CN109211741B - 光学测定装置以及光学测定方法 - Google Patents

光学测定装置以及光学测定方法 Download PDF

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Publication number
CN109211741B
CN109211741B CN201810708073.4A CN201810708073A CN109211741B CN 109211741 B CN109211741 B CN 109211741B CN 201810708073 A CN201810708073 A CN 201810708073A CN 109211741 B CN109211741 B CN 109211741B
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measurement
sample
optical
base
target position
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CN109211741A (zh
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泉谷悠介
若山育央
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Otsuka Electronics Co Ltd
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Otsuka Electronics Co Ltd
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N15/02—Investigating particle size or size distribution
    • G01N15/0205—Investigating particle size or size distribution by optical means
    • G01N15/0211—Investigating a scatter or diffraction pattern
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N15/02—Investigating particle size or size distribution
    • G01N15/0205—Investigating particle size or size distribution by optical means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N15/10—Investigating individual particles
    • G01N15/14—Optical investigation techniques, e.g. flow cytometry
    • G01N15/1434—Optical arrangements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/08—Measuring arrangements characterised by the use of optical techniques for measuring diameters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01—Arrangements or apparatus for facilitating the optical investigation
    • G01N21/03—Cuvette constructions
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N21/49—Scattering, i.e. diffuse reflection within a body or fluid
    • G01N21/51—Scattering, i.e. diffuse reflection within a body or fluid inside a container, e.g. in an ampoule
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N35/00—Automatic analysis not limited to methods or materials provided for in any single one of groups G01N1/00 - G01N33/00; Handling materials therefor
    • G01N35/02—Automatic analysis not limited to methods or materials provided for in any single one of groups G01N1/00 - G01N33/00; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations
    • G01N35/025—Automatic analysis not limited to methods or materials provided for in any single one of groups G01N1/00 - G01N33/00; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations having a carousel or turntable for reaction cells or cuvettes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N2015/03—Electro-optical investigation of a plurality of particles, the analyser being characterised by the optical arrangement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N15/10—Investigating individual particles
    • G01N15/14—Optical investigation techniques, e.g. flow cytometry
    • G01N2015/1493—Particle size
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01—Arrangements or apparatus for facilitating the optical investigation
    • G01N2021/0106—General arrangement of respective parts
    • G01N2021/015—Apparatus with interchangeable optical heads or interchangeable block of optics and detector
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N21/49—Scattering, i.e. diffuse reflection within a body or fluid
    • G01N21/53—Scattering, i.e. diffuse reflection within a body or fluid within a flowing fluid, e.g. smoke
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/02—Mechanical
    • G01N2201/024—Modular construction
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/02—Mechanical
    • G01N2201/024—Modular construction
    • G01N2201/0245—Modular construction with insertable-removable part

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  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Dispersion Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
CN201810708073.4A 2017-07-05 2018-07-02 光学测定装置以及光学测定方法 Active CN109211741B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017132206A JP6961406B2 (ja) 2017-07-05 2017-07-05 光学測定装置および光学測定方法
JP2017-132206 2017-07-05

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CN109211741A CN109211741A (zh) 2019-01-15
CN109211741B true CN109211741B (zh) 2022-06-17

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Country Status (6)

Country Link
US (1) US10788412B2 (cg-RX-API-DMAC7.html)
EP (1) EP3425370B1 (cg-RX-API-DMAC7.html)
JP (1) JP6961406B2 (cg-RX-API-DMAC7.html)
KR (1) KR102488587B1 (cg-RX-API-DMAC7.html)
CN (1) CN109211741B (cg-RX-API-DMAC7.html)
TW (1) TWI798232B (cg-RX-API-DMAC7.html)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4190888A1 (en) * 2020-07-31 2023-06-07 Kyocera Corporation Sample observation device
JP2025184455A (ja) * 2024-06-07 2025-12-18 大塚電子株式会社 光学測定システムおよびプログラム
CN223449804U (zh) * 2024-09-12 2025-10-17 无锡迅杰光远科技有限公司 光谱采集系统

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1279763A (zh) * 1997-11-19 2001-01-10 大塚电子株式会社 光学角度特性测定装置
WO2007138818A1 (ja) * 2006-05-26 2007-12-06 Japan Aerospace Exploration Agency 微小液滴・気泡・粒子の位置・粒径・速度測定の方法と装置
JP2009526239A (ja) * 2006-02-08 2009-07-16 ベックマン コールター， インコーポレイテッド モジュール方式の蛍光測定および光度測定読取装置
EP2163883A2 (de) * 2008-09-15 2010-03-17 Fritsch GmbH Partikelgröeenmessgerät
CN102323191A (zh) * 2008-09-26 2012-01-18 株式会社堀场制作所 颗粒物性测量装置
WO2016024429A1 (ja) * 2014-08-11 2016-02-18 シャープ株式会社 微小粒子検出装置

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CH542716A (de) 1972-01-29 1973-10-15 Krauss Maffei Ag Vorrichtung zum Pressen von länglichen Gegenständen, insbesondere von Skiern
JPH0233158Y2 (cg-RX-API-DMAC7.html) * 1985-01-30 1990-09-06
US4657390A (en) * 1985-02-21 1987-04-14 Laser Precision Corporation Universal spectrometer system having modular sampling chamber
JPH0678978B2 (ja) 1990-05-25 1994-10-05 スズキ株式会社 凝集パターン検出装置
JP3533502B2 (ja) 1994-10-14 2004-05-31 株式会社日立製作所 自動化学分析装置
JP3744650B2 (ja) * 1997-05-28 2006-02-15 石川島播磨重工業株式会社 カラーフィルタ検査装置の基板保持機構
US6232608B1 (en) * 1998-08-18 2001-05-15 Molecular Devices Corporation Optimization systems in a scanning fluorometer
US20020176801A1 (en) 1999-03-23 2002-11-28 Giebeler Robert H. Fluid delivery and analysis systems
JP3689278B2 (ja) 1999-05-19 2005-08-31 株式会社堀場製作所 粒子径分布測定装置および粒子径分布測定方法
JP2004206760A (ja) * 2002-12-24 2004-07-22 Sankyo Seiki Mfg Co Ltd 光ヘッド装置
JP5182913B2 (ja) * 2006-09-13 2013-04-17 大日本スクリーン製造株式会社 パターン描画装置およびパターン描画方法
US20080151204A1 (en) * 2006-12-21 2008-06-26 Asml Netherlands B.V. Method for positioning a target portion of a substrate with respect to a focal plane of a projection system
JP2009293987A (ja) 2008-06-03 2009-12-17 Arkray Inc 分析装置
US20160077015A1 (en) * 2011-09-25 2016-03-17 Theranos, Inc. Systems and methods for multi-analysis
JP5947709B2 (ja) * 2012-12-27 2016-07-06 株式会社堀場製作所 分光分析方法及び分光分析装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1279763A (zh) * 1997-11-19 2001-01-10 大塚电子株式会社 光学角度特性测定装置
JP2009526239A (ja) * 2006-02-08 2009-07-16 ベックマン コールター， インコーポレイテッド モジュール方式の蛍光測定および光度測定読取装置
WO2007138818A1 (ja) * 2006-05-26 2007-12-06 Japan Aerospace Exploration Agency 微小液滴・気泡・粒子の位置・粒径・速度測定の方法と装置
EP2163883A2 (de) * 2008-09-15 2010-03-17 Fritsch GmbH Partikelgröeenmessgerät
CN102323191A (zh) * 2008-09-26 2012-01-18 株式会社堀场制作所 颗粒物性测量装置
WO2016024429A1 (ja) * 2014-08-11 2016-02-18 シャープ株式会社 微小粒子検出装置

Also Published As

Publication number Publication date
JP2019015576A (ja) 2019-01-31
TWI798232B (zh) 2023-04-11
TW201907147A (zh) 2019-02-16
EP3425370A1 (en) 2019-01-09
EP3425370B1 (en) 2022-10-05
US20190011351A1 (en) 2019-01-10
US10788412B2 (en) 2020-09-29
KR102488587B1 (ko) 2023-01-13
KR20190005112A (ko) 2019-01-15
CN109211741A (zh) 2019-01-15
JP6961406B2 (ja) 2021-11-05

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