrument.For echelle grating as the key element in spectrometer, diffraction efficiency is that its is most important
One of parameter plays conclusive effect to the performance of echelle spectrometer.Diffraction efficiency be divided into absolute diffraction efficiency and
Relative diffraction.In actual measurement, diffraction efficiency is commonly referred to as relative diffraction, i.e. detector receives given
The diffraction luminous flux of diffraction time and wavelength and the ratio between the reflection flux of reference mirror received.Unless otherwise noted,
The diffraction efficiency mentioned hereinafter is relative diffraction.
In order to more accurately measure working condition and energy transmission effect of the echelle grating in spectral instrument, having must
Diffraction efficiency of the echelle grating under its working condition is measured.However, what echelle grating production firm provided
Diffraction efficiency curve can not accurately reflect the performance level under echelle grating working condition, this is for echelle grating light
The design of spectrometer and the limitation certain using generation.In the prior art, Chinese invention patent application No.201810032110.4 is public
It has opened a kind of ' the straight echelle grating diffraction efficiency test device of autocollimatic ', which is only capable of test echelle grating in auto-collimation
The relative diffraction of each diffraction time central wavelength under state, can not assess echelle grating under spectral instrument time of day
Power transmission capabilities.
Summary of the invention
The object of the present invention is to provide a kind of light channel structures of the adjustable echelle grating diffraction efficiency tester of offset angle
And its test method.It is theoretical according to echelle grating conical diffraction mounting, design working condition of the echelle grating in tester.It should
Light channel structure can realize the measurement of different structure size, the echelle grating diffraction efficiency of different technical parameter.Meanwhile according to
The working condition for the echelle grating that family provides adjusts the angle of eccentricity of diffraction efficiency tester, realizes that echelle grating is true
The measurement of diffraction efficiency under working condition.
Design philosophy of the invention is according to echelle grating conical diffraction mounting theory, in conjunction with echelle grating in spectrometer
Working condition, design places the Double layer rotating platform of echelle grating, by the rotation of Double layer rotating platform realize in ladder
The measurement of the diffraction efficiency under echelle grating working condition is realized in the change of grating offset angle and the adjusting of wave-length coverage.
To achieve the goals above, the present invention provides the following technical scheme that
The present invention provides a kind of light channel structure of adjustable echelle grating diffraction efficiency tester of offset angle, including light source 1,
Preposition optical path 2, optical path 3 and detection system 4, the light source 1 are used to provide company for the measurement of echelle grating diffraction efficiency
Continuous test wavelength, the light that the preposition optical path 2 issues light source 1 are divided, for for echelle grating diffraction efficiency
Measurement provides monochromatic light, measurement of the optical path 3 for realizing echelle grating diffraction efficiency, the use of detection system 4
In the photosignal that reception is emitted from optical path 3.
The optical path 3 includes middle slit 5, collimating mirror 6, element under test, focusing by the propagation trajectories sequence of light beam
Mirror module 10 and exit slit 11.
The element under test by Double layer rotating platform 7 install in the optical path, element under test be echelle grating 8 to be measured or
Reference mirror 9.
The Double layer rotating platform 7 include upper layer turntable and lower layer's turntable, lower layer's turntable by rotation realize to
The setting of the different offset angles of echelle grating 8 is surveyed, upper layer turntable realizes sweeping for the different test wavelength ranges of echelle grating 8
It retouches.
Graduated scale 12 is provided at the focus lamp module 10, the scale of the graduated scale 12 is according to middle ladder to be measured
The offset angle of grating 8 is arranged, and the graduation position of graduated scale 12 corresponding with offset angle is arranged in the focus lamp module 10
On.
The adjustable extent of the offset angle of the echelle grating to be measured 8 is 3 °~10 °.
The light source 1 is deuterium lamp or tungsten lamp.
The echelle grating 8 and reference mirror 9 have corresponding element under test fixture.
The preposition optical path 2 is using C-T horizontal sweep grating monochromator, chiasma type raster monochromator or prism scanning
Monochromator.
According to the basic parameter of echelle grating 8 to be measured and test offset angle, corresponding focus lamp module 10 is selected；It is described
Basic parameter includes incisure density and blaze angle.
The focus lamp module 10 includes convertible a variety of focus lamps, is focused needed for capable of being selected according to different offset angles
Mirror.
The present invention provides a kind of measurement method of echelle grating diffraction efficiency using the light channel structure, the side
Method includes the following steps:
1) it selects and focus lamp module 10 is set:
Echelle grating 8 to be measured is mounted on Double layer rotating platform 7, the lower layer by rotating Double layer rotating platform 7 revolves
Turntable sets the test offset angle of echelle grating 8 to be measured at the target bias angle under 8 working condition of echelle grating to be measured；
Then, according to by the basic parameter of echelle grating 8 to be measured and test offset angle, corresponding focus lamp module 10 is selected, is placed
On graduated scale 12 and test offset angle corresponding position；The basic parameter includes incisure density and blaze angle；
2) test of 8 diffraction luminous flux of sample to be tested echelle grating:
According to the test wavelength that light source 1 issues, preposition optical path 2 provides the monochromatic light of corresponding wavelength, flat by Double layer rotating
The diffraction light of the different wave length of echelle grating 8 to be measured is irradiated in focus lamp module 10 by the rotation of the upper layer turntable of platform 7,
Focus lamp module 10 focuses to light beam at exit slit 11, and detection system 4 acquires the different diffraction times of echelle grating 8 to be measured
The diffraction luminous flux of different free spectral ranges；
3) test of 9 reflection flux of reference mirror:
Echelle grating 8 is disassembled from Double layer rotating platform 7, reference mirror 9 is fixed on Double layer rotating and is put down
On platform 7；
Consistent with step 2, according to test wavelength, preposition optical path 2 provides the monochromatic light of corresponding wavelength, passes through Double layer rotating
The reflected light of the different wave length of reference mirror 9 is irradiated in focus lamp module 10 by the rotation of the upper layer turntable of platform 7, is gathered
Burnt mirror module 10 focuses to light beam at exit slit 11, and the reflected light that detection system 4 acquires 9 different wave length of reference mirror is logical
Amount；
4) by the diffraction luminous flux of step 2) compared with step 3) reflection flux, spreading out for echelle grating 8 to be measured is obtained
Efficiency is penetrated, curve of the diffraction efficiency about wavelength is drawn.
Compared with prior art, the beneficial effects of the present invention are:
Working condition of the present invention according to echelle grating to be measured in spectrometer is realized to be measured using Double layer rotating platform
The setting of echelle grating offset angle and the scanning of wavelength to be measured select suitable focus lamp module to realize diffraction luminous flux and anti-
The acquisition of irradiating luminous flux, thus realize the test of diffraction efficiency under echelle grating real work state, it can more accurately
Evaluate energy transmission performance of the echelle grating in spectrometer.
Detailed description of the invention
Fig. 1 is the structural representation of the light channel structure of the adjustable echelle grating diffraction efficiency tester of offset angle of the present invention
Figure；
Fig. 2 is position signal of the focus lamp module 10 on graduated scale 12 in the case of echelle grating difference angle of eccentricity
Figure；
Fig. 3 is spectrometer in the case where different offset angles, and working condition power transmission capabilities simulation curve and efficiency are surveyed
Try the comparison diagram of instrument test diffraction efficiency simulation curve.
Appended drawing reference therein are as follows:
1 light source
2 preposition optical paths
3 optical paths
4 detection systems
5 middle slits
6 collimating mirrors
7 Double layer rotating platforms
8 echelle grating to be measured
9 reference mirrors
10 focus lamp modules
11 exit slits
12 graduated scales
Specific embodiment
The present invention is described in further details with reference to the accompanying drawing.
The light channel structure of the adjustable echelle grating diffraction efficiency tester of offset angle of the present invention includes light source 1, preposition light
Road 2, optical path 3, detection system 4.
Wherein, light source 1 provides continuously test wavelength, 2 pairs of light of preposition optical path for the measurement of echelle grating diffraction efficiency
The light that source 1 issues is divided, and provides monochromatic light for the measurement of echelle grating diffraction efficiency, optical path 3 is for realizing in
The measurement of echelon diffraction efficiency, detection system 4 are used to receive the photosignal being emitted from optical path 3.
The optical path 3 includes middle slit 5, collimating mirror 6, element under test, focusing by the propagation trajectories sequence of light beam
Mirror module 10 and exit slit 11.
The element under test by Double layer rotating platform 7 install in the optical path, element under test be echelle grating 8 to be measured or
Reference mirror 9.
The Double layer rotating platform 7 includes upper layer turntable and lower layer's turntable, and lower layer's turntable realizes middle ladder to be measured
The setting of 8 offset angle of grating, upper layer turntable realize the scanning of 8 test wavelength range of echelle grating.
Graduated scale 12 is provided at the focus lamp module 10, the scale of the graduated scale 12 is according to middle ladder to be measured
The offset angle of grating 8 is arranged, and the graduation position of graduated scale 12 corresponding with offset angle is arranged in the focus lamp module 10
On.
The adjustable extent of the offset angle of the echelle grating to be measured 8 is 3 °~10 °, can adapt to ladder in the overwhelming majority
The working condition of grating.
Echelle grating 8 and reference mirror 9 have corresponding element under test fixture.
Monochromatic preposition optical path 2 is provided using scanning monochromator for test, can according to need selection C-T horizontal sweep
Grating monochromator, chiasma type raster monochromator or prism scanning monochromator etc..
Focus lamp module 10 is that the different offset angles of echelle grating 8 to be measured design a variety of focus lamps, can according to testing requirement
Directly replace.
The present invention is implemented according to structural schematic diagram.As shown in Figure 1, selecting suitable light source according to test wavelength range.This
In invention, test wavelength 190nm-400nm selects deuterium lamp, and test wavelength 400nm-2500nm selects tungsten lamp.As shown in Fig. 2,
The offset angle of echelle grating 8 to be measured be 3 ° when, focus lamp module 10 should be placed on graduated scale 12 label 3 ° it is corresponding
On position；When the offset angle of echelle grating 8 to be measured is 4 °, focus lamp module 10 should be placed on 4 ° of the label of graduated scale 12
On corresponding position；When the offset angle of echelle grating 8 to be measured is 5 °, focus lamp module 10 should be placed on the mark of graduated scale 12
On 5 ° of corresponding positions of note, and so on ..., when the offset angle of echelle grating 8 to be measured is 10 °, focus lamp module 10 is answered
This is placed on 10 ° of corresponding positions of the label of graduated scale 12.Between graduated scale 12 is only labelled between 3 °~10 ° of offset angle
Every 1 ° of corresponding position, but it is not limited only to this range, can divided according to demand thinner.When number of the angle of eccentricity between integer
It when value, can round up, the measurement of diffraction efficiency is carried out according to approximate angle of eccentricity.
The measurement of the diffraction efficiency of present invention echelle grating 8 to be measured is implemented as follows:
Echelle grating 8 to be measured is mounted on Double layer rotating platform 7 by first step, by rotating Double layer rotating platform 7
Lower layer's turntable set the test offset angle of echelle grating 8 to be measured in the mesh under 8 working condition of echelle grating to be measured
Mark offset angle；Then, according to by the basic parameter of echelle grating 8 to be measured and test offset angle, corresponding focus lamp mould is selected
Block 10 is placed on graduated scale 12 and test offset angle corresponding position；The basic parameter includes incisure density and blaze angle.
Second step, the test of 8 diffraction luminous flux of sample to be tested echelle grating.
The light that light source 1 issues enters optical path 3 after the light splitting of preposition optical path 2, through middle slit 5, and light beam is through centre
Slit 5 is irradiated on collimating mirror 6, and collimated mirror 6 is irradiated in echelle grating 8 to be measured after reflecting.
According to the test wavelength that light source 1 issues, preposition optical path 2 provides the monochromatic light of corresponding wavelength, flat by Double layer rotating
The diffraction light of the different wave length of echelle grating 8 to be measured is irradiated in focus lamp module 10 by the rotation of the upper layer turntable of platform 7,
Focus lamp module 10 focuses to light beam at exit slit 11, and detection system 4 acquires the different diffraction times of echelle grating 8 to be measured
The diffraction luminous flux of different free spectral ranges；
Third step, the test of 9 reflection flux of reference mirror.
Echelle grating 8 is disassembled from Double layer rotating platform 7, reference mirror 9 is fixed on Double layer rotating and is put down
On platform 7.
Consistent with second step, according to test wavelength, preposition optical path 2 provides the monochromatic light of corresponding wavelength, is revolved by bilayer
The reflected light of the different wave length of reference mirror 9 is irradiated in focus lamp module 10 by the rotation for turning the upper layer turntable of platform 7,
Focus lamp module 10 focuses to light beam at exit slit 11, and detection system 4 acquires the reflected light of 9 different wave length of reference mirror
Flux；
Four steps obtains scala media to be measured by the diffraction luminous flux of second step compared with third step reflection flux
Diffraction efficiency curve of the terraced grating 8 about test wavelength.
Embodiment
The present invention, which is only tested under echelle grating working condition with the parameter declaration of echelle grating to be measured in embodiment, to spread out
Penetrate the importance of efficiency.
The basic parameter of embodiment echelle grating to be measured: incisure density 54.49l/mm, blaze angle are 46 °, are counted respectively
The wave-length coverage in the case that such echelle grating diffraction time to be measured is fixed, offset angle changes is calculated, as shown in table 1.
Table 1
The final purpose of test diffraction efficiency is the curve for obtaining efficiency about wavelength.As can be seen from Table 1, for certain money
Echelle grating to be measured, basic parameter are fixed, and diffraction time is fixed, and change offset angle, corresponding wave-length coverage variation is very greatly.Such as
Shown in Fig. 3, the diffraction time of echelle grating to be measured is 60, if the offset angle of efficiency tester is 3 °, efficiency peak is corresponding
Wavelength is 439.44nm, and the efficiency value of other wavelength successively decreases from 439.44nm to long shortwave two sides within the scope of scanning wavelength,
Efficiency value at 435.78nm is significantly less than efficiency peak；And if the offset angle of echelle grating working condition to be measured is 8 °,
The corresponding wavelength of efficiency peak is then 435.76nm, and energy transmission performance of the spectrometer at 435.76nm is not efficiency tester
In the case where different offset angles, the peak value of diffraction efficiency is corresponding for obtained diffraction efficiency value, the i.e. simulation curve of diffraction efficiency
Wavelength difference is bigger, therefore the corresponding diffraction efficiency of wavelength that efficiency tester provides cannot reflect that echelle grating to be measured exists
Energy transmission performance under spectrometer working condition, it is therefore desirable to measure spreading out for echelle grating 8 to be measured using the method for the present invention
Penetrate efficiency.
Claims (8)
1. a kind of light channel structure of the adjustable echelle grating diffraction efficiency tester of offset angle, including light source (1), preposition optical path
(2), optical path (3) and detection system (4), the light source (1) are used to provide company for the measurement of echelle grating diffraction efficiency
Continuous test wavelength, the light that the preposition optical path (2) issues light source (1) are divided, for imitating for echelle grating diffraction
The measurement of rate provides monochromatic light, measurement of the optical path (3) for realizing echelle grating diffraction efficiency, the detection system
System (4) is used to receive the photosignal being emitted from optical path (3), it is characterised in that:
The optical path (3) by the propagation trajectories sequence of light beam includes middle slit (5), collimating mirror (6), element under test, poly-
Burnt mirror module (10) and exit slit (11)；
The element under test by Double layer rotating platform (7) install in the optical path, element under test be echelle grating to be measured (8) or
Reference mirror (9)；
The Double layer rotating platform (7) includes upper layer turntable and lower layer's turntable, and lower layer's turntable is realized to be measured by rotation
The setting of echelle grating (8) difference offset angle, upper layer turntable realize sweeping for echelle grating (8) different test wavelength ranges
It retouches；
It is provided with graduated scale (12) at the focus lamp module (10), the scale of the graduated scale (12) is according to scala media to be measured
The offset angle of terraced grating (8) is arranged, and the focus lamp module (10) is arranged in graduated scale (12) corresponding with offset angle
On graduation position.
2. the light channel structure of the adjustable echelle grating diffraction efficiency tester of offset angle according to claim 1, feature
Be: the adjustable extent of the offset angle of the echelle grating (8) to be measured is 3 °~10 °.
3. the light channel structure of the adjustable echelle grating diffraction efficiency tester of offset angle according to claim 1, feature
Be: the light source (1) is deuterium lamp or tungsten lamp.
4. the light channel structure of the adjustable echelle grating diffraction efficiency tester of offset angle according to claim 1, feature
Be: the echelle grating (8) and reference mirror (9) have corresponding element under test fixture.
5. the light channel structure of the adjustable echelle grating diffraction efficiency tester of offset angle according to claim 1, feature
Be: the preposition optical path (2) is using C-T horizontal sweep grating monochromator, chiasma type raster monochromator or prism scanning
Monochromator.
6. the light channel structure of the adjustable echelle grating diffraction efficiency tester of offset angle according to claim 1, feature
It is: according to the basic parameter of echelle grating to be measured (8) and test offset angle, selects corresponding focus lamp module (10)；Institute
Stating basic parameter includes incisure density and blaze angle.
7. the light channel structure of according to claim 1-offset angle is adjustable echelle grating diffraction efficiency tester, feature
Be: the focus lamp module (10) includes convertible a variety of focus lamps, is focused needed for capable of being selected according to different offset angles
Mirror.
8. a kind of measurement method of the echelle grating diffraction efficiency using light channel structure described in claim 1, feature exist
In: described method includes following steps:
1) it selects and focus lamp module (10) is set:
Echelle grating to be measured (8) is mounted on Double layer rotating platform (7), by the lower layer for rotating Double layer rotating platform (7)
Turntable sets the test offset angle of echelle grating to be measured (8) to the target under echelle grating to be measured (8) working condition
Offset angle；Then, according to by the basic parameter of echelle grating to be measured (8) and test offset angle, corresponding focus lamp mould is selected
Block (10) is placed on graduated scale (12) and test offset angle corresponding position；The basic parameter includes incisure density and sudden strain of a muscle
Credit angle；
2) test of sample to be tested echelle grating (8) diffraction luminous flux:
According to the test wavelength that light source 1 issues, preposition optical path (2) provides the monochromatic light of corresponding wavelength, passes through Double layer rotating platform
(7) diffraction light of the different wave length of echelle grating to be measured (8) is irradiated to focus lamp module by the rotation of upper layer turntable
(10) on, focus lamp module (10) focuses to light beam at exit slit (11), and detection system (4) acquires echelle grating to be measured
(8) the diffraction luminous flux of different diffraction time differences free spectral range；
3) test of reference mirror (9) reflection flux:
Echelle grating (8) is disassembled from Double layer rotating platform (7), reference mirror (9) is fixed on Double layer rotating
On platform (7)；
Consistent with step 2, according to test wavelength, preposition optical path (2) provides the monochromatic light of corresponding wavelength, flat by Double layer rotating
The reflected light of the different wave length of reference mirror (9) is irradiated to focus lamp module (10) by the rotation of the upper layer turntable of platform (7)
On, focus lamp module (10) focuses to light beam at exit slit (11), and it is different that detection system (4) acquires reference mirror (9)
The reflection flux of wavelength；
4) by the diffraction luminous flux of step 2) compared with step 3) reflection flux, the diffraction of echelle grating to be measured (8) is obtained
Efficiency draws curve of the diffraction efficiency about wavelength.
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Cited By (3)
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| CN113566961A (en) * | 2021-07-12 | 2021-10-29 | 钢研纳克检测技术股份有限公司 | Small fixing device for echelle grating and posture adjusting method |
| CN114646454A (en) * | 2020-12-21 | 2022-06-21 | 北京科益虹源光电技术有限公司 | Device and method for testing diffraction efficiency of echelle grating |
| CN115031925A (en) * | 2022-08-10 | 2022-09-09 | 歌尔光学科技有限公司 | Grating detection method, device and system and computer readable storage medium |
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| CN114646454A (en) * | 2020-12-21 | 2022-06-21 | 北京科益虹源光电技术有限公司 | Device and method for testing diffraction efficiency of echelle grating |
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| CN113566961B (en) * | 2021-07-12 | 2023-10-13 | 钢研纳克检测技术股份有限公司 | Echelle grating small-sized fixing device and posture adjustment method |
| CN115031925A (en) * | 2022-08-10 | 2022-09-09 | 歌尔光学科技有限公司 | Grating detection method, device and system and computer readable storage medium |
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| Publication number | Publication date |
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| CN109269771B (en) | 2021-02-12 |
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