CN109232001A - 一种提高陶瓷餐具坯体强度的烧制方法 - Google Patents

一种提高陶瓷餐具坯体强度的烧制方法 Download PDF

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CN109232001A
CN109232001A CN201811181732.XA CN201811181732A CN109232001A CN 109232001 A CN109232001 A CN 109232001A CN 201811181732 A CN201811181732 A CN 201811181732A CN 109232001 A CN109232001 A CN 109232001A
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姚永祥
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Abstract

本发明主要涉及陶瓷加工技术领域,公开了一种提高陶瓷餐具坯体强度的烧制方法,包括:初烧、喷雾处理、二次烧制、三次烧制、冷却;本发明提供的提高陶瓷餐具坯体强度的烧制方法,方法简单,得到的陶瓷餐具坯体强度高,表面光滑,耐磨性强,便于施釉,实用性强;将陶瓷餐具生坯置于窑内,先缓慢升温后进行烧制,使坯体内的水分缓慢挥发,避免坯体产生气泡,使坯体致密均匀,细腻光滑,显著提高坯体强度;初烧后向坯体外表面均匀喷雾表面处理液,填充坯体表面可能残留的缝隙,提高餐具的强度和耐磨性。

Description

一种提高陶瓷餐具坯体强度的烧制方法
技术领域
本发明主要涉及陶瓷加工技术领域,尤其涉及一种提高陶瓷餐具坯体强度的烧制方法。
背景技术
随着人们生活质量的提高和审美观点的改变,陶瓷餐具在生活中的使用越来越广泛,但是陶瓷餐具在使用过程中稍微碰撞就会出现裂痕和掉瓷,并且在长期的洗刷过程中会使碗内产生大量划痕,色泽加深,从而影响陶瓷餐具的使用,缩短陶瓷餐具的使用寿命;目前为了提高陶瓷餐具的强度都是在坯体的原料配比方面进行研究,还没有出现在坯体的烧制过程中进行改进的。
发明内容
为了弥补已有技术的缺陷,本发明的目的是提供一种提高陶瓷餐具坯体强度的烧制方法。
一种提高陶瓷餐具坯体强度的烧制方法,包括以下步骤:
(1)初烧:将陶瓷餐具生坯置于窑中,以0.4~0.8℃/min的速度升高温度至240~260℃,保温30~40min,自然冷却至50~70℃,得初烧坯体;
(2)喷雾处理:向初烧坯体外表面均匀喷雾表面处理液,喷雾量为1.1~1.3ml/cm2,静置60~90min,得喷雾处理坯体;
(3)二次烧制:将喷雾处理坯体以1.2~1.4℃/min的速度升高温度至510~530℃,保温50~60min,再以2.5~2.9℃/min的速度升高温度至680~720℃,保温20~30min,自然降温至310~350℃,得二次烧制坯体;
(4)三次烧制:将二次烧制坯体以4.1~4.5℃/min的速度升高温度至940~1020℃,保温30~40min,以1.2~1.4℃/min的速度降低温度至790~810℃,保温20~30min,得三次烧制坯体;
(5)冷却:将三次烧制坯体以3.4~3.6℃/min的速度降低温度至260~300℃,保温40~50min,再自然降至室温,得陶瓷餐具坯体。
所述步骤(2)的表面处理液,由以下重量份的原料组成:硫酸锌16~18、纳米二氧化硅10~12、过硼酸钠5~7、水400~500;所述表面处理液的制备方法,将纳米二氧化硅加入水中,于45~50℃、31~33kHz超声20~30min,再加入硫酸锌和过硼酸钠,升高温度至60~70℃,保温搅拌10~20min,自然降温,得表面处理液。
所述提高陶瓷餐具坯体强度的烧制方法制备得到的陶瓷餐具坯体。
本发明的优点是:本发明提供的提高陶瓷餐具坯体强度的烧制方法,方法简单,得到的陶瓷餐具坯体强度高,表面光滑,耐磨性强,便于施釉,实用性强;将陶瓷餐具生坯置于窑内,先缓慢升温后进行烧制,使坯体内的水分缓慢挥发,避免坯体产生气泡,使坯体致密均匀,细腻光滑,显著提高坯体强度;初烧后向坯体外表面均匀喷雾表面处理液,填充坯体表面可能残留的缝隙,提高餐具的强度和耐磨性;表面喷雾处理后再进行二次烧制,先缓慢升高温度再快速升高温度,使表面处理液能够渗入坯体表面并紧密结合,提高坯体的强度和光滑性,利于后期釉料与坯体结合紧密;二次烧制后再快速升温,使坯体充分玻化,提高餐具坯体的强度和细腻性,再缓慢降低温度,使坯体内部玻化均匀,提高坯体的强度耐磨性;最后进行快速降温,提高强度和耐候性,避免过高和过低温度使坯体发生裂痕。
具体实施方式
下面用具体实施例说明本发明。
实施例1
一种提高陶瓷餐具坯体强度的烧制方法,包括以下步骤:
(1)初烧:将陶瓷餐具生坯置于窑中,以0.4℃/min的速度升高温度至240℃,保温30min,自然冷却至50℃,得初烧坯体;
(2)喷雾处理:向初烧坯体外表面均匀喷雾表面处理液,喷雾量为1.1ml/cm2,静置60min,得喷雾处理坯体;所述的表面处理液,由以下重量份的原料组成:硫酸锌16、纳米二氧化硅10、过硼酸钠5、水400;所述表面处理液的制备方法,将纳米二氧化硅加入水中,于45℃、31kHz超声20min,再加入硫酸锌和过硼酸钠,升高温度至60℃,保温搅拌10min,自然降温,得表面处理液;
(3)二次烧制:将喷雾处理坯体以1.2℃/min的速度升高温度至510℃,保温50min,再以2.5℃/min的速度升高温度至680℃,保温20min,自然降温至310℃,得二次烧制坯体;
(4)三次烧制:将二次烧制坯体以4.1℃/min的速度升高温度至940℃,保温30min,以1.2℃/min的速度降低温度至790℃,保温20min,得三次烧制坯体;
(5)冷却:将三次烧制坯体以3.4℃/min的速度降低温度至260℃,保温40min,再自然降至室温,得陶瓷餐具坯体。
所述提高陶瓷餐具坯体强度的烧制方法制备得到的陶瓷餐具坯体。
实施例2
一种提高陶瓷餐具坯体强度的烧制方法,包括以下步骤:
(1)初烧:将陶瓷餐具生坯置于窑中,以0.6℃/min的速度升高温度至250℃,保温30~40min,自然冷却至60℃,得初烧坯体;
(2)喷雾处理:向初烧坯体外表面均匀喷雾表面处理液,喷雾量为1.2ml/cm2,静置75min,得喷雾处理坯体;所述的表面处理液,由以下重量份的原料组成:硫酸锌17、纳米二氧化硅11、过硼酸钠6、水450;所述表面处理液的制备方法,将纳米二氧化硅加入水中,于48℃、32kHz超声25min,再加入硫酸锌和过硼酸钠,升高温度至65℃,保温搅拌15min,自然降温,得表面处理液;
(3)二次烧制:将喷雾处理坯体以1.3℃/min的速度升高温度至520℃,保温55min,再以2.7℃/min的速度升高温度至700℃,保温25min,自然降温至330℃,得二次烧制坯体;
(4)三次烧制:将二次烧制坯体以4.3℃/min的速度升高温度至980℃,保温35min,以1.3℃/min的速度降低温度至800℃,保温25min,得三次烧制坯体;
(5)冷却:将三次烧制坯体以3.5℃/min的速度降低温度至280℃,保温45min,再自然降至室温,得陶瓷餐具坯体。
所述提高陶瓷餐具坯体强度的烧制方法制备得到的陶瓷餐具坯体。
实施例3
一种提高陶瓷餐具坯体强度的烧制方法,包括以下步骤:
(1)初烧:将陶瓷餐具生坯置于窑中,以0.8℃/min的速度升高温度至260℃,保温40min,自然冷却至70℃,得初烧坯体;
(2)喷雾处理:向初烧坯体外表面均匀喷雾表面处理液,喷雾量为1.3ml/cm2,静置90min,得喷雾处理坯体;所述的表面处理液,由以下重量份的原料组成:硫酸锌18、纳米二氧化硅12、过硼酸钠7、水500;所述表面处理液的制备方法,将纳米二氧化硅加入水中,于50℃、33kHz超声30min,再加入硫酸锌和过硼酸钠,升高温度至70℃,保温搅拌20min,自然降温,得表面处理液;
(3)二次烧制:将喷雾处理坯体以1.4℃/min的速度升高温度至530℃,保温60min,再以2.9℃/min的速度升高温度至720℃,保温30min,自然降温至350℃,得二次烧制坯体;
(4)三次烧制:将二次烧制坯体以4.5℃/min的速度升高温度至1020℃,保温40min,以1.4℃/min的速度降低温度至810℃,保温30min,得三次烧制坯体;
(5)冷却:将三次烧制坯体以3.6℃/min的速度降低温度至300℃,保温50min,再自然降至室温,得陶瓷餐具坯体。
所述提高陶瓷餐具坯体强度的烧制方法制备得到的陶瓷餐具坯体。
对比例1
去除步骤(1),其余方法,同实施例1。
对比例2
去除步骤(2)中的硫酸锌,其余方法,同实施例1。
对比例3
去除步骤(2)中的过硼酸钠,其余方法,同实施例1。
对比例4
去除步骤(3),其余方法,同实施例1。
对比例5
去除步骤(4),其余方法,同实施例1。
对比例6
去除步骤(5),其余方法,同实施例1。
实施例和对比例陶瓷餐具坯体的性能:
以专利文件CN 105272163 A公开的一种环保陶瓷砖生坯中的原料进行陶瓷餐具生坯的制备,制备完成后按照实施例和对比例的方法进行烧制,以专利文件CN 105272163 A公开的烧制方法作为对照组,烧制完成后,并以GB/T4100-2006为基准,将各组的瓷砖在MMS-1G高速销盘摩擦磨损实验机上进行摩擦磨损试验,记录磨损量,检测瓷砖的耐磨度,并检测针孔数及气泡数,每个试验重复3次,结果取平均值,实施例和对比例陶瓷餐具坯体的性能见表1。
表1:实施例和对比例陶瓷餐具坯体的性能
注:“—”表示未检出。
表1的结果表明,实施例的提高陶瓷餐具坯体强度的烧制方法,磨损量明显较对比例和对照组小,针孔数和气泡数明显较对比例和对照组少,说明本发明提供的提高陶瓷餐具坯体强度的烧制方法具有很好的烧制效果。

Claims (3)

1.一种提高陶瓷餐具坯体强度的烧制方法,其特征在于,包括以下步骤:
(1)初烧:将陶瓷餐具生坯置于窑中,以0.4~0.8℃/min的速度升高温度至240~260℃,保温30~40min,自然冷却至50~70℃,得初烧坯体;
(2)喷雾处理:向初烧坯体外表面均匀喷雾表面处理液,喷雾量为1.1~1.3ml/cm2,静置60~90min,得喷雾处理坯体;
(3)二次烧制:将喷雾处理坯体以1.2~1.4℃/min的速度升高温度至510~530℃,保温50~60min,再以2.5~2.9℃/min的速度升高温度至680~720℃,保温20~30min,自然降温至310~350℃,得二次烧制坯体;
(4)三次烧制:将二次烧制坯体以4.1~4.5℃/min的速度升高温度至940~1020℃,保温30~40min,以1.2~1.4℃/min的速度降低温度至790~810℃,保温20~30min,得三次烧制坯体;
(5)冷却:将三次烧制坯体以3.4~3.6℃/min的速度降低温度至260~300℃,保温40~50min,再自然降至室温,得陶瓷餐具坯体。
2.根据权利要求1所述提高陶瓷餐具坯体强度的烧制方法,其特征在于,所述步骤(2)的表面处理液,由以下重量份的原料组成:硫酸锌16~18、纳米二氧化硅10~12、过硼酸钠5~7、水400~500;所述表面处理液的制备方法,将纳米二氧化硅加入水中,于45~50℃、31~33kHz超声20~30min,再加入硫酸锌和过硼酸钠,升高温度至60~70℃,保温搅拌10~20min,自然降温,得表面处理液。
3.一种权利要求1或2所述提高陶瓷餐具坯体强度的烧制方法制备得到的陶瓷餐具坯体。
CN201811181732.XA 2018-10-11 2018-10-11 一种提高陶瓷餐具坯体强度的烧制方法 Active CN109232001B (zh)

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CN111548138A (zh) * 2020-04-27 2020-08-18 恩平市新锦成陶瓷有限公司 低温快烧釉面砖的烧成方法及低温快烧釉面砖

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CN111548138A (zh) * 2020-04-27 2020-08-18 恩平市新锦成陶瓷有限公司 低温快烧釉面砖的烧成方法及低温快烧釉面砖

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