CN206570410U - A kind of recovery and processing system of acidic etching waste liquid - Google Patents
A kind of recovery and processing system of acidic etching waste liquid Download PDFInfo
- Publication number
- CN206570410U CN206570410U CN201720014515.6U CN201720014515U CN206570410U CN 206570410 U CN206570410 U CN 206570410U CN 201720014515 U CN201720014515 U CN 201720014515U CN 206570410 U CN206570410 U CN 206570410U
- Authority
- CN
- China
- Prior art keywords
- chlorine
- waste liquid
- acidic etching
- etching waste
- recovery
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000005530 etching Methods 0.000 title claims abstract description 69
- 239000007788 liquid Substances 0.000 title claims abstract description 60
- 239000002699 waste material Substances 0.000 title claims abstract description 58
- 230000002378 acidificating effect Effects 0.000 title claims abstract description 43
- 238000011084 recovery Methods 0.000 title claims abstract description 20
- 239000000460 chlorine Substances 0.000 claims abstract description 66
- 229910052801 chlorine Inorganic materials 0.000 claims abstract description 66
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims abstract description 65
- 238000006243 chemical reaction Methods 0.000 claims abstract description 30
- 238000010521 absorption reaction Methods 0.000 claims abstract description 23
- 239000011259 mixed solution Substances 0.000 claims abstract description 20
- 239000003513 alkali Substances 0.000 claims abstract description 19
- 239000000243 solution Substances 0.000 claims abstract description 16
- 230000001590 oxidative effect Effects 0.000 claims abstract description 14
- 239000007800 oxidant agent Substances 0.000 claims abstract description 13
- HEMHJVSKTPXQMS-UHFFFAOYSA-M sodium hydroxide Inorganic materials [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 56
- 238000005868 electrolysis reaction Methods 0.000 claims description 28
- 239000012528 membrane Substances 0.000 claims description 26
- 239000002253 acid Substances 0.000 claims description 13
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 10
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 claims description 10
- 239000010949 copper Substances 0.000 claims description 9
- 229910052802 copper Inorganic materials 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 8
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 claims description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 6
- 239000011780 sodium chloride Substances 0.000 claims description 5
- BZSXEZOLBIJVQK-UHFFFAOYSA-N 2-methylsulfonylbenzoic acid Chemical compound CS(=O)(=O)C1=CC=CC=C1C(O)=O BZSXEZOLBIJVQK-UHFFFAOYSA-N 0.000 claims description 4
- 239000005708 Sodium hypochlorite Substances 0.000 claims description 4
- WQYVRQLZKVEZGA-UHFFFAOYSA-N hypochlorite Chemical compound Cl[O-] WQYVRQLZKVEZGA-UHFFFAOYSA-N 0.000 claims description 4
- VKJKEPKFPUWCAS-UHFFFAOYSA-M potassium chlorate Chemical compound [K+].[O-]Cl(=O)=O VKJKEPKFPUWCAS-UHFFFAOYSA-M 0.000 claims description 4
- 238000001556 precipitation Methods 0.000 claims description 4
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 claims description 4
- 238000002347 injection Methods 0.000 claims description 3
- 239000007924 injection Substances 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 239000001301 oxygen Substances 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- 239000001103 potassium chloride Substances 0.000 claims description 3
- 235000011164 potassium chloride Nutrition 0.000 claims description 3
- 230000001376 precipitating effect Effects 0.000 claims description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 2
- 230000008859 change Effects 0.000 claims description 2
- 238000000034 method Methods 0.000 abstract description 9
- 230000008929 regeneration Effects 0.000 abstract description 9
- 238000011069 regeneration method Methods 0.000 abstract description 9
- 230000008901 benefit Effects 0.000 abstract description 4
- 239000003344 environmental pollutant Substances 0.000 abstract description 4
- 231100000719 pollutant Toxicity 0.000 abstract description 4
- 230000008569 process Effects 0.000 abstract description 3
- 238000004064 recycling Methods 0.000 abstract description 3
- 238000005516 engineering process Methods 0.000 description 4
- 229910021592 Copper(II) chloride Inorganic materials 0.000 description 2
- VMQMZMRVKUZKQL-UHFFFAOYSA-N Cu+ Chemical compound [Cu+] VMQMZMRVKUZKQL-UHFFFAOYSA-N 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- LYVWMIHLNQLWAC-UHFFFAOYSA-N [Cl].[Cu] Chemical compound [Cl].[Cu] LYVWMIHLNQLWAC-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 229910001431 copper ion Inorganic materials 0.000 description 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000036541 health Effects 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- -1 hydrogen Potassium oxide Chemical class 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 239000010842 industrial wastewater Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 244000005700 microbiome Species 0.000 description 1
- 229910001950 potassium oxide Inorganic materials 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
Landscapes
- ing And Chemical Polishing (AREA)
Abstract
The utility model discloses a kind of recovery and processing system of acidic etching waste liquid, by carrying out film electrolytic regeneration PROCESS FOR TREATMENT to acidic etching waste liquid, the chlorine that acidic etching waste liquid is produced in film electrolytic regeneration technique again absorbs through chlorine absorption unit and is directed into dense heat alkali liquid, reaction generation mixed solution, the mixed solution of generation needs the oxidant of addition to use in being produced as former etching solution, realize that pollutant is converted into resource reclaim recycling, it is more environmentally-friendly, and with good economic benefit.
Description
Technical field
The utility model is related to the processing regeneration field of acidic etching waste liquid, and more particularly to one kind can be efficient by chlorine
The recovery and processing system of the acidic etching waste liquid absorbed.
Background technology
In the electronics industry, the manufacture of printed circuit board not only consumes substantial amounts of water and energy, and produce to environment and
The harmful chemical substance of human health, and acidic etching waste liquid is to etch that a kind of copper content produced during copper foil is higher, acid
The larger industrial wastewater of degree.The main component of acidic etching waste liquid is copper chloride, hydrogen chloride, sodium chloride etc., severe contamination environment,
The existence of microorganism in water is influenceed, soil granular structure, influence crops existence is destroyed.Scientific research personnel be directed to always through
Ji, the exploitation and popularization of efficient acidic etching waste liquid recovery and utilization technology.
Existing acidic etching liquid recycling utilization technique is mainly membrane electrolysis, and this method is to be based on electrochemical principle,
Copper chlorine complex ion i.e. in acidic etching waste liquid obtains electron reduction for copper in negative electrode, and anode produces chlorine as oxidizing
The cuprous ion produced in etching production.But because of etching work procedure production requirement limitation, solution Central Asia content of copper ion is few, in the presence of
Between it is short, cause that the chlorine utilization produced is low, the follow-up more chlorine without utilizing enters exhaust treatment system, need to consume a large amount of
Piece alkali or reducing agent processing, material waste are serious, and operation cost is high, project commercial application is there is limitation.
Utility model content
Main purpose of the present utility model is to provide a kind of recovery and processing system of acidic etching waste liquid, can be by acid etching
The chlorine produced in the film electrolytic regeneration technique of waste liquid carries out efficient absorption recycling, realizes that pollutant is converted into resource reclaim.
The utility model proposes a kind of recovery and processing system of acidic etching waste liquid, including for collecting etching production line
Waste collection groove, the membrane electrolysis cells for being electrolysed to acidic etching waste liquid of acidic etching waste liquid, the waste collection groove
Connected between the membrane electrolysis cells by woven hose, and it is defeated by the acidic etching waste liquid in the waste collection groove to install water pump
Enter in the membrane electrolysis cells；Electrolytic cell is divided into cathode chamber and anode chamber by the membrane electrolysis cells by film, and the membrane electrolysis cells are by acid
Property etching waste liquor electrolysis precipitating metal copper and chlorine, obtain acid etching regenerated liquid；
The recovery and processing system also includes being used to store the accumulator tank of acid etching regenerated liquid, the chlorine for absorbing chlorine
Aspiration receiving apparatus, the alkaline reaction groove for storing the alkali lye that concentration is 0.5~50% and the oxygen connected with the alkaline reaction groove
Agent collecting vessel, is provided with the heater for being heated to alkali lye on the alkaline reaction groove, protects the alkali lye
Hold at 30~80 degrees Celsius, the chlorine of precipitation is absorbed and is directed into the alkaline reaction groove by the chlorine absorption unit
In alkali lye, the mixed solution that chlorine needs the oxidant of addition to use in being produced with alkaline reaction generation as former etching solution,
The mixed solution formed after the completion of reaction is inputted in the oxidant collection bucket.
Preferably, in addition to the chlorine sensor above the membrane electrolysis cells and for controlling the chlorine absorption
The control module of device, the control module is electrically connected with the chlorine sensor, the chlorine absorption unit, in the chlorine
When gas sensor detects chlorine, the control module controls the chlorine absorption unit to open.
Preferably, the chlorine absorption unit absorbs or spray-absorption device for injection.
Preferably, in addition to the membrane electrolysis cells circulating slot connected, the cathode chamber and anode chamber are respectively by defeated
The circulation of liquid pipe and the circulating slot is connected, and is respectively mounted water pump and is made acidic etching waste liquid in the anode chamber and the circulating slot
Between and the cathode chamber and the circulating slot between circulate.
Preferably, the alkali lye is sodium hydroxide or potassium hydroxide solution, and the sodium hydroxide solution is given birth to chlorine reaction
Into the mixed solution of sodium chlorate, sodium hypochlorite and sodium chloride；It is the potassium hydroxide solution and chlorine reaction generation potassium chlorate, secondary
The mixed solution of potassium chlorate and potassium chloride.
The beneficial effects of the utility model are：
The utility model carries out film electrolytic regeneration PROCESS FOR TREATMENT to acidic etching waste liquid, and acidic etching waste liquid is electrolysed in film
The chlorine produced in regeneration technology absorbs and is directed into dense heat alkali liquid through chlorine absorption unit, reaction generation mixed solution, raw
Into mixed solution can be produced as former etching solution in need the oxidant of addition to use, realize that pollutant is converted into resource reclaim
Recycle, it is more environmentally-friendly, and with good economic benefit.
Brief description of the drawings
Fig. 1 is the structured flowchart of the recovery and processing system of acidic etching waste liquid of the present utility model.
Realization, functional characteristics and the advantage of the utility model purpose will be described further referring to the drawings in conjunction with the embodiments.
Embodiment
It should be appreciated that specific embodiment described herein is not used to limit this only to explain the utility model
Utility model.
Reference picture 1, proposes a kind of embodiment of the recovery and processing system of acidic etching waste liquid of the present utility model：
A kind of recovery and processing system of acidic etching waste liquid, including for collecting the acidic etching waste liquid of etching production line
Waste collection groove, for the membrane electrolysis cells being electrolysed to acidic etching waste liquid, the circulating slot connected with membrane electrolysis cells.Waste liquid is received
Connected between collection groove and membrane electrolysis cells by woven hose, and electric pump is installed and the acidic etching waste liquid in waste collection groove is inputted into film
In electrolytic cell.Electrolytic cell is divided into cathode chamber and anode chamber by membrane electrolysis cells by film, and cathode chamber and anode chamber pass through woven hose respectively
Connected with circulating slot circulation, and be respectively mounted that electric pump makes acidic etching waste liquid between anode chamber and circulating slot and cathode chamber is with following
Circulated between annular groove.Acidic etching waste liquid is electrolysed precipitating metal copper and chlorine by membrane electrolysis cells, obtains acid etching regeneration
Liquid.Chemical equation is as follows：
Anolyte reaction chamber：
2(CuCl3)2-+2Cl-→2(CuCl4)2-+2e
2Cl-→Cl2↑+2e
Cathode chamber reacts：
(CuCl4)2-+Cu+2Cl-→2(CuCl3)2-
2(CuCl3)2-→2(CuCl2)-+2Cl-
2(CuCl2)-+2e→2Cu↓+4Cl-
2H++2e→H2↑
Recovery and processing system is also including being used to store the accumulator tank of acid etching regenerated liquid, being inhaled for absorbing the chlorine of chlorine
Receiving apparatus, the alkaline reaction groove for storing the alkali lye that concentration is 0.5~50% and the oxidant collection connected with alkaline reaction groove
Bucket.The acid etching regenerated liquid isolated is collected into accumulator tank.
Recovery and processing system is also including the chlorine sensor above membrane electrolysis cells and for controlling chlorine absorption to fill
The control module put.Control module is electrically connected with chlorine sensor, chlorine absorption unit, and anode is detected in chlorine sensor
When there is chlorine precipitation room, control module control chlorine absorption unit starts to start, and absorbs chlorine.
Heater for being heated to alkali lye is installed on alkaline reaction groove, alkali lye is maintained at 30~80 and takes the photograph
Family name's degree.Heater is steam heater or electric heater unit.
The chlorine of precipitation is absorbed and is directed into the alkali lye of alkaline reaction groove by chlorine absorption unit.Alkali lye is concentration
For 0.5~50%, temperature is 30~80 degrees Celsius of sodium hydroxide or potassium hydroxide solution：Using sodium hydroxide solution, hydrogen-oxygen
Change the mixed solution that sodium solution generates sodium chlorate, sodium hypochlorite and sodium chloride with chlorine reaction；Using potassium hydroxide solution, hydrogen
Potassium oxide solution generates the mixed solution of potassium chlorate, postassium hypochlorite and potassium chloride with chlorine reaction.
Sodium hydroxide solution and chlorine reaction equation：
2NaOH+CI2=NaCI+NaCIO+H2O
6NaOH+3CI2=5NaCI+NaCIO3+3H2O
The mixed solution that chlorine is generated with alkaline reaction needs the oxidant of addition to use in being produced as former etching solution,
In the mixed solution input oxidant collection bucket formed after the completion of reaction.
Wherein, chlorine absorption unit absorbs or spray-absorption device for injection.Chlorine absorption unit can be single-stage or many
Level series connection.
The application method of this recovery and processing system comprises the following steps：
1) acidic etching waste liquid for etching production line is collected into waste collection groove, will be pending in waste collection groove
Acidic etching waste liquid add membrane electrolysis cells in；Electrolytic cell is divided into cathode chamber and anode chamber, membrane electrolysis cells by membrane electrolysis cells by film
Cathode chamber and anode chamber connected respectively with same circulating slot, by electric pump by acidic etching waste liquid membrane electrolysis cells cathode chamber
Circulated between anode chamber and circulating slot；Acidic etching waste liquid in the cathode chamber of membrane electrolysis cells and anode chamber be electrolysed instead
Should, metallic copper is generated in cathode chamber, chlorine is generated in anode chamber.
2) it is 0.5~50% to absorb and be directed into concentration the chlorine that generation is electrolysed in step 1 by chlorine absorption unit,
Temperature is in 30~80 degrees Celsius of sodium hydroxide solution, sodium hydroxide solution generates sodium chlorate, sodium hypochlorite with chlorine reaction
And the mixed solution of sodium chloride.
3) mixed solution generated in step 2 is collected in oxidant collection bucket, needs to add in producing as former etching solution
Plus oxidant use.
4) after the completion of acidic etching waste liquid is electrolysed in membrane electrolysis cells, acid etching regenerated liquid is obtained, by acid etching again
Raw liquid is separated with the metallic copper of generation, and metallic copper is collected into copper collecting tank, and acid etching regenerated liquid is collected into accumulator tank.
The utility model carries out film electrolytic regeneration PROCESS FOR TREATMENT to acidic etching waste liquid, and acidic etching waste liquid is electrolysed in film
The chlorine produced in regeneration technology absorbs and is directed into dense heat alkali liquid through chlorine absorption unit, reaction generation mixed solution, raw
Into mixed solution can be produced as former etching solution in need the oxidant of addition to use, realize that pollutant is converted into resource reclaim
Recycle, it is more environmentally-friendly, and with good economic benefit.
Preferred embodiment of the present utility model is these are only, the scope of the claims of the present utility model is not thereby limited, it is every
The equivalent structure transformation made using the utility model specification and accompanying drawing content, or directly or indirectly it is used in other correlations
Technical field, is similarly included in scope of patent protection of the present utility model.
Claims (5)
1. a kind of recovery and processing system of acidic etching waste liquid, it is characterised in that including the acidity for collecting etching production line
Waste collection groove, the membrane electrolysis cells for being electrolysed to acidic etching waste liquid of etching waste liquor, the waste collection groove and institute
State and connected by woven hose between membrane electrolysis cells, and water pump is installed and the acidic etching waste liquid in the waste collection groove is inputted into institute
State in membrane electrolysis cells；Electrolytic cell is divided into cathode chamber and anode chamber by the membrane electrolysis cells by film, and the membrane electrolysis cells lose acidity
Waste liquid electrolysis precipitating metal copper and chlorine are carved, acid etching regenerated liquid is obtained；
The recovery and processing system is also including being used to store the accumulator tank of acid etching regenerated liquid, being inhaled for absorbing the chlorine of chlorine
Receiving apparatus, the alkaline reaction groove for storing the alkali lye that concentration is 0.5~50% and the oxidant connected with the alkaline reaction groove
Collecting vessel, the heater for being heated to alkali lye is provided with the alkaline reaction groove, the alkali lye is maintained at
30~80 degrees Celsius, the chlorine of precipitation is absorbed and is directed into the alkali lye of the alkaline reaction groove by the chlorine absorption unit
In, chlorine is generated with alkaline reaction can be as the mixed solution for needing the oxidant of addition to use in the production of former etching solution, reaction
After the completion of the mixed solution that is formed input in the oxidant collection bucket.
2. the recovery and processing system of acidic etching waste liquid according to claim 1, it is characterised in that also including installed in institute
State the chlorine sensor above membrane electrolysis cells and the control module for controlling the chlorine absorption unit, the control module with
The chlorine sensor, chlorine absorption unit electrical connection, when the chlorine sensor detects chlorine, the control
Module controls the chlorine absorption unit to open.
3. the recovery and processing system of acidic etching waste liquid according to claim 1 or 2, it is characterised in that the chlorine is inhaled
Receiving apparatus absorbs or spray-absorption device for injection.
4. the recovery and processing system of acidic etching waste liquid according to claim 1, it is characterised in that also including with the film
The circulating slot of electrolytic cell connection, the cathode chamber and anode chamber are connected by woven hose with circulating slot circulation respectively, and point
Not An Zhuan water pump make acidic etching waste liquid between the anode chamber and the circulating slot and the cathode chamber and the circulating slot
Between circulate.
5. the recovery and processing system of acidic etching waste liquid according to claim 1, it is characterised in that the alkali lye is hydrogen-oxygen
Change sodium or potassium hydroxide solution, the sodium hydroxide solution generates sodium chlorate, sodium hypochlorite and sodium chloride with chlorine reaction
Mixed solution；The potassium hydroxide solution generates the mixed solution of potassium chlorate, postassium hypochlorite and potassium chloride with chlorine reaction.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720014515.6U CN206570410U (en) | 2017-01-06 | 2017-01-06 | A kind of recovery and processing system of acidic etching waste liquid |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720014515.6U CN206570410U (en) | 2017-01-06 | 2017-01-06 | A kind of recovery and processing system of acidic etching waste liquid |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN206570410U true CN206570410U (en) | 2017-10-20 |
Family
ID=60060690
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201720014515.6U Expired - Fee Related CN206570410U (en) | 2017-01-06 | 2017-01-06 | A kind of recovery and processing system of acidic etching waste liquid |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN206570410U (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106498401A (en) * | 2017-01-06 | 2017-03-15 | 深圳市新锐思环保科技有限公司 | A kind of recoverying and utilizing method of acidic etching waste liquid and recovery and processing system |
| CN107630220A (en) * | 2017-10-27 | 2018-01-26 | 深圳市洁驰科技有限公司 | Acidic etching liquid regeneration treatment system |
| CN108425116A (en) * | 2018-02-01 | 2018-08-21 | 深圳中科欧泰华环保科技有限公司 | The processing method and equipment of three-level cyclic absorption are used in acid etching production line |
| CN109161895A (en) * | 2018-08-27 | 2019-01-08 | 安徽绿洲危险废物综合利用有限公司 | Acid copper chloride etching liquid copper reclaiming system and reclaiming method |
| CN109292738A (en) * | 2018-10-26 | 2019-02-01 | 惠州市臻鼎环保科技有限公司 | Using the technique and system of acidic etching waste liquid production industrial bleaching water |
-
2017
- 2017-01-06 CN CN201720014515.6U patent/CN206570410U/en not_active Expired - Fee Related
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106498401A (en) * | 2017-01-06 | 2017-03-15 | 深圳市新锐思环保科技有限公司 | A kind of recoverying and utilizing method of acidic etching waste liquid and recovery and processing system |
| CN107630220A (en) * | 2017-10-27 | 2018-01-26 | 深圳市洁驰科技有限公司 | Acidic etching liquid regeneration treatment system |
| CN107630220B (en) * | 2017-10-27 | 2019-09-20 | 深圳市洁驰科技有限公司 | Acidic etching liquid regeneration treatment system |
| CN108425116A (en) * | 2018-02-01 | 2018-08-21 | 深圳中科欧泰华环保科技有限公司 | The processing method and equipment of three-level cyclic absorption are used in acid etching production line |
| CN109161895A (en) * | 2018-08-27 | 2019-01-08 | 安徽绿洲危险废物综合利用有限公司 | Acid copper chloride etching liquid copper reclaiming system and reclaiming method |
| CN109292738A (en) * | 2018-10-26 | 2019-02-01 | 惠州市臻鼎环保科技有限公司 | Using the technique and system of acidic etching waste liquid production industrial bleaching water |
| CN109292738B (en) * | 2018-10-26 | 2021-10-26 | 惠州市臻鼎环保科技有限公司 | Process and system for preparing industrial bleaching water by using acidic etching waste liquid |
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| CP02 | Change in the address of a patent holder | ||
| CP02 | Change in the address of a patent holder |
Address after: 518000 4th floor, building B, Hangcheng Industrial Zone, chentian, Taoyuan community, Xixiang street, Bao'an District, Shenzhen City, Guangdong Province Patentee after: SHENZHEN XINRUISI ENVIRONMENTAL PROTECTION TECHNOLOGY Co.,Ltd. Address before: 518000 rooms 530-531, building 1, Taoyuanju complex building, Xixiang street, Bao'an District, Shenzhen City, Guangdong Province Patentee before: SHENZHEN XINRUISI ENVIRONMENTAL PROTECTION TECHNOLOGY Co.,Ltd. |
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| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20171020 |