CN109161895A - Acid copper chloride etching liquid copper reclaiming system and reclaiming method - Google Patents
Acid copper chloride etching liquid copper reclaiming system and reclaiming method Download PDFInfo
- Publication number
- CN109161895A CN109161895A CN201810979851.3A CN201810979851A CN109161895A CN 109161895 A CN109161895 A CN 109161895A CN 201810979851 A CN201810979851 A CN 201810979851A CN 109161895 A CN109161895 A CN 109161895A
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- Prior art keywords
- molten iron
- copper
- etching
- cylinder
- solution
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- Granted
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- 238000005530 etching Methods 0.000 title claims abstract description 135
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 90
- 239000010949 copper Substances 0.000 title claims abstract description 81
- 229910052802 copper Inorganic materials 0.000 title claims abstract description 81
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 title claims abstract description 32
- 239000002253 acid Substances 0.000 title claims abstract description 29
- 239000007788 liquid Substances 0.000 title claims description 90
- 238000000034 method Methods 0.000 title claims description 57
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 273
- 229910052742 iron Inorganic materials 0.000 claims abstract description 137
- 238000011069 regeneration method Methods 0.000 claims abstract description 35
- 230000008929 regeneration Effects 0.000 claims abstract description 33
- 238000005406 washing Methods 0.000 claims abstract description 26
- 239000012535 impurity Substances 0.000 claims abstract description 7
- 238000010521 absorption reaction Methods 0.000 claims description 64
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 claims description 45
- 229910001431 copper ion Inorganic materials 0.000 claims description 43
- 239000007789 gas Substances 0.000 claims description 36
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 35
- 239000000460 chlorine Substances 0.000 claims description 35
- 229910052801 chlorine Inorganic materials 0.000 claims description 35
- 239000002699 waste material Substances 0.000 claims description 35
- 238000004519 manufacturing process Methods 0.000 claims description 29
- 239000003792 electrolyte Substances 0.000 claims description 24
- 238000005201 scrubbing Methods 0.000 claims description 23
- 238000005868 electrolysis reaction Methods 0.000 claims description 20
- 238000003860 storage Methods 0.000 claims description 17
- 230000001172 regenerating effect Effects 0.000 claims description 16
- 239000003513 alkali Substances 0.000 claims description 15
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 13
- 238000004140 cleaning Methods 0.000 claims description 13
- NMCUIPGRVMDVDB-UHFFFAOYSA-L iron dichloride Chemical compound Cl[Fe]Cl NMCUIPGRVMDVDB-UHFFFAOYSA-L 0.000 claims description 13
- 229960002089 ferrous chloride Drugs 0.000 claims description 12
- 230000001590 oxidative effect Effects 0.000 claims description 12
- 239000000126 substance Substances 0.000 claims description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 11
- 230000003647 oxidation Effects 0.000 claims description 8
- 238000007254 oxidation reaction Methods 0.000 claims description 8
- 238000012545 processing Methods 0.000 claims description 8
- 230000005611 electricity Effects 0.000 claims description 5
- 229910000041 hydrogen chloride Inorganic materials 0.000 claims description 5
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 claims description 5
- 238000011144 upstream manufacturing Methods 0.000 claims description 5
- -1 under electrolysis Substances 0.000 claims 1
- 238000004064 recycling Methods 0.000 abstract description 8
- 238000011084 recovery Methods 0.000 abstract description 6
- 238000005516 engineering process Methods 0.000 abstract description 4
- 238000005265 energy consumption Methods 0.000 abstract description 2
- 239000002912 waste gas Substances 0.000 abstract description 2
- 229960003280 cupric chloride Drugs 0.000 abstract 2
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 75
- 238000004458 analytical method Methods 0.000 description 8
- 239000000047 product Substances 0.000 description 7
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 6
- 239000010936 titanium Substances 0.000 description 6
- 229910052719 titanium Inorganic materials 0.000 description 6
- 238000005070 sampling Methods 0.000 description 5
- 239000012530 fluid Substances 0.000 description 4
- 239000012528 membrane Substances 0.000 description 4
- 239000007800 oxidant agent Substances 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 238000004090 dissolution Methods 0.000 description 3
- 239000003814 drug Substances 0.000 description 3
- 239000008151 electrolyte solution Substances 0.000 description 3
- 230000003628 erosive effect Effects 0.000 description 3
- FBAFATDZDUQKNH-UHFFFAOYSA-M iron chloride Chemical compound [Cl-].[Fe] FBAFATDZDUQKNH-UHFFFAOYSA-M 0.000 description 3
- 238000001556 precipitation Methods 0.000 description 3
- 238000010129 solution processing Methods 0.000 description 3
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical group [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 239000011889 copper foil Substances 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 229940079593 drug Drugs 0.000 description 2
- 241000208340 Araliaceae Species 0.000 description 1
- 229910021577 Iron(II) chloride Inorganic materials 0.000 description 1
- 235000005035 Panax pseudoginseng ssp. pseudoginseng Nutrition 0.000 description 1
- 235000003140 Panax quinquefolius Nutrition 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 239000013043 chemical agent Substances 0.000 description 1
- 239000013064 chemical raw material Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005660 chlorination reaction Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000003517 fume Substances 0.000 description 1
- 235000008434 ginseng Nutrition 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000010808 liquid waste Substances 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 230000007096 poisonous effect Effects 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000006479 redox reaction Methods 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000010865 sewage Substances 0.000 description 1
- 210000000952 spleen Anatomy 0.000 description 1
- 210000002784 stomach Anatomy 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/46—Regeneration of etching compositions
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/08—Apparatus, e.g. for photomechanical printing surfaces
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
- C25C1/12—Electrolytic production, recovery or refining of metals by electrolysis of solutions of copper
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
- C25C7/06—Operating or servicing
- C25C7/08—Separating of deposited metals from the cathode
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrochemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- ing And Chemical Polishing (AREA)
- Treating Waste Gases (AREA)
Abstract
本发明提供一种酸性氯化铜蚀刻液铜回收再生系统及回收再生方法,涉及蚀刻液循环再生技术领域。本发明酸性氯化铜蚀刻液铜回收再生系统包括蚀刻液再生系统以及位于蚀刻液再生系统下游的废气处理系统,还包括铁水洗涤液处理系统;本发明酸性氯化铜蚀刻液铜回收再生方法有效解决现有酸性氯化铜蚀刻液再生循环的高能耗、低回用率、阴极铜杂质含量多、氯气二次污染环境等问题,对酸性氯化铜蚀刻液电解再生循环技术的全面应用提供技术支持。
The invention provides an acid copper chloride etching solution copper recovery and regeneration system and a recovery and regeneration method, which relate to the technical field of etching solution recycling and regeneration. The acid copper chloride etching solution copper recovery and regeneration system of the invention includes an etching solution regeneration system and a waste gas treatment system located downstream of the etching solution regeneration system, and also includes a molten iron washing solution treatment system; the acid copper chloride etching solution copper recovery and regeneration method of the invention is effective Solve the problems of high energy consumption, low recycling rate, high content of cathode copper impurities, secondary pollution of the environment by chlorine gas, etc. of the existing acid cupric chloride etching solution regeneration cycle, and provide technology for the comprehensive application of the acid cupric chloride etching solution electrolytic regeneration cycle technology support.
Description
Claims (8)
Priority Applications (1)
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CN201810979851.3A CN109161895B (en) | 2018-08-27 | 2018-08-27 | Acid copper chloride etching solution copper recovery and regeneration system and recovery and regeneration method |
Applications Claiming Priority (1)
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CN201810979851.3A CN109161895B (en) | 2018-08-27 | 2018-08-27 | Acid copper chloride etching solution copper recovery and regeneration system and recovery and regeneration method |
Publications (2)
Publication Number | Publication Date |
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CN109161895A true CN109161895A (en) | 2019-01-08 |
CN109161895B CN109161895B (en) | 2020-10-27 |
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CN201810979851.3A Active CN109161895B (en) | 2018-08-27 | 2018-08-27 | Acid copper chloride etching solution copper recovery and regeneration system and recovery and regeneration method |
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CN (1) | CN109161895B (en) |
Cited By (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109881200A (en) * | 2019-04-10 | 2019-06-14 | 深圳市铿东科技有限公司 | A kind of regenerating alkaline etching liquid and its copper recovery method |
CN109881199A (en) * | 2019-04-10 | 2019-06-14 | 深圳市铿东科技有限公司 | A kind of alkaline etching solution regeneration and its copper recovery system |
CN110453225A (en) * | 2019-08-29 | 2019-11-15 | 深圳市祺鑫天正环保科技有限公司 | The processing method of acidic etching waste liquid |
CN111101157A (en) * | 2019-12-27 | 2020-05-05 | 合肥恒力装备有限公司 | Zero-emission treatment process for PCB etching waste liquid |
CN111394725A (en) * | 2020-04-24 | 2020-07-10 | 深圳市京中康科技有限公司 | A device for recovering chlorine gas by acid etching copper recovery system |
CN111394728A (en) * | 2020-04-24 | 2020-07-10 | 深圳市京中康科技有限公司 | Method for further treating chlorine in acid etching copper recovery system |
CN111560615A (en) * | 2020-04-24 | 2020-08-21 | 励福(江门)环保科技股份有限公司 | Method for on-line recovery of copper and chlorine from acidic etching waste liquid and regeneration of etching liquid |
CN111733419A (en) * | 2020-08-05 | 2020-10-02 | 上海毅蓝电子科技有限公司 | Acidic etching solution and device and method for recycling electrolytic copper extraction |
CN111748826A (en) * | 2020-07-28 | 2020-10-09 | 昆山科之源环保科技有限公司 | Acid chloride etching waste liquid single-film double-chamber electrolytic copper and chlorine regeneration system and process |
CN113088722A (en) * | 2021-03-17 | 2021-07-09 | 磨名言 | Method for electrolytically recovering copper from copper sulfide ore |
CN113564638A (en) * | 2021-07-12 | 2021-10-29 | 天水华洋电子科技股份有限公司 | Recyclable and recyclable etching liquid medicine process |
CN114318372A (en) * | 2022-01-18 | 2022-04-12 | 广东德同环保科技有限公司 | Device and method for absorbing chlorine by circularly electrolyzing ferric trichloride |
CN114481221A (en) * | 2022-01-26 | 2022-05-13 | 昆山华拓环保科技有限公司 | Copper extraction method of recyclable acidic etching solution |
CN115466957A (en) * | 2021-08-19 | 2022-12-13 | 叶涛 | A method and device for electrolytic regeneration of copper by precipitation of acidic copper chloride etching waste liquid |
CN115537816A (en) * | 2022-10-08 | 2022-12-30 | 青岛理工大学 | A swirl electrolysis system and method for regeneration of acid copper chloride etchant and copper recovery |
RU2824908C1 (en) * | 2024-04-12 | 2024-08-15 | Общество с ограниченной ответственностью "НАУЧНО-ТЕХНИЧЕСКИЙ ЦЕНТР ВАТТ" (ООО "НТЦ ВАТТ") | Method of regenerating copper chloride hydrochloride etching solution by electrolysis |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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CN104152905A (en) * | 2014-06-24 | 2014-11-19 | 深圳市新锐思环保科技有限公司 | Acidic copper chloride etching liquid electrolytic regeneration recycling and copper plate recovery device and method |
CN104911596A (en) * | 2015-06-01 | 2015-09-16 | 深圳中能润德环保有限公司 | Device and method for cyclic regeneration and copper extraction of etching liquid |
CN105177583A (en) * | 2015-09-09 | 2015-12-23 | 成都虹华环保科技股份有限公司 | Method and system for circulating and regenerating zero-emission waste acidic etching solutions |
CN206570410U (en) * | 2017-01-06 | 2017-10-20 | 深圳市新锐思环保科技有限公司 | A kind of recovery and processing system of acidic etching waste liquid |
-
2018
- 2018-08-27 CN CN201810979851.3A patent/CN109161895B/en active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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CN104152905A (en) * | 2014-06-24 | 2014-11-19 | 深圳市新锐思环保科技有限公司 | Acidic copper chloride etching liquid electrolytic regeneration recycling and copper plate recovery device and method |
CN104911596A (en) * | 2015-06-01 | 2015-09-16 | 深圳中能润德环保有限公司 | Device and method for cyclic regeneration and copper extraction of etching liquid |
CN105177583A (en) * | 2015-09-09 | 2015-12-23 | 成都虹华环保科技股份有限公司 | Method and system for circulating and regenerating zero-emission waste acidic etching solutions |
CN206570410U (en) * | 2017-01-06 | 2017-10-20 | 深圳市新锐思环保科技有限公司 | A kind of recovery and processing system of acidic etching waste liquid |
Cited By (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109881200B (en) * | 2019-04-10 | 2021-05-11 | 深圳市铿东科技有限公司 | Regeneration of alkaline etching solution and copper recovery method thereof |
CN109881199A (en) * | 2019-04-10 | 2019-06-14 | 深圳市铿东科技有限公司 | A kind of alkaline etching solution regeneration and its copper recovery system |
CN109881200A (en) * | 2019-04-10 | 2019-06-14 | 深圳市铿东科技有限公司 | A kind of regenerating alkaline etching liquid and its copper recovery method |
CN110453225A (en) * | 2019-08-29 | 2019-11-15 | 深圳市祺鑫天正环保科技有限公司 | The processing method of acidic etching waste liquid |
CN110453225B (en) * | 2019-08-29 | 2021-07-30 | 深圳市祺鑫环保科技有限公司 | Method for treating acidic waste etching solution |
CN111101157A (en) * | 2019-12-27 | 2020-05-05 | 合肥恒力装备有限公司 | Zero-emission treatment process for PCB etching waste liquid |
CN111394725A (en) * | 2020-04-24 | 2020-07-10 | 深圳市京中康科技有限公司 | A device for recovering chlorine gas by acid etching copper recovery system |
CN111394728A (en) * | 2020-04-24 | 2020-07-10 | 深圳市京中康科技有限公司 | Method for further treating chlorine in acid etching copper recovery system |
CN111560615A (en) * | 2020-04-24 | 2020-08-21 | 励福(江门)环保科技股份有限公司 | Method for on-line recovery of copper and chlorine from acidic etching waste liquid and regeneration of etching liquid |
CN111748826A (en) * | 2020-07-28 | 2020-10-09 | 昆山科之源环保科技有限公司 | Acid chloride etching waste liquid single-film double-chamber electrolytic copper and chlorine regeneration system and process |
CN111733419A (en) * | 2020-08-05 | 2020-10-02 | 上海毅蓝电子科技有限公司 | Acidic etching solution and device and method for recycling electrolytic copper extraction |
CN113088722A (en) * | 2021-03-17 | 2021-07-09 | 磨名言 | Method for electrolytically recovering copper from copper sulfide ore |
CN113564638A (en) * | 2021-07-12 | 2021-10-29 | 天水华洋电子科技股份有限公司 | Recyclable and recyclable etching liquid medicine process |
CN115466957A (en) * | 2021-08-19 | 2022-12-13 | 叶涛 | A method and device for electrolytic regeneration of copper by precipitation of acidic copper chloride etching waste liquid |
CN114318372A (en) * | 2022-01-18 | 2022-04-12 | 广东德同环保科技有限公司 | Device and method for absorbing chlorine by circularly electrolyzing ferric trichloride |
CN114481221A (en) * | 2022-01-26 | 2022-05-13 | 昆山华拓环保科技有限公司 | Copper extraction method of recyclable acidic etching solution |
CN115537816A (en) * | 2022-10-08 | 2022-12-30 | 青岛理工大学 | A swirl electrolysis system and method for regeneration of acid copper chloride etchant and copper recovery |
CN115537816B (en) * | 2022-10-08 | 2024-06-07 | 青岛理工大学 | A cyclonic electrolysis system and method for regenerating acidic cupric chloride etchant and recovering copper |
RU2824908C1 (en) * | 2024-04-12 | 2024-08-15 | Общество с ограниченной ответственностью "НАУЧНО-ТЕХНИЧЕСКИЙ ЦЕНТР ВАТТ" (ООО "НТЦ ВАТТ") | Method of regenerating copper chloride hydrochloride etching solution by electrolysis |
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Denomination of invention: Copper recovery and regeneration system and method of acidic copper chloride etching solution Effective date of registration: 20210625 Granted publication date: 20201027 Pledgee: Guangde sub branch of Postal Savings Bank of China Ltd. Pledgor: ANHUI LVZHOU DANGER WASTE COMPREHENSIVE UTILIZATION Co.,Ltd. Registration number: Y2021980005258 |
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Date of cancellation: 20220714 Granted publication date: 20201027 Pledgee: Guangde sub branch of Postal Savings Bank of China Ltd. Pledgor: ANHUI LVZHOU DANGER WASTE COMPREHENSIVE UTILIZATION Co.,Ltd. Registration number: Y2021980005258 |
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Denomination of invention: Acid copper chloride etching solution copper recovery and regeneration system and recovery and regeneration method Granted publication date: 20201027 Pledgee: China Construction Bank Corporation Guangde Branch Pledgor: ANHUI LVZHOU DANGER WASTE COMPREHENSIVE UTILIZATION Co.,Ltd. Registration number: Y2025980005498 |