CN112458463A - Acid etching solution recycling system and method - Google Patents
Acid etching solution recycling system and method Download PDFInfo
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- CN112458463A CN112458463A CN202011237059.4A CN202011237059A CN112458463A CN 112458463 A CN112458463 A CN 112458463A CN 202011237059 A CN202011237059 A CN 202011237059A CN 112458463 A CN112458463 A CN 112458463A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/46—Regeneration of etching compositions
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
- C25C1/12—Electrolytic production, recovery or refining of metals by electrolysis of solutions of copper
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
- C25C7/02—Electrodes; Connections thereof
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
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- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
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- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
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Abstract
The invention discloses a circulating regeneration system for an acidic etching solution, which comprises an ionic membrane electrolysis circulating system, a chlorine absorption system and a regenerated solution preparation monitoring system; the ionic membrane electrolysis circulating system is constructed as a solution circulating loop and comprises an electrolysis system; the chlorine absorption system comprises a chlorine treatment cylinder, an alkali liquor pool and a chlorine treatment tower secondary absorption system; the chlorine treatment cylinder and the alkali liquor pool respectively suck chlorine through negative pressure generated by the ejector and introduce the chlorine into the low ORP etching liquid medicine and the alkaline solution; and the ORP monitor is used for controlling the generation of the chlorine gas by controlling the ORP value of the electrolytic etching solution. According to the invention, through controlling the ORP value of the electrolytic etching solution, the generation of chlorine is effectively controlled, monovalent copper ions are changed into divalent copper ions, the etching capability is recovered, the production is completely returned, the oxidant used in the production is reduced, even cancelled, the production materials are saved, and the production cost is reduced.
Description
Technical Field
The invention relates to the technical field of acidic etching solution recovery, in particular to a system and a method for recycling acidic etching solution.
Background
Acid etching is an important step in the production of printed wiring boards. As the etching is carried out, the concentration of copper ions in the etching solution is higher and higher, the etching speed is slower and slower, and the etching progress and quality are seriously influenced if the copper ions are not replaced. The acidic etching waste liquid not only contains a large amount of copper ions, but also contains other valuable chemical substances. The manufacturer will essentially handle itself or commission a qualified merchant to the recovery process.
Currently, there are several ways to recover copper from spent etching solutions, and representative techniques include:
1. chemical method. Adding NaOH into the waste liquid, combining with copper ions to generate copper hydroxide precipitate, and preparing CuO or CuSO4Crystallization and the like, the method can recover Cu, but has high chemical consumption and large energy consumption, and generates wastewater which is difficult to treat, the concentration of Cu ions in the wastewater exceeds the standard, a large amount of ammonia in the wastewater is difficult to degrade, and a large amount of cost is needed for retreatment;
2. direct electrolysis. The method requires changing CuCl2 in the acidic etching solution to CuSO 4. After the etching waste liquid is generated, because the waste liquid does not contain Cl < - > ions, copper can be directly obtained through electrolysis without extraction, so that the concentration of copper ions in the etching liquid is reduced, and the purposes of regenerating and recovering copper are achieved. However, this technique severely reduces the speed and quality of the etched lines, which is unacceptable to most manufacturers.
Therefore, a novel system and a method for recycling acidic etching solution are needed to realize energy-saving, environment-friendly and efficient recycling.
Disclosure of Invention
The present invention addresses the needs of the art and overcomes the deficiencies of the prior art. The invention provides a circulating regeneration system for an acidic etching solution, which comprises an ionic membrane electrolysis circulating system, a chlorine absorption system and a regenerated solution preparation monitoring system;
the ionic membrane electrolysis circulating system is constructed as a solution circulating loop, and the solution circulating loop comprises an electrolysis system;
the chlorine absorption system comprises a chlorine treatment cylinder, an alkali liquor pool and a chlorine treatment tower secondary absorption system;
the chlorine treatment cylinder and the alkali liquor pool are respectively provided with a first ejector and a second ejector, the first ejector is used for sucking chlorine away and introducing low-ORP etching liquor through negative pressure formed by the pressure water flowing through the contraction section of the first ejector and the throat diameter joint through full mixing and compression, and the second ejector is used for sucking chlorine away and introducing the chlorine into alkaline solution of the alkali liquor pool through negative pressure formed by the pressure water flowing through the contraction section of the second ejector and the throat diameter joint through full mixing and compression; the chlorine absorption system is hermetically connected with the electrolysis system;
the regenerated liquid blending monitoring system is used for acquiring and monitoring the operation data of the acidic etching liquid circulating regeneration system; the regeneration liquid blending monitoring system comprises an ORP monitor, and is used for controlling the generation of chlorine by controlling the ORP value of the electrolytic etching liquid.
As a further improvement of the embodiment of the invention, the electrolytic system comprises a current control module and an electrolytic tank, wherein at least one or more electrolytic plates are arranged in the electrolytic tank; the current control module is connected in parallel with the electrolytic plate.
As a further improvement of the embodiment of the present invention, the solution circulation loop further includes an acidic etching solution storage tank, and a first connection pipeline, an electrolyzed waste solution storage tank, a waste water treatment device, and a second connection pipeline disposed between the electrolysis system and the electrolyzed waste solution storage tank, which are disposed between the acidic etching solution storage tank and the electrolysis system.
As a further improvement of the embodiment of the present invention, the regenerated liquid blending monitoring system further includes a specific gravity detector, an acidimeter, and a flow meter.
As a further improvement of the embodiment of the present invention, the electrode plate includes an anode electrode plate, a cathode electrode plate, and a separator separating the anode electrode plate from the cathode electrode plate.
As a further improvement of the embodiment of the invention, the acidic etching solution circulating and regenerating system is constructed into a plurality of three-way spraying structures, and the plurality of three-way spraying structures are respectively arranged in the chlorine treatment cylinder, the alkali liquor pool and the chlorine treatment tower secondary absorption system.
As a further improvement of the embodiment of the present invention, the liquid pump is a CQF engineering plastic pump, and is disposed on the first connection pipeline.
On the other hand, the invention also discloses a method for recycling the acid etching solution, which comprises the following steps:
s1, the acidic etching solution enters an ion membrane electrolysis system, the acidic etching solution with low ORP enters from the anode of the ion membrane electrolysis cell, and monovalent copper ions in the acidic etching solution lose electrons at the anode to be oxidized into divalent copper ions under the electrolysis action of the etching solution;
s2, high-copper-content etching solution enters from the lower position of the cathode area of the ion-exchange membrane electrolytic cell, copper ions are reduced to copper simple substances at the cathode under the electrolytic action of the etching waste solution, so that the concentration of the copper ions is reduced, the etching solution with the reduced copper ion content flows out from the higher position of the cathode, and the etching solution is mixed and then returns to the etching process to be used, so that a solution circulation loop is formed;
s3, absorbing chlorine generated in the electrolysis process into etching liquid containing low ORP through a first ejector, fully mixing, absorbing part of the chlorine in the etching liquid containing low ORP through a three-way spraying design, absorbing the other part of the chlorine into sodium hydroxide solution through a second ejector, fully mixing, fully reacting through a three-way spraying device, and finally treating a small amount of residual chlorine through two gas towers and one adsorption tower and discharging the chlorine after reaching the standard.
As a further refinement of an embodiment of the invention, the method further comprises the steps of: the method comprises the following steps that a regenerated liquid preparation monitoring system collects and monitors operation data of an acid etching liquid circulating regeneration system; the operation data comprises data collected by a specific gravity detector, an ORP monitor, an acidimeter and a flowmeter.
As a further improvement of the embodiment of the invention, the ORP monitoring meter controls the generation of chlorine by controlling the ORP value of the electrolytic etching solution, when the ORP is too high and chlorine is separated out under the condition of incomplete jet flow absorption or failure of ORP controller, the acid mist is treated by the reaction of sodium hydroxide and chlorine, and the treated gas is discharged after being purified by the waste gas tower.
The invention has the following beneficial effects:
1. the acidic etching solution recycling system effectively controls the generation of chlorine gas by controlling the ORP value of the electrolytic etching solution, so that monovalent copper ions are changed into divalent copper ions, the etching capability is recovered, the production is completely returned, the oxidant used in the production is reduced or even cancelled, the production materials are saved, and the production cost is reduced;
2. the acid etching solution circulating regeneration system performs the processes of jet flow absorption and alkali reaction neutralization on hydrochloric acid volatile gas in a cathode chamber and chlorine gas generated under emergency, so that waste gas is prevented from overflowing, and the safety of the system is ensured;
3. the acid etching solution recycling system enables copper ions to be orderly deposited on a cathode titanium plate by controlling three factors of a coating formula of the anode titanium plate, membrane flux and material components of the cathode titanium plate, so as to obtain a compact copper plate;
4. the acid etching solution recycling system utilizes the perfluorinated sulfonic acid ion membrane electrolysis method to extract copper with the purity of more than 99.9 percent, can produce copper plates, has low labor intensity of workers and high copper selling price (1500 yuan/ton higher than one ton of seller of copper powder produced by the current common ion membrane electrolysis method);
5. the acid etching solution recycling system has high automation degree, is simple to operate and maintain, and does not influence production in installation and debugging.
Drawings
FIG. 1 is a schematic structural diagram of a system for recycling acidic etching solution according to an embodiment of the present invention;
FIG. 2 is a schematic structural view of a chlorine absorption system provided in an embodiment of the present invention;
FIG. 3 is a schematic structural diagram of an electrolysis system provided in an embodiment of the present invention;
the examples in the figures are represented as:
an ionic membrane electrolysis circulation system 1; an electrolysis system 11; an acidic etching solution storage barrel 12; a first connection line 13; a post-electrolysis waste liquid storage tank 14; a wastewater treatment device 15; a second connecting line 16; a current control module 111; an electrolytic cell 112; an electrolytic plate 113; an anode electrode plate 1131; a cathode electrode plate 1132; a separator 1133; a chlorine absorption system 2; a chlorine treatment cylinder 21; the first ejector 211; an alkaline liquid pool 22; a second ejector 221; a chlorine treatment tower secondary absorption system 23; a regenerated liquid blending monitoring system 3; three spraying structures 4; a liquid pump 5.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
In order to meet the actual needs and overcome the defects of the prior art, on one hand, the invention provides a circulating regeneration system of an acidic etching solution, which comprises an ionic membrane electrolysis circulating system 1, a chlorine absorption system 2 and a regenerated solution blending monitoring system 3 as shown in figure 1;
as shown in fig. 1 and 2, the ionic membrane electrolysis circulation system 1 is configured as a solution circulation loop including an electrolysis system 11; the chlorine absorption system 2 comprises a chlorine treatment cylinder 21, an alkali liquor pool 22 and a chlorine treatment tower secondary absorption system 23; the chlorine treatment cylinder 21 and the alkali liquor pool 22 are respectively provided with a first ejector 211 and a second ejector, the first ejector 211 is used for sucking chlorine away and introducing low ORP etching liquor through negative pressure formed by fully mixing and compressing pressure water flowing through a contraction section of the first ejector 211 and a throat joint, and the second ejector is used for sucking chlorine away through negative pressure and introducing the chlorine into an alkaline solution of the alkali liquor pool 22; the chlorine absorption system 2 is hermetically connected with the electrolysis system 11;
the regenerated liquid blending monitoring system 3 is used for collecting and monitoring the operation data of the acid etching liquid circulating regeneration system; the regeneration liquid blending monitoring system 3 comprises an ORP monitor for controlling the generation of chlorine gas by controlling the ORP value of the electrolytic etching liquid.
Specifically, as shown in fig. 3, the electrolysis system 11 comprises a current control module 111 and an electrolysis bath 112, wherein at least one or more electrolysis plates 113 are arranged in the electrolysis bath 112; the current control module 111 and the electrolytic plate 113 are connected in parallel.
In the embodiment of the present invention, the solution circulation loop further includes an acidic etching solution storage barrel 12, and a first connection pipeline 13, an electrolyzed waste liquid storage barrel 14, a waste water treatment device 15 and a second connection pipeline 16 arranged between the electrolysis system 11 and the electrolyzed waste liquid storage barrel 14, which are arranged between the acidic etching solution storage barrel 12 and the electrolysis system 11.
The regenerated liquid blending monitoring system 3 also comprises a specific gravity detector, an acidimeter and a flowmeter.
Electrode plate 113 includes anode electrode plate 1131, cathode electrode plate 1132, and separator 1133, separator 1133 separating anode electrode plate 1131 from cathode electrode plate 1132.
In the embodiment of the invention, the acidic etching solution circulating and regenerating system is constructed into a plurality of three-way spraying structures 4, and the plurality of three-way spraying structures 4 are respectively arranged in the chlorine treatment cylinder 21, the alkali liquor pool 22 and the chlorine treatment tower secondary absorption system 23.
In addition, the liquid pump is further included, and in the embodiment of the present invention, the liquid pump is a CQF engineering plastic pump and is disposed on the first connection pipe 13.
On the other hand, the embodiment of the invention also discloses a method for recycling the acidic etching solution, which comprises the following steps:
s1, the acidic etching solution enters an ion membrane electrolysis system, the acidic etching solution with low ORP enters from the anode of the ion membrane electrolysis cell, and monovalent copper ions in the acidic etching solution lose electrons at the anode to be oxidized into divalent copper ions under the electrolysis action of the etching solution;
s2, high-copper-content etching solution enters from the lower position of the cathode area of the ion-exchange membrane electrolytic cell, copper ions are reduced to copper simple substances at the cathode under the electrolytic action of the etching waste solution, so that the concentration of the copper ions is reduced, the etching solution with the reduced copper ion content flows out from the higher position of the cathode, and the etching solution is mixed and then returns to the etching process to be used, so that a solution circulation loop is formed;
s3, absorbing chlorine generated in the electrolysis process into etching liquid containing low ORP through a first ejector, fully mixing, absorbing part of the chlorine in the etching liquid containing low ORP through a three-way spraying design, absorbing the other part of the chlorine into sodium hydroxide solution through a second ejector, fully mixing, fully reacting through a three-way spraying device, and finally treating a small amount of residual chlorine through two gas towers and one adsorption tower and discharging the chlorine after reaching the standard.
In the embodiment of the invention, the regenerated liquid blending monitoring system collects and monitors the operation data of the acid etching liquid circulating regeneration system; operational data includes, but is not limited to, data collected by specific gravity detectors, ORP monitors, acidimeters, and flow meters.
The ORP monitoring instrument controls the generation of chlorine by controlling the ORP value of the electrolytic etching solution, and when the ORP is too high and chlorine is separated out under the condition of incomplete jet flow absorption or failure of ORP controller, the acid mist is treated by the reaction of sodium hydroxide and chlorine, and the treated gas is purified by the waste gas tower and then discharged.
The invention has the following beneficial effects:
1. the acidic etching solution recycling system effectively controls the generation of chlorine gas by controlling the ORP value of the electrolytic etching solution, so that monovalent copper ions are changed into divalent copper ions, the etching capability is recovered, the production is completely returned, the oxidant used in the production is reduced or even cancelled, the production materials are saved, and the production cost is reduced;
2. the acid etching solution circulating regeneration system performs the processes of jet flow absorption and alkali reaction neutralization on hydrochloric acid volatile gas in a cathode chamber and chlorine gas generated under emergency, so that waste gas is prevented from overflowing, and the safety of the system is ensured;
3. the acid etching solution recycling system enables copper ions to be orderly deposited on a cathode titanium plate by controlling three factors of a coating formula of the anode titanium plate, membrane flux and material components of the cathode titanium plate, so as to obtain a compact copper plate;
4. the acid etching solution recycling system utilizes the perfluorinated sulfonic acid ion membrane electrolysis method to extract copper with the purity of more than 99.9 percent, can produce copper plates, has low labor intensity of workers and high copper selling price, and is about 1500 yuan/ton higher than one ton of copper powder produced by the current common ion membrane electrolysis method;
5. the acid etching solution recycling system has high automation degree, is simple to operate and maintain, and does not influence production in installation and debugging.
The above is only a preferred embodiment of the present invention, and it should be noted that, for those skilled in the art, many variations and modifications can be made without departing from the inventive concept of the present invention, which falls into the protection scope of the present invention.
Claims (10)
1. A circulating regeneration system for acidic etching solution is characterized by comprising an ion membrane electrolytic circulation system, a chlorine absorption system and a regenerated solution preparation monitoring system;
the ionic membrane electrolysis circulating system is constructed as a solution circulating loop, and the solution circulating loop comprises an electrolysis system;
the chlorine absorption system comprises a chlorine treatment cylinder, an alkali liquor pool and a chlorine treatment tower secondary absorption system;
the chlorine treatment cylinder and the alkali liquor pool are respectively provided with a first ejector and a second ejector, the first ejector is used for sucking chlorine away and introducing low-ORP etching liquor through negative pressure formed by the pressure water flowing through the contraction section of the first ejector and the throat diameter joint through full mixing and compression, and the second ejector is used for sucking chlorine away and introducing the chlorine into alkaline solution of the alkali liquor pool through negative pressure formed by the pressure water flowing through the contraction section of the second ejector and the throat diameter joint through full mixing and compression; the chlorine absorption system is hermetically connected with the electrolysis system;
the regenerated liquid blending monitoring system is used for acquiring and monitoring the operation data of the acidic etching liquid circulating regeneration system; the regeneration liquid blending monitoring system comprises an ORP monitor, and is used for controlling the generation of chlorine by controlling the ORP value of the electrolytic etching liquid.
2. The system for recycling acidic etching solution according to claim 1, wherein the electrolytic system comprises a current control module and an electrolytic cell, and at least one or more electrolytic plates are arranged in the electrolytic cell; the current control module is connected in parallel with the electrolytic plate.
3. The system of claim 1, wherein the solution circulation loop further comprises an acidic etching solution storage barrel, a first connection pipeline arranged between the acidic etching solution storage barrel and the electrolysis system, an electrolyzed waste solution storage barrel, a waste water treatment device, and a second connection pipeline arranged between the electrolysis system and the electrolyzed waste solution storage barrel.
4. The system of claim 1, further comprising a specific gravity detector, an acidimeter, and a flow meter.
5. The system for recycling acidic etching solution according to claim 2, wherein said electrode plates comprise an anode electrode plate, a cathode electrode plate, and a separator, and said separator separates said anode electrode plate from said cathode electrode plate.
6. The system of claim 1, wherein the system is configured as a plurality of three-way spraying structures, and the three-way spraying structures are respectively arranged in the chlorine treatment cylinder, the alkali solution tank and the chlorine treatment tower secondary absorption system.
7. The system for recycling acidic etching solution according to claim 3, further comprising a liquid pump, wherein said liquid pump is a CQF engineering plastic pump and is disposed on said first connection pipeline.
8. The method for recycling the acidic etching solution is characterized by comprising the following steps of:
s1, the acidic etching solution enters an ion membrane electrolysis system, the acidic etching solution with low ORP enters from the anode of the ion membrane electrolysis cell, and monovalent copper ions in the acidic etching solution lose electrons at the anode to be oxidized into divalent copper ions under the electrolysis action of the etching solution;
s2, high-copper-content etching solution enters from the lower position of the cathode area of the ion-exchange membrane electrolytic cell, copper ions are reduced to copper simple substances at the cathode under the electrolytic action of the etching waste solution, so that the concentration of the copper ions is reduced, the etching solution with the reduced copper ion content flows out from the higher position of the cathode, and the etching solution is mixed and then returns to the etching process to be used, so that a solution circulation loop is formed;
s3, absorbing chlorine generated in the electrolysis process into etching liquid containing low ORP through a first ejector, fully mixing, absorbing part of the chlorine in the etching liquid containing low ORP through a three-way spraying design, absorbing the other part of the chlorine into sodium hydroxide solution through a second ejector, fully mixing, fully reacting through a three-way spraying device, and finally treating a small amount of residual chlorine through two gas towers and one adsorption tower and discharging the chlorine after reaching the standard.
9. The method for recycling acidic etching solution according to claim 8, further comprising the steps of: the method comprises the following steps that a regenerated liquid preparation monitoring system collects and monitors operation data of an acid etching liquid circulating regeneration system; the operation data comprises data collected by a specific gravity detector, an ORP monitor, an acidimeter and a flowmeter.
10. The method for recycling acidic etching solution according to claim 8, wherein the ORP monitor controls the generation of chlorine by controlling the ORP value of the electrolytic etching solution, when the ORP is too high and chlorine is separated out under the condition of incomplete jet absorption or failure of ORP controller, the acid mist is treated by reaction between sodium hydroxide and chlorine, and the treated gas is discharged after being purified by the waste gas tower.
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN113073328A (en) * | 2021-03-23 | 2021-07-06 | 江苏净拓环保科技有限公司 | Nitric acid deplating cyclic regeneration system and method |
| CN113564638A (en) * | 2021-07-12 | 2021-10-29 | 天水华洋电子科技股份有限公司 | Recyclable and recyclable etching liquid medicine process |
| CN114481221A (en) * | 2022-01-26 | 2022-05-13 | 昆山华拓环保科技有限公司 | Copper extraction method of recyclable acidic etching solution |
| CN115125583A (en) * | 2022-06-29 | 2022-09-30 | 广东臻鼎环境科技有限公司 | Remote monitoring and management method for electrolysis of acidic etching waste liquid and recycling of regenerated liquid and chlorine |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN113073328A (en) * | 2021-03-23 | 2021-07-06 | 江苏净拓环保科技有限公司 | Nitric acid deplating cyclic regeneration system and method |
| CN113564638A (en) * | 2021-07-12 | 2021-10-29 | 天水华洋电子科技股份有限公司 | Recyclable and recyclable etching liquid medicine process |
| CN114481221A (en) * | 2022-01-26 | 2022-05-13 | 昆山华拓环保科技有限公司 | Copper extraction method of recyclable acidic etching solution |
| CN115125583A (en) * | 2022-06-29 | 2022-09-30 | 广东臻鼎环境科技有限公司 | Remote monitoring and management method for electrolysis of acidic etching waste liquid and recycling of regenerated liquid and chlorine |
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Application publication date: 20210309 |